WO2012081759A1 - Procédé pour fabriquer une cellule solaire à couche mince organique ayant une structure à canaux - Google Patents

Procédé pour fabriquer une cellule solaire à couche mince organique ayant une structure à canaux Download PDF

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Publication number
WO2012081759A1
WO2012081759A1 PCT/KR2010/009460 KR2010009460W WO2012081759A1 WO 2012081759 A1 WO2012081759 A1 WO 2012081759A1 KR 2010009460 W KR2010009460 W KR 2010009460W WO 2012081759 A1 WO2012081759 A1 WO 2012081759A1
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WO
WIPO (PCT)
Prior art keywords
substrate
forming
solar cell
manufacturing
thin film
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Application number
PCT/KR2010/009460
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English (en)
Korean (ko)
Inventor
황준영
강정진
조영준
이낙규
강경태
이성호
황철진
강희석
유경훈
이상호
Original Assignee
한국생산기술연구원
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Application filed by 한국생산기술연구원 filed Critical 한국생산기술연구원
Publication of WO2012081759A1 publication Critical patent/WO2012081759A1/fr

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/80—Constructional details
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/30—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation comprising bulk heterojunctions, e.g. interpenetrating networks of donor and acceptor material domains
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/50—Photovoltaic [PV] devices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Definitions

  • the present invention relates to a method for manufacturing an organic thin film solar cell having a channel structure, and more particularly, to a method for manufacturing a solar cell that can easily solve defects and compensate for defects according to the manufacture of a substrate composed of independent cells, and can simplify the manufacturing process. .
  • solar cells are attracting attention as a new energy source because they use sunlight that can be infinite.
  • Most of the solar cells currently in practical use are inorganic solar cells using monocrystalline silicon, polycrystalline silicon, and amorphous silicon.
  • these inorganic silicon solar cells have a drawback that their manufacturing process is complicated and their cost is high. Therefore, these inorganic silicon solar cells are not widely used for general household use.
  • a solar cell uses the photovoltaic effect of a semiconductor and is made by combining a p-type semiconductor and an n-type semiconductor.
  • the electrons of the n-type semiconductor diffuse into the p-type semiconductor due to the concentration difference of impurities. Holes diffuse from p-type to n-type.
  • the energy of electrons in the conduction band of the p-type semiconductor is narrower than that of the n-type semiconductor, and the energy of holes in the valence band of the n-type semiconductor is higher than that of the p-type semiconductor. Is generated.
  • a solar cell manufacturing method using a conventional printing method such as inkjet, forming a positive electrode pattern on the surface of the substrate, forming a conductive polymer layer on a portion of the surface of the substrate on which the positive electrode pattern is formed, the positive electrode pattern and the conductive polymer Forming an organic photoelectric layer on the surface of the substrate, and forming a negative electrode pattern on a portion of the organic photoelectric layer, wherein each of the steps is performed through a printing method.
  • Manufacturing methods are known.
  • the present invention for solving the above problems in the solar cell manufacturing method using a printing method, to improve the ease and reliability of manufacturing, to solve the manufacturing defects of each cell and to provide a solar cell manufacturing method that is easy to complement the There is a purpose.
  • a method of manufacturing a substrate by patterning such that horizontal walls are formed side by side at predetermined intervals on the prepared substrate surface, and forming a lower electrode (anode) on the surface on which the substrate wall surface is formed.
  • the electrode pattern Forming a buffer layer on the surface, forming an active layer (organic photoelectric layer) on the surface of the buffer layer, forming an electron accepting layer on the surface of the active layer, and forming an upper electrode (cathode) pattern on the surface of the electron receiving layer; Characterized in that comprises a.
  • the substrate the glass temperature is 250 degrees Celsius or less, characterized in that provided with a transparent film.
  • the step of manufacturing the substrate the step of mounting the stamper and the substrate with the wall surface formed in the molding machine in the chamber, the step of converting the chamber into a vacuum state and the heating temperature and pressing force so that the wall pattern formed on the stamper is transferred to the substrate, It characterized in that it comprises a step of controlling the pressing time and transferring.
  • the wall surface of the substrate is repeatedly formed at intervals of 5 mm or less, and the length of the wall surface is 10 times or more than the distance between the wall surfaces.
  • the lower electrode forming step may include coating a hydrophobic material on the surface of the substrate using spin coating, placing a mask according to a lower electrode pattern to be formed on the surface of the hydrophobic material, and irradiating ultraviolet rays. Changing the hydrophobic material to hydrophilic according to a mask pattern, and depositing the lower electrode.
  • the forming of the lower electrode may include positioning a mask according to a lower electrode pattern to be formed on the surface of the substrate having hydrophobic characteristics, changing a hydrophobic surface to hydrophilic according to a mask pattern by irradiating ultraviolet rays, and the lower electrode. It characterized in that it comprises a step of depositing.
  • substrate is characterized by being 10 times or less of the space
  • the buffer layer is characterized in that formed of poly ethylenedioxythiophene (PEDT) / poly styrene sulphonic acid (PSS).
  • PEDT poly ethylenedioxythiophene
  • PSS poly styrene sulphonic acid
  • the electron accepting layer is formed of LiF (Lithium Fluoride) or LiO 2 .
  • the lower electrode and the upper electrode pattern may be formed to be spaced apart from each other.
  • the forming of the buffer layer and the forming of the active layer may include any of inkjet printing, aerosol jet printing, EHD (electrohydrodynamic) jet printing, gravure printing, gravure offset printing, flexo printing, and screen printing. It is characterized by one printing technique.
  • the forming of the partition wall of the substrate may include any one of inkjet printing, aerosol jet printing, electrohydrodynamic (EHD) jet printing, gravure printing, gravure offset printing, flexographic printing, and screen printing. .
  • EHD electrohydrodynamic
  • the present invention configured as described above has the advantage that the electrode pattern is easily formed by forming a wall surface on the substrate surface, and the manufacturing defects can be easily solved and supplemented as each cell is manufactured to operate independently.
  • the etching process is not used in the entire process as it is manufactured only by the thermoforming process, the printing process, or the selective deposition process, there is a high advantage in the ease of the process and the environment.
  • FIG. 1 is a flowchart of a method for manufacturing an organic thin film solar cell having a channel structure according to the present invention
  • FIG. 2 is a flow chart showing a manufacturing step of a substrate on which a horizontal wall surface is formed according to the present invention
  • FIG. 3 is a top view of a substrate on which a wall is formed according to the present invention.
  • FIG. 4 is a perspective view showing a partition wall forming process according to another embodiment of the present invention.
  • FIG. 5 is a top view showing a state in which the lower electrode is formed on the substrate surface in the solar cell manufacturing method according to the invention
  • Figure 6 is a top view showing a state in which the upper electrode is formed on the substrate surface in the solar cell manufacturing method according to the present invention.
  • vacuum chamber 720 mold
  • a method of manufacturing a substrate by patterning a horizontal wall surface 110 to be formed side by side on the prepared substrate surface, Forming a lower electrode (anode) pattern on the surface of the substrate wall, forming a buffer layer 300 on the surface of the electrode pattern, and forming an active layer (organic photoelectric layer; 400) on the surface of the buffer layer And forming an electron accepting layer 500 on the surface of the active layer and forming an upper electrode (cathode) pattern on the surface of the electron accepting layer.
  • the solar cell manufacturing method by forming a cell independent by patterning the wall surface arranged horizontally parallel to the substrate surface, and manufacturing a solar cell using the substrate having such a pattern can increase the manufacturing reliability
  • FIG. 1 is a flowchart of a method of manufacturing an organic thin film solar cell having a channel structure according to the present invention.
  • a transparent or thin and flexible plastic substrate 100 is prepared, and then a wall is formed to be horizontally arranged side by side on one surface.
  • the wall surface is configured to have independent cells, and forms a wall pattern on the surface of the substrate after the transfer process.
  • FIG. 2 is a flow chart showing the manufacturing step of the substrate with a horizontal wall surface formed in accordance with the present invention.
  • the substrate according to the present invention is an organic thin film type substrate having transparency capable of transmitting sunlight, having excellent moldability and heat resistance, and having flexibility, and in terms of formability, polyethylene (PE) resin and polycarbonate (PC) resin.
  • PE polyethylene
  • PC polycarbonate
  • PMMA Polymethyl methacrylate
  • PA polyamide
  • PEN polyenthylene naphthalate
  • the glass temperature is 250 degrees Celsius or less. Use a transparent film.
  • the molding machine corresponds to a molding machine that is implemented by compression in a vacuum atmosphere.
  • the atmosphere of the chamber is switched to a vacuum atmosphere, and then the heating temperature, the heating pressure, and the heating time are set to compress the stamper and the substrate.
  • the heating temperature is 180 degrees
  • the heating pressure is 19 megapascals (Mpa)
  • the heating time can be formed to optimize the wall surface of the substrate by setting the process conditions to about 19 minutes.
  • the final substrate is completed by separating the substrate on which the transfer to the substrate is completed on the molding machine.
  • FIG. 3 is a top view of a substrate on which a wall is formed according to the present invention.
  • the wall surface formed as the surface of the solar cell substrate is arranged side by side horizontally to form a cell, the interval between each wall is 5 mm or less, the length of the wall is preferably about 10 times or more of the interval between the wall surface.
  • the width of the wall surface is less than or equal to the smallest size of 100 micrometers, the thickness of the substrate, 1/10 of the gap between the wall surface, the height of the wall surface is preferably formed to 1 to 2 micrometers.
  • the interval between cells corresponds to approximately 10 mm.
  • a substrate having a channel structure having a wall pattern arranged horizontally side by side on the substrate surface has an advantage in that electrode (lower electrode) patterning is easy and defects are easily solved or supplemented because each cell is configured independently.
  • FIG. 4 is a perspective view showing a partition wall forming process in another embodiment according to the present invention.
  • partition walls perpendicular to the wall surface are formed on the lower electrode pattern at regular intervals to form a plurality of grid-shaped electrode patterns.
  • the partition wall forming process is further applied, the problem of the existing technology of forming the grid structure from the beginning is solved, thereby having the advantages of the grid structure and increasing the ease of the process.
  • the partition wall may be formed by applying any one of inkjet printing, aerosol jet printing, electrohydrodynamic (EHD) jet printing, gravure printing, gravure offset printing, flexographic printing, and screen printing.
  • EHD electrohydrodynamic
  • Figure 5 is a top view showing a state in which the lower electrode is formed on the surface of the solar cell manufacturing method according to the present invention.
  • the lower electrode (anode) 200 is formed from the substrate having the wall surface.
  • the lower electrode forms AZO (Al-doped Zinc Oxide) by CVD deposition method.
  • AZO Al-doped Zinc Oxide
  • CVD deposition method When the deposition process is described in detail, first, a substrate is mounted on a spin coater to form a hydrophobic material on the substrate surface, OTS (OctadecylTricholro Silane) is added and operated for a predetermined time to coat the hydrophobic material on the substrate. After the coating is completed, a mask corresponding to the electrode pattern is manufactured, and the mask is placed on a substrate to convert UV into hydrophilicity according to the mask. An Al-doped Zinc Oxide (AZO) transparent conductive film is formed using ALD (Atomic Layer Deposition) according to the lower electrode formation pattern converted to hydrophilicity.
  • ALD Atomic Layer Deposition
  • the buffer layer 300, the organic photoelectric layer (active layer; 400), and the electron accepting layer (Lif layer; 500) are sequentially printed and deposited as shown in FIG. 1.
  • the buffer layer 300 is necessary to form the organic photoelectric layer.
  • the buffer layer is required due to the small wettability according to the interface anisotropy between the inorganic lower electrode and the organic photoelectric layer of the organic material.
  • Baytron P VP Al 4083 grade was used as polyethylenedioxythiphene: polystyrene sulfonic acid (PEDT: PSS) as a buffer layer on the AZO electrode.
  • PDT polystyrene sulfonic acid
  • 4083 is not formed by ink jet spraying, and is formed by ink jet spraying by adding glycerol and DI water. And heat treatment for 10 minutes at 140 degrees in air for adhesion and moisture removal of the substrate and the buffer layer.
  • an organic photoelectric layer (active layer) 400 is formed.
  • the organic photoelectric layer poly (3-hexyl-thiophene) (P3HT) and phenyl-C61 butyric acid methylester (PCBM), which is an electron receiving material, are used.
  • P3HT uses EE grade Rieke methal
  • PCBM uses Nano-C. Chlorobenzene was used as a solvent for dissolving the two organic materials, and the two materials were dissolved at a weight ratio of 10: 8, and foreign substances were filtered using a Teflon filter to filter more than 0.45um and then sprayed using a micro fab equipment. Finally, heat treatment was performed at 70 ° C.
  • the step of forming the pre-buffer layer and the process of forming the active layer (organic photoelectric layer) may be any of inkjet printing, aerosol jet printing, EHD (electrohydrodynamic) jet printing, gravure printing, gravure offset printing, flexo printing, and screen printing. It can be formed by applying one printing technique.
  • the electron accepting layer may be further formed on the surface of the organic photoelectric layer.
  • the electron accepting layer (buffer layer) is used to improve performance when manufacturing a device such as an organic solar cell or an organic light emitting diode.
  • the upper electrode is used as aluminum (most commonly), LiF (Lithium Fluoride) or LiO 2 is used. Can be formed.
  • FIG. 6 is a top view illustrating a state in which an upper electrode is formed on a surface of a solar cell according to the present invention. Finally, an upper electrode (cathode) 600 is formed on the surface of the electron accepting layer.
  • a preferred example of the upper electrode is formed by depositing aluminum (Al), and as shown in FIG. 6, the pattern of the lower electrode and the pattern of the upper electrode are spaced apart from each other to form a short circuit between both electrodes.
  • a protective layer is finally formed on the surface of the substrate on which the upper electrode is formed.
  • the protective layer is intended to block air and moisture in order to maintain the state of the device after the cathode deposition process is completed, and by using a flexible substrate, the protective layer also uses a resin having flexibility, a representative material is Polyvinylpyrrolidone (PVP) is a stable polymer with high mechanical strength. It is soluble in organic solvents (IPA, Benzene, etc.) and is possible in liquid phase processes. In this case, the protective layer may be formed through spin coating or printing coating.
  • the present invention configured as described above uses a substrate having a channel structure, and thus has high manufacturing reliability, and as a cell, it is easy to solve and compensate for manufacturing defects.

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Photovoltaic Devices (AREA)
  • Hybrid Cells (AREA)

Abstract

La présente invention concerne un procédé pour fabriquer une cellule solaire à couche mince organique ayant une structure à canaux. Le procédé pour fabriquer la cellule solaire à couche mince organique comprend les étapes de : fabrication d'un substrat par modelage du substrat afin de former des parois mutuellement horizontales (110) côte-à-côte sur la surface d'un substrat préparé ; formation d'un motif d'électrode inférieure (anode ; 200) sur la surface de laquelle les parois du substrat sont formées ; formation d'une couche tampon (300) sur la surface d'un motif d'électrode ; formation d'une couche active (couche photoactive organique ; 400) sur la surface de la couche tampon ; formation d'une couche acceptrice d'électron (500) sur la surface de la couche active ; et formation d'un motif d'électrode supérieure (cathode ; 600) sur la couche acceptrice d'électron.
PCT/KR2010/009460 2010-12-16 2010-12-29 Procédé pour fabriquer une cellule solaire à couche mince organique ayant une structure à canaux WO2012081759A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2010-0129166 2010-12-16
KR1020100129166A KR101207504B1 (ko) 2010-12-16 2010-12-16 채널 구조의 유기박막 태양전지 제조방법

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WO2012081759A1 true WO2012081759A1 (fr) 2012-06-21

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Publication number Priority date Publication date Assignee Title
KR101366843B1 (ko) * 2012-11-13 2014-03-03 재단법인대구경북과학기술원 고개구율 태양전지 모듈 및 그 제조방법
KR101469235B1 (ko) * 2013-07-03 2014-12-09 한밭대학교 산학협력단 유기 태양전지의 제조장치 및 제조방법
KR101539959B1 (ko) * 2015-01-06 2015-07-30 성안기계 (주) 유기 태양 전지 제조 방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080223445A1 (en) * 2007-03-12 2008-09-18 Northwestern University Electron-blocking layer / hole-transport layer for organic photovoltaics and applications of same
KR20090089526A (ko) * 2008-02-19 2009-08-24 주식회사 엘지화학 태양전지용 선택적 에미터의 제조방법 및 그에 사용되는마스크 패턴 제조용 페이스트.
US20100170568A1 (en) * 2007-09-27 2010-07-08 Murata Manufacturing Co., Ltd Ag electrode paste, solar battery cell, and method of manufacturing the same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080223445A1 (en) * 2007-03-12 2008-09-18 Northwestern University Electron-blocking layer / hole-transport layer for organic photovoltaics and applications of same
US20100170568A1 (en) * 2007-09-27 2010-07-08 Murata Manufacturing Co., Ltd Ag electrode paste, solar battery cell, and method of manufacturing the same
KR20090089526A (ko) * 2008-02-19 2009-08-24 주식회사 엘지화학 태양전지용 선택적 에미터의 제조방법 및 그에 사용되는마스크 패턴 제조용 페이스트.

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KR101207504B1 (ko) 2012-12-05
KR20120067639A (ko) 2012-06-26

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