WO2012073810A1 - Substrate for display panel and substrate exposure method - Google Patents

Substrate for display panel and substrate exposure method Download PDF

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Publication number
WO2012073810A1
WO2012073810A1 PCT/JP2011/077156 JP2011077156W WO2012073810A1 WO 2012073810 A1 WO2012073810 A1 WO 2012073810A1 JP 2011077156 W JP2011077156 W JP 2011077156W WO 2012073810 A1 WO2012073810 A1 WO 2012073810A1
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WO
WIPO (PCT)
Prior art keywords
substrate
display panel
alignment mark
exposure
display area
Prior art date
Application number
PCT/JP2011/077156
Other languages
French (fr)
Japanese (ja)
Inventor
田中　茂樹
宏樹 胡内
Original Assignee
シャープ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by シャープ株式会社 filed Critical シャープ株式会社
Priority to JP2012546821A priority Critical patent/JP5756813B2/en
Priority to CN201180052583.7A priority patent/CN103189799B/en
Publication of WO2012073810A1 publication Critical patent/WO2012073810A1/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133354—Arrangements for aligning or assembling substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element

Definitions

  • the present invention relates to a display panel substrate and a substrate exposure method. More specifically, the present invention relates to a display panel substrate suitable for scanning exposure performed in a photo-alignment processing step of an alignment film, and an exposure method for the substrate.
  • the alignment film formed on the surfaces of the TFT array substrate and the color filter substrate of the liquid crystal display panel is subjected to an alignment process in order to align liquid crystal molecules in a predetermined direction.
  • rubbing with a fiber material has been generally used as a method for this alignment treatment, but recently, a photo-alignment treatment has been used as an alternative alignment treatment method.
  • the photo-alignment process is a process that gives predetermined alignment characteristics to the surface of the alignment film by irradiating the alignment film with light from a predetermined direction.
  • “light” is not limited to visible light, but includes ultraviolet light (ultraviolet light) that is an electromagnetic wave having a shorter wavelength than visible light.
  • an exposure method in the photo-alignment treatment for example, a method in which a mask provided with an opening having a predetermined shape is arranged so as to cover the entire surface of the substrate, and light is irradiated from above the mask.
  • an exposure method has been proposed in which a substrate is moved while irradiating light on a partial region of the substrate surface using a small mask having slit-shaped openings (Patent Document 1). 2).
  • a specific region on the substrate surface is exposed in a stripe shape.
  • the pattern formed on the surface of the substrate is photographed, and the position of the actual illumination is monitored using the photographed image. To do.
  • the area that is actually exposed does not deviate from the area to be exposed, and correction is performed when the area does not deviate.
  • an alignment mark is formed on the substrate so that the exposure can be performed with high precision in the vicinity of the exposure start position of the substrate.
  • the exposure start position should be exposed even when the alignment mark is arranged outside the area where the picture element pattern is formed in a lattice pattern and just around the periphery of the area as in Patent Document 1. There is a possibility of further devising because the exposure position shifts out of the region and is called “following failure”.
  • the present invention has been made in view of the above-described present situation, and an object thereof is to provide a display panel substrate and a substrate exposure method capable of accurately starting exposure from a predetermined position in a predetermined direction. Is.
  • the present inventors have disclosed an exposure method (in other words, scanning exposure) in which a substrate is moved while irradiating light onto a partial region of the substrate surface using a small mask having slit-like openings formed therein.
  • an exposure method in other words, scanning exposure
  • the alignment mark in an aspect in which the alignment mark is arranged outside the region where the pixel pattern is formed in a lattice shape (in other words, the exposure region) and in the immediate vicinity of the exposure region. It has been found that the exposure area may reach under the mask after the mask correction is completed.
  • the present inventors can complete the adjustment of the position and orientation of the mask before the exposure area reaches under the mask by arranging the center of the alignment mark at a position 2 mm or more away from the display area.
  • the present invention has been achieved as a result of conceiving that exposure can be accurately started from a predetermined position in a predetermined direction and the above-mentioned problems can be solved brilliantly.
  • the present invention is a display panel substrate having a display area in which a plurality of picture elements are arranged and a frame area adjacent to the display area, An alignment mark is provided in the frame area, The center of the alignment mark is a display panel substrate located at a position 2 mm or more away from the display area.
  • the display panel substrate of the present invention is suitable as a substrate to which scanning exposure is applied, and the alignment mark is preferably used for positioning during scanning exposure.
  • exposure accuracy can be improved by configuring an exposure system that reads information on the position and orientation of the alignment mark and adjusts the position and orientation of the photomask.
  • the present invention is also a substrate exposure method in which the display panel substrate placed on the stage is scanned and exposed by an exposure machine including a light source, a photomask, a stage, and an imaging device, In the scanning exposure, at least one of the display panel substrate and the photomask is moved, and light emitted from the light source is irradiated to the display region through a light transmitting portion provided in the photomask.
  • the substrate exposure method is as follows: Before scanning and exposing the inside of the display area, information on the position and orientation of the alignment mark is read by the imaging device, It is also a substrate exposure method in which the position and / or orientation of the photomask is adjusted based on the information while the photomask moves from the frame area to the display area.
  • the frame region is not particularly limited as long as it is a region excluding the display region in the display panel substrate, and includes, for example, an outer peripheral region of the display panel substrate.
  • the frame area may include an area between the plurality of display areas. , It does not have to be included.
  • the center of the alignment mark is preferably at a position within 50 mm from the display area. If the center of the alignment mark is placed more than 50 mm away from the display area, even if the mask position and orientation are adjusted to the optimum state based on the alignment mark, the mask position and orientation when reaching the display area is optimal. There is a possibility that it is out of the normal state.
  • the display panel substrate may include a wiring in the frame region, and the alignment mark may be disposed in a region between the wiring and the display region. According to this embodiment, it is possible to prevent the distance between the display area and the alignment mark from becoming too large, and to prevent the wiring in the frame area from being misidentified as the alignment mark.
  • the alignment mark is not particularly limited as long as it can read information on the position and orientation by the imaging device.
  • the alignment mark may be formed by a light shielding member extending in a row.
  • the pattern extending in a row is effective for obtaining information on both the position and the orientation, and the light shielding body is effective for obtaining information by the imaging device.
  • the imaging apparatus since it is a simple shape, there is little possibility that the imaging apparatus will fail to recognize.
  • the said alignment mark has the form extended in parallel with the alignment pattern in a display area.
  • the imaging apparatus can recognize the alignment pattern in the display area accurately and easily using the alignment mark provided in the frame area as a clue.
  • the alignment mark and the alignment pattern extending in parallel mean that the angle formed by the straight line portion included in the alignment mark and the straight line portion included in the alignment pattern is less than 3 °. , Preferably less than 1 °.
  • the said alignment mark has a form which has a 150 micrometers or more linear part parallel to the alignment pattern in a display area. If the alignment mark is provided with a straight line portion having the same length as that of the picture element, information regarding the position and orientation can be accurately determined by the imaging device.
  • the said alignment mark is arrange
  • substrate for display panels is a board
  • the exposure can be accurately started in a predetermined direction from a predetermined position. Can be accurately exposed.
  • FIG. 1 is a side view conceptually showing the configuration of the main part of the exposure apparatus according to Embodiment 1.
  • FIG. 8 is a diagram schematically showing the orientation direction of liquid crystal molecules in each pixel in a liquid crystal display panel configured by bonding the array substrate shown in FIG. 6 and the color filter substrate shown in FIG. 7.
  • FIG. 3 is a schematic plan view showing a configuration of a photomask for an array substrate used in the exposure method according to Embodiment 1. It is the figure which showed the relationship of the dimension and position of the photomask of FIG. 9, and the pattern formed in the array substrate.
  • FIG. 5 is a schematic plan view showing an enlarged alignment mark formed on a display panel substrate according to Embodiment 2.
  • FIG. 6 is a schematic plan view illustrating an enlarged alignment mark formed on a display panel substrate according to Embodiment 3.
  • FIG. 10 is a schematic plan view illustrating an enlarged alignment mark formed on a display panel substrate according to Embodiment 4.
  • Embodiment 1 A display panel substrate according to this embodiment and an exposure method using the substrate will be described with reference to FIGS.
  • FIG. 1 is a schematic perspective view illustrating a state before exposure of a display area in the exposure method according to the first embodiment.
  • FIG. 2 is a state during exposure of the display area in the exposure method according to the first embodiment.
  • the substrate exposure method according to the present embodiment uses a so-called “scanning exposure” method.
  • the mother glass substrate 10 is used while irradiating the surface of the mother glass substrate 10 with ultraviolet rays through the light transmitting portion of the mask 50 using a mask 50 having a slit-like light transmitting portion. It is to be moved.
  • the arrows in FIGS. 1 and 2 indicate the moving direction of the mother glass substrate 10.
  • the exposure method according to this embodiment is applied to a step of performing a photo-alignment process on an alignment film formed on the mother glass substrate 10.
  • the mother glass substrate 10 is for manufacturing an array substrate or a color filter substrate of a liquid crystal display panel, and six array substrates or color filter substrates can be cut out from one mother glass substrate 10.
  • the mother glass substrate 10 is described as an example of the display panel substrate.
  • the display panel substrate of the present invention may be a single array substrate or a single color filter substrate.
  • the mother glass substrate 10 is provided with six display areas 11 corresponding to each array substrate or color filter substrate.
  • the source signal lines and the gate signal lines intersecting each other are formed in a mesh pattern, and the thin film transistor and the pixel electrode are formed in each pixel region partitioned by the source signal line and the gate signal line. Is formed.
  • a black matrix is formed in a mesh shape, and a color filter is formed in each pixel area partitioned by the black matrix.
  • An alignment film to which a photo-alignment process can be applied is formed on the surface of the mother glass substrate.
  • An alignment mark 13 is provided in the outer peripheral region (frame region) of the mother glass substrate 10.
  • This alignment mark 13 is used to adjust the position and orientation of the mask 50 in advance in accordance with the position and orientation of the substrate 10 before starting the exposure to the display area 11 in the execution of the exposure method according to the present embodiment. belongs to.
  • the mask 50 is not suddenly largely displaced at the time of starting exposure on the display area 11, the accuracy of the exposure position can be improved, and the occurrence of exposure unevenness can be prevented.
  • the pattern in the display area 11 is complicated, it may fail to recognize a predetermined follow-up pattern (alignment pattern) in the display area 11 when exposure to the display area 11 is started. Since the pre-adjustment is performed by the alignment mark 13 arranged at the position, the capturing accuracy of the follow-up pattern (alignment pattern) can be improved.
  • the center of the alignment mark 13 is provided at a position 2 mm to 50 mm away from the display area 11.
  • the follow-up pattern (alignment pattern) in the display area 11 could not be accurately recognized at a rate of 80% or more.
  • the rate at which the follow-up pattern (alignment pattern) in the display area 11 cannot be accurately recognized is about 1 to 2%. Met.
  • the defect rate is about 1 to 2%. However, if the distance between the center of the alignment mark 13 and the display area 11 becomes too large, the defect rate may increase.
  • the amount of deviation when reading the alignment mark 13 (the amount that needs to be corrected at that time) is about 50 ⁇ m at the maximum.
  • the operation status of a general apparatus is, for example, that the maximum moving speed of the mask during alignment is 1 mm / sec, the acceleration is 25 mm / sec 2 , and the substrate transport speed is 90 mm / sec. From this condition, it can be said that the distance between the center of the alignment mark 13 and the display area 11 is 6.3 mm in order to correct the deviation of 50 ⁇ m.
  • the substrate conveyance speed is not limited to 90 mm / sec, and a general range is 50 mm / sec to 200 mm / sec.
  • the lower limit of the distance between the center of the alignment mark 13 and the display region 11 is preferably 5 mm or more, and more preferably 8 mm or more.
  • the upper limit of the distance between the center of the alignment mark 13 and the display area 11 is preferably 20 mm or less.
  • the alignment mark 13 is arrange
  • the dimension of the alignment mark 13 is not particularly limited.
  • the width of the alignment mark 13 is preferably 10 ⁇ m or more, and preferably 50 ⁇ m or less.
  • the length of the alignment mark 13 in the substrate transport direction is preferably 150 ⁇ m or more, more preferably 500 ⁇ m or more, and preferably 10 mm or less. From the viewpoint of causing the exposure machine to recognize the alignment mark 13, the length of the alignment mark 13 in the substrate transport direction is usually 1 mm or less.
  • FIG. 3 is an enlarged schematic plan view showing the alignment marks formed on the display panel substrate according to the first embodiment and the end of the display area corresponding to the array substrate.
  • a rectangular pattern having a width of about 15 ⁇ m and a length of about 500 ⁇ m is formed 2 mm to 50 mm from the display area 11 corresponding to the array substrate.
  • the alignment mark 13 is formed at a distant position. Since the rectangular pattern 13 has a simple shape, it is advantageous in that it is less likely to be recognized by the imaging apparatus.
  • the rectangular pattern 13 is formed in the same process as the source signal line 15 and is made of the same material as the source signal line 15.
  • the two source signal lines 15 are arranged as one set, and the rectangular pattern 13 is formed at a position where the center line coincides with the center line of the one set of source signal lines 15 formed in the display region 11. Is done. Since the rectangular pattern 13 and the center line of the set of source signal lines 15 coincide with each other, the imaging device is prevented from failing to capture the set of source signal lines 15.
  • the imaging apparatus uses a set of source signal lines 15 as a follow-up pattern (alignment pattern) in the display area 11, whereby accurate exposure is performed on the entire display area 11.
  • a rectangular pattern having a width of about 15 ⁇ m and a length of about 500 ⁇ m is positioned 2 mm to 50 mm away from the display area 11 corresponding to the color filter substrate.
  • the alignment mark 13 is formed.
  • the rectangular pattern 13 is formed in the same process as the black matrix, and its center line is formed at a position that coincides with the center line of the black matrix formed in the display area 11.
  • the imaging apparatus uses a black matrix as a follow-up pattern (alignment pattern) in the display area 11, whereby accurate exposure is performed on the entire display area 11.
  • the alignment mark 13 can be formed together in the step of forming the source signal line 15 or the black matrix. Therefore, it is not necessary to add a special process for forming the alignment mark 13, and the cost and time for manufacturing the substrate are not increased.
  • FIG. 4 is a schematic plan view showing a state before adjusting the orientation of the display panel substrate and the center line of the translucent portion provided on the photomask in the exposure method according to the first embodiment.
  • the substrate 10 is inclined with respect to the transport direction (see the arrow in FIG. 4), and is not parallel to the center line of the slit-like light transmitting portion of the photomask 50.
  • the display area 11 cannot be exposed along the arrangement direction of the picture elements provided on the substrate 10. If the length of the substrate in the conveyance direction is 2460 mm, a positional deviation of about 250 ⁇ m may actually occur between the front end and the rear end of the substrate, whereas the follow-up pattern (alignment pattern) has a predetermined position. If it deviates 5 ⁇ m or more from the distance, it becomes difficult to recognize.
  • the position and orientation of the alignment mark 13 positioned on the photomask 50 side from the display area 11 by 2 mm to 50 mm are determined.
  • the conveyance direction of the substrate 10 and the center line of the slit-like light transmitting portion of the photomask 50 are at a desired angle (for example, parallel) without stopping the conveyance of the substrate 10.
  • the position and angle of at least one of the substrate 10 and the photomask 50 are adjusted.
  • FIG. 5 is a side view conceptually showing the structure of the main part of the exposure apparatus according to the first embodiment.
  • the exposure machine includes an exposure unit 51 that irradiates the substrate 10 with ultraviolet rays, and a stage 55 for placing and moving the substrate 10.
  • the exposure unit 51 includes an ultraviolet light source that emits ultraviolet light, and is configured to irradiate the surface of the substrate 10 with ultraviolet light at a predetermined irradiation angle via the mask 50. What is necessary is just to select a light source suitably according to irradiation object, and the light source which emits visible light may be sufficient.
  • Each exposure unit 51 includes an imaging unit 53, a storage unit, a collation unit, and a mask moving unit.
  • the imaging unit 53 can photograph the surface of the substrate 10.
  • the storage means can store a reference image serving as a reference for exposure alignment.
  • the collating unit compares and collates the image captured by the image capturing unit 53 with the reference image, and calculates a difference between the actual exposure position and the position to be exposed.
  • the mask moving unit corrects the position and / or angle of the mask 50 based on the shift calculation result by the collating unit. Note that the collating means can similarly correct the position and / or angle of the mask 50 by a method of comparing and collating the result of imaging the substrate 10 and the result of imaging the mask 50 instead of using the reference image. it can.
  • the mask 50 is, for example, a plate-like member, and a light-transmitting portion having a predetermined dimension is provided at a predetermined location. Therefore, when the substrate 10 is transported and passes directly under the mask 50, only the region that has passed directly under the light transmitting portion of the mask 50 is exposed. As a result, a predetermined elongated linear area on the surface of the substrate 10 is exposed.
  • the light transmitting portion is not particularly limited as long as it can transmit light (ultraviolet rays in the present embodiment).
  • the light transmitting portion may be an opening provided in a mask or a portion where a transparent film is formed. Also good.
  • the exposure apparatus includes a plurality of masks 50 (in other words, exposure units 51). Then, the exposure units 51 are arranged perpendicular to the traveling direction of the substrate 10. Thereby, it can expose by one scan over the full width of the board
  • the substrate 10 is placed on the stage 55. At this time, the substrate 10 is placed so that the alignment mark 13 is positioned at the forefront in the direction of travel of the substrate 10 by the stage 55 (the direction indicated by the arrow in FIG. 1).
  • the alignment mark 13 formed on the surface of the substrate 10 enters the field of view of the imaging means 53 of each exposure unit 51, and the imaging means 53 takes an image thereof.
  • the collating unit compares and collates the image of the alignment mark 13 photographed by the imaging unit 53 with the reference image stored in the storage unit, and calculates a deviation between the position to be exposed and the actually exposed position. To do.
  • the correcting means corrects the position of the mask 50 (particularly, the position perpendicular to the traveling direction of the substrate 10) and the angle (particularly the angle relative to the traveling direction of the substrate 10) based on the calculation result.
  • the center line of the alignment mark 13 coincides with the set of source signal lines 15 or black matrix center lines formed in the display region 11 (see FIG. 3). Therefore, when the position and angle of the mask 50 are corrected using the alignment mark 13, the same effect as that obtained by photographing and correcting a set of source signal lines 15 or black matrix formed in the display region 11 is obtained. It is done.
  • the set of source signal lines 15 or the black matrix is used as an alignment pattern to be imaged by the imaging unit when the display area 11 is exposed.
  • the alignment mark 13 When the alignment mark 13 reaches a position where it can be imaged by the imaging means 53, the display area 11 of the substrate 10 does not reach directly below the mask 50. That is, the exposure is not yet started. Therefore, even if the mask 50 is largely moved by the correction using the alignment mark 13, the exposure on the display area 11 is not affected at all.
  • the display area 11 of the substrate 10 enters the field of view of the imaging means 53. Then, the imaging unit 53 can photograph the alignment pattern formed in the display area 11, and the position and angle of the mask 50 are corrected based on the alignment pattern. At almost the same time, the display area 11 of the substrate 10 reaches a position where it is exposed. As described above, the position and angle of the mask 50 are corrected by the alignment mark 13 until the substrate 10 reaches this position. Therefore, when this position is reached, the position and angle of the mask 50 do not change significantly. As a result, it is possible to improve the accuracy of the exposure position in the vicinity of the exposure start position with respect to the display area 11, and to prevent the occurrence of exposure unevenness.
  • the alignment pattern formed in the display region 11 is imaged, the exposure position shift is calculated by comparing and comparing the captured image and the reference image, and the position of the mask 50 based on the calculation result In addition, the angle correction is continuously performed. As a result, it is possible to expose a predetermined linear portion by carrying the substrate 10 once.
  • the exposure method according to the present embodiment corrects the position and angle of the mask 50 using the alignment mark 13 formed in advance outside the display area 11 before the exposure to the display area 11 is started. .
  • the alignment mark 13 of the substrate 10 is formed at a position where the imaging means 53 of the exposure unit 51 can take an image when the substrate 10 is placed on the stage 55 and conveyed.
  • the number of alignment marks 13 formed on the substrate 10 is equal to the number of exposure units 51 provided in the exposure machine.
  • the exposure method according to this embodiment is applied to a step of performing a photo-alignment process.
  • the photo-alignment treatment can be applied to liquid crystal display panels of various display modes, and is particularly suitable for a liquid crystal display panel of a twisted nematic vertical alignment (vertical alignment twisted nematic (VATN)) mode.
  • VATN vertical alignment twisted nematic
  • FIG. 6 is a diagram schematically showing a photo-alignment process for the array substrate using the exposure method according to the first embodiment.
  • the structure of the picture element applied to this embodiment is not particularly limited.
  • a pixel element 21 is formed in a region surrounded by the source signal line 19 and the gate signal line 17, and a pixel having a general configuration in which driving of the pixel is controlled by a thin film transistor will be described as an example.
  • two regions are assumed to be formed by being divided into approximately halfway between the source signal lines 19 on both sides (line A in the drawing) in each picture element.
  • each region is irradiated with ultraviolet rays from a direction inclined by a predetermined angle ⁇ with respect to the normal of the surface of the picture element.
  • the direction of the irradiation of ultraviolet rays with respect to each region is such that, when the optical axes of the irradiated ultraviolet rays are projected onto the surface of the picture element, the projected optical axes are parallel to the source signal lines 19 and differ from each other by 180 °. To do.
  • FIG. 7 is a diagram schematically showing a photo-alignment process for the color filter substrate using the exposure method according to the first embodiment.
  • a black matrix 23 is formed in a lattice shape, and a color filter layer is formed in each picture element divided by the lattice.
  • the color filter substrate is formed by being divided into two substantially at the middle (line B in the figure) of the two sides constituting the boundary of the picture element, which is parallel to the gate signal line 17 of the array substrate when bonded to the array substrate. Assume two regions to be used. Then, each region is irradiated with ultraviolet rays from a direction inclined by a predetermined angle ⁇ with respect to the normal of the surface of the picture element.
  • the direction of the irradiation of ultraviolet rays with respect to each region is such that, when the optical axes of the irradiated ultraviolet rays are projected onto the surface of the picture element, the projected optical axes are parallel to the gate signal lines 17 of the array substrate and 180 to each other. ° Different orientation.
  • FIG. 8 is a diagram schematically showing the orientation direction of the liquid crystal molecules in each pixel for the liquid crystal display panel formed by bonding the array substrate shown in FIG. 6 and the color filter substrate shown in FIG. is there.
  • the liquid crystal display panel is configured by bonding the substrates subjected to the alignment treatment as described above, the liquid crystal molecules filled between the two substrates are applied to each region of each substrate as shown in FIG. Alignment is performed according to the direction of the alignment treatment, that is, the irradiation direction of ultraviolet rays. As a result, a plurality of domain regions having different orientation directions of liquid crystal molecules are formed in each picture element.
  • the arrows in FIG. 8 indicate the orientation directions of the liquid crystal molecules located at the same distance from both substrate surfaces.
  • FIG. 9 is a schematic plan view showing the configuration of an array substrate photomask used in the exposure method according to the first embodiment.
  • FIG. 10 is a diagram showing the relationship between the size and position of the photomask of FIG. 9 and the pattern formed on the array substrate. In FIG. 10, for convenience of explanation, the pattern formed in the display area 11 is simplified from the pattern shown in FIG.
  • the array substrate photomask 60 is a substantially rectangular plate-shaped member.
  • a plurality of slit-like translucent portions 61 through which ultraviolet rays can pass are formed in parallel at a predetermined pitch Px.
  • the pitch Px is set equal to the pitch of the source signal lines 19 formed on the array substrate.
  • the width (dimension on the short side) Lx of the translucent portion 61 is set to a dimension that is approximately 1 ⁇ 2 of the pitch of the source signal lines 19.
  • FIG. 11 is a diagram showing the relationship between the dimensions and positions of the color filter substrate photomask used in the exposure method according to the first embodiment and the pattern formed on the color filter substrate.
  • the color filter substrate photomask 70 has substantially the same configuration as the array substrate photomask 60 (see FIG. 9). That is, a plurality of slit-like light transmitting portions 71 through which ultraviolet rays can pass are formed in parallel at a predetermined pitch Py.
  • the pitch Py is set to be equal to the pitch of the black matrix 23 formed on the color filter substrate (here, the pitch of the side parallel to the gate signal line 17 of the array substrate when superimposed on the array substrate).
  • the width (dimension on the short side) Ly of the translucent part 71 is set to a dimension that is about 1 ⁇ 2 of the pitch of the black matrix 23.
  • Embodiment 2 shows another example of alignment marks arranged in the frame region of the display panel substrate.
  • FIG. 12 is an enlarged schematic plan view showing alignment marks formed on the display panel substrate according to the second embodiment.
  • a slit-shaped notch (extracted portion) having a width (W) of 15 ⁇ m and a length (L) of about 500 ⁇ m is provided in the planarly arranged member.
  • the notch is used as an alignment mark.
  • a metal member formed in the same process as the source signal line is used if it is provided at a position 2 to 50 mm away from the display area corresponding to the array substrate.
  • a light shielding member formed in the same process as the black matrix is used.
  • the center line of the notch is formed at a position that coincides with the center line of the source signal line or black matrix formed in the display area.
  • Embodiment 3 shows another example of alignment marks arranged in the frame region of the display panel substrate.
  • FIG. 13 is an enlarged schematic plan view showing alignment marks formed on the display panel substrate according to the third embodiment.
  • the alignment mark has an H-shape, and the left and right directions are respectively provided at the upper end and the lower end of a linear portion having a width (W) of 15 ⁇ m and a length (L) of about 500 ⁇ m.
  • the straight line portions extending in a straight line are connected at the midpoint so as to form a right angle.
  • a metal member formed in the same process as the source signal line is used, and 2 mm to 50 mm from the display area corresponding to the color filter substrate. If it is provided at a distant position, a light shielding member formed in the same process as the black matrix is used.
  • the center line of the alignment mark is formed at a position that coincides with the center line of the source signal line or black matrix formed in the display area.
  • the H-shaped alignment mark is advantageous in that it does not easily cause confusion with other patterns.
  • Embodiment 4 shows another example of alignment marks arranged in the frame region of the display panel substrate.
  • FIG. 14 is a schematic plan view showing an enlarged alignment mark formed on the display panel substrate according to the fourth embodiment.
  • the alignment mark is a dotted line pattern having a width (W) of 15 ⁇ m and a total length (L) of about 500 ⁇ m. If it is provided at a position 2 mm to 50 mm away from the display area corresponding to the array substrate, a metal member formed in the same process as the source signal line is used, and 2 mm to 50 mm from the display area corresponding to the color filter substrate. If it is provided at a distant position, a light shielding member formed in the same process as the black matrix is used.
  • the center line of the alignment mark is formed at a position that coincides with the center line of the source signal line or black matrix formed in the display area.
  • the array substrate is exposed while moving the substrate in the extending direction of the source signal line.
  • the array substrate may be exposed while moving in the extending direction of the gate signal line. .
  • the position where the alignment mark is formed may be changed, and the “gate signal line” and the “source signal line” in the above description may be read.
  • the step of performing the photo-alignment process has been exemplified.
  • the display panel substrate and the exposure method using the substrate according to the present invention are applied to the manufacture of a color filter substrate and the array substrate. May be. Even in those cases, the same effect can be obtained by applying the present invention to the arrangement of the alignment marks.
  • Examples of producing a color filter substrate include exposure for forming a black matrix pattern and exposure for forming a color filter pattern of each color.
  • the color of the color filter is not particularly limited, and may be three colors of red, green, and blue, or may be four colors of red, green, blue, and yellow.
  • the light irradiation angle ( ⁇ ) is not particularly limited, and may be 0 °.
  • a pattern such as a gate signal line, a source signal line, and an insulating film
  • a resist may be applied on the various thin films that form the pattern and exposed, or if the various thin films that form the pattern are photosensitive materials, direct exposure may be performed.
  • direct exposure may be performed.
  • wiring and the like it is also possible to form a complicated pattern other than a straight line by repeatedly irradiating light to be exposed in a pulse shape.

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Abstract

The present invention provides a substrate for a display panel and a substrate exposure method such that it is possible to accurately commence an exposure in a prescribed direction from a prescribed location. The present invention relates to a substrate for a display panel, comprising: a display region wherein a plurality of pixels are arrayed; and a frame region which is adjacent to the display region. The substrate for the display panel further comprises alignment marks within the frame region. The centers of the alignment marks are in locations 2mm or more distant from the display region.

Description

表示パネル用基板及び基板露光方法Display panel substrate and substrate exposure method
本発明は、表示パネル用基板及び基板露光方法に関する。より詳しくは、配向膜の光配向処理工程等で行われる走査露光に適した表示パネル用の基板、及び、当該基板に対する露光方法に関するものである。 The present invention relates to a display panel substrate and a substrate exposure method. More specifically, the present invention relates to a display panel substrate suitable for scanning exposure performed in a photo-alignment processing step of an alignment film, and an exposure method for the substrate.
液晶表示パネルのＴＦＴアレイ基板及びカラーフィルタ基板の表面に形成される配向膜には、液晶分子を所定の向きに配向させるために配向処理が施される。この配向処理の方法として、従来一般には、繊維材料によるラビングが用いられてきたが、最近では、これに代わる配向処理の方法として、光配向処理が用いられるようになってきている。 The alignment film formed on the surfaces of the TFT array substrate and the color filter substrate of the liquid crystal display panel is subjected to an alignment process in order to align liquid crystal molecules in a predetermined direction. Conventionally, rubbing with a fiber material has been generally used as a method for this alignment treatment, but recently, a photo-alignment treatment has been used as an alternative alignment treatment method.
光配向処理は、配向膜に所定の方向から光を照射することにより、配向膜の表面に所定の配向特性を与える処理である。なお、本明細書において「光」とは、可視光線に限定されるものではなく、可視光線よりも波長の短い電磁波である紫外線（紫外光）を含むものである。光配向処理における露光方法としては、例えば、所定の形状の開口部が設けられたマスクを基板全面に覆いかぶせるように配置し、そのマスクの上方から光を照射するという方法が挙げられる。 The photo-alignment process is a process that gives predetermined alignment characteristics to the surface of the alignment film by irradiating the alignment film with light from a predetermined direction. In this specification, “light” is not limited to visible light, but includes ultraviolet light (ultraviolet light) that is an electromagnetic wave having a shorter wavelength than visible light. As an exposure method in the photo-alignment treatment, for example, a method in which a mask provided with an opening having a predetermined shape is arranged so as to cover the entire surface of the substrate, and light is irradiated from above the mask.
そのような露光方法では、基板サイズの大型化に伴ってマスクのサイズも大きくする必要があり、マスクの高価格化を招く。また、マスクが大型化すると、撓みによる開口部の位置ずれが生じやすくなる。 In such an exposure method, it is necessary to increase the size of the mask as the substrate size increases, leading to an increase in the cost of the mask. Further, when the mask is enlarged, the position of the opening is likely to be displaced due to bending.
これに対して、スリット状の開口部が形成された小形のマスクを用いて基板表面の一部の領域に光を照射しつつ、基板を移動させるという露光方法が提案されている（特許文献１、２参照）。この露光方法によれば、基板表面の特定の領域がストライプ状に露光される。また、この露光方法においては、光を照射しつつ基板を移動させている間は、基板の表面に形成されたパターンを撮影し、撮影された画像を用いて実際に照射している位置を監視する。これにより、実際に露光される領域が露光すべき領域から外れないようにし、また、外れた場合には補正する。 On the other hand, an exposure method has been proposed in which a substrate is moved while irradiating light on a partial region of the substrate surface using a small mask having slit-shaped openings (Patent Document 1). 2). According to this exposure method, a specific region on the substrate surface is exposed in a stripe shape. Also, in this exposure method, while moving the substrate while irradiating light, the pattern formed on the surface of the substrate is photographed, and the position of the actual illumination is monitored using the photographed image. To do. As a result, the area that is actually exposed does not deviate from the area to be exposed, and correction is performed when the area does not deviate.
そして、このような露光方法の実施に際し、基板の露光開始位置の近傍において精度よく露光ができるようにするため、基板にはアライメントマークが形成される。特許文献１では、露光対象となる基板について、絵素のパターンが格子状に形成される領域の外側で、かつその領域の直近に、基板に対するマスクの位置や角度をあらかじめ補正するためのアライメントマークとしてのダミーパターンを形成することが開示されている。 When performing such an exposure method, an alignment mark is formed on the substrate so that the exposure can be performed with high precision in the vicinity of the exposure start position of the substrate. In Patent Document 1, an alignment mark for correcting in advance the position and angle of a mask with respect to a substrate on the outside of an area where a pattern of picture elements is formed in a lattice pattern and in the vicinity of the area of the substrate to be exposed. Forming a dummy pattern is disclosed.
特開２００７－４１１７５号公報JP 2007-41175 A 国際公開第２００７／１１３９３３号International Publication No. 2007/113933
特許文献１のように、絵素のパターンが格子状に形成される領域の外側で、かつその領域の周辺の直近に、アライメントマークを配置した場合であっても、露光開始位置が露光すべき領域から外れてしまい、「追従不良」と呼ばれる露光位置のずれが生じることがあったため、更なる工夫の余地があった。 The exposure start position should be exposed even when the alignment mark is arranged outside the area where the picture element pattern is formed in a lattice pattern and just around the periphery of the area as in Patent Document 1. There is a possibility of further devising because the exposure position shifts out of the region and is called “following failure”.
本発明は、上記現状に鑑みてなされたものであり、所定の位置から所定の方向に向けて正確に露光を開始することができる表示パネル用基板及び基板露光方法を提供することを目的とするものである。 The present invention has been made in view of the above-described present situation, and an object thereof is to provide a display panel substrate and a substrate exposure method capable of accurately starting exposure from a predetermined position in a predetermined direction. Is.
本発明者らは、スリット状の開口部が形成された小形のマスクを用いて基板表面の一部の領域に光を照射しつつ、基板を移動させるという露光方法（言い換えれば、走査露光）について種々検討した結果、基板の露光開始位置の近傍において精度よく露光ができないことがあることに着目した。すなわち、本発明者らは、絵素のパターンが格子状に形成される領域（言い換えれば、露光領域）の外側で、かつ露光領域の直近に、アライメントマークを配置した態様では、アライメントマークを認識してからマスクの補正が完了するまでの間に、露光領域がマスクの下に到達してしまう場合があることを見いだした。そこで、本発明者らは、表示領域から２ｍｍ以上離れた位置にアライメントマークの中心を配置することにより、露光領域がマスクの下に到達する前にマスクの位置及び向きの調整を完了させることができ、所定の位置から所定の方向に向けて正確に露光を開始することができ、上記課題をみごとに解決することができることに想到した結果、本発明に到達したものである。 The present inventors have disclosed an exposure method (in other words, scanning exposure) in which a substrate is moved while irradiating light onto a partial region of the substrate surface using a small mask having slit-like openings formed therein. As a result of various studies, attention was paid to the fact that exposure may not be performed accurately near the exposure start position of the substrate. That is, the present inventors recognize the alignment mark in an aspect in which the alignment mark is arranged outside the region where the pixel pattern is formed in a lattice shape (in other words, the exposure region) and in the immediate vicinity of the exposure region. It has been found that the exposure area may reach under the mask after the mask correction is completed. Therefore, the present inventors can complete the adjustment of the position and orientation of the mask before the exposure area reaches under the mask by arranging the center of the alignment mark at a position 2 mm or more away from the display area. Thus, the present invention has been achieved as a result of conceiving that exposure can be accurately started from a predetermined position in a predetermined direction and the above-mentioned problems can be solved brilliantly.
すなわち、本発明は、複数の絵素が配列された表示領域と、上記表示領域に隣接する額縁領域とを有する表示パネル用基板であって、
上記額縁領域内にアライメントマークを備え、
上記アライメントマークの中心は、上記表示領域から２ｍｍ以上離れた位置にある表示パネル用基板である。 That is, the present invention is a display panel substrate having a display area in which a plurality of picture elements are arranged and a frame area adjacent to the display area,
An alignment mark is provided in the frame area,
The center of the alignment mark is a display panel substrate located at a position 2 mm or more away from the display area.
本発明の表示パネル用基板は、走査露光が適用される基板として好適であり、上記アライメントマークは、走査露光の際に位置決めに好適に用いられるものである。例えば、上記アライメントマークの位置及び向きに関する情報を読み取って、フォトマスクの位置、向きを調整する露光システムを構成すれば、露光精度の向上が可能である。 The display panel substrate of the present invention is suitable as a substrate to which scanning exposure is applied, and the alignment mark is preferably used for positioning during scanning exposure. For example, exposure accuracy can be improved by configuring an exposure system that reads information on the position and orientation of the alignment mark and adjusts the position and orientation of the photomask.
本発明はまた、光源、フォトマスク、ステージ及び撮像装置を備える露光機により、上記ステージ上に載置した上記表示パネル用基板を走査露光する基板露光方法であって、
上記走査露光は、上記表示パネル用基板及び上記フォトマスクの少なくとも一方を移動させつつ、上記フォトマスクに設けられた透光部を通じて、上記光源から放出された光を上記表示領域に照射するものであり、
上記基板露光方法は、
上記表示領域内を走査露光する前に、上記撮像装置によって上記アライメントマークの位置及び向きに関する情報を読み取り、
上記フォトマスクが上記額縁領域から上記表示領域へ移動する間に、上記情報に基づいて上記フォトマスクの位置及び／又は向きを調整する基板露光方法でもある。 The present invention is also a substrate exposure method in which the display panel substrate placed on the stage is scanned and exposed by an exposure machine including a light source, a photomask, a stage, and an imaging device,
In the scanning exposure, at least one of the display panel substrate and the photomask is moved, and light emitted from the light source is irradiated to the display region through a light transmitting portion provided in the photomask. Yes,
The substrate exposure method is as follows:
Before scanning and exposing the inside of the display area, information on the position and orientation of the alignment mark is read by the imaging device,
It is also a substrate exposure method in which the position and / or orientation of the photomask is adjusted based on the information while the photomask moves from the frame area to the display area.
なお、本明細書において、額縁領域とは、表示パネル用基板内の表示領域を除く領域であれば特に限定されず、例えば、表示パネル用基板の外周領域が挙げられる。また、表示パネル用基板がマザーガラス基板であって、表示パネル用基板内に複数の表示領域が配置される場合には、上記額縁領域は、複数の表示領域間の領域を含んでいてもよく、含まなくてもよい。 In the present specification, the frame region is not particularly limited as long as it is a region excluding the display region in the display panel substrate, and includes, for example, an outer peripheral region of the display panel substrate. When the display panel substrate is a mother glass substrate and a plurality of display areas are arranged in the display panel substrate, the frame area may include an area between the plurality of display areas. , It does not have to be included.
上記アライメントマークの中心は、上記表示領域から５０ｍｍ以内の位置にあることが好ましい。アライメントマークの中心を表示領域から５０ｍｍよりも離して配置すると、アライメントマークに基づきマスクの位置及び向きを最適な状態に調整しても、表示領域に到達した時点でのマスクの位置及び向きが最適な状態から外れてしまっているおそれがある。 The center of the alignment mark is preferably at a position within 50 mm from the display area. If the center of the alignment mark is placed more than 50 mm away from the display area, even if the mask position and orientation are adjusted to the optimum state based on the alignment mark, the mask position and orientation when reaching the display area is optimal. There is a possibility that it is out of the normal state.
本発明の一形態として、上記表示パネル用基板は、上記額縁領域内に配線を備え、上記アライメントマークは、上記配線と上記表示領域との間の領域に配置されている形態が挙げられる。この形態によれば、表示領域とアライメントマークの距離が大きくなり過ぎることを防止でき、かつ額縁領域内の配線をアライメントマークとして誤認することを防止できる。 As an embodiment of the present invention, the display panel substrate may include a wiring in the frame region, and the alignment mark may be disposed in a region between the wiring and the display region. According to this embodiment, it is possible to prevent the distance between the display area and the alignment mark from becoming too large, and to prevent the wiring in the frame area from being misidentified as the alignment mark.
なお、上記アライメントマークは、撮像装置によって位置及び向きに関する情報を読み取ることができるものであればよく、その形状及び材質は特に限定されない。例えば、本発明の一形態として、上記アライメントマークは、列状に伸びる遮光部材により形成されている形態が挙げられる。列状に伸びるパターンであることは、位置及び向きの両方に関する情報を得るのに有効であり、遮光体であることは、撮像装置により情報を得るのに有効である。また、単純な形状であることから、撮像装置が認識し損なう可能性が少ない。 The alignment mark is not particularly limited as long as it can read information on the position and orientation by the imaging device. For example, as an embodiment of the present invention, the alignment mark may be formed by a light shielding member extending in a row. The pattern extending in a row is effective for obtaining information on both the position and the orientation, and the light shielding body is effective for obtaining information by the imaging device. Moreover, since it is a simple shape, there is little possibility that the imaging apparatus will fail to recognize.
本発明の一形態として、上記アライメントマークは、表示領域内のアライメントパターンと平行に伸びている形態が挙げられる。この形態によれば、撮像装置は、額縁領域内に設けた上記アライメントマークを手がかりにして、正確かつ容易に表示領域内のアライメントパターンを認識することができる。なお、上記アライメントマークと上記アライメントパターンとが平行に伸びるとは、上記アライメントマークに含まれる直線部分と上記アライメントパターンに含まれる直線部分とにより形成される角度が３°未満であることを意味し、好ましくは１°未満である。 As one form of this invention, the said alignment mark has the form extended in parallel with the alignment pattern in a display area. According to this aspect, the imaging apparatus can recognize the alignment pattern in the display area accurately and easily using the alignment mark provided in the frame area as a clue. The alignment mark and the alignment pattern extending in parallel mean that the angle formed by the straight line portion included in the alignment mark and the straight line portion included in the alignment pattern is less than 3 °. , Preferably less than 1 °.
本発明の一形態として、上記アライメントマークは、表示領域内のアライメントパターンと平行な１５０μｍ以上の直線部分を有する形態が挙げられる。上記アライメントマークに絵素と同程度の長さの直線部分を設ければ、撮像装置によって位置及び向きに関する情報を正確に決定することができる。 As one form of this invention, the said alignment mark has a form which has a 150 micrometers or more linear part parallel to the alignment pattern in a display area. If the alignment mark is provided with a straight line portion having the same length as that of the picture element, information regarding the position and orientation can be accurately determined by the imaging device.
本発明の一形態として、上記アライメントマークは、表示領域内のアライメントパターンと平行に配置され、かつ点線状に配置されている形態が挙げられる。この形態によっても、撮像装置は、額縁領域内に設けた上記アライメントマークを手がかりにして、正確かつ容易に表示領域内のアライメントパターンを認識することができる。 As one form of this invention, the said alignment mark is arrange | positioned in parallel with the alignment pattern in a display area, and the form arrange | positioned at dotted line form is mentioned. Also in this form, the imaging apparatus can recognize the alignment pattern in the display area accurately and easily using the alignment mark provided in the frame area as a clue.
本発明の一形態として、上記表示パネル用基板は、液晶表示パネルに用いられる基板であり、配向膜を備える形態が挙げられる。光配向処理における露光状態は、液晶表示装置の表示品位に強く関連することから、額縁領域内に上記アライメントマークを設けることにより光配向処理における露光の正確性を向上させれば、液晶表示装置の表示品位を優れたものとすることができる。 As one form of this invention, the said board | substrate for display panels is a board | substrate used for a liquid crystal display panel, and the form provided with an alignment film is mentioned. Since the exposure state in the photo-alignment process is strongly related to the display quality of the liquid crystal display device, if the exposure accuracy in the photo-alignment process is improved by providing the alignment mark in the frame region, the liquid crystal display device The display quality can be improved.
本発明に係る表示パネル用基板、及び、それを用いた基板露光方法によれば、所定の位置から所定の方向に向けて正確に露光を開始することができることから、基板の露光開始位置の近傍においても精度よく露光ができる。 According to the display panel substrate and the substrate exposure method using the display panel substrate according to the present invention, the exposure can be accurately started in a predetermined direction from a predetermined position. Can be accurately exposed.
実施形態１に係る露光方法において、表示領域への露光前の状態を示す斜視模式図である。In the exposure method which concerns on Embodiment 1, it is a perspective schematic diagram which shows the state before the exposure to a display area. 実施形態１に係る露光方法において、表示領域への露光中の状態を示す斜視模式図である。In the exposure method which concerns on Embodiment 1, it is a perspective schematic diagram which shows the state during the exposure to a display area. 実施形態１に係る表示パネル用基板に形成されたアライメントマークと、アレイ基板に対応する表示領域の端部とを拡大して示した平面模式図である。4 is an enlarged schematic plan view showing alignment marks formed on a display panel substrate according to Embodiment 1 and end portions of a display region corresponding to an array substrate. FIG. 実施形態１に係る露光方法において、表示パネル用基板の向きとフォトマスクに設けられた透光部の中心線とを平行に調整する前の状態を示す平面模式図である。In the exposure method which concerns on Embodiment 1, it is a plane schematic diagram which shows the state before adjusting the direction of the board | substrate for display panels, and the centerline of the translucent part provided in the photomask in parallel. 実施形態１に係る露光機の要部の構成を概念的に示した側方図である。FIG. 3 is a side view conceptually showing the configuration of the main part of the exposure apparatus according to Embodiment 1. 実施形態１に係る露光方法を用いたアレイ基板に対する光配向処理を模式的に示した図である。It is the figure which showed typically the photo-alignment process with respect to the array substrate using the exposure method which concerns on Embodiment 1. FIG. 実施形態１に係る露光方法を用いたカラーフィルタ基板に対する光配向処理を模式的に示した図である。It is the figure which showed typically the optical orientation process with respect to the color filter substrate using the exposure method which concerns on Embodiment 1. FIG. 図６に示したアレイ基板と図７に示したカラーフィルタ基板とを貼り合わせて構成した液晶表示パネルについて、各絵素内における液晶分子の配向方向を模式的に示した図である。FIG. 8 is a diagram schematically showing the orientation direction of liquid crystal molecules in each pixel in a liquid crystal display panel configured by bonding the array substrate shown in FIG. 6 and the color filter substrate shown in FIG. 7. 実施形態１に係る露光方法に用いられるアレイ基板用フォトマスクの構成を示した平面模式図である。FIG. 3 is a schematic plan view showing a configuration of a photomask for an array substrate used in the exposure method according to Embodiment 1. 図９のフォトマスクとアレイ基板に形成されたパターンとの寸法及び位置の関係を示した図である。It is the figure which showed the relationship of the dimension and position of the photomask of FIG. 9, and the pattern formed in the array substrate. 実施形態１に係る露光方法に用いられるカラーフィルタ基板用フォトマスクと、カラーフィルタ基板に形成されたパターンとの寸法及び位置の関係を示した図である。It is the figure which showed the relationship of the dimension and position of the photomask for color filter substrates used for the exposure method which concerns on Embodiment 1, and the pattern formed in the color filter substrate. 実施形態２に係る表示パネル用基板に形成されたアライメントマークを拡大して示した平面模式図である。FIG. 5 is a schematic plan view showing an enlarged alignment mark formed on a display panel substrate according to Embodiment 2. 実施形態３に係る表示パネル用基板に形成されたアライメントマークを拡大して示した平面模式図である。FIG. 6 is a schematic plan view illustrating an enlarged alignment mark formed on a display panel substrate according to Embodiment 3. 実施形態４に係る表示パネル用基板に形成されたアライメントマークを拡大して示した平面模式図である。FIG. 10 is a schematic plan view illustrating an enlarged alignment mark formed on a display panel substrate according to Embodiment 4.
実施形態１
本実施形態に係る表示パネル用基板、及び、その基板を用いた露光方法について、図１～１１を参照して説明する。 Embodiment 1
A display panel substrate according to this embodiment and an exposure method using the substrate will be described with reference to FIGS.
図１は、実施形態１に係る露光方法において、表示領域への露光前の状態を示す斜視模式図であり、図２は、実施形態１に係る露光方法において、表示領域への露光中の状態を示す斜視模式図である。 FIG. 1 is a schematic perspective view illustrating a state before exposure of a display area in the exposure method according to the first embodiment. FIG. 2 is a state during exposure of the display area in the exposure method according to the first embodiment. FIG.
本実施形態に係る基板の露光方法は、いわゆる「走査（スキャン）露光」と呼ばれる方式を用いている。図１及び２に示すように、スリット状の透光部が形成されたマスク５０を用い、このマスク５０の透光部を通じて、マザーガラス基板１０の表面に紫外線を照射しつつマザーガラス基板１０を移動させるものである。図１、２中の矢印が、マザーガラス基板１０の移動方向を示している。本実施形態に係る露光方法は、マザーガラス基板１０に形成される配向膜に対して、光配向処理を施す工程に適用される。 The substrate exposure method according to the present embodiment uses a so-called “scanning exposure” method. As shown in FIGS. 1 and 2, the mother glass substrate 10 is used while irradiating the surface of the mother glass substrate 10 with ultraviolet rays through the light transmitting portion of the mask 50 using a mask 50 having a slit-like light transmitting portion. It is to be moved. The arrows in FIGS. 1 and 2 indicate the moving direction of the mother glass substrate 10. The exposure method according to this embodiment is applied to a step of performing a photo-alignment process on an alignment film formed on the mother glass substrate 10.
マザーガラス基板１０は、液晶表示パネルのアレイ基板又はカラーフィルタ基板を製造するためのものであり、１枚のマザーガラス基板１０から６枚のアレイ基板又はカラーフィルタ基板を切り出すことができる。なお、本実施形態では、表示パネル用基板としてマザーガラス基板１０を例にとって説明するが、本発明の表示パネル用基板は、単体のアレイ基板、単体のカラーフィルタ基板であってもよい。 The mother glass substrate 10 is for manufacturing an array substrate or a color filter substrate of a liquid crystal display panel, and six array substrates or color filter substrates can be cut out from one mother glass substrate 10. In this embodiment, the mother glass substrate 10 is described as an example of the display panel substrate. However, the display panel substrate of the present invention may be a single array substrate or a single color filter substrate.
マザーガラス基板１０には、各アレイ基板又はカラーフィルタ基板に対応して、６つの表示領域１１が設けられている。アレイ基板に対応する表示領域では、互いに交差するソース信号線及びゲート信号線が網目状に形成されており、ソース信号線及びゲート信号線により区画された各絵素領域に、薄膜トランジスタ及び絵素電極が形成されている。カラーフィルタ基板に対応する表示領域では、ブラックマトリックスが網目状に形成されており、ブラックマトリックスにより区画された各絵素領域に、カラーフィルタが形成されている。そして、マザーガラス基板の表面には光配向処理が適用可能な配向膜が形成されている。 The mother glass substrate 10 is provided with six display areas 11 corresponding to each array substrate or color filter substrate. In the display region corresponding to the array substrate, the source signal lines and the gate signal lines intersecting each other are formed in a mesh pattern, and the thin film transistor and the pixel electrode are formed in each pixel region partitioned by the source signal line and the gate signal line. Is formed. In the display area corresponding to the color filter substrate, a black matrix is formed in a mesh shape, and a color filter is formed in each pixel area partitioned by the black matrix. An alignment film to which a photo-alignment process can be applied is formed on the surface of the mother glass substrate.
マザーガラス基板１０の外周領域（額縁領域）には、アライメントマーク１３が設けられている。このアライメントマーク１３は、本実施形態に係る露光方法の実施において、表示領域１１への露光を開始する前に、基板１０の位置及び向きに応じて、予めマスク５０の位置及び向きを調整するためのものである。そのような調整により、表示領域１１に対して露光を開始する時点においてマスク５０が急激に大きく変位することがなく、露光位置の精度の向上を図ることができ、露光ムラの発生を防止できる。また、表示領域１１内のパターンは複雑であるため、表示領域１１への露光開始時に表示領域１１内の所定の追従用パターン（アライメントパターン）を認識し損なう場合があるが、額縁領域内の所定の位置に配置されたアライメントマーク１３により事前調整がなされることで、追従用パターン（アライメントパターン）の捕捉精度を向上させることができる。 An alignment mark 13 is provided in the outer peripheral region (frame region) of the mother glass substrate 10. This alignment mark 13 is used to adjust the position and orientation of the mask 50 in advance in accordance with the position and orientation of the substrate 10 before starting the exposure to the display area 11 in the execution of the exposure method according to the present embodiment. belongs to. By such adjustment, the mask 50 is not suddenly largely displaced at the time of starting exposure on the display area 11, the accuracy of the exposure position can be improved, and the occurrence of exposure unevenness can be prevented. In addition, since the pattern in the display area 11 is complicated, it may fail to recognize a predetermined follow-up pattern (alignment pattern) in the display area 11 when exposure to the display area 11 is started. Since the pre-adjustment is performed by the alignment mark 13 arranged at the position, the capturing accuracy of the follow-up pattern (alignment pattern) can be improved.
アライメントマーク１３の中心は、表示領域１１から２ｍｍ～５０ｍｍ離れた位置に設けられる。本願発明者の実験によれば、アライメントマーク１３を表示領域１１に隣接して配置したとき（アライメントマーク１３の長さは２ｍｍであり、アライメントマーク１３の中心と表示領域１１の境界との距離は１ｍｍであった）には、８０％以上の割合で、表示領域１１内の追従用パターン（アライメントパターン）の認識を正確に行うことができなかった。また、アライメントマーク１３を表示領域１１から５２ｍｍ離れた位置に配置したときには、表示領域１１内の追従用パターン（アライメントパターン）の認識を正確に行うことができなかった割合は、１～２％程度であった。しかしながら、アライメントマーク１３を配置するために額縁領域を５０ｍｍ以上設けることは、表示装置用基板の他の設計上の要素を考慮すると困難な場合が多い。また、上記した実験結果では、不良率は１～２％程度であったが、アライメントマーク１３の中心と表示領域１１との間隔が大きくなり過ぎると、不良率が増加するおそれがある。 The center of the alignment mark 13 is provided at a position 2 mm to 50 mm away from the display area 11. According to the experiment of the present inventor, when the alignment mark 13 is arranged adjacent to the display area 11 (the length of the alignment mark 13 is 2 mm, and the distance between the center of the alignment mark 13 and the boundary of the display area 11 is 1 mm), the follow-up pattern (alignment pattern) in the display area 11 could not be accurately recognized at a rate of 80% or more. In addition, when the alignment mark 13 is arranged at a position 52 mm away from the display area 11, the rate at which the follow-up pattern (alignment pattern) in the display area 11 cannot be accurately recognized is about 1 to 2%. Met. However, it is often difficult to provide a frame region of 50 mm or more in order to arrange the alignment mark 13 in consideration of other design elements of the display device substrate. In the above experimental results, the defect rate is about 1 to 2%. However, if the distance between the center of the alignment mark 13 and the display area 11 becomes too large, the defect rate may increase.
また、アライメントマーク１３を読み取ったときのずれ量（その時点で補正が必要な量）は、最大で５０μｍ程度である。一方、一般的な装置の動作状況は、例えば、位置合わせ時のマスクの最大移動速度が１ｍｍ／ｓｅｃ、その加速度が２５ｍｍ／ｓｅｃ２であり、基板の搬送速度が９０ｍｍ／ｓｅｃである。この条件からは、５０μｍのずれを補正するためには、アライメントマーク１３の中心と表示領域１１との距離が６．３ｍｍ必要といえる。但し、例えば基板の搬送速度は９０ｍｍ／ｓｅｃに限られず、５０ｍｍ／ｓｅｃ～２００ｍｍ／ｓｅｃが一般的な範囲である。これらのことから、アライメントマーク１３の中心と表示領域１１との距離の下限は、５ｍｍ以上であることが好ましく、８ｍｍ以上であることがより好ましい。アライメントマーク１３の中心と表示領域１１との距離の上限は、２０ｍｍ以下であることが好ましい。また、アライメントマーク１３は、認識率を向上させる観点から、額縁領域内の配線と表示領域との間の領域に配置されていることが好ましい。 Further, the amount of deviation when reading the alignment mark 13 (the amount that needs to be corrected at that time) is about 50 μm at the maximum. On the other hand, the operation status of a general apparatus is, for example, that the maximum moving speed of the mask during alignment is 1 mm / sec, the acceleration is 25 mm / sec 2 , and the substrate transport speed is 90 mm / sec. From this condition, it can be said that the distance between the center of the alignment mark 13 and the display area 11 is 6.3 mm in order to correct the deviation of 50 μm. However, for example, the substrate conveyance speed is not limited to 90 mm / sec, and a general range is 50 mm / sec to 200 mm / sec. For these reasons, the lower limit of the distance between the center of the alignment mark 13 and the display region 11 is preferably 5 mm or more, and more preferably 8 mm or more. The upper limit of the distance between the center of the alignment mark 13 and the display area 11 is preferably 20 mm or less. Moreover, it is preferable that the alignment mark 13 is arrange | positioned in the area | region between the wiring in a frame area | region, and a display area from a viewpoint of improving a recognition rate.
アライメントマーク１３の寸法は特に限定されない。アライメントマーク１３の幅は、１０μｍ以上であることが好ましく、また、５０μｍ以下であることが好ましい。アライメントマーク１３の基板搬送方向の長さは、１５０μｍ以上であることが好ましく、５００μｍ以上であることがより好ましく、また、１０ｍｍ以下であることが好ましい。露光機にアライメントマーク１３を認識させる観点からは、アライメントマーク１３の基板搬送方向における長さは、通常１ｍｍ以下でよい。 The dimension of the alignment mark 13 is not particularly limited. The width of the alignment mark 13 is preferably 10 μm or more, and preferably 50 μm or less. The length of the alignment mark 13 in the substrate transport direction is preferably 150 μm or more, more preferably 500 μm or more, and preferably 10 mm or less. From the viewpoint of causing the exposure machine to recognize the alignment mark 13, the length of the alignment mark 13 in the substrate transport direction is usually 1 mm or less.
図３は、実施形態１に係る表示パネル用基板に形成されたアライメントマークと、アレイ基板に対応する表示領域の端部とを拡大して示した平面模式図である。図３に示すように、露光されるマザーガラス基板がアレイ基板を製造するためのものであれば、幅１５μｍ、長さ５００μｍ程度の矩形パターンを、アレイ基板に対応する表示領域１１から２ｍｍ～５０ｍｍ離れた位置に、アライメントマーク１３として形成する。矩形パターン１３は、単純な形状であることから、撮像装置が認識し損なう可能性が少ない点で有利である。矩形パターン１３は、ソース信号線１５と同一工程で形成され、ソース信号線１５と同じ材料からなる。 FIG. 3 is an enlarged schematic plan view showing the alignment marks formed on the display panel substrate according to the first embodiment and the end of the display area corresponding to the array substrate. As shown in FIG. 3, if the mother glass substrate to be exposed is for manufacturing an array substrate, a rectangular pattern having a width of about 15 μm and a length of about 500 μm is formed 2 mm to 50 mm from the display area 11 corresponding to the array substrate. The alignment mark 13 is formed at a distant position. Since the rectangular pattern 13 has a simple shape, it is advantageous in that it is less likely to be recognized by the imaging apparatus. The rectangular pattern 13 is formed in the same process as the source signal line 15 and is made of the same material as the source signal line 15.
ソース信号線１５は、２本を１組として配置されており、矩形パターン１３は、その中心線が、表示領域１１に形成された１組のソース信号線１５の中心線と一致する位置に形成される。矩形パターン１３と１組のソース信号線１５の中心線とが一致していることにより、撮像装置が１組のソース信号線１５を捕捉し損なうことが防止されている。撮像装置は、表示領域１１内では１組のソース信号線１５を追従用のパターン（アライメントパターン）とし、これによって表示領域１１内の全体に対して正確な露光が行われる。 The two source signal lines 15 are arranged as one set, and the rectangular pattern 13 is formed at a position where the center line coincides with the center line of the one set of source signal lines 15 formed in the display region 11. Is done. Since the rectangular pattern 13 and the center line of the set of source signal lines 15 coincide with each other, the imaging device is prevented from failing to capture the set of source signal lines 15. The imaging apparatus uses a set of source signal lines 15 as a follow-up pattern (alignment pattern) in the display area 11, whereby accurate exposure is performed on the entire display area 11.
また、露光されるマザーガラス基板がカラーフィルタ基板を製造するためのものであれば、幅１５μｍ、長さ５００μｍ程度の矩形パターンを、カラーフィルタ基板に対応する表示領域１１から２ｍｍ～５０ｍｍ離れた位置に、アライメントマーク１３として形成する。この矩形パターン１３は、ブラックマトリックスと同一工程で形成され、その中心線が、表示領域１１に形成されたブラックマトリックスの中心線と一致する位置に形成される。撮像装置は、表示領域１１内ではブラックマトリックスを追従用のパターン（アライメントパターン）とし、これによって表示領域１１内の全体に対して正確な露光が行われる。 If the mother glass substrate to be exposed is for manufacturing a color filter substrate, a rectangular pattern having a width of about 15 μm and a length of about 500 μm is positioned 2 mm to 50 mm away from the display area 11 corresponding to the color filter substrate. The alignment mark 13 is formed. The rectangular pattern 13 is formed in the same process as the black matrix, and its center line is formed at a position that coincides with the center line of the black matrix formed in the display area 11. The imaging apparatus uses a black matrix as a follow-up pattern (alignment pattern) in the display area 11, whereby accurate exposure is performed on the entire display area 11.
以上のように、本実施形態に係る表示パネル用基板では、ソース信号線１５又はブラックマトリックスを形成する工程において、併せてアライメントマーク１３を形成することができる。したがって、アライメントマーク１３を形成するための特別の工程を追加する必要がなく、基板製造のコスト及び時間の増加を招くこともない。 As described above, in the display panel substrate according to the present embodiment, the alignment mark 13 can be formed together in the step of forming the source signal line 15 or the black matrix. Therefore, it is not necessary to add a special process for forming the alignment mark 13, and the cost and time for manufacturing the substrate are not increased.
図４は、実施形態１に係る露光方法において、表示パネル用基板の向きとフォトマスクに設けられた透光部の中心線とを平行に調整する前の状態を示す平面模式図である。図４に示したように、基板１０が、その搬送方向（図４中の矢印参照）に対して傾いており、かつフォトマスク５０のスリット状の透光部の中心線と平行になっていない状態では、基板１０に設けられた絵素の配列方向に沿って表示領域１１を露光することができない。基板の搬送方向の長さが２４６０ｍｍであれば、基板の前端と後端との間で実際上２５０μｍ程度の位置ずれが生じることがあるのに対し、追従用パターン（アライメントパターン）が所定の位置から５μｍ以上ずれてしまうと、認識することが困難となってしまう。 FIG. 4 is a schematic plan view showing a state before adjusting the orientation of the display panel substrate and the center line of the translucent portion provided on the photomask in the exposure method according to the first embodiment. As shown in FIG. 4, the substrate 10 is inclined with respect to the transport direction (see the arrow in FIG. 4), and is not parallel to the center line of the slit-like light transmitting portion of the photomask 50. In the state, the display area 11 cannot be exposed along the arrangement direction of the picture elements provided on the substrate 10. If the length of the substrate in the conveyance direction is 2460 mm, a positional deviation of about 250 μm may actually occur between the front end and the rear end of the substrate, whereas the follow-up pattern (alignment pattern) has a predetermined position. If it deviates 5 μm or more from the distance, it becomes difficult to recognize.
これに対して、本実施形態では、基板１０の表示領域１１がフォトマスクの下に到達する前に、表示領域１１よりも２ｍｍ～５０ｍｍフォトマスク５０側に位置するアライメントマーク１３の位置及び向きを確認する。そして、その確認結果に基づき、基板１０の搬送を止めることなく、基板１０の搬送方向とフォトマスク５０のスリット状の透光部の中心線とが所望の角度（例えば、平行）となるように、基板１０及びフォトマスク５０の少なくとも一方の位置及び角度を調整する。これにより、所定の位置から所定の方向に向けて正確に露光を開始することができることから、基板の露光開始位置である表示領域１１の端部においても精度よく露光ができる。 On the other hand, in this embodiment, before the display area 11 of the substrate 10 reaches under the photomask, the position and orientation of the alignment mark 13 positioned on the photomask 50 side from the display area 11 by 2 mm to 50 mm are determined. Check. Then, based on the confirmation result, the conveyance direction of the substrate 10 and the center line of the slit-like light transmitting portion of the photomask 50 are at a desired angle (for example, parallel) without stopping the conveyance of the substrate 10. The position and angle of at least one of the substrate 10 and the photomask 50 are adjusted. Thus, since exposure can be accurately started from a predetermined position in a predetermined direction, exposure can be performed with high accuracy even at the end of the display area 11 that is the exposure start position of the substrate.
図５は、実施形態１に係る露光機の要部の構成を概念的に示した側方図である。露光機は、基板１０に紫外線を照射する露光ユニット５１と、基板１０を載置して移動させるためのステージ５５とを備える。 FIG. 5 is a side view conceptually showing the structure of the main part of the exposure apparatus according to the first embodiment. The exposure machine includes an exposure unit 51 that irradiates the substrate 10 with ultraviolet rays, and a stage 55 for placing and moving the substrate 10.
露光ユニット５１は、紫外線を発する紫外線光源を備え、マスク５０を介して基板１０の表面に対して所定の照射角で紫外線を照射できるように構成される。光源は、照射対象に応じて適宜選択すればよく、可視光線を発する光源であってもよい。 The exposure unit 51 includes an ultraviolet light source that emits ultraviolet light, and is configured to irradiate the surface of the substrate 10 with ultraviolet light at a predetermined irradiation angle via the mask 50. What is necessary is just to select a light source suitably according to irradiation object, and the light source which emits visible light may be sufficient.
また、各露光ユニット５１は、撮像手段５３と、記憶手段と、照合手段と、マスク移動手段とを備える。撮像手段５３は、基板１０の表面を撮影できる。例えばＣＣＤカメラ等が適用できる。記憶手段は、露光の位置合わせの基準となる基準画像を記憶しておくことができる。照合手段は、撮像手段５３が撮影した画像と基準画像とを比較照合して、実際に露光している位置と露光すべき位置とのズレを算出する。マスク移動手段は、照合手段によるズレの算出結果に基づいて、マスク５０の位置及び／又は角度を補正する。なお、照合手段は、基準画像を用いる代わりに、基板１０を撮像した結果とマスク５０を撮像した結果とを比較照合する方法によっても、同様にマスク５０の位置及び／又は角度を補正することができる。 Each exposure unit 51 includes an imaging unit 53, a storage unit, a collation unit, and a mask moving unit. The imaging unit 53 can photograph the surface of the substrate 10. For example, a CCD camera or the like can be applied. The storage means can store a reference image serving as a reference for exposure alignment. The collating unit compares and collates the image captured by the image capturing unit 53 with the reference image, and calculates a difference between the actual exposure position and the position to be exposed. The mask moving unit corrects the position and / or angle of the mask 50 based on the shift calculation result by the collating unit. Note that the collating means can similarly correct the position and / or angle of the mask 50 by a method of comparing and collating the result of imaging the substrate 10 and the result of imaging the mask 50 instead of using the reference image. it can.
マスク５０は、例えば板状の部材であり、所定の箇所に所定の寸法形状の透光部が設けられる。したがって、基板１０が搬送されてマスク５０の直下を通過すると、マスク５０の透光部の直下を通過した領域のみが露光される。この結果、基板１０の表面の所定の細長い線状の領域が露光される。透光部としては、光（本実施形態では紫外線）を透過することができれば特に限定されず、例えば、マスクに設けた開口であってもよいし、透明な膜が形成された部分であってもよい。 The mask 50 is, for example, a plate-like member, and a light-transmitting portion having a predetermined dimension is provided at a predetermined location. Therefore, when the substrate 10 is transported and passes directly under the mask 50, only the region that has passed directly under the light transmitting portion of the mask 50 is exposed. As a result, a predetermined elongated linear area on the surface of the substrate 10 is exposed. The light transmitting portion is not particularly limited as long as it can transmit light (ultraviolet rays in the present embodiment). For example, the light transmitting portion may be an opening provided in a mask or a portion where a transparent film is formed. Also good.
また、図１に示したように、露光機は、複数のマスク５０（言い換えれば、露光ユニット５１）を備える。そして、露光ユニット５１が基板１０の進行方向に対して垂直に並べられる。これにより、基板１０の全幅に亘って１回の走査で露光できる。なお、各露光ユニット５１は、それぞれ独立して上記の動作を行うことができる。 Further, as shown in FIG. 1, the exposure apparatus includes a plurality of masks 50 (in other words, exposure units 51). Then, the exposure units 51 are arranged perpendicular to the traveling direction of the substrate 10. Thereby, it can expose by one scan over the full width of the board | substrate 10. FIG. Each exposure unit 51 can perform the above operation independently.
次に、露光機を用いて、本実施形態に係る基板に対し、本発明の実施形態に係る露光方法を実施する動作について説明する。 Next, an operation of performing the exposure method according to the embodiment of the present invention on the substrate according to the embodiment using an exposure machine will be described.
まず、ステージ５５上に基板１０を載置する。このとき、アライメントマーク１３が、ステージ５５による基板１０の進行方向（図１中の矢印が指す方向）の最も前方に位置するように、基板１０を置く。 First, the substrate 10 is placed on the stage 55. At this time, the substrate 10 is placed so that the alignment mark 13 is positioned at the forefront in the direction of travel of the substrate 10 by the stage 55 (the direction indicated by the arrow in FIG. 1).
ステージ５５による基板１０の搬送が開始されると、まず基板１０の表面に形成されたアライメントマーク１３が各露光ユニット５１の撮像手段５３の視野に入り、撮像手段５３はこれを撮影する。照合手段は、撮像手段５３が撮影したアライメントマーク１３の画像と、記憶手段が記憶している基準画像とを比較照合し、露光すべき位置と、実際に露光している位置とのズレを算出する。そして補正手段は、この算出結果に基づいて、マスク５０の位置（特に、基板１０の進行方向に対して直角方向の位置）や角度（特に、基板１０の進行方向に対する角度）を補正する。 When the conveyance of the substrate 10 by the stage 55 is started, first, the alignment mark 13 formed on the surface of the substrate 10 enters the field of view of the imaging means 53 of each exposure unit 51, and the imaging means 53 takes an image thereof. The collating unit compares and collates the image of the alignment mark 13 photographed by the imaging unit 53 with the reference image stored in the storage unit, and calculates a deviation between the position to be exposed and the actually exposed position. To do. The correcting means corrects the position of the mask 50 (particularly, the position perpendicular to the traveling direction of the substrate 10) and the angle (particularly the angle relative to the traveling direction of the substrate 10) based on the calculation result.
アライメントマーク１３の中心線は、表示領域１１に形成される１組のソース信号線１５又はブラックマトリックスの中心線と一致している（図３参照）。したがって、アライメントマーク１３を用いてマスク５０の位置や角度が補正されると、表示領域１１に形成される１組のソース信号線１５又はブラックマトリックスを撮影して補正をしたのと同じ効果が得られる。なお、１組のソース信号線１５又はブラックマトリックスは、表示領域１１の露光時に撮像手段の撮影対象とされるアライメントパターンとして用いられる。 The center line of the alignment mark 13 coincides with the set of source signal lines 15 or black matrix center lines formed in the display region 11 (see FIG. 3). Therefore, when the position and angle of the mask 50 are corrected using the alignment mark 13, the same effect as that obtained by photographing and correcting a set of source signal lines 15 or black matrix formed in the display region 11 is obtained. It is done. The set of source signal lines 15 or the black matrix is used as an alignment pattern to be imaged by the imaging unit when the display area 11 is exposed.
アライメントマーク１３が撮像手段５３によって撮影可能な位置に達した時点においては、基板１０の表示領域１１は、マスク５０の直下には達していない。すなわち、まだ露光が開始されない。したがって、アライメントマーク１３を用いた補正によってマスク５０が大きく移動したとしても、表示領域１１に対する露光には何らの影響を及ぼさない。 When the alignment mark 13 reaches a position where it can be imaged by the imaging means 53, the display area 11 of the substrate 10 does not reach directly below the mask 50. That is, the exposure is not yet started. Therefore, even if the mask 50 is largely moved by the correction using the alignment mark 13, the exposure on the display area 11 is not affected at all.
基板１０がさらに進行すると、基板１０の表示領域１１が撮像手段５３の視野に入る。そうすると、撮像手段５３は表示領域１１に形成されるアライメントパターンを撮影できるようになり、このアライメントパターンに基づいてマスク５０の位置及び角度の補正が行われる。また、それとほぼ同時に、基板１０の表示領域１１が露光される位置に達する。上記のとおり、基板１０がこの位置に達するまでに、アライメントマーク１３によるマスク５０の位置及び角度の補正が行われている。したがって、この位置に達した時点では、マスク５０の位置及び角度が大きく変化することがない。この結果、表示領域１１に対する露光の開始位置の近傍において、露光位置の精度の向上を図ることができ、露光ムラの発生を防止できる。 As the substrate 10 further advances, the display area 11 of the substrate 10 enters the field of view of the imaging means 53. Then, the imaging unit 53 can photograph the alignment pattern formed in the display area 11, and the position and angle of the mask 50 are corrected based on the alignment pattern. At almost the same time, the display area 11 of the substrate 10 reaches a position where it is exposed. As described above, the position and angle of the mask 50 are corrected by the alignment mark 13 until the substrate 10 reaches this position. Therefore, when this position is reached, the position and angle of the mask 50 do not change significantly. As a result, it is possible to improve the accuracy of the exposure position in the vicinity of the exposure start position with respect to the display area 11, and to prevent the occurrence of exposure unevenness.
以降、基板１０を搬送しつつ、表示領域１１に形成されたアライメントパターンの撮影、撮影した画像と基準画像との比較照合による露光位置のズレの算出、及び、算出結果に基づいたマスク５０の位置及び角度の補正を継続的に行う。その結果、基板１０の１回の搬送によって、所定の線状の箇所に露光を施すことができる。 Thereafter, while the substrate 10 is being transported, the alignment pattern formed in the display region 11 is imaged, the exposure position shift is calculated by comparing and comparing the captured image and the reference image, and the position of the mask 50 based on the calculation result In addition, the angle correction is continuously performed. As a result, it is possible to expose a predetermined linear portion by carrying the substrate 10 once.
このように本実施形態に係る露光方法は、表示領域１１に対して露光を開始する前に、あらかじめ表示領域１１の外側に形成されるアライメントマーク１３を用いてマスク５０の位置及び角度を補正する。 As described above, the exposure method according to the present embodiment corrects the position and angle of the mask 50 using the alignment mark 13 formed in advance outside the display area 11 before the exposure to the display area 11 is started. .
このような動作を実現するため、基板１０のアライメントマーク１３は、基板１０をステージ５５上に載置して搬送した際に、露光ユニット５１の撮像手段５３が撮影できる位置に形成される。また、基板１０に形成されるアライメントマーク１３の数は、露光機が備える露光ユニット５１の数に等しい数とされる。 In order to realize such an operation, the alignment mark 13 of the substrate 10 is formed at a position where the imaging means 53 of the exposure unit 51 can take an image when the substrate 10 is placed on the stage 55 and conveyed. The number of alignment marks 13 formed on the substrate 10 is equal to the number of exposure units 51 provided in the exposure machine.
本実施形態に係る露光方法は、光配向処理を施す工程に適用されるものである。光配向処理は、さまざまな表示モードの液晶表示パネルに適用できるものであるが、なかでも、ねじれネマチック垂直配向（Vertical Alignment Twisted Nematic（ＶＡＴＮ））モードの液晶表示パネルに好適である。以下では、図６～８を参照して、本実施形態に係る露光方法によりＶＡＴＮモードの液晶表示パネルを作製する方法を説明する。なお、図６～８では、説明の便宜上、表示領域１１に形成されたパターンを図３に示したパターンよりも簡略化している。 The exposure method according to this embodiment is applied to a step of performing a photo-alignment process. The photo-alignment treatment can be applied to liquid crystal display panels of various display modes, and is particularly suitable for a liquid crystal display panel of a twisted nematic vertical alignment (vertical alignment twisted nematic (VATN)) mode. Hereinafter, a method of manufacturing a VATN mode liquid crystal display panel by the exposure method according to the present embodiment will be described with reference to FIGS. 6 to 8, the pattern formed in the display area 11 is simplified from the pattern shown in FIG. 3 for convenience of explanation.
図６は、実施形態１に係る露光方法を用いたアレイ基板に対する光配向処理を模式的に示した図である。本実施形態に適用される絵素の構造は特に限定されるものではない。ここでは、ソース信号線１９とゲート信号線１７に囲まれる領域に絵素電極２１が形成され、薄膜トランジスタにより絵素の駆動を制御するという、一般的な構成の絵素を例に用いて説明する。アレイ基板については、図６に示すように、各絵素内にその両側のソース信号線１９の略中間（図中の線Ａ）で二分されて形成される２つの領域を想定する。そしてそれぞれの領域に対して、絵素の面の法線に対して所定の角度θだけ傾斜した方向から紫外線を照射する。各領域に対する紫外線の照射の向きは、それぞれ照射される紫外線の光軸を絵素の面に投影した場合に、これらの投影した光軸がソース信号線１９に平行でかつ互いに１８０°異なる向きとする。 FIG. 6 is a diagram schematically showing a photo-alignment process for the array substrate using the exposure method according to the first embodiment. The structure of the picture element applied to this embodiment is not particularly limited. Here, a pixel element 21 is formed in a region surrounded by the source signal line 19 and the gate signal line 17, and a pixel having a general configuration in which driving of the pixel is controlled by a thin film transistor will be described as an example. . For the array substrate, as shown in FIG. 6, two regions are assumed to be formed by being divided into approximately halfway between the source signal lines 19 on both sides (line A in the drawing) in each picture element. Then, each region is irradiated with ultraviolet rays from a direction inclined by a predetermined angle θ with respect to the normal of the surface of the picture element. The direction of the irradiation of ultraviolet rays with respect to each region is such that, when the optical axes of the irradiated ultraviolet rays are projected onto the surface of the picture element, the projected optical axes are parallel to the source signal lines 19 and differ from each other by 180 °. To do.
図７は、実施形態１に係る露光方法を用いたカラーフィルタ基板に対する光配向処理を模式的に示した図である。図７に示すように、カラーフィルタ基板には、ブラックマトリックス２３が格子状に形成され、格子により区分された各絵素内にカラーフィルタ層が形成される。カラーフィルタ基板については、アレイ基板と貼り合わせた際にアレイ基板のゲート信号線１７に平行となる、絵素の境界を構成する２辺の略中間（図中の線Ｂ）で二分されて形成される２つの領域を想定する。そしてそれぞれの領域に対して、絵素の面の法線に対して所定の角度θだけ傾斜した方向から紫外線を照射する。各領域に対する紫外線の照射の向きは、それぞれ照射される紫外線の光軸を絵素の面に投影した場合に、これらの投影した光軸が、アレイ基板のゲート信号線１７に平行でかつ互いに１８０°異なる向きとする。 FIG. 7 is a diagram schematically showing a photo-alignment process for the color filter substrate using the exposure method according to the first embodiment. As shown in FIG. 7, on the color filter substrate, a black matrix 23 is formed in a lattice shape, and a color filter layer is formed in each picture element divided by the lattice. The color filter substrate is formed by being divided into two substantially at the middle (line B in the figure) of the two sides constituting the boundary of the picture element, which is parallel to the gate signal line 17 of the array substrate when bonded to the array substrate. Assume two regions to be used. Then, each region is irradiated with ultraviolet rays from a direction inclined by a predetermined angle θ with respect to the normal of the surface of the picture element. The direction of the irradiation of ultraviolet rays with respect to each region is such that, when the optical axes of the irradiated ultraviolet rays are projected onto the surface of the picture element, the projected optical axes are parallel to the gate signal lines 17 of the array substrate and 180 to each other. ° Different orientation.
図８は、図６に示したアレイ基板と図７に示したカラーフィルタ基板とを貼り合わせて構成した液晶表示パネルについて、各絵素内における液晶分子の配向方向を模式的に示した図である。上記のように配向処理が施された基板どうしを貼り合わせて液晶表示パネルを構成すると、図８に示すように、両基板の間に充填される液晶分子は、各基板の各領域に施された配向処理の向き、すなわち紫外線の照射方向にしたがって配向する。その結果、各絵素内には、液晶分子の配向の向きが互いに異なる複数のドメイン領域が形成される。図８中の矢印は、両基板面から等距離に位置する液晶分子の配向の向きを示している。 FIG. 8 is a diagram schematically showing the orientation direction of the liquid crystal molecules in each pixel for the liquid crystal display panel formed by bonding the array substrate shown in FIG. 6 and the color filter substrate shown in FIG. is there. When the liquid crystal display panel is configured by bonding the substrates subjected to the alignment treatment as described above, the liquid crystal molecules filled between the two substrates are applied to each region of each substrate as shown in FIG. Alignment is performed according to the direction of the alignment treatment, that is, the irradiation direction of ultraviolet rays. As a result, a plurality of domain regions having different orientation directions of liquid crystal molecules are formed in each picture element. The arrows in FIG. 8 indicate the orientation directions of the liquid crystal molecules located at the same distance from both substrate surfaces.
図９は、実施形態１に係る露光方法に用いられるアレイ基板用フォトマスクの構成を示した平面模式図である。図１０は、図９のフォトマスクとアレイ基板に形成されたパターンとの寸法及び位置の関係を示した図である。なお、図１０では、説明の便宜上、表示領域１１に形成されたパターンを図３に示したパターンよりも簡略化している。 FIG. 9 is a schematic plan view showing the configuration of an array substrate photomask used in the exposure method according to the first embodiment. FIG. 10 is a diagram showing the relationship between the size and position of the photomask of FIG. 9 and the pattern formed on the array substrate. In FIG. 10, for convenience of explanation, the pattern formed in the display area 11 is simplified from the pattern shown in FIG.
図９に示すように、アレイ基板用フォトマスク６０は、略長方形の板状の部材である。そして紫外線が通過できるスリット状の透光部６１が、所定のピッチＰｘで複数平行に形成されている。ピッチＰｘは、図１０に示すように、アレイ基板に形成されるソース信号線１９のピッチに等しく設定される。また、透光部６１の幅（短い側の寸法）Ｌｘは、ソース信号線１９のピッチの約１／２の寸法に設定される。 As shown in FIG. 9, the array substrate photomask 60 is a substantially rectangular plate-shaped member. A plurality of slit-like translucent portions 61 through which ultraviolet rays can pass are formed in parallel at a predetermined pitch Px. As shown in FIG. 10, the pitch Px is set equal to the pitch of the source signal lines 19 formed on the array substrate. Further, the width (dimension on the short side) Lx of the translucent portion 61 is set to a dimension that is approximately ½ of the pitch of the source signal lines 19.
図１１は、実施形態１に係る露光方法に用いられるカラーフィルタ基板用フォトマスクと、カラーフィルタ基板に形成されたパターンとの寸法及び位置の関係を示した図である。 FIG. 11 is a diagram showing the relationship between the dimensions and positions of the color filter substrate photomask used in the exposure method according to the first embodiment and the pattern formed on the color filter substrate.
カラーフィルタ基板用フォトマスク７０は、アレイ基板用フォトマスク６０とほぼ同一の構成を備える（図９参照）。すなわち、紫外線が通過できるスリット状の透光部７１が、所定のピッチＰｙで複数平行に形成される。ピッチＰｙは、カラーフィルタ基板に形成されたブラックマトリックス２３のピッチ（ここでは、アレイ基板と重ね合わせた場合に、アレイ基板のゲート信号線１７に平行する辺のピッチ）と等しくなるように設定される。また、透光部７１の幅（短い側の寸法）Ｌｙは、ブラックマトリックス２３のピッチの約１／２の寸法に設定される。 The color filter substrate photomask 70 has substantially the same configuration as the array substrate photomask 60 (see FIG. 9). That is, a plurality of slit-like light transmitting portions 71 through which ultraviolet rays can pass are formed in parallel at a predetermined pitch Py. The pitch Py is set to be equal to the pitch of the black matrix 23 formed on the color filter substrate (here, the pitch of the side parallel to the gate signal line 17 of the array substrate when superimposed on the array substrate). The Further, the width (dimension on the short side) Ly of the translucent part 71 is set to a dimension that is about ½ of the pitch of the black matrix 23.
このようなマスク６０、７０を用い、上述した露光方法によって、各基板を露光すると、各基板とも、各絵素の半分の領域が、基板の一回の移動により露光される。その後、露光位置を透光部の半ピッチ分ずらし、紫外線の照射の角度を変えて残りの半分の領域について露光する。この結果、各絵素の半分ずつの領域が互いに異なる方向に配向処理される。 When each substrate is exposed by the above-described exposure method using such masks 60, 70, half of each pixel is exposed by one movement of the substrate. After that, the exposure position is shifted by a half pitch of the translucent part, and the angle of ultraviolet irradiation is changed to expose the remaining half region. As a result, the half of each picture element is oriented in different directions.
実施形態２
本実施形態は、表示パネル用基板の額縁領域に配置されるアライメントマークの別の一例を示すものである。図１２は、実施形態２に係る表示パネル用基板に形成されたアライメントマークを拡大して示した平面模式図である。図１２に示すように、本実施形態では、面状に配置された部材に、幅（Ｗ）１５μｍ、長さ（Ｌ）５００μｍ程度のスリット状の切欠き部（抜き部）が設けられ、この切欠き部がアライメントマークとして用いられる。上記面状に配置された部材としては、アレイ基板に対応する表示領域から２ｍｍ～５０ｍｍ離れた位置に設けられる場合であれば、ソース信号線と同一工程で形成される金属部材が用いられ、カラーフィルタ基板に対応する表示領域から２ｍｍ～５０ｍｍ離れた位置に設けられる場合であれば、ブラックマトリックスと同一工程で形成される遮光部材が用いられる。切欠き部の中心線は、表示領域に形成されたソース信号線又はブラックマトリックスの中心線と一致する位置に形成される。 Embodiment 2
The present embodiment shows another example of alignment marks arranged in the frame region of the display panel substrate. FIG. 12 is an enlarged schematic plan view showing alignment marks formed on the display panel substrate according to the second embodiment. As shown in FIG. 12, in the present embodiment, a slit-shaped notch (extracted portion) having a width (W) of 15 μm and a length (L) of about 500 μm is provided in the planarly arranged member. The notch is used as an alignment mark. As the member arranged in a planar shape, a metal member formed in the same process as the source signal line is used if it is provided at a position 2 to 50 mm away from the display area corresponding to the array substrate. In the case where it is provided at a position 2 mm to 50 mm away from the display area corresponding to the filter substrate, a light shielding member formed in the same process as the black matrix is used. The center line of the notch is formed at a position that coincides with the center line of the source signal line or black matrix formed in the display area.
実施形態３
本実施形態は、表示パネル用基板の額縁領域に配置されるアライメントマークの別の一例を示すものである。図１３は、実施形態３に係る表示パネル用基板に形成されたアライメントマークを拡大して示した平面模式図である。図１３に示すように、本実施形態では、アライメントマークは、Ｈ字形状を有しており、幅（Ｗ）１５μｍ、長さ（Ｌ）５００μｍ程度の直線部の上端及び下端にそれぞれ、左右方向に伸びる直線部が、直角となるように、その中点で接続されている。アレイ基板に対応する表示領域から２ｍｍ～５０ｍｍ離れた位置に設けられる場合であれば、ソース信号線と同一工程で形成される金属部材が用いられ、カラーフィルタ基板に対応する表示領域から２ｍｍ～５０ｍｍ離れた位置に設けられる場合であれば、ブラックマトリックスと同一工程で形成される遮光部材が用いられる。アライメントマークの中心線は、表示領域に形成されたソース信号線又はブラックマトリックスの中心線と一致する位置に形成される。Ｈ字形状のアライメントマークは、他のパターンとの混同を生じにくい点で有利である。 Embodiment 3
The present embodiment shows another example of alignment marks arranged in the frame region of the display panel substrate. FIG. 13 is an enlarged schematic plan view showing alignment marks formed on the display panel substrate according to the third embodiment. As shown in FIG. 13, in the present embodiment, the alignment mark has an H-shape, and the left and right directions are respectively provided at the upper end and the lower end of a linear portion having a width (W) of 15 μm and a length (L) of about 500 μm. The straight line portions extending in a straight line are connected at the midpoint so as to form a right angle. If it is provided at a position 2 mm to 50 mm away from the display area corresponding to the array substrate, a metal member formed in the same process as the source signal line is used, and 2 mm to 50 mm from the display area corresponding to the color filter substrate. If it is provided at a distant position, a light shielding member formed in the same process as the black matrix is used. The center line of the alignment mark is formed at a position that coincides with the center line of the source signal line or black matrix formed in the display area. The H-shaped alignment mark is advantageous in that it does not easily cause confusion with other patterns.
実施形態４
本実施形態は、表示パネル用基板の額縁領域に配置されるアライメントマークの別の一例を示すものである。図１４は、実施形態４に係る表示パネル用基板に形成されたアライメントマークを拡大して示した平面模式図である。図１４に示すように、本実施形態では、アライメントマークは、幅（Ｗ）１５μｍ、全長（Ｌ）５００μｍ程度の点線状のパターンである。アレイ基板に対応する表示領域から２ｍｍ～５０ｍｍ離れた位置に設けられる場合であれば、ソース信号線と同一工程で形成される金属部材が用いられ、カラーフィルタ基板に対応する表示領域から２ｍｍ～５０ｍｍ離れた位置に設けられる場合であれば、ブラックマトリックスと同一工程で形成される遮光部材が用いられる。アライメントマークの中心線は、表示領域に形成されたソース信号線又はブラックマトリックスの中心線と一致する位置に形成される。 Embodiment 4
The present embodiment shows another example of alignment marks arranged in the frame region of the display panel substrate. FIG. 14 is a schematic plan view showing an enlarged alignment mark formed on the display panel substrate according to the fourth embodiment. As shown in FIG. 14, in this embodiment, the alignment mark is a dotted line pattern having a width (W) of 15 μm and a total length (L) of about 500 μm. If it is provided at a position 2 mm to 50 mm away from the display area corresponding to the array substrate, a metal member formed in the same process as the source signal line is used, and 2 mm to 50 mm from the display area corresponding to the color filter substrate. If it is provided at a distant position, a light shielding member formed in the same process as the black matrix is used. The center line of the alignment mark is formed at a position that coincides with the center line of the source signal line or black matrix formed in the display area.
上述の各実施形態は、本発明の技術的思想を逸脱しない範囲でさまざまな変更が施されてもよく、例えば、特定の実施形態に記載された構成を他の実施形態に記載された構成により置き換えてもよいし、各実施形態同士を組み合わせてもよい。 Various modifications may be made to the above-described embodiments without departing from the technical idea of the present invention. For example, a configuration described in a specific embodiment may be changed according to a configuration described in another embodiment. You may replace and you may combine each embodiment.
上述の各実施形態では、アレイ基板については、基板をソース信号線の延伸方向に移動させつつ露光する構成を示したが、ゲート信号線の延伸方向に移動させつつ露光する構成であってもよい。この場合、アライメントマークが形成される位置を変更し、上記説明における「ゲート信号線」と「ソース信号線」とを読み替えればよい。 In each of the embodiments described above, the array substrate is exposed while moving the substrate in the extending direction of the source signal line. However, the array substrate may be exposed while moving in the extending direction of the gate signal line. . In this case, the position where the alignment mark is formed may be changed, and the “gate signal line” and the “source signal line” in the above description may be read.
上述の各実施形態では、光配向処理を施す工程を例示したが、本発明に係る表示パネル用基板、及び、その基板を用いた露光方法は、カラーフィルタ基板の作製、アレイ基板の作製に適用してもよい。それらの場合であっても、アライメントマークの配置に本発明を適用することで同様の効果を得ることができる。 In each of the above-described embodiments, the step of performing the photo-alignment process has been exemplified. However, the display panel substrate and the exposure method using the substrate according to the present invention are applied to the manufacture of a color filter substrate and the array substrate. May be. Even in those cases, the same effect can be obtained by applying the present invention to the arrangement of the alignment marks.
カラーフィルタ基板を作製する場合としては、例えば、ブラックマトリックスのパターンを形成するための露光、各色のカラーフィルタのパターンを形成するための露光が挙げられる。カラーフィルタの色は特に限定されず、赤色、緑色、青色の３色であってもよいし、赤色、緑色、青色、黄色の４色であってもよい。この場合、光の照射角度（θ）は特に限定されず、０°でよい。 Examples of producing a color filter substrate include exposure for forming a black matrix pattern and exposure for forming a color filter pattern of each color. The color of the color filter is not particularly limited, and may be three colors of red, green, and blue, or may be four colors of red, green, blue, and yellow. In this case, the light irradiation angle (θ) is not particularly limited, and may be 0 °.
アレイ基板を作製する場合としては、例えば、ゲート信号線、ソース信号線、絶縁膜等のパターンを形成するための露光が挙げられる。パターンの元になる各種薄膜の上にレジストを塗布し露光を行ってもよいし、パターンの元になる各種薄膜が感光性の材料であれば直接露光してもよい。また、配線等の形成においては、露光する光をパルス状に繰り返し照射することで直線以外の複雑なパターンを形成することも可能である。 In the case of producing an array substrate, for example, exposure for forming a pattern such as a gate signal line, a source signal line, and an insulating film can be mentioned. A resist may be applied on the various thin films that form the pattern and exposed, or if the various thin films that form the pattern are photosensitive materials, direct exposure may be performed. In formation of wiring and the like, it is also possible to form a complicated pattern other than a straight line by repeatedly irradiating light to be exposed in a pulse shape.
なお、本願は、２０１０年１２月３日に出願された日本国特許出願２０１０－２７０５６３号を基礎として、パリ条約ないし移行する国における法規に基づく優先権を主張するものである。該出願の内容は、その全体が本願中に参照として組み込まれている。 The present application claims priority based on the Paris Convention or the laws and regulations in the country to which the transition is based on Japanese Patent Application No. 2010-270563 filed on Dec. 3, 2010. The contents of the application are hereby incorporated by reference in their entirety.
１０　マザーガラス基板
１１　表示領域
１３　アライメントマーク（矩形パタ－ン）
１５　ソース信号線
１７　ゲート信号線
１９　ソース信号線
２１　絵素電極
２３　ブラックマトリックス
５０　マスク
５１　露光ユニット
５３　撮像手段
５５　ステージ
６０　アレイ基板用フォトマスク
６１　透光部
７０　カラーフィルタ基板用フォトマスク
７１　透光部
　 10 Mother glass substrate 11 Display area 13 Alignment mark (rectangular pattern)
15 Source signal line 17 Gate signal line 19 Source signal line 21 Picture element electrode 23 Black matrix 50 Mask 51 Exposure unit 53 Imaging unit 55 Stage 60 Photomask 61 for array substrate Translucent portion 70 Photomask 71 for color filter substrate Translucent portion

Claims (9)

  1. 複数の絵素が配列された表示領域と、前記表示領域に隣接する額縁領域とを有する表示パネル用基板であって、
    前記額縁領域内にアライメントマークを備え、
    前記アライメントマークの中心は、前記表示領域から２ｍｍ以上離れた位置にあることを特徴とする表示パネル用基板。     A display panel substrate having a display area in which a plurality of picture elements are arranged and a frame area adjacent to the display area,
    An alignment mark is provided in the frame area,
    The center of the alignment mark is at a position 2 mm or more away from the display area.
  2. 前記アライメントマークの中心は、前記表示領域から５０ｍｍ以内の位置にあることを特徴とする請求項１に記載の表示パネル用基板。 The display panel substrate according to claim 1, wherein the center of the alignment mark is at a position within 50 mm from the display area.
  3. 前記表示パネル用基板は、前記額縁領域内に配線を備え、
    前記アライメントマークは、前記配線と前記表示領域との間の領域に配置されていることを特徴とする請求項１又は２に記載の表示パネル用基板。     The display panel substrate includes a wiring in the frame region,
    The display panel substrate according to claim 1, wherein the alignment mark is arranged in a region between the wiring and the display region.
  4. 前記アライメントマークは、列状に伸びる遮光部材により形成されていることを特徴とする請求項１～３のいずれかに記載の表示パネル用基板。 4. The display panel substrate according to claim 1, wherein the alignment mark is formed of a light shielding member extending in a row.
  5. 前記アライメントマークは、表示領域内のアライメントパターンと平行に伸びていることを特徴とする請求項１～４のいずれかに記載の表示パネル用基板。 5. The display panel substrate according to claim 1, wherein the alignment mark extends in parallel with an alignment pattern in the display area.
  6. 前記アライメントマークは、表示領域内のアライメントパターンと平行な１５０μｍ以上の直線部分を有することを特徴とする請求項１～５のいずれかに記載の表示パネル用基板。 6. The display panel substrate according to claim 1, wherein the alignment mark has a straight line portion of 150 μm or more parallel to the alignment pattern in the display area.
  7. 前記アライメントマークは、表示領域内のアライメントパターンと平行に配置され、かつ点線状に配置されていることを特徴とする請求項１～３のいずれかに記載の表示パネル用基板。 The display panel substrate according to any one of claims 1 to 3, wherein the alignment mark is arranged in parallel with an alignment pattern in a display region and is arranged in a dotted line.
  8. 前記表示パネル用基板は、液晶表示パネルに用いられる基板であり、配向膜を備えることを特徴とする請求項１～７のいずれかに記載の表示パネル用基板。 The display panel substrate according to claim 1, wherein the display panel substrate is a substrate used for a liquid crystal display panel, and includes an alignment film.
  9. 光源、フォトマスク、ステージ及び撮像装置を備える露光機により、前記ステージ上に載置した請求項１～８のいずれかに記載の表示パネル用基板を走査露光する基板露光方法であって、
    前記走査露光は、前記表示パネル用基板及び前記フォトマスクの少なくとも一方を移動させつつ、前記フォトマスクに設けられた透光部を通じて、前記光源から放出された光を前記表示領域に照射するものであり、
    前記基板露光方法は、
    前記表示領域内を走査露光する前に、前記撮像装置によって前記アライメントマークの位置及び向きに関する情報を読み取り、
    前記フォトマスクが前記額縁領域から前記表示領域へ移動する間に、前記情報に基づいて前記フォトマスクの位置及び／又は向きを調整することを特徴とする基板露光方法。
    　     9. A substrate exposure method for scanning and exposing a display panel substrate according to claim 1 placed on the stage by an exposure machine comprising a light source, a photomask, a stage, and an imaging device,
    In the scanning exposure, at least one of the display panel substrate and the photomask is moved, and the display area is irradiated with light emitted from the light source through a light transmitting portion provided in the photomask. Yes,
    The substrate exposure method includes:
    Before scanning exposure in the display area, the information on the position and orientation of the alignment mark is read by the imaging device,
    A substrate exposure method, wherein the position and / or orientation of the photomask is adjusted based on the information while the photomask moves from the frame area to the display area.
PCT/JP2011/077156 2010-12-03 2011-11-25 Substrate for display panel and substrate exposure method WO2012073810A1 (en)

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