WO2012029809A3 - 形状測定装置および形状測定方法 - Google Patents

形状測定装置および形状測定方法 Download PDF

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Publication number
WO2012029809A3
WO2012029809A3 PCT/JP2011/069654 JP2011069654W WO2012029809A3 WO 2012029809 A3 WO2012029809 A3 WO 2012029809A3 JP 2011069654 W JP2011069654 W JP 2011069654W WO 2012029809 A3 WO2012029809 A3 WO 2012029809A3
Authority
WO
WIPO (PCT)
Prior art keywords
light
shape measurement
measured
reference comb
depth
Prior art date
Application number
PCT/JP2011/069654
Other languages
English (en)
French (fr)
Other versions
WO2012029809A2 (ja
Inventor
塩田達俊
Original Assignee
国立大学法人 長岡技術科学大学
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 国立大学法人 長岡技術科学大学 filed Critical 国立大学法人 長岡技術科学大学
Priority to US13/820,045 priority Critical patent/US20130342849A1/en
Priority to EP11821824.7A priority patent/EP2634558A2/en
Priority to JP2012531903A priority patent/JPWO2012029809A1/ja
Publication of WO2012029809A2 publication Critical patent/WO2012029809A2/ja
Publication of WO2012029809A3 publication Critical patent/WO2012029809A3/ja

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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/24Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02001Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02007Two or more frequencies or sources used for interferometric measurement
    • G01B9/02008Two or more frequencies or sources used for interferometric measurement by using a frequency comb
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/02015Interferometers characterised by the beam path configuration
    • G01B9/02027Two or more interferometric channels or interferometers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00Measuring instruments characterised by the use of optical techniques
    • G01B9/02Interferometers
    • G01B9/0209Low-coherence interferometers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/25Fabry-Perot in interferometer, e.g. etalon, cavity
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/958Inspecting transparent materials or objects, e.g. windscreens

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)

Abstract

 光源11と測定光照射系13と参照コム光分離器14と光合波器15と光検出器16とを備え、参照コム光分離器14は、広帯域光を入射し、当該広帯域光を、出射方向をZ軸方向としたときに結像点におけるY座標値の大きさに応じて周波数間隔が連続的に変化する参照コム光に分離し、X軸を測定対象の仮想の切断線とし、Y座標を深さとして、検出面に表れる干渉画像を測定対象の断層画像とする。これにより、出射方向をZ軸方向としたときに結像点におけるY座標値の大きさに応じて周波数間隔が(連続的に)変化する参照コム光を用いて、ダイナミックレンジが大きい深さ方向の一次元断層、または深さ方向の二次元断層を測定する。
PCT/JP2011/069654 2010-08-31 2011-08-30 形状測定装置および形状測定方法 WO2012029809A2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US13/820,045 US20130342849A1 (en) 2010-08-31 2011-08-30 Shape measurement device and shape measurement method
EP11821824.7A EP2634558A2 (en) 2010-08-31 2011-08-30 Shape measurement device and shape measurement method
JP2012531903A JPWO2012029809A1 (ja) 2010-08-31 2011-08-30 形状測定装置

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2010-193465 2010-08-31
JP2010193465 2010-08-31
JP2010197206 2010-09-03
JP2010-197206 2010-09-03

Publications (2)

Publication Number Publication Date
WO2012029809A2 WO2012029809A2 (ja) 2012-03-08
WO2012029809A3 true WO2012029809A3 (ja) 2012-05-10

Family

ID=45773333

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2011/069654 WO2012029809A2 (ja) 2010-08-31 2011-08-30 形状測定装置および形状測定方法

Country Status (4)

Country Link
US (1) US20130342849A1 (ja)
EP (1) EP2634558A2 (ja)
JP (1) JPWO2012029809A1 (ja)
WO (1) WO2012029809A2 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6820020B2 (ja) * 2016-03-02 2021-01-27 国立大学法人電気通信大学 形状測定方法及び形状測定装置
CN108759708B (zh) * 2018-03-15 2019-12-24 北京航空航天大学 一种对尖峰噪声免疫的高精度相干峰定位方法
CN113932729B (zh) * 2021-08-24 2024-02-09 西安空间无线电技术研究所 一种基于光频梳的太赫兹天线形面检测系统及方法

Citations (5)

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Publication number Priority date Publication date Assignee Title
JP2000342589A (ja) * 1999-06-07 2000-12-12 Olympus Optical Co Ltd 光断層診断装置
JP2006266861A (ja) * 2005-03-24 2006-10-05 Topcon Corp 光画像計測装置
JP2008157710A (ja) * 2006-12-22 2008-07-10 Naohiro Tanno 光コヒーレンストモグラフィー装置
JP2009541770A (ja) * 2006-06-23 2009-11-26 オプトポール テクノロジー スポルカ アクシジナ 調整システムを有する光周波数領域トモグラフィ用装置、光周波数領域トモグラフィ用装置の調整システム、および光周波数領域トモグラフィ用装置を調整する方法、および物体の画像化方法
JP2010038910A (ja) * 2008-07-07 2010-02-18 Canon Inc 光干渉断層法を用いる撮像装置及び撮像方法

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CH684212A5 (fr) * 1990-10-16 1994-07-29 Suisse Electronique Microtech Dispositif optique à interférométrie en lumière blanche.
US8605290B2 (en) * 2005-01-31 2013-12-10 Josh N Hogan Precision measuring system
US7379189B2 (en) * 2005-02-08 2008-05-27 Tokyo Electron Limited Temperature/thickness measuring apparatus, temperature/thickness measuring method, temperature/thickness measuring system, control system and control method
US7486405B2 (en) * 2006-05-01 2009-02-03 Hogan Josh N Optimized reference level generation
US8440952B2 (en) * 2008-11-18 2013-05-14 The Regents Of The University Of California Methods for optical amplified imaging using a two-dimensional spectral brush

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000342589A (ja) * 1999-06-07 2000-12-12 Olympus Optical Co Ltd 光断層診断装置
JP2006266861A (ja) * 2005-03-24 2006-10-05 Topcon Corp 光画像計測装置
JP2009541770A (ja) * 2006-06-23 2009-11-26 オプトポール テクノロジー スポルカ アクシジナ 調整システムを有する光周波数領域トモグラフィ用装置、光周波数領域トモグラフィ用装置の調整システム、および光周波数領域トモグラフィ用装置を調整する方法、および物体の画像化方法
JP2008157710A (ja) * 2006-12-22 2008-07-10 Naohiro Tanno 光コヒーレンストモグラフィー装置
JP2010038910A (ja) * 2008-07-07 2010-02-18 Canon Inc 光干渉断層法を用いる撮像装置及び撮像方法

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
KOHEI SUZUKI ET AL.: "VIPA ni yoru Kukan ni FSR Sosa sareta Hikari Shuhasu Comb no Hassei to Single Shot Ichi Keisoku System", 2010 NEN SHUKI DAI 71 KAI EXTENDED ABSTRACTS, vol. 14A, no. NK4, 30 August 2010 (2010-08-30), pages 03 - 040, XP008169978 *
QUINLAN S.G.F. ET AL.: "Simultaneous Optical Comb Frequency Stabilization and Super-Mode Noise Suppression of Harmonically Mode-Locked Semiconductor Ring Laser Using an Intracavity Etalon", IEEE PHOTONICS TECHNOLOGY LETTERS, vol. 17, no. 1, 1 January 2005 (2005-01-01), pages 199 - 201, XP011124097 *
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Also Published As

Publication number Publication date
US20130342849A1 (en) 2013-12-26
JPWO2012029809A1 (ja) 2013-10-31
EP2634558A2 (en) 2013-09-04
WO2012029809A2 (ja) 2012-03-08

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