WO2012023447A1 - Surface shape transfer resin sheet manufacturing method - Google Patents

Surface shape transfer resin sheet manufacturing method Download PDF

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Publication number
WO2012023447A1
WO2012023447A1 PCT/JP2011/067980 JP2011067980W WO2012023447A1 WO 2012023447 A1 WO2012023447 A1 WO 2012023447A1 JP 2011067980 W JP2011067980 W JP 2011067980W WO 2012023447 A1 WO2012023447 A1 WO 2012023447A1
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WO
WIPO (PCT)
Prior art keywords
resin sheet
roll
shape
resin
transfer
Prior art date
Application number
PCT/JP2011/067980
Other languages
French (fr)
Japanese (ja)
Inventor
豊博 濱松
麻貴 河村
Original Assignee
住友化学株式会社
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Filing date
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Publication of WO2012023447A1 publication Critical patent/WO2012023447A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/04Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C43/00Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
    • B29C43/22Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of indefinite length
    • B29C43/222Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of indefinite length characterised by the shape of the surface
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/03Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor characterised by the shape of the extruded material at extrusion
    • B29C48/07Flat, e.g. panels
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/03Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor characterised by the shape of the extruded material at extrusion
    • B29C48/07Flat, e.g. panels
    • B29C48/08Flat, e.g. panels flexible, e.g. films
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/25Component parts, details or accessories; Auxiliary operations
    • B29C48/88Thermal treatment of the stream of extruded material, e.g. cooling
    • B29C48/91Heating, e.g. for cross linking
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/25Component parts, details or accessories; Auxiliary operations
    • B29C48/88Thermal treatment of the stream of extruded material, e.g. cooling
    • B29C48/911Cooling
    • B29C48/9135Cooling of flat articles, e.g. using specially adapted supporting means
    • B29C48/914Cooling of flat articles, e.g. using specially adapted supporting means cooling drums
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/25Component parts, details or accessories; Auxiliary operations
    • B29C48/88Thermal treatment of the stream of extruded material, e.g. cooling
    • B29C48/911Cooling
    • B29C48/9135Cooling of flat articles, e.g. using specially adapted supporting means
    • B29C48/915Cooling of flat articles, e.g. using specially adapted supporting means with means for improving the adhesion to the supporting means
    • B29C48/9155Pressure rollers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/001Combinations of extrusion moulding with other shaping operations
    • B29C48/0011Combinations of extrusion moulding with other shaping operations combined with compression moulding
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/03Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor characterised by the shape of the extruded material at extrusion
    • B29C48/12Articles with an irregular circumference when viewed in cross-section, e.g. window profiles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C48/00Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor
    • B29C48/03Extrusion moulding, i.e. expressing the moulding material through a die or nozzle which imparts the desired form; Apparatus therefor characterised by the shape of the extruded material at extrusion
    • B29C48/13Articles with a cross-section varying in the longitudinal direction, e.g. corrugated pipes

Definitions

  • the present invention relates to a method for producing a surface shape transfer resin sheet that can be used for applications such as a light diffusion plate and an optical film.
  • the surface shape transfer resin sheet is a sheet obtained by continuously extruding a melt-kneaded resin from a die to form a resin sheet, and transferring the uneven shape of the transfer mold to the resin sheet.
  • a manufacturing method of the surface shape transfer resin sheet for example, a step of sandwiching a continuous resin sheet continuously extruded from a die between a first pressing roll and a second pressing roll, and a surface of the second pressing roll
  • a manufacturing method is proposed that includes a step of conveying the continuous resin sheet as it is, and a step of sandwiching the conveyed continuous resin sheet between a second pressing roll and a third pressing roll (for example, Patent Documents). 1).
  • a transfer mold is attached to the third pressing roll, and when the resin sheet is sandwiched between the second pressing roll and the third pressing roll, the uneven shape is transferred to the surface of the resin sheet.
  • the surface shape transfer resin sheet use as a light diffusing plate or an optical film incorporated in a backlight device of a liquid crystal display device is becoming widespread.
  • the uneven shape is not accurately transferred when the resin sheet is manufactured (that is, the transfer rate is not high)
  • the optical properties as designed can be imparted to the light diffusion plate and the optical film.
  • a method of increasing the temperature of the roll on which the transfer mold is mounted can be considered.
  • the fluidity of the resin sheet can be increased by the heat transmitted from the roll to the resin sheet, and the resin can be introduced into the tip of the groove portion of the transfer mold, so that an improvement in transfer rate can be expected.
  • the roll temperature is too high, a “winding phenomenon” in which the resin sheet sticks to the roll surface tends to occur.
  • a “tick mark” is formed on the surface of the resin sheet after the shape transfer.
  • the tack mark is a striped appearance defect attached to the surface of the resin sheet when peeling off from the transfer mold.
  • An object of the present invention is a surface shape transfer resin sheet that can accurately transfer a transfer mold to the surface of a resin sheet and that can suppress the occurrence of a winding phenomenon in a shape roll (a press roll provided with a transfer mold). It is to provide a manufacturing method.
  • the manufacturing method of the surface shape transfer resin sheet of the present invention for achieving the above object includes an extrusion process in which a resin is continuously extruded from a die in a heated and melted state to form a continuous resin sheet, and JIS K 6768 By pressing the surface of the transfer mold against the surface of the continuous resin sheet using a shape roll (Shaped roll) having a transfer mold having a surface with a wetting tension of 35 mN / m or less measured according to And a transfer step of transferring the shape of the transfer mold onto the surface of the continuous resin sheet.
  • a shape roll Shaped roll
  • a shape roll provided with a transfer mold in which an organic polysiloxane treatment is applied to the surface as the shape roll.
  • the shape The roll surface temperature is Tg ⁇ 30 (° C.) or more and Tg + 50 (° C.) or less, and the transport speed of the continuous resin sheet is 0.2 / T (m / min) or more and 50 / T (m / min) or less. It is preferable that the transfer step is performed under the condition that the surface temperature of the continuous resin sheet before contacting the shape roll is Tg + 50 (° C.) or more and Tg + 160 (° C.) or less.
  • the wetting tension of the surface of the transfer mold (the contact surface with the continuous resin sheet) is 35 mN / m or less, even if the temperature of the shape roll increases, Occurrence of the “wrapping phenomenon” in which the resin sheet is stuck to the transfer mold can be suppressed. Therefore, it becomes possible to raise the temperature of a shape roll and to improve the fluidity
  • FIG. 1 is a schematic side view of a liquid crystal display device on which a resin sheet according to an embodiment of the present invention is mounted.
  • FIG. 2 is a schematic perspective view of the liquid crystal display device shown in FIG.
  • FIG. 3 is a schematic perspective view of a light diffusing plate made of a resin sheet according to an embodiment of the present invention.
  • FIG. 4 is a schematic perspective view of an optical film made of a resin sheet according to an embodiment of the present invention.
  • FIG. 5 is an enlarged cross-sectional view of a main part of the lamp box showing a mounting state of the light diffusing plate and the optical film.
  • FIG. 6 is a schematic configuration diagram of a manufacturing apparatus used in the method for manufacturing a resin sheet according to one embodiment of the present invention.
  • FIG. 6 is a schematic configuration diagram of a manufacturing apparatus used in the method for manufacturing a resin sheet according to one embodiment of the present invention.
  • FIG. 7 is a schematic cross-sectional view of the intaglio transfer mold attached to the lower roll.
  • FIG. 8 is a schematic cross-sectional view showing a first modified example (substantially semicircular shape) of the intaglio transfer mold.
  • FIG. 9 is a schematic cross-sectional view showing a second modified example (substantially prism shape) of the intaglio transfer type.
  • FIG. 10 is a schematic configuration diagram showing a modification of the sheet manufacturing apparatus shown in FIG.
  • FIG. 11 is a diagram showing IR spectra of the transfer mold surfaces of Examples and Comparative Examples.
  • FIG. 1 is a schematic side view of a liquid crystal display device on which a resin sheet according to an embodiment of the present invention is mounted.
  • FIG. 2 is a schematic perspective view of the liquid crystal display device shown in FIG.
  • the liquid crystal display device 1 (liquid crystal television) is a so-called direct liquid crystal display device, and includes a backlight system 2, a liquid crystal panel 3 disposed in front of the backlight system 2, a backlight system 2, and a liquid crystal panel 3. And an optical film 4 disposed between the two.
  • the liquid crystal display device 1 is shown in a posture in which the front side (viewing side) of the liquid crystal display device 1 is directed upward in the drawing.
  • the scales of the constituent members such as the liquid crystal display device 1, the backlight system 2, and the liquid crystal panel 3 shown in the following drawings are set for convenience of explanation, and the scales of all the constituent members are the same. Not that.
  • the backlight system 2 has a rectangular plate-shaped rear wall 5 and a rectangular frame-shaped side wall 6 integrally standing upright from the periphery of the rear wall 5, and is made of a thin box-shaped resin whose front side is open.
  • a lamp box 7, a plurality of linear light sources 8 provided in the lamp box 7, and a light diffusion plate 10 that closes an open surface 9 (front surface) of the lamp box 7 are provided. That is, the box-shaped lamp box 7 has an open surface 9 whose outline is formed by the side wall 6 having a square frame shape, and the linear light source 8 is provided in a space surrounded by the side wall 6 and the rear wall 5.
  • a reflection plate (not shown) for reflecting light incident on the rear wall 5 side from the linear light source 8 toward the open surface 9 side of the box is attached to the whole. It may be done.
  • the linear light source 8 is, for example, a cylindrical lamp having a diameter of 2 mm to 4 mm.
  • the plurality of linear light sources 8 are arranged in parallel with each other at an equal interval in a state where they are spaced apart from the back surface 18 of the light diffusion plate 10.
  • the distance L between the centers of the adjacent linear light sources 8 is preferably 30 mm to 60 mm from the viewpoint of power saving.
  • the distance D between the back surface 18 of the light diffusing plate 10 (for example, the central portion of the back surface 18) and the center of the linear light source 8 is preferably 10 mm to 20 mm from the viewpoint of reducing the thickness.
  • the ratio of the distance L to the distance D (L / D) is preferably 2.5 to 4.0.
  • the interval L is more preferably 40 mm to 55 mm, and the distance D is more preferably 13 mm to 17 mm.
  • the number of the linear light sources 8 is inevitably determined by the size of the lamp box 7 (screen size of the liquid crystal display device 1) and the interval L. For example, in the 32 type liquid crystal display device 1, the number is 6 to 10. Preferably there is. In FIGS. 1 and 2, only five linear light sources 8 are shown for easy illustration.
  • linear light source 8 a well-known cylindrical lamp such as a fluorescent tube (cold cathode tube), a halogen lamp, or a tungsten lamp can be used.
  • a point light source such as a light emitting diode (LED) can be used instead of the linear light source 8.
  • the liquid crystal panel 3 includes a liquid crystal cell 11 and a pair of polarizing plates 12 and 13 sandwiching the liquid crystal cell 11 from both sides in the thickness direction. Such a liquid crystal panel 3 is disposed on the front surface of the backlight system 2 so that the polarizing plate 12 on the back side and the light diffusion plate 10 face each other.
  • liquid crystal cell 11 a known liquid crystal cell such as a TFT liquid crystal cell or an STN liquid crystal cell can be used.
  • the optical film 4 is not particularly limited, and examples thereof include a microlens film, a substantially semicircular lenticular lens film, a diffusion film, a prism film, and a reflective polarization separation film.
  • FIG. 3 is a schematic perspective view of a light diffusing plate made of a resin sheet according to an embodiment of the present invention.
  • FIG. 4 is a schematic perspective view of an optical film made of a resin sheet according to an embodiment of the present invention.
  • FIG. 5 is an enlarged cross-sectional view of a main part of the lamp box showing a mounted state of the light diffusing plate.
  • the light diffusing plate 10 is formed in a square plate shape that is substantially the same as the frame shape of the side wall 6 of the lamp box 7.
  • a plurality of semi-elliptical ridges 17 extending between a pair of opposed peripheral edges of the light diffusing plate 10 are formed in a streak shape. That is, on the front surface 16 of the light diffusing plate 10, semi-elliptical ridges 17 and concave grooves 19 between adjacent semi-elliptical ridges 17 are alternately formed.
  • the semi-elliptical ridge 17 has a substantially semi-elliptical contour in a cut surface (III-III cross section in FIG. 3) orthogonal to the direction in which the semi-elliptical ridge 17 extends.
  • a number of semi-elliptical ridges 17 are arranged in parallel with each other at an equal interval E 1 (for example, 1 ⁇ m to 15 ⁇ m).
  • the distance (pitch P 1 ′) between the centers of the adjacent semi-elliptical ridges 17 is, for example, 30 ⁇ m to 500 ⁇ m.
  • the height of the semi-elliptical ridge 17 (depth of the concave groove 19) H 1 ′ is, for example, 10 ⁇ m to 500 ⁇ m.
  • the aspect ratio represented by the ratio of the 'height H 1 for "pitch P 1 of the semi-elliptic convex strip 17 (H 1' / P 1 ') for example, 0.3 or more, preferably 0.4 to 0.7.
  • the other main surface (back surface 18) of the light diffusing plate 10 is a flat surface having no irregularities. Further, as shown in FIG. 5, the thickness T 1 of the light diffusing plate 10 from the back surface 18 to the top of the semi-elliptical ridges 17 on the front surface 16 is, for example, 1 mm to 4 mm.
  • the optical film 4 is formed in a square plate shape substantially the same as the shape of the light diffusion plate 10.
  • a plurality of convex shapes 21 extending between a pair of opposing peripheral edges of the optical film 4 are formed in a streak shape.
  • the cross section of the convex shape 21 is, for example, a semi-elliptical shape, a prism shape, or the like (a semi-elliptical shape in FIG. 4). That is, on the front surface 20 of the optical film 4, convex shapes 21 and concave grooves 22 between adjacent convex shapes 21 are alternately formed.
  • a large number of the convex shapes 21 are arranged at equal intervals E 2 (for example, 1 ⁇ m to 15 ⁇ m) in parallel with each other.
  • the distance (pitch P 2 ′) between the centers of adjacent convex shapes 21 is, for example, 30 ⁇ m to 500 ⁇ m.
  • the height of the convex shape 21 (depth of the concave groove 22) H 2 ′ is, for example, 10 ⁇ m to 500 ⁇ m.
  • the aspect ratio represented by the ratio of 'the height H 2 to' pitch P 2 of the convex 21 (H 2 '/ P 2 ') for example, 0.3 or more, preferably 0.4 to 0 .7.
  • the other main surface (back surface 23) of the optical film 4 is a flat surface having no irregularities. Further, as shown in FIG. 5, the thickness T 2 of the optical film 4 from the back surface 23 to the top of the convex shape 21 on the front surface 20 is, for example, 0.1 mm to 1 mm.
  • the raw material for the light diffusing plate 10 and the optical film 4 is not particularly limited, and a resin such as an amorphous translucent resin or a crystalline resin can be used.
  • amorphous translucent resin examples include acrylic resin, styrene resin, polycarbonate, cyclic polyolefin, cyclic olefin copolymer, MS resin (methyl methacrylate-styrene copolymer resin), ABS resin ( And acrylonitrile-butadiene-styrene copolymer resin) and AS resin (acrylonitrile-styrene copolymer resin).
  • Examples of the crystalline resin used include propylene-based resins and ethylene-based resins.
  • amorphous translucent resin and crystalline resin can be used alone or in combination of two or more.
  • a styrene resin and a polycarbonate are preferable and single use of a styrene resin is more preferable.
  • a polycarbonate an acrylic resin, MS resin, and AS resin are preferable.
  • the light diffusing plate 10 and the optical film 4 can contain a light diffusing agent (light diffusing particles) if necessary.
  • the light diffusing agent is not particularly limited as long as it has a refractive index different from that of the resin constituting the light diffusing plate 10 and the optical film 4 and can diffuse transmitted light.
  • inorganic light diffusing agents include calcium carbonate, barium sulfate, titanium oxide, aluminum hydroxide, silica, glass, talc, mica, white carbon, magnesium oxide, and zinc oxide. These may be subjected to a surface treatment with a fatty acid or the like.
  • organic light diffusing agent examples include styrene polymer particles, acrylic polymer particles, siloxane polymer particles, and the like, and preferably a high molecular weight weight having a weight average molecular weight of 500,000 to 5,000,000.
  • examples include coalescent particles and crosslinked polymer particles having a gel fraction of 10% by mass or more when dissolved in acetone.
  • the above light diffusing agents can be used alone or in combination of two or more.
  • the mixing ratio of the light diffusing agent is preferably 0.001 to 1 part by weight, more preferably 0.001 to 1 part by weight with respect to 100 parts by weight of the resin. 0.01 parts by weight.
  • the light diffusing agent can be used as a master batch in which the light diffusing agent is dispersed in the resin.
  • the absolute value of the difference between the refractive index of the resin and the refractive index of the light diffusing agent is usually 0.01 to 0.20, preferably 0.02 to 0.15, from the viewpoint of light diffusibility. It is.
  • the light diffusion plate 10 and the optical film 4 for example, an antistatic agent, an ultraviolet absorber, a heat stabilizer, an antioxidant, a weathering agent, a light stabilizer, a fluorescent whitening agent, a processing stabilizer, and the like. These various additives can also be added.
  • the ultraviolet absorber is not particularly limited, and examples thereof include a salicylic acid phenyl ester ultraviolet absorber, a benzophenone ultraviolet absorber, a triazine ultraviolet absorber, and a benzotriazole ultraviolet absorber.
  • an ultraviolet absorber it is preferable to add 0.1 to 3 parts by weight of the ultraviolet absorber with respect to 100 parts by weight of the resin. If it is the above-mentioned range, the bleeding to the surface of an ultraviolet absorber can be suppressed and the external appearance of the light-diffusion plate 10 and the optical film 4 can be maintained favorable.
  • the heat stabilizer is not particularly limited, and examples thereof include manganese compounds and copper compounds.
  • it is preferably added together with the ultraviolet absorber, and the heat stabilizer is preferably added at a ratio of 2 parts by weight or less with respect to 1 part by weight of the ultraviolet absorber in the resin. More preferably, 0.01 to 1 part by weight of a heat stabilizer is added to 1 part by weight of the ultraviolet absorber.
  • the antioxidant is not particularly limited, and examples thereof include hindered phenol compounds and hindered amine compounds.
  • the antioxidant is added, it is preferable to add 0.1 to 3 parts by weight of the antioxidant with respect to 100 parts by weight of the resin.
  • the light diffusing plate 10 has a side wall of the lamp box 7 so that the extending direction of the semi-elliptical ridges 17 is parallel to the extending direction of the linear light source 8 in the lamp box 7.
  • 6 is fixed to the lamp box 7 by bringing the back surface 18 of the light diffusion plate 10 into contact therewith.
  • the open surface 9 of the lamp box 7 is blocked by the light diffusion plate 10.
  • the optical film 4 is disposed in front of the light diffusing plate 10.
  • the optical film 4 is arranged so that the direction in which the semi-elliptical ridges 17 in the light diffusing plate 10 extend and the direction in which the convex shapes 21 in the optical film 4 extend are parallel.
  • optical film 4 may be arrange
  • the light diffusion plate 10 and the optical film 4 described above can be produced by cutting a resin sheet produced by the following method.
  • the optical film 4 can also be manufactured according to the following method.
  • FIG. 6 is a schematic configuration diagram of a manufacturing apparatus used in the method for manufacturing a resin sheet according to an embodiment of the present invention.
  • FIG. 7 is a schematic cross-sectional view of the intaglio transfer mold attached to the lower roll.
  • the sheet manufacturing apparatus 51 takes out the resin sheet 53, a sheet molding machine 52 that extrudes the raw material resin into a sheet shape, a set of pressing rolls 54 for molding the extruded resin sheet 53 by pressing. And a pair of take-up roll groups 55.
  • the sheet molding machine 52 is configured by a known extrusion molding machine such as a single screw extruder or a twin screw extruder.
  • the sheet molding machine 52 includes a cylinder 56 for heating and melting (softening) the resin material, a hopper 57 for feeding the resin material into the cylinder 56, and a die 58 for extruding the softened resin material in the cylinder 56. Including.
  • the die 58 a metal T-die used in a normal extrusion molding method or the like is used.
  • the width of the lip (die lip 59) of the die 58 is selected according to the width of the target resin sheet 53, and is, for example, 200 mm to 3000 mm.
  • the pressing roll group 54 includes three pressing rolls 63, 64, 65 as a mechanism for forming irregularities on the front and back surfaces 75, 76 of the resin sheet 53 by a transfer mold while molding the resin sheet 53 by pressing.
  • the surface 76 of the resin sheet 53 is a surface that forms the front surface 16 of the light diffusing plate 10, and is a shape transfer surface that is finally subjected to shape processing.
  • the back surface 75 of the resin sheet 53 is a surface that forms the back surface 18 of the light diffusing plate 10, and is a surface that is not finally subjected to shape processing (for example, a flat surface that maintains flatness in this embodiment). It is.
  • the three pressing rolls 63, 64, 65 are each made of a cylindrical metal roll (for example, made of chromium, copper, nickel, stainless steel, or a resin surface material), and the temperature of the peripheral surface thereof. It is a cooling roll having a function of adjusting (surface temperature).
  • the three pressing rolls 63, 64, 65 are arranged in the vertical direction so that the axes are parallel to each other as the upper roll 63, the intermediate roll 64, and the lower roll 65 as the shape roll in order from the top to the bottom. ing.
  • peripheral surface 66 of the upper roll 63 and the peripheral surface 67 of the intermediate roll 64 are, for example, made smooth surfaces (mirror surfaces) by being mirror-finished.
  • an intaglio transfer mold 69 for forming the semi-elliptical ridges 17 and the concave grooves 19 in the resin sheet 53 is provided.
  • the intaglio transfer mold 69 is, for example, copper-plated on a cylindrical metal roll, the plated metal roll is placed on a lathe, and a diamond plating is used to form a copper plating layer in a desired uneven shape. After engraving or forming a groove by chemical etching or the like, the copper plating layer is manufactured by performing a chrome plating process.
  • the surfaces of the upper roll 63 and the intermediate roll 64 that are not provided with the intaglio transfer mold 69 are also subjected to plating treatment such as chromium plating, copper plating, nickel plating, Ni—P plating, etc., if necessary. It may be.
  • the intaglio transfer mold 69 is preferably manufactured using a combination of a lathe and a diamond tool in order to form a more precise shape with good reproducibility.
  • the chromium plating thickness applied on the copper plating layer is preferably 5 ⁇ m or less, more preferably 2 ⁇ m or less.
  • the intaglio transfer mold 69 includes a semi-elliptical groove 70 and a ridge 71 between the adjacent semi-elliptical grooves 70 (the ridge 71 is opposite to the groove 19, and the surface of the intaglio transfer mold 69.
  • the surface of the ridge 71 is alternately arranged along the axial direction of the lower roll 65.
  • the depth H 1 of the semi-elliptical concave groove 70 is slightly larger than the height H 1 ′ of the semi-elliptical ridge 17 and is, for example, 10 ⁇ m to 500 ⁇ m, preferably 20 ⁇ m to 300 ⁇ m or less. If the depth H 1 is excessively large, it becomes difficult to allow the resin to enter the tip of the semi-elliptical concave groove 70.
  • the distance between the centers of the adjacent semi-elliptical grooves 70 is appropriately determined according to the shape of the semi-elliptical ridges 17, and is, for example, 30 ⁇ m to 500 ⁇ m, preferably 40 ⁇ m to 450 ⁇ m. . If the pitch P 1 is less than 30 [mu] m, there is a possibility that the resin solidifies immediately in contact with the lower roll 65, to obtain a result, the resin does not penetrate to the tip of the semi-elliptical groove 70, the imprint profile to target There is a risk that it will not be possible. On the other hand, if the pitch P 1 is greater than 500 [mu] m, there is a possibility that streaks of pitch or also observed with the naked eye, the interference fringe pattern between the liquid crystal panel 3 and the optical film 4 or appear.
  • the aspect ratio represented by the ratio of the height H 1 to the pitch P 1 of the semi-elliptical concave groove 70 (H 1 / P 1 ) is, for example, 0.3 or more, preferably 0.4 to 0.7. It is.
  • the difference between the height H 1 ′ of the semi-elliptical ridge 17 and the depth H 1 of the semi-elliptical concave groove 70 is that the intaglio transfer mold 69 is transferred to the resin sheet 53 to form the semi-elliptical ridge 17. This is due to the transfer rate (H 1 ′ / H 1 ) (%).
  • the surface of the intaglio transfer mold 69 having such a shape is subjected to organic polysiloxane treatment.
  • the organic polysiloxane treatment is a treatment in which the organic polysiloxane is brought into contact with the transfer mold surface.
  • the organic polysiloxane treatment is performed, for example, by applying an organic polysiloxane solution to the surface of the intaglio transfer mold 69 and drying it, by polymerizing organic siloxane on the surface of the intaglio transfer mold 69, or by treating the organic polysiloxane with the intaglio transfer mold 69. It can be carried out by a method of chemically reacting with a material (for example, chromium plating) and bonding.
  • a material for example, chromium plating
  • the organic polysiloxane is composed of, for example, a skeleton of a bifunctional siloxane unit, a trifunctional siloxane unit, and a tetrafunctional siloxane unit.
  • Examples of the functional group bonded to the siloxane skeleton include a hydrocarbon group having 1 to 10 carbon atoms, preferably a hydrocarbon group having 1 to 6 carbon atoms.
  • alkyl such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, pentyl, neopentyl, hexyl, octyl, nonyl, decyl and the like
  • a cycloalkyl group such as a cyclohexyl group; an aryl group such as a phenyl group, a tolyl group, a xylyl group, and a naphthyl group; an aralkyl group such as a benzyl group, a phenylethyl group, and a phenylpropyl group; a vinyl group, an allyl group, a propenyl group, Alkenyl groups such as isopropenyl group, butenyl group, pentenyl group, hexenyl group, octenyl group; cycloalkenyl groups such
  • halogen atoms substituted by halogen atoms, cyano groups, etc.
  • the surface of the intaglio transfer mold 69 can be washed to remove excess organic polysiloxane remaining on the surface of the intaglio transfer mold 69. Thereby, even if the organic polysiloxane remains and fine irregularities are generated on the surface of the intaglio transfer mold 69, the roughened surface can be leveled.
  • the intaglio transfer mold 69 can be cleaned by, for example, a method of wiping the surface of the intaglio transfer mold 69 after the organic polysiloxane treatment with fibers (for example, cotton, silk, etc.).
  • the wetting tension measured in accordance with JIS K 6768 on the surface of the intaglio transfer mold 69 is set to 35 mN / m or less.
  • the surface tension of the intaglio transfer mold 69 is preferably 5 mN / m to 30 mN / m.
  • this wetting tension exceeds 35 mN / m, a winding phenomenon is likely to occur.
  • the wetting tension is less than 5 mN / m, shape transfer tends to be insufficient.
  • motors are connected to the rotation shafts of the pressing rolls 63, 64, 65, respectively, and the upper roll 63 and the lower roll 65 can rotate counterclockwise in FIG. 64 can rotate clockwise. That is, the pressing rolls 63, 64, 65 are “rotatable counterclockwise”, “rotatable clockwise”, and “rotatable counterclockwise” in order from the top. Thereby, all the rolls 63, 64, 65 can be rotated synchronously with the resin sheet 53 sandwiched therebetween. Moreover, the conveyance speed of the resin sheet 53 can be adjusted by adjusting the rotational speed of the press rolls 63, 64, and 65 as appropriate.
  • each pressing roll 63, 64, 65 is, for example, 100 mm to 500 mm. Further, when a metal roll is used as the pressing rolls 63, 64, 65, the surface thereof may be plated with, for example, chrome plating, copper plating, nickel plating, Ni—P plating or the like.
  • a heater 72 for heating the surface 76 (surface on the transfer side) of the resin sheet 53 conveyed on the intermediate roll 64 may be installed near the intermediate roll 64.
  • the heater 72 is disposed so as to be separated from the peripheral surface 67 of the intermediate roll 64, and heats the resin sheet 53 being conveyed from the surface 76 side.
  • a known heater such as an infrared heater can be used.
  • the heater 72 may be an in-line type installed in a line where the resin sheet 53 is conveyed, or may be a handy type that can be held by a worker and irradiated with heat.
  • the pair of take-up roll groups 55 includes a pair of take-up rolls 85 and 86 that sandwich the resin sheet 53 from both sides in the thickness direction.
  • the take-up rolls 85 and 86 are each formed of a cylindrical roll (usually a roll made of resin), and face each other so that the upper end of the lower take-up roll 85 is substantially at the same height as the lower end of the lower roll 65. is set up. Thereby, since the resin sheet 53 delivered from the lower roll 65 can be horizontally conveyed while being supported at the height immediately after the delivery, the conveyance resistance can be reduced.
  • the raw material resin is charged into the hopper 57 of the sheet forming machine 52, melted and kneaded by the cylinder 56, and then supplied to a feed block (not shown).
  • the temperature in the cylinder 56 is the temperature T (R2B) at the inlet of the intermediate roll 64 on the back surface 75 before the resin sheet 53 contacts the intermediate roll 64 (in this specification, the temperature at the inlet of the intermediate roll 64 on the surface of the resin sheet 53 is “ T (R2B) ”) is preferably adjusted appropriately so as to be in the range of 200 ° C. to 290 ° C.
  • the temperature in the cylinder 56 is preferably set to 190 ° C. to 250 ° C.
  • the resin in the feed block (not shown) is continuously extruded as the resin sheet 53 by being extruded from the die 58.
  • the resin sheet 53 extruded from the die 58 is first fed into the gap (gap) between the upper roll 63 and the intermediate roll 64 (in this case, melted as necessary) A bank (resin pool) is formed) and the upper roll 63 and the intermediate roll 64 are sandwiched and pressed. Thereafter, the back surface 75 (back surface 18) is brought into close contact with the peripheral surface 67 of the intermediate roll 64 and conveyed. During conveyance, the resin sheet 53 is heated by the heater 72 from the surface 76 side while being cooled by the intermediate roll 64.
  • the surface temperature of the upper roll 63 and the intermediate roll 64 is preferably lower than the extrusion temperature of the resin sheet 53.
  • the surface temperature of the upper roll 63 is 40 ° C. to 160 ° C.
  • the surface temperature of the intermediate roll 64 is 50 ° C. to 200 ° C.
  • the output of the heater 72 is the temperature T (R3B) at the lower roll 65 inlet of the surface 76 before the resin sheet 53 contacts the lower roll 65 (in this specification, the temperature at the lower roll 65 inlet of the surface of the resin sheet 53).
  • the resin can be satisfactorily introduced to the tip of the semi-elliptical concave groove 70 of the intaglio transfer mold 69.
  • the glass transition temperature Tg of resin means the glass transition temperature Tg of resin before adding an additive as mentioned above.
  • Second pressing step (transfer step) and second conveying step Thereafter, the conveyed resin sheet 53 enters between the intermediate roll 64 and the lower roll 65 (gap), and the intermediate roll 64 and the lower roll 65 It is inserted and pressed. Then, when the intermediate roll 64 and the lower roll 65 are pressed, the surface shape of the intaglio transfer mold 69 is transferred to the surface 76 (front surface 16) of the resin sheet 53 in the sheet flow direction (feeding direction). A large number of parallel stripe-like semi-elliptical ridges 17 are formed.
  • the surface temperature T (R3) of the lower roll 65 (in this specification, the surface temperature of the lower roll 65 is referred to as “T (R3)”) is the glass transition temperature of the raw resin. Is preferably Tg ⁇ 30 ° C. ⁇ T (R3) ⁇ Tg + 50 ° C., more preferably Tg ⁇ 20 ° C. ⁇ T (R3) ⁇ Tg + 40 ° C.
  • T (R3) the glass transition temperature of the lower roll 65
  • the surface temperature T (R3) of the lower roll 65 is adjusted so that the lower limit is 72 ° C. and the upper limit is 152 ° C.
  • the surface temperature T (R3) of the lower roll 65 is in the above range, the semi-elliptical concave groove of the intaglio transfer mold 69 is prevented while preventing the “wrapping phenomenon” in which the resin sheet 53 sticks to the intaglio transfer mold 69.
  • the resin can be satisfactorily introduced to the tip of 70.
  • the resin sheet 53 is peeled off from the lower roll 65 at the lower end of the lower roll 65 and is sent to the take-up roll group 55 in the horizontal direction. Thereafter, the resin sheet 53 is manufactured by being taken up by the pair of take-up rolls 85 and 86. And after the resin sheet 53 is further cooled, the said light diffusing plate 10 can be obtained by cut
  • the conveyance speed (speed of the production line) V of the resin sheet 53 is preferably 0.2 / T 1 (m / m) using the thickness T 1 (mm) of the resin sheet 53 (light diffusion plate 10). min) ⁇ V ⁇ 50 / T 1 (m / min), more preferably 0.3 / T 1 (m / min) ⁇ V ⁇ 40 / T 1 (m / min). Adjusted. If the conveyance speed V is in the above range, the resin sheet 53 can be produced in a relatively short cycle time while preventing the occurrence of the “wrapping phenomenon” in which the resin sheet 53 sticks to the intaglio transfer mold 69, so that productivity is good. .
  • the surface of the intaglio transfer mold 69 of the lower roll 65 is treated with organic polysiloxane.
  • the fine hole (micro crack) produced when the lower roll 65 is plated with chromium can be filled with the organic polysiloxane.
  • the wetting tension of the surface of the intaglio transfer mold 69 of the lower roll 65 is 35 mN / m or less. Therefore, even if the surface temperature T (R3) of the lower roll 65 is increased, it is possible to prevent the “winding phenomenon” in which the resin sheet 53 is stuck to the intaglio transfer mold 69.
  • the temperature T (R3B) at the inlet of the lower roll 65 of the surface 76 of the resin sheet 53 is Tg + 50 ° C.
  • the surface temperature T (R3) of the lower roll 65 is Tg ⁇ 30 ° C.
  • the shape of the intaglio transfer mold 69 optimized by the optical design can be reproduced well as the semi-elliptical ridges 17 of the resin sheet 53. Therefore, the light diffusing plate 10 made of the resin sheet 53 can exhibit excellent optical characteristics. Moreover, if the optical film 4 is manufactured according to said method, the optical film 4 can express the outstanding optical characteristic.
  • an intaglio transfer mold 79 having a prism groove 80 having a substantially prism shape for example, a vertex angle ⁇ of 60 ° to 120 ° shown in FIG.
  • the shape roll provided with the intaglio transfer mold 69 is arranged as the lower roll 65, but it may be arranged as the intermediate roll 64 as in the manufacturing apparatus 91 shown in FIG. Good.
  • the temperature T (R2B) at the entrance of the intermediate roll 64 on the back surface 75 of the resin sheet 53 is preferably in the range of Tg + 50 ° C. ⁇ T (R2B) ⁇ Tg + 160 ° C., where Tg is the glass transition temperature of the raw material resin. More preferably, the temperature is appropriately adjusted so that Tg + 70 ° C. ⁇ T (R 2 B) ⁇ Tg + 140 ° C.
  • the temperature T (R2B) at the entrance of the intermediate roll 64 on the back surface 75 of the resin sheet 53 is adjusted so that the heater 72 can heat the back surface 75 (the surface on the transfer side) of the resin sheet 53 extruded from the die 58. It can be performed by installing and adjusting the output of the heater 72 or adjusting the temperature of the cylinder 56.
  • the back surface 18 of the light diffusing plate 10 and the back surface 23 of the optical film 4 are flat surfaces without unevenness.
  • the mat has fine unevenness after being embossed or the like. It may be a surface.
  • an embossed transfer mold may be provided on the peripheral surface 67 of the intermediate roll 64, and the transfer mold may be transferred.
  • the surface 76 of the resin sheet 53 may be embossed.
  • an embossed transfer mold may be provided on the peripheral surface 68 of the lower roll 65, and the transfer mold may be transferred.
  • the press roll group 54 was a form which arrange
  • a roll in contact with the resin sheet 53 that assists the conveyance of the resin sheet 53 and the close contact between the resin sheet 53 and the pressing rolls 63, 64, 65 is used. It may be provided.
  • the surface of the intaglio transfer mold 69 (the contact surface with the resin sheet 53) is treated with an organic polysiloxane has been described. However, if the surface has a wetting tension of 35 mN / m or less. For example, the organic polysiloxane treatment may not be performed.
  • the light diffusing plate (resin sheet) is not limited to a single layer resin plate like the light diffusing plate 10, for example, from a two-layer resin plate, a three-layer resin plate, four or more layers It may be a multi-layer resin plate.
  • the light diffusing plate 10 is used suitably as a light diffusing plate for backlights, it is not particularly limited to such an application.
  • the backlight system 2 is preferably used as a surface light source device for a liquid crystal display device, but is not particularly limited to such an application.
  • various design changes can be made within the scope of matters described in the claims.
  • Example 1 The apparatus which has the structure similar to the resin sheet manufacturing apparatus shown in FIG. 6 was used.
  • the upper roll and the intermediate roll mirror surface cooling rolls having chromium plating on the surface were used.
  • the lower roll the surface material is made of chromium, and concave grooves having a concave lens shape (substantially semicircular shape) as shown in FIG. A shape roll subjected to siloxane treatment was used.
  • the pitch P 1 of the intaglio transfer mold having concave lens-shaped concave grooves was 353 ⁇ m, and the depth H 1 was 223.7 ⁇ m.
  • a styrene resin (“HRM40” manufactured by Toyo Styrene Co., Ltd., Tg: 102 ° C.) is supplied to an extruder having a screw diameter of 40 mm and melt-kneaded at a cylinder temperature of 210 ° C. to 260 ° C. , Fed to the feed block.
  • the resin in the feed block was continuously extruded into a sheet at a T die temperature of 250 ° C. to 260 ° C. via a T die having a width of 250 mm.
  • the extruded resin sheet (continuous resin sheet) was sandwiched between an upper roll (mirror cooling roll) and an intermediate roll (mirror cooling roll) and conveyed in a state of being wound around the surface of the intermediate roll.
  • the conveyed resin sheet was sandwiched between an intermediate roll and a lower roll (shape roll), conveyed while being wound around the surface of the lower roll, and the resin sheet peeled from the lower roll was taken up by the take-up roll. Accordingly, concave shape on a surface (upper surface) is transferred, the thickness T 1 is to obtain a surface profile transfer resin sheet 2 mm.
  • the sheet conveyance speed was 0.65 m / min (within a range of 0.2 / T 1 or more and 50 / T 1 or less). Further, the surface temperature of the resin sheet before contacting the lower roll (temperature T (R3B) at the lower roll inlet) was adjusted by a heater.
  • the wetting tension of the surface of the intaglio transfer mold of the lower roll was measured by the following method in accordance with JIS K 6768 and found to be 23 mN / m. Specifically, the wetting tension was tested using a “mixture for wetting tension test” (hereinafter, simply referred to as “medicine”) manufactured by Wako Pure Chemical Industries, Ltd. First, the temperature of the intaglio transfer mold (work) was stabilized at around 23 ° C. Next, the surface of the intaglio transfer mold was wiped with a cloth soaked with ethanol.
  • a cotton swab was immersed in the chemical, and one drop of the chemical adhering to the cotton swab was placed on the intaglio transfer mold so as not to flow.
  • the determination was made 3 to 5 seconds after placing the liquid.
  • the determination was made by visually observing the placed liquid to determine whether “(1) the liquid is playing” or “(2) the liquid is wet”. The case where the liquid swelled and the size did not change was determined as (1), and the case where the liquid was flat and gradually spread was determined as (2).
  • the process proceeds to a chemical having a smaller numerical value (wetting tension), and if the result is (2), the process proceeds to a chemical having a larger numerical value (wetting tension). This operation was repeated to narrow down the chemicals with wet tension that can reliably wet the surface of the intaglio transfer mold, and the wet tension of the chemicals was used as the measurement result.
  • Example 2 As the lower roll (shape roll), the same process as in Example 1 was used except that the surface of the intaglio transfer mold was wiped with a cotton cloth after the organopolysiloxane treatment of Example 1 and the surface was washed.
  • a resin sheet was prepared according to the methods and conditions described above.
  • Example 1 A resin sheet was produced by the same method and conditions as in Example 1 except that a roll not subjected to organic polysiloxane treatment was used as the lower roll (shape roll).
  • Example 3 The apparatus which has the structure similar to the resin sheet manufacturing apparatus shown in FIG. 10 was used.
  • the upper roll and the lower roll mirror surface cooling rolls having a surface plated with chromium were used.
  • the intermediate roll the surface material is made of chrome, and concave grooves having a concave lens shape (substantially semicircular shape) as shown in FIG. A shape roll subjected to siloxane treatment was used.
  • the pitch P 1 of the intaglio transfer mold having concave lens-shaped concave grooves was 353 ⁇ m, and the depth H 1 was 223.7 ⁇ m.
  • a polycarbonate resin (“Caliber 200-30” manufactured by Sumitomo Dow Co., Ltd., glass transition temperature Tg measured in accordance with JIS 7212-1987, Tg: 147 ° C.) is used as an extruder having a screw diameter of 40 mm.
  • the mixture was melt-kneaded at a cylinder temperature of 210 ° C. to 260 ° C. and then supplied to the feed block.
  • the resin in the feed block was continuously extruded into a sheet at a T die temperature of 250 ° C. to 260 ° C. via a T die having a width of 250 mm.
  • the extruded resin sheet (continuous resin sheet) was sandwiched between an upper roll (mirror cooling roll) and an intermediate roll (shape roll) and conveyed in a state of being wound around the surface of the intermediate roll. Then, the conveyed resin sheet was pinched
  • the sheet conveyance speed (line speed) was 0.90 m / min (range of 0.2 / T 1 or more and 50 / T 1 or less).
  • ⁇ Comparative example 2> A resin sheet was produced by the same method and conditions as in Example 3 except that a roll not subjected to organic polysiloxane treatment was used as an intermediate roll (shape roll).
  • TOF-SIMS Time-of-Flight Secondary Ion Mass Spectrometry
  • Irradiated primary ions 69 Ga + Measurement area: about 80 ⁇ 80 ⁇ m 2 ⁇
  • the detected secondary ions Positive (C 5 H 15 Si 2 O + and C 7 H 21 Si 4 O 4 +) Detection mass range: 0.5 to 2000 a. m. u
  • the transfer mold surface of Example 1 has positive ions derived from organic polysiloxane (C 5 H 15 Si 2 O + and C 7 H 21 Si). A large amount of 4 O 4 + ) was detected. The positive ions detected on the surface of the transfer mold of Example 2 were less because the transfer mold surface was wiped with a cotton cloth, thereby removing the organopolysiloxane that could not fit into the fine holes of the chrome plating. This is probably because

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  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Optical Elements Other Than Lenses (AREA)
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  • Extrusion Moulding Of Plastics Or The Like (AREA)

Abstract

Provided is a surface shape transfer resin sheet manufacturing method capable of accurately transferring a transfer pattern to the surface of a resin sheet and, in addition, capable of preventing a winding phenomenon at a shaped roll from occurring. In one embodiment of the invention, a resin sheet (53) is formed by continuously extruding a resin in a heat-melting state from a die (58), and the resin sheet (53) is inserted between an upper roll (63) and an intermediate roll (64). Next, the resin sheet (53) is conveyed while being firmly attached to the intermediate roll (64), and the conveyed resin sheet (53) is inserted between the intermediate roll (64) and a lower roll (65). Upon insertion between the intermediate roll (64) and the lower roll (65), an intaglio transfer pattern (69) formed on the lower roll (65) is transferred to the surface (76) of the resin sheet (53). As the lower roll (65), a shaped roll is used, which is equipped with the intaglio transfer pattern (69) having the surface with a wetting tension of 35 mN/m or less measured conforming to JIS K6768.

Description

表面形状転写樹脂シートの製造方法Manufacturing method of surface shape transfer resin sheet
 本発明は、光拡散板や光学フィルム用途などに利用することができる表面形状転写樹脂シートの製造方法に関する。 The present invention relates to a method for producing a surface shape transfer resin sheet that can be used for applications such as a light diffusion plate and an optical film.
 表面形状転写樹脂シートは、溶融混練された樹脂をダイから連続的に押し出して樹脂シートを成形し、当該樹脂シートに転写型の凹凸形状を転写することによって得られるシートである。 The surface shape transfer resin sheet is a sheet obtained by continuously extruding a melt-kneaded resin from a die to form a resin sheet, and transferring the uneven shape of the transfer mold to the resin sheet.
 表面形状転写樹脂シートの製造方法として、例えば、ダイから連続的に押し出された連続樹脂シートを第一押圧ロールと第二押圧ロールとの間に挟み込む工程と、第二押圧ロールの表面に密着させたまま上記連続樹脂シートを搬送する工程と、搬送された上記連続樹脂シートを第二押圧ロールと第三押圧ロールとの間に挟み込む工程とを含む製造方法が提案されている(例えば、特許文献1参照)。この方法では、第三押圧ロールに転写型が装着されており、第二押圧ロールと第三押圧ロールとの間に樹脂シートを挟みこんだ際、樹脂シートの表面に凹凸形状が転写される。 As a manufacturing method of the surface shape transfer resin sheet, for example, a step of sandwiching a continuous resin sheet continuously extruded from a die between a first pressing roll and a second pressing roll, and a surface of the second pressing roll A manufacturing method is proposed that includes a step of conveying the continuous resin sheet as it is, and a step of sandwiching the conveyed continuous resin sheet between a second pressing roll and a third pressing roll (for example, Patent Documents). 1). In this method, a transfer mold is attached to the third pressing roll, and when the resin sheet is sandwiched between the second pressing roll and the third pressing roll, the uneven shape is transferred to the surface of the resin sheet.
特開2009-220555号公報JP 2009-220555 A
 表面形状転写樹脂シートの用途として、液晶表示装置のバックライト装置に組み込まれる光拡散板や光学フィルムとしての使用用途などが普及しつつある。これらの用途では、樹脂シートを製造する際に凹凸形状が精度よく転写されていないと(すなわち、転写率が高くないと)、光拡散板および光学フィルムに設計どおりの光学特性を付与することが困難である。そのため、近年では、転写型を精度よく樹脂シートに転写させるための手法の確立が望まれている。 As the use of the surface shape transfer resin sheet, use as a light diffusing plate or an optical film incorporated in a backlight device of a liquid crystal display device is becoming widespread. In these applications, if the uneven shape is not accurately transferred when the resin sheet is manufactured (that is, the transfer rate is not high), the optical properties as designed can be imparted to the light diffusion plate and the optical film. Have difficulty. Therefore, in recent years, establishment of a technique for accurately transferring a transfer mold onto a resin sheet is desired.
 そのような手法として、例えば、転写型が装着されたロールの温度を高くする手法が考えられる。この手法では、ロールから樹脂シートに伝わる熱により樹脂シートの流動性を高めることができ、転写型の溝部の先端にまで樹脂を入り込ませることができるので、転写率の向上が期待できる。 As such a method, for example, a method of increasing the temperature of the roll on which the transfer mold is mounted can be considered. In this method, the fluidity of the resin sheet can be increased by the heat transmitted from the roll to the resin sheet, and the resin can be introduced into the tip of the groove portion of the transfer mold, so that an improvement in transfer rate can be expected.
 しかしながら、ロール温度を高くし過ぎると、樹脂シートがロール表面に貼り付く「巻き付き現象」が発生し易くなる。その結果、形状転写後の樹脂シートの表面に、その一部が盛り上がって形成される「タックマーク(sticking-mark)」が発生するという不具合がある。ここで、タックマークとは、転写型から剥離する際に樹脂シートの表面に付く縞状の外観不良である。 However, if the roll temperature is too high, a “winding phenomenon” in which the resin sheet sticks to the roll surface tends to occur. As a result, there is a problem that a “tick mark” is formed on the surface of the resin sheet after the shape transfer. Here, the tack mark is a striped appearance defect attached to the surface of the resin sheet when peeling off from the transfer mold.
 本発明の目的は、樹脂シートの表面に転写型を精度よく転写することができ、しかも形状ロール(転写型を備えた押圧ロール)における巻き付き現象の発生を抑制することができる表面形状転写樹脂シートの製造方法を提供することである。 An object of the present invention is a surface shape transfer resin sheet that can accurately transfer a transfer mold to the surface of a resin sheet and that can suppress the occurrence of a winding phenomenon in a shape roll (a press roll provided with a transfer mold). It is to provide a manufacturing method.
 上記目的を達成するための本発明の表面形状転写樹脂シートの製造方法は、樹脂を加熱溶融状態でダイ(die)から連続的に押し出して連続樹脂シートを形成する押出工程と、JIS K 6768に準拠して測定される濡れ張力が35mN/m以下の表面を有する転写型を備えた形状ロール(Shaped roll)を用いて、前記連続樹脂シートの表面に前記転写型の前記表面を押し当てることにより、前記転写型の形状を前記連続樹脂シートの表面に転写する転写工程と、を含むことを特徴としている。 The manufacturing method of the surface shape transfer resin sheet of the present invention for achieving the above object includes an extrusion process in which a resin is continuously extruded from a die in a heated and melted state to form a continuous resin sheet, and JIS K 6768 By pressing the surface of the transfer mold against the surface of the continuous resin sheet using a shape roll (Shaped roll) having a transfer mold having a surface with a wetting tension of 35 mN / m or less measured according to And a transfer step of transferring the shape of the transfer mold onto the surface of the continuous resin sheet.
 また、本発明の表面形状転写樹脂シートの製造方法では、前記形状ロールとして、前記表面に対して有機ポリシロキサン処理が施されている転写型を備えた形状ロールを用いることが好適である。また、本発明の表面形状転写樹脂シートの製造方法では、前記形状ロールとして、前記有機ポリシロキサン処理後、前記表面が洗浄された転写型を備えた形状ロールを用いることが好適である。 In the method for producing a surface shape transfer resin sheet of the present invention, it is preferable to use a shape roll provided with a transfer mold in which an organic polysiloxane treatment is applied to the surface as the shape roll. Moreover, in the manufacturing method of the surface shape transfer resin sheet of this invention, it is suitable to use the shape roll provided with the transfer type by which the said surface was wash | cleaned after the said organic polysiloxane process as said shape roll.
 さらに、本発明の表面形状転写樹脂シートの製造方法では、前記樹脂のガラス転移温度をTg(℃)、転写後の前記連続樹脂シートの厚さをT(mm)として表したときに、前記形状ロールの表面温度がTg-30(℃)以上Tg+50(℃)以下であり、前記連続樹脂シートの搬送速度が0.2/T(m/min)以上50/T(m/min)以下であり、前記形状ロールに接触する前の前記連続樹脂シートの表面温度がTg+50(℃)以上Tg+160(℃)以下である条件下で前記転写工程を行うことが好適である。 Furthermore, in the method for producing a surface shape transfer resin sheet of the present invention, when the glass transition temperature of the resin is expressed as Tg (° C.) and the thickness of the continuous resin sheet after transfer is expressed as T (mm), the shape The roll surface temperature is Tg−30 (° C.) or more and Tg + 50 (° C.) or less, and the transport speed of the continuous resin sheet is 0.2 / T (m / min) or more and 50 / T (m / min) or less. It is preferable that the transfer step is performed under the condition that the surface temperature of the continuous resin sheet before contacting the shape roll is Tg + 50 (° C.) or more and Tg + 160 (° C.) or less.
 本発明の表面形状転写樹脂シートの製造方法によれば、転写型の表面(連続樹脂シートとの接触面)の濡れ張力が35mN/m以下であるので、形状ロールの温度が高くなっても、転写型に樹脂シートが貼り付く「巻き付き現象」の発生を抑制することができる。そのため、形状ロールの温度を高くして樹脂シートの流動性を高めることが可能となり、転写型の凹部に樹脂を良好に入り込ませることができる。これにより、樹脂シートの表面に転写型を精度よく転写することができる。その結果、この製造方法により得られる樹脂シートを液晶表示装置の光拡散板や光学フィルムとして用いれば、優れた光学特性を発現することができる。 According to the method for producing a surface shape transfer resin sheet of the present invention, since the wetting tension of the surface of the transfer mold (the contact surface with the continuous resin sheet) is 35 mN / m or less, even if the temperature of the shape roll increases, Occurrence of the “wrapping phenomenon” in which the resin sheet is stuck to the transfer mold can be suppressed. Therefore, it becomes possible to raise the temperature of a shape roll and to improve the fluidity | liquidity of a resin sheet, and to make resin penetrate into the recessed part of a transfer type | mold favorable. Thereby, the transfer mold can be accurately transferred onto the surface of the resin sheet. As a result, if the resin sheet obtained by this manufacturing method is used as a light diffusing plate or an optical film of a liquid crystal display device, excellent optical characteristics can be expressed.
図1は、本発明の一実施形態に係る樹脂シートが搭載された液晶表示装置の模式的な側面図である。FIG. 1 is a schematic side view of a liquid crystal display device on which a resin sheet according to an embodiment of the present invention is mounted. 図2は、図1に示す液晶表示装置の模式的な斜視図である。FIG. 2 is a schematic perspective view of the liquid crystal display device shown in FIG. 図3は、本発明の一実施形態に係る樹脂シートからなる光拡散板の模式的な斜視図である。FIG. 3 is a schematic perspective view of a light diffusing plate made of a resin sheet according to an embodiment of the present invention. 図4は、本発明の一実施形態に係る樹脂シートからなる光学フィルムの模式的な斜視図である。FIG. 4 is a schematic perspective view of an optical film made of a resin sheet according to an embodiment of the present invention. 図5は、光拡散板および光学フィルムの取り付け状態を示すランプボックスの要部拡大断面図である。FIG. 5 is an enlarged cross-sectional view of a main part of the lamp box showing a mounting state of the light diffusing plate and the optical film. 図6は、本発明の一実施形態に係る樹脂シートの製造方法に使用される製造装置の概略構成図である。FIG. 6 is a schematic configuration diagram of a manufacturing apparatus used in the method for manufacturing a resin sheet according to one embodiment of the present invention. 図7は、下ロールに取り付けられた凹版転写型の模式断面図である。FIG. 7 is a schematic cross-sectional view of the intaglio transfer mold attached to the lower roll. 図8は、凹版転写型の第1の変形例(略半円形状)を示す模式断面図である。FIG. 8 is a schematic cross-sectional view showing a first modified example (substantially semicircular shape) of the intaglio transfer mold. 図9は、凹版転写型の第2の変形例(略プリズム形状)を示す模式断面図である。FIG. 9 is a schematic cross-sectional view showing a second modified example (substantially prism shape) of the intaglio transfer type. 図10は、図6に示すシート製造装置の変形例を示す概略構成図である。FIG. 10 is a schematic configuration diagram showing a modification of the sheet manufacturing apparatus shown in FIG. 図11は、実施例および比較例の転写型表面のIRスペクトルを示す図である。FIG. 11 is a diagram showing IR spectra of the transfer mold surfaces of Examples and Comparative Examples.
 以下では、本発明の実施の形態を、添付図面を参照して詳細に説明する。 Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
<液晶表示装置の全体構成>
 図1は、本発明の一実施形態に係る樹脂シートが搭載された液晶表示装置の模式的な側面図である。図2は、図1に示す液晶表示装置の模式的な斜視図である。液晶表示装置1(液晶テレビ)は、いわゆる直下型液晶表示装置であって、バックライトシステム2と、バックライトシステム2の前面に配置された液晶パネル3と、バックライトシステム2と液晶パネル3との間に配置された光学フィルム4とを備えている。なお、図1および図2では、便宜的に、液晶表示装置1の前側(視認側)を図中の上側に向けた姿勢で液晶表示装置1を表している。また、以下の図で表される液晶表示装置1、バックライトシステム2、液晶パネル3などの各構成部材の縮尺は、説明の便宜上それぞれ設定されたものであり、全ての構成部材の縮尺が同じであるわけではない。
<Overall configuration of liquid crystal display device>
FIG. 1 is a schematic side view of a liquid crystal display device on which a resin sheet according to an embodiment of the present invention is mounted. FIG. 2 is a schematic perspective view of the liquid crystal display device shown in FIG. The liquid crystal display device 1 (liquid crystal television) is a so-called direct liquid crystal display device, and includes a backlight system 2, a liquid crystal panel 3 disposed in front of the backlight system 2, a backlight system 2, and a liquid crystal panel 3. And an optical film 4 disposed between the two. In FIG. 1 and FIG. 2, for convenience, the liquid crystal display device 1 is shown in a posture in which the front side (viewing side) of the liquid crystal display device 1 is directed upward in the drawing. Further, the scales of the constituent members such as the liquid crystal display device 1, the backlight system 2, and the liquid crystal panel 3 shown in the following drawings are set for convenience of explanation, and the scales of all the constituent members are the same. Not that.
 バックライトシステム2は、四角板状の後壁5および後壁5の周縁から前方へ一体的に立設された四角枠状の側壁6を有し、前面側が開放された薄型箱状の樹脂製ランプボックス7と、ランプボックス7内に設けられた複数の線状光源8と、ランプボックス7の開放面9(前面)を塞ぐ光拡散板10とを備えている。すなわち、箱状のランプボックス7は、その開放面9の輪郭が四角枠状の側壁6により形成され、側壁6および後壁5により囲まれる空間内に、線状光源8が設けられている。ランプボックス7の後壁5内面には、例えば、線状光源8から後壁5側へ入射する光を、ボックスの開放面9側へ反射させるための反射板(図示せず)が全体に取り付けられていてもよい。 The backlight system 2 has a rectangular plate-shaped rear wall 5 and a rectangular frame-shaped side wall 6 integrally standing upright from the periphery of the rear wall 5, and is made of a thin box-shaped resin whose front side is open. A lamp box 7, a plurality of linear light sources 8 provided in the lamp box 7, and a light diffusion plate 10 that closes an open surface 9 (front surface) of the lamp box 7 are provided. That is, the box-shaped lamp box 7 has an open surface 9 whose outline is formed by the side wall 6 having a square frame shape, and the linear light source 8 is provided in a space surrounded by the side wall 6 and the rear wall 5. On the inner surface of the rear wall 5 of the lamp box 7, for example, a reflection plate (not shown) for reflecting light incident on the rear wall 5 side from the linear light source 8 toward the open surface 9 side of the box is attached to the whole. It may be done.
 線状光源8は、例えば、直径が2mm~4mmの円筒状ランプである。複数の線状光源8は、光拡散板10の背面18に対して一定間隔をあけた状態で、互いに平行に等しい間隔をあけて配置されている。 The linear light source 8 is, for example, a cylindrical lamp having a diameter of 2 mm to 4 mm. The plurality of linear light sources 8 are arranged in parallel with each other at an equal interval in a state where they are spaced apart from the back surface 18 of the light diffusion plate 10.
 隣り合う線状光源8の中心同士の間隔Lは、省電力化の観点から、30mm~60mmであることが好ましい。また、光拡散板10の背面18(例えば、背面18における中央部)と線状光源8の中心との距離Dは、薄型化の観点から、10mm~20mmであることが好ましい。また、距離Dに対する間隔Lの比率(L/D)は、2.5~4.0であることが好ましい。なお、間隔Lは、40mm~55mmであることがより好ましく、距離Dは、13mm~17mmであることがより好ましい。また、線状光源8の数は、ランプボックス7のサイズ(液晶表示装置1の画面サイズ)および間隔Lにより必然的に決まるが、例えば、32型の液晶表示装置1では、6~10本であることが好ましい。なお、図1および図2では、図解し易くするために、線状光源8を5本分だけ表している。 The distance L between the centers of the adjacent linear light sources 8 is preferably 30 mm to 60 mm from the viewpoint of power saving. Further, the distance D between the back surface 18 of the light diffusing plate 10 (for example, the central portion of the back surface 18) and the center of the linear light source 8 is preferably 10 mm to 20 mm from the viewpoint of reducing the thickness. The ratio of the distance L to the distance D (L / D) is preferably 2.5 to 4.0. The interval L is more preferably 40 mm to 55 mm, and the distance D is more preferably 13 mm to 17 mm. The number of the linear light sources 8 is inevitably determined by the size of the lamp box 7 (screen size of the liquid crystal display device 1) and the interval L. For example, in the 32 type liquid crystal display device 1, the number is 6 to 10. Preferably there is. In FIGS. 1 and 2, only five linear light sources 8 are shown for easy illustration.
 また、線状光源8としては、例えば、蛍光管(冷陰極管)、ハロゲンランプ、タングステンランプなど、公知の筒形ランプを用いることができる。また、バックライトシステム2の光源としては、線状光源8に代えて、発光ダイオード(LED)などの点状光源などを用いることもできる。 Further, as the linear light source 8, a well-known cylindrical lamp such as a fluorescent tube (cold cathode tube), a halogen lamp, or a tungsten lamp can be used. Further, as the light source of the backlight system 2, a point light source such as a light emitting diode (LED) can be used instead of the linear light source 8.
 液晶パネル3は、液晶セル11と、液晶セル11を厚さ方向両側から挟む1対の偏光板12,13とを備えている。このような液晶パネル3は、背面側の偏光板12と光拡散板10とが対向するように、バックライトシステム2の前面に配置される。 The liquid crystal panel 3 includes a liquid crystal cell 11 and a pair of polarizing plates 12 and 13 sandwiching the liquid crystal cell 11 from both sides in the thickness direction. Such a liquid crystal panel 3 is disposed on the front surface of the backlight system 2 so that the polarizing plate 12 on the back side and the light diffusion plate 10 face each other.
 液晶セル11としては、例えば、TFT型液晶セル、STN型液晶セルなど、公知の液晶セルを用いることができる。 As the liquid crystal cell 11, a known liquid crystal cell such as a TFT liquid crystal cell or an STN liquid crystal cell can be used.
 光学フィルム4としては、特に制限されず、例えば、マイクロレンズフィルム、略半円状のレンチキュラーレンズフィルム、拡散フィルム、プリズムフィルム、反射型偏光分離フィルムなどが挙げられる。 The optical film 4 is not particularly limited, and examples thereof include a microlens film, a substantially semicircular lenticular lens film, a diffusion film, a prism film, and a reflective polarization separation film.
<光拡散板および光学フィルムの構成>
 図3は、本発明の一実施形態に係る樹脂シートからなる光拡散板の模式的な斜視図である。図4は、本発明の一実施形態に係る樹脂シートからなる光学フィルムの模式的な斜視図である。図5は、光拡散板の取り付け状態を示すランプボックスの要部拡大断面図である。
<Configuration of light diffusion plate and optical film>
FIG. 3 is a schematic perspective view of a light diffusing plate made of a resin sheet according to an embodiment of the present invention. FIG. 4 is a schematic perspective view of an optical film made of a resin sheet according to an embodiment of the present invention. FIG. 5 is an enlarged cross-sectional view of a main part of the lamp box showing a mounted state of the light diffusing plate.
 図3に示すように、光拡散板10は、ランプボックス7の側壁6の枠形状とほぼ同じ四角の板状に形成されている。光拡散板10の一方の主面(前面16)には、光拡散板10の1組の対向周縁間に延びる半楕円凸条17が多数筋状に形成されている。すなわち、光拡散板10の前面16には、半楕円凸条17と、隣り合う半楕円凸条17間の凹溝19とが交互に形成されている。 As shown in FIG. 3, the light diffusing plate 10 is formed in a square plate shape that is substantially the same as the frame shape of the side wall 6 of the lamp box 7. On one main surface (front surface 16) of the light diffusing plate 10, a plurality of semi-elliptical ridges 17 extending between a pair of opposed peripheral edges of the light diffusing plate 10 are formed in a streak shape. That is, on the front surface 16 of the light diffusing plate 10, semi-elliptical ridges 17 and concave grooves 19 between adjacent semi-elliptical ridges 17 are alternately formed.
 半楕円凸条17は、半楕円凸条17が延びる方向に直交する切断面(図3のIII-III断面)が略半楕円形状の輪郭を有している。多数の半楕円凸条17は、互いに平行に等しい間隔E(例えば、1μm~15μm)をあけて配置されている。隣り合う半楕円凸条17の中心同士の距離(ピッチP’)は、例えば、30μm~500μmである。また、半楕円凸条17の高さ(凹溝19の深さ)H’は、例えば、10μm~500μmである。また、半楕円凸条17のピッチP’に対する高さH’の比率(H’/P’)で表されるアスペクト比は、例えば、0.3以上、好ましくは0.4~0.7である。 The semi-elliptical ridge 17 has a substantially semi-elliptical contour in a cut surface (III-III cross section in FIG. 3) orthogonal to the direction in which the semi-elliptical ridge 17 extends. A number of semi-elliptical ridges 17 are arranged in parallel with each other at an equal interval E 1 (for example, 1 μm to 15 μm). The distance (pitch P 1 ′) between the centers of the adjacent semi-elliptical ridges 17 is, for example, 30 μm to 500 μm. Further, the height of the semi-elliptical ridge 17 (depth of the concave groove 19) H 1 ′ is, for example, 10 μm to 500 μm. The aspect ratio represented by the ratio of the 'height H 1 for "pitch P 1 of the semi-elliptic convex strip 17 (H 1' / P 1 ') , for example, 0.3 or more, preferably 0.4 to 0.7.
 一方、光拡散板10の他方の主面(背面18)は、凹凸のない平坦面となっている。また、図5に示すように、背面18から前面16における半楕円凸条17の頂部までの光拡散板10の厚さTは、例えば、1mm~4mmである。 On the other hand, the other main surface (back surface 18) of the light diffusing plate 10 is a flat surface having no irregularities. Further, as shown in FIG. 5, the thickness T 1 of the light diffusing plate 10 from the back surface 18 to the top of the semi-elliptical ridges 17 on the front surface 16 is, for example, 1 mm to 4 mm.
 また、図4に示すように、光学フィルム4は、光拡散板10の形状とほぼ同じ四角の板状に形成されている。 Further, as shown in FIG. 4, the optical film 4 is formed in a square plate shape substantially the same as the shape of the light diffusion plate 10.
 光学フィルム4の一方の主面(前面20)には、光学フィルム4の1組の対向周縁間に延びる凸形状21が多数筋状に形成されている。この凸形状21の断面(図4のIV-IV断面)の形状は、例えば、半楕円形状、プリズム形状などである(図4では半楕円形状)。すなわち、光学フィルム4の前面20には、凸形状21と、隣り合う凸形状21間の凹溝22とが交互に形成されている。 On one main surface (front surface 20) of the optical film 4, a plurality of convex shapes 21 extending between a pair of opposing peripheral edges of the optical film 4 are formed in a streak shape. The cross section of the convex shape 21 (IV-IV cross section in FIG. 4) is, for example, a semi-elliptical shape, a prism shape, or the like (a semi-elliptical shape in FIG. 4). That is, on the front surface 20 of the optical film 4, convex shapes 21 and concave grooves 22 between adjacent convex shapes 21 are alternately formed.
 多数の凸形状21は、互いに平行に等しい間隔E(例えば、1μm~15μm)をあけて配置されている。隣り合う凸形状21の中心同士の距離(ピッチP’)は、例えば、30μm~500μmである。また、凸形状21の高さ(凹溝22の深さ)H’は、例えば、10μm~500μmである。また、凸形状21のピッチP’に対する高さH’の比率(H’/P’)で表されるアスペクト比は、例えば、0.3以上、好ましくは、0.4~0.7である。 A large number of the convex shapes 21 are arranged at equal intervals E 2 (for example, 1 μm to 15 μm) in parallel with each other. The distance (pitch P 2 ′) between the centers of adjacent convex shapes 21 is, for example, 30 μm to 500 μm. Further, the height of the convex shape 21 (depth of the concave groove 22) H 2 ′ is, for example, 10 μm to 500 μm. The aspect ratio represented by the ratio of 'the height H 2 to' pitch P 2 of the convex 21 (H 2 '/ P 2 ') , for example, 0.3 or more, preferably 0.4 to 0 .7.
 一方、光学フィルム4の他方の主面(背面23)は、凹凸のない平坦面となっている。また、図5に示すように、背面23から前面20における凸形状21の頂部までの光学フィルム4の厚さTは、例えば、0.1mm~1mmである。 On the other hand, the other main surface (back surface 23) of the optical film 4 is a flat surface having no irregularities. Further, as shown in FIG. 5, the thickness T 2 of the optical film 4 from the back surface 23 to the top of the convex shape 21 on the front surface 20 is, for example, 0.1 mm to 1 mm.
 光拡散板10および光学フィルム4の原料としては、特に制限されず、樹脂、例えば、非晶性の透光性樹脂あるいは結晶性樹脂を用いることができる。 The raw material for the light diffusing plate 10 and the optical film 4 is not particularly limited, and a resin such as an amorphous translucent resin or a crystalline resin can be used.
 用いられる非晶性透光性樹脂としては、例えば、アクリル系樹脂、スチレン系樹脂、ポリカーボネート、環状ポリオレフィン、環状オレフィン共重合体、MS樹脂(メタクリル酸メチル-スチレン共重合体樹脂)、ABS樹脂(アクリロニトリル-ブタジエン-スチレン共重合体樹脂)、AS樹脂(アクリロニトリル-スチレン共重合体樹脂)などが挙げられる。 Examples of the amorphous translucent resin used include acrylic resin, styrene resin, polycarbonate, cyclic polyolefin, cyclic olefin copolymer, MS resin (methyl methacrylate-styrene copolymer resin), ABS resin ( And acrylonitrile-butadiene-styrene copolymer resin) and AS resin (acrylonitrile-styrene copolymer resin).
 用いられる結晶性樹脂としては、例えば、プロピレン系樹脂、エチレン系樹脂などが挙げられる。 Examples of the crystalline resin used include propylene-based resins and ethylene-based resins.
 上記非晶性透光性樹脂および結晶性樹脂は、単独使用または2種以上併用することができる。また、これらのうち、光拡散板10の原料としては、スチレン系樹脂、ポリカーボネートが好ましく、スチレン系樹脂の単独使用がより好ましい。また、光学フィルム4の原料としては、ポリカーボネート、アクリル樹脂、MS樹脂、AS樹脂が好ましい。 The above amorphous translucent resin and crystalline resin can be used alone or in combination of two or more. Moreover, among these, as a raw material of the light diffusing plate 10, a styrene resin and a polycarbonate are preferable and single use of a styrene resin is more preferable. Moreover, as a raw material of the optical film 4, a polycarbonate, an acrylic resin, MS resin, and AS resin are preferable.
 また、光拡散板10および光学フィルム4は、必要により光拡散剤(光拡散粒子)を含有することができる。光拡散剤としては、光拡散板10および光学フィルム4を構成する樹脂と屈折率が異なり、透過光を拡散できる粒子であれば特に制限されない。例えば、無機系の光拡散剤として、炭酸カルシウム、硫酸バリウム、酸化チタン、水酸化アルミニウム、シリカ、硝子、タルク、マイカ、ホワイトカーボン、酸化マグネシウム、酸化亜鉛などが挙げられる。これらは、脂肪酸などで表面処理が施されたものであってもよい。 Moreover, the light diffusing plate 10 and the optical film 4 can contain a light diffusing agent (light diffusing particles) if necessary. The light diffusing agent is not particularly limited as long as it has a refractive index different from that of the resin constituting the light diffusing plate 10 and the optical film 4 and can diffuse transmitted light. Examples of inorganic light diffusing agents include calcium carbonate, barium sulfate, titanium oxide, aluminum hydroxide, silica, glass, talc, mica, white carbon, magnesium oxide, and zinc oxide. These may be subjected to a surface treatment with a fatty acid or the like.
 また、例えば、有機系の光拡散剤として、スチレン系重合体粒子、アクリル系重合体粒子、シロキサン系重合体粒子などが挙げられ、好ましくは、重量平均分子量が50万~500万の高分子量重合体粒子や、アセトンに溶解させたときのゲル分率が10質量%以上である架橋重合体粒子が挙げられる。 Examples of the organic light diffusing agent include styrene polymer particles, acrylic polymer particles, siloxane polymer particles, and the like, and preferably a high molecular weight weight having a weight average molecular weight of 500,000 to 5,000,000. Examples include coalescent particles and crosslinked polymer particles having a gel fraction of 10% by mass or more when dissolved in acetone.
 上記光拡散剤は、単独使用または2種以上併用することができる。 The above light diffusing agents can be used alone or in combination of two or more.
 光拡散板10および光学フィルム4が光拡散剤を含有する場合、光拡散剤の配合割合は、樹脂100重量部に対して、好ましくは0.001~1重量部、より好ましくは0.001~0.01重量部である。また、光拡散剤は、当該光拡散剤を上記樹脂に分散させたマスターバッチとして用いることができる。また、樹脂の屈折率と光拡散剤の屈折率との差の絶対値は、光拡散性の観点から、通常、0.01~0.20であり、好ましくは、0.02~0.15である。 When the light diffusing plate 10 and the optical film 4 contain a light diffusing agent, the mixing ratio of the light diffusing agent is preferably 0.001 to 1 part by weight, more preferably 0.001 to 1 part by weight with respect to 100 parts by weight of the resin. 0.01 parts by weight. The light diffusing agent can be used as a master batch in which the light diffusing agent is dispersed in the resin. The absolute value of the difference between the refractive index of the resin and the refractive index of the light diffusing agent is usually 0.01 to 0.20, preferably 0.02 to 0.15, from the viewpoint of light diffusibility. It is.
 また、光拡散板10および光学フィルム4には、必要により、例えば、帯電防止剤、紫外線吸収剤、熱安定剤、酸化防止剤、耐候剤、光安定剤、蛍光増白剤、加工安定剤などの各種添加剤を添加することもできる。 Further, if necessary, the light diffusion plate 10 and the optical film 4, for example, an antistatic agent, an ultraviolet absorber, a heat stabilizer, an antioxidant, a weathering agent, a light stabilizer, a fluorescent whitening agent, a processing stabilizer, and the like. These various additives can also be added.
 紫外線吸収剤としては、特に制限されず、例えば、サリチル酸フェニルエステル系紫外線吸収剤、ベンゾフェノン系紫外線吸収剤、トリアジン系紫外線吸収剤、ベンゾトリアゾール系紫外線吸収剤などが挙げられる。紫外線吸収剤を添加する場合には、樹脂100重量部に対して、紫外線吸収剤を0.1~3重量部添加することが好ましい。上記した範囲であれば、紫外線吸収剤の表面へのブリードを抑制でき、光拡散板10および光学フィルム4の外観を良好に維持することができる。 The ultraviolet absorber is not particularly limited, and examples thereof include a salicylic acid phenyl ester ultraviolet absorber, a benzophenone ultraviolet absorber, a triazine ultraviolet absorber, and a benzotriazole ultraviolet absorber. When an ultraviolet absorber is added, it is preferable to add 0.1 to 3 parts by weight of the ultraviolet absorber with respect to 100 parts by weight of the resin. If it is the above-mentioned range, the bleeding to the surface of an ultraviolet absorber can be suppressed and the external appearance of the light-diffusion plate 10 and the optical film 4 can be maintained favorable.
 熱安定剤としては、特に制限されず、例えば、マンガン化合物、銅化合物などが挙げられる。熱安定剤を添加する場合には、紫外線吸収剤とともに添加し、樹脂中の紫外線吸収剤1重量部に対して、熱安定剤を2重量部以下の割合で添加することが好ましく、樹脂中の紫外線吸収剤1重量部に対して、熱安定剤を0.01~1重量部添加することがさらに好ましい。 The heat stabilizer is not particularly limited, and examples thereof include manganese compounds and copper compounds. In the case of adding a heat stabilizer, it is preferably added together with the ultraviolet absorber, and the heat stabilizer is preferably added at a ratio of 2 parts by weight or less with respect to 1 part by weight of the ultraviolet absorber in the resin. More preferably, 0.01 to 1 part by weight of a heat stabilizer is added to 1 part by weight of the ultraviolet absorber.
 また、酸化防止剤としては、特に制限されず、例えば、ヒンダードフェノール化合物、ヒンダードアミン化合物などが挙げられる。酸化防止剤を添加する場合には、樹脂100重量部に対して、酸化防止剤を0.1~3重量部添加することが好ましい。 The antioxidant is not particularly limited, and examples thereof include hindered phenol compounds and hindered amine compounds. When the antioxidant is added, it is preferable to add 0.1 to 3 parts by weight of the antioxidant with respect to 100 parts by weight of the resin.
 そして、光拡散板10は、図5に示すように、ランプボックス7内の線状光源8の延びる方向に対して半楕円凸条17の延びる方向が平行となるように、ランプボックス7の側壁6に対して光拡散板10の背面18を当接させて、ランプボックス7に固定されている。これにより、ランプボックス7の開放面9が光拡散板10により塞がれている。また、光学フィルム4は、光拡散板10の前方に配置されている。光学フィルム4は、図5に示すように、光拡散板10における半楕円凸条17の延びる方向と、光学フィルム4における凸形状21の延びる方向とが平行となるように配置される。なお、光学フィルム4は、光拡散板10における半楕円凸条17の延びる方向と、光学フィルム4における凸形状21の延びる方向とが垂直となるように配置されてもよい。 As shown in FIG. 5, the light diffusing plate 10 has a side wall of the lamp box 7 so that the extending direction of the semi-elliptical ridges 17 is parallel to the extending direction of the linear light source 8 in the lamp box 7. 6 is fixed to the lamp box 7 by bringing the back surface 18 of the light diffusion plate 10 into contact therewith. As a result, the open surface 9 of the lamp box 7 is blocked by the light diffusion plate 10. The optical film 4 is disposed in front of the light diffusing plate 10. As shown in FIG. 5, the optical film 4 is arranged so that the direction in which the semi-elliptical ridges 17 in the light diffusing plate 10 extend and the direction in which the convex shapes 21 in the optical film 4 extend are parallel. In addition, the optical film 4 may be arrange | positioned so that the direction where the semi-elliptical protruding item | line 17 in the light diffusing plate 10 extends and the direction where the convex shape 21 in the optical film 4 extend may become perpendicular | vertical.
<光拡散板(樹脂シート)の製造方法>
 上記した光拡散板10および光学フィルム4は、下記の方法により製造された樹脂シートを切断することにより作製することができる。なお、以下では、光拡散板10を製造する場合について説明するが、光学フィルム4も下記の方法に倣って製造することができる。
<Method for producing light diffusion plate (resin sheet)>
The light diffusion plate 10 and the optical film 4 described above can be produced by cutting a resin sheet produced by the following method. In addition, below, although the case where the light diffusing plate 10 is manufactured is demonstrated, the optical film 4 can also be manufactured according to the following method.
 図6は、本発明の一実施形態に係る樹脂シートの製造方法に使用される製造装置の概略構成図である。図7は、下ロールに取り付けられた凹版転写型の模式断面図である。 FIG. 6 is a schematic configuration diagram of a manufacturing apparatus used in the method for manufacturing a resin sheet according to an embodiment of the present invention. FIG. 7 is a schematic cross-sectional view of the intaglio transfer mold attached to the lower roll.
 シート製造装置51は、原料樹脂をシート状に押し出して成形するシート成形機52と、押し出された樹脂シート53を押圧により成形するための一組の押圧ロール群54と、樹脂シート53を引き取るための一対の引取ロール群55とを備えている。 The sheet manufacturing apparatus 51 takes out the resin sheet 53, a sheet molding machine 52 that extrudes the raw material resin into a sheet shape, a set of pressing rolls 54 for molding the extruded resin sheet 53 by pressing. And a pair of take-up roll groups 55.
 シート成形機52は、例えば、一軸押出機、二軸押出機など、公知の押出成形機で構成されている。シート成形機52は、樹脂材料を加熱溶融(軟化)させるためのシリンダ56と、シリンダ56内に樹脂材料を投入するためのホッパ57と、シリンダ56内で軟化した樹脂材料を押し出すためのダイ58とを含んでいる。 The sheet molding machine 52 is configured by a known extrusion molding machine such as a single screw extruder or a twin screw extruder. The sheet molding machine 52 includes a cylinder 56 for heating and melting (softening) the resin material, a hopper 57 for feeding the resin material into the cylinder 56, and a die 58 for extruding the softened resin material in the cylinder 56. Including.
 ダイ58としては、通常の押出成形法に用いられる金属製のTダイなどが用いられる。ダイ58のリップ(ダイリップ59)の幅は、目的とする樹脂シート53の幅に合わせて選択され、例えば、200mm~3000mmである。 As the die 58, a metal T-die used in a normal extrusion molding method or the like is used. The width of the lip (die lip 59) of the die 58 is selected according to the width of the target resin sheet 53, and is, for example, 200 mm to 3000 mm.
 押圧ロール群54は、樹脂シート53を押圧により成形しながら、樹脂シート53の表裏面75,76に転写型により凹凸を形成する機構として、3つの押圧ロール63,64,65を備えている。なお、樹脂シート53の表面76が、光拡散板10の前面16を形成する面であり、最終的に形状加工が施される形状転写面である。一方、樹脂シート53の裏面75が、光拡散板10の背面18を形成する面であり、最終的に形状加工が施されない面(例えば、この実施形態では、平坦性が維持される平坦面)である。 The pressing roll group 54 includes three pressing rolls 63, 64, 65 as a mechanism for forming irregularities on the front and back surfaces 75, 76 of the resin sheet 53 by a transfer mold while molding the resin sheet 53 by pressing. The surface 76 of the resin sheet 53 is a surface that forms the front surface 16 of the light diffusing plate 10, and is a shape transfer surface that is finally subjected to shape processing. On the other hand, the back surface 75 of the resin sheet 53 is a surface that forms the back surface 18 of the light diffusing plate 10, and is a surface that is not finally subjected to shape processing (for example, a flat surface that maintains flatness in this embodiment). It is.
 3つの押圧ロール63,64,65は、それぞれ円柱状の金属製(例えば、クロム製、銅製、ニッケル製、ステンレス製など、あるいは樹脂製の表面材質である)ロールからなり、その周面の温度(表面温度)を調節する機能を有する冷却ロールである。3つの押圧ロール63,64,65は、上から下へ向かって順に上ロール63、中間ロール64、および形状ロールとしての下ロール65として、軸線が相互に平行となるように上下方向に配置されている。 The three pressing rolls 63, 64, 65 are each made of a cylindrical metal roll (for example, made of chromium, copper, nickel, stainless steel, or a resin surface material), and the temperature of the peripheral surface thereof. It is a cooling roll having a function of adjusting (surface temperature). The three pressing rolls 63, 64, 65 are arranged in the vertical direction so that the axes are parallel to each other as the upper roll 63, the intermediate roll 64, and the lower roll 65 as the shape roll in order from the top to the bottom. ing.
 上ロール63の周面66および中間ロール64の周面67は、この実施形態では、例えば、鏡面加工が施されることにより平滑面(鏡面)とされている。 In this embodiment, the peripheral surface 66 of the upper roll 63 and the peripheral surface 67 of the intermediate roll 64 are, for example, made smooth surfaces (mirror surfaces) by being mirror-finished.
 下ロール65の周面68には、樹脂シート53に半楕円凸条17および凹溝19を形成するための凹版転写型69が設けられている。凹版転写型69は、例えば、円柱状の金属製ロールの上に銅メッキを施し、メッキされた金属製ロールを旋盤に設置し、ダイヤモンドバイトを用いて、目的とする凹凸形状に銅メッキ層を彫刻したり、ケミカルエッチングなどで溝を形成したりした後、銅メッキ層上にクロムメッキ処理を施すことにより作製する。なお、凹版転写型69が設けられていない上ロール63および中間ロール64の表面にも、必要に応じて、例えば、クロムメッキ、銅メッキ、ニッケルメッキ、Ni-Pメッキなどのメッキ処理が施されていてもよい。 On the peripheral surface 68 of the lower roll 65, an intaglio transfer mold 69 for forming the semi-elliptical ridges 17 and the concave grooves 19 in the resin sheet 53 is provided. The intaglio transfer mold 69 is, for example, copper-plated on a cylindrical metal roll, the plated metal roll is placed on a lathe, and a diamond plating is used to form a copper plating layer in a desired uneven shape. After engraving or forming a groove by chemical etching or the like, the copper plating layer is manufactured by performing a chrome plating process. The surfaces of the upper roll 63 and the intermediate roll 64 that are not provided with the intaglio transfer mold 69 are also subjected to plating treatment such as chromium plating, copper plating, nickel plating, Ni—P plating, etc., if necessary. It may be.
 凹版転写型69は、より精密な形状を再現よく形成するため、旋盤とダイヤモンドバイトとの組み合わせを用いて作製することが好ましい。銅メッキ層上に施すクロムメッキ厚は、好ましくは5μm以下、さらに好ましくは2μm以下である。 The intaglio transfer mold 69 is preferably manufactured using a combination of a lathe and a diamond tool in order to form a more precise shape with good reproducibility. The chromium plating thickness applied on the copper plating layer is preferably 5 μm or less, more preferably 2 μm or less.
 この凹版転写型69には、図7に示すように、半楕円凸条17とは反対型の半楕円凹溝70が、下ロール65の周方向に沿って多数筋状に形成されている。すなわち、凹版転写型69には、半楕円凹溝70と、隣り合う半楕円凹溝70間の凸条71(この凸条71は凹溝19とは反対型であり、凹版転写型69の表面という場合には、この凸条71の表面のことをいう)とが下ロール65の軸方向に沿って交互に配置されている。 In this intaglio transfer mold 69, as shown in FIG. 7, a number of semi-elliptical grooves 70 opposite to the semi-elliptical ridges 17 are formed in a streak shape along the circumferential direction of the lower roll 65. That is, the intaglio transfer mold 69 includes a semi-elliptical groove 70 and a ridge 71 between the adjacent semi-elliptical grooves 70 (the ridge 71 is opposite to the groove 19, and the surface of the intaglio transfer mold 69. In this case, the surface of the ridge 71 is alternately arranged along the axial direction of the lower roll 65.
 半楕円凹溝70の深さHは、半楕円凸条17の高さH’よりもやや大きく、例えば、10μm~500μm、好ましくは、20μm~300μm以下である。深さHが過剰に大きすぎると、半楕円凹溝70の先端にまで樹脂を入り込ませることが難しくなる。 The depth H 1 of the semi-elliptical concave groove 70 is slightly larger than the height H 1 ′ of the semi-elliptical ridge 17 and is, for example, 10 μm to 500 μm, preferably 20 μm to 300 μm or less. If the depth H 1 is excessively large, it becomes difficult to allow the resin to enter the tip of the semi-elliptical concave groove 70.
 また、隣り合う半楕円凹溝70の中心同士の距離(ピッチP)は、半楕円凸条17の形状に応じて適宜定められるが、例えば、30μm~500μm、好ましくは、40μm~450μmである。ピッチPが30μm未満の場合、樹脂が下ロール65に接触してすぐに固化するおそれがあり、その結果、樹脂が半楕円凹溝70の先端にまで入り込まず、目標とする転写形状を得ることができないおそれがある。一方、ピッチPが500μmを超えている場合、ピッチの筋が肉眼でも観察されたり、液晶パネル3や光学フィルム4などとの干渉縞模様が現れたりするおそれがある。 Further, the distance between the centers of the adjacent semi-elliptical grooves 70 (pitch P 1 ) is appropriately determined according to the shape of the semi-elliptical ridges 17, and is, for example, 30 μm to 500 μm, preferably 40 μm to 450 μm. . If the pitch P 1 is less than 30 [mu] m, there is a possibility that the resin solidifies immediately in contact with the lower roll 65, to obtain a result, the resin does not penetrate to the tip of the semi-elliptical groove 70, the imprint profile to target There is a risk that it will not be possible. On the other hand, if the pitch P 1 is greater than 500 [mu] m, there is a possibility that streaks of pitch or also observed with the naked eye, the interference fringe pattern between the liquid crystal panel 3 and the optical film 4 or appear.
 また、半楕円凹溝70のピッチPに対する高さHの比率(H/P)で表されるアスペクト比は、例えば、0.3以上、好ましくは、0.4~0.7である。なお、半楕円凸条17の高さH’と半楕円凹溝70の深さHとの差は、凹版転写型69が樹脂シート53に転写されて半楕円凸条17が形成される際の転写率(H’/H)(%)に起因するものである。 The aspect ratio represented by the ratio of the height H 1 to the pitch P 1 of the semi-elliptical concave groove 70 (H 1 / P 1 ) is, for example, 0.3 or more, preferably 0.4 to 0.7. It is. The difference between the height H 1 ′ of the semi-elliptical ridge 17 and the depth H 1 of the semi-elliptical concave groove 70 is that the intaglio transfer mold 69 is transferred to the resin sheet 53 to form the semi-elliptical ridge 17. This is due to the transfer rate (H 1 ′ / H 1 ) (%).
 このような形状の凹版転写型69の表面(樹脂シート53との接触面)には、有機ポリシロキサン処理が施されている。有機ポリシロキサン処理とは、有機ポリシロキサンを転写型の表面と接触させる処理である。有機ポリシロキサン処理により、この実施形態では、下ロール65にクロムメッキを施した際に生じた微細な孔(マイクロクラック)を有機ポリシロキサンで埋めることができる。有機ポリシロキサン処理は、例えば、有機ポリシロキサン溶液を凹版転写型69の表面に塗布し、乾燥させる方法、有機シロキサンを凹版転写型69の表面で重合させる方法、又は有機ポリシロキサンを凹版転写型69の材質(例えば、クロムメッキ)と化学的に反応させて結合させる方法により行うことができる。 The surface of the intaglio transfer mold 69 having such a shape (contact surface with the resin sheet 53) is subjected to organic polysiloxane treatment. The organic polysiloxane treatment is a treatment in which the organic polysiloxane is brought into contact with the transfer mold surface. By this organic polysiloxane treatment, in this embodiment, fine holes (microcracks) generated when chromium plating is applied to the lower roll 65 can be filled with the organic polysiloxane. The organic polysiloxane treatment is performed, for example, by applying an organic polysiloxane solution to the surface of the intaglio transfer mold 69 and drying it, by polymerizing organic siloxane on the surface of the intaglio transfer mold 69, or by treating the organic polysiloxane with the intaglio transfer mold 69. It can be carried out by a method of chemically reacting with a material (for example, chromium plating) and bonding.
 有機ポリシロキサンは、例えば、二官能シロキサン単位、三官能シロキサン単位および四官能シロキサン単位の骨格からなる。シロキサン骨格と結合する官能基としては、例えば、炭素数1~10の炭化水素基、好ましくは、炭素数1~6の炭化水素基が挙げられる。具体的には、例えば、メチル基、エチル基、プロピル基、イソプロピル基、ブチル基、イソブチル基、tert-ブチル基、ペンチル基、ネオペンチル基、ヘキシル基、オクチル基、ノニル基、デシル基などのアルキル基;シクロヘキシル基などのシクロアルキル基;フェニル基、トリル基、キシリル基、ナフチル基などのアリール基;ベンジル基、フェニルエチル基、フェニルプロピル基などのアラルキル基;ビニル基、アリル基、プロペニル基、イソプロペニル基、ブテニル基、ペンテニル基、ヘキセニル基、オクテニル基などのアルケニル基;シクロヘキセニル基などのシクロアルケニル基;上述した炭化水素基の水素原子の一部または全部をフッ素、臭素、塩素などのハロゲン原子、シアノ基などで置換したもの、具体的には、例えば、クロロメチル基、クロロプロピル基、ブロモエチル基、トリフロロプロピル基などのハロゲン置換アルキル基、例えば、シアノエチル基などが挙げられる。 The organic polysiloxane is composed of, for example, a skeleton of a bifunctional siloxane unit, a trifunctional siloxane unit, and a tetrafunctional siloxane unit. Examples of the functional group bonded to the siloxane skeleton include a hydrocarbon group having 1 to 10 carbon atoms, preferably a hydrocarbon group having 1 to 6 carbon atoms. Specifically, for example, alkyl such as methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tert-butyl, pentyl, neopentyl, hexyl, octyl, nonyl, decyl and the like A cycloalkyl group such as a cyclohexyl group; an aryl group such as a phenyl group, a tolyl group, a xylyl group, and a naphthyl group; an aralkyl group such as a benzyl group, a phenylethyl group, and a phenylpropyl group; a vinyl group, an allyl group, a propenyl group, Alkenyl groups such as isopropenyl group, butenyl group, pentenyl group, hexenyl group, octenyl group; cycloalkenyl group such as cyclohexenyl group; some or all of the hydrogen atoms of the above-described hydrocarbon groups are fluorine, bromine, chlorine, etc. Substituted by halogen atoms, cyano groups, etc. A chloromethyl group, chloropropyl group, bromoethyl group, a halogen-substituted alkyl groups such as trifluoropropyl group, for example, such as cyanoethyl group.
 また、有機ポリシロキサン処理後、凹版転写型69の表面を洗浄することにより、凹版転写型69の表面に残存する余分な有機ポリシロキサンを取り除くこともできる。これにより、有機ポリシロキサンが残存して凹版転写型69の表面に微細な凹凸が生じていても、その粗くなった表面を均すことができる。この凹版転写型69の洗浄は、例えば、有機ポリシロキサン処理後の凹版転写型69の表面を、繊維(例えば、コットン、シルクなど)で拭く方法により行うことができる。 Further, after the treatment with the organic polysiloxane, the surface of the intaglio transfer mold 69 can be washed to remove excess organic polysiloxane remaining on the surface of the intaglio transfer mold 69. Thereby, even if the organic polysiloxane remains and fine irregularities are generated on the surface of the intaglio transfer mold 69, the roughened surface can be leveled. The intaglio transfer mold 69 can be cleaned by, for example, a method of wiping the surface of the intaglio transfer mold 69 after the organic polysiloxane treatment with fibers (for example, cotton, silk, etc.).
 上記のような有機ポリシロキサン処理が施されることにより、凹版転写型69の表面のJIS K 6768に準拠して測定される濡れ張力は、35mN/m以下とされている。凹版転写型69の表面の濡れ張力は、好ましくは、5mN/m~30mN/mである。この濡れ張力が35mN/mを超えると、巻き付き現象が発生しやすくなる。一方、濡れ張力が5mN/m未満であると、形状転写が不十分になる傾向がある。 When the above-described organic polysiloxane treatment is performed, the wetting tension measured in accordance with JIS K 6768 on the surface of the intaglio transfer mold 69 is set to 35 mN / m or less. The surface tension of the intaglio transfer mold 69 is preferably 5 mN / m to 30 mN / m. When this wetting tension exceeds 35 mN / m, a winding phenomenon is likely to occur. On the other hand, when the wetting tension is less than 5 mN / m, shape transfer tends to be insufficient.
 また、押圧ロール63,64,65の回転軸にはそれぞれモータ(図示せず)が接続されていて、上ロール63および下ロール65が、図6において反時計回りに回転可能であり、中間ロール64が時計回りに回転可能である。すなわち、押圧ロール63,64,65は、上から順に「反時計回りに回転可能」、「時計回りに回転可能」、「反時計回りに回転可能」である。これにより、全てのロール63,64,65が樹脂シート53を挟みこんだ状態で同期回転することができる。また、押圧ロール63,64,65の回転速度を適宜調節することにより、樹脂シート53の搬送速度を調整することができる。 Further, motors (not shown) are connected to the rotation shafts of the pressing rolls 63, 64, 65, respectively, and the upper roll 63 and the lower roll 65 can rotate counterclockwise in FIG. 64 can rotate clockwise. That is, the pressing rolls 63, 64, 65 are “rotatable counterclockwise”, “rotatable clockwise”, and “rotatable counterclockwise” in order from the top. Thereby, all the rolls 63, 64, 65 can be rotated synchronously with the resin sheet 53 sandwiched therebetween. Moreover, the conveyance speed of the resin sheet 53 can be adjusted by adjusting the rotational speed of the press rolls 63, 64, and 65 as appropriate.
 各押圧ロール63,64,65の直径は、例えば、100mm~500mmである。また、押圧ロール63,64,65として金属製ロールが用いられる場合、その表面に、例えば、クロムメッキ、銅メッキ、ニッケルメッキ、Ni-Pメッキなどのメッキ処理が施されていてもよい。 The diameter of each pressing roll 63, 64, 65 is, for example, 100 mm to 500 mm. Further, when a metal roll is used as the pressing rolls 63, 64, 65, the surface thereof may be plated with, for example, chrome plating, copper plating, nickel plating, Ni—P plating or the like.
 また、中間ロール64の近くには、中間ロール64上を搬送される樹脂シート53の表面76(転写される側の表面)を加熱するためのヒータ72が設置されていてもよい。ヒータ72は、中間ロール64の周面67に対して離間するように対向配置されていて、搬送される樹脂シート53を表面76側から加熱する。ヒータ72としては、例えば、赤外線ヒータなど、公知のヒータを用いることができる。また、ヒータ72は、樹脂シート53が搬送されるラインに設置するインラインタイプのものであってもよいし、作業者が手に持って熱を照射できるハンディタイプのものであってもよい。 Further, a heater 72 for heating the surface 76 (surface on the transfer side) of the resin sheet 53 conveyed on the intermediate roll 64 may be installed near the intermediate roll 64. The heater 72 is disposed so as to be separated from the peripheral surface 67 of the intermediate roll 64, and heats the resin sheet 53 being conveyed from the surface 76 side. As the heater 72, for example, a known heater such as an infrared heater can be used. The heater 72 may be an in-line type installed in a line where the resin sheet 53 is conveyed, or may be a handy type that can be held by a worker and irradiated with heat.
 一対の引取ロール群55は、樹脂シート53を厚さ方向両側から挟み込む一対の引取ロール85,86を含んでいる。引取ロール85,86は、それぞれ円柱状のロール(通常、表面が樹脂製のロール)からなり、下側の引取ロール85の上端が下ロール65の下端とほぼ同じ高さ位置となるように対向設置されている。これにより、下ロール65から送出される樹脂シート53を、送出直後の高さで支持したまま水平搬送できるので、搬送抵抗を小さくすることができる。 The pair of take-up roll groups 55 includes a pair of take-up rolls 85 and 86 that sandwich the resin sheet 53 from both sides in the thickness direction. The take-up rolls 85 and 86 are each formed of a cylindrical roll (usually a roll made of resin), and face each other so that the upper end of the lower take-up roll 85 is substantially at the same height as the lower end of the lower roll 65. is set up. Thereby, since the resin sheet 53 delivered from the lower roll 65 can be horizontally conveyed while being supported at the height immediately after the delivery, the conveyance resistance can be reduced.
 次いで、上記した製造装置を用いた樹脂シート53の製造方法を説明する。
(1)押出工程
 まず、シート成形機52のホッパ57に原料樹脂が投入され、シリンダ56で溶融混練された後、フィードブロック(図示せず)に供給される。シリンダ56内の温度は、樹脂シート53が中間ロール64と接する前の裏面75の中間ロール64入口における温度T(R2B)(本明細書において、樹脂シート53表面の中間ロール64入口における温度を「T(R2B)」と言う)が、好ましくは、200℃~290℃の範囲となるように適宜調節される。シリンダ56内の温度は、具体的には、190℃~250℃に設定されることが好ましい。
Next, a method for manufacturing the resin sheet 53 using the above-described manufacturing apparatus will be described.
(1) Extrusion Step First, the raw material resin is charged into the hopper 57 of the sheet forming machine 52, melted and kneaded by the cylinder 56, and then supplied to a feed block (not shown). The temperature in the cylinder 56 is the temperature T (R2B) at the inlet of the intermediate roll 64 on the back surface 75 before the resin sheet 53 contacts the intermediate roll 64 (in this specification, the temperature at the inlet of the intermediate roll 64 on the surface of the resin sheet 53 is “ T (R2B) ”) is preferably adjusted appropriately so as to be in the range of 200 ° C. to 290 ° C. Specifically, the temperature in the cylinder 56 is preferably set to 190 ° C. to 250 ° C.
 次いで、フィードブロック(図示せず)内の樹脂が、ダイ58から押し出されることにより、連続的に樹脂シート53として押し出される。 Next, the resin in the feed block (not shown) is continuously extruded as the resin sheet 53 by being extruded from the die 58.
(2)第1押圧工程および第1搬送工程
 ダイ58から押し出された樹脂シート53は、まず、上ロール63と中間ロール64との間(ギャップ)に送り込まれ(この際、必要に応じてメルトバンク(樹脂溜まり)が形成される)、上ロール63と中間ロール64とで挟み込まれて押圧される。その後、中間ロール64の周面67に裏面75(背面18)が密着して搬送される。搬送の際、樹脂シート53は中間ロール64により冷却されつつ、表面76側からヒータ72で加熱される。上ロール63および中間ロール64の表面温度としては、樹脂シート53の押出温度よりも低いことが好ましく、例えば、上ロール63の表面温度が40℃~160℃であり、中間ロール64の表面温度が50℃~200℃である。
(2) First Pressing Step and First Conveying Step The resin sheet 53 extruded from the die 58 is first fed into the gap (gap) between the upper roll 63 and the intermediate roll 64 (in this case, melted as necessary) A bank (resin pool) is formed) and the upper roll 63 and the intermediate roll 64 are sandwiched and pressed. Thereafter, the back surface 75 (back surface 18) is brought into close contact with the peripheral surface 67 of the intermediate roll 64 and conveyed. During conveyance, the resin sheet 53 is heated by the heater 72 from the surface 76 side while being cooled by the intermediate roll 64. The surface temperature of the upper roll 63 and the intermediate roll 64 is preferably lower than the extrusion temperature of the resin sheet 53. For example, the surface temperature of the upper roll 63 is 40 ° C. to 160 ° C., and the surface temperature of the intermediate roll 64 is 50 ° C. to 200 ° C.
 一方、ヒータ72の出力は、樹脂シート53が下ロール65と接する前の表面76の下ロール65入口における温度T(R3B)(本明細書において、樹脂シート53表面の下ロール65入口における温度を「T(R3B)」と言う)が、原料樹脂のガラス転移温度をTgとしたとき、好ましくは、Tg+50℃≦T(R3B)≦Tg+160℃の範囲、より好ましくは、Tg+70℃≦T(R3B)≦Tg+140℃の範囲となるように適宜調節される。これにより、適切な流動性を保持した状態の樹脂シート53を中間ロール64と下ロール65との間に突入させることができる。そのため、凹版転写型69の半楕円凹溝70の先端まで良好に樹脂を入り込ませることができる。なお、本明細書において樹脂のガラス転移温度Tgは、上述したような添加剤を添加する前の樹脂のガラス転移温度Tgを意味する。 On the other hand, the output of the heater 72 is the temperature T (R3B) at the lower roll 65 inlet of the surface 76 before the resin sheet 53 contacts the lower roll 65 (in this specification, the temperature at the lower roll 65 inlet of the surface of the resin sheet 53). “T (R3B)” is preferably Tg + 50 ° C. ≦ T (R3B) ≦ Tg + 160 ° C., more preferably Tg + 70 ° C. ≦ T (R3B), where Tg is the glass transition temperature of the raw material resin. It adjusts suitably so that it may become the range of <= Tg + 140 degreeC. Thereby, the resin sheet 53 in a state in which appropriate fluidity is maintained can be plunged between the intermediate roll 64 and the lower roll 65. Therefore, the resin can be satisfactorily introduced to the tip of the semi-elliptical concave groove 70 of the intaglio transfer mold 69. In addition, in this specification, the glass transition temperature Tg of resin means the glass transition temperature Tg of resin before adding an additive as mentioned above.
(3)第2押圧工程(転写工程)および第2搬送工程
 その後、搬送される樹脂シート53は、中間ロール64と下ロール65との間(ギャップ)に入り込み、中間ロール64と下ロール65とで挟み込まれて押圧される。そして、中間ロール64と下ロール65との押圧の際、樹脂シート53の表面76(前面16)には、凹版転写型69の表面形状が転写されることによりシートの流れ方向(送出方向)に平行な筋状の半楕円凸条17が多数本形成される。
(3) Second pressing step (transfer step) and second conveying step Thereafter, the conveyed resin sheet 53 enters between the intermediate roll 64 and the lower roll 65 (gap), and the intermediate roll 64 and the lower roll 65 It is inserted and pressed. Then, when the intermediate roll 64 and the lower roll 65 are pressed, the surface shape of the intaglio transfer mold 69 is transferred to the surface 76 (front surface 16) of the resin sheet 53 in the sheet flow direction (feeding direction). A large number of parallel stripe-like semi-elliptical ridges 17 are formed.
 その後、樹脂シート53は、下ロール65の周面68に表面76が密着して搬送される。樹脂シート53の押圧および搬送の際、下ロール65の表面温度T(R3)(本明細書において、下ロール65の表面温度を「T(R3)」と言う)は、原料樹脂のガラス転移温度をTgとしたとき、好ましくは、Tg-30℃≦T(R3)≦Tg+50℃の範囲、より好ましくは、Tg-20℃≦T(R3)≦Tg+40℃の範囲に調節される。例えば、ガラス転移温度Tgが102℃のスチレン系樹脂を使用する場合には、下ロール65の表面温度T(R3)は、下限が72℃、上限が152℃となるように調節される。 Thereafter, the resin sheet 53 is conveyed with the surface 76 in close contact with the peripheral surface 68 of the lower roll 65. When the resin sheet 53 is pressed and conveyed, the surface temperature T (R3) of the lower roll 65 (in this specification, the surface temperature of the lower roll 65 is referred to as “T (R3)”) is the glass transition temperature of the raw resin. Is preferably Tg−30 ° C. ≦ T (R3) ≦ Tg + 50 ° C., more preferably Tg−20 ° C. ≦ T (R3) ≦ Tg + 40 ° C. For example, when a styrene resin having a glass transition temperature Tg of 102 ° C. is used, the surface temperature T (R3) of the lower roll 65 is adjusted so that the lower limit is 72 ° C. and the upper limit is 152 ° C.
 下ロール65の表面温度T(R3)が、上記した範囲であれば、凹版転写型69に樹脂シート53が貼り付く「巻き付き現象」の発生を防止しつつ、凹版転写型69の半楕円凹溝70の先端まで良好に樹脂を入り込ませることができる。 If the surface temperature T (R3) of the lower roll 65 is in the above range, the semi-elliptical concave groove of the intaglio transfer mold 69 is prevented while preventing the “wrapping phenomenon” in which the resin sheet 53 sticks to the intaglio transfer mold 69. The resin can be satisfactorily introduced to the tip of 70.
 搬送後、樹脂シート53は、下ロール65の下端において下ロール65から剥離して、引取ロール群55へと水平方向に送出される。その後、一対の引取ロール85,86により引き取られて樹脂シート53が製造される。そして、樹脂シート53がさらに冷却された後、適当な大きさに切断されることにより、上記光拡散板10を得ることができる。 After the conveyance, the resin sheet 53 is peeled off from the lower roll 65 at the lower end of the lower roll 65 and is sent to the take-up roll group 55 in the horizontal direction. Thereafter, the resin sheet 53 is manufactured by being taken up by the pair of take-up rolls 85 and 86. And after the resin sheet 53 is further cooled, the said light diffusing plate 10 can be obtained by cut | disconnecting to a suitable magnitude | size.
 なお、樹脂シート53の搬送速度(製造ラインの速度)Vは、樹脂シート53(光拡散板10)の厚さT(mm)を用いて、好ましくは、0.2/T(m/min)≦V≦50/T(m/min)の範囲、より好ましくは、0.3/T(m/min)≦V≦40/T(m/min)の範囲となるように調節される。搬送速度Vが上記範囲であれば、凹版転写型69に樹脂シート53が貼り付く「巻き付き現象」の発生を防止しつつ、比較的短いサイクルタイムで樹脂シート53を生産できるので、生産性がよい。 In addition, the conveyance speed (speed of the production line) V of the resin sheet 53 is preferably 0.2 / T 1 (m / m) using the thickness T 1 (mm) of the resin sheet 53 (light diffusion plate 10). min) ≦ V ≦ 50 / T 1 (m / min), more preferably 0.3 / T 1 (m / min) ≦ V ≦ 40 / T 1 (m / min). Adjusted. If the conveyance speed V is in the above range, the resin sheet 53 can be produced in a relatively short cycle time while preventing the occurrence of the “wrapping phenomenon” in which the resin sheet 53 sticks to the intaglio transfer mold 69, so that productivity is good. .
(4)作用効果
 以上のように、本実施形態によれば、下ロール65の凹版転写型69の表面が、有機ポリシロキサン処理されている。これにより、下ロール65にクロムメッキを施した際に生じた微細な孔(マイクロクラック)を有機ポリシロキサンで埋めることができる。これにより、下ロール65の凹版転写型69の表面の濡れ張力は、35mN/m以下となっている。そのため、下ロール65の表面温度T(R3)が高くなっても、凹版転写型69に樹脂シート53が貼り付く「巻き付き現象」の発生を防止することができる。その結果、とりわけ、樹脂シート53の表面76の下ロール65入口における温度T(R3B)をTg+50℃≦T(R3B)≦Tg+160℃とし、下ロール65の表面温度T(R3)をTg-30℃≦T(R3)≦Tg+50℃とし、樹脂シート53の搬送速度Vを0.2/T(m/min)≦V≦50/T(m/min)とすることにより、凹版転写型69の半楕円凹溝70の先端まで樹脂をより良好に入り込ませることができる。また、得られる樹脂シート53におけるタックマークの発生をより効果的に防止することができる。
(4) Effects As described above, according to the present embodiment, the surface of the intaglio transfer mold 69 of the lower roll 65 is treated with organic polysiloxane. Thereby, the fine hole (micro crack) produced when the lower roll 65 is plated with chromium can be filled with the organic polysiloxane. Thereby, the wetting tension of the surface of the intaglio transfer mold 69 of the lower roll 65 is 35 mN / m or less. Therefore, even if the surface temperature T (R3) of the lower roll 65 is increased, it is possible to prevent the “winding phenomenon” in which the resin sheet 53 is stuck to the intaglio transfer mold 69. As a result, the temperature T (R3B) at the inlet of the lower roll 65 of the surface 76 of the resin sheet 53 is Tg + 50 ° C. ≦ T (R3B) ≦ Tg + 160 ° C., and the surface temperature T (R3) of the lower roll 65 is Tg−30 ° C. By setting ≦ T (R3) ≦ Tg + 50 ° C. and the conveyance speed V of the resin sheet 53 being 0.2 / T 1 (m / min) ≦ V ≦ 50 / T 1 (m / min), the intaglio transfer mold 69 The resin can be better penetrated to the tip of the semi-elliptical groove 70. Moreover, generation | occurrence | production of the tack mark in the resin sheet 53 obtained can be prevented more effectively.
 よって、本実施形態によれば、光学設計により最適化された凹版転写型69の形状を、樹脂シート53の半楕円凸条17として良好に再現することができる。したがって、この樹脂シート53からなる光拡散板10は、優れた光学特性を発現することができる。また、上記の方法に倣って光学フィルム4を製造すれば、その光学フィルム4は、優れた光学特性を発現することができる。 Therefore, according to the present embodiment, the shape of the intaglio transfer mold 69 optimized by the optical design can be reproduced well as the semi-elliptical ridges 17 of the resin sheet 53. Therefore, the light diffusing plate 10 made of the resin sheet 53 can exhibit excellent optical characteristics. Moreover, if the optical film 4 is manufactured according to said method, the optical film 4 can express the outstanding optical characteristic.
 すなわち、この実施形態で開示された製造手法を用いることにより、従来の製造手法では転写困難であった難易度の高いプリズム形状や、高H’/P’比(0.5以上)、狭ピッチ形状(30μm以下)についても、高い転写率で精度よく転写することができる。 That is, by using the manufacturing method disclosed in this embodiment, a highly difficult prism shape, which is difficult to transfer by the conventional manufacturing method, a high H 1 ′ / P 1 ′ ratio (0.5 or more), Even a narrow pitch shape (30 μm or less) can be accurately transferred at a high transfer rate.
 以上、本発明の一実施形態について説明したが、この発明はさらに他の実施形態で実施することもできる。 Although one embodiment of the present invention has been described above, the present invention can also be implemented in other embodiments.
 例えば、下ロール65の周面68には、凹版転写型69に代えて、図8に示す、断面が略半円形状(シリンドリカルレンズ形状)の半円凹溝78を有する凹版転写型77や、図9に示す、断面が略プリズム形状(例えば、頂点角度θが60°~120°)のプリズム凹溝80を有する凹版転写型79を設けることもできる。 For example, on the peripheral surface 68 of the lower roll 65, instead of the intaglio transfer mold 69, an intaglio transfer mold 77 having a semicircular groove 78 having a substantially semicircular cross section (cylindrical lens shape) shown in FIG. It is also possible to provide an intaglio transfer mold 79 having a prism groove 80 having a substantially prism shape (for example, a vertex angle θ of 60 ° to 120 °) shown in FIG.
 また、前述の実施形態では、凹版転写型69が設けられた形状ロールは、下ロール65として配置されていたが、図10に示す製造装置91のように、中間ロール64として配置されていてもよい。この場合、樹脂シート53の裏面75の中間ロール64入口における温度T(R2B)が、例えば、原料樹脂のガラス転移温度をTgとしたとき、好ましくはTg+50℃≦T(R2B)≦Tg+160℃の範囲、より好ましくは、Tg+70℃≦T(R2B)≦Tg+140℃の範囲となるように適宜調節する。樹脂シート53の裏面75の中間ロール64入口における温度T(R2B)の調節は、ヒータ72を、ダイ58から押し出された樹脂シート53の裏面75(転写される側の表面)を加熱できるように設置し、そのヒータ72の出力を調節したり、シリンダ56の温度を調節したりすることにより行うことができる。 Further, in the above-described embodiment, the shape roll provided with the intaglio transfer mold 69 is arranged as the lower roll 65, but it may be arranged as the intermediate roll 64 as in the manufacturing apparatus 91 shown in FIG. Good. In this case, the temperature T (R2B) at the entrance of the intermediate roll 64 on the back surface 75 of the resin sheet 53 is preferably in the range of Tg + 50 ° C. ≦ T (R2B) ≦ Tg + 160 ° C., where Tg is the glass transition temperature of the raw material resin. More preferably, the temperature is appropriately adjusted so that Tg + 70 ° C. ≦ T (R 2 B) ≦ Tg + 140 ° C. The temperature T (R2B) at the entrance of the intermediate roll 64 on the back surface 75 of the resin sheet 53 is adjusted so that the heater 72 can heat the back surface 75 (the surface on the transfer side) of the resin sheet 53 extruded from the die 58. It can be performed by installing and adjusting the output of the heater 72 or adjusting the temperature of the cylinder 56.
 また、前述の実施形態では、光拡散板10の背面18および光学フィルム4の背面23は、凹凸のない平坦面であるとしたが、例えば、エンボス加工などが施されて微細な凹凸を有するマット面であってもよい。その場合、図6に示す実施形態にあっては、樹脂シート53の裏面75をエンボス加工などすればよい。樹脂シート53の裏面75をエンボス加工するには、例えば、樹脂シート53の製造装置51において、中間ロール64の周面67にエンボス形状の転写型を設け、当該転写型を転写すればよい。また、図10の実施形態にあっては、樹脂シート53の表面76をエンボス加工などすればよい。樹脂シート53の表面76をエンボス加工するには、例えば、樹脂シート53の製造装置91において、下ロール65の周面68にエンボス形状の転写型を設け、当該転写型を転写すればよい。 In the above-described embodiment, the back surface 18 of the light diffusing plate 10 and the back surface 23 of the optical film 4 are flat surfaces without unevenness. For example, the mat has fine unevenness after being embossed or the like. It may be a surface. In that case, what is necessary is just to emboss the back surface 75 of the resin sheet 53 in embodiment shown in FIG. In order to emboss the back surface 75 of the resin sheet 53, for example, in the manufacturing apparatus 51 for the resin sheet 53, an embossed transfer mold may be provided on the peripheral surface 67 of the intermediate roll 64, and the transfer mold may be transferred. In the embodiment of FIG. 10, the surface 76 of the resin sheet 53 may be embossed. In order to emboss the surface 76 of the resin sheet 53, for example, in the manufacturing apparatus 91 for the resin sheet 53, an embossed transfer mold may be provided on the peripheral surface 68 of the lower roll 65, and the transfer mold may be transferred.
 また、押圧ロール群54は、前述の実施形態では、上ロール63、中間ロール64および下ロール65を鉛直方向に並べて配置する形態であったが、例えば、3つの押圧ロールを水平方向や斜め方向に並べて配置する形態であってもよい。また、転写技術上無関係なロールであれば、例えば、樹脂シート53の搬送や、樹脂シート53と押圧ロール63,64,65との密着を補助する、樹脂シート53に接するロール(タッチロール)が設けられていてもよい。 Moreover, although the press roll group 54 was a form which arrange | positions the upper roll 63, the intermediate | middle roll 64, and the lower roll 65 along with the perpendicular direction in the above-mentioned embodiment, for example, three press rolls are horizontal or diagonally arranged. It may be arranged side by side. In addition, if the roll is irrelevant in terms of transfer technology, for example, a roll (touch roll) in contact with the resin sheet 53 that assists the conveyance of the resin sheet 53 and the close contact between the resin sheet 53 and the pressing rolls 63, 64, 65 is used. It may be provided.
 また、前述の実施形態では、凹版転写型69の表面(樹脂シート53との接触面)に有機ポリシロキサン処理が施されている場合について説明したが、表面の濡れ張力が35mN/m以下であれば、有機ポリシロキサン処理が施されていなくてもよい。 In the above-described embodiment, the case where the surface of the intaglio transfer mold 69 (the contact surface with the resin sheet 53) is treated with an organic polysiloxane has been described. However, if the surface has a wetting tension of 35 mN / m or less. For example, the organic polysiloxane treatment may not be performed.
 また、例えば、光拡散板(樹脂シート)は、光拡散板10のような単層樹脂板に限定されるものではなく、例えば、2層樹脂板、3層樹脂板、4層以上の層からなる複数層の樹脂板であってもよい。また、光拡散板10は、バックライト用の光拡散板として好適に用いられるが、特にこのような用途に限定されるものではない。 Further, for example, the light diffusing plate (resin sheet) is not limited to a single layer resin plate like the light diffusing plate 10, for example, from a two-layer resin plate, a three-layer resin plate, four or more layers It may be a multi-layer resin plate. Moreover, although the light diffusing plate 10 is used suitably as a light diffusing plate for backlights, it is not particularly limited to such an application.
 また、バックライトシステム2は、液晶表示装置用の面光源装置として好適に用いられるが、特にこのような用途に限定されるものではない。その他、特許請求の範囲に記載された事項の範囲で種々の設計変更を施すことが可能である。 Further, the backlight system 2 is preferably used as a surface light source device for a liquid crystal display device, but is not particularly limited to such an application. In addition, various design changes can be made within the scope of matters described in the claims.
 次に、本発明を実施例および比較例に基づいて説明するが、本発明は下記の実施例によって限定されるものではない。 Next, the present invention will be described based on examples and comparative examples, but the present invention is not limited to the following examples.
<実施例1>
 図6に示す樹脂シート製造装置と同様の構成を有する装置を用いた。上ロールおよび中間ロールとして、表面にクロムメッキが施された鏡面冷却ロールを用いた。また、下ロールとして、表面材質がクロムからなり、当該表面の全域に、ロール回転方向と平行に図8に示すような凹型レンズ形状(略半円形状)の凹溝が形成され、かつ有機ポリシロキサン処理が施された形状ロールを用いた。凹型レンズ形状の凹溝を有する凹版転写型のピッチPは353μm、深さHは223.7μmであった。
<Example 1>
The apparatus which has the structure similar to the resin sheet manufacturing apparatus shown in FIG. 6 was used. As the upper roll and the intermediate roll, mirror surface cooling rolls having chromium plating on the surface were used. Further, as the lower roll, the surface material is made of chromium, and concave grooves having a concave lens shape (substantially semicircular shape) as shown in FIG. A shape roll subjected to siloxane treatment was used. The pitch P 1 of the intaglio transfer mold having concave lens-shaped concave grooves was 353 μm, and the depth H 1 was 223.7 μm.
 樹脂シートの製造に際しては、まず、スチレン樹脂(東洋スチレン株式会社製「HRM40」、Tg:102℃)を、スクリュー径40mmの押出機に供給し、シリンダ温度210℃~260℃で溶融混練した後、フィードブロックに供給した。次いで、フィードブロック内の樹脂を、幅250mmのTダイを経由させて、Tダイ温度250℃~260℃でシート状に連続的に押し出した。 In the production of the resin sheet, first, a styrene resin (“HRM40” manufactured by Toyo Styrene Co., Ltd., Tg: 102 ° C.) is supplied to an extruder having a screw diameter of 40 mm and melt-kneaded at a cylinder temperature of 210 ° C. to 260 ° C. , Fed to the feed block. Next, the resin in the feed block was continuously extruded into a sheet at a T die temperature of 250 ° C. to 260 ° C. via a T die having a width of 250 mm.
 その後、押し出された樹脂シート(連続樹脂シート)を、上ロール(鏡面冷却ロール)と中間ロール(鏡面冷却ロール)とで挟み込み、中間ロールの表面に巻きつけた状態で搬送した。続いて、搬送された樹脂シートを中間ロールと下ロール(形状ロール)とで挟み込み、下ロールの表面に巻きつけた状態で搬送し、下ロールから剥離した樹脂シートを引き取りロールで引き取った。これにより、表面(上面)に凹形状が転写された、厚さTが2mmの表面形状転写樹脂シートを得た。なお、シートの搬送速度(ライン速度)は、0.65m/min(0.2/T以上50/T以下の範囲内)であった。また、下ロールに接する前の樹脂シートの表面温度(下ロール入口における温度T(R3B))は、ヒータにより調節した。 Thereafter, the extruded resin sheet (continuous resin sheet) was sandwiched between an upper roll (mirror cooling roll) and an intermediate roll (mirror cooling roll) and conveyed in a state of being wound around the surface of the intermediate roll. Subsequently, the conveyed resin sheet was sandwiched between an intermediate roll and a lower roll (shape roll), conveyed while being wound around the surface of the lower roll, and the resin sheet peeled from the lower roll was taken up by the take-up roll. Accordingly, concave shape on a surface (upper surface) is transferred, the thickness T 1 is to obtain a surface profile transfer resin sheet 2 mm. The sheet conveyance speed (line speed) was 0.65 m / min (within a range of 0.2 / T 1 or more and 50 / T 1 or less). Further, the surface temperature of the resin sheet before contacting the lower roll (temperature T (R3B) at the lower roll inlet) was adjusted by a heater.
 そして、樹脂シート表面の下ロール入口における温度T(R3B)および下ロールの表面温度T(R3)を変化させ、各条件下の製造工程における巻き付き現象の発生の有無を確認した。また、得られた樹脂シートの断面を顕微鏡で観察し、凸条の高さH’を測定することにより形状転写率を求めた。
 形状転写率(%)=(樹脂シートの凸条の高さH’/下ロールの凹溝の深さH)×100
And the temperature T (R3B) in the lower roll inlet of the resin sheet surface and the surface temperature T (R3) of a lower roll were changed, and the presence or absence of the winding phenomenon in the manufacturing process of each condition was confirmed. Moreover, the cross section of the obtained resin sheet was observed with a microscope, and the shape transfer rate was determined by measuring the height H 1 ′ of the ridges.
Shape transfer rate (%) = (height H 1 ′ of protrusions of resin sheet / depth H 1 of concave grooves of lower roll) × 100
 また、下ロールの凹版転写型の表面の濡れ張力を、JIS K 6768に準拠して以下の方法により測定したところ、23mN/mであった。具体的には、濡れ張力は、和光純薬工業株式会社製「濡れ張力試験用混合液」(以下、単に「薬品」と言う)を用いて試験を行った。まず、凹版転写型(ワーク)の温度を23℃付近で安定させた。次に、凹版転写型の表面を、エタノールを浸み込ませた布で拭いた。次に、薬品に綿棒を浸し、綿棒に付着した薬品を、流れないように凹版転写型の真上に1滴載せた。そして、液を載せた3~5秒後に判定した。判定は、載せられた液を目視で観察することにより、「(1)液を弾いている」か「(2)液が濡れている」のどちらかを判断した。液が盛り上がり、大きさも変化しない場合を(1)と判断し、液が平らで、徐々に広がる場合を(2)と判断した。 Further, the wetting tension of the surface of the intaglio transfer mold of the lower roll was measured by the following method in accordance with JIS K 6768 and found to be 23 mN / m. Specifically, the wetting tension was tested using a “mixture for wetting tension test” (hereinafter, simply referred to as “medicine”) manufactured by Wako Pure Chemical Industries, Ltd. First, the temperature of the intaglio transfer mold (work) was stabilized at around 23 ° C. Next, the surface of the intaglio transfer mold was wiped with a cloth soaked with ethanol. Next, a cotton swab was immersed in the chemical, and one drop of the chemical adhering to the cotton swab was placed on the intaglio transfer mold so as not to flow. The determination was made 3 to 5 seconds after placing the liquid. The determination was made by visually observing the placed liquid to determine whether “(1) the liquid is playing” or “(2) the liquid is wet”. The case where the liquid swelled and the size did not change was determined as (1), and the case where the liquid was flat and gradually spread was determined as (2).
 判定後、結果が(1)なら、より数値(濡れ張力)の小さな薬品に進み、結果が(2)なら、より数値(濡れ張力)の大きな薬品に進んだ。この操作を繰り返し、凹版転写型の表面を確実に濡らすことができる濡れ張力の薬品を絞り込み、その薬品の濡れ張力を測定結果とした。 After the judgment, if the result is (1), the process proceeds to a chemical having a smaller numerical value (wetting tension), and if the result is (2), the process proceeds to a chemical having a larger numerical value (wetting tension). This operation was repeated to narrow down the chemicals with wet tension that can reliably wet the surface of the intaglio transfer mold, and the wet tension of the chemicals was used as the measurement result.
<実施例2>
 下ロール(形状ロール)として、実施例1の有機ポリシロキサン処理後、凹版転写型の表面をコットン布で拭くことにより、当該表面が洗浄されたロールを用いたこと以外は、実施例1と同様の方法・条件により、樹脂シートを作製した。
<Example 2>
As the lower roll (shape roll), the same process as in Example 1 was used except that the surface of the intaglio transfer mold was wiped with a cotton cloth after the organopolysiloxane treatment of Example 1 and the surface was washed. A resin sheet was prepared according to the methods and conditions described above.
 そして、樹脂シート表面の下ロール入口における温度T(R3B)および下ロールの表面温度T(R3)を変化させ、各条件下の製造工程における巻き付き現象の発生の有無を確認した。また、得られた樹脂シートの断面を顕微鏡で観察し、凸条の高さH’を測定することにより形状転写率を求めた。また、下ロールの凹版転写型の表面の濡れ張力を、実施例1と同様の方法により測定したところ、23mN/mであった。 And the temperature T (R3B) in the lower roll inlet of the resin sheet surface and the surface temperature T (R3) of a lower roll were changed, and the presence or absence of the winding phenomenon in the manufacturing process of each condition was confirmed. Moreover, the cross section of the obtained resin sheet was observed with a microscope, and the shape transfer rate was determined by measuring the height H 1 ′ of the ridges. Further, the wetting tension of the surface of the intaglio transfer mold of the lower roll was measured by the same method as in Example 1 and found to be 23 mN / m.
<比較例1>
 下ロール(形状ロール)として、有機ポリシロキサン処理が施されていないロールを用いたこと以外は、実施例1と同様の方法・条件により、樹脂シートを作製した。
<Comparative Example 1>
A resin sheet was produced by the same method and conditions as in Example 1 except that a roll not subjected to organic polysiloxane treatment was used as the lower roll (shape roll).
 そして、樹脂シート表面の下ロール入口における温度T(R3B)および下ロールの表面温度T(R3)を変化させ、各条件下の製造工程における巻き付き現象の発生の有無を確認した。また、得られた樹脂シートの断面を顕微鏡で観察し、凸条の高さH’を測定することにより形状転写率を求めた。また、下ロールの凹版転写型の表面の濡れ張力を、実施例1と同様の方法により測定したところ、42mN/mであった。 And the temperature T (R3B) in the lower roll inlet of the resin sheet surface and the surface temperature T (R3) of a lower roll were changed, and the presence or absence of the winding phenomenon in the manufacturing process of each condition was confirmed. Moreover, the cross section of the obtained resin sheet was observed with a microscope, and the shape transfer rate was determined by measuring the height H 1 ′ of the ridges. Further, the wetting tension of the surface of the intaglio transfer mold of the lower roll was measured by the same method as in Example 1, and it was 42 mN / m.
<実施例3>
 図10に示す樹脂シート製造装置と同様の構成を有する装置を用いた。上ロールおよび下ロールとして、表面にクロムメッキが施された鏡面冷却ロールを用いた。また、中間ロールとして、表面材質がクロムからなり、当該表面の全域に、ロール回転方向と平行に図8に示すような凹型レンズ形状(略半円形状)の凹溝が形成され、かつ有機ポリシロキサン処理が施された形状ロールを用いた。凹型レンズ形状の凹溝を有する凹版転写型のピッチPは353μm、深さHは223.7μmであった。
<Example 3>
The apparatus which has the structure similar to the resin sheet manufacturing apparatus shown in FIG. 10 was used. As the upper roll and the lower roll, mirror surface cooling rolls having a surface plated with chromium were used. Further, as the intermediate roll, the surface material is made of chrome, and concave grooves having a concave lens shape (substantially semicircular shape) as shown in FIG. A shape roll subjected to siloxane treatment was used. The pitch P 1 of the intaglio transfer mold having concave lens-shaped concave grooves was 353 μm, and the depth H 1 was 223.7 μm.
 樹脂シートの製造に際しては、まず、ポリカーボネート樹脂(住友ダウ株式会社製「カリバー200-30」、JIS7212-1987に準拠して測定されたガラス転移温度Tg:147℃)を、スクリュー径40mmの押出機に供給し、シリンダ温度210℃~260℃で溶融混練した後、フィードブロックに供給した。次いで、フィードブロック内の樹脂を、幅250mmのTダイを経由させて、Tダイ温度250℃~260℃でシート状に連続的に押し出した。 In the production of the resin sheet, first, a polycarbonate resin (“Caliber 200-30” manufactured by Sumitomo Dow Co., Ltd., glass transition temperature Tg measured in accordance with JIS 7212-1987, Tg: 147 ° C.) is used as an extruder having a screw diameter of 40 mm. The mixture was melt-kneaded at a cylinder temperature of 210 ° C. to 260 ° C. and then supplied to the feed block. Next, the resin in the feed block was continuously extruded into a sheet at a T die temperature of 250 ° C. to 260 ° C. via a T die having a width of 250 mm.
 その後、押し出された樹脂シート(連続樹脂シート)を、上ロール(鏡面冷却ロール)と中間ロール(形状ロール)とで挟み込み、中間ロールの表面に巻きつけた状態で搬送した。続いて、搬送された樹脂シートを中間ロールと下ロール(鏡面冷却ロール)とで挟み込み、下ロールの表面に巻きつけた状態で搬送し、下ロールから剥離した樹脂シートを引き取りロールで引き取った。これにより、表面(下面)に凹形状が転写された、厚さTが1.2mmの表面形状転写樹脂シートを得た。なお、シートの搬送速度(ライン速度)は、0.90m/min(0.2/T以上50/T以下の範囲)であった。 Thereafter, the extruded resin sheet (continuous resin sheet) was sandwiched between an upper roll (mirror cooling roll) and an intermediate roll (shape roll) and conveyed in a state of being wound around the surface of the intermediate roll. Then, the conveyed resin sheet was pinched | interposed with the intermediate roll and the lower roll (mirror surface cooling roll), conveyed in the state wound around the surface of the lower roll, and the resin sheet peeled from the lower roll was taken up with the take-up roll. Accordingly, concave shape on a surface (lower surface) has been transferred, the thickness T 1 is to obtain a surface profile transfer resin sheet 1.2 mm. The sheet conveyance speed (line speed) was 0.90 m / min (range of 0.2 / T 1 or more and 50 / T 1 or less).
 そして、樹脂シート表面の中間ロール入口における温度T(R2B)を変化させ、各条件下の製造工程における巻き付き現象の発生の有無を確認した。また、得られた樹脂シートの断面を顕微鏡で観察し、凸条の高さH’を測定することにより形状転写率を求めた。また、中間ロールの凹版転写型の表面の濡れ張力を、実施例1と同様の方法により測定したところ、23mN/mであった。 And the temperature T (R2B) in the intermediate | middle roll inlet_port | entrance of the resin sheet surface was changed, and the presence or absence of the generation | occurrence | production of the winding phenomenon in the manufacturing process of each condition was confirmed. Moreover, the cross section of the obtained resin sheet was observed with a microscope, and the shape transfer rate was determined by measuring the height H 1 ′ of the ridges. Further, the wetting tension of the surface of the intaglio transfer mold of the intermediate roll was measured by the same method as in Example 1, and found to be 23 mN / m.
<比較例2>
 中間ロール(形状ロール)として、有機ポリシロキサン処理が施されていないロールを用いたこと以外は、実施例3と同様の方法・条件により、樹脂シートを作製した。
<Comparative example 2>
A resin sheet was produced by the same method and conditions as in Example 3 except that a roll not subjected to organic polysiloxane treatment was used as an intermediate roll (shape roll).
 製造の際、当該製造工程における巻き付き現象の発生の有無を確認した。また、得られた樹脂シートの断面を顕微鏡で観察し、凸条の高さH’を測定することにより形状転写率を求めた。また、下ロールの凹版転写型の表面の濡れ張力を、実施例1と同様の方法により測定したところ、42mN/mであった。 During the production, whether or not the winding phenomenon occurred in the production process was confirmed. Moreover, the cross section of the obtained resin sheet was observed with a microscope, and the shape transfer rate was determined by measuring the height H 1 ′ of the ridges. Further, the wetting tension of the surface of the intaglio transfer mold of the lower roll was measured by the same method as in Example 1, and it was 42 mN / m.
<評価>
(1)形状転写率および巻き付き現象評価
 実施例1~2および比較例1の製造方法により得られた樹脂シートの形状転写率および巻き付き現象の有無の評価結果を下記表1に示す。また、実施例3および比較例2の製造方法により得られた樹脂シートの形状転写率および巻き付き現象の有無の評価結果を下記表2に示す。なお、巻き付き現象の有無の評価は、下記の基準で判定した。
A:巻き付き無し
B:少し巻き付きあり
C:巻き付きあり(Bよりも巻き付きが大きい)
<Evaluation>
(1) Evaluation of Shape Transfer Rate and Winding Phenomenon Evaluation results of the shape transfer rate of the resin sheets obtained by the production methods of Examples 1 and 2 and Comparative Example 1 and the presence or absence of the winding phenomenon are shown in Table 1 below. Table 2 below shows the results of evaluating the shape transfer rate of the resin sheets obtained by the production methods of Example 3 and Comparative Example 2 and the presence or absence of the winding phenomenon. In addition, evaluation of the presence or absence of the winding phenomenon was determined according to the following criteria.
A: No winding B: A little winding C: Winding (winding is larger than B)
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
(2)IR(Infrared Spectroscopy)分析
 実施例1~2および比較例1で使用された下ロール(形状ロール)の転写型表面の赤外吸収スペクトルを、ATR反射法にて測定した。得られたIRスペクトルを、図11に示す。図11に示すように、実施例1の転写型表面には、有機ポリシロキサンのスペクトルと同じ波数の位置にピークが見られたが、実施例2および比較例1の転写型表面にはピークが見られなかった。実施例2にピークが見られなかったのは、コットン布で転写型表面を拭いたので、これにより、クロムメッキの微細な孔に入りきらなかった有機ポリシロキサンが取り除かれたためであると考えられる。
(2) IR (Infrared Spectroscopy) Analysis The infrared absorption spectrum of the transfer mold surface of the lower roll (shape roll) used in Examples 1 and 2 and Comparative Example 1 was measured by the ATR reflection method. The obtained IR spectrum is shown in FIG. As shown in FIG. 11, the transfer mold surface of Example 1 showed a peak at the same wave number as the spectrum of the organopolysiloxane, but the transfer mold surface of Example 2 and Comparative Example 1 had a peak. I couldn't see it. The reason why the peak was not observed in Example 2 is considered to be that the transfer mold surface was wiped with a cotton cloth, and this removed organic polysiloxane that could not fit into the fine holes of the chrome plating. .
(3)TOF-SIMS(Time-of-Flight Secondary Ion Mass Spectrometry)分析
 実施例1~2および比較例1で使用された下ロール(形状ロール)の転写型表面の一部を、TOF-SIMS装置(Physical Electronics社製)により分析した。測定条件は以下のとおりとした。また、測定結果を下記表3に示す。なお、表3では、Positiveイオンマススペクトルの合計強度が1になるように、各Positiveイオンマススペクトルの強度を規格化した結果を示している。
・照射した一次イオン:69Ga
・測定面積:約80×80μm
・検出した二次イオン:Positive(C15SiおよびC21Si
・検出質量範囲:0.5~2000a.m.u
(3) TOF-SIMS (Time-of-Flight Secondary Ion Mass Spectrometry) Analysis A portion of the transfer mold surface of the lower roll (shape roll) used in Examples 1 and 2 and Comparative Example 1 was subjected to TOF-SIMS apparatus. (Analyzed by Physical Electronics). The measurement conditions were as follows. The measurement results are shown in Table 3 below. Table 3 shows the result of normalizing the intensity of each positive ion mass spectrum so that the total intensity of the positive ion mass spectrum is 1.
Irradiated primary ions: 69 Ga +
Measurement area: about 80 × 80 μm 2
· The detected secondary ions: Positive (C 5 H 15 Si 2 O + and C 7 H 21 Si 4 O 4 +)
Detection mass range: 0.5 to 2000 a. m. u
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003
 表3に示すように、実施例1の転写型表面には、実施例2および比較例1に比べて、有機ポリシロキサン由来のPositiveイオン(C15SiおよびC21Si )が多く検出された。実施例2の転写型表面で検出されたPositiveイオンが少なかったのは、コットン布で転写型表面を拭いたので、これにより、クロムメッキの微細な孔に入りきらなかった有機ポリシロキサンが取り除かれたためであると考えられる。 As shown in Table 3, compared with Example 2 and Comparative Example 1, the transfer mold surface of Example 1 has positive ions derived from organic polysiloxane (C 5 H 15 Si 2 O + and C 7 H 21 Si). A large amount of 4 O 4 + ) was detected. The positive ions detected on the surface of the transfer mold of Example 2 were less because the transfer mold surface was wiped with a cotton cloth, thereby removing the organopolysiloxane that could not fit into the fine holes of the chrome plating. This is probably because
 4…光学フィルム、10…光拡散板、53…樹脂シート、58…ダイ、63…上ロール、64…中間ロール、65…下ロール、69…凹版転写型、76…(樹脂シートの)表面、77…凹版転写型、79…凹版転写型。 4 ... optical film, 10 ... light diffusion plate, 53 ... resin sheet, 58 ... die, 63 ... upper roll, 64 ... intermediate roll, 65 ... lower roll, 69 ... intaglio transfer mold, 76 ... surface of (resin sheet), 77 ... Intaglio transfer mold, 79 ... Intaglio transfer mold.

Claims (4)

  1.  樹脂を加熱溶融状態でダイから連続的に押し出して連続樹脂シートを形成する押出工程と、
     JIS K 6768に準拠して測定される濡れ張力が35mN/m以下の表面を有する転写型を備えた形状ロールを用いて、前記連続樹脂シートの表面に前記転写型の前記表面を押し当てることにより、前記転写型の形状を前記連続樹脂シートの表面に転写する転写工程と、
    を含む、表面形状転写樹脂シートの製造方法。
    An extrusion process in which the resin is continuously extruded from the die in a heated and melted state to form a continuous resin sheet;
    By pressing the surface of the transfer mold against the surface of the continuous resin sheet using a shape roll having a transfer mold having a surface with a wetting tension of 35 mN / m or less measured according to JIS K 6768 A transfer step of transferring the shape of the transfer mold to the surface of the continuous resin sheet;
    A method for producing a surface shape transfer resin sheet.
  2.  前記形状ロールとして、前記表面に対して有機ポリシロキサン処理が施されている転写型を備えた形状ロールを用いる、請求項1に記載の表面形状転写樹脂シートの製造方法。 The method for producing a surface shape transfer resin sheet according to claim 1, wherein a shape roll having a transfer mold in which an organic polysiloxane treatment is applied to the surface is used as the shape roll.
  3.  前記形状ロールとして、前記有機ポリシロキサン処理後、前記表面が洗浄された転写型を備えた形状ロールを用いる、請求項2に記載の表面形状転写樹脂シートの製造方法。 The method for producing a surface shape transfer resin sheet according to claim 2, wherein a shape roll provided with a transfer mold whose surface is washed after the treatment with the organic polysiloxane is used as the shape roll.
  4.  前記樹脂のガラス転移温度をTg(℃)、転写後の前記連続樹脂シートの厚さをT(mm)として表したときに、
     前記形状ロールの表面温度がTg-30(℃)以上Tg+50(℃)以下であり、前記連続樹脂シートの搬送速度が0.2/T(m/min)以上50/T(m/min)以下であり、前記形状ロールに接触する前の前記連続樹脂シートの表面温度がTg+50(℃)以上Tg+160(℃)以下である条件下で前記転写工程を行う、請求項1~3のいずれか一項に記載の表面形状転写樹脂シートの製造方法。
    When the glass transition temperature of the resin is expressed as Tg (° C.) and the thickness of the continuous resin sheet after transfer is expressed as T (mm),
    The surface temperature of the shape roll is Tg−30 (° C.) or more and Tg + 50 (° C.) or less, and the conveying speed of the continuous resin sheet is 0.2 / T (m / min) or more and 50 / T (m / min) or less. The transfer step is performed under a condition that the surface temperature of the continuous resin sheet before contacting the shape roll is Tg + 50 (° C.) or more and Tg + 160 (° C.) or less. The manufacturing method of the surface shape transcription | transfer resin sheet of description.
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