WO2012020930A3 - 정전용량형 압력센서 및 그의 제조방법 - Google Patents
정전용량형 압력센서 및 그의 제조방법 Download PDFInfo
- Publication number
- WO2012020930A3 WO2012020930A3 PCT/KR2011/005364 KR2011005364W WO2012020930A3 WO 2012020930 A3 WO2012020930 A3 WO 2012020930A3 KR 2011005364 W KR2011005364 W KR 2011005364W WO 2012020930 A3 WO2012020930 A3 WO 2012020930A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- hollow
- insulating film
- disposed
- pressure sensor
- sealing film
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 4
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000007789 sealing Methods 0.000 abstract 4
- 238000001514 detection method Methods 0.000 abstract 3
- 230000003071 parasitic effect Effects 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 239000004020 conductor Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/12—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means by making use of variations in capacitance, i.e. electric circuits therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0042—Constructional details associated with semiconductive diaphragm sensors, e.g. etching, or constructional details of non-semiconductive diaphragms
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L19/00—Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges
- G01L19/0061—Electrical connection means
- G01L19/0069—Electrical connection means from the sensor to its support
- G01L19/0076—Electrical connection means from the sensor to its support using buried connections
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0072—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance
- G01L9/0073—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance using a semiconductive diaphragm
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/84—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by variation of applied mechanical force, e.g. of pressure
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Analytical Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Ceramic Engineering (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Measuring Fluid Pressure (AREA)
- Pressure Sensors (AREA)
Abstract
본 발명은 압력 검출시 공동 이외의 영역에서 잡음으로 작용하는 기생 정전용량을 최소화하여 미소 센서를 구현할 수 있는 정전용량형 압력센서 및 그의 제조방법을 제공하는데 그 목적이 있다. 이를 위해, 본 발명은 하부전극으로 기능하는 기판과, 상기 기판 상에 형성된 제1 절연막과, 상기 제1 절연막 상에 형성된 공동과, 상기 공동과 연통하는 개구부를 가지며, 상기 공동을 덮도록 상기 제1 절연막 상에 형성된 제2 절연막과, 상기 개구부를 매개로 상기 개구부와 상기 공동의 일부가 매립되도록 전도성 재질로 형성된 밀봉막과, 상기 공동과 중첩되도록 상기 제2 절연막 상에 형성된 상부전극을 포함하는 정전용량형 압력센서를 제공한다. 따라서, 본 발명에 의하면, 공동을 형성한 후 상기 공동의 양측부에 전도성 재질로 밀봉막을 앵커(anchor) 형상으로 형성하고, 상기 밀봉막과 전기적으로 분리되어 상기 공동과 중첩되는 상부전극을 형성하여 압력 검출시 실질적으로 영향을 미치는 공동 영역을 상기 밀봉막을 통해 특정 영역으로 제한함으로써 압력 검출시 공동 이외의 영역에서 잡음으로 작용하는 기생 정전용량을 최소화하여 미소 센서를 구현할 수 있다.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/814,304 US8754453B2 (en) | 2010-08-13 | 2011-07-21 | Capacitive pressure sensor and method for manufacturing same |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2010-0078321 | 2010-08-13 | ||
KR1020100078321A KR101215919B1 (ko) | 2010-08-13 | 2010-08-13 | 정전용량형 압력센서 및 그의 제조방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2012020930A2 WO2012020930A2 (ko) | 2012-02-16 |
WO2012020930A3 true WO2012020930A3 (ko) | 2012-05-03 |
Family
ID=45568005
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2011/005364 WO2012020930A2 (ko) | 2010-08-13 | 2011-07-21 | 정전용량형 압력센서 및 그의 제조방법 |
Country Status (3)
Country | Link |
---|---|
US (1) | US8754453B2 (ko) |
KR (1) | KR101215919B1 (ko) |
WO (1) | WO2012020930A2 (ko) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102472678B (zh) * | 2009-07-24 | 2014-04-23 | 罗姆股份有限公司 | 半导体压力传感器、压力传感器装置、电子设备以及半导体压力传感器的制造方法 |
US8368152B2 (en) * | 2011-04-18 | 2013-02-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | MEMS device etch stop |
US8900975B2 (en) | 2013-01-03 | 2014-12-02 | International Business Machines Corporation | Nanopore sensor device |
US9347840B2 (en) * | 2013-07-18 | 2016-05-24 | Xulite Semiconductor Products, Inc. | Two dimensional material-based pressure sensor |
US10444104B2 (en) * | 2016-11-30 | 2019-10-15 | Texas Instruments Incorporated | Methods and apparatus to calibrate micro-electromechanical systems |
US10197466B2 (en) | 2016-11-30 | 2019-02-05 | Texas Instruments Incorporated | Methods and apparatus to calibrate micro-electromechanical systems |
US10386256B2 (en) | 2016-11-30 | 2019-08-20 | Texas Instruments Incorporated | Methods and apparatus to calibrate micro-electromechanical systems |
KR102529493B1 (ko) | 2017-11-23 | 2023-05-04 | 현대자동차주식회사 | 연료전지 시스템용 압력 센서 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63250865A (ja) * | 1987-04-08 | 1988-10-18 | Nippon Denso Co Ltd | 圧力検出素子及びその製造方法 |
JPH11223569A (ja) * | 1998-02-04 | 1999-08-17 | Denso Corp | 半導体圧力センサの製造方法 |
JP2009296569A (ja) * | 2008-05-02 | 2009-12-17 | Canon Inc | 容量型機械電気変換素子の製造方法、及び容量型機械電気変換素子 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3310643C2 (de) * | 1983-03-24 | 1986-04-10 | Karlheinz Dr. 7801 Schallstadt Ziegler | Drucksensor |
DE69922727T2 (de) * | 1998-03-31 | 2005-12-15 | Hitachi, Ltd. | Kapazitiver Druckwandler |
JP4296731B2 (ja) * | 2001-07-18 | 2009-07-15 | 株式会社デンソー | 静電容量型圧力センサの製造方法 |
JP3778128B2 (ja) * | 2002-05-14 | 2006-05-24 | 株式会社デンソー | メンブレンを有する半導体装置の製造方法 |
TWI224191B (en) * | 2003-05-28 | 2004-11-21 | Au Optronics Corp | Capacitive semiconductor pressure sensor |
DE102005004878B4 (de) * | 2005-02-03 | 2015-01-08 | Robert Bosch Gmbh | Mikromechanischer kapazitiver Drucksensor und entsprechendes Herstellungsverfahren |
JP2007170843A (ja) | 2005-12-19 | 2007-07-05 | Yokogawa Electric Corp | 振動式トランスデューサおよびその製造方法 |
JP4988217B2 (ja) * | 2006-02-03 | 2012-08-01 | 株式会社日立製作所 | Mems構造体の製造方法 |
FR2923475B1 (fr) * | 2007-11-09 | 2009-12-18 | Commissariat Energie Atomique | Procede de realisation d'un dispositif a membrane suspendue |
US8089144B2 (en) * | 2008-12-17 | 2012-01-03 | Denso Corporation | Semiconductor device and method for manufacturing the same |
US9281415B2 (en) * | 2010-09-10 | 2016-03-08 | The Board Of Trustees Of The Leland Stanford Junior University | Pressure sensing apparatuses and methods |
US8749000B2 (en) * | 2012-02-15 | 2014-06-10 | Robert Bosch Gmbh | Pressure sensor with doped electrode |
-
2010
- 2010-08-13 KR KR1020100078321A patent/KR101215919B1/ko active IP Right Grant
-
2011
- 2011-07-21 US US13/814,304 patent/US8754453B2/en active Active
- 2011-07-21 WO PCT/KR2011/005364 patent/WO2012020930A2/ko active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63250865A (ja) * | 1987-04-08 | 1988-10-18 | Nippon Denso Co Ltd | 圧力検出素子及びその製造方法 |
JPH11223569A (ja) * | 1998-02-04 | 1999-08-17 | Denso Corp | 半導体圧力センサの製造方法 |
JP2009296569A (ja) * | 2008-05-02 | 2009-12-17 | Canon Inc | 容量型機械電気変換素子の製造方法、及び容量型機械電気変換素子 |
Also Published As
Publication number | Publication date |
---|---|
US20130126994A1 (en) | 2013-05-23 |
KR20120015845A (ko) | 2012-02-22 |
WO2012020930A2 (ko) | 2012-02-16 |
KR101215919B1 (ko) | 2012-12-27 |
US8754453B2 (en) | 2014-06-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2012020930A3 (ko) | 정전용량형 압력센서 및 그의 제조방법 | |
WO2012143784A3 (en) | Semiconductor device and manufacturing method thereof | |
WO2012099394A3 (en) | Touch panel and method for manufacturing the same | |
AU2014380483A1 (en) | Fingerprint recognition device, manufacturing method therefor and electronic device | |
WO2013109877A3 (en) | Chemical sensor with conductive cup-shaped sensor surface | |
WO2008086530A3 (en) | Mems sensor with cap electrode | |
WO2010032156A3 (en) | Capacitive micromachined ultrasound transducer | |
WO2012102746A8 (en) | Implantable capacitive pressure sensor apparatus and methods regarding same | |
WO2010101858A3 (en) | Hermetic packaging of integrated circuit components | |
WO2011156787A3 (en) | Pillar structure for memory device and method | |
WO2009134095A3 (ko) | 발광 소자 및 그 제조방법 | |
WO2018041834A3 (en) | An electrochemical sensor, and a method of forming an electrochemical sensor | |
WO2010095811A3 (ko) | 광소자용 기판, 이를 갖는 광소자 패키지 및 이의 제조 방법 | |
WO2012005851A3 (en) | Electrically conductive laminate structures, electrical interconnects, and method of forming electrical interconnects | |
WO2011025631A3 (en) | Semiconductor crystal based radiation detector and method of producing the same | |
WO2012058011A3 (en) | Interconnect structure with enhanced reliability | |
EP2363689A3 (en) | Motion sensor, and method of manufacturing motion sensor | |
WO2011005284A3 (en) | Encapsulated phase change cell structures and methods | |
WO2012091487A3 (ko) | 전극 및 이를 포함하는 전자소자 | |
WO2013061204A3 (en) | Pre-collapsed capacitive micro-machined transducer cell with plug | |
WO2010038976A3 (en) | Semiconductor light emitting device and method of manufacturing the same | |
WO2014096962A3 (en) | Recessed contact to semiconductor nanowires | |
WO2011043869A3 (en) | Semiconductor device having a copper plug | |
WO2012031963A3 (de) | Widerstandsbauelement und verfahren zur herstellung eines widerstandsbauelements | |
WO2012057504A3 (ko) | 태양전지 및 그 제조 방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 11816546 Country of ref document: EP Kind code of ref document: A2 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 13814304 Country of ref document: US |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 11816546 Country of ref document: EP Kind code of ref document: A2 |