WO2012020930A3 - 정전용량형 압력센서 및 그의 제조방법 - Google Patents

정전용량형 압력센서 및 그의 제조방법 Download PDF

Info

Publication number
WO2012020930A3
WO2012020930A3 PCT/KR2011/005364 KR2011005364W WO2012020930A3 WO 2012020930 A3 WO2012020930 A3 WO 2012020930A3 KR 2011005364 W KR2011005364 W KR 2011005364W WO 2012020930 A3 WO2012020930 A3 WO 2012020930A3
Authority
WO
WIPO (PCT)
Prior art keywords
hollow
insulating film
disposed
pressure sensor
sealing film
Prior art date
Application number
PCT/KR2011/005364
Other languages
English (en)
French (fr)
Other versions
WO2012020930A2 (ko
Inventor
황학인
이대성
신규식
Original Assignee
전자부품연구원
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 전자부품연구원 filed Critical 전자부품연구원
Priority to US13/814,304 priority Critical patent/US8754453B2/en
Publication of WO2012020930A2 publication Critical patent/WO2012020930A2/ko
Publication of WO2012020930A3 publication Critical patent/WO2012020930A3/ko

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L9/00Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
    • G01L9/12Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means by making use of variations in capacitance, i.e. electric circuits therefor
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L9/00Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
    • G01L9/0041Transmitting or indicating the displacement of flexible diaphragms
    • G01L9/0042Constructional details associated with semiconductive diaphragm sensors, e.g. etching, or constructional details of non-semiconductive diaphragms
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L19/00Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges
    • G01L19/0061Electrical connection means
    • G01L19/0069Electrical connection means from the sensor to its support
    • G01L19/0076Electrical connection means from the sensor to its support using buried connections
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01LMEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L9/00Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
    • G01L9/0041Transmitting or indicating the displacement of flexible diaphragms
    • G01L9/0072Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance
    • G01L9/0073Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance using a semiconductive diaphragm
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007Multistep manufacturing processes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/84Types of semiconductor device ; Multistep manufacturing processes therefor controllable by variation of applied mechanical force, e.g. of pressure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Ceramic Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Measuring Fluid Pressure (AREA)
  • Pressure Sensors (AREA)

Abstract

본 발명은 압력 검출시 공동 이외의 영역에서 잡음으로 작용하는 기생 정전용량을 최소화하여 미소 센서를 구현할 수 있는 정전용량형 압력센서 및 그의 제조방법을 제공하는데 그 목적이 있다. 이를 위해, 본 발명은 하부전극으로 기능하는 기판과, 상기 기판 상에 형성된 제1 절연막과, 상기 제1 절연막 상에 형성된 공동과, 상기 공동과 연통하는 개구부를 가지며, 상기 공동을 덮도록 상기 제1 절연막 상에 형성된 제2 절연막과, 상기 개구부를 매개로 상기 개구부와 상기 공동의 일부가 매립되도록 전도성 재질로 형성된 밀봉막과, 상기 공동과 중첩되도록 상기 제2 절연막 상에 형성된 상부전극을 포함하는 정전용량형 압력센서를 제공한다. 따라서, 본 발명에 의하면, 공동을 형성한 후 상기 공동의 양측부에 전도성 재질로 밀봉막을 앵커(anchor) 형상으로 형성하고, 상기 밀봉막과 전기적으로 분리되어 상기 공동과 중첩되는 상부전극을 형성하여 압력 검출시 실질적으로 영향을 미치는 공동 영역을 상기 밀봉막을 통해 특정 영역으로 제한함으로써 압력 검출시 공동 이외의 영역에서 잡음으로 작용하는 기생 정전용량을 최소화하여 미소 센서를 구현할 수 있다.
PCT/KR2011/005364 2010-08-13 2011-07-21 정전용량형 압력센서 및 그의 제조방법 WO2012020930A2 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US13/814,304 US8754453B2 (en) 2010-08-13 2011-07-21 Capacitive pressure sensor and method for manufacturing same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2010-0078321 2010-08-13
KR1020100078321A KR101215919B1 (ko) 2010-08-13 2010-08-13 정전용량형 압력센서 및 그의 제조방법

Publications (2)

Publication Number Publication Date
WO2012020930A2 WO2012020930A2 (ko) 2012-02-16
WO2012020930A3 true WO2012020930A3 (ko) 2012-05-03

Family

ID=45568005

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2011/005364 WO2012020930A2 (ko) 2010-08-13 2011-07-21 정전용량형 압력센서 및 그의 제조방법

Country Status (3)

Country Link
US (1) US8754453B2 (ko)
KR (1) KR101215919B1 (ko)
WO (1) WO2012020930A2 (ko)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102472678B (zh) * 2009-07-24 2014-04-23 罗姆股份有限公司 半导体压力传感器、压力传感器装置、电子设备以及半导体压力传感器的制造方法
US8368152B2 (en) * 2011-04-18 2013-02-05 Taiwan Semiconductor Manufacturing Company, Ltd. MEMS device etch stop
US8900975B2 (en) 2013-01-03 2014-12-02 International Business Machines Corporation Nanopore sensor device
US9347840B2 (en) * 2013-07-18 2016-05-24 Xulite Semiconductor Products, Inc. Two dimensional material-based pressure sensor
US10444104B2 (en) * 2016-11-30 2019-10-15 Texas Instruments Incorporated Methods and apparatus to calibrate micro-electromechanical systems
US10197466B2 (en) 2016-11-30 2019-02-05 Texas Instruments Incorporated Methods and apparatus to calibrate micro-electromechanical systems
US10386256B2 (en) 2016-11-30 2019-08-20 Texas Instruments Incorporated Methods and apparatus to calibrate micro-electromechanical systems
KR102529493B1 (ko) 2017-11-23 2023-05-04 현대자동차주식회사 연료전지 시스템용 압력 센서

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63250865A (ja) * 1987-04-08 1988-10-18 Nippon Denso Co Ltd 圧力検出素子及びその製造方法
JPH11223569A (ja) * 1998-02-04 1999-08-17 Denso Corp 半導体圧力センサの製造方法
JP2009296569A (ja) * 2008-05-02 2009-12-17 Canon Inc 容量型機械電気変換素子の製造方法、及び容量型機械電気変換素子

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3310643C2 (de) * 1983-03-24 1986-04-10 Karlheinz Dr. 7801 Schallstadt Ziegler Drucksensor
DE69922727T2 (de) * 1998-03-31 2005-12-15 Hitachi, Ltd. Kapazitiver Druckwandler
JP4296731B2 (ja) * 2001-07-18 2009-07-15 株式会社デンソー 静電容量型圧力センサの製造方法
JP3778128B2 (ja) * 2002-05-14 2006-05-24 株式会社デンソー メンブレンを有する半導体装置の製造方法
TWI224191B (en) * 2003-05-28 2004-11-21 Au Optronics Corp Capacitive semiconductor pressure sensor
DE102005004878B4 (de) * 2005-02-03 2015-01-08 Robert Bosch Gmbh Mikromechanischer kapazitiver Drucksensor und entsprechendes Herstellungsverfahren
JP2007170843A (ja) 2005-12-19 2007-07-05 Yokogawa Electric Corp 振動式トランスデューサおよびその製造方法
JP4988217B2 (ja) * 2006-02-03 2012-08-01 株式会社日立製作所 Mems構造体の製造方法
FR2923475B1 (fr) * 2007-11-09 2009-12-18 Commissariat Energie Atomique Procede de realisation d'un dispositif a membrane suspendue
US8089144B2 (en) * 2008-12-17 2012-01-03 Denso Corporation Semiconductor device and method for manufacturing the same
US9281415B2 (en) * 2010-09-10 2016-03-08 The Board Of Trustees Of The Leland Stanford Junior University Pressure sensing apparatuses and methods
US8749000B2 (en) * 2012-02-15 2014-06-10 Robert Bosch Gmbh Pressure sensor with doped electrode

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63250865A (ja) * 1987-04-08 1988-10-18 Nippon Denso Co Ltd 圧力検出素子及びその製造方法
JPH11223569A (ja) * 1998-02-04 1999-08-17 Denso Corp 半導体圧力センサの製造方法
JP2009296569A (ja) * 2008-05-02 2009-12-17 Canon Inc 容量型機械電気変換素子の製造方法、及び容量型機械電気変換素子

Also Published As

Publication number Publication date
US20130126994A1 (en) 2013-05-23
KR20120015845A (ko) 2012-02-22
WO2012020930A2 (ko) 2012-02-16
KR101215919B1 (ko) 2012-12-27
US8754453B2 (en) 2014-06-17

Similar Documents

Publication Publication Date Title
WO2012020930A3 (ko) 정전용량형 압력센서 및 그의 제조방법
WO2012143784A3 (en) Semiconductor device and manufacturing method thereof
WO2012099394A3 (en) Touch panel and method for manufacturing the same
AU2014380483A1 (en) Fingerprint recognition device, manufacturing method therefor and electronic device
WO2013109877A3 (en) Chemical sensor with conductive cup-shaped sensor surface
WO2008086530A3 (en) Mems sensor with cap electrode
WO2010032156A3 (en) Capacitive micromachined ultrasound transducer
WO2012102746A8 (en) Implantable capacitive pressure sensor apparatus and methods regarding same
WO2010101858A3 (en) Hermetic packaging of integrated circuit components
WO2011156787A3 (en) Pillar structure for memory device and method
WO2009134095A3 (ko) 발광 소자 및 그 제조방법
WO2018041834A3 (en) An electrochemical sensor, and a method of forming an electrochemical sensor
WO2010095811A3 (ko) 광소자용 기판, 이를 갖는 광소자 패키지 및 이의 제조 방법
WO2012005851A3 (en) Electrically conductive laminate structures, electrical interconnects, and method of forming electrical interconnects
WO2011025631A3 (en) Semiconductor crystal based radiation detector and method of producing the same
WO2012058011A3 (en) Interconnect structure with enhanced reliability
EP2363689A3 (en) Motion sensor, and method of manufacturing motion sensor
WO2011005284A3 (en) Encapsulated phase change cell structures and methods
WO2012091487A3 (ko) 전극 및 이를 포함하는 전자소자
WO2013061204A3 (en) Pre-collapsed capacitive micro-machined transducer cell with plug
WO2010038976A3 (en) Semiconductor light emitting device and method of manufacturing the same
WO2014096962A3 (en) Recessed contact to semiconductor nanowires
WO2011043869A3 (en) Semiconductor device having a copper plug
WO2012031963A3 (de) Widerstandsbauelement und verfahren zur herstellung eines widerstandsbauelements
WO2012057504A3 (ko) 태양전지 및 그 제조 방법

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 11816546

Country of ref document: EP

Kind code of ref document: A2

WWE Wipo information: entry into national phase

Ref document number: 13814304

Country of ref document: US

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 11816546

Country of ref document: EP

Kind code of ref document: A2