WO2011158635A1 - 赤外線カットフィルタ - Google Patents
赤外線カットフィルタ Download PDFInfo
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- WO2011158635A1 WO2011158635A1 PCT/JP2011/062225 JP2011062225W WO2011158635A1 WO 2011158635 A1 WO2011158635 A1 WO 2011158635A1 JP 2011062225 W JP2011062225 W JP 2011062225W WO 2011158635 A1 WO2011158635 A1 WO 2011158635A1
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- Prior art keywords
- infrared
- wavelength
- transmittance
- cut filter
- light transmission
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- 230000000903 blocking effect Effects 0.000 title abstract 5
- 238000002834 transmittance Methods 0.000 claims abstract description 161
- 230000005540 biological transmission Effects 0.000 claims abstract description 113
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- 238000005520 cutting process Methods 0.000 claims description 5
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- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
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Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/26—Reflecting filters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
- G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
- G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
Definitions
- the present invention relates to an infrared cut filter that transmits light in the visible range and cuts infrared rays.
- an imaging optical system In an optical system of an electronic camera typified by a general video camera or a digital still camera, an imaging optical system, an infrared cut filter, an optical low-pass filter, a CCD (Charge Coupled Device) or CCD from the subject side along the optical axis.
- An imaging device such as a CMOS (Complementary Metal Oxide Semiconductor) is sequentially disposed (for example, refer to Patent Document 1).
- the imaging device here has a sensitivity characteristic that responds to light in a wider wavelength band than light in the wavelength band (visible range) visible to the human eye. In addition to the visible range, light in the infrared range Also respond to.
- the human eye responds to light having a wavelength in the range of about 400 nm to 620 nm in the dark place and responds to light having a wavelength in the range of about 420 nm to 700 nm in the bright place.
- a CCD responds to light having a wavelength in the range of 400 nm to 700 nm and further to light having a wavelength exceeding 700 nm.
- an infrared cut filter is provided in addition to the CCD that is the imaging device so that infrared rays do not reach the imaging device, and the captured image is close to the human eye. Is to be obtained.
- transmits the light ray (visible light) of visible region and absorbs the light ray (infrared ray) of infrared region, and permeate
- an infrared cut coat to do.
- the infrared absorbing glass for example, blue glass in which a pigment such as copper ion is dispersed is listed.
- a high refractive index material such as TiO 2 , ZrO 2 , Ta 2 O 5 , and Nb 2 O 5 and a low refractive index material such as SiO 2 and MgF 2 are alternately formed on a transparent substrate.
- a dielectric multilayer film having several tens of layers is listed.
- FIG. 7 shows light transmission characteristics L11 and L12 of two infrared absorbing glasses having different thicknesses. Specifically, the thickness of the infrared absorption glass showing the light transmission characteristics of L11 is set to be half or less of the thickness of the infrared absorption glass showing the light transmission characteristics of L12.
- infrared absorbing glass is used as the infrared cut filter, as shown by L11 and L12 in FIG. 7, “a characteristic that the transmittance gradually decreases, close to the sensitivity characteristic of the human eye, from the visible region to the infrared region. Can be obtained. Further, as can be seen from the comparison between L11 and L12, the transmittance in the visible region of the infrared absorbing glass, particularly the transmittance in the wavelength band of 600 nm to 700 nm, is higher as the thickness is thinner.
- the infrared absorbing glass having the light transmission characteristic indicated by L11 in FIG. 7 has a transmittance of about 10% with respect to a light beam having a wavelength of 700 nm and transmits a light beam having a wavelength of about 750 nm. For this reason, the infrared rays cannot be sufficiently cut, and the imaging device is caused to pick up an infrared region image that cannot be detected by human eyes.
- the transmittance with respect to a light beam having a wavelength of 700 nm is about It is 0%, and it is possible to sufficiently cut light having a wavelength exceeding 700 nm.
- an infrared absorbing glass having the light transmission characteristics shown in L12 has been used for the conventional infrared cut filter.
- the transmittance is about 650 nm at a wavelength of 640 nm because the light transmission characteristics are about 50% at a wavelength of 600 nm.
- the transmittance for red visible light having a wavelength of 600 nm to 700 nm is low, and the red visible light is sufficiently transmitted.
- An imaging element of an imaging device such as a CCD or a CMOS has a lower red sensitivity than blue or green. For this reason, if the transmission of red visible light is insufficient, the image sensor cannot sufficiently detect red, and the image captured by the imaging device is a dark image with weak redness.
- the point at which the transmittance was about 0% could not be adjusted to 700 nm while sufficiently transmitting red visible light.
- the infrared cut coat does not absorb and block infrared rays but reflects and blocks infrared rays. For this reason, the infrared cut coat urges generation of a ghost due to repeated reflection of light between the infrared cut coat and the imaging optical system.
- the present invention has been made in view of such a situation, and is capable of cutting light having a wavelength exceeding 700 nm while sufficiently transmitting red visible light having a wavelength of 600 nm to 700 nm, and
- An object of the present invention is to provide an infrared cut filter that can suppress the generation of ghosts.
- An infrared cut filter is an infrared cut filter that cuts infrared rays, and includes an infrared absorber that absorbs infrared rays and an infrared reflector that reflects infrared rays, and the infrared absorber has a wavelength of 620 nm to 670 nm.
- the infrared reflector has a light transmission characteristic with a transmittance of 50% at a wavelength in the wavelength band of 670 nm to 690 nm;
- the wavelength at which the infrared reflector exhibits a transmittance of 50% is longer than the wavelength at which the infrared absorber exhibits a transmittance of 50%.
- the wavelength may be 620 nm to 670 nm. It has a light transmission characteristic that the transmittance is 50% at a wavelength in the band and the transmittance is less than 5% at a wavelength of 700 nm.
- an infrared absorber exhibiting a light transmission characteristic having a transmittance of 50% at a wavelength in the wavelength band of 620 nm to 670 nm, and a transmittance of 50% at a wavelength in the wavelength band of 670 nm to 690 nm.
- the transmittance gradually decreases from the visible range to the infrared range, and the sensitivity characteristic of the human eye has a transmittance of about 0% at a wavelength of 700 nm. It is possible to obtain light transmission characteristics close to.
- the infrared absorber includes an infrared absorber having a light transmission characteristic with a transmittance of 50% at a wavelength in the wavelength band of 620 nm to 670 nm, for example, L11 in FIG.
- Infrared absorbing glass having light transmission characteristics is used, and the point at which the transmittance becomes about 0% (less than 5%) is that the infrared absorbing action of the infrared absorbing body is combined with the infrared reflecting action of the infrared reflecting body. Therefore, it is adjusted to 700 nm.
- the infrared cut filter of the present invention is higher in the visible region, particularly in the wavelength band of 600 nm to 700 nm, as compared with the conventional infrared cut filter made of infrared absorbing glass having the light transmission characteristics shown in L12 of FIG.
- the transmittance can be maintained. That is, it is possible to transmit a sufficient amount of red light (wavelength of 600 nm to 700 nm) that can be sensed by the imaging device of the imaging device while cutting infrared rays having a wavelength exceeding 700 nm.
- the infrared cut filter of the present invention to the infrared cut filter of the image pickup apparatus, the red sensitivity of the image pickup device is weak, and the disadvantage that the image picked up by the image pickup device tends to be a dark image can be solved. It becomes possible.
- the amount of light reflected by the infrared reflector is suppressed by combining the infrared reflector with the infrared reflector.
- the half-value wavelength (wavelength at which the transmittance is 50%) of the infrared reflector 3 is longer than the half-value wavelength of the infrared absorber 2, and the infrared reflector 3 absorbs infrared rays, thereby causing the infrared reflector 3 to
- the amount of reflected light (infrared light) is suppressed. For this reason, generation
- the thickness of the infrared absorbing glass having the light transmission characteristics shown in L11 of FIG. 7 having a transmittance of 50% at a wavelength of 640 nm has the light transmission characteristics shown in L12 of FIG. 7 used as a conventional infrared cut filter. As taught that the thickness is less than half of the thickness of the infrared absorbing glass, an infrared ray having a light transmission characteristic with a transmittance of 50% at a wavelength within the wavelength band of 620 nm to 670 nm constituting the infrared cut filter of the present invention.
- an absorber having a thickness smaller than that of an infrared cut filter made of a conventional infrared absorbing glass having a light transmission characteristic indicated by L12 in FIG. 7 can be used. For this reason, with the same thickness or thin thickness as a conventional infrared cut filter composed only of an infrared absorber, the infrared ray is cut while sufficiently transmitting red visible light, and in the visible range, An infrared cut filter having near light transmission characteristics can be provided.
- the infrared absorber has a light transmission characteristic such that the transmittance is 10% to 40% at a wavelength of 700 nm, and the infrared reflector has a transmittance at a wavelength of 700 nm. It may have a light transmission characteristic of less than 15%.
- an infrared absorber having a light transmission characteristic with a transmittance of 10% to 40% at a wavelength of 700 nm, and an infrared reflector having a light transmission characteristic with a transmittance of less than 15% at a wavelength of 700 nm In combination, it is possible to reliably obtain high transmittance in the wavelength band of red visible light (600 nm to 700 nm).
- the infrared reflector exhibits a transmittance of 80% or more at each wavelength within the wavelength band of 450 nm to 650 nm, and an average of the transmittance in the wavelength band of 450 nm to 650 nm. You may have the light transmission characteristic which is 90% or more.
- the light transmission characteristic depending on the light transmission characteristic of the infrared absorber is obtained in the wavelength band of 450 nm to 650 nm. Therefore, the transmittance gradually decreases from the visible region to the infrared region, and the wavelength of 700 nm is reduced.
- Light transmission characteristics close to the sensitivity characteristics of the human eye with a transmittance of about 0% at the wavelength can be obtained, and also high transmittance in the visible range, particularly in the wavelength band of red visible light (600 nm to 700 nm). Can be obtained.
- one infrared reflector may be provided on one main surface of the one infrared absorber.
- the imaging device incorporating the infrared cut filter can be reduced in thickness.
- an infrared cut filter capable of cutting light having a wavelength exceeding 700 nm while sufficiently transmitting red visible light having a wavelength of 600 nm to 700 nm and suppressing generation of a ghost.
- FIG. 1 is a schematic diagram illustrating a schematic configuration of an imaging apparatus using the infrared cut filter according to the first embodiment.
- FIG. 2 is a partially enlarged view showing a schematic configuration of the infrared reflector of the infrared cut filter according to Embodiment 1.
- FIG. 3 is a diagram showing the light transmission characteristics of the infrared cut filter according to Example 1 of the first embodiment.
- FIG. 4 is a diagram illustrating the light transmission characteristics of the infrared cut filter according to Example 2 of the first embodiment.
- FIG. 5 is a diagram showing the light transmission characteristics of the infrared cut filter according to Example 3 of the first embodiment.
- FIG. 6 is a schematic diagram showing a schematic configuration of an imaging apparatus using the infrared cut filter according to the second embodiment.
- FIG. 7 is a diagram showing the light transmission characteristics of the infrared absorbing glass.
- FIG. 8 is a diagram showing the light transmission characteristics of the infrared cut coat.
- the infrared cut filter 1 As shown in FIG. 1, the infrared cut filter 1 according to the first exemplary embodiment is disposed between the imaging optical system 4 and the imaging device 5 arranged along the optical axis of the imaging optical path in the imaging apparatus.
- the infrared cut filter 1 is formed by bonding an infrared absorber 2 that transmits visible light and absorbs infrared light, and an infrared reflector 3 that transmits visible light and reflects infrared light. That is, the infrared cut filter 1 is configured such that one infrared reflector 3 is provided on one main surface of one infrared absorber 2 (another main surface 212 of an infrared absorbing glass 21 described later).
- the infrared absorber 2 is formed by forming an antireflection film 22 (AR coating) on one main surface 211 of the infrared absorbing glass 21.
- AR coating antireflection film 22
- the infrared absorbing glass 21 is a blue glass in which a pigment such as copper ions is dispersed, and for example, a rectangular thin glass having a thickness of 0.2 mm to 1.2 mm is used.
- the antireflection film 22 with respect to one main surface 211 of the infrared absorbing glass 21, a single layer made of MgF 2, multilayer film made of Al 2 O 2 and ZrO 2 and MgF 2 Prefecture, TiO 2 and SiO 2 It is formed by vacuum-depositing any one of the multilayer films composed of the above by a known vacuum deposition apparatus (not shown).
- the antireflection film 22 performs a vapor deposition operation while monitoring the film thickness, and closes a shutter (not shown) provided near the vapor deposition source (not shown) when the predetermined film thickness is reached. This is done by stopping the deposition.
- Such an antireflection film 22 is formed so as to have a refractive index larger than the refractive index of the atmosphere (about 1.0) and smaller than the refractive index of the infrared absorbing glass 21 in the N atmosphere. .
- Such an infrared absorber 2 has a light transmission characteristic in which the transmittance is 50% at a wavelength in the wavelength band of 620 nm to 670 nm and the transmittance is 10% to 40% at a wavelength of 700 nm. Note that in the light transmission characteristics of the infrared absorber 2 described above, the transmittance has a maximum value of 90% or more at a wavelength within the wavelength band of 400 nm to 550 nm.
- the infrared reflector 3 has an infrared reflecting film 32 formed on one main surface 311 of the transparent substrate 31.
- the transparent substrate 31 is a colorless transparent glass that transmits visible light and infrared light, for example, a rectangular thin plate glass having a thickness of 0.2 mm to 1.0 mm.
- the infrared reflection film 32 is a multilayer film in which a plurality of first thin films 321 made of a high refractive index material and a plurality of second thin films 322 made of a low refractive index material are alternately stacked.
- the TiO 2 used in the first thin film 321 has been using the SiO 2 to the second thin film 322, the odd layer in TiO 2, an even layer with SiO 2, the final layer is SiO While a 2, film design, if the final layer is a SiO 2, odd-numbered layers is in SiO 2, the even layer may be a TiO 2.
- the infrared reflecting film 32 As a method of manufacturing the infrared reflecting film 32, TiO 2 and SiO 2 are alternately vacuum-deposited on a main surface 311 of the transparent substrate 31 by using a known vacuum deposition apparatus (not shown), and shown in FIG. Such a method of forming the infrared reflecting film 32 is used.
- the film thickness of each thin film 321 and 322 is adjusted by performing a vapor deposition operation while monitoring the film thickness, and when a predetermined film thickness is reached, a shutter (not shown) provided in the vicinity of the vapor deposition source (not shown) is closed. For example, the deposition of the deposition material (TiO 2 , SiO 2 ) is stopped.
- the infrared reflection film 32 includes a plurality of layers defined by ordinal numbers in order from the one main surface 311 side of the transparent substrate 31, one layer, two layers, three layers in the first embodiment. ⁇ It is composed of.
- Each of the first layer, the second layer, the third layer,... Is formed by laminating a first thin film 321 and a second thin film 322.
- the first thin film 321 and the second thin film 322 to be laminated have different optical thicknesses so that the thicknesses of the first layer, the second layer, the third layer,.
- the optical film thickness here is calculated
- the infrared reflector 3 exhibits a transmittance of 80% or more at each wavelength within the wavelength band of 450 nm to 650 nm, and exhibits an average transmittance of 90% or more in the wavelength band of 450 nm to 650 nm.
- the transmittance is 50% at a wavelength in the wavelength band of 670 nm to 690 nm, and the transmittance is less than 15% at a wavelength of 700 nm.
- the wavelength at which the infrared reflector 3 exhibits 50% transmittance is longer than the wavelength at which the infrared absorber 2 exhibits 50% transmittance.
- the infrared cut filter 1 including the infrared absorber 2 and the infrared reflector 3 has a thickness of 0.4 mm to 1.6 mm, for example. That is, the total thickness of the infrared absorber 2 and the infrared reflector 3 is, for example, 0, for the thickness of the infrared absorber glass 21 constituting the infrared absorber 2 and the thickness of the transparent substrate 31 constituting the infrared reflector 3. 4 mm to 1.6 mm.
- the infrared cut filter 1 has a transmittance of 90% or more at a wavelength within a wavelength band of 450 nm to 550 nm, and a wavelength of 620 nm to 670 nm due to the combination of the light transmission characteristics of the infrared absorber 2 and the infrared reflector 3 described above.
- the light transmission characteristic is such that the transmittance is 50% at a wavelength in the band and the transmittance is less than 5% at a wavelength of 700 nm.
- Examples 1 to 3 Specific examples of the infrared cut filter 1 according to Embodiment 1 are shown below as Examples 1 to 3, and the wavelength characteristics and configurations of the infrared cut filters 1 according to Examples 1 to 3 are shown in FIGS. Tables 1 to 3 below show.
- Example 1 a glass plate having a thickness of 0.8 mm and a refractive index of about 1.5 in N atmosphere was used as the infrared absorbing glass 21 with blue glass in which a pigment such as copper ions was dispersed. . Then, an Al 2 O 3 film having a refractive index of 1.6 in the N atmosphere, a ZrO 2 film having a refractive index of 2.0 in the N atmosphere, and a Nr atmosphere in the main surface 211 of the infrared absorbing glass 21 Infrared absorber 2 was obtained by forming each film constituting antireflection film 22 by vacuum deposition in the order of the MgF 2 film having a refractive index of 1.4.
- the infrared absorber 2 has light transmission characteristics as indicated by L1 in FIG.
- the incident angle of the light beam is 0 degree, that is, the light beam is vertically incident.
- the infrared absorbing glass 21 has a transmittance of 90% or more in the wavelength band of 400 nm to 550 nm, a decrease in the transmittance in the wavelength band of 550 nm to 700 nm, and a transmittance of 50% at a wavelength of about 640 nm.
- the light transmission characteristic has a transmittance of about 17% at a wavelength of.
- the transparent substrate 31 of the infrared reflector 3 a glass plate having a refractive index of 1.5 in the N atmosphere and a thickness of 0.3 mm was used. Further, as the first thin film 321 constituting the infrared reflecting film 32, TiO 2 having a refractive index of 2.30 in the N atmosphere is used, and as the second thin film 322, the refractive index in the N atmosphere is 1.46. SiO 2 was used, and the center wavelength thereof was 688 nm.
- the optical film thickness of each of the thin films 321 and 322 is set to a value as shown in Table 1 by the method for manufacturing the infrared reflecting film 32 composed of 40 layers.
- the respective thin films 321 and 322 were formed, and the infrared reflector 3 was obtained.
- Table 1 shows the composition of the infrared reflecting film 32 of the infrared cut filter 1 and the optical film thickness of each thin film (first thin film 321 and second thin film 322).
- the infrared reflector 3 has a light transmission characteristic as indicated by L2 in FIG. That is, the light transmission characteristics of the infrared reflector 3 (infrared reflective film 32) show a transmittance of about 100% in the wavelength band of 395 nm to 670 nm (wavelength band including the wavelength band of 450 nm to 650 nm), and the wavelength is When the wavelength exceeds about 670 nm, the transmittance sharply decreases, and the transmittance is 50% at a wavelength of about 680 nm, and the transmittance is about 4% at a wavelength of 700 nm.
- the infrared cut filter 1 according to Example 1 having a thickness of 1.1 mm is obtained by bonding the other main surface 312 of the transparent substrate 31 to the other main surface 212 of the infrared absorbing glass 21. Obtained.
- the infrared cut filter 1 according to Example 1 has the light transmission characteristics indicated by L3 in FIG. 3 in which the light transmission characteristics of the infrared absorber 2 and the infrared reflector 3 are combined. That is, the infrared cut filter 1 of Example 1 has a transmittance of 90% or more in the wavelength band of 400 nm to 550 nm, a decrease in the transmittance in the wavelength band of 550 nm to 700 nm, and a transmittance of 50 at a wavelength of about 640 nm. %, And has a light transmission characteristic such that the transmittance is about 0% at a wavelength of 700 nm.
- Example 2 a glass plate having a thickness of 0.55 mm and a refractive index of about 1.5 in the N atmosphere was used as the infrared absorbing glass 21 with blue glass in which a pigment such as copper ions was dispersed. . Then, an Al 2 O 3 film having a refractive index of 1.6 in the N atmosphere, a ZrO 2 film having a refractive index of 2.0 in the N atmosphere, and a Nr atmosphere in the main surface 211 of the infrared absorbing glass 21 Infrared absorber 2 was obtained by forming each film constituting antireflection film 22 by vacuum deposition in the order of the MgF 2 film having a refractive index of 1.4.
- the infrared absorber 2 has light transmission characteristics as indicated by L5 in FIG.
- the incident angle of the light beam is 0 degree, that is, the light beam is vertically incident.
- the infrared absorbing glass 21 has a transmittance of 90% or more in the wavelength band of 400 nm to 550 nm, a decrease in the transmittance in the wavelength band of 550 nm to 700 nm, and a transmittance of 50% at a wavelength of about 650 nm.
- the transparent substrate 31 of the infrared reflector 3 a glass plate having a refractive index of 1.5 in the N atmosphere and a thickness of 0.3 mm was used. Further, as the first thin film 321 constituting the infrared reflecting film 32, TiO 2 having a refractive index of 2.30 in the N atmosphere is used, and as the second thin film 322, the refractive index in the N atmosphere is 1.46. SiO 2 was used, and the center wavelength thereof was 748 nm.
- the optical film thickness of each of these thin films 321 and 322 is set to a value as shown in Table 2, and the manufacturing method of the infrared reflecting film 32 composed of 40 layers described above is applied to one main surface 311 of the transparent substrate 31. Thus, the respective thin films 321 and 322 were formed, and the infrared reflector 3 was obtained.
- Table 2 shows the composition of the infrared reflecting film 32 of the infrared cut filter 1 and the optical film thickness of each thin film (first thin film 321 and second thin film 322).
- the infrared reflector 3 has light transmission characteristics as indicated by L6 in FIG.
- the light transmission characteristics of the infrared reflector 3 have an average transmittance of 10% or less in the wavelength band of 380 nm to 420 nm, and when the wavelength exceeds 430 nm, the transmittance sharply increases.
- the transmittance is about 100% (average 90% or more), and when the wavelength exceeds about 670 nm, the transmittance decreases sharply.
- the light transmission characteristic is such that the transmittance is 50% at a wavelength of about 680 nm and the transmittance is about 3% at a wavelength of 700 nm.
- the infrared cut filter 1 according to Example 2 having a thickness of 0.85 mm is obtained by bonding the other main surface 312 of the transparent substrate 31 to the other main surface 212 of the infrared absorbing glass 21. Obtained.
- the infrared cut filter 1 according to Example 2 has a light transmission characteristic indicated by L7 in FIG. 4 in which the light transmission characteristics of the infrared absorber 2 and the infrared reflector 3 are combined. That is, the infrared cut filter 1 of Example 2 is configured to cut light in a wavelength band of 380 nm to 420 nm in addition to light having a wavelength exceeding 700 nm, and has a transmittance in the wavelength band of 380 nm to 420 nm.
- the transmittance sharply increases, the transmittance is 90% or more in the wavelength band of 450 nm to 550 nm, and the transmittance decreases in the wavelength band of 550 nm to 700 nm.
- the light transmission characteristic is such that the transmittance is 50% at a wavelength of 650 nm and the transmittance is about 0% at a wavelength of 700 nm.
- Example 3 a glass plate having a thickness of 0.45 mm and a refractive index of about 1.5 in the N atmosphere was used as the infrared absorbing glass 21 with blue glass in which a pigment such as copper ions was dispersed. . Then, an Al 2 O 3 film having a refractive index of 1.6 in the N atmosphere, a ZrO 2 film having a refractive index of 2.0 in the N atmosphere, and a Nr atmosphere in the main surface 211 of the infrared absorbing glass 21 Infrared absorber 2 was obtained by forming each film constituting antireflection film 22 by vacuum deposition in the order of the MgF 2 film having a refractive index of 1.4.
- the infrared absorber 2 has light transmission characteristics as indicated by L8 in FIG.
- the incident angle of the light beam is 0 degree, that is, the light beam is vertically incident.
- the infrared absorption glass 21 has a transmittance of 90% or more in the wavelength band of 400 nm to 550 nm, a decrease in the transmittance in the wavelength band of 550 nm to 700 nm, and a transmittance of 50% at a wavelength of about 670 nm.
- the light transmission characteristic has a transmittance of about 34% at a wavelength of.
- Example 1 As the transparent substrate 31 of the infrared reflector 3, a glass plate having a refractive index of 1.5 in N atmosphere and a thickness of 0.3 mm was used as in Example 1. Similarly to Example 1, TiO 2 having a refractive index of 2.30 in the N atmosphere is used as the first thin film 321 constituting the infrared reflecting film 32, and the refraction in the N atmosphere is used as the second thin film 322. SiO 2 having a ratio of 1.46 was used, and the center wavelength thereof was 688 nm.
- the optical film thickness of each of these thin films 321 and 322 is set to the value shown in Table 1 above.
- the thin films 321 and 322 were formed on one main surface 311 of 31 to obtain the infrared reflector 3.
- the infrared reflector 3 has light transmission characteristics as indicated by L9 in FIG. As described above, in Example 3, the infrared reflector 3 was obtained in the same manner as in Example 1. However, the infrared reflector 3 (infrared reflective film 32) of Example 3 was obtained in Example 1 due to manufacturing errors.
- This light transmission characteristic L9 is slightly different from the light transmission characteristic L2 (see FIG. 3) of the infrared reflector 3 (infrared reflective film 32). Specifically, the light transmission characteristic L9 of the infrared reflector 3 (infrared reflective film 32) of Example 3 shows a transmittance of 90% or more in the wavelength band of 400 nm to 440 nm, and within the wavelength band of 450 nm to 650 nm.
- the infrared reflector 3 infrared reflective film 32
- the light transmission characteristics of the infrared reflector 3 show that when the wavelength exceeds about 670 nm, the transmittance sharply decreases, and shows a transmittance of 50% at a wavelength of about 680 nm. Shows a transmittance of about 5%.
- the infrared cut filter 1 according to Example 3 having a thickness of 0.75 mm is obtained by bonding the other main surface 312 of the transparent substrate 31 to the other main surface 212 of the infrared absorbing glass 21. Obtained.
- the infrared cut filter 1 according to Example 3 has a light transmission characteristic indicated by L10 in FIG. 5 in which the light transmission characteristics of the infrared absorber 2 and the infrared reflector 3 are combined.
- the infrared cut filter 1 of Example 3 has an average transmittance of 90% or more in the wavelength band of 400 nm to 550 nm, the transmittance decreases in the wavelength band of 550 nm to 700 nm, and the transmittance at a wavelength of about 670 nm.
- the infrared cut filter 1 As shown in the light transmission characteristics L3, L7, and L10 (see FIGS. 3 to 5) of the infrared cut filters 1 of Examples 1 to 3 described above, the infrared cut filter 1 according to the first embodiment has an infrared absorber. 2 and the infrared reflector 3, the transmittance is 90% or more at a wavelength in the wavelength band of 450 nm to 550 nm, and the transmittance is 50% at a wavelength in the wavelength band of 620 nm to 670 nm. Light transmission characteristics can be obtained with a transmittance of about 0% (less than 5%) at the wavelength.
- the transmittance in the wavelength band of 380 nm to 420 nm specifically, the transmittance in the wavelength band influenced by ultraviolet rays that are invisible to human eyes. Since the average is suppressed to 10% or less, the light transmission characteristics closer to the human eye sensitivity characteristics can be obtained as compared with the infrared cut filters according to the first and third embodiments.
- the light transmission characteristics L3, L7, and L10 of the infrared cut filters 1 according to Examples 1 to 3 shown in FIGS. 3 to 5 will be described more specifically by comparison with the light transmission characteristics L4 of the conventional infrared cut filter.
- a conventional infrared cut filter having a light transmission characteristic indicated by L4 in FIGS. 3 to 5 is composed of an infrared absorber in which an antireflection film is formed on both surfaces of an infrared absorption glass.
- the point at which the transmittance is about 0% is set to 700 nm by setting the thickness of the infrared absorbing glass, which is an infrared absorber, to 1.6 mm.
- the thickness is less than half that of a conventional infrared cut filter (infrared absorber) having L4 light transmission characteristics, and the visible region, particularly 600 nm to Infrared reflector 3 is combined with infrared absorber 2 having a higher transmittance than a conventional infrared cut filter in the wavelength band of 700 nm, that is, infrared absorber 2 having light transmission characteristics indicated by L1, L5, or L8.
- the point at which the transmittance is about 0% is set to 700 nm.
- the light transmission characteristics L3, L7, and L10 of the infrared cut filter 1 according to Examples 1 to 3 are the same as the light transmission characteristics L4 of the conventional infrared cut filter in the visible light range, particularly in the wavelength band of 600 nm to 700 nm. Compared with high transmittance. Further, in the light transmission characteristics L3, L7, and L10 of the infrared cut filter 1 according to Examples 1 to 3, the transmittance with respect to a light beam having a wavelength of 700 nm is more 0 than the light transmission characteristic L4 of the conventional infrared cut filter. %.
- the transmittance at a wavelength of 600 nm is about 55%
- the transmittance is about 50% at a wavelength of about 605 nm
- the transmittance is about 605 nm. 7.5%
- the transmittance is about 3% at a wavelength of 700 nm.
- the transmittance at a wavelength of 600 nm is about 75%, and the transmittance is about 50% at a wavelength of about 640 nm.
- the transmittance is about 20% at a wavelength of 675 nm, and the transmittance is about 0% at a wavelength of 700 nm.
- the transmittance at a wavelength of 600 nm is about 80%, the transmittance is about 50% at a wavelength of about 650 nm, and 675 nm.
- the transmittance is about 30% at the wavelength, and the transmittance is about 0% at the wavelength of 700 nm. Furthermore, in the light transmission characteristic L10 (see FIG. 5) of the infrared cut filter 1 according to Example 3, the transmittance at a wavelength of 600 nm is about 85%, the transmittance is about 50% at a wavelength of about 670 nm, and 675 nm. The transmittance is about 40% at the wavelength, and the transmittance is about 0% at the wavelength of 700 nm.
- the light transmission characteristics L3, L7, and L10 of the infrared cut filters 1 according to Examples 1 to 3 are 600 nm to 700 nm, particularly 600 nm, compared with the light transmission characteristics L4 of the conventional infrared cut filter.
- the transmittance at a wavelength band of ⁇ 675 nm is high, and the transmittance at a wavelength of 700 nm is close to 0%. That is, the infrared cut filter 1 according to Examples 1 to 3 sufficiently transmits red visible light having a wavelength of 600 nm to 700 nm while sufficiently cutting infrared light exceeding 700 nm as compared with the conventional infrared cut filter.
- the imaging device 5 can capture an image with a stronger reddish hue than in the past, and can be used in a dark place. It becomes possible to capture an image brightly.
- the amount of light reflected by the infrared reflector 2 is suppressed by combining the infrared reflector 2 with the infrared reflector 3.
- the half-value wavelength of the infrared reflector 3 is about 680 nm as shown in FIG. 3, and is longer than the half-value wavelength (about 640 nm) of the infrared absorber 2.
- the half value wavelength of the infrared reflector 3 is about 680 nm as shown in FIG.
- the half-value wavelength of the infrared reflector 3 is about 680 nm as shown in FIG. 5 and is longer than the half-value wavelength (about 670 nm) of the infrared absorber 2.
- the half-value wavelength of the infrared reflector 3 (the wavelength at which the transmittance is 50%) is longer than the half-value wavelength of the infrared absorber 2, and the infrared absorber 2 at the intersection P where the transmittance curves indicating the light transmission characteristics L1, L5 and L8 of the infrared ray 3 and the transmittance curves indicating the light transmission characteristics L2, L6 and L9 of the infrared reflector 3 intersect (the transmission of the infrared absorber 2).
- the wavelength at which the rate and the transmittance of the infrared reflector 3 are the same) is longer than the half-value wavelength of the infrared absorber 2.
- the transmittance of the infrared absorber 2 and the infrared reflector 3 at the wavelength of the intersection P is 50% or less. For this reason, in the infrared cut filter 1 according to the first to third embodiments, the amount of light reflected by the infrared reflector 3 is suppressed by the absorption of infrared rays by the infrared absorber 2, and the amount of light reflected by the infrared reflector 2 is reduced. Generation of flare and ghost due to reflection is suppressed.
- the half-value wavelength of the infrared reflector 3 is longer than the half-value wavelength of the infrared absorber 2, and the infrared absorber 2 and the infrared reflector 3
- the half-value wavelength of the infrared cut filter 1 by the combination is configured to substantially match the half-value wavelength of the infrared absorber 2.
- the half-wavelength of the infrared cut filter 1 is set by the infrared absorber 2 with less variation in transmittance due to design error compared to the infrared reflector 3, in manufacturing the infrared cut filter 1
- the infrared reflector 3 exhibits a transmittance of 80% or more at each wavelength within the wavelength band of 450 nm to 650 nm, and 450 nm to 650 nm.
- the light transmission characteristic has an average transmittance of 90% or more in the wavelength band.
- the infrared cut filter 1 can obtain light transmission characteristics depending on the light transmission characteristics of the infrared absorber 2 in the wavelength band of 450 nm to 650 nm, so that the transmittance gradually decreases from the visible range to the infrared range.
- the infrared reflector 3 has a transmittance of 90% or more with respect to the light beam having the half-value wavelength of the infrared absorber 2 so that the half-value wavelength of the infrared cut filter 1 and the half-value wavelength of the infrared absorber 2 substantially coincide with each other. Therefore, the infrared cut filter 1 is provided with a light transmission characteristic close to the sensitivity characteristic of the human eye whose transmittance gradually decreases at a wavelength of 550 nm to 700 nm of the infrared absorber. The light transmission characteristic close to the sensitivity characteristic is obtained.
- the infrared absorber 2 can be configured with a thickness smaller than that of the conventional infrared cut filter having the light transmission characteristics indicated by L4. For this reason, the thickness of the infrared cut filter 1 can be the same as the conventional infrared cut filter or thinner than the conventional infrared cut filter.
- the infrared cut filter 1 ⁇ / b> A according to the second embodiment is arranged between the imaging optical system 4 and the imaging device 5 arranged along the optical axis of the imaging optical path in the imaging apparatus.
- the infrared cut filter 1A includes an infrared absorber 2A that absorbs infrared rays and an infrared reflector 3A that reflects infrared rays.
- the infrared absorber 2A and the infrared reflector 3A are disposed apart from each other between the imaging optical system 4 and the imaging device 5 arranged along the optical axis of the imaging optical path. Note that the infrared absorber 2A is disposed closer to the imaging optical system 4 than the infrared reflector 3A.
- the infrared absorber 2A is formed by forming antireflection films 22 on both main surfaces 211 and 212 of the infrared absorbing glass 21.
- the infrared absorbing glass 21 is a blue glass in which a pigment such as copper ion is dispersed, as in the infrared absorbing glass 21 of the infrared absorber 2 shown in the first embodiment, and has a thickness of 0.2 mm to 1 mm, for example. .2mm square sheet glass is used.
- the antireflection film 22 with respect to both main surfaces 211 and 212 of the infrared absorbing glass 21, a single layer made of MgF 2, multilayer film made of Al 2 O 2 and ZrO 2 and MgF 2 Prefecture, TiO 2 and SiO 2 is formed by vacuum deposition using a known vacuum deposition apparatus (not shown).
- the antireflection film 22 performs a vapor deposition operation while monitoring the film thickness, and closes a shutter (not shown) provided near the vapor deposition source (not shown) when the predetermined film thickness is reached. This is done by stopping the deposition.
- Such an antireflection film 22 is formed so as to have a refractive index larger than the refractive index of the atmosphere (about 1.0) and smaller than the refractive index of the infrared absorbing glass 21 in the N atmosphere. .
- Such an infrared absorber 2A has the same light transmission characteristics as the infrared absorber 2 of the first embodiment because it uses the same infrared absorbing glass 21 as that of the first embodiment. That is, it has a light transmission characteristic in which the transmittance is 50% at a wavelength in the wavelength band of 620 nm to 670 nm and the transmittance is 10% to 40% at a wavelength of 700 nm. In the light transmission characteristics of such an infrared absorber 2A, the transmittance has a maximum value of 90% or more at a wavelength in the wavelength band of 400 nm to 550 nm.
- the infrared reflector 3A has an infrared reflection film 32 formed on one main surface 311 of the transparent substrate 31 and an antireflection film 33 formed on the other main surface 312. As shown in FIG. 6, the infrared reflector 3 ⁇ / b> A is arranged such that the surface on the infrared reflective film 32 side faces the imaging device 5 in the imaging apparatus.
- the transparent substrate 31 is a colorless transparent glass that transmits visible light and infrared rays, similar to the transparent substrate 31 shown in the first embodiment, for example, a rectangular thin plate glass having a thickness of 0.2 mm to 1.0 mm. I use it.
- the infrared reflective film 32 As the infrared reflective film 32, a plurality of first thin films 321 made of a high refractive index material similar to the infrared reflective film 32 shown in the first embodiment and a plurality of second thin films 322 made of a low refractive index material are alternately laminated. A multilayer film is used.
- Such an infrared reflector 3A has the same light transmission characteristics as the infrared reflector 3 of the first embodiment since the infrared reflector 32 similar to that of the first embodiment is formed on the transparent substrate 31. That is, the infrared reflector 3A exhibits a transmittance of 80% or more at each wavelength within the wavelength band of 450 nm to 650 nm, and exhibits an average transmittance of 90% or more in the wavelength band of 450 nm to 650 nm, and is 670 nm to 690 nm.
- the light transmittance is 50% at a wavelength within the wavelength band of, and the transmittance is less than 15% at a wavelength of 700 nm.
- the wavelength at which the infrared reflector 3A exhibits a transmittance of 50% is longer than the wavelength at which the infrared absorber 2 exhibits a transmittance of 50%.
- the antireflection film 22 performs a vapor deposition operation while monitoring the film thickness, and closes a shutter (not shown) provided near the vapor deposition source (not shown) when the predetermined film thickness is reached. This is done by stopping the deposition.
- Such an antireflection film 33 is formed so as to have a refractive index larger than the refractive index of the atmosphere (about 1.0) and smaller than the refractive index of the transparent substrate 31 in the N atmosphere.
- the total thickness of the infrared absorber 2A and the infrared reflector 3A is, for example, 0.4 to 1.6 mm. That is, the thickness of the infrared absorber glass 21 constituting the infrared absorber 2 and the thickness of the transparent substrate 31 constituting the infrared reflector 3 are, for example, the sum of the thicknesses of the infrared absorber 2 and the infrared reflector 3 being 0. 0. 0. It is appropriately adjusted so as to be 4 mm to 1.6 mm.
- the light transmission characteristics similar to those of the infrared cut filter 1 according to the first embodiment can be obtained by combining the light transmission characteristics of the infrared absorber 2A and the infrared reflector 3A. That is, light having a transmittance of 90% or more at a wavelength in the wavelength band of 450 nm to 550 nm, a transmittance of 50% at a wavelength in the wavelength band of 620 nm to 670 nm, and a transmittance of less than 5% at a wavelength of 700 nm. Transmission characteristics are obtained.
- the infrared cut filter 1A according to the second embodiment can obtain the same light transmission characteristics as those of the infrared cut filter 1 according to the first embodiment, and thus the same as the infrared cut filter 1 according to the first embodiment. There is an effect.
- a glass plate is used as the transparent substrate 31, but the present invention is not limited to this.
- a quartz plate can be used as long as the substrate can transmit light.
- the transparent substrate 31 may be a birefringent plate or a birefringent plate composed of a plurality of sheets. Moreover, you may comprise the transparent substrate 31 combining a quartz plate and a glass plate.
- TiO 2 is used for the first thin film 321, but the present invention is not limited to this, and it is only necessary that the first thin film 321 is made of a high refractive material.
- ZrO 2 , TaO 2 , Nb 2 O 2 or the like may be used.
- SiO 2 is used for the second thin film 322, the present invention is not limited to this, and the second thin film 322 may be made of a low refractive material, and for example, MgF 2 or the like may be used.
- the infrared cut filters 1 and 1A of Embodiments 1 and 2 are arranged in the imaging apparatus so that the infrared absorbers 2 and 2A are located closer to the imaging optical system 4 than the infrared reflectors 3 and 3A.
- the infrared cut filters 1 and 1A may be arranged so that the infrared reflectors 3 and 3A are located closer to the imaging optical system 4 than the infrared absorbers 2 and 2A.
- the infrared cut filters 1 and 1A when the infrared cut filters 1 and 1A are arranged so that the infrared absorbers 2 and 2A are positioned on the imaging optical system 4 side, the light reflected by the infrared reflectors 3 and 3A is infrared rays. Since the light can be absorbed by the absorbers 2 and 2A, the image is reflected by the infrared reflectors 3 and 3A as compared with the case where the infrared reflectors 3 and 3A are arranged on the imaging optical system 4 side. The amount of light scattered by the optical system 4 can be reduced, and the occurrence of ghost can be suppressed.
- the infrared absorbers 2 and 2A are provided on the imaging optical system 4 side.
- the distance between the infrared reflectors 3 and 3A and the imaging device 5, more specifically, the distance between the foreign matter generated in the infrared reflectors 3 and 3A during the manufacturing process and the imaging device 5 is larger than the case where the imaging device 5 is disposed. Therefore, it is possible to suppress the deterioration of the image due to the foreign matter.
- the infrared absorbers 2 and 2A one main surface 211 of the infrared absorbing glass 21 or one having the antireflection film 22 formed on both main surfaces 211 and 212 is used.
- the infrared absorbers 2 and 2A referred to in the present invention are not limited to this.
- the antireflection film 22 may not be formed. That is, you may use the infrared rays absorption glass in which the antireflection film is not formed as an infrared rays absorber.
- the infrared reflector 3 is formed by forming the infrared reflecting film 32 on the one principal surface 311 of the transparent substrate 31 bonded to the other principal surface 212 of the infrared absorbing glass 21.
- the infrared reflector 3A the one in which the infrared reflecting film 32 is formed on one main surface 311 of the transparent substrate 31 and the antireflection film 33 is formed on the other main surface 312 is used.
- the infrared reflectors 3 and 3A are not limited to this.
- an infrared reflecting film formed on the surface of infrared absorbing glass may be used as an infrared reflector.
- the infrared reflecting film 32 is formed on one main surface 311 of the transparent substrate 31 bonded to the other main surface 212 of the infrared absorbing glass 21, but the other main surface 212 of the infrared absorbing glass 21.
- an infrared reflection film 32 as an infrared absorber may be directly formed.
- TiO 2 and SiO 2 are alternately vacuum-deposited on the other main surface 212 of the infrared absorbing glass 21, so that the infrared reflecting film 32 as an infrared absorber becomes the other main surface 212 of the infrared absorbing glass 21. It may be formed.
- the infrared reflective film 32 is formed directly on the other main surface 212 of the infrared absorbing glass 21, the infrared cut filter 1 can be thinned.
- the antireflection film 33 is formed on the other main surface 312 of the transparent substrate 31.
- the refractive index in the atmosphere of the transparent substrate 31 is substantially the same as the refractive index in the atmosphere.
- the antireflection film 33 may not be formed.
- the present invention can be applied to an infrared cut filter that transmits light in the visible range and cuts infrared rays.
Abstract
Description
本実施の形態1にかかる赤外線カットフィルタ1は、図1に示すように、撮像装置において、撮像光路の光軸に沿って配列された結像光学系4と撮像デバイス5との間に配置される。
Nd=d×N×4/λ(Nd:光学膜厚、d:物理膜厚、N:屈折率、λ:中心波長)
本実施の形態において、赤外線反射体3は、450nm~650nmの波長帯域内の各波長で80%以上の透過率を示し、この450nm~650nmの波長帯域で平均90%以上の透過率を示して、670nm~690nmの波長帯域内の波長で透過率が50%となり、700nmの波長で透過率が15%未満となる光透過特性を有する。また、この赤外線反射体3が50%の透過率を示す波長は、赤外線吸収体2が50%の透過率を示す波長よりも長い。
本実施例1では、赤外線吸収ガラス21として、銅イオン等の色素を分散させた青色ガラスで、厚さが0.8mmで、N大気中における屈折率が約1.5のガラス板を用いた。そして、この赤外線吸収ガラス21の一主面211に、N大気中における屈折率が1.6のAl2O3膜、N大気中における屈折率が2.0のZrO2膜、N大気中における屈折率が1.4のMgF2膜の順に、反射防止膜22を構成する各膜を真空蒸着により形成して赤外線吸収体2を得た。
本実施例2では、赤外線吸収ガラス21として、銅イオン等の色素を分散させた青色ガラスで、厚さが0.55mmで、N大気中における屈折率が約1.5のガラス板を用いた。そして、この赤外線吸収ガラス21の一主面211に、N大気中における屈折率が1.6のAl2O3膜、N大気中における屈折率が2.0のZrO2膜、N大気中における屈折率が1.4のMgF2膜の順に、反射防止膜22を構成する各膜を真空蒸着により形成して赤外線吸収体2を得た。
本実施例3では、赤外線吸収ガラス21として、銅イオン等の色素を分散させた青色ガラスで、厚さが0.45mmで、N大気中における屈折率が約1.5のガラス板を用いた。そして、この赤外線吸収ガラス21の一主面211に、N大気中における屈折率が1.6のAl2O3膜、N大気中における屈折率が2.0のZrO2膜、N大気中における屈折率が1.4のMgF2膜の順に、反射防止膜22を構成する各膜を真空蒸着により形成して赤外線吸収体2を得た。
本実施の形態2に係る赤外線カットフィルタ1Aは、図6に示すように、撮像装置において、撮像光路の光軸に沿って配列された結像光学系4と撮像デバイス5との間に配置される。
2,2A 赤外線吸収体
21 赤外線吸収ガラス
211,212 主面
22 反射防止膜
3,3A 赤外線反射体
31 透明基板
311,312 主面
32 赤外線反射膜
321 第1薄膜
322 第2薄膜
33 反射防止膜
4 結像光学系
5 撮像デバイス
Claims (4)
- 赤外線をカットする赤外線カットフィルタであって、
赤外線を吸収する赤外線吸収体と、赤外線を反射する赤外線反射体とを備え、
前記赤外線吸収体は、620nm~670nmの波長帯域内の波長で透過率が50%となる光透過特性を有し、
前記赤外線反射体は、670nm~690nmの波長帯域内の波長で透過率が50%となる光透過特性を有し、
前記赤外線反射体が50%の透過率を示す波長は、前記赤外線吸収体が50%の透過率を示す波長よりも長く、
前記赤外線吸収体と前記赤外線反射体の組み合わせにより、620nm~670nmの波長帯域内の波長で透過率が50%となり、700nmの波長で透過率が5%未満となる光透過特性を有することを特徴とする赤外線カットフィルタ。 - 請求項1に記載の赤外線カットフィルタであって、
前記赤外線吸収体は、700nmの波長で透過率が10%~40%となる光透過特性を有し、
前記赤外線反射体は、700nmの波長で透過率が15%未満となる光透過特性を有することを特徴とする赤外線カットフィルタ。 - 請求項1又は2に記載の赤外線カットフィルタであって、
前記赤外線反射体は、450nm~650nmの波長帯域内の各波長で80%以上の透過率を示し、450nm~650nmの波長帯域での透過率の平均が90%以上である光透過特性を有することを特徴とする赤外線カットフィルタ。 - 請求項1乃至3のいずれか1つに記載の赤外線カットフィルタであって、
1つの前記赤外線吸収体の一主面に、1つの前記赤外線反射体が設けられていることを特徴とする赤外線カットフィルタ。
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US13/322,504 US8693089B2 (en) | 2010-06-18 | 2011-05-27 | IR cut filter |
EP11795543.5A EP2584385A4 (en) | 2010-06-18 | 2011-05-27 | INFRARED BARRIER FILTER |
JP2011534429A JP5013022B2 (ja) | 2010-06-18 | 2011-05-27 | 赤外線カットフィルタ |
CN201180030229.4A CN102985856B (zh) | 2010-06-18 | 2011-05-27 | 红外截止滤光片 |
KR1020127028129A KR101374755B1 (ko) | 2010-06-18 | 2011-05-27 | 적외선 차단 필터 |
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EP (1) | EP2584385A4 (ja) |
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KR (1) | KR101374755B1 (ja) |
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Cited By (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
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CN103364858A (zh) * | 2012-03-30 | 2013-10-23 | 鸿富锦精密工业(深圳)有限公司 | 光学元件、镜头模组及光学元件制造方法 |
WO2014010532A1 (ja) * | 2012-07-10 | 2014-01-16 | コニカミノルタ株式会社 | 誘電多層膜構造を有する赤外遮蔽フィルム |
WO2014034386A1 (ja) * | 2012-08-29 | 2014-03-06 | 旭硝子株式会社 | 近赤外線カットフィルタ |
US20140063597A1 (en) * | 2012-09-06 | 2014-03-06 | Nippon Sheet Glass, Limited | Infrared cut filter and imaging apparatus |
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KR20140076714A (ko) * | 2012-12-13 | 2014-06-23 | 엘지이노텍 주식회사 | 근적외선 필름 |
US20140300956A1 (en) * | 2013-04-09 | 2014-10-09 | Nippon Sheet Glass Company, Limited | Infrared cut filter and imaging apparatus |
JP2015028621A (ja) * | 2013-07-03 | 2015-02-12 | 富士フイルム株式会社 | 赤外線遮光組成物、赤外線遮光層、赤外線カットフィルタ、カメラモジュール |
WO2016114362A1 (ja) * | 2015-01-14 | 2016-07-21 | 旭硝子株式会社 | 近赤外線カットフィルタおよび固体撮像装置 |
WO2016114363A1 (ja) * | 2015-01-14 | 2016-07-21 | 旭硝子株式会社 | 近赤外線カットフィルタおよび撮像装置 |
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JP2017120433A (ja) * | 2017-01-26 | 2017-07-06 | 日本板硝子株式会社 | 赤外線カットフィルタ、撮像装置および赤外線カットフィルタの製造方法 |
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---|---|---|---|---|
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11305033A (ja) * | 1998-04-22 | 1999-11-05 | Toyobo Co Ltd | 赤外線吸収フィルタ |
JP2000209510A (ja) | 1999-01-11 | 2000-07-28 | Daishinku Corp | 撮像装置 |
JP2003161831A (ja) * | 2001-11-29 | 2003-06-06 | Daishinku Corp | 光線カットフィルタ |
JP2006154395A (ja) * | 2004-11-30 | 2006-06-15 | Canon Inc | 光学フィルタ及びそれを有する撮像装置 |
JP2006220873A (ja) * | 2005-02-09 | 2006-08-24 | Olympus Corp | 光学フィルタおよび撮像装置 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001042230A (ja) * | 1999-07-27 | 2001-02-16 | Olympus Optical Co Ltd | 撮像光学系 |
JP2005345680A (ja) | 2004-06-02 | 2005-12-15 | Kureha Chem Ind Co Ltd | 光学フィルターおよび撮像装置 |
US7411729B2 (en) | 2004-08-12 | 2008-08-12 | Olympus Corporation | Optical filter, method of manufacturing optical filter, optical system, and imaging apparatus |
JP5268436B2 (ja) * | 2008-06-06 | 2013-08-21 | キヤノン株式会社 | 光学フィルタ及び撮像装置 |
-
2011
- 2011-05-27 CN CN201180030229.4A patent/CN102985856B/zh active Active
- 2011-05-27 KR KR1020127028129A patent/KR101374755B1/ko active IP Right Grant
- 2011-05-27 US US13/322,504 patent/US8693089B2/en active Active
- 2011-05-27 JP JP2011534429A patent/JP5013022B2/ja active Active
- 2011-05-27 EP EP11795543.5A patent/EP2584385A4/en not_active Withdrawn
- 2011-05-27 WO PCT/JP2011/062225 patent/WO2011158635A1/ja active Application Filing
- 2011-06-17 TW TW100121238A patent/TWI537616B/zh active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11305033A (ja) * | 1998-04-22 | 1999-11-05 | Toyobo Co Ltd | 赤外線吸収フィルタ |
JP2000209510A (ja) | 1999-01-11 | 2000-07-28 | Daishinku Corp | 撮像装置 |
JP2003161831A (ja) * | 2001-11-29 | 2003-06-06 | Daishinku Corp | 光線カットフィルタ |
JP2006154395A (ja) * | 2004-11-30 | 2006-06-15 | Canon Inc | 光学フィルタ及びそれを有する撮像装置 |
JP2006220873A (ja) * | 2005-02-09 | 2006-08-24 | Olympus Corp | 光学フィルタおよび撮像装置 |
Non-Patent Citations (1)
Title |
---|
See also references of EP2584385A4 * |
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Also Published As
Publication number | Publication date |
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JPWO2011158635A1 (ja) | 2013-08-19 |
TWI537616B (zh) | 2016-06-11 |
US20130094075A1 (en) | 2013-04-18 |
KR101374755B1 (ko) | 2014-03-17 |
JP5013022B2 (ja) | 2012-08-29 |
CN102985856A (zh) | 2013-03-20 |
US8693089B2 (en) | 2014-04-08 |
EP2584385A4 (en) | 2014-02-26 |
TW201224533A (en) | 2012-06-16 |
KR20130018803A (ko) | 2013-02-25 |
EP2584385A1 (en) | 2013-04-24 |
CN102985856B (zh) | 2015-12-16 |
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