WO2011139128A3 - 웨이퍼 처리를 위한 다중 플라즈마 발생 장치 - Google Patents

웨이퍼 처리를 위한 다중 플라즈마 발생 장치 Download PDF

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Publication number
WO2011139128A3
WO2011139128A3 PCT/KR2011/003415 KR2011003415W WO2011139128A3 WO 2011139128 A3 WO2011139128 A3 WO 2011139128A3 KR 2011003415 W KR2011003415 W KR 2011003415W WO 2011139128 A3 WO2011139128 A3 WO 2011139128A3
Authority
WO
WIPO (PCT)
Prior art keywords
wafer
generation device
plasma generation
wafer treatment
treatment
Prior art date
Application number
PCT/KR2011/003415
Other languages
English (en)
French (fr)
Other versions
WO2011139128A2 (ko
Inventor
유정호
Original Assignee
나노세미콘(주)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 나노세미콘(주) filed Critical 나노세미콘(주)
Priority claimed from KR1020110043020A external-priority patent/KR101101364B1/ko
Publication of WO2011139128A2 publication Critical patent/WO2011139128A2/ko
Publication of WO2011139128A3 publication Critical patent/WO2011139128A3/ko

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)

Abstract

웨이퍼의 처리 효율 및 품질을 향상하고, 플라즈마 가스가 효율적으로 반응하여 웨이퍼에 증착되도록 한 웨이퍼 처리를 위한 다중 플라즈마 발생 장치가 제시된다. 제시된 웨이퍼 처리를 위한 다중 플라즈마 발생 장치는, 웨이퍼 처리 장치의 외부 실린더의 외주면을 따라 권취되어 웨이퍼 처리 장치의 내부 실린더 내부로 주입되는 증착용 가스를 가열하는 외부 코일; 및 외부 실린더 및 내부 실린더 사이에 형성되어 증착용 가스에 플라즈마를 발생시키는 내부 코일을 포함한다.
PCT/KR2011/003415 2010-05-07 2011-05-06 웨이퍼 처리를 위한 다중 플라즈마 발생 장치 WO2011139128A2 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR20100042751 2010-05-07
KR10-2010-0042751 2010-05-07
KR10-2011-0043020 2011-05-06
KR1020110043020A KR101101364B1 (ko) 2010-05-07 2011-05-06 웨이퍼 처리를 위한 다중 플라즈마 발생 장치

Publications (2)

Publication Number Publication Date
WO2011139128A2 WO2011139128A2 (ko) 2011-11-10
WO2011139128A3 true WO2011139128A3 (ko) 2012-01-12

Family

ID=44904253

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2011/003415 WO2011139128A2 (ko) 2010-05-07 2011-05-06 웨이퍼 처리를 위한 다중 플라즈마 발생 장치

Country Status (1)

Country Link
WO (1) WO2011139128A2 (ko)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100340164B1 (ko) * 1993-07-30 2002-11-27 텍사스 인스트루먼츠 인코포레이티드 플라즈마 프로세싱을 위한 rf 유도 플라즈마 소스
KR20050103201A (ko) * 2003-01-31 2005-10-27 다우 코닝 아일랜드 리미티드 플라즈마 발생 전극 조립체
KR20070010628A (ko) * 2005-07-19 2007-01-24 주식회사 큐피에스 다중 안테나 코일군이 구비된 유도결합 플라즈마 반응장치
KR20090021913A (ko) * 2007-08-29 2009-03-04 최대규 유도 결합 플라즈마 소스가 내장된 서셉터 및 이를 구비한플라즈마 처리 챔버

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100340164B1 (ko) * 1993-07-30 2002-11-27 텍사스 인스트루먼츠 인코포레이티드 플라즈마 프로세싱을 위한 rf 유도 플라즈마 소스
KR20050103201A (ko) * 2003-01-31 2005-10-27 다우 코닝 아일랜드 리미티드 플라즈마 발생 전극 조립체
KR20070010628A (ko) * 2005-07-19 2007-01-24 주식회사 큐피에스 다중 안테나 코일군이 구비된 유도결합 플라즈마 반응장치
KR20090021913A (ko) * 2007-08-29 2009-03-04 최대규 유도 결합 플라즈마 소스가 내장된 서셉터 및 이를 구비한플라즈마 처리 챔버

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Publication number Publication date
WO2011139128A2 (ko) 2011-11-10

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