WO2011126292A3 - Cnt 대전 방지 처리된 작업 스테이지의 수선 방법 - Google Patents

Cnt 대전 방지 처리된 작업 스테이지의 수선 방법 Download PDF

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Publication number
WO2011126292A3
WO2011126292A3 PCT/KR2011/002397 KR2011002397W WO2011126292A3 WO 2011126292 A3 WO2011126292 A3 WO 2011126292A3 KR 2011002397 W KR2011002397 W KR 2011002397W WO 2011126292 A3 WO2011126292 A3 WO 2011126292A3
Authority
WO
WIPO (PCT)
Prior art keywords
cnt
antistatic
working stage
repairing
specific part
Prior art date
Application number
PCT/KR2011/002397
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English (en)
French (fr)
Other versions
WO2011126292A2 (ko
Inventor
박도형
이동면
구성창
Original Assignee
(주)탑나노시스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by (주)탑나노시스 filed Critical (주)탑나노시스
Publication of WO2011126292A2 publication Critical patent/WO2011126292A2/ko
Publication of WO2011126292A3 publication Critical patent/WO2011126292A3/ko

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Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/24Electrically-conducting paints
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/60Additives non-macromolecular
    • C09D7/61Additives non-macromolecular inorganic
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/70Additives characterised by shape, e.g. fibres, flakes or microspheres
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/005Repairing damaged coatings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K7/00Use of ingredients characterised by shape
    • C08K7/02Fibres or whiskers
    • C08K7/04Fibres or whiskers inorganic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Chemical Or Physical Treatment Of Fibers (AREA)

Abstract

본 발명은 CNT대전 방지 처리된 작업 스테이지의 수선 방법을 제공한다. 본 발명의 CNT대전 방지 처리된 작업 스테이지의 수선 방법은, 세척 단계와, 예열 단계와, 코팅 단계와, 열경화 단계를 포함한다. 세척 단계는 작업스테이지 중 수선이 필요한 특정 부위를 세척한다. 예열 단계는 상기 특정 부위를 예열한다. 코팅 단계는 상기 특정 부위에 탄소나노튜브가 함유된 리페어 용액을 코팅한다. 열경화 단계는 상기 리페어 용액이 코팅된 특정 부위를 열경화시킨다. 본 발명에 따르면 현장에서 신속하고, 간편하게 CNT 대전방지 처리된 작업 스테이지를 리페어 할 수 있다.
PCT/KR2011/002397 2010-04-06 2011-04-06 Cnt 대전 방지 처리된 작업 스테이지의 수선 방법 WO2011126292A2 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2010-0031220 2010-04-06
KR1020100031220A KR101171316B1 (ko) 2010-04-06 2010-04-06 씨엔티대전 방지 처리된 작업 스테이지의 수선 방법

Publications (2)

Publication Number Publication Date
WO2011126292A2 WO2011126292A2 (ko) 2011-10-13
WO2011126292A3 true WO2011126292A3 (ko) 2012-03-08

Family

ID=44763397

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2011/002397 WO2011126292A2 (ko) 2010-04-06 2011-04-06 Cnt 대전 방지 처리된 작업 스테이지의 수선 방법

Country Status (2)

Country Link
KR (1) KR101171316B1 (ko)
WO (1) WO2011126292A2 (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101381864B1 (ko) * 2012-06-11 2014-04-24 (주)탑나노시스 탄소나노튜브 코팅막 및 상기 탄소나노튜브 코팅막을 형성하는 탄소나노튜브 용액 조성물
KR102231786B1 (ko) 2018-12-19 2021-03-25 (주)탑나노시스 손상된 작업스테이지 보수용 용액 조성물, 상기 보수용 용액 조성물을 이용한 손상된 작업스테이지 보수 방법
KR102261935B1 (ko) 2019-09-25 2021-06-07 (주)탑나노시스 작업 스테이지 수선 방법

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030047036A (ko) * 2001-12-07 2003-06-18 주식회사 코미코 플라즈마 스프레이 방식을 이용한 세라믹 반도체 부품의제조 및 재생 방법
KR20070040300A (ko) * 2005-10-11 2007-04-16 미쓰비시덴키 가부시키가이샤 소자기판의 제조 방법 및 기판 지지장치
US20070190799A1 (en) * 2005-01-18 2007-08-16 Applied Materials, Inc. Refurbishing a wafer having a low-k dielectric layer
US20080024742A1 (en) * 2006-07-26 2008-01-31 Tadahiro Ohmi Substrate stage and heat treatment apparatus
US20090034149A1 (en) * 2007-07-31 2009-02-05 Applied Materials, Inc. Method for refurbishing an electrostatic chuck with reduced plasma penetration and arcing

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003083783A (ja) 2001-09-10 2003-03-19 Advance Denki Kogyo Kk フローモニター

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030047036A (ko) * 2001-12-07 2003-06-18 주식회사 코미코 플라즈마 스프레이 방식을 이용한 세라믹 반도체 부품의제조 및 재생 방법
US20070190799A1 (en) * 2005-01-18 2007-08-16 Applied Materials, Inc. Refurbishing a wafer having a low-k dielectric layer
KR20070040300A (ko) * 2005-10-11 2007-04-16 미쓰비시덴키 가부시키가이샤 소자기판의 제조 방법 및 기판 지지장치
US20080024742A1 (en) * 2006-07-26 2008-01-31 Tadahiro Ohmi Substrate stage and heat treatment apparatus
US20090034149A1 (en) * 2007-07-31 2009-02-05 Applied Materials, Inc. Method for refurbishing an electrostatic chuck with reduced plasma penetration and arcing

Also Published As

Publication number Publication date
KR20110111904A (ko) 2011-10-12
WO2011126292A2 (ko) 2011-10-13
KR101171316B1 (ko) 2012-08-10

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