WO2011124074A1 - 一种圆柱型等离子体谐振腔 - Google Patents

一种圆柱型等离子体谐振腔 Download PDF

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Publication number
WO2011124074A1
WO2011124074A1 PCT/CN2010/079322 CN2010079322W WO2011124074A1 WO 2011124074 A1 WO2011124074 A1 WO 2011124074A1 CN 2010079322 W CN2010079322 W CN 2010079322W WO 2011124074 A1 WO2011124074 A1 WO 2011124074A1
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Prior art keywords
cylindrical
waveguide
resonant cavity
cavity
movable end
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PCT/CN2010/079322
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English (en)
French (fr)
Inventor
李震宇
卢松涛
刘善沛
龙胜亚
雷高清
刘泳涛
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长飞光纤光缆有限公司
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Application filed by 长飞光纤光缆有限公司 filed Critical 长飞光纤光缆有限公司
Priority to EP10849310.7A priority Critical patent/EP2557629B1/en
Publication of WO2011124074A1 publication Critical patent/WO2011124074A1/zh
Priority to US13/647,407 priority patent/US9282625B2/en

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00—Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/14—Vacuum chambers
    • H05H7/18—Cavities; Resonators
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
    • C03B37/01815—Reactant deposition burners or deposition heating means
    • C03B37/01823—Plasma deposition burners or heating means
    • C03B37/0183—Plasma deposition burners or heating means for plasma within a tube substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32247—Resonators

Definitions

  • the present invention relates to a cylindrical plasmonic resonator for a PCVD fiber preform processing machine, which is an improvement over existing plasmonic resonators. Background technique
  • PCVD or plasma chemical vapor deposition is one of the main processes for optical fiber preform processing.
  • the PCVD process is flexible and precise.
  • the plasma resonator microwave system is the core part of PCVD processing equipment.
  • the plasmonic cavity microwave system comprises a plasmonic resonator, a microwave generator and a waveguide device.
  • the waveguide device couples the microwave transmission generated by the microwave generator to the plasmon resonator, and processes the fiber preform through the plasmon resonator.
  • the zone emits high frequency microwave energy to complete the PCVD process.
  • the matching between the cavity and the microwave is very important. Otherwise, the mismatch between the two will not only affect the coupling effect, but also cause energy loss, and it will also damage the system components and affect the processing accuracy of the PCVD process.
  • the existing plasmonic resonators for the manufacture of optical fiber preforms are divided into two different types of structures, coaxial and cylindrical.
  • the cylindrical type is easier to realize the PCVD processing of large-diameter preforms.
  • the cylindrical cavity has a simple cavity structure, is easy to manufacture, and has excellent deposition performance.
  • most of the existing resonant cavities are fixed structures, and the dimensions of the cavities are fixed, which cannot meet the deposition of different sizes of liners, and the processing range is greatly limited. Summary of the invention
  • the technical problem to be solved by the present invention is to provide a cylindrical plasmonic resonator for the above-mentioned deficiencies of the prior art, which is not only simple in structure, easy to process, excellent in deposition performance, but also capable of adjusting and loading within a certain range. Matching performance, meeting the requirements of different sizes of liner deposition, and expanding the processing range.
  • a cylindrical cavity is included, a cut-off waveguide is disposed at both ends of the cylindrical cavity, and a waveguide is opened in the circumferential direction of the cylindrical cavity.
  • the inlet is different in that: the cut-off waveguide at the two ends of the cylindrical resonator housing is a movable end cover structure, the movable end cover structure cut-off waveguide is provided with an intermediate through-hole, the inner end surface is provided with a convex round table, and the cylinder Type resonator phase configuration.
  • the cut-off waveguides of the movable end cover structures at both ends of the cylindrical resonator housing are symmetrical.
  • the connecting hole is opened at the outer periphery of the end face of the cut-off waveguide of the movable end cover structure, and the screw hole is correspondingly arranged at the end of the cylindrical cavity, and the movable end cover and the cylindrical cavity end are connected by bolts.
  • the head phase is fixed.
  • the cut-off waveguide of the movable end cover structure is provided with a cooling water channel, and the two ends of the cooling water channel are in communication with the cooling water pipe.
  • the beneficial effects of the invention are as follows: 1. Since the cut-off waveguide is a movable end cap structure, the inner diameter and the length of the cut-off waveguide can be adjusted by adjusting the diameter of the intermediate through-hole and adjusting the axial thickness of the movable end cap, so that the resonant cavity can be Matching with different diameters of glass liners in a certain size range, the waveguide device can better match the cavity load, improve the coupling effect, adapt to the load change during the process, reduce the energy loss, and thus expand the cylindrical plasma. The processing range of the resonant cavity; 2.
  • the cavity structure is simple, easy to process and manufacture; the energy distribution is uniform throughout the cavity; as shown in Figure 1 and Figure 2, the deposition is uniform; the deposition adhesion effect is good, the dust is less, and the pipeline is not blocked.
  • the deposition rate and efficiency are high, and the processing precision and efficiency of the PCVD process are improved. 3.
  • the use performance is stable and the work reliability is strong. Since there is no other device in the cavity, the phenomenon of arc ignition can be avoided, and the microwave system is avoided. Damage, thereby increasing the effective service life of the plasmonic microwave system; 4 Cooling channels arranged in the active end cap cutoff waveguide structure, the structure is simple, and can fully meet the cooling requirements of the high temperature environment of the resonator.
  • Figure 1 is a front cross-sectional structural view showing an embodiment of the present invention.
  • FIG. 2 is a graph comparing the uniformity of refractive index deviation of a core layer of a deposited mandrel according to an embodiment of the present invention.
  • FIG 3 is a graph comparing the uniformity of refractive index deviation of a deposited mandrel cladding according to an embodiment of the present invention.
  • FIG. 4 is a graph comparing the uniformity of refractive index total deviation of a deposited mandrel according to an embodiment of the present invention.
  • Figure 5 is a graph comparing the diameter uniformity of a core of a deposited mandrel according to an embodiment of the present invention. detailed description
  • a cylindrical resonator chamber 1 having a diameter D and a cavity length L, which is opened in the circumferential direction of the cylindrical resonator housing 1.
  • the waveguide inlet 4 is connected to the waveguide device, and a cut-off waveguide 2 of a movable end cover structure is disposed at both ends of the cylindrical resonator chamber 1.
  • the cut-off waveguide 2 of the movable end cover structure is provided with an intermediate through hole 5 having an aperture d , the inner end surface is provided with a raised round table, Arranging with the cylindrical cavity, the outer section from the inner end surface of the circular table to the movable end cover structure is the length of the cutoff waveguide /, and the connection hole is opened at the outer periphery of the end face of the movable end cover structure, at the end of the cylindrical cavity
  • the movable end cover is fixed to the end of the cylindrical cavity of the resonant cavity by bolts; the movable end cover structure of the two ends is symmetrical with respect to the waveguide; thereby forming a fixed cylindrical plasma capable of detachably replacing the cut-off waveguide Resonant cavity, used to process glass liners of different diameters within a certain range.
  • the cut-off waveguide 2 of the movable end cover structure is provided with a cooling water channel 6, and the two ends of the cooling water channel 6 communicate with the cooling water pipe, and the entire cavity and the cut-off waveguide can be sufficiently cooled by heat conduction.
  • the cross-sectional area of the inlet and outlet pipes of the cooling water channel is 40mm 2 ⁇ 50mm 2
  • the cross-sectional area of the cooling water channel in the movable end cover is about 270mm 2 ⁇ 470mm 2 .
  • the external cooling water supply pressure is about 3Bar ⁇ 4Bar
  • the flow rate is 2.5m/s ⁇ 3m/s
  • the cooling water flow is about 6L/min ⁇ 9L/min.
  • the heat exchange capacity is about 12kJ ⁇ 19kJ.
  • D 100 ⁇ 5 mm
  • L 87 ⁇ 2 mm
  • d 45 ⁇ 2 mm
  • / 50 ⁇ 5 mm.
  • D 100 ⁇ 5 mm
  • L 87 ⁇ 2 mm
  • d 55 ⁇ 2 mm
  • / 50 ⁇ 5 mm.
  • D 100 ⁇ 5 mm
  • L 87 ⁇ 2 mm
  • d 65 ⁇ 2 mm
  • / 50 ⁇ 5 mm.
  • D 100 ⁇ 5 mm
  • L 87 ⁇ 2 mm
  • d 70 mm soil 2 mm
  • / 50 mm ⁇ 70 mm.
  • the deposition rate of the resonator core layer of the present invention is higher than that of other resonators under the same external conditions.
  • the effect of the resonator deposition of the present invention is better than that of other resonators.

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  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
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Abstract

本发明涉及一种用PCVD光纤预制棒加工机床的圆柱型等离子体谐振腔，包括有圆柱型谐振腔壳体，在圆柱型谐振腔壳体两端设置截止波导，在圆柱型谐振腔壳体周向开设有一波导入口，其特征在于：在圆柱型谐振腔壳体两端的截止波导为活动端盖结构，所述的活动端盖结构截止波导开设有中间通孔，内端面设置凸起的圆台，与圆柱型谐振腔相配置。本发明通过拆换截止波导可使谐振腔与不同直径的玻璃管相匹配，使波导装置更好地与谐振腔负载匹配，提高耦合效果，以适应加工过程中负载的变化，减少能量损耗，从而提高了圆柱型等离子体谐振腔的加工适应范围；本发明结构简单，易于加工制造；沉积均匀；沉积附着效果好，提高了PCVD工艺的加工精度和效率。

Description

一种圆柱型等离子体谐振腔 技术领域
本发明涉及一种用于 PCVD光纤预制棒加工机床的圆柱型等离子体谐振腔，是对 现有等离子体谐振腔的改进。 背景技术
PCVD即等离子化学气相沉积法是光纤预制棒加工的主要工艺之一， PCVD工艺 具有灵活精密的特点， 而等离子体谐振腔微波系统是 PCVD加工设备的核心部分。 等 离子体谐振腔微波系统包括有等离子体谐振腔、 微波发生器和波导装置三部分组成， 波导装置将微波发生器产生的微波传输耦合至等离子体谐振腔， 通过等离子体谐振腔 向光纤预制棒加工区发射高频微波能量来完成 PCVD工艺加工过程。在这过程中等离 子体谐振腔与微波的匹配十分重要， 否则， 两者之间的不匹配不仅会影响耦合效果， 造成能量的损耗， 而且还易损坏系统器件， 并影响 PCVD工艺的加工精度。
现有用于光纤预制棒制造的等离子体谐振腔分为同轴型与圆柱型两种不同的结构 类型。 其中圆柱型更易于实现大直径预制棒的 PCVD加工。 圆柱型谐振腔的型腔结构 简单， 容易加工制造， 沉积性能优异。 但现有各型谐振腔大都为固定结构， 腔体的尺 寸固定， 不能满足不同尺寸的衬管沉积， 加工范围受到很大的限制。 发明内容
本发明所要解决的技术问题是针对上述现有技术存在的不足而提供一种圆柱型 等离子体谐振腔， 它不仅结构简单， 易于加工， 沉积性能优异， 而且能够在一定的范 围内调整与负载的匹配性能， 满足不同尺寸的衬管沉积要求， 扩大加工范围。
本发明为解决上述提出的问题所采用的技术方案为： 包括有圆柱型谐振腔壳体， 在圆柱型谐振腔壳体的两端设置截止波导， 在圆柱型谐振腔壳体周向开设有一波导入 口， 其不同之处在于： 在圆柱型谐振腔壳体两端的截止波导为活动端盖结构， 所述的 活动端盖结构截止波导开设有中间通孔， 内端面设置凸起的圆台， 与圆柱型谐振腔相 配置。 按上述方案， 所述的圆柱型谐振腔壳体两端的活动端盖结构的截止波导相对称。 按上述方案， 在活动端盖结构的截止波导端面近外周处开置连接孔， 在圆柱型谐 振腔壳体的端头对应设置螺孔，通过螺栓将活动端盖与圆柱型谐振腔壳体端头相固联。
按上述方案， 所述的活动端盖结构的截止波导内设有冷却水道， 冷却水道的两头 与冷却水管道相连通。
本发明的有益效果在于： 1、 由于截止波导为活动端盖结构， 通过对其中间通孔直 径的调整和活动端盖轴向厚度的调整使截止波导的内径和长度得以调整， 可使谐振腔 与一定尺寸范围内不同直径的玻璃衬管相匹配，使波导装置更好地与谐振腔负载匹配， 提高耦合效果， 以适应加工过程中负载的变化， 减少能量损耗， 从而扩大了圆柱型等 离子体谐振腔的加工范围； 2、 型腔结构简单， 易于加工制造； 在整个腔体内， 能量分 布均匀； 如图 1与图 2所示， 沉积均匀； 沉积附着效果好， 粉尘少， 不堵塞管道， 沉 积速率和效率高， 提高了 PCVD工艺的加工精度和效率； 3、 使用性能稳定， 工作可 靠性强， 由于谐振腔内无其它器件， 可避免电弧打火现象的出现， 避免微波对系统器 件的损坏， 从而提高等离子体谐振腔微波系统的有效使用寿命； 4、在截止波导的活动 端盖结构中设置冷却水道， 结构简单， 并能充分满足谐振腔高温环境下的冷却要求。 附图说明
图 1为本发明一个实施例的正剖视结构图。
图 2为本发明一个实施例的沉积芯棒芯层折射率偏差均匀性比较图表。
图 3为本发明一个实施例的沉积芯棒包层折射率偏差均匀性比较图表。
图 4为本发明一个实施例的沉积芯棒折射率总偏差均匀性比较图表。
图 5为本发明一个实施例的沉积芯棒芯层直径均匀性比较图表。 具体实施方式
以下结合附图进一步说明本发明的实施例， 包括圆柱型谐振腔壳体 1， 圆柱型谐 振腔腔体直径为 D， 腔体长度为 L， 在圆柱型谐振腔壳体 1的周向开设有一波导入口 4与波导装置相接，在圆柱型谐振腔壳体 1的两端设置活动端盖结构的截止波导 2，所 述活动端盖结构的截止波导 2开设有中间通孔 5， 孔径为 d， 内端面设置凸起的圆台， 与圆柱型谐振腔相配置， 从圆台的内端面至活动端盖结构外断面为截止波导长度 /， 在活动端盖结构的端面近外周处开设连接孔， 在圆柱型谐振腔壳体的端头对应设置螺 孔， 通过螺栓将活动端盖与圆柱型谐振腔壳体端头相固联； 两端的活动端盖结构截止 波导相对称； 由此构成可拆卸调换截止波导的固定型圆柱型等离子体谐振腔， 用以加 工一定范围内的不同直径的玻璃衬管。 此外， 所述的活动端盖结构的截止波导 2内设 有冷却水道 6， 冷却水道 6的两头与冷却水管道相连通， 通过热传导， 能使整个谐振 腔壳体及截止波导充分冷却。 冷却水道入口和出口管路横截面积为 40mm2~50mm2， 活动端盖内冷却水道横截面积约为 270mm2~470mm2。 外部冷却水供水压力约 3Bar~4Bar, 流速为 2.5m/s~3m/s， 其冷却水流量约为 6L/min~9L/min。 冷却水道冷却 水入口与出口的温差 A t=28 °C ~32°C， 换热能力约为 12kJ~19kJ。
本实施例的主要结构参数如下：
( 1 ) 对于外径约 36mm的玻璃衬管， 选择关键参数如下：
D=100±5mm， L=87±2mm， d=45土 2mm， /=50±5mm。
( 2) 对于外径约 47mm的玻璃衬管， 选择关键参数如下：
D=100±5mm， L=87±2mm， d=55土 2mm， /=50±5mm。
( 3 ) 对于外径约 55mm的玻璃衬管， 选择关键参数如下：
D=100±5mm， L=87±2mm， d=65土 2mm， /=50±5mm。
( 4) 对于外径约 60mm的玻璃衬管， 选择关键参数如下：
D=100±5mm， L=87±2mm， d=70mm土 2mm， /=50mm~70mm。
从图 2~图4的图表可知， 在同等外部条件下， 本发明谐振腔芯层的沉积速率要高 于其它谐振腔。
从图 5的图标可知， 从 0到 200mm长度的沉积区域内， 从直径与折射率的指标 来看， 本发明谐振腔沉积的效果要好于其它谐振腔。

Claims

权 利 要 求 书
1 . 一种圆柱型等离子体谐振腔， 包括有圆柱型谐振腔壳体， 在圆柱型谐振腔壳 体的两端设置截止波导， 在圆柱型谐振腔壳体周向开设有一波导入口， 其特征在于： 在圆柱型谐振腔壳体两端的截止波导为活动端盖结构， 所述的活动端盖结构截止波导 开设有中间通孔， 内端面设置凸起的圆台， 与圆柱型谐振腔相配置。
2. 按权利要求 1所述的圆柱型等离子体谐振腔， 其特征在于： 所述的圆柱型谐振 腔壳体两端活动端盖结构的截止波导相对称。
3. 按权利要求 1或 2所述的圆柱型等离子体谐振腔， 其特征在于： 在活动端盖 结构的截止波导端面近外周处开设连接孔，在圆柱型谐振腔壳体的端头对应设置螺孔， 通过螺栓将活动端盖与圆柱型谐振腔壳体端头相固联。
4. 按权利要求 3所述的圆柱型等离子体谐振腔， 其特征在于： 所述的活动端盖结 构的截止波导内设有冷却水道， 冷却水道的两头与冷却水管相连通。
5. 按权利要求 4所述的圆柱型等离子体谐振腔， 其特征在于： 冷却水道入口与出 口管路横截面积为 40mm2~50mm2，活动端盖内冷却水道横截面积为 270mm2~470mm2。
6. 按权利要求 4所述的圆柱型等离子体谐振腔， 其特征在于： 冷却水供水压力 3Bar~4Bar, 流速为 2.5m/s~3m/s， 冷却水流量为 6L/min~9L/min， 冷却水道冷却水入 口与出口的温差 A t=28。C -32 °C。
7. 按权利要求 4所述的圆柱型等离子体谐振腔， 其特征在于： 所述的圆柱型谐 振腔主要结构参数为： D=100土 5mm， L=87±2mm， d=45±2mm， /=50土 5mm; 其中 D为 圆柱型谐振腔腔体直径， L为腔体长度， d为截止波导开设中间通孔孔径， /为从圆台 的内端面至活动端盖结构外端面的截止波导长度。
8. 按权利要求 4所述的圆柱型等离子体谐振腔， 其特征在于： 所述的圆柱型谐 振腔主要结构参数为： D=100±5mm， L=87+2mm, d=55+2mm, /=50+5mm; 其中 D为 圆柱型谐振腔腔体直径， L为腔体长度， d为截止波导开设中间通孔孔径， /为从圆台 的内端面至活动端盖结构外端面的截止波导长度。
9. 按权利要求 4所述的圆柱型等离子体谐振腔， 其特征在于： 所述的圆柱型谐 振腔主要结构参数为： D=100土 5mm， L=87±2mm， d=65±2mm， /=50土 5mm; 其中 D为 圆柱型谐振腔腔体直径， L为腔体长度， d为截止波导开设中间通孔孔径， /为从圆台 的内端面至活动端盖结构外端面的截止波导长度。
10. 按权利要求 4所述的圆柱型等离子体谐振腔， 其特征在于： 所述的圆柱型谐 振腔主要结构参数为： D=100±5mm， L=87±2mm， d=70mm土 2mm， /=50mm~70mm; 其中 D为圆柱型谐振腔腔体直径， L为腔体长度， d为截止波导开设中间通孔孔径， I 为从圆台的内端面至活动端盖结构外端面的截止波导长度。
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