WO2011096530A1

WO2011096530A1 - Method of manufacturing color filter and liquid crystal panel

Info

Publication number: WO2011096530A1
Application number: PCT/JP2011/052408
Authority: WO
Inventors: 誠大植
Original assignee: シャープ株式会社
Priority date: 2010-02-08
Filing date: 2011-02-04
Publication date: 2011-08-11

Abstract

Provided is a color filter substrate capable of implementing a high contrast ratio. A first coloring layer (14a) comprising a first coloring material (61) is formed on a substrate (12) after which a second coloring material (62) is deposited onto the substrate (12). Subsequently, a second coloring layer (14b) is formed on the substrate (12) by irradiating light onto the second coloring material (62) via a mask (72). In the process for forming the second coloring layer (14b), in the mask (72) a slit (73b) is formed in the image pixel edge portion (73) through which light is irradiated onto the area (15a) where the first coloring layer (14a) adjoins the second coloring layer (14b).

Description

Color filter manufacturing method and liquid crystal panel

The present invention relates to a color filter manufacturing method and a liquid crystal panel. In particular, the present invention relates to a method for manufacturing a color filter used for a liquid crystal panel having a high contrast ratio.
Note that this application claims priority based on Japanese Patent Application No. 2010-25616 filed on Feb. 8, 2010, the entire contents of which are incorporated herein by reference. .

In recent years, thin and light liquid crystal panels have been used as display panels used in personal computer displays and display units of portable information terminal devices. And the display characteristics of the liquid crystal panel have been improved, and the use for television receivers and the like is progressing. Although the viewing angle characteristics of the liquid crystal panel have been improved, further improvement is desired. In particular, there is a strong demand for improving the viewing angle characteristics of a liquid crystal panel using a vertically aligned liquid crystal layer (sometimes referred to as a VA (Vertical Alignment) mode liquid crystal panel).

Currently, VA mode liquid crystal panels used for large display devices such as televisions employ an alignment division structure in which a plurality of liquid crystal domains are formed in one pixel region in order to improve viewing angle characteristics. As a method of forming the alignment division structure, the MVA mode is the mainstream. In the MVA mode, by providing an alignment regulating structure on the liquid crystal layer side of a pair of substrates facing each other with a vertical alignment type liquid crystal layer interposed therebetween, a plurality of domains (typically the alignment direction is different) 4 types). As the alignment regulating structure, slits (openings) or ribs (projection structure) provided on the electrodes are used, and the alignment regulating force is exhibited from both sides of the liquid crystal layer (for example, Patent Documents 1 to 4).

Japanese Patent Laid-Open No. 11-133429 Japanese Patent Laid-Open No. 11-352486 JP 2007-163978 A JP 2007-256811 A JP 2009-282366 A

The characteristics required for liquid crystal panels are not only the viewing angle characteristics but also the improvement of the contrast ratio. When slots or ribs are provided as the orientation restricting structure, the light transmittance of the region in which the slots or ribs are provided is lowered, so that the display luminance is lowered, and therefore it is difficult to realize a high contrast ratio.

However, recently, the photo-alignment method has been put to practical use as a method for setting the pretilt direction of liquid crystal molecules, and it has become possible to achieve excellent visual field characteristics without providing slots or ribs (for example, patent documents). 5). Then, the restriction in the case where the slot or the rib is provided is removed, and according to the study of the present inventor, it has been found that a new problem arises in further improvement of the contrast ratio.

FIG. 6 is a cross-sectional view schematically showing the structure of the liquid crystal panel 1000 examined by the present inventors. The liquid crystal panel 1000 shown in FIG. 6 includes a color filter substrate 110 and an array substrate 120 facing each other. A liquid crystal layer 130 is provided between the color filter substrate 110 and the array substrate 120.

Vertical alignment films

111 and 121 for aligning liquid crystal molecules vertically with respect to both

substrates

110 and 120 when the voltage applied to the liquid crystal layer 130 is OFF are provided on the surfaces of both

substrates

110 and 120 on the liquid crystal layer 130 side. It has been. A pair of polarizing

plates

141 and 142 are attached to the outer surfaces of both the

substrates

110 and 120 so that their polarization axes are orthogonal to each other. Note that a backlight 150 for irradiating light is provided on the back side of the array substrate 120. The backlight 150 is, for example, a linear light source (CCFL or the like) or an LED light source.

Further, a color filter layer (R, G, B) 114 is formed on the surface of the glass substrate 112 of the color filter substrate 110. The color filter layer 114 is composed of a first colored layer (R) 114a, a second colored layer (G) 114b, and a third colored layer (B) 114c, and between the colored layers (R, G, B). A black matrix 116 is formed. The black matrix 116 can suppress color mixing of the colored layers (R, G, B).

Of the surface of the color filter substrate 110, sharp corners 115 are formed on the liquid crystal layer 130 side in the color overlap portions of the colored layers (R, G, B). The corner 115 is formed for the following reason. That is, when the color filter substrate 110 is manufactured, the first colored layer (R) 114a, the second colored layer (G) 114b, the third colored layer (B) 114c and the respective layers are sequentially formed. In consideration of errors (tolerances, etc.) in the manufacturing process of the color filter, if the respective colored layers (R, G, B) are formed so as not to cause color loss, corner portions 115 are inevitably formed.

When only a low contrast ratio (for example, 3000 or less) is required for the liquid crystal panel 1000, even if the corner portion 115 is present on the color filter substrate 110, the influence thereof is little or hardly. On the other hand, when the liquid crystal panel 1000 is required to have a very high contrast ratio (for example, 5000 or more), the presence of the corner 115 affects. Specifically, due to the influence of the corner 115, the alignment of the liquid crystal molecules in the region 131 in contact with the alignment film 111 around the corner 115 in the liquid crystal layer 130 is disturbed, and as a result, the contrast ratio is lowered.

Further explanation is as follows. In the black portion of the liquid crystal panel 1000, the voltage applied to the liquid crystal layer 130 is turned off, and the liquid crystal molecules are aligned substantially perpendicular to the surfaces of both the

substrates

110 and 120. In this state, when light is irradiated from the backlight 150, the light transmitted through the polarizing plate 142 is blocked by the polarizing plate 141, so that a black display is obtained. However, if the orientation of the liquid crystal molecules in the region 131 around the corner 115 is disturbed due to the influence of the corner 115 of the color filter layer 114, the light passing through the region 131 has a large light leakage in the black display state. This causes a decrease in contrast ratio.

On the other hand, in order to suppress a decrease in contrast ratio, it is also possible to execute processing for removing the corner portions 115 of the color filter layer 114 and flattening the surface of the color filter layer 114. However, when such a process is performed, the manufacturing process increases, and thus the manufacturing cost of the color filter substrate 110 increases. Today, it is very important to manufacture a high quality liquid crystal panel 1000 at a low cost, and it is difficult to introduce an extra manufacturing process.

The present invention has been made in view of such a point, and a main object thereof is to provide a color filter manufacturing method capable of easily manufacturing a color filter substrate capable of realizing display with a high contrast ratio. There is.

The method for producing a color filter according to the present invention includes a step (a) of forming a first colored layer composed of a first colored material on a substrate, and a second coloring so as to cover the first colored layer. A step (b) of depositing a second coloring material constituting the layer on the substrate; and irradiating the second coloring material with light through a mask, thereby adjoining the first coloring layer. (C) on the substrate, and in the step (c), a pixel edge region that irradiates an adjacent region of the first colored layer and the second colored layer in the mask. A slit is formed in the portion.
In a preferred embodiment, the method further includes the step (d) of depositing a third coloring material constituting the third coloring layer on the substrate so as to cover the second coloring layer, through a further mask. Irradiating the third colored material with light to form a third colored layer adjacent to the second colored layer on the substrate (e), and in the step (e), Among the further masks, a slit is formed in a portion of a pixel edge region that irradiates an adjacent region of the second colored layer and the third colored layer.
In a preferred embodiment, the step of forming an alignment film on the first colored layer, the second colored layer, and the third colored layer is performed, and the step of forming the alignment film includes light irradiation. A light irradiation step for defining the orientation direction is included.
The liquid crystal panel according to the present invention is a liquid crystal panel including a color filter substrate and an array substrate facing each other, and a liquid crystal layer provided between the color filter substrate and the array substrate, and the liquid crystal layer and the color filter An alignment film for aligning liquid crystal molecules constituting the liquid crystal layer is formed between the substrate and the color filter substrate. The color filter substrate includes a translucent base material, and the liquid crystal layer side of the translucent base material. Formed of the first colored material, adjacent to the first colored layer, adjacent to the second colored layer formed of the second colored material, and adjacent to the second colored layer, A third colored layer composed of a third colored material, wherein the second colored layer is slit in a portion of a pixel edge region that irradiates an adjacent region of the first colored layer and the second colored layer. Before the mask is formed The second colored material is formed by irradiating light, and the third colored layer is formed with a slit in a portion of a pixel edge region that irradiates an adjacent region of the second colored layer and the third colored layer. It is formed by irradiating the third coloring material with light through a further mask.
In a preferred embodiment, the alignment film is a photo-alignment film whose alignment direction is defined by light irradiation.

According to the present invention, the second colored material is deposited on the substrate so as to cover the first colored layer, and then the second colored material is irradiated with light through the mask so as to be adjacent to the first colored layer. The process of forming a 2nd colored layer is performed. In the step of forming the second colored layer, a slit is formed in a portion of the pixel edge region that irradiates the adjacent region of the first colored layer and the second colored layer in the mask, and the slit The film thickness of the second colored layer in the adjacent region can be adjusted. Therefore, since it is possible to suppress the occurrence of corners (convex portions in the color overlap portion) in the adjacent region between the first colored layer and the second colored layer, it is possible to alleviate disorder in the alignment of liquid crystal molecules around the adjacent region, Therefore, the occurrence of light leakage can be suppressed. As a result, it is possible to easily manufacture a color filter substrate that can realize display with a high contrast ratio.

It is sectional drawing which shows typically the structure of the liquid crystal panel 100 which concerns on embodiment of this invention. It is a figure which shows the structure of the mask 90 in which the slit was formed. It is the graph which showed the relationship between the average transmittance | permeability of a mask, and a film thickness. (A) to (c) are process cross-sectional views for explaining a method for manufacturing the color filter substrate 10 according to the embodiment of the present invention. (A) to (c) are process cross-sectional views for explaining a method for manufacturing the color filter substrate 10 according to the embodiment of the present invention. 2 is a cross-sectional view schematically showing a configuration of a liquid crystal panel 1000. FIG.

Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following drawings, components having substantially the same function are denoted by the same reference numerals for the sake of brevity. In addition, this invention is not limited to the following embodiment.

FIG. 1 schematically shows a cross-sectional configuration of a liquid crystal panel 100 according to an embodiment of the present invention. The liquid crystal panel 100 of this embodiment includes a color filter substrate 10 and an array substrate 20 that face each other. A liquid crystal layer 30 is provided between the color filter substrate 10 and the array substrate 20.

Between the liquid crystal layer 30 and the color filter substrate 10, an alignment film 11 for aligning liquid crystal molecules constituting the liquid crystal layer 30 is formed. The alignment film 11 of the present embodiment is a vertical alignment film that vertically aligns liquid crystal molecules constituting the liquid crystal layer 30. The array substrate 20 of the present embodiment is a substrate on which a thin film transistor (TFT) is formed. On the surface of the array substrate 20, a vertical alignment film 21 that vertically aligns liquid crystal molecules constituting the liquid crystal layer 30 is formed. Note that when the liquid crystal molecules are vertically aligned by the

vertical alignment films

11 and 21, the liquid crystal layer 30 is referred to as being in a vertical alignment state, but the vertically aligned liquid crystal molecules are not aligned with the

vertical alignment films

11 and 21. It is not strictly perpendicular to the surface.

The color filter substrate 10 of the present embodiment is composed of a translucent substrate (for example, a glass substrate) 12 and a color filter layer 14 formed on the translucent substrate 12 on the liquid crystal layer 30 side. The color filter layer 14 includes a first colored layer (red: R) 14a, a second colored layer (green: G) 14b, and a third colored layer (blue: B) 14c. A black matrix 16 is formed between the colored layers (R, G, B). The black matrix 16 can suppress the color mixture of each colored layer (R, G, B).

Furthermore, the liquid crystal molecules constituting the liquid crystal layer 30 of this embodiment are negative-type nematic liquid crystals having negative dielectric anisotropy. When the voltage applied to the liquid crystal layer 30 is OFF, the liquid crystal molecules are aligned substantially perpendicular to the surfaces of both the

substrates

10 and 20. A pair of

polarizing plates

41 and 42 are attached to the outer surfaces of the color filter substrate 10 and the array substrate 20. Since the liquid crystal panel 100 of the present embodiment is a so-called normally white type, the

polarizing plates

41 and 42 are arranged so that their polarization axes are orthogonal to each other. A backlight 50 for irradiating light is provided on the back side of the array substrate 20.

In the configuration of the present embodiment, among the surfaces of the color filter substrate 10, the surface 15 in the color overlap portion 18 where the colored layers (R, G, B) overlap is substantially flat. That is, in the configuration of the present embodiment, there is no sharp corner (reference numeral 115 in FIG. 6) on the liquid crystal layer 30 side. This is because the exposure process was performed using the mask used in the manufacturing method of the present embodiment when forming the second colored layer (G). Similarly, when the third colored layer (B) is formed, the exposure process is performed using the mask used in the manufacturing method of the present embodiment. A method for manufacturing the color filter substrate 10 of the present embodiment and a mask used therefor will be described later.

Next, with reference to FIG. 2 and FIG. 3, the principle of making the surface 15 of the color overlapping portion 18 found by studying the present inventor substantially flat will be described. FIG. 2 shows a mask (gray tone mask) 90 in which slits are formed. FIG. 3 is a graph showing the relationship between the transmittance of exposure light and the thickness of the color resist.

The mask 90 shown in FIG. 2 has a structure composed of a striped light shielding pattern 92 in which slits are formed, and a transmission pattern 94 positioned between the light shielding patterns 92. If the ratio between the light shielding pattern 92 and the transmission pattern 94 is changed, the transmittance of the exposure light transmitted through the mask 90 can be changed.

FIG. 3 shows that the film thickness of the exposed photoresist can be adjusted by the average transmittance of the exposure light that has passed through the mask 90. The photoresist here is a positive resist whose solubility is increased by exposure light exposure. In the example shown in FIG. 3, when the average transmittance is 0% (the transmission pattern 94 is 0%), the film thickness of the photoresist is 3.27 μm, and the average transmittance is changed by changing the average transmittance. It can be adjusted from 1 μm to 0.8 μm. Although the case where the photoresist is a positive resist has been described here, the relationship with the positive resist is reversed, but even in the case of a negative resist, the film thickness can be adjusted by changing the average transmittance.

Next, a method for manufacturing the color filter substrate 10 of this embodiment will be described with reference to FIGS. 4 (a) to 5 (c). 4A to 5C are process cross-sectional views for explaining a method for manufacturing the color filter substrate 10.

First, after preparing a translucent base material (for example, a glass substrate) 12 made of a flat light transmissive material, a black matrix 16 is formed on the translucent base material 12 as shown in FIG. Form. The black matrix 16 is made of, for example, a metal material (for example, chromium oxide) or a black resin material. Next, a red resist 61 (R), which is a material constituting the red colored layer 14 a (R), is formed on the translucent substrate 12 so as to cover the black matrix 16. Here, the red resist 61 (R) is applied on the glass substrate 12 to a thickness of 1.0 to 2.5 μm, for example, and then dried.

Next, as shown in FIG. 4B, the red colored layer 14a (R) is formed by patterning the red resist 61 (R) through the mask 70. Specifically, a photomask 70 having an opening 70 a that defines the shape of the red colored layer 14 a (R) is disposed above the glass substrate 12, and exposure light (ultraviolet rays) 81 is transmitted through the photomask 70 to the red resist 61. Irradiate (R). Since the light shielding layer 70 b is formed on the photomask 70, the red resist 61 (R) is cured by the ultraviolet light that has passed through the opening 70 a. Next, the red colored layer 14a (R) is obtained by developing with an alkaline developer, for example.

Next, a green resist 62 (G), which is a material constituting the green colored layer 14 b (G), is formed on the glass substrate 12 so as to cover the red colored layer 14 a (R). Here, the green resist 62 (G) is applied on the glass substrate 12 to a thickness of 1.0 to 2.5 μm, for example, and then dried.

Next, as shown in FIG. 5A, the green colored layer 14b (G) is formed by patterning the green resist 62 (G) through the mask 72. Specifically, a photomask 72 having an opening 72 a that defines the shape of the green colored layer 14 b (G) is disposed above the glass substrate 12, and exposure light (ultraviolet light) 82 is transmitted through the photomask 72 to the green resist 62. Irradiate (G). Next, for example, the green colored layer 14b (G) is obtained by developing with an alkali developer.

Here, the light mask layer 72b is formed on the photomask 72, and the pixel that irradiates the adjacent region 15a of the red colored layer 14a (R) and the green colored layer 14b (G) in the photomask 72. A slit 73 b is formed in the edge region 73. The pixel edge region 73 is a region that irradiates the surface 15 in the color overlap portion 18 illustrated in FIG. 1, and corresponds to an upper peripheral region of the black matrix 16 in this example.

The slit 73b has the same structure as that shown in FIG. 2, and the average transmittance of the exposure light of the photomask 72 is adjusted by the slit 73b. Specifically, the green resist 62 (G) is cured by the ultraviolet rays that have passed through the opening 72a. Furthermore, the adjacent region 15a of the red colored layer 14a (R) and the green colored layer 14b (G) is substantially flattened by the ultraviolet rays that have passed through the slit 73b formed in the pixel edge region 73. In addition, the average transmittance of the pixel edge region 73 is adjusted by the slit 73b.

Next, as shown in FIG.5 (b), the blue colored layer 14c (B) is comprised on the glass substrate 12 so that the red colored layer 14a (R) and the green colored layer 14b (G) may be covered. A blue resist 63 (B) as a material is formed. Here, the blue resist 63 (B) is applied on the glass substrate 12 to a thickness of 1.0 to 2.5 μm, for example, and then dried.

Next, as shown in FIG. 5C, the blue colored layer 14c (B) is formed by patterning the blue resist 63 (B) through the mask 74. Specifically, a photomask 74 having an opening 74 a that defines the shape of the blue colored layer 14 c (B) is disposed above the glass substrate 12, and exposure light (ultraviolet light) 83 is transmitted through the photomask 74 to the blue resist 63. Irradiate (B). Next, for example, the blue colored layer 14c (B) is obtained by developing with an alkali developer.

Also in this mask 74, a slit 75b is formed in the portion of the pixel edge region 75 that irradiates the adjacent region. More specifically, a light shielding layer 74b is formed on the photomask 74, and pixels in the photomask 74 that irradiate adjacent regions of the green coloring layer 14b (G) and the blue coloring layer 14c (B). A slit 75 b is formed in the edge region 75. The slit 75b has the same structure as that shown in FIG. 2, and the average transmittance of the exposure light of the photomask 74 is adjusted by the slit 75b. Specifically, the blue resist 63 (B) is cured by the ultraviolet rays that have passed through the opening 74 a. Furthermore, the adjacent region 15b of the green coloring layer 14b (G) and the blue coloring layer 14c (B) is substantially flattened by the ultraviolet rays that pass through the slit 75b formed in the pixel edge region 75. In addition, the average transmittance of the pixel edge region 75 is adjusted by the slit 75b.

In this way, the color filter substrate 10 of the present embodiment can be obtained. In the color filter substrate 10 of the present embodiment as well, in order to prevent color loss, the

adjacent regions

15a and 15b are slightly convex rather than depressed. However, it is still substantially flat and is not in the state of the corner 115 as shown in FIG.

As described above, according to the method for manufacturing the color filter substrate 10 of the present embodiment, after the second colored material 62 (G) is deposited on the substrate 12 so as to cover the first colored layer 14a (R). The step of forming the second colored layer 14b (G) adjacent to the first colored layer 14a (R) is performed by irradiating the second colored material 62 (G) with light through the mask 72. Here, in the step of forming the second colored layer 14b (G), the pixel edge that irradiates the adjacent region 15a of the first colored layer 14a (R) and the second colored layer 14b (G) in the mask 72. A slit 73b is formed in the region 73, and the thickness of the second colored layer 14b (G) in the adjacent region 15a can be adjusted by the slit 73b.

Therefore, it is possible to suppress the occurrence of a corner portion (the convex portion 115 in the color overlapping portion shown in FIG. 6) in the adjacent region 15a between the first colored layer 14a (R) and the second colored layer 14b (G). . Disturbances in alignment of liquid crystal molecules around the adjacent region 15a can be alleviated, and therefore light leakage can be suppressed. As a result, the color filter substrate 10 capable of realizing display with a high contrast ratio can be easily manufactured. More specifically, since the second colored layer 14b (G) can be formed and the adjacent region 15a can be planarized with a single mask 72 (in a single exposure step), a complicated process is not used. In addition, the color filter substrate 10 capable of realizing a display with a high contrast ratio at a low cost while suppressing the mask cost can be manufactured.

Furthermore, as described above, the same technique can be executed in the step of forming the third colored layer 14c (B). That is, in the mask 74, a slit 75b is formed in a portion of the pixel edge region 75 that irradiates the adjacent region 15b of the second colored layer 14b (G) and the third colored layer 14c (B). The thickness of the third colored layer 14c (B) in the adjacent region 15b can be adjusted by the slit 75b. Therefore, it is possible to suppress the occurrence of a corner portion (the convex portion 115 in the color overlapping portion shown in FIG. 6) in the adjacent region 15b.

The first colored layer 14a, the second colored layer 14b, and the third colored layer 14c may not correspond to the red colored layer (R), the green colored layer (G), and the blue colored layer (B), respectively. Of course, other color combinations may be used. For example, the first colored layer 14a may be a blue colored layer (B), the second colored layer 14b may be a red colored layer (R), and the third colored layer 14c may be a green colored layer (G). Furthermore, the manufacturing method of the present embodiment can be applied even when the color filter layer 14 is composed of four or more colored layers instead of three colored layers.

Further, after the step shown in FIG. 5C, the vertical alignment film 11 can be formed on the color filter layer 14 (R, G, B). Of course, before the step of forming the vertical alignment film 11, a step of forming a transparent electrode (for example, an ITO electrode) and a step of forming a spacer (for example, a columnar spacer) are performed on the color filter layer 14. May be.

The vertical alignment film 11 is formed by, for example, an inkjet method, a printing method, a spin coating method, or the like. The vertical alignment film 11 of this embodiment is an organic alignment film (for example, a polyimide film), but an inorganic alignment film (for example, an inorganic alignment film having SiOx as a basic skeleton) can also be used.

In addition, as the alignment film 11, a photo-alignment film whose alignment direction is defined by light irradiation can be used. That is, a method of defining the pretilt direction of the liquid crystal molecules using a photo-alignment method can also be used. The photo-alignment method sets the pretilt angle by irradiating the photo-alignment film with polarized light. Unlike the rubbing method, the photo-alignment method is a non-contact process because a light irradiation step that defines the alignment direction by light irradiation is performed. Therefore, there is an advantage that static electricity is not generated.

In the case of a liquid crystal panel using a photo-alignment method, excellent viewing characteristics can be achieved without providing slots or ribs. Therefore, it is possible to realize a liquid crystal panel having an excellent contrast ratio that eliminates the influence of a decrease in light transmittance due to the slots or ribs. The color filter substrate 10 of the present embodiment can be suitably used for a liquid crystal panel having such an excellent contrast ratio (for example, 5000 or more).

After that, the array substrate 20 produced in a separate process and the color filter substrate 10 are opposed to each other, and the liquid crystal layer 30 is formed between the color filter substrate 10 and the array substrate 20. The liquid crystal layer 30 can be formed using, for example, a dropping injection method. After the structure including the color filter substrate 10 and the array substrate 20 sandwiching the liquid crystal layer 30 is formed,

polarizing plates

41 and 42 are attached to the outside of the color filter substrate 10 and the array substrate 20. In the case of a normally white type, the

polarizing plates

41 and 42 are arranged so that their polarization axes are orthogonal to each other. In this way, the liquid crystal panel 100 of the present embodiment is obtained.

As mentioned above, although this invention has been demonstrated by suitable embodiment, such description is not a limitation matter and, of course, various modifications are possible.

According to the present invention, it is possible to provide a color filter substrate and a liquid crystal panel that can realize display with a high contrast ratio.

10 Color filter substrate 11 Alignment film (Vertical alignment film)
12 Translucent substrate (glass substrate)
14 Color filter layer 14a to c Colored layer 15 Surface of

color overlapping portion

15a, 15b Adjacent region 16 Black matrix 18 Color overlapping portion 20 Array substrate 21 Alignment film (vertical alignment film)
30

Liquid crystal layer

41, 42 Polarizing plate 50 Backlight 61 Red resist 62 Green resist 63 Blue resist 70 Mask 70a Opening 70b Light shielding layer 72 Mask 72a Opening 72b Light shielding layer 73 Pixel edge region 73b Slit 74 Mask 74a Opening 74b Light shielding layer 75 pixel edge region 75b slit 90 mask 92 light shielding pattern 94 transmission pattern 100 liquid crystal panel 1000 liquid crystal panel

Claims

A color filter manufacturing method comprising:
Forming a first colored layer composed of a first colored material on a substrate (a);
Depositing a second colored material constituting the second colored layer on the substrate so as to cover the first colored layer;
(C) forming a second colored layer adjacent to the first colored layer on the substrate by irradiating the second colored material with light through a mask.
In the step (c), a slit is formed in a portion of a pixel edge region that irradiates an adjacent region of the first colored layer and the second colored layer in the mask. Manufacturing method.
Further, the step (d) of depositing a third colored material constituting the third colored layer on the substrate so as to cover the second colored layer is performed,
Forming a third colored layer adjacent to the second colored layer on the substrate by irradiating the third colored material with light through a further mask; and
In the step (e), a slit is formed in a part of a pixel edge region that irradiates an adjacent region of the second colored layer and the third colored layer in the further mask. The manufacturing method of the color filter of Claim 1.
Performing a step of forming an alignment film on the first colored layer, the second colored layer, and the third colored layer;
The method for producing a color filter according to claim 2, wherein the step of forming the alignment film includes a light irradiation step of defining an alignment direction by light irradiation.
A color filter substrate and an array substrate facing each other;
A liquid crystal panel comprising a liquid crystal layer provided between the color filter substrate and the array substrate,
Between the liquid crystal layer and the color filter substrate, an alignment film for aligning liquid crystal molecules constituting the liquid crystal layer is formed,
The color filter substrate is
A translucent substrate;
A first colored layer formed on the liquid crystal layer side of the translucent substrate and made of a first colored material;
A second colored layer adjacent to the first colored layer and composed of a second colored material;
A third colored layer composed of a third colored material adjacent to the second colored layer,
The second colored layer is
The second colored material is formed by irradiating light through a mask in which a slit is formed in a portion of a pixel edge region that irradiates an adjacent region of the first colored layer and the second colored layer. And
The third colored layer is
Formed by irradiating the third colored material with light through a further mask in which a slit is formed in a portion of a pixel edge region that irradiates an adjacent region of the second colored layer and the third colored layer LCD panel.
The liquid crystal panel according to claim 4, wherein the alignment film is a photo-alignment film whose alignment direction is defined by light irradiation.