JP5655426B2 - Color filter manufacturing method and color filter - Google Patents

Description

  The present invention relates to a color filter and a manufacturing method thereof, a color filter substrate, and a liquid crystal display device used for a mobile display such as a mobile phone and a high-resolution liquid crystal television compatible with digital broadcasting. In particular, the present invention relates to a color filter having a black matrix with a small aperture ratio reduction, high adhesion, and high sealing strength, a manufacturing method thereof, a color filter substrate, and a liquid crystal display device.

  A color liquid crystal display device is generally configured by enclosing a liquid crystal between a color filter substrate and an array substrate. The color filter substrate includes a transparent substrate as a structural support, and a polarizing film is laminated on the screen observer side. The opposite side (back side) is divided into a large number of pixel regions, and a light shielding film (so-called black matrix or BM) is provided at a portion between the pixels located at the boundary between the pixel region and the pixel region. Each of these has a transparent colored layer. The transparent colored layer colors the transmitted light for each pixel. Generally, a transparent colored layer of three colors of red (R), green (G), and blue (B) corresponding to the three primary colors of light is arranged for each pixel. doing.

  Furthermore, an overcoat layer that fills the level difference caused by the transparent colored pixels is provided, and a transparent electrode and an alignment film are provided. A color filter substrate for a liquid crystal display device such as a horizontal electric field method has a configuration in which a transparent electrode is omitted.

  On the other hand, the array substrate disposed opposite to the color filter substrate includes a transparent substrate as a structural support, and an electrode and an alignment film are provided on the liquid crystal side, and a polarizing film is provided on the opposite side. A voltage is applied to each pixel between the transparent electrode and the electrode on the array substrate side to control the transmission / non-transmission of light, and the transmitted light from the backlight is displayed on the screen as display light.

  The black matrix makes the position of the colored pixels of the color filter a fixed position and has a uniform size, and prevents color mixture of transmitted light colored in these colors. In addition, when used in a display device, it has a function of blocking unwanted light and making an image of the display device a uniform image with no unevenness and an improved contrast. Furthermore, in order to prevent malfunction caused by light of a TFT element (thin film transistor) that drives a liquid crystal provided on the opposing array substrate, it also has a function of shielding light to the TFT element.

  In this black matrix, a thin film is formed on a substrate using a metal such as chromium (Cr) or chromium oxide (CrOX), or a metal compound, and a positive photoresist is used on the formed thin film. An etching resist pattern is formed, and then the exposed portion of the formed metal thin film is etched and the etching resist pattern is stripped to form a black matrix. A black matrix formed using a metal such as chromium (Cr) is widely used as a chromium black matrix (hereinafter referred to as CrBM).

  In addition, there is a black matrix formed using a resin as a black matrix. This is formed by a photolithography method using, for example, a light-shielding photoresist (photosensitive colored resin composition) as a black matrix forming material, and recently used as a resin black matrix (hereinafter referred to as resin BM). Widely used. This resin BM requires a low-reflection resin BM to suppress internal reflection in a liquid crystal display device when using a CrBM when a high-brightness backlight is used, such as a television. Adopted when a highly insulating resin BM is required to suppress disturbance of the electric field in a liquid crystal display device that occurs when used in an IPS (In Plane Switching) system, for example. Is done.

  The CrBM substrate described above has a configuration such as “glass + CrO + Cr” and has low reflection on the glass surface side, but the film surface side (colored pixel side) is made of Cr, and thus has high reflectance. In a panel for an aircraft or the like, this reflection causes an abnormal operation of the TFT. In order to make the reflection low, the resin BM may be used. However, the resin BM has a problem that the adhesion is weak and the reliability is inferior to that of the CrBM. In addition, there is a double-sided low reflection Cr substrate such as “glass + CrO + Cr + CrO” in the CrBM substrate, but there is a problem that the material cost is high due to a special configuration.

  On the other hand, in recent years, mobile devices have further expanded their applications as information terminals and television viewing terminals, and these display devices are required to have higher resolution, higher luminance, and lower power consumption. In particular, regarding the resolution, for example, a mobile phone with a 2.4-inch display screen, which has a conventional resolution of QVGA (Quarter Video Graphics Array: 320 × 240 pixels), has a resolution of VGA (640 × 480 pixels). In this case, the width of one pixel of the transparent colored pixels is narrowed from about 75 μm to about 25 μm. If the ratio of the line width of the light-shielding film (black matrix) to the transparent colored pixels and the width of one pixel increases, the aperture ratio decreases and the display screen becomes dark. Therefore, it is necessary to make the light-shielding film as thin as possible. However, there is a limit in the photolithography process, and the light shielding film is generally used with a line width of about 5 to 15 μm.

  However, as described above, when forming CrBM or forming resin BM, photolithography is used to form the black matrix in any case. Usually, a photomask and a photoresist having a substantially substrate size are formed by, for example, performing batch exposure with a proximity aligner using a proximity aligner at a distance of about 50 μm to 100 μm, and then developing. Therefore, in order to form a pixel having a corner portion with good resolution as designed, even if it is exposed by irradiating ultraviolet rays through a photomask having a light-shielding pattern that faithfully reproduces the corner portion, the photomask Diffracted light is generated from the end of the light-shielding pattern, and the coating film of the photosensitive coloring composition is exposed to the diffracted light, resulting in a problem that the corner portion has poor resolution and the shape is rounded. The same applies to the case where a light shielding film is formed using a negative photoresist and a negative photoresist photomask, and the case where a light shielding film is formed using a positive photoresist and a positive photoresist photomask. The four corners of the pixel are rounded.

  Therefore, for example, when patterning is performed with the design shown in FIG. 1A, the shape of the corner portion of the light-shielding film cannot be reproduced because of the resolution limit in the exposure machine, and FIG. The rounded shape shown in b) is obtained. In particular, in the case of the resin BM, this tendency is remarkable for optimizing the application suitability and high sensitivity of the photosensitive colored resin composition. In the case of the CrBM, the photolithographic method is used although not as remarkable as the resin BM. Therefore, it becomes the same tendency. As the pattern is rounded as shown in FIG. 1B, the aperture ratio decreases. In particular, in the case of a high-definition product having an opening line width of 30 μm or less, the effect of a decrease in the aperture ratio is increased due to the influence of this rounding. When a color filter with a low aperture ratio is used, it must be a display device with a low aperture ratio, and it is necessary to take measures such as increasing the light intensity of the light source of the backlight, making it difficult to reduce power consumption. There's a problem.

In order to solve the above-described problems of the prior art, for example, Patent Document 1 discloses that a substantially triangular light transmission portion is extended to the four corners of a rectangular light transmission portion, or is substantially omitted at the four corners of a rectangular light shielding portion. A manufacturing method of a color filter having a light-shielding film with four corners at right angles using a photomask provided with an extended triangular light-shielding portion is disclosed. However, with this method, the BM width cannot be reduced, and the opening line width cannot be reduced.

  Further, Patent Document 2 discloses a technique for stably forming the resin BM by performing exposure processing in two portions using two exposure masks having an orthogonal stripe pattern. Yes. However, in this method, there is a problem that the angular step at the intersection portion becomes too high due to the difference between the development residual film ratio at the intersection portion of the stripe-shaped exposed portion and the development residual film ratio at other stripe portions. A transparent colored layer is applied to each of the pixel regions after BM formation, but in order to avoid so-called white spots at the corners of the light shielding film, the transparent colored layer is formed on the light shielding layer so as to cross the intersection portion. As a result, the flatness of the color filter is impaired, and in some cases, a flattening process such as application of an overcoat layer or the like is required. In addition, there is a problem that the adhesion at the time of panel bonding of the outer periphery of the display screen is insufficient as compared with the case of using CrBM.

JP 2003-66589 A JP 2009-223266 A

  The present invention has been made in view of the above-described problems, and has a color filter having a black matrix with little decrease in aperture ratio, high adhesion, and high sealing strength, a manufacturing method thereof, a color filter substrate, and a liquid crystal display. An object is to provide an apparatus.

Invention of Claim 1 of this invention is a manufacturing method of the color filter which has a transparent substrate, the black matrix provided on the said transparent substrate, and the colored pixel provided in the opening part of the said black matrix, A method for producing a color filter, which comprises at least the following steps (1) to (3) and is produced in the order of these steps.
(1) A step of forming on the transparent substrate a stripe-shaped metal light-shielding portion and a frame-shaped outer peripheral metal light-shielding portion that is wider than the stripe-shaped metal light-shielding portion and demarcates a display area .
(2) On the transparent substrate on which the stripe-shaped metal light-shielding portion is formed, and further, an end is formed on the frame-shaped outer peripheral metal light- shielding portion that is orthogonal to the stripe-shaped metal light-shielding portion and defines the display area. A step of forming an overlapping stripe-shaped resin light-shielding portion by a photolithography method using a photosensitive resin composition in which a black pigment is dispersed.
(3) A step of forming colored pixels on the transparent substrate in which openings are formed by the stripe-shaped metal light-shielding portion and the stripe-shaped resin light-shielding portion.

Next, the invention according to claim 2 of the present invention is a color filter obtained by the process of claim 1.

  The color filter of the present invention includes a frame-shaped outer peripheral metal light-shielding portion that demarcates a display area, a stripe-shaped metal light-shielding portion that is connected to the outer peripheral metal light-shielding portion, and a stripe shape that is orthogonal to the stripe-shaped metal light-shielding portion. Since the color pixel is formed in the opening formed with the resin light-shielding portion, rounding of the four corners of the opening portion pattern is prevented even in the patterning by the photolithography method, and the opening ratio is not lowered. In addition, since the color filter has good flatness and the frame-shaped light-shielding portion on the outer peripheral portion is made of metal such as Cr, the adhesiveness is higher than that of the resin BM alone, and the seal strength can be prevented from being lowered.

  According to the present invention, there is little decrease in the aperture ratio that can handle high definition, and since the frame-shaped light shielding portion on the outer peripheral portion is made of metal such as Cr, the adhesiveness is stronger than the resin BM alone, and the sealing strength as a panel is reduced. Can be prevented. In addition, since the flatness of the color filter is good, it is possible to prevent defects such as cracks in the transparent electrode layer provided on the surface of the color filter and peeling of the alignment film in the rubbing process of manufacturing the liquid crystal display device, resulting in poor alignment of the liquid crystal Thus, a bright liquid crystal display device free from light leakage caused by the above can be obtained.

The schematic diagram explaining the design pattern of black matrix, and the shape after patterning. FIG. 5 is a schematic diagram illustrating an example of a liquid crystal display device to which the color filter of the present invention is applied in cross section. The schematic diagram which shows an example of the black matrix based on the color filter of this invention. The schematic diagram which shows one Embodiment of the color filter board | substrate of this invention in a cross section. The schematic diagram which shows another example of one Embodiment of the color filter board | substrate of this invention in a cross section. The schematic diagram which represented the structure of one Embodiment of the liquid crystal display device of this invention with the cross section. The schematic diagram which represented the structure of another example of one Embodiment of the liquid crystal display device of this invention with the cross section.

  An embodiment of the color filter of the present invention will be described in detail below. In the following description, parts having the same function are described with the same reference numerals.

  FIG. 2 is a schematic diagram for explaining in cross section the configuration of an embodiment of a liquid crystal display device to which the color filter of the present invention is applied. This color liquid crystal display device is configured by enclosing a liquid crystal 3 between a color filter substrate 1 and an array substrate 2.

The color filter substrate 1 according to the color filter 10 of the present invention includes a transparent substrate 11 as a structural support, and a polarizing film 12 is laminated on the screen observer side. The opposite side (rear side) is divided into a large number of pixel regions, and a light shielding film (so-called black matrix, BM) 13 is provided at a portion between the pixels located at the boundary between the pixel region and the pixel region. A transparent colored layer 14 is disposed in each of the regions. The transparent colored layer 14 colors transmitted light for each pixel. Generally, the transparent colored layers 14R, 14G of three colors of red (R), green (G), and blue (B) corresponding to the three primary colors of light are used. 14B is arranged for each pixel. Furthermore, if necessary, an overcoat layer 15 that fills the level difference due to the transparent colored pixels 14 is provided, and a transparent electrode 16 and an alignment film (not shown) are provided. A color filter substrate for a liquid crystal display device such as a horizontal electric field method may have a configuration in which a transparent electrode is omitted.

  The array substrate 2 arranged opposite to the color filter substrate 1 includes a transparent substrate 21 as a structural support, an electrode (not shown) and an alignment film (not shown) are provided on the liquid crystal side, and a polarizing film 22 on the opposite side. Is provided. A voltage is applied to each pixel between the transparent electrode 16 and the electrode on the array substrate side to control the transmission / non-transmission of light, and the transmitted light is displayed on the screen as display light.

  In the color filter of the present invention, as shown in FIG. 3, the black matrix has a frame-shaped outer peripheral metal light-shielding portion 13MG that demarcates the display area, and a stripe-shaped metal light-shielding portion 13MS connected to the outer peripheral metal light-shielding portion. And a stripe-shaped resin light-shielding portion 13RS orthogonal to the stripe-shaped metal light-shielding portion.

The color filter of the present invention includes at least the following steps (1) to (3) and is manufactured in the order of these steps.
(1) A step of forming a frame-shaped outer peripheral metal light-shielding portion for defining a display area and a stripe-shaped metal light-shielding portion connected to the outer peripheral metal light-shielding portion on a transparent substrate.
(2) A step of further forming a stripe-shaped resin light-shielding portion orthogonal to the above-described stripe-shaped metal light-shielding portion on the transparent substrate on which the metal light-shielding portion is formed.
(3) A step of forming colored pixels on a transparent substrate in which openings are formed by orthogonal stripe-shaped metal light-shielding portions and stripe-shaped resin light-shielding portions.

  First, a metal thin film made of a metal chromium film or the like is formed on a transparent substrate such as glass by a sputtering method or the like. Next, a mask having a predetermined pattern having a frame-shaped outer peripheral metal light-shielding portion for defining a display area and a stripe-shaped metal light-shielding portion connected to the outer peripheral metal light-shielding portion on the metal thin film by a known photolithography method. Is used to form a resist pattern. Next, the metal thin film is etched using the formed resist pattern as an etching mask. Next, the resist pattern is removed with a stripping solution, and a frame-shaped outer peripheral metal light-shielding portion that demarcates the display area and a stripe-shaped metal light-shielding portion connected to the outer peripheral metal light-shielding portion are formed on the transparent substrate. The

  Next, a photosensitive resin composition in which a black pigment is dispersed is applied and dried on the substrate on which the metal light-shielding portion is formed, thereby forming a light-shielding photosensitive resin layer. Next, the light-shielding photosensitive resin layer is exposed using an ultra-high pressure mercury lamp lamp or the like using a mask having a predetermined stripe pattern orthogonal to the stripe-shaped metal light-shielding portion. Next, it develops with developing solutions, such as sodium carbonate aqueous solution, It wash | cleans well after image development, Furthermore, after drying, it heat-processes and hardens resin BM pattern. The frame-shaped outer peripheral metal light-shielding portion that defines the display area, the stripe-shaped metal light-shielding portion connected to the outer-peripheral metal light-shielding portion, and the stripe-shaped resin light-shielding portion orthogonal to the stripe-shaped metal light-shielding portion. A black matrix having an enclosed opening is formed on the transparent substrate.

  On the transparent substrate obtained above, for example, by using a photosensitive resin composition in which a red, green, or blue pigment is dispersed, colored pixels are formed by a photolithography method in the same manner as in the case of the above-described resin BM. The color filter of the present invention is formed.

The transparent substrate used in the color filter of the present invention preferably has a certain transmittance with respect to visible light, and more preferably has a transmittance of 80% or more. Examples thereof include various glass substrates such as quartz glass, borosilicate glass, and aluminosilicate glass, and various plastic substrates such as polycarbonate, polyethylene terephthalate, and polyether sulfone. In addition, these substrates may be subjected to appropriate pretreatment such as chemical treatment with a silane coupling agent or the like, plasma treatment, ion plating, sputtering, gas phase reaction method, vacuum deposition, etc., if desired.

  The metal light-shielding portion according to the color filter of the present invention forms a thin film on a substrate by using a metal such as chromium (Cr) or chromium oxide (CrOX) or a metal compound by sputtering or the like. The thickness of the metal thin film is usually about 100 nm to 200 nm, and the optical density (OD value) is 3.5 or more, preferably 3.8 or more. 0.0 or higher is required. Next, a positive-type photoresist is applied or bonded onto the thin film, and a frame-shaped outer peripheral metal light-shielding portion that demarcates the display area and a stripe-shaped metal light-shielding portion connected to the outer peripheral metal light-shielding portion are provided. It exposes using the mask of the predetermined pattern which has, and develops, and forms an etching resist pattern. Next, the exposed portion of the metal thin film is etched. The glass substrate formed above is immersed in an etching tank filled with an etching solution made of a mixed solution of cerium nitrate and perchloric acid for a predetermined time (60 to 120 seconds) and sent to the next step. Thereafter, by stripping the etching resist pattern, a transparent substrate having a frame-shaped outer peripheral metal light-shielding portion that demarcates the display area and a stripe-shaped metal light-shielding portion connected to the outer peripheral metal light-shielding portion is obtained.

  Next, the resin light-shielding part (resin BM) according to the color filter of the present invention can be formed by a photolithography method using a photosensitive resin composition in which a black pigment is dispersed. Examples of the black pigment include organic pigments such as carbon black, graphite, aniline black, and cyanine black, and inorganic pigments such as titanium oxide and iron oxide, and carbon black having excellent light-shielding properties is particularly preferable. The pigment concentration in the solid content of the black photosensitive resin composition used for forming the resin BM is preferably in the range of 35 to 50% by mass, more preferably in the range of 40 to 45% by mass. The resin BM forming resist coating solution is applied on the transparent substrate on which the metal light-shielding portion is previously formed by a dipping method, a roll coater method, a spin coating method, a die coating method, various printing methods, and the like. Thereafter, heat drying and curing (pre-baking) are performed using an oven or a hot plate. The film thickness of the resin BM is preferably between 1.2 μm and 3.0 μm, more preferably in the range of 1.3 μm to 1.6 μm. When the film thickness of the resin BM is within this range, the black photosensitive resin composition described above is used to form a black matrix having an OD value of 4.0 to 5.0 and sufficient light shielding properties comparable to metal chromium. be able to.

  The coating film of the black photosensitive resin composition thus obtained is applied to a predetermined stripe pattern orthogonal to the stripe-shaped metal light-shielding portion using an active light source such as ultra-high pressure mercury, mercury vapor arc, carbon arc, xenon arc, etc. Then, pattern exposure is performed through a mask having, followed by development with a developing solution such as an aqueous sodium carbonate solution, washing thoroughly with water after development, and drying, followed by heat treatment to cure the resin BM pattern. As described above, the frame-shaped outer peripheral metal light-shielding portion that demarcates the display area, the stripe-shaped metal light-shielding portion connected to the outer peripheral metal light-shielding portion, and the stripe-shaped resin orthogonal to the stripe-shaped metal light-shielding portion A transparent substrate having a black matrix formed with the light shielding portion is obtained.

  In the conventional color filter manufacturing process, a photolithographic method that is highly productive and capable of handling a large size is often used, and most exposure apparatuses use i-line as the main wavelength. With these devices, the resolution has reached its limit, and it has not been possible to handle higher resolutions. In order to accurately form a corner portion having a radius of 3 μmR or less, it is better to use an exposure light source having a shorter wavelength. However, due to the characteristics of the exposure lamp, there is a drawback that exposure illuminance is reduced when the wavelength is shortened. In addition, the photosensitive wavelength of the photosensitive coloring composition has to be optimized in accordance with the wavelength of the light source. That is, it was impossible to accurately form a corner portion having a radius of 3 μmR or less.

  According to the present invention, conventional materials can be used without losing the advantages such as high productivity of the conventional photolithographic method, the corner portion is not rounded, and the corner portion having a radius of 1 μm R or less is accurately formed. Therefore, a high-definition color filter having a black matrix with a high aperture ratio can be formed with high accuracy.

  The colored pixels in the color filter of the present invention can be formed by photolithography using a photosensitive resin composition in which, for example, a red, green, or blue pigment is dispersed, as in the case of the resin BM described above. The photosensitive coloring composition contains, as its essential components, a photopolymerizable monomer, a resin binder, a polymerization initiator, a colorant (color pigment) and a solvent. Moreover, you may contain additives, such as a dispersing agent, a photosensitizer, and a chain transfer agent. As each colored pigment, any known pigments used in conventional color filter production can be used. Also, a plurality of pigments can be used in combination for spectral adjustment of the color filter.

  The film thickness of the flat portion of the colored pixel is preferably in the range of 1.5 to 2.5 μm, and more preferably in the range of 1.6 to 2.0 μm. If the film thickness of the colored pixel is within this range, the metal light shielding portion when the film thickness of the resin BM is between 1.2 μm and 3.0 μm, more preferably between 1.3 μm and 1.6 μm. Therefore, sufficient flatness can be obtained between the film thickness of the resin BM and the film thickness of the flat portion of the colored pixel. When the film thickness is thin, the resin BM needs to be thinned, and the light shielding property is insufficient. On the other hand, when the film thickness is large, the coatability of the colored photosensitive resin composition is deteriorated. The overlapping width of the resin BM and the colored pixel is preferably in the range of 1.0 to 5.0 μm, more preferably in the range of 2.0 to 4.0 μm. If the overlap width is within this range, sufficient flatness can be obtained. The overlapping width between the metal light-shielding portion and the colored pixels may be the same as the overlapping between the resin BM and the colored pixels, but the overlapping width may be larger.

  As shown in FIG. 4, the color filter substrate 1 of the present invention includes a transparent substrate 11, a black matrix 13 provided on the transparent substrate 11, and colored layers 14 (R) and 14 provided in openings of the black matrix 13. (G), the color filter 10 having 14 (B), the transparent electrode layer 16 formed by sputtering or the like, and the like provided on the surface of the color filter 10, and the surface of the transparent electrode layer 16. The alignment film 17 is provided.

  FIG. 5 is a schematic view showing another example of one embodiment of the color filter substrate of the present invention in cross section. As shown in FIG. 5, the color filter substrate 1 has the same configuration as the color filter substrate shown in FIG. 4 except that a transparent electrode layer is not provided between the color filter 10 and the alignment film 17.

  Next, the liquid crystal display device according to the present invention is an acrylic epoxy adhesive in which spacer particles (diameter: 3.5 μm) are mixed into the frame-shaped outer peripheral metal light-shielding portion that defines the display area of any of the above color filter substrates. After applying the agent with a seal coating device and dropping the liquid crystal on the display area in the center of the color filter substrate, it is bonded to the counter substrate provided opposite the color filter substrate, and the sealant is cured to form a liquid crystal cell. Further, the liquid crystal cell and the backlight unit are combined to form a liquid crystal display device.

6 shows a TN (Twisted Nematic) using a color filter substrate having the same configuration as the color filter substrate shown in FIG. 4 as an embodiment of the liquid crystal display device of the present invention.
It is a schematic diagram showing the structure of the liquid crystal display device of a method. Here, the outer peripheral seal portion is not shown.

  The liquid crystal display device 5 shown in FIG. 6 includes a color filter substrate 1 and a counter substrate provided with an electrode that is provided to face the color filter substrate 1 and that faces the transparent electrode 16 and applies an electric field in a direction perpendicular to the substrate. (Array substrate) 2 and a liquid crystal 3 filled between the color filter substrate 1 and the counter substrate 2. Polarizing plates 12 and 22 made of, for example, a TAC (triacetyl cellulose) film obtained by stretching an iodine complex on polyvinyl alcohol are provided on the main surface of the color filter substrate 1 and the counter substrate 2 opposite to the liquid crystal cell. The counter substrate 2 includes a transparent substrate 21, a pixel electrode 26 provided on the transparent substrate 21, and an alignment film 27 provided to cover the pixel electrode 26. The liquid crystal 3 is filled between the alignment film 27 of the counter substrate 2 and the alignment film 17 of the color filter substrate 1.

  FIG. 7 shows another example of the embodiment of the liquid crystal display device of the present invention, a lateral electric field method (IPS: In-Plane Switching) using a color filter substrate having the same configuration as the color filter substrate shown in FIG. It is a schematic diagram showing the structure of this liquid crystal display device in a cross section. Here, the outer peripheral seal portion is not shown.

  A liquid crystal display device 5 shown in FIG. 7 is provided opposite to the color filter substrate 1 and the color filter substrate 1. The counter substrate 2 is provided with electrodes that apply an electric field in a direction parallel to the substrate. And a liquid crystal 3 filled between the substrates 2. Polarizing plates 12 and 22 made of, for example, a TAC (triacetyl cellulose) film obtained by stretching an iodine complex on polyvinyl alcohol are provided on the main surface of the color filter substrate 1 and the counter substrate 2 opposite to the liquid crystal cell. The counter substrate 2 includes a transparent substrate 21, a common electrode 28 provided on the transparent substrate 21, an insulating layer 27 provided so as to cover the common electrode 28, and a pixel electrode provided on the insulating layer 27. 26. The liquid crystal 3 is disposed between the insulating layer 27 provided with the pixel electrode 26 and the alignment film 17 of the color filter substrate 1.

  The above-described liquid crystal display devices illustrated in FIGS. 6A and 6B and FIG. 6B each have a small reduction in the aperture ratio, so that the device has high luminance and can save power in the backlight. . In addition, since the flatness of the color filter is good, the alignment film is not peeled off in the rubbing process, and light leakage due to poor alignment of liquid crystal does not occur, so that excellent display characteristics are exhibited. Furthermore, since the bonded portion of the liquid crystal cell is a frame-shaped outer peripheral metal light-shielding portion, the bonding with a sealing agent such as an acrylic epoxy adhesive is strong and stable, and there is little risk of strength reduction.

DESCRIPTION OF SYMBOLS 1 ... Color filter substrate 11 ... Transparent substrate 12 ... Polarizing film
13 ... Light shielding film (BM) 13MG ... Frame-shaped outer peripheral metal light shielding part
13MS: Striped metal light shielding part 13RS: Striped resin light shielding part 14: Transparent colored pixel 14R: Red pixel 14G: Green pixel
14B ... Blue pixel 15 ... Overcoat layer 16 ... Transparent electrode
17 ... Alignment film
2 ... Counter substrate (array substrate) 21 ... Transparent substrate 22 ... Polarizing film
26 ... Pixel electrode 27 ... Insulating layer 28 ... Common electrode 3 ... Liquid crystal 4 ... Backlight 5 ... Liquid crystal display device

Claims (2)

A transparent substrate, a black matrix provided on the transparent substrate, a manufacturing method of a color filter having a colored pixel provided in an opening portion of the black matrix, at least the following (1) to (3) A process for producing a color filter, comprising the steps of:
(1) A step of forming on the transparent substrate a stripe-shaped metal light-shielding portion and a frame-shaped outer peripheral metal light-shielding portion that is wider than the stripe-shaped metal light-shielding portion and demarcates a display area .
(2) On the transparent substrate on which the stripe-shaped metal light-shielding portion is formed, and further, an end is formed on the frame-shaped outer peripheral metal light- shielding portion that is orthogonal to the stripe-shaped metal light-shielding portion and defines the display area. A step of forming an overlapping stripe-shaped resin light-shielding portion by a photolithography method using a photosensitive resin composition in which a black pigment is dispersed.
(3) A step of forming colored pixels on the transparent substrate in which openings are formed by the stripe-shaped metal light-shielding portion and the stripe-shaped resin light-shielding portion.   A color filter obtained by the production method according to claim 1.