JP3521490B2 - Liquid crystal display device and method of manufacturing the same - Google Patents
Liquid crystal display device and method of manufacturing the sameInfo
- Publication number
- JP3521490B2 JP3521490B2 JP20300294A JP20300294A JP3521490B2 JP 3521490 B2 JP3521490 B2 JP 3521490B2 JP 20300294 A JP20300294 A JP 20300294A JP 20300294 A JP20300294 A JP 20300294A JP 3521490 B2 JP3521490 B2 JP 3521490B2
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- JP
- Japan
- Prior art keywords
- light
- liquid crystal
- shielding
- crystal display
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
【０００１】[0001]
【産業上の利用分野】この発明は、液晶表示素子および
その製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device and a method for manufacturing the same.
【０００２】[0002]
【従来の技術】液晶表示素子には、例えば各画素電極に
それぞれＴＦＴ（薄膜トランジスタ）などの駆動素子を
搭載したアクティブタイプのカラー液晶表示素子があ
る。このアクティブタイプのカラー液晶表示素子では、
画素電極およびＴＦＴを備えた一方の基板と、各画素電
極に対応するカラーフィルタおよび画素電極のすべてに
対応する共通電極を備えた他方の基板との間に液晶を封
入している。この場合、画素間（画素電極間に相当す
る）の隙間からの光の漏れを防止するために、他方の基
板にはブラックマスクと呼ばれる格子状の遮光部が設け
られている。2. Description of the Related Art Liquid crystal display elements include, for example, active type color liquid crystal display elements in which driving elements such as TFTs (thin film transistors) are mounted on respective pixel electrodes. In this active type color liquid crystal display element,
Liquid crystal is sealed between one substrate provided with pixel electrodes and TFTs and the other substrate provided with a color filter corresponding to each pixel electrode and a common electrode corresponding to all pixel electrodes. In this case, in order to prevent light from leaking from the gap between the pixels (corresponding to the pixel electrodes), the other substrate is provided with a lattice-shaped light shielding portion called a black mask.
【０００３】このようなカラー液晶表示素子における基
板の製造方法の一例を図４および図５を参照して説明す
る。まず、図４（ａ）に示すように、ガラスやセラミッ
クなどの透明な基板１の上面にクロムなどの金属からな
る遮光膜２を形成し、この遮光膜２上にフォトレジスト
３を格子状にパターン形成し、このフォトレジスト３を
マスクとして遮光膜２をエッチング液でウエットエッチ
ングし、遮光膜２の不要な部分を除去した上、フォトレ
ジスト３を剥離する。すると、図４（ｂ）および図５に
示すように、基板１上に格子状の遮光部４が画素間に対
応して形成される。次に、図４（ｃ）に示すように、遮
光膜２が除去された画素と対応する部分の基板１上にカ
ラーフィルタ５をパターン形成した後、図４（ｄ）に示
すように、カラーフィルタ５および遮光部４上にＩＴＯ
などの透明導電材料からなる共通電極６を形成する。な
お、共通電極６上には図示しない配向膜が形成される。An example of a method of manufacturing a substrate in such a color liquid crystal display device will be described with reference to FIGS. 4 and 5. First, as shown in FIG. 4A, a light shielding film 2 made of a metal such as chromium is formed on the upper surface of a transparent substrate 1 such as glass or ceramic, and a photoresist 3 is formed on the light shielding film 2 in a grid pattern. A pattern is formed, the light-shielding film 2 is wet-etched with an etching solution using the photoresist 3 as a mask to remove unnecessary portions of the light-shielding film 2, and then the photoresist 3 is peeled off. Then, as shown in FIGS. 4B and 5, the lattice-shaped light shielding portions 4 are formed on the substrate 1 so as to correspond to the pixels. Next, as shown in FIG. 4C, a color filter 5 is patterned on the substrate 1 in a portion corresponding to the pixel from which the light shielding film 2 is removed, and then, as shown in FIG. ITO on the filter 5 and the light shield 4
The common electrode 6 made of a transparent conductive material such as is formed. An alignment film (not shown) is formed on the common electrode 6.
【０００４】[0004]
【発明が解決しようとする課題】ところで、このような
従来のカラー液晶表示素子では、遮光膜２のウエットエ
ッチングとして、ディップ方式やシャワ方式などがある
が、いずれの方式においても、遮光部４が格子状である
から、エッチング液が格子状の遮光部４の隅々に回り込
みにくく、遮光部４の角部がエッチング不良により丸く
パターン形成され、表示ムラが生じたり、点欠陥となっ
たりするなどの問題がある。このようなパターン不良は
小さくても、画素数の多い高精細な大画面になればなる
ほど、遮光部４のパターン不良が目立ち、歩留まりが低
下するという問題がある。この発明の目的は、エッチン
グ液の回り込み不良によるエッチング不良を確実に防ぐ
ことのできる液晶表示素子およびその製造方法を提供す
ることである。By the way, in such a conventional color liquid crystal display element, the wet etching of the light-shielding film 2 includes a dip method and a shower method. In either method, the light-shielding section 4 is used. Since it has a lattice shape, it is difficult for the etching solution to sneak into every corner of the lattice-shaped light-shielding portion 4, and the corner portions of the light-shielding portion 4 are formed into a round pattern due to defective etching, resulting in display unevenness or point defects. I have a problem. Even if such a pattern defect is small, there is a problem that the pattern defect of the light-shielding portion 4 becomes more noticeable and the yield decreases as the size of the high-definition large screen increases with the number of pixels. An object of the present invention is to provide a liquid crystal display element and a method for manufacturing the same capable of reliably preventing an etching defect due to an inflow of an etching solution.
【０００５】[0005]
【課題を解決するための手段】請求項１記載の発明は、
相対向する２枚の基板間に液晶が介在され、画素がマト
リクス状に配列された液晶表示素子において、一方の基
板の一面に画素間に対応して一方向に形成された帯状の
第１遮光部と、この基板の一面に光透過膜を介して第１
遮光部上をこれと直交する方向に横切りかつ画素間に対
応して形成された帯状の第２遮光部とを備え、他方の基
板に画素電極及びＴＦＴが形成されているようにしたも
のである。この場合、光透過膜は、透明電極、またはカ
ラーフィルタ、もしくは透明電極とカラーフィルタとの
２層構造であることが好ましい。請求項４記載の発明
は、相対向する２枚の基板間に液晶が介在され、一方の
基板に光透過膜が形成され、他方の基板に画素電極及び
ＴＦＴが形成され、画素がマトリクス状に配列される液
晶表示素子の製造方法において、一方の基板の一面に第
１遮光膜を成膜し、この第１遮光膜をマスクを介してエ
ッチングすることにより画素間に対応する帯状の第１遮
光部を一方向に形成し、この後、一方の基板の一面に光
透過膜を介して第１遮光部を覆う第２遮光膜を成膜し、
この第２遮光膜をマスクを介してエッチングすることに
より第１遮光部上をこれと直交する方向に横切って画素
間に対応する帯状の第２遮光部を形成するようにしたも
のである。The invention according to claim 1 is
In a liquid crystal display element in which liquid crystal is interposed between two substrates facing each other and pixels are arranged in a matrix, a band-shaped first light shield formed in one direction on one surface of one substrate corresponding to the pixels And a first surface of the substrate through a light-transmitting film on the first surface.
A strip-shaped second light-shielding portion formed across the light-shielding portion in a direction perpendicular to the light-shielding portion and corresponding to the pixels ,
A pixel electrode and a TFT are formed on the plate . In this case, the light transmitting film preferably has a transparent electrode, a color filter, or a two-layer structure of a transparent electrode and a color filter. In the invention according to claim 4, liquid crystal is interposed between two substrates facing each other, and
A light transmitting film is formed on the substrate, and the pixel electrode and
In a method of manufacturing a liquid crystal display element in which TFTs are formed and pixels are arranged in a matrix, a first light-shielding film is formed on one surface of one substrate, and the first light-shielding film is etched through a mask. forming a first light-shielding portion of the strip corresponding to the inter-pixel in one direction, and thereafter, forming a second light-shielding film covering the first light-shielding portion through the light-transmitting film on a surface of one substrate,
By etching the second light-shielding film through a mask, a strip-shaped second light-shielding portion corresponding to pixels is formed across the first light-shielding portion in a direction orthogonal to the first light-shielding portion.
【０００６】[0006]
【作用】この発明によれば、一方の基板の一面に第１遮
光膜を成膜し、この第１遮光膜をマスクを介してエッチ
ングすることにより画素間に対応する帯状の第１遮光部
を一方向に形成するので、エッチング液の回り込み不良
によるエッチング不良を防ぎ、確実に第１遮光部をパタ
ーニングすることができ、この後、基板の一面に光透過
膜を介して第１遮光部を覆う第２遮光膜を成膜し、この
第２遮光膜をマスクを介してエッチングすることにより
第１遮光部上をこれと直交する方向に横切って画素間に
対応する帯状の第２遮光部を形成するので、上記と同
様、エッチング液の回り込み不良によるエッチング不良
を防ぎ、かつ第１遮光部とは光透過膜を介しているので
第１の遮光膜までエッチングされることを防ぎ、確実に
第２遮光部をパターニングすることができ、これら互い
に交差する第１遮光部と第２遮光部とによって格子状の
ブラックマスクを精度良く形成することができる。According to the present invention, a first light-shielding film is formed on one surface of one substrate, and the first light-shielding film is etched through a mask to form a band-shaped first light-shielding portion corresponding to pixels. Since it is formed in one direction, it is possible to prevent the etching failure due to the invasion failure of the etching solution and to reliably pattern the first light-shielding portion, and then cover the first light-shielding portion on one surface of the substrate through the light-transmitting film. A second light-shielding film is formed, and the second light-shielding film is etched through a mask to cross the first light-shielding portion in a direction orthogonal to the second light-shielding film to form a band-shaped second light-shielding portion corresponding to pixels. Therefore, similar to the above, the etching failure due to the invasion of the etching solution is prevented, and the first light-shielding portion is prevented from being etched up to the first light-shielding film because the light-transmitting film is interposed between the first light-shielding portion and the second light-shielding film. Put the shading part Can be ring, a grid of the black mask can be accurately formed by the first light shielding portion which intersect these with each other and the second light-shielding portion.
【０００７】[0007]
【実施例】以下、図１〜図３を参照して、この発明をア
クティブタイプのカラー液晶表示素子に適用した場合の
一実施例について説明する。図１（ａ）〜図１（ｆ）は
一方の基板の製造工程を示した図、図２は図１（ｂ）の
平面図、図３は図１（ｆ）の平面図である。これの図を
参照してカラー液晶表示素子をその製造工程順に説明す
る。なお、図４および図５に示された従来例と同一部分
には同一符号を付し、その説明は適宜省略する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment in which the present invention is applied to an active type color liquid crystal display element will be described below with reference to FIGS. 1 (a) to 1 (f) are views showing a manufacturing process of one substrate, FIG. 2 is a plan view of FIG. 1 (b), and FIG. 3 is a plan view of FIG. 1 (f). The color liquid crystal display device will be described in the order of manufacturing steps with reference to these drawings. The same parts as those of the conventional example shown in FIGS. 4 and 5 are designated by the same reference numerals, and the description thereof will be appropriately omitted.
【０００８】まず、図１（ａ）に示すように、基板１の
上面にクロムなどの金属からなる第１遮光膜１０を形成
し、この第１遮光膜１０上に第１フォトレジスト１１を
複数の帯状に互いに平行にパターン形成し、この第１フ
ォトレジスト１１をマスクとして第１遮光膜１０をエッ
チング液（例えば、第１遮光膜１０がクロムの場合に
は、硝酸セリウムアンモニウムと過塩素酸とを混合した
ＴＷ液）でウエットエッチングし、第１遮光膜１０の不
要な部分を除去する。このとき、第１フォトレジスト１
１が帯状であり、四隅がないので、従来のようなエッチ
ング液の回り込み不良によるエッチング不良が生じるこ
とがなく、確実に第１遮光膜１０をエッチングすること
ができる。この後、第１フォトレジスト１１を剥離する
と、図１（ｂ）および図２に示すように、基板１上に画
素間に対応する帯状の第１遮光部１２が精度良く形成さ
れる。次に、図１（ｃ）に示すように、画素に対応する
部分を含む第１遮光膜１０が除去された部分の基板１上
にカラーフィルタ５をパターン形成した後、図１（ｄ）
に示すように、カラーフィルタ５および第１遮光部１２
上にＩＴＯなどの透明導電材料からなる共通電極６をパ
ターン形成する。First, as shown in FIG. 1A, a first light shielding film 10 made of a metal such as chromium is formed on the upper surface of a substrate 1, and a plurality of first photoresists 11 are formed on the first light shielding film 10. In parallel with each other, and the first photoresist 11 is used as a mask to etch the first light-shielding film 10 (for example, when the first light-shielding film 10 is chromium, cerium ammonium nitrate and perchloric acid are used). Wet etching with a mixed TW solution) to remove unnecessary portions of the first light-shielding film 10. At this time, the first photoresist 1
Since 1 is a band shape and has no four corners, the first light-shielding film 10 can be reliably etched without causing the etching defect due to the defect of the etchant flowing around unlike the conventional case. Then, when the first photoresist 11 is peeled off, as shown in FIGS. 1B and 2, the strip-shaped first light-shielding portions 12 corresponding to the pixels are accurately formed on the substrate 1. Next, as shown in FIG. 1C, a color filter 5 is patterned on a portion of the substrate 1 where the first light-shielding film 10 including the portion corresponding to the pixel is removed, and then, as shown in FIG.
As shown in FIG.
A common electrode 6 made of a transparent conductive material such as ITO is patterned on the upper surface.
【０００９】この後、図１（ｅ）に示すように、共通電
極６上に第１遮光膜１０と同じ材料からなる第２遮光膜
１３を平坦に形成し、この第２遮光膜１３上に第２フォ
トレジスト１４を第１遮光部１２と直交する方向に帯状
にパターン形成し、この第２フォトレジスト１４をマス
クとして第２遮光膜１３を上記と同じエッチング液でウ
エットエッチングし、第２遮光膜１３の不要な部分を除
去する。このときにも、第２フォトレジスト１４が平坦
な第２遮光膜１３上に帯状に形成されているから、第１
フォトレジスト１１と同様、エッチング液の回り込み不
良によるエッチング不良が生じることがなく、確実に第
２遮光膜１３をエッチングすることができる。この後、
第２フォトレジスト１４を剥離すると、図１（ｆ）およ
び図３に示すように、共通電極６上に第１遮光膜１２の
上方をこれと直交して横切る帯状の第２遮光部１５が画
素間の隙間に対応して精度良く形成される。なお、共通
電極６上には図示しない配向膜が第２遮光部１５を覆っ
て形成される。そして、このように製造された基板１
と、図示しない画素電極およびＴＦＴが形成された基板
とを、各電極を対向させてシール材で貼り合わせ、この
シール材と２枚の基板とで囲われた領域内に液晶を封入
することにより、カラー液晶表示素子が形成される。Thereafter, as shown in FIG. 1E, a second light-shielding film 13 made of the same material as the first light-shielding film 10 is formed flat on the common electrode 6, and the second light-shielding film 13 is formed on the second light-shielding film 13. The second photoresist 14 is patterned in a band shape in a direction orthogonal to the first light shielding portion 12, and the second light shielding film 13 is wet-etched with the same etching solution as described above by using the second photoresist 14 as a mask to form a second light shield. The unnecessary portion of the film 13 is removed. Also at this time, since the second photoresist 14 is formed in a strip shape on the flat second light shielding film 13,
Similar to the photoresist 11, the second light-shielding film 13 can be surely etched without causing an etching defect due to a defect of the etchant flowing around. After this,
When the second photoresist 14 is peeled off, as shown in FIG. 1F and FIG. 3, the strip-shaped second light-shielding portion 15 that crosses the upper portion of the first light-shielding film 12 on the common electrode 6 at right angles to the pixel is formed. It is formed with high precision corresponding to the gap between them. An alignment film (not shown) is formed on the common electrode 6 so as to cover the second light shielding portion 15. Then, the substrate 1 manufactured in this way
And a substrate on which a pixel electrode and a TFT (not shown) are formed by adhering each electrode to each other with a sealing material, and by enclosing the liquid crystal in a region surrounded by the sealing material and the two substrates. A color liquid crystal display element is formed.
【００１０】このようなカラー液晶表示素子では、第１
遮光部１２と第２遮光部１５とが互いに直交しているの
で、これら第１、第２遮光部１２、１５によって格子状
のブラックマスクを精度良く形成することができ、この
結果、画素数の多い高精細な大画面に適用しても、歩留
まりを向上させることができる。In such a color liquid crystal display device, the first
Since the light-shielding portion 12 and the second light-shielding portion 15 are orthogonal to each other, the first and second light-shielding portions 12 and 15 can accurately form a lattice-shaped black mask, and as a result, the number of pixels can be reduced. The yield can be improved even when applied to a large number of high-definition large screens.
【００１１】さらに、上記実施例では、アクティブタイ
プのカラー液晶表示素子につい述べたが、これに限ら
ず、単純マトリクスタイプのカラー表示型もしくは白黒
表示型の液晶表示素子にも適用することができる。 Further, in the above embodiment, the active tie is
I mentioned the color liquid crystal display device of
No, simple matrix type color display type or black and white
It can also be applied to a display type liquid crystal display element.
【００１２】[0012]
【発明の効果】以上説明したように、この発明によれ
ば、一方の基板の一面に第１遮光膜を成膜し、この第１
遮光膜をマスクを介してエッチングすることにより画素
間に対応する帯状の第１遮光部を一方向に形成するの
で、エッチング液の回り込み不良によるエッチング不良
を防ぎ、確実に第１遮光部をパターニングすることがで
き、この後、基板の一面に光透過膜を介して第１遮光部
を覆う第２遮光膜を成膜し、この第２遮光膜をマスクを
介してエッチングすることにより第１遮光部上をこれと
直交する方向に横切って画素間に対応する帯状の第２遮
光部を形成するので、上記と同様、エッチング液の回り
込み不良によるエッチング不良を防ぎ、確実に第２遮光
部をパターニングすることができ、これら互いに交差す
る第１遮光部と第２遮光部とによって格子状のブラック
マスクを精度良く形成することができる。As described above, according to the present invention, the first light-shielding film is formed on one surface of one substrate, and the first light-shielding film is formed.
Since the strip-shaped first light-shielding portion corresponding to the pixels is formed in one direction by etching the light-shielding film through the mask, the etching failure due to the invasion of the etching solution is prevented, and the first light-shielding portion is reliably patterned. After that, a second light-shielding film that covers the first light-shielding portion is formed on one surface of the substrate through the light-transmitting film, and the second light-shielding film is etched through the mask to etch the first light-shielding portion. Since the strip-shaped second light-shielding portion corresponding to the pixels is formed across the top in a direction orthogonal to this, the etching failure due to the invasion of the etching solution is prevented and the second light-shielding portion is reliably patterned, as in the above. It is possible to accurately form the lattice-shaped black mask by the first light shielding portion and the second light shielding portion that intersect with each other.
【図１】（ａ）〜（ｆ）はこの発明を適用したカラー液
晶表示素子における一方の基板の製造工程の一例を示す
各断面図。1A to 1F are cross-sectional views showing an example of a manufacturing process of one substrate in a color liquid crystal display device to which the present invention is applied.
【図２】図１（ｂ）の要部平面図。FIG. 2 is a plan view of an essential part of FIG.
【図３】図１（ｆ）の要部平面図。FIG. 3 is a plan view of a main part of FIG.
【図４】（ａ）〜（ｄ）は従来の基板の製造工程を示す
各断面図。4A to 4D are cross-sectional views showing a conventional substrate manufacturing process.
【図５】図４（ｂ）の要部平面図。FIG. 5 is a plan view of a main part of FIG.
１ 基板 ５ カラーフィルタ ６ 共通電極 １０ 第１遮光膜 １１ 第１フォトレジスト １２ 第１遮光部 １３ 第２遮光膜 １４ 第２フォトレジスト １５ 第２遮光部 1 substrate 5 color filters 6 common electrode 10 First light-shielding film 11 First photoresist 12 First light shield 13 Second light-shielding film 14 Second photoresist 15 Second light shield
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭62−223727（ＪＰ，Ａ) 特開 平１−156725（ＪＰ，Ａ) 特開 平６−160901（ＪＰ，Ａ) 特開 昭60−111225（ＪＰ，Ａ) 特開 平４−255830（ＪＰ，Ａ) 特開 平５−53135（ＪＰ，Ａ) 特開 平６−94912（ＪＰ，Ａ) (58)調査した分野(Int.Cl.7，ＤＢ名) G02F 1/1335 500 ─────────────────────────────────────────────────── --- Continuation of the front page (56) References JP-A-62-223727 (JP, A) JP-A-1-156725 (JP, A) JP-A-6-160901 (JP, A) JP-A-60- 111225 (JP, A) JP 4-255830 (JP, A) JP 5-53135 (JP, A) JP 6-94912 (JP, A) (58) Fields investigated (Int. Cl. 7 , DB name) G02F 1/1335 500
Claims (5)
れ、画素がマトリクス状に配列された液晶表示素子にお
いて、 一方の基板の一面に前記画素間に対応して一方向に形成
された帯状の第１遮光部と、 前記一方の基板の一面に光透過膜を介して前記第１遮光
部上をこれと直交する方向に横切りかつ前記画素間に対
応して形成された帯状の第２遮光部と、 を備え、 他方の基板に画素電極及びＴＦＴが形成されている、 ことを特徴とする液晶表示素子。1. A liquid crystal display device in which liquid crystal is interposed between two substrates facing each other and pixels are arranged in a matrix, and the liquid crystal is formed on one surface of one substrate in one direction corresponding to the pixels. a first light-shielding portion of the strip was, the band-shaped formed corresponding to between cross and the pixel the first shielding portion above through the light-transmitting film on a surface of one substrate in a direction perpendicular thereto the liquid crystal display device includes a second light-shielding portion, the other of the pixel electrode and the TFT substrate is formed, characterized in that.
ーフィルタであることを特徴とする請求項１記載の液晶
表示素子。2. The liquid crystal display element according to claim 1, wherein the light transmitting film is a transparent electrode or a color filter.
ルタとの２層構造であることを特徴とする請求項１記載
の液晶表示素子。3. The liquid crystal display element according to claim 1, wherein the light transmitting film has a two-layer structure of a transparent electrode and a color filter.
れ、一方の基板に光透過膜が形成され、他方の基板に画
素電極及びＴＦＴが形成され、画素がマトリクス状に配
列される液晶表示素子の製造方法において、前記 一方の基板の一面に第１遮光膜を成膜し、この第１
遮光膜をマスクを介してエッチングすることにより前記
画素間に対応する帯状の第１遮光部を一方向に形成し、 前記一方の基板の一面に前記光透過膜を介して前記第１
遮光部を覆う第２遮光膜を成膜し、この第２遮光膜をマ
スクを介してエッチングすることにより第１遮光部上を
これと直交する方向に横切って前記画素間に対応する帯
状の第２遮光部を形成する、 ことを特徴とする液晶表示素子の製造方法。4. A liquid crystal is interposed between two substrates facing each other, a light transmitting film is formed on one substrate, and an image is formed on the other substrate.
Pixel electrodes and TFT are formed, in the manufacturing method of the liquid crystal display device in which pixels are arranged in matrix, forming a first light-shielding film on a surface of the one substrate, the first
The light-shielding film through a mask to form a first light-shielding portion of the strip corresponding to between the pixels by etching in one direction, said first through said light transmitting film on a surface of said one substrate
A second light-shielding film that covers the light-shielding portion is formed, and the second light-shielding film is etched through a mask to cross the first light-shielding portion in a direction orthogonal to the first light-shielding portion and to form a strip-shaped first portion corresponding to the pixels. 2. A method for manufacturing a liquid crystal display element, which comprises forming a light-shielding portion.
いずれもウエットエッチングであることを特徴とする請
求項４記載の液晶表示素子の製造方法。5. The etching of the first and second light shielding films comprises:
5. The method for manufacturing a liquid crystal display device according to claim 4, wherein both are wet etching.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20300294A JP3521490B2 (en) | 1994-08-05 | 1994-08-05 | Liquid crystal display device and method of manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20300294A JP3521490B2 (en) | 1994-08-05 | 1994-08-05 | Liquid crystal display device and method of manufacturing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0850286A JPH0850286A (en) | 1996-02-20 |
| JP3521490B2 true JP3521490B2 (en) | 2004-04-19 |
Family
ID=16466709
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20300294A Expired - Fee Related JP3521490B2 (en) | 1994-08-05 | 1994-08-05 | Liquid crystal display device and method of manufacturing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3521490B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100254870B1 (en) * | 1997-07-14 | 2000-05-01 | 구본준 | Color filter structure and its manufacturing method of lcd device |
| KR100686225B1 (en) * | 2000-02-25 | 2007-02-22 | 삼성전자주식회사 | Manufacturing method of color filter panel for liquid crystal display |
| JP2006243261A (en) * | 2005-03-02 | 2006-09-14 | Sony Corp | Liquid crystal panel, image display apparatus, and projection type image display apparatus |
| KR20070039237A (en) * | 2005-10-07 | 2007-04-11 | 삼성전자주식회사 | Display panel and manufacturing method thereof |
| JP5655426B2 (en) * | 2010-08-18 | 2015-01-21 | 凸版印刷株式会社 | Color filter manufacturing method and color filter |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60111225A (en) * | 1983-11-21 | 1985-06-17 | Matsushita Electric Ind Co Ltd | Color image display element of liquid crystal |
| JP2549840B2 (en) * | 1986-03-25 | 1996-10-30 | セイコーエプソン株式会社 | LCD panel |
| JPH01156725A (en) * | 1987-12-15 | 1989-06-20 | Seiko Epson Corp | Display device |
| JP2935280B2 (en) * | 1991-02-08 | 1999-08-16 | 富士通株式会社 | Thin film transistor matrix |
| JP3189310B2 (en) * | 1991-08-28 | 2001-07-16 | セイコーエプソン株式会社 | Liquid crystal device manufacturing method |
| JPH0694912A (en) * | 1992-09-14 | 1994-04-08 | Fujitsu Ltd | Production of color filter |
| JPH06160901A (en) * | 1992-11-20 | 1994-06-07 | Sanyo Electric Co Ltd | Liquid crystal display device |
-
1994
- 1994-08-05 JP JP20300294A patent/JP3521490B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0850286A (en) | 1996-02-20 |
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