JPH0850286A - Liquid crystal display element and production thereof - Google Patents

Abstract

PURPOSE:To provide a production method of a liquid crystal display element to surely prevent etching defects due to insufficient infiltration of an etching liquid. CONSTITUTION:A first light-shielding film 10 is formed one a top surface of a substrate 1 and etched to form a belt-like first light-shielding part 12 in one direction according to the interval of pixels. By this method, etching defects due to insufficient infiltration of the etching liquid can be prevented and the first light-shielding part 12 can be surely patterned. Thereafter, a common electrode 6 is formed on the first light-shielding part 12 and a color filter 5, a second light-shielding film 14 is formed on the common electrode 6 and etched to form the belt-like second light-shielding part 15 corresponding to the interval of pixels to cross the first light-shielding part 12 perpendicular to each other. similarly, etching defects due to insufficient infiltration of the etching liquid can be prevented and the second light-shielding part 15 can be surely patterned. Therefore, a grid-like black mask can be formed with good accuracy by forming the first light-shielding part 12 and the second light-shielding part 15.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device and a method for manufacturing the same.

[0002]

2. Description of the Related Art Liquid crystal display elements include, for example, active type color liquid crystal display elements in which driving elements such as TFTs (thin film transistors) are mounted on respective pixel electrodes. In this active type color liquid crystal display element,
Liquid crystal is sealed between one substrate provided with pixel electrodes and TFTs and the other substrate provided with a color filter corresponding to each pixel electrode and a common electrode corresponding to all pixel electrodes. In this case, in order to prevent light from leaking from the gap between the pixels (corresponding to the pixel electrodes), the other substrate is provided with a lattice-shaped light shielding portion called a black mask.

An example of a method of manufacturing a substrate in such a color liquid crystal display device will be described with reference to FIGS. 4 and 5. First, as shown in FIG. 4A, a light shielding film 2 made of a metal such as chromium is formed on the upper surface of a transparent substrate 1 such as glass or ceramic, and a photoresist 3 is formed on the light shielding film 2 in a grid pattern. A pattern is formed, the light-shielding film 2 is wet-etched with an etching solution using the photoresist 3 as a mask to remove unnecessary portions of the light-shielding film 2, and then the photoresist 3 is peeled off. Then, as shown in FIGS. 4B and 5, the lattice-shaped light shielding portions 4 are formed on the substrate 1 so as to correspond to the pixels. Next, as shown in FIG. 4C, a color filter 5 is patterned on the substrate 1 in a portion corresponding to the pixel from which the light shielding film 2 is removed, and then, as shown in FIG. ITO on the filter 5 and the light shield 4
The common electrode 6 made of a transparent conductive material such as is formed. An alignment film (not shown) is formed on the common electrode 6.

[0004]

By the way, in such a conventional color liquid crystal display element, the wet etching of the light-shielding film 2 includes a dip method and a shower method. In either method, the light-shielding section 4 is used. Since it has a grid shape, the etching liquid is less likely to flow into every corner of the grid-shaped light-shielding section 4, and the corners of the light-shielding section 4 are formed into a circular pattern due to defective etching, resulting in display unevenness or point defects. I have a problem. Even if such a pattern defect is small, there is a problem that the pattern defect of the light-shielding portion 4 becomes more noticeable and the yield decreases as the size of the high-definition large screen increases with the number of pixels. An object of the present invention is to provide a liquid crystal display element and a method for manufacturing the same capable of reliably preventing an etching defect due to an inflow of an etching solution.

[0005]

According to the first aspect of the present invention,
In a liquid crystal display element in which liquid crystal is interposed between two substrates facing each other and pixels are arranged in a matrix, a band-shaped first light shield formed in one direction on one surface of one substrate corresponding to the pixels And a first surface of the substrate through a light-transmitting film on the first surface.
A strip-shaped second light-shielding portion that is formed across the light-shielding portion in a direction orthogonal to the light-shielding portion and is formed between the pixels. In this case, the light transmitting film preferably has a transparent electrode, a color filter, or a two-layer structure of a transparent electrode and a color filter. According to a fourth aspect of the present invention, in a method of manufacturing a liquid crystal display element in which liquid crystal is interposed between two substrates facing each other and pixels are arranged in a matrix, a first light shielding film is formed on one surface of one substrate. Then, the first light-shielding film is etched through a mask to form a band-shaped first light-shielding portion corresponding to the pixels in one direction, and then the first light-shielding film is formed on one surface of the substrate through the light-transmitting film. A second light-shielding film that covers the light-shielding portion is formed, and the second light-shielding film is etched through a mask to cross the first light-shielding portion in a direction orthogonal to the second light-shielding portion and form a second strip-shaped corresponding to pixels. The light shielding portion is formed.

[0006]

According to the present invention, a first light-shielding film is formed on one surface of one substrate, and the first light-shielding film is etched through a mask to form a band-shaped first light-shielding portion corresponding to pixels. Since it is formed in one direction, it is possible to prevent the etching failure due to the invasion failure of the etching solution and to reliably pattern the first light-shielding portion, and then cover the first light-shielding portion on one surface of the substrate through the light-transmitting film. A second light-shielding film is formed, and the second light-shielding film is etched through a mask to cross the first light-shielding portion in a direction orthogonal to the second light-shielding film to form a band-shaped second light-shielding portion corresponding to pixels. Therefore, similar to the above, the etching failure due to the invasion of the etching solution is prevented, and the first light-shielding portion is prevented from being etched up to the first light-shielding film because the light-transmitting film is interposed between the first light-shielding portion and the second light-shielding film. Put the shading part Can be ring, a grid of the black mask can be accurately formed by the first light shielding portion which intersect these with each other and the second light-shielding portion.

[0007]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment in which the present invention is applied to an active type color liquid crystal display element will be described below with reference to FIGS. 1 (a) to 1 (f) are views showing a manufacturing process of one substrate, FIG. 2 is a plan view of FIG. 1 (b), and FIG. 3 is a plan view of FIG. 1 (f). The color liquid crystal display device will be described in the order of manufacturing steps with reference to these drawings. The same parts as those of the conventional example shown in FIGS. 4 and 5 are designated by the same reference numerals, and the description thereof will be appropriately omitted.

First, as shown in FIG. 1A, a first light-shielding film 10 made of a metal such as chromium is formed on the upper surface of a substrate 1, and a plurality of first photoresists 11 are formed on the first light-shielding film 10. In parallel with each other, and the first photoresist 11 is used as a mask to etch the first light-shielding film 10 (for example, when the first light-shielding film 10 is chromium, cerium ammonium nitrate and perchloric acid are used). Wet etching with a mixed TW solution) to remove unnecessary portions of the first light-shielding film 10. At this time, the first photoresist 1
Since 1 is strip-shaped and has no four corners, the first light-shielding film 10 can be surely etched without causing the etching defect due to the defect of the etchant flowing in unlike the conventional case. Then, when the first photoresist 11 is peeled off, as shown in FIGS. 1B and 2, the strip-shaped first light-shielding portions 12 corresponding to the pixels are accurately formed on the substrate 1. Next, as shown in FIG. 1C, a color filter 5 is patterned on a portion of the substrate 1 where the first light-shielding film 10 including the portion corresponding to the pixel is removed, and then, as shown in FIG.
As shown in FIG.
A common electrode 6 made of a transparent conductive material such as ITO is patterned on the upper surface.

Thereafter, as shown in FIG. 1E, a second light-shielding film 13 made of the same material as the first light-shielding film 10 is formed flat on the common electrode 6, and the second light-shielding film 13 is formed on the second light-shielding film 13. The second photoresist 14 is patterned in a band shape in a direction orthogonal to the first light shielding portion 12, and the second light shielding film 13 is wet-etched with the same etching solution as described above by using the second photoresist 14 as a mask to form a second light shield. The unnecessary portion of the film 13 is removed. Also at this time, since the second photoresist 14 is formed in a strip shape on the flat second light shielding film 13,
Similar to the photoresist 11, the second light-shielding film 13 can be surely etched without causing an etching defect due to a defect of the etchant flowing around. After this,
When the second photoresist 14 is peeled off, as shown in FIGS. 1F and 3, the strip-shaped second light-shielding portion 15 that crosses the first light-shielding film 12 above the common electrode 6 at right angles to the pixel is formed in the pixel. It is formed with high precision corresponding to the gap between them. An alignment film (not shown) is formed on the common electrode 6 so as to cover the second light shielding portion 15. Then, the substrate 1 manufactured in this way
And a substrate on which a pixel electrode and a TFT (not shown) are formed by adhering each electrode to each other with a sealing material, and by enclosing the liquid crystal in a region surrounded by the sealing material and the two substrates. A color liquid crystal display element is formed.

In such a color liquid crystal display device, the first
Since the light-shielding portion 12 and the second light-shielding portion 15 are orthogonal to each other, the first and second light-shielding portions 12 and 15 can accurately form a lattice-shaped black mask, and as a result, the number of pixels can be reduced. The yield can be improved even when applied to a large number of high-definition large screens.

In the above embodiment, the first and second light shielding portions 12 and 15 are formed on the substrate 1 on the common electrode 6 side. However, the present invention is not limited to this, and may be formed on the substrate on the pixel electrode side, for example. .
Furthermore, in the above embodiment, the active type color liquid crystal display element was described, but the present invention is not limited to this, and the present invention can be applied to a simple matrix type color display type or monochrome display type liquid crystal display element.

[0012]

As described above, according to the present invention, the first light-shielding film is formed on one surface of one substrate, and the first light-shielding film is formed.
Since the strip-shaped first light-shielding portion corresponding to the pixels is formed in one direction by etching the light-shielding film through the mask, the etching failure due to the invasion of the etching solution is prevented, and the first light-shielding portion is reliably patterned. After that, a second light-shielding film that covers the first light-shielding portion is formed on one surface of the substrate through the light-transmitting film, and the second light-shielding film is etched through the mask to etch the first light-shielding portion. Since the strip-shaped second light-shielding portion corresponding to the pixels is formed across the top in a direction orthogonal to this, the etching failure due to the sneak defect of the etching solution is prevented and the second light-shielding portion is reliably patterned in the same manner as described above. It is possible to accurately form the lattice-shaped black mask by the first light shielding portion and the second light shielding portion that intersect with each other.

[Brief description of drawings]

1A to 1F are cross-sectional views showing an example of a manufacturing process of one substrate in a color liquid crystal display device to which the present invention is applied.

FIG. 2 is a plan view of an essential part of FIG.

FIG. 3 is a plan view of a main part of FIG.

4A to 4D are cross-sectional views showing a conventional substrate manufacturing process.

FIG. 5 is a plan view of a main part of FIG.

[Explanation of symbols]

 1 Substrate 5 Color Filter 6 Common Electrode 10 First Light-shielding Film 11 First Photoresist 12 First Light-shielding Part 13 Second Light-shielding Film 14 Second Photoresist 15 Second Light-shielding Part

Claims (5)

[Claims] 1. A liquid crystal display device in which liquid crystal is interposed between two substrates facing each other and pixels are arranged in a matrix, and the liquid crystal is formed on one surface of one substrate in one direction corresponding to the pixels. A strip-shaped first light-shielding portion, and a strip-shaped second light-shielding portion which is formed on one surface of the substrate across the first light-shielding portion in a direction orthogonal to the first light-shielding portion and corresponding to the pixels. A liquid crystal display device comprising: 2. The liquid crystal display element according to claim 1, wherein the light transmitting film is a transparent electrode or a color filter. 3. The liquid crystal display element according to claim 1, wherein the light transmitting film has a two-layer structure of a transparent electrode and a color filter. 4. A method of manufacturing a liquid crystal display device in which liquid crystal is interposed between two substrates facing each other, and pixels are arranged in a matrix, wherein a first light-shielding film is formed on one surface of one substrate, By etching the first light-shielding film through a mask, a band-shaped first light-shielding portion corresponding to the pixels is formed in one direction, and the first light-shielding portion is formed on one surface of the substrate through a light-transmitting film. A second light-shielding film is formed so as to cover the first light-shielding portion in a direction orthogonal to the second light-shielding film by forming a second light-shielding film covering the strip-shaped second light-shielding portion corresponding to the pixels. A method of manufacturing a liquid crystal display element, comprising: 5. The etching of the first and second light shielding films comprises:
5. The method for manufacturing a liquid crystal display device according to claim 4, wherein both are wet etching.