WO2011089772A1 - Exposure apparatus, liquid crystal display device, and method for manufacturing liquid crystal display device - Google Patents

Abstract

Disclosed is an exposure apparatus, which can suppress, even if scanning is temporarily stopped during scanning exposure, the fact that display nonuniformity is viewed in a joint portion. Also disclosed are a liquid crystal display device, and a method for manufacturing the liquid crystal display device. The exposure apparatus is provided for the purpose of exposing a photo-alignment film provided on a substrate. The exposure apparatus is provided with a light source and a photomask, and exposes the photo-alignment film, while scanning the light source or the substrate, with the photomask therebetween. When the direction in which the light source or the substrate is scanned is expressed as the scanning direction, and the direction perpendicular to the scanning direction is expressed as the perpendicular direction, the photomask has a first region and a second region adjacent to the first region in the perpendicular direction. The first region has a plurality of first light-transmitting sections in a first light blocking section, and the first light-transmitting sections are arranged in the perpendicular direction. The second region has a plurality of second light-transmitting sections in a second light blocking section, each of the second light-transmitting sections is smaller than each of the first light transmitting sections, and the second light-transmitting sections are arranged in the perpendicular direction and are discretely distributed in the scanning direction.

Description

Exposure apparatus, liquid crystal display device and manufacturing method thereof

The present invention relates to an exposure apparatus, a liquid crystal display device, and a manufacturing method thereof. More specifically, the present invention relates to an exposure apparatus suitably used for alignment processing of a photo-alignment film, a liquid crystal display device including the photo-alignment film, and a method for manufacturing the liquid crystal display device.

Since the liquid crystal display device is a display device that can be reduced in weight, thickness, and power consumption, it is widely used for televisions, monitors for personal computers, monitors for portable terminals, and the like. Such a liquid crystal display device usually controls the transmittance of light transmitted through the liquid crystal layer according to the inclination angle of the liquid crystal molecules that changes in accordance with the voltage applied between the pair of substrates (liquid crystal layer). Therefore, the liquid crystal display device has an angle dependency on the transmittance. As a result, in the conventional liquid crystal display device, display defects such as a decrease in contrast and gradation inversion during halftone display may occur depending on the viewing angle (observation) direction. Therefore, in general, the liquid crystal display device has room for improvement in terms of improving viewing angle characteristics.

Therefore, an alignment division technique has been developed in which each pixel is divided into two or more regions having different tilt directions of liquid crystal molecules. According to this technique, when a voltage is applied to the liquid crystal layer, the liquid crystal molecules are inclined in different directions within the pixel, so that the viewing angle characteristics can be improved. Each region having a different orientation direction is also called a domain, and orientation division is also called a multi-domain.

As liquid crystal modes in which alignment division is performed, in the horizontal alignment mode, a multi-domain twisted nematic (TN) mode, a multi-domain birefringence control (ECB) mode, a multi-domain optically compensated birefringence (OCB) mode, and the like. (Optically Compensated Birefringence) mode and the like. On the other hand, in the vertical alignment mode, a multi-domain vertical alignment (MVA) mode, a PVA (Patterned Vertical Alignment) mode, a multi-domain VAECB (Vertical Alignment ECB) mode, and the like are listed. However, various improvements have been made to realize a wider viewing angle.

Examples of the method for performing alignment division include a rubbing method and a photo-alignment method. As a rubbing method, a method of rubbing an alignment film in a state where a rubbing region and a non-rubbing region are separated by a patterned resist has been proposed. However, in the rubbing method, the alignment treatment is performed by rubbing the surface of the alignment film with a cloth wound around a roller. Therefore, in the rubbing method, dust such as cloth hairs or scraped pieces may be generated, or switching elements may be damaged due to static electricity, characteristic shift, deterioration, etc., and there is room for further improvement. It was.

On the other hand, the photo-alignment method uses a photo-alignment film as the alignment film, and irradiates (exposures) light such as ultraviolet rays to the photo-alignment film, thereby generating an alignment regulating force in the alignment film and / or This is an alignment method for changing the alignment regulation direction. Therefore, the photo-alignment method can perform the alignment treatment of the alignment film in a non-contact manner, and can suppress the occurrence of dirt, dust, etc. during the alignment treatment. Further, by using a photomask at the time of exposure, light irradiation can be performed under different conditions on a desired region in the alignment film surface. Therefore, a domain having a desired design can be easily formed.

As a conventional alignment dividing method by the photo-alignment method, for example, in the case of dividing a pixel into two domains, the following methods can be mentioned. That is, a photomask in which a slit-like light-transmitting portion having a width of about half the pixel pitch is formed in the light-shielding region is prepared. Is shifted by about a half pitch, and the second exposure is performed on the remaining area of the pixel under conditions different from the first exposure. By such a method, each pixel can be easily divided into two or more domains. For example, Patent Document 1 discloses a technique for forming a VAECB (Vertical Alignment ECB) mode by performing an alignment process by a photo-alignment method.

In recent years, the size of liquid crystal display devices has been increasing, and liquid crystal televisions have rapidly expanded into the size range, which has been the main battlefield of plasma televisions, such as 40-inch to 60-inch. However, it has been very difficult to divide and align such a large liquid crystal display device of the 60 type class by the conventional photo-alignment method as described above. This is because an exposure apparatus that can expose a 60-type class substrate at a time and is of a size that can be installed in a factory does not actually exist, and exposes the entire surface of a 60-type class substrate at a time. This is because it is impossible. Therefore, when the large-sized liquid crystal display device is divided by the photo-alignment method, it is necessary to divide the substrate into several times and perform exposure. Further, even when a 20-inch class relatively small liquid crystal display device is divided by the photo-alignment method, exposure is performed by dividing the substrate several times in order to reduce the size of the exposure device as much as possible. It may be necessary to do this. However, in the liquid crystal display device in which the substrate is divided and exposed by dividing the substrate several times in this way, the joints between the exposure regions may be clearly visible on the display screen, resulting in a defective product. There was a case. Therefore, when alignment of the liquid crystal display device is performed by dividing and exposing the substrate, there is still room for improvement in terms of improving display quality and yield.

As a technique for improving this, the present inventors have developed the following method and have already filed a patent application (see Patent Document 2). This method includes an exposure step of dividing the substrate surface into two or more exposure regions and exposing the alignment film through a photomask for each exposure region, and the exposure step includes a part of the adjacent exposure region. The exposure is performed so as to overlap, and the photomask has a halftone portion corresponding to the overlapping exposure region.

JP 2001-281669 A International Publication No. 2007/088644

When the scan exposure method is adopted in the technique described in Patent Document 2, no particular problem occurs as long as the substrate is normally moved at a constant speed. However, in the unlikely event that the substrate stops due to a momentary power interruption or the like, there is a problem that the edge of the pattern formed on the photomask appears as display unevenness in the overlapping exposure region (joint portion). Was newly found.

The test conducted by the present inventors will be described in detail with reference to the drawings.
As shown in FIG. 32, the used photomask 121 has a central portion 119 and a halftone portion 120. In the central portion 119 and the halftone portion 120, a light transmitting portion (stripe pattern) is formed in a stripe shape. However, the length of the translucent part 128 of the halftone part 120 gradually decreases as the distance from the central part 119 increases. The length of the translucent part 128 decreases in a trigonometric function. In this way, the aperture ratio of the halftone portion 120 is smaller than the aperture ratio of the central portion 119. Note that the length of the translucent part 128 may decrease linearly as the distance from the central part 119 increases.

FIG. 33 and FIG. 34 are schematic views for explaining the step of scanning exposure of the photo-alignment film formed on the substrate. As shown in FIGS. 33 and 34, since the substrate 118 is large, the photo-alignment film is exposed using a plurality of photomasks 121. The substrate 118 is fixed on the stage 171. Then, with the light source (not shown) and the photomask 121 fixed, the substrate 118 and the stage 171 pass under them, whereby the entire photo-alignment film provided on the substrate 118 is exposed. Further, the substrate 118 is irradiated with UV light from a direction inclined by, for example, 40 ° with respect to the normal direction of the substrate surface. The width of the UV light transmitted through the light transmitting portion 127 of the central portion 119 is, for example, 40 mm. A part of the alignment film (joint portion 124) is exposed through the halftone portions 120 of the two photomasks. Thereby, when the board | substrate 118 has moved normally, the joint part 124, ie, the joint, is not visually recognized. On the other hand, when the substrate 118 is stopped due to a trouble during the scanning exposure, as shown in FIG. 35, display unevenness (mask trace 180) is visually recognized at the joint portion 124 corresponding to the tip portion of the light transmitting portion 128.

Moreover, when the present inventors made a panel using the substrate in which the above trouble occurred, and turned on the panel to evaluate the details, it was found that the appearance of the mask trace depends on the location. Specifically, as shown in FIG. 36, the mask mark 180 appears darker from the joint end 124a toward the center line 124c of the joint, and appears darkest at the center line 124c. On the other hand, this phenomenon (mask mark) was not visually recognized except for the joint portion 124, that is, in the region exposed through the central portion 119.

In the scan exposure method, the irradiation amount is set by the length of the light transmitting portion (opening) of the photomask 121 and the moving speed of the substrate 118. More specifically, in the scan exposure method, the irradiation amount to the photo-alignment film is calculated by the following equation.
(Irradiation amount) = (Illuminance) × (Translucent width) / (Scanning speed)
Since the irradiation amount is set with the value calculated by this equation, when the substrate 118 is stationary, the scanning speed becomes zero, and the effective irradiation amount instantaneously increases. That is, the dose is discontinuous between the movement of the substrate 118 and the stationary state. This discontinuity in the irradiation amount directly affects the tilt angle of the liquid crystal molecules. In addition, the degree of instantaneous increase in irradiation amount when the substrate is stopped is different between the joint portion 124 and the portion other than the joint portion 124, and the degree of increase is greater at the joint portion 124. it is conceivable that.

The present invention has been made in view of the above situation, and an exposure apparatus, a liquid crystal display apparatus, and a liquid crystal display apparatus capable of suppressing display unevenness from being visually recognized at a joint even if scanning is temporarily stopped during scan exposure. The object is to provide a manufacturing method thereof.

The inventors of the present invention have made various studies on an exposure apparatus that can suppress the display unevenness from being visually recognized at the joint even when the scan is temporarily stopped during the scan exposure, and has focused on the pattern of the photomask. Then, the photomask is provided with a first region and a second region adjacent to the first region in a direction (vertical direction) perpendicular to the scan direction, and a plurality of the first regions are provided in the first light shielding portion of the first region. Forming the first light-transmitting portion, arranging the plurality of first light-transmitting portions in the vertical direction, forming the plurality of second light-transmitting portions in the second light-shielding portion of the second region, It is assumed that the joint portion is exposed through the second region by making it smaller than the first light-transmitting portion and arranging the plurality of second light-transmitting portions in the vertical direction and discretely distributing them in the scanning direction. In addition, even when scanning is temporarily stopped during exposure, display unevenness corresponding to the end of the second light-transmitting portion is blurred, and traces of the pattern of the second light-transmitting portion are recorded. Finding things that can be made inconspicuous and solving the above problems Conceive bets is the present invention has been completed.

That is, the present invention is an exposure apparatus for exposing a photo-alignment film provided on a substrate, the exposure apparatus comprising a light source and a photomask, while scanning at least one of the light source and the substrate. When the photo-alignment film is exposed through the photomask, a direction in which at least one of the light source and the substrate is scanned is a scanning direction, and a direction perpendicular to the scanning direction is a vertical direction. A first region and a second region adjacent to the first region in a direction perpendicular to the first region, the first region having a plurality of first light-transmitting portions in a first light shielding portion, The first light transmitting portions are arranged in a vertical direction, the second region has a plurality of second light transmitting portions in the second light shielding portion, and the plurality of second light transmitting portions are the plurality of first light transmitting portions. The plurality of second light-transmitting parts are smaller than the light part and are arranged in the vertical direction. Rutotomoni is an exposure apparatus that is discretely distributed in the scanning direction.

The configuration of the exposure apparatus of the present invention is not particularly limited by other components as long as such components are formed as essential.

The present invention is also a method of manufacturing a liquid crystal display device including a photo-alignment film provided on a substrate, the manufacturing method including the photo-alignment through a photomask while scanning at least one of a light source and the substrate. An exposure step of exposing a film, wherein a direction in which at least one of the light source and the substrate is scanned is a scanning direction, and a direction perpendicular to the scanning direction is a vertical direction. And a second region adjacent to the first region in the vertical direction, the first region having a plurality of first light-transmitting portions in the first light-shielding portion, and the plurality of first light-transmitting portions being Arranged in a vertical direction, the second region has a plurality of second light transmitting portions in a second light shielding portion, and the plurality of second light transmitting portions are smaller than the plurality of first light transmitting portions. The plurality of second light transmitting portions are arranged in a vertical direction and are Is also a method of manufacturing the liquid crystal display device are discretely distributed.

The configuration of the manufacturing method of the liquid crystal display device of the present invention is not particularly limited by other components and processes as long as such components and processes are essential.

Preferred embodiments of the exposure apparatus and the liquid crystal display manufacturing method of the present invention will be described in detail below. Various forms shown below may be combined as appropriate.

In the exposure apparatus and the manufacturing method of the liquid crystal display device of the present invention, the photo-alignment film is made of a material (photo-alignment material) in which the alignment direction of the liquid crystal changes depending on the irradiation direction of the light beam or the moving direction of the irradiation region of the light beam. Preferably it is formed.

In the exposure apparatus and the liquid crystal display manufacturing method of the present invention, it is preferable that the aperture ratio of the second region decreases as the distance from the first region increases. Thereby, it can suppress more effectively that a joint is visually recognized.

In the exposure apparatus and the liquid crystal display device manufacturing method of the present invention, the plurality of second light transmitting parts and the second light shielding part are center lines of the second area parallel to the scanning direction (the center of the second area). The lines may be provided (substantially) symmetrically with respect to a line parallel to the scanning direction. Thereby, it is possible to eliminate the unevenness of the light transmitting portion and the light shielding portion over the entire second region, and it is possible to avoid the mask edge of the joint portion being visually recognized even during a momentary power failure. As described above, the pattern of the second light transmitting part and the pattern of the second light shielding part may be (substantially) symmetric with respect to the center line.

In the exposure apparatus and the liquid crystal display device manufacturing method of the present invention, the plurality of second light transmitting parts and the second light shielding part are center lines of the second area parallel to the scanning direction (the center of the second area). The lines may be in a (substantially) mirror image relationship with respect to the lines parallel to the scanning direction. Thereby, it is possible to eliminate the unevenness of the light transmitting portion and the light shielding portion over the entire second region, and it is possible to avoid the mask edge of the joint portion being visually recognized even during a momentary power failure. As described above, the pattern of the second light transmitting part and the pattern of the second light shielding part may be in a (substantially) mirror image relationship with respect to the center line.

In the exposure apparatus of the present invention, the photomask is a first photomask, and the exposure apparatus further includes a second photomask, and scans at least one of the light source and the substrate. The photo-alignment film is exposed through a second photomask, and the second photomask has a third region and a fourth region that is adjacent to the third region in a direction perpendicular to the third region. The region has a plurality of third light-transmitting portions in the third light-shielding portion, the plurality of third light-transmitting portions are arranged in a vertical direction, and the fourth region has a plurality of fourth light-transmitting portions in the fourth light-shielding portion. The plurality of fourth light transmission portions are smaller than the plurality of third light transmission portions, and the plurality of fourth light transmission portions are arranged in the vertical direction and in the scanning direction. Dispersed discretely, a part of the photo-alignment film is exposed through the plurality of second light transmitting parts. Together, it is preferably exposed through the plurality of fourth light transmitting portion. As a result, the joint can be exposed through the second and fourth light-transmitting parts, and generation of a seam at the joint can be suppressed. In addition, even when scanning is temporarily stopped during exposure, display unevenness corresponding to the end portion of the fourth light transmitting portion can be blurred, and the trace of the pattern of the fourth light transmitting portion can be made inconspicuous. Note that separate light sources may be used for the first and second photomasks.

In the method for manufacturing a liquid crystal display device of the present invention, the photomask is a first photomask, and the exposure step includes scanning the at least one of the light source and the substrate with the first photomass and the second photomask. The photo-alignment film is exposed through the photomask, and the second photomask has a third region and a fourth region that is adjacent to the third region in a direction perpendicular to the third region. The third light-shielding part has a plurality of third light-transmitting parts, the plurality of third light-transmitting parts are arranged in a vertical direction, and the fourth region has a plurality of fourth light-transmitting parts in the fourth light-shielding part. The plurality of fourth light transmissive portions are smaller than the plurality of third light transmissive portions, and the plurality of fourth light transmissive portions are arranged in the vertical direction and discrete in the scanning direction. And a part of the photo-alignment film is exposed through the plurality of second light-transmitting portions. Moni, are preferably exposed through the plurality of fourth light transmitting portion. As a result, the joint can be exposed through the second and fourth light-transmitting parts, and generation of a seam at the joint can be suppressed. In addition, even when scanning is temporarily stopped during exposure, display unevenness corresponding to the end portion of the fourth light transmitting portion can be blurred, and the trace of the pattern of the fourth light transmitting portion can be made inconspicuous. Note that separate light sources may be used for the first and second photomasks.

In the exposure apparatus and the liquid crystal display manufacturing method of the present invention, it is preferable that the aperture ratio of the fourth region decreases as the distance from the third region increases. Thereby, it can suppress more effectively that a joint is visually recognized.

In the exposure apparatus and the manufacturing method of the liquid crystal display device of the present invention, the plurality of second light transmissive portions are provided corresponding to the fourth light shielding portions, and the plurality of fourth light transmissive portions are the second light shielding portions. It may be provided corresponding to the part. As a result, even during a momentary power failure, it is possible to eliminate the multiple exposure areas, and it is possible to avoid not only the mask end of the joint portion but also the joint exposure portion itself being visually recognized. As described above, the pattern of the second light-transmitting portion may correspond to the pattern of the fourth light-shielding portion, and the pattern of the fourth light-transmitting portion may correspond to the pattern of the second light-shielding portion.

In the manufacturing method of the exposure apparatus and the liquid crystal display device of the present invention, the first and second photomasks are center lines of the second region parallel to the scanning direction (center lines of the second region, A line parallel to the scanning direction) and a center line of the fourth region parallel to the scanning direction (substantially a center line of the fourth region and parallel to the scanning direction). The plurality of second light-transmitting portions and the plurality of fourth light-transmitting portions may be in a (substantially) mirror image relationship with respect to the center lines. As a result, even during a momentary power failure, it is possible to eliminate the multiple exposure areas, and it is possible to avoid not only the mask end of the joint portion but also the joint exposure portion itself being visually recognized. As described above, the pattern of the second light-transmitting portion and the pattern of the fourth light-transmitting portion may be in a (substantially) mirror image relationship with respect to the center lines.

In the manufacturing method of the exposure apparatus and the liquid crystal display device according to the present invention, if a straight line parallel to the scanning direction is a scanning line, a plurality of second (excluding the plurality of second light transmitting portions) existing on the same scanning line. The translucent portions may be arranged at substantially equal intervals. Thereby, it is possible to suppress the occurrence of display unevenness due to the uneven location of the second light-transmitting portion.

In the exposure apparatus and the manufacturing method of the liquid crystal display device of the present invention, the plurality of first light transmitting portions may be dispersed in the scanning direction, and at this time, (the plurality of first light transmitting portions) Among them, it is preferable that a region between the first light transmitting parts adjacent in the scanning direction is shielded from light. Thereby, it is possible to suppress the occurrence of display unevenness due to the discontinuity in the number of edges of the first and second light transmitting parts.

From the same point of view, in the exposure apparatus and the liquid crystal display manufacturing method of the present invention, the plurality of third light-transmitting portions may be dispersed in the scanning direction. Of the third light transmitting parts, it is preferable that a region between the third light transmitting parts adjacent in the scanning direction is shielded from light.

In the method for manufacturing a liquid crystal display device according to the present invention, the exposure step includes forming the photo-alignment film so as to form, in each pixel, two regions that are exposed in antiparallel directions when the substrate is viewed in plan. Is preferably exposed. As a result, wide-angle display such as multi-domain TN mode, multi-domain ECB mode, multi-domain VAECB mode, multi-domain VAHAN (Vertical Alignment Hybrid-aligned Nematic) mode, multi-domain VATN (Vertical Alignment Twisted Nematic) liquid crystal display, etc. Can be easily realized.

The present invention is also a liquid crystal display device manufactured by the method for manufacturing a liquid crystal display device of the present invention.

A preferred embodiment of the liquid crystal display device of the present invention will be described in detail below. Various forms shown below may be combined as appropriate.

The liquid crystal display device of the present invention is preferably driven by active matrix, but may be driven simply.

The liquid crystal display device may include a vertical alignment type liquid crystal layer, and the liquid crystal layer may contain a liquid crystal material having a negative dielectric anisotropy. Thereby, a liquid crystal display device in a vertical alignment mode can be realized.

The liquid crystal display device may include a horizontally aligned liquid crystal layer, and the liquid crystal layer may contain a liquid crystal material having positive dielectric anisotropy. Thereby, a liquid crystal display device in a horizontal alignment mode can be realized.

The liquid crystal layer may contain a twisted nematic liquid crystal. Thereby, a liquid crystal display device of TN mode, VATN mode, multi-domain TN mode or multi-domain VATN mode can be realized. Note that a VATN mode liquid crystal display device includes a pair of substrates, a liquid crystal layer containing a nematic liquid crystal, and a pair of vertical alignment films provided on the respective substrates. The directions of the alignment treatment applied to these alignment films are substantially orthogonal to each other, and the nematic liquid crystal is vertically and twist-aligned when no voltage is applied.

The liquid crystal display device preferably has 2 or more domains, preferably 4 or less domains, and more preferably 4 domains. Thereby, a liquid crystal display device excellent in viewing angle characteristics can be realized while suppressing the complexity of the manufacturing process. Further, by using four domains, a wide viewing angle can be obtained in any of four directions orthogonal to each other, for example, four directions of up, down, left, and right. Further, the viewing angle characteristics in any of the four directions orthogonal to each other can be made substantially the same. That is, it is possible to realize viewing angle characteristics with excellent symmetry. Therefore, a liquid crystal display device with small viewing angle dependency can be realized. In addition, the arrangement form of the domains when the orientation is divided into four domains is not particularly limited, and examples thereof include a matrix form and a stripe form such as an eye shape.

According to the exposure apparatus, the liquid crystal display apparatus, and the manufacturing method thereof of the present invention, it is possible to suppress the display unevenness from being visually recognized at the joint even if the scan is temporarily stopped during the scan exposure.

1 is a schematic cross-sectional view illustrating a configuration of a liquid crystal display device according to Embodiment 1. FIG. FIG. 3 is a schematic plan view showing one sub-pixel of Embodiment 1 and shows a light irradiation direction with respect to a first substrate (vertical alignment film). FIG. 3 is a schematic plan view showing one sub-pixel of Embodiment 1 and shows a light irradiation direction with respect to a second substrate (vertical alignment film). FIG. 2 is a schematic plan view showing one sub-pixel of Embodiment 1, showing the light irradiation direction on the first and second substrates and the alignment direction of liquid crystal molecules when a voltage is applied. Moreover, the polarization axis direction of the polarizing plate of Embodiment 1 is shown. 3 is a schematic plan view of a first substrate (TFT array substrate) of Embodiment 1. FIG. 3 is a schematic plan view of a second substrate (CF substrate) of Embodiment 1. FIG. 6 is a schematic plan view showing a first substrate and a photomask in the exposure process of Embodiment 1. FIG. 6 is a schematic plan view showing a first substrate and a photomask in the exposure process of Embodiment 1. FIG. 3 is a schematic plan view showing a first substrate in the exposure process of Embodiment 1. FIG. 6 is a schematic plan view showing a first substrate and a photomask in the exposure process of Embodiment 1. FIG. 6 is a schematic plan view showing a first substrate and a photomask in the exposure process of Embodiment 1. FIG. FIG. 2 is a schematic perspective view showing an exposure apparatus according to Embodiment 1, and a schematic plan view showing a configuration of a TFT array substrate according to Embodiment 1. FIG. It is a cross-sectional schematic diagram which shows the board | substrate and photomask in the exposure process of Embodiment 1, and shows the irradiation aspect of the light with respect to a board | substrate. It is a plane schematic diagram which shows the 2nd board | substrate and photomask in the exposure process of Embodiment 1. It is a plane schematic diagram which shows the 2nd board | substrate and photomask in the exposure process of Embodiment 1. 6 is a schematic plan view showing a second substrate in the exposure step of Embodiment 1. FIG. It is a plane schematic diagram which shows the 2nd board | substrate and photomask in the exposure process of Embodiment 1. It is a plane schematic diagram which shows the 2nd board | substrate and photomask in the exposure process of Embodiment 1. 3 is a schematic plan view showing the photomask of Embodiment 1. FIG. 3 is a schematic plan view showing the photomask of Embodiment 1. FIG. 3 is a schematic plan view showing the photomask of Embodiment 1. FIG. 3 is a schematic plan view showing the photomask of Embodiment 1. FIG. 3 is a schematic plan view illustrating a first substrate of Embodiment 1. FIG. It is a plane schematic diagram which shows the 1st board | substrate and 2nd board | substrate which were bonded together of Embodiment 1. FIG. It is a plane schematic diagram which shows the board | substrate and photomask in the exposure process of Embodiment 1, and shows a modification. 3 is a schematic plan view showing the photomask of Embodiment 1. FIG. 6 is a schematic plan view showing a photomask according to Embodiment 2. FIG. 6 is a schematic plan view showing a photomask according to Embodiment 2. FIG. It is a plane schematic diagram which shows the photomask of Embodiment 2, and shows a modification. It is a plane schematic diagram which shows the photomask of Embodiment 3. It is a plane schematic diagram which shows the photomask of Embodiment 3. It is a plane schematic diagram which shows the photomask of a comparison form. It is a plane schematic diagram which shows the board | substrate and photomask in the exposure process of a comparison form. It is a cross-sectional schematic diagram which shows the board | substrate and photomask in the exposure process of a comparison form. It is a plane schematic diagram which shows the board | substrate of a comparison form. It is a plane schematic diagram which shows the display nonuniformity in a comparison form.

Embodiments will be described below, and the present invention will be described in more detail with reference to the drawings. However, the present invention is not limited only to these embodiments.

(Embodiment 1)
First, the configuration of the liquid crystal display device of Embodiment 1 will be described. As shown in FIG. 1, the liquid crystal display device 100 according to the present embodiment includes a first substrate 1 (for example, a TFT array substrate) and a second substrate 2 (for example, a CF substrate), which are a pair of opposing substrates, and a first substrate 1. And a liquid crystal layer 3 provided between the second substrates 2. In addition, the first substrate 1 includes, on the liquid crystal layer 3 side of the insulating substrate 26a, in order from the insulating substrate 26a side, a transparent electrode 4a (pixel electrode) for applying a driving voltage to the liquid crystal layer 3, a vertical alignment film 5a, Have The second substrate 2 has, on the liquid crystal layer 3 side of the insulating substrate 26b, a transparent electrode 4b (common electrode) for applying a driving voltage to the liquid crystal layer 3 and a vertical alignment film 5b in order from the insulating substrate 26b side. . On the opposite side of the first substrate 1 and the second substrate 2 from the liquid crystal layer 3, retardation plates 7a and 7b and polarizing plates 6a and 6b are arranged in this order from the substrate side. The retardation plates 7a and 7b need not be installed, but are preferably installed from the viewpoint of realizing a wide viewing angle. Further, only one of the phase difference plates 7a and 7b may be arranged. Thus, the liquid crystal display device 100 includes a so-called liquid crystal display panel.

The liquid crystal layer 3 contains, for example, a nematic liquid crystal material (negative type nematic liquid crystal material) having a negative dielectric anisotropy. The liquid crystal molecules in the liquid crystal layer 3 are aligned in a substantially vertical direction with respect to the surfaces of the vertical alignment films 5a and 5b when a driving voltage is not applied to the liquid crystal layer 3 (when no voltage is applied). Actually, the liquid crystal molecules are aligned with a slight inclination of about 0.1 ° to several degrees with respect to the normal direction of the surfaces of the vertical alignment films 5a and 5b. That is, the liquid crystal molecules are aligned by the vertical alignment films 5a and 5b so as to have a slight pretilt angle. The pretilt angle is an angle formed by the alignment film surface and the major axis direction of the liquid crystal molecules near the alignment film surface when no voltage is applied. Further, when no voltage is applied, the direction in which the liquid crystal molecules in the vicinity of the surface of the alignment film are inclined when the substrate is viewed in plan is defined as a pretilt direction. On the other hand, when a sufficient driving voltage equal to or higher than a threshold value is applied to the liquid crystal layer 3 (when a voltage is applied), the liquid crystal molecules are further tilted in a certain direction by a preset pretilt angle. More specifically, the liquid crystal molecules 3 a located at substantially the center in the thickness direction of the liquid crystal layer 3 are inclined in a direction substantially parallel to the surfaces of the first substrate 1 and the second substrate 2. The vertical alignment films 5a and 5b are made of a photo-alignment film material. The pretilt direction defined by the vertical alignment films 5a and 5b is such that the surface of the vertical alignment films 5a and 5b is, for example, the substrate surface via a photomask. It is determined by exposing from an oblique direction.

A domain formed in a sub-pixel will be described with reference to FIGS. 2 and 4, a dotted arrow indicates a light beam irradiation direction applied to the first substrate, and in FIGS. 3 and 4, a solid line arrow indicates a light beam irradiation direction applied to the second substrate. In FIG. 4, a liquid crystal molecule (liquid crystal director) 3a is located at the approximate center of each domain when the substrate is viewed in plan, and is positioned at the approximate center in the thickness direction of the liquid crystal layer. ).

As shown in FIGS. 2 and 3, each of the vertical alignment films 5 a and 5 b emits light from an antiparallel direction (a parallel and reverse direction A and direction B) in the sub-pixel 8 when the substrate is viewed in plan. Is irradiated. Further, as shown in FIG. 4, the direction of light irradiation to the vertical alignment films 5a and 5b is set so as to be approximately 90 ° different from each other when the first substrate 1 and the second substrate 2 are bonded together. As a result, in each domain, the pretilt direction defined by the vertical alignment film 5a and the pretilt direction defined by the vertical alignment film 5b differ from each other by approximately 90 °. Accordingly, the liquid crystal molecules contained in the liquid crystal layer 3 are twisted and aligned by approximately 90 ° in each domain when the substrate is viewed in plan. Further, the liquid crystal molecules 3a are aligned in a direction shifted by approximately 45 ° with respect to the light irradiation direction when the substrate is viewed in plan. Further, the liquid crystal molecules 3a in each domain are inclined in four different directions. As described above, the liquid crystal display device 100 according to the present embodiment uses the vertical alignment films whose pretilt directions (alignment processing directions) are orthogonal to each other, so that the liquid crystal molecules are approximately 90 ° twist aligned. Therefore, the liquid crystal display device 100 has a 4-domain VATN mode. Each sub-pixel 8 is divided into eight regions, but the liquid crystal molecules 3a have four tilt directions, so the liquid crystal display device 100 has four domains.

According to the 4-domain VATN mode, as shown in FIGS. 2 to 4, the first substrate 1 and the second substrate 2 are each irradiated twice, and the alignment directions of the liquid crystal molecules 3a are different from each other by a total of four irradiations. One domain can be formed. Therefore, it is possible to reduce the number of apparatuses and shorten the alignment processing time (shorten the tact time). Further, dividing one pixel (one sub-pixel) into four domains is a preferable form from the viewpoint of realizing a wide viewing angle of the liquid crystal display device. Further, the photomask for forming the alignment control structure such as ribs (protrusions) required in the liquid crystal mode having the alignment control structure such as the conventional MVA mode, that is, the photolithography process can be reduced. As a result, the manufacturing process can be simplified. In addition, when one pixel (one sub-pixel) is divided into two domains, for example, the viewing angle characteristics in the other direction can be increased, although the viewing angle in the other direction can be widened. Can not. Although the number of domains may be increased to five or more, it is not preferable because the process becomes complicated and the processing time becomes long. Furthermore, it has been found that there is practically no difference in viewing angle characteristics between four domains and more domains.

As shown in FIG. 4, the polarizing plates 6a and 6b are arranged so that the polarization axis direction P of the polarizing plate 6a and the polarization axis direction Q of the polarizing plate 6b are substantially orthogonal to each other when the panel (substrate) is viewed in plan. Has been placed. Further, one of the polarization axis direction P of the polarizing plate 6a and the polarization axis direction Q of the polarizing plate 6b is arranged along the light irradiation direction with respect to the vertical alignment film 5a, and the other is with respect to the vertical alignment film 5b. It arrange | positions along the irradiation direction of light. Therefore, when a voltage is applied, the light incident from the polarizing plate 6a side becomes polarized light in the polarization axis direction P, rotates 90 ° along the twist of the liquid crystal molecules in the liquid crystal layer 3, and becomes polarized light in the polarization axis direction Q. Thus, the light is emitted from the polarizing plate 6b. On the other hand, when no voltage is applied, the liquid crystal molecules remain vertically aligned in the liquid crystal layer 3, and the polarized light in the polarization axis direction P passes through the liquid crystal layer 3 as it is without optical rotation and is blocked by the polarizing plate 6b. It becomes. Thus, the liquid crystal display device 100 is in a normally black mode. In the present specification, the polarization axis means an absorption axis. Further, the polarization axis direction P of the polarizing plate 6a and the polarization axis direction Q of the polarizing plate 6b are not particularly limited to the directions shown in FIG. 4 and may be set as appropriate, but the polarization of the pair of polarizing plates 6a and 6b The axial directions are preferably approximately 90 ° different from each other when the panel (substrate) is viewed in plan. That is, it is preferable that the polarizing plates 6a and 6b are arranged in a crossed Nicols arrangement.

In this embodiment, the vertical alignment type liquid crystal display device is described. However, the liquid crystal display device of this embodiment may be a horizontal alignment type liquid crystal display device. In this case, the liquid crystal layer 3 contains a nematic liquid crystal material (positive nematic liquid crystal material) having a positive dielectric anisotropy, and is perpendicular to the liquid crystal layer 3 side of the first substrate 1 and the second substrate 2. A horizontal alignment film may be provided instead of the alignment films 5a and 5b.

Below, the manufacturing method of the liquid crystal display device of Embodiment 1 is demonstrated.
First, a pair of first and second substrates before alignment film formation is prepared by a general method. As the first substrate, for example, as shown in FIG. 5, a plurality of scanning signal lines (gate bus lines) 9, a plurality of TFTs 11, and a plurality of data are formed on an insulating substrate (not shown) formed of glass or the like. By sequentially forming the signal line (source bus line) 10 and the plurality of pixel electrodes 12, the scanning signal line 9 and the data signal line 10 cross on the insulating substrate in a lattice shape via an insulating film (not shown). A TFT array substrate in which the TFT 11 and the pixel electrode 12 are further arranged at each intersection is used. On the other hand, as the second substrate, for example, as shown in FIG. 6, a black matrix (BM) 13 and red (R) and blue (G) are formed on an insulating substrate (not shown) made of glass or the like. And a color filter 14 including three colored layers of green (B), a protective film (overcoat layer, not shown), and a transparent electrode film (not shown) are sequentially formed on the insulating substrate. A CF substrate is used in which the BM 13 is arranged in a lattice pattern and the color filter 14 is arranged in a region partitioned by the BM 13. Thus, in the present embodiment, one pixel is composed of three RGB sub-pixels arranged in the x-axis direction (the horizontal direction when the display surface (display screen) is viewed from the front). Note that the insulating substrate is not particularly limited to glass as long as it has an insulating surface. Moreover, what is necessary is just to use the material normally used for the material of the above-mentioned each structural member.

Next, after applying a solution containing the photo-alignment film material to the TFT array substrate and the CF substrate by a spin casting method or the like, the photo-alignment film material is baked, for example, at 180 ° C. for 60 minutes, thereby performing vertical alignment. A film is formed. The photo-alignment film material is not particularly limited, and examples thereof include a resin containing a photosensitive group. More specifically, a 4-chalcone group (the following chemical formula (1)), a 4′-chalcone group (the following chemical formula (2)), a coumarin group (the following chemical formula (3)), and a cinnamoyl group (the following chemical formula (4)). A polyimide containing a photosensitive group such as is suitable. The photosensitive groups of the following chemical formulas (1) to (4) are those that cause a crosslinking reaction (including a dimerization reaction), an isomerization reaction, a photoreorientation, etc. by irradiation with light (preferably ultraviolet rays). Accordingly, the variation in the pretilt angle in the alignment film plane can be effectively reduced as compared with the photodecomposition type photo-alignment film material. The photosensitive groups represented by the following chemical formulas (1) to (4) include structures in which a substituent is bonded to the benzene ring. Further, the cinnamate group (C ₆ H ₅ —CH═CH—COO—, in which the oxygen atom is further bonded to the carbonyl group in the cinnamoyl group of the following chemical formula (4) has the advantage that it is easy to synthesize. is doing. Therefore, the photo-alignment film material is more preferably a polyimide containing a cinnamate group. The firing temperature, firing time, and film thickness of the photo-alignment film are not particularly limited and may be set as appropriate.

In this embodiment, a photo-alignment film material that reacts with light and generates a pretilt angle of liquid crystal molecules in the light irradiation direction is used as the alignment film material. However, the photo-alignment method disclosed in Non-Patent Document 1 As described above, a photo-alignment film material that can define the pretilt direction depending on the moving direction of the light irradiation region may be used. In this case, light does not need to be incident on the substrate from an oblique direction, and can be incident substantially perpendicular to the substrate.

Next, an alignment film exposure method will be described.
In this embodiment, the alignment film is exposed by a scanning method. Hereinafter, the exposure process for the first substrate will be described.

First, a photomask 21a having a central portion 19a and a gray tone portion 20a and a photomask 21b having a central portion 19b and a gray tone portion 20b are prepared.

Note that the photomask used in this embodiment has a pattern formed of a metal film such as chromium on a transparent substrate such as glass, and the region where the metal film is formed is a light shielding portion, The opening is a translucent part.

Then, as shown in FIG. 7, the photomasks 21a and 21b are arranged so that the gray tone portions 20a and 20b overlap in the y-axis direction. The photomasks 21a and 21b are provided with a plurality of slits formed in the y-axis direction in the x-axis direction (axis that forms an angle of 90 ° with the y-axis). More specifically, a plurality of rectangular light transmissions having a width substantially half the sub-pixel pitch Px in the x-axis direction (lateral direction when the display surface is viewed from the front) are provided in the light shielding portions of the central portions 19a and 19b. The light transmitting portions are arranged at substantially the same pitch as the pitch Px. On the other hand, in the gray tone portions 20a and 20b, a plurality of light transmitting portions are arranged at a pitch substantially the same as the pitch Px, but the light transmitting portions of the gray tone portions 20a and 20b are the light transmitting portions of the central portions 19a and 19b. It is smaller than the light part and is distributed in the scanning direction. The pattern of the gray tone portions 20a and 20b will be described in detail later.

Further, a photomask 21c having a central portion 19c and a gray tone portion 20c and a photomask 21d having a central portion 19d and a gray tone portion 20d are prepared. Then, as shown in FIG. 7, the photomasks 21c and 21d are arranged so that the gray tone portions 20c and 20d overlap in the y-axis direction. The same patterns as the photomasks 21a and 21b are formed on the photomasks 21c and 21d. Note that there is actually a space between the photomasks 21a and 21b and the photomasks 21c and 21d so that the first substrate 1 can be accommodated sufficiently.

In addition, as shown in FIG. 12, a light source is disposed above each of the photomasks 21a to 21d. Here, only the configuration including the photomask 21a is illustrated, but the configuration including the photomasks 21b to 21d is the same as the configuration including the photomask 21a. In the present embodiment, the light source 25 and the photomask 21a are linearly moved together, or the substrate 18 (first substrate or second substrate) while the light source 25 and the photomask 21a are fixed. Moves linearly. FIG. 12 shows a case where the substrate 18 moves. As the substrate 18, a first substrate (TFT array substrate) is shown. An image detection camera 30 is provided on the side of the photomask 21a, and the substrate 18 can be moved so as to read and follow the bus wiring such as the data signal line 10 and the scanning signal line 9. According to this process, the exposure apparatus can be reduced in size. In addition, the cost of the exposure apparatus can be reduced. Furthermore, since the photomask can be small, the accuracy of the mask itself can be increased. In addition, since the scan exposure is excellent in the stability of the irradiation amount within the substrate surface, it is possible to effectively suppress variations in the properties of the alignment film such as the alignment azimuth and the pretilt angle.

Next, after aligning the slits of the photomasks 21a and 21b and the sub-pixels, as shown in FIG. 8, the photomask 21a is moved using the polarized ultraviolet light while moving the first substrate 1 in the + y-axis direction. , 21b, the alignment film provided on the surface of the first substrate 1 is exposed from end to end (1st scan). At this time, the first substrate 1 is moved so that the slits of the photomasks 21a and 21b are along the bus wiring such as the data signal line 10 and the scanning signal line 9. Further, as shown in FIG. 13, the polarized ultraviolet light 15 is applied to the first substrate 1 from an oblique direction. In addition, a predetermined gap (proximity gap 16) is provided between the photomasks 21a and 21b and the first substrate 1. Accordingly, the first substrate 1 can be moved smoothly and contact with the first substrate 1 can be suppressed even if the photomasks 21a and 21b are bent by their own weight. By this 1st scan, an approximately half region of each pixel (each subpixel) is subjected to orientation processing. In addition, the liquid crystal molecules 3b in the vicinity of the surface of the vertical alignment film 5a exhibit a substantially constant pretilt angle 17, as shown in FIG. Further, as shown in FIG. 9, the first substrate 1 has an exposure region 22 that is scan-exposed through the central portion 19a of the photomask 21a and an exposure region that is scan-exposed through the central portion 19b of the photomask 21b. 23 and the joint portion 24 subjected to the scanning exposure through the gray tone portions 20a and 20b of the photomasks 21a and 21b. That is, in the exposure process of the present embodiment, the alignment film surface provided on the first substrate 1 is divided into exposure regions 22 and 23 and a joint portion 24 interposed between adjacent exposure regions 22 and 23, The joint portion 24 is exposed through the gray tone portions 20a and 20b, and the exposure regions 22 and 23 are exposed through the central portions 19a and 19b. The joint portion 24 is exposed at least twice through the gray tone portions 20a and 20b.

Next, as shown in FIG. 10, after the first substrate 1 is rotated by 180 ° in the plane, the slits provided in the photomasks 21 c and 21 d correspond to the unexposed areas of the sub-pixels. The first substrate 1 is horizontally moved in the axial direction by approximately half of the pitch Px. Thereafter, as shown in FIG. 11, exposure is performed from end to end of the alignment film (2nd scan) while moving the first substrate 1 as in the case of the 1st scan shown in FIG. As a result, the remaining half of the remaining area of each pixel (each sub-pixel) is subjected to orientation treatment, and the first substrate 1 is exposed over the entire surface. In addition, the incident angle with respect to the 1st board | substrate 1 of the light ray at the 2nd scan (polarized ultraviolet ray 15) and the incident angle with respect to the 1st board | substrate 1 of the light ray at the 1st scan (polarized ultraviolet ray 15) are substantially the same. On the other hand, during the 1st scan and the 2nd scan, the first substrate 1 is rotated by 180 ° in the plane. Therefore, the direction of the light beam with respect to the first substrate 1 at the 1st scan and the first substrate 1 at the 2nd scan As shown in FIG. 2, the direction of the light beam is just opposite when the first substrate 1 is viewed in plan. That is, each sub-pixel of the first substrate 1 is divided into two regions whose alignment directions are antiparallel to each other.

Next, an exposure process for the second substrate will be described. The exposure mode for the second substrate is substantially the same as the exposure mode for the first substrate, except that the type of photomask is different.

First, a photomask 21e having a central portion 19e and a gray tone portion 20e and a photomask 21f having a central portion 19f and a gray tone portion 20f are prepared. And as shown in FIG. 14, the photomasks 21e and 21f are arrange | positioned so that the gray tone parts 20e and 20f may overlap in an x-axis direction. The photomasks 21e and 21f are provided with a plurality of slits formed in the x-axis direction in the y-axis direction. More specifically, in the light shielding portions of the central portions 19e and 19f, a plurality of rectangular transparent portions having a width of about ¼ of the pixel pitch Py in the y-axis direction (vertical direction when the display surface is viewed from the front). Light portions are provided, and these light-transmitting portions are provided so as to have a pitch that is approximately half the pitch Py. On the other hand, in the gray tone portions 20e and 20f, a plurality of light transmitting portions are arranged at substantially the same pitch as the pitch Py, but the light transmitting portions of the gray tone portions 20e and 20f are the light transmitting portions of the central portions 19e and 19r. It is smaller than the light part and is distributed in the scanning direction. In the present embodiment, the vertical pixel pitch and the sub-pixel pitch when the display surface is viewed from the front are the same.

A photomask 21g having a central portion 19g and a gray tone portion 20g and a photomask 21h having a central portion 19h and a gray tone portion 20h are prepared. And as shown in FIG. 14, the photomasks 21g and 21h are arrange | positioned so that the gray tone parts 20g and 20h may overlap in an x-axis direction. The same patterns as the photomasks 21e and 21f are formed on the photomasks 21g and 21h. There is actually a space between the photomasks 21e and 21f and the photomasks 21g and 21h so that the second substrate 2 can be accommodated sufficiently.

Similarly to the exposure process for the first substrate shown in FIG. 12, light sources are arranged above the photomasks 21e to 21h.

Next, after aligning the slits of the photomasks 21e and 21f and the pixels of the second substrate 2, as shown in FIG. 15, the polarized light is used while moving the second substrate 2 in the + x-axis direction. Then, exposure is performed from end to end of the alignment film provided on the surface of the second substrate 2 through the photomasks 21e and 21f (1st scan). At this time, the second substrate 2 is moved so that the slits of the photomasks 21e and 21f are along the BM13. Similarly to the irradiation direction with respect to the first substrate shown in FIG. 13, the polarized ultraviolet light is irradiated to the second substrate 2 from an oblique direction. In addition, a proximity gap is provided between the photomasks 21e and 21f and the second substrate 2 as in the case of the exposure process for the first substrate. By this 1st scan, an approximately half region of each pixel (each subpixel) is subjected to orientation processing. In addition, the liquid crystal molecules in the vicinity of the surface of the vertical alignment film provided on the second substrate exhibit a substantially constant pretilt angle as in the case of the first substrate shown in FIG. Further, as shown in FIG. 16, the second substrate 2 has an exposure region 32 that is scan-exposed through the central portion 19e of the photomask 21e and an exposure region that is scan-exposed through the central portion 19f of the photomask 21f. 33 and the joint portion 34 subjected to the scanning exposure through the gray tone portions 20e and 20f of the photomasks 21e and 21f. That is, in the exposure process of the present embodiment, the alignment film surface provided on the second substrate 2 is divided into exposure regions 32 and 33 and a joint portion 34 interposed between the adjacent exposure regions 32 and 33, and The joint portion 34 is exposed through the gray tone portions 20e and 20f, and the exposure regions 32 and 33 are exposed through the central portions 19e and 19f. The joint portion 34 is exposed at least twice through the gray tone portions 20e and 20f.

Next, as shown in FIG. 17, after the second substrate 2 is rotated by 180 ° in the plane, the y-axis is set so that the slits provided in the photomasks 21g and 21h correspond to the unexposed areas of the pixels. The second substrate 2 is horizontally moved in the direction by about 1/4 of the pitch Py. After that, as shown in FIG. 18, exposure is performed from end to end of the alignment film while moving the second substrate 2 (2nd scan), as in the case of the first scan shown in FIG. Thereby, the remaining half of the remaining area of each pixel (each sub-pixel) is subjected to orientation treatment, and the second substrate 2 is exposed over the entire surface. The direction of the light beam with respect to the second substrate 2 at the time of the first scan and the direction of the light beam with respect to the second substrate 2 at the time of the 2nd scan are as follows when the second substrate 2 is viewed in plan as shown in FIG. Reverse. That is, each sub-pixel of the second substrate 2 is divided into two regions whose alignment directions are antiparallel to each other.

In the present embodiment, in order to align and divide one subpixel into four domains, a stripe pattern is formed with a width approximately half of the horizontal pixel pitch Px (x-axis direction in FIGS. 5 and 6). The TFT array substrate is exposed using a photomask, while the vertical sub-pixel pitch Py (in FIGS. 5 and 6, the y-axis direction, and in this embodiment, the vertical sub-pixel pitch and the pixel pitch are the same). In the above description, the CF substrate is exposed using a photomask in which a stripe pattern is formed with a width of approximately ¼ of the above. However, the pattern of the light transmitting portion is not particularly limited, and may be set as appropriate according to the layout of the pixel (subpixel), the pixel (subpixel) size, the resolution of the panel, and the like. Further, in the present embodiment, four domains are formed in a matrix, but the arrangement form of the domains is not particularly limited to a matrix, and may be a stripe shape like an eye shape. Furthermore, when each subpixel has a subpixel, a slit pattern may be formed according to each subpixel in order to divide and align each subpixel.

Examples of materials that can be used in the present embodiment and conditions in an applicable manufacturing process include the following. However, materials and conditions that can be used in the present embodiment are not limited to the following. The type of light used for exposure is not particularly limited to polarized ultraviolet rays, and can be set as appropriate depending on the alignment film material, manufacturing process, etc., and may be non-polarized light (extinction ratio = 1: 1).
Liquid crystal materials: Δn (birefringence) = 0.06 to 0.14, Δε (dielectric anisotropy) = − 2.0 to −8.0, Tni (nematic-isotropic phase transition temperature) = 60 to Nematic liquid crystal having 110 ° C.
・ Pretilt angle: 85 ~ 89.9 °
・ Cell thickness: 2-5μm
・ Irradiation energy density: 0.01 to 5 J / cm ²
・ Proximity gap: 10-250μm
Light source: Low pressure mercury lamp, high pressure mercury lamp, deuterium lamp, metal halide lamp, argon resonance lamp, xenon lamp, excimer laser.
・ Extinction ratio of ultraviolet rays (degree of polarization): 1: 1 to 60: 1
-UV irradiation direction: 0 to 60 ° direction from the normal direction of the substrate surface

Next, the patterns of the photomasks 21a and 21b will be described in detail.
As shown in FIG. 19, the photomask 21a has a central portion 19a and a gray tone portion 20a in which a gray tone is formed. The photomask 21b has a central portion 19b and a gray tone portion 20b in which a gray tone is formed. Corresponding to the joint portion 24, gray tone portions 20a and 20b are provided.

In the central portion 19a, a plurality of light transmitting portions 27a are formed. The planar shape of the light transmitting portion 27a is a rectangle, and the light transmitting portion 27a is formed in a stripe shape. The size of each translucent part 27a is the same. The light transmitting portions 27a are arranged at the same pitch as the pixel pitch Px in a direction (vertical direction) perpendicular to the scanning direction. Further, as shown in FIG. 20, the width (length in the vertical direction) Δx of the light transmitting portion 27a is, for example, approximately half of the pitch Px. Note that Δx may be set to a value obtained by adding about a few μm to half of the pitch Px. That is, you may form the part exposed in multiple times at the boundary between each domain. The length y1 in the scanning direction of the translucent part 27a is, for example, 40 mm.

The gray tone does not adjust the aperture ratio by the length of the continuous light transmitting parts as in the technique described in Patent Document 2, but the size, number and / or density of a plurality of minute light transmitting parts. This is a pattern for adjusting the aperture ratio. The aperture ratio is a ratio (percentage) of the area of each light transmitting portion of the gray tone portion to the average area of the light transmitting portion at the center. A plurality of light-transmitting portions are also formed in the gray tone portion 20a, but here, as it goes to the end of the mask 21a, the size of the light-transmitting portion decreases or the number of light-transmitting portions decreases. And / or the aperture ratio is changed by decreasing the density of the translucent part. Assuming that the gray tone portion 20a is provided so as to overlap the pixels for N columns, as shown in FIG. 21, the length obtained by dividing the length y1 by (N−1), for example, is set as the unit length Δy, The length y2 in the scanning direction of the light transmitting portion of the tone portion 20a is set to an integer multiple of Δy. Note that the width (the length in the vertical direction) of the light transmitting portion of the gray tone portion 20a is set in the same manner as Δx.

FIG. 22 shows details of the gray tone pattern.
Here, a case where the gray tone portions 20a and 20b are provided so as to overlap with pixels for 16 columns will be described as an example. Therefore, the unit length Δy is a value obtained by dividing 40 mm into 15 parts. Further, a rectangular light transmission portion having a length in the scanning direction of Δy and a width of Δx is defined as a unit area (a region partitioned by a lattice in FIG. 22).

As shown in FIG. 22, the gray tone part 20a is formed with a plurality of light transmitting parts 28a smaller than the light transmitting part 27a. The planar shape of the light transmitting portions 28a is a rectangle, and the light transmitting portions 28a are arranged at the same pitch as the pixel pitch Px in the vertical direction. That is, all of the light transmitting portions 27a and 28a are formed corresponding to the pixels (sub-pixels), and are arranged at a pitch Px in the vertical direction. Here, the pixel located at the right end of the gray tone portion 20a is the pixel in the first column, and the pixel located at the left end of the gray tone portion 20a is the pixel in the 16th column (in FIG. 22, above the gray tone portion 20a). (See the numbers listed.) In addition, the light transmitting portion 28a is also ordered in the same manner as the pixels. That is, the light transmitting portion 28a that overlaps the pixels in the second column is the light transmitting portion in the second column, and the light transmitting portion 28a that overlaps the pixels in the 16th column is the light transmitting portion in the 16th column. Note that no light-transmitting portion is formed in the portion of the gray tone portion 20a that overlaps the pixels in the first column. Then, in the light transmitting portions 28a in the 3rd to 15th rows, the number of the light transmitting portions 28a in the same row is two or more, and the light transmitting portions 28a in the same row are dispersedly arranged in the scanning direction. ing. Each translucent portion 28a includes one or a plurality of unit areas, and the number of unit areas included in the translucent portions 28a in the same row increases as the row is closer to the central portion 19a. Specifically, the light-transmitting portion is not formed in the portion corresponding to the pixel in the first column, and one piece is provided in the light-transmitting portion 28a in the second row,. The unit 28a includes 14 unit areas, and the light-transmitting unit 28a in the 16th column includes 15 unit areas. The translucent portions 28a up to the ninth row all include one unit area, but some of the translucent portions 28a in the tenth and subsequent rows include a plurality of unit areas. Finally, the 16th row of translucent portions 28a has the same size as the translucent portion 27a of the central portion 19a. As described above, the light transmitting part 27a includes 15 unit areas.

Further, a light transmitting portion 27b similar to the light transmitting portion 27a is formed in the central portion 19b of the photomask 21b, and a light transmitting portion 28b similar to the light transmitting portion 28a is formed in the gray tone portion 20b. .

As described above, in the photomasks 21a and 21b, the majority of the light transmitting portions 28a and 28b are discretely dispersed in the scanning direction. Therefore, even if the first substrate 1 stops during scan exposure, the pattern of the light transmitting portions 28a and 28b transferred to the first substrate 1 (alignment film) can be blurred. As a result, as shown in FIG. 23, it is possible to prevent display unevenness due to the light transmitting portions 28a and 28b from being visually recognized not only in the exposure regions 22 and 23 but also in the joint portion 24.

From the viewpoint of more effectively eliminating the display unevenness, it is preferable to arrange the light transmitting portions 28a and 28b as follows (see FIG. 22). First, it is preferable to arrange the light transmissions 28a and 28b to be dispersed as much as possible in the scanning direction. Further, the pattern of the translucent portion 28a and the pattern of the light shielding portion in the gray tone portion 20a are inverted with respect to the center line of the gray tone portion 20a that is parallel to the scanning direction (joint portion center line). Thus, it is preferable to install the translucent portion 28a without bias. That is, it is preferable that the pattern of the translucent part 28a and the pattern of the light shielding part in the gray tone part 20a have a negative / positive or mirror image relationship with respect to the joint center line. The same can be said for the photomask 21b. Furthermore, it is preferable that the photomask 21b (gray tone portion 20b) is a photomask 21a (gray tone portion 20a) that is just negative / positive inverted. That is, it is preferable that the pattern of the light transmitting portion 28b of the photomask 21b and the pattern of the light shielding portion in the gray tone portion 20a of the photomask 21a match. In addition, the photomask 21a and the photomask 21b are arranged so that the joint centerlines of the two coincide with each other, and the pattern of the light transmitting portion 28b of the photomask 21a and the pattern of the light transmitting portion 28b of the photomask 21b are In addition, it is preferable to have a mirror image relationship with respect to the center line of both joints.

Further, the translucent portions 28a and 28b are smaller than the translucent portions 27a and 27b, respectively, and the aperture ratios of the gray tone portions 20a and 20b are smaller than the aperture ratios of the central portions 19a and 19b, respectively. Each pixel overlapping the gray tone portions 20a and 20b is exposed through the light transmitting portions 28a and 28b of the two photomasks 21a and 21b. Therefore, similarly to Patent Document 2, it is possible to suppress the seam from being visually recognized.

Further, the aperture ratios of the gray tone portions 20a and 20b are gradually decreased as the distance from the central portions 19a and 19b is increased. Therefore, it can suppress more effectively that a joint is visually recognized.

Further, since the same patterns as the photomasks 21a and 21b are formed on the photomasks 21c and 21d, these effects can also be exhibited in the photomasks 21c and 21d.

In addition, the central portions 19e and 19f of the photomasks 21e and 21f are formed with a light-transmitting portion similar to the light-transmitting portion 27a, and the gray- tone portions 20e and 20f of the photomasks 21e and 21f are provided with a light-transmitting portion 28a. Similar light-transmitting portions are formed. However, the width of the light transmitting portions of the photomasks 21e and 21f is approximately 1/4 of the pitch Py, and the pitch is approximately half of the pitch Py. Further, the same patterns as the photomasks 21e and 21f are formed on the photomasks 21g and 21h.

Therefore, even if the second substrate 2 is stopped during the scan exposure, the pattern of the light transmitting portions of the gray tone portions 20e and 20f transferred to the second substrate 2 (alignment film) can be blurred. As a result, not only the exposure areas 32 and 33 but also the joint portion 34 can prevent the display unevenness caused by the light transmitting portions of the gray tone portions 20e and 20f from being visually recognized.

Furthermore, as with the first substrate 1, it is possible to effectively suppress the seam from being visually recognized.

Hereinafter, the bonding process of the first substrate and the second substrate will be described. In the bonding step, a sealing material is applied around the first substrate or the second substrate manufactured as described above. Next, for example, 4 μm plastic beads are spread on a substrate coated with a sealing material, and then the first substrate and the second substrate are bonded together. At this time, the relationship between the light irradiation directions of the two substrates in one sub-pixel is as shown in FIG. 4, and the scanning directions are substantially orthogonal between the opposing substrates in each domain. Also, the joint portion 24 of the first substrate 1 and the joint portion 34 of the second substrate 2 are substantially orthogonal as shown in FIG.

Next, when, for example, the liquid crystal material is sealed between the first substrate and the second substrate, the liquid crystal molecules in each domain develop pretilt angles in different directions. As a result, the orientation direction of the liquid crystal molecules 3a near the center in the in-plane direction and the thickness direction of the liquid crystal layer of each domain is 45 from the direction irradiated with light when the substrate is viewed in plan, as shown in FIG. ° Inclined direction.

Next, two polarizing plates 6a and 6b are attached to the outside of the first substrate 1 and the second substrate 2 so that the polarization axes are oriented in the direction shown in FIG. When no voltage is applied, the liquid crystal molecules are substantially vertically aligned, so that the liquid crystal display panel of the present embodiment can realize a good black display (normally black mode). In addition, the liquid crystal display panel of this embodiment has four domains, and the liquid crystal molecules in the four domains respond to four different directions, so that display characteristics almost independent of the viewing angle direction can be exhibited.

Thereafter, the liquid crystal display device of Embodiment 1 can be completed through a general module manufacturing process.

In the present embodiment, the number of photomasks used simultaneously is not limited to two, and may be three or more. For example, as shown in FIG. 25, the scan exposure of the substrate 18 may be performed using six photomasks 21 arranged in a staggered pattern. Accordingly, since a smaller photomask can be used, the manufacturing cost of the photomask can be reduced. Further, since the mask size is small, it is possible to suppress the mask from being bent due to its own weight, so that the alignment process can be performed with higher accuracy. Furthermore, since the mask size is small, the pattern accuracy of the mask itself can be improved.

As described above, according to this embodiment, it is possible to suppress the occurrence of display unevenness, however, there is a concern in this embodiment. This point will be described by taking the photomask 21a as an example. The number of edges of the light transmitting portions in the central portion 19a and the gray tone portion 20a, which are orthogonal to the scanning direction, is as shown in FIG. 26, and is between the 9th to 11th light transmitting portions 28a. The number of edges is discontinuous.

According to Non-Patent Document 1, it is disclosed that even if the alignment film from the oblique direction is not exposed as in the present embodiment, the tilt angle appears even if the alignment film is exposed from the normal direction while scanning. . That is, the alignment ability may be imparted to the alignment film only by passing through the edge of the light transmitting part. Although this document is based on a horizontal alignment film, it is estimated that the same phenomenon occurs in a vertical alignment film. Therefore, when the gray tone portion 20a is provided as in the present embodiment and discontinuity occurs in the number of edges in the gray tone portion 20a, discontinuity occurs in the effective irradiation energy received by the alignment film. There is a concern that it is visually recognized as unevenness.

Therefore, Embodiment 2 created by the present inventors in order to eliminate this concern will be described.

(Embodiment 2)
In the present embodiment, the photomask 21a will be described as an example, but the photomasks 21b to 21g may have the same form. The second embodiment is different from the first embodiment in the following points. That is, as shown in FIG. 27, in both the central portion 19a and the gray tone portion 20a, a light shielding portion (hereinafter referred to as a bridge 29) is provided at the boundary between unit areas. Thereby, the translucent part 27a is discretely dispersed (divided) in the scanning direction. In FIG. 27, the edge of the light transmitting part newly generated by the installation of the bridge 29 (edge orthogonal to the scanning direction) is surrounded by an ellipse. There are actually two edges per ellipse. Further, the total of the edges included in the light-transmitting portions in the same row is shown below the photomask 21a. As described above, in the present embodiment, the number of edges continuously changes and gradually decreases from the central portion 19a toward the gray tone portion 20a.

Therefore, according to the present embodiment, it is possible to suppress the occurrence of unevenness due to the discontinuity of the number of edges.

Further, since the number of edges is increased as compared with the first embodiment, the tilt angle can be expressed more effectively. Therefore, it is possible to shorten the tact time by increasing the scanning speed. Alternatively, the illuminance of the light source can be reduced to extend the life of the light source.

Of course, even in the present embodiment, even if the first substrate 1 is stopped during the scan exposure, display unevenness caused by the light transmitting portion 28a is not visually recognized not only in the exposure regions 22 and 23 but also in the joint portion 24. Can be.

Note that the width (length in the short direction (scan direction)) α of the bridge 29 is preferably as thin as possible so that the bridge is not transferred to the alignment film even when the scan exposure is stopped. Specifically, the lower limit value of α is preferably 1 μm, which is the minimum value of the drawing line width of the mask, and the upper limit value is preferably about 20 μm. Since a gap (about 100 to 200 μm) exists between the substrate and the mask at the time of scan exposure, diffraction occurs in the light beam transmitted through the light transmitting portion. Therefore, the upper limit value is determined so that the intensity distribution on the alignment film of the light beam that has passed through the light transmitting portion is uniform. That is, the upper limit value is determined so that the image of the bridge 29 is sufficiently blurred on the alignment film. As shown in FIG. 28, the length Δy2 (μm) in the scanning direction of the unit area of the present embodiment is obtained by the following equation.
(N−1) × Δy2 + (N−2) × α = 40000

FIG. 29 shows a modification of the second embodiment.
In this modification, as shown in FIG. 29, the bridge 29 is formed only in the portion where the number of edges is discontinuous in the first embodiment. In other words, in the present modification, two bridges 29 are added only to the translucent portion 28a in the tenth row. Also by this, since the number of edges can be continuously changed from the central portion 19a to the gray tone portion 20a, it is possible to suppress the occurrence of unevenness due to the discontinuity of the number of edges.

(Embodiment 3)
In the present embodiment, the photomask 21a will be described as an example, but the photomasks 21b to 21g may have the same form. The third embodiment is different from the first and second embodiments in the following points. That is, as shown in FIG. 30, the photomask pattern of the third embodiment is not a mosaic pattern as in the first and second embodiments. It is assumed that the gray tone part 20a is provided so as to overlap with the pixels for N columns. The pixel located at the right end of the gray tone part 20a is the first pixel, and the pixel located at the left end of the gray tone part 20a is N columns. It is assumed that the pixel is an eye (refer to the number described above the gray tone portion 20a in FIG. 30). In addition, the light transmitting portion 28a is also ordered in the same manner as the pixels. That is, the light transmitting portion 28a that overlaps the pixels in the first column is the light transmitting portion in the first column, and the light transmitting portion 28a that overlaps the pixels in the Nth column is the light transmitting portion in the Nth column. Further, a straight line parallel to the scan direction is defined as a scan line. Then, the number of the light transmitting portions 28a in the same row is larger as the row is closer to the central portion 19a, and increases by one. Each translucent portion 28a includes one unit area, and among the translucent portions 28a in the third column or more, the translucent portions 28a in the same row, that is, the translucent portions 28a existing on the same scanning line. Are arranged at equal intervals in the scanning direction. In the gray tone portion 20a, the density of the light transmitting portion 28a changes sparsely as the distance from the central portion 19a increases.

According to the present embodiment, the translucent portions 28a in the same row are arranged at equal intervals in the scanning direction. Therefore, unlike the mosaic pattern shown in the first and second embodiments, the position of the light transmitting portion 28a is not biased. Therefore, it is possible to suppress the occurrence of display unevenness due to the uneven position of the light transmitting portion 28a.

In addition, since a bridge is provided in the light transmitting portion 27a of the central portion 19a, the number of edges orthogonal to the scanning direction continuously changes from the central portion 19a toward the gray tone portion 20a, and gradually decreases. Yes. Therefore, according to this embodiment, it is possible to suppress the occurrence of unevenness due to the discontinuity of the number of edges. In the present embodiment, the length Δy3 in the scanning direction of the unit area and the width α of the bridge 29 can be obtained in the same way as in the second embodiment as shown in FIG. Of course, in this embodiment, the bridge 29 may not be provided in the light transmitting portion 27a.

This application claims the priority based on the Paris Convention or the laws and regulations in the country of transition based on Japanese Patent Application No. 2010-13453 filed on January 25, 2010. The contents of the application are hereby incorporated by reference in their entirety.

1: first substrate 2: second substrate 3: liquid crystal layers 3a, 3b: liquid crystal molecules 4a, 4b: transparent electrodes 5a, 5b: vertical alignment films 6a, 6b: polarizing plates 7a, 7b: retardation plate 8: sub-pixel 9: Scanning signal line 10: Data signal line 11: TFT
12: Pixel electrode 13: Black matrix (BM)
14: Color filter 15: Light beam (polarized ultraviolet light)
16: Proximity gap 17: Pretilt angle 18: Substrate 19a to 19h: Center portion 20a to 20h: Gray tone portion 21, 21a to 21h: Photomask 22, 23, 32, 33: Exposure region 24, 34: Joint portion 25 : Light sources 26a, 26b: Insulating substrates 27a, 27b, 28a, 28b: Translucent part 29: Bridge 30: Image detection camera 100: Liquid crystal display device P, Q: Polarization axis direction A of polarizing plate, B: Direction R: Red colored layer G: Green colored layer B: Blue colored layer

Claims (28)

1. An exposure apparatus for exposing a photo-alignment film provided on a substrate,
   The exposure apparatus includes a light source and a photomask, and exposes the photo-alignment film through the photomask while scanning at least one of the light source and the substrate,
   When a direction in which at least one of the light source and the substrate is scanned is a scanning direction and a direction perpendicular to the scanning direction is a vertical direction,
   The photomask has a first region and a second region adjacent to the first region in the vertical direction,
   The first region has a plurality of first light transmitting parts in the first light shielding part,
   The plurality of first light transmission parts are arranged in a vertical direction,
   The second region has a plurality of second light transmitting parts in the second light shielding part,
   The plurality of second light transmission parts are smaller than the plurality of first light transmission parts,
   The exposure apparatus according to claim 1, wherein the plurality of second light transmitting portions are arranged in the vertical direction and are dispersed in the scanning direction.
2. 2. The exposure apparatus according to claim 1, wherein the aperture ratio of the second area decreases as the distance from the first area increases.
3. The plurality of second light-transmitting portions and the second light-shielding portion are provided symmetrically with respect to a center line of the second region parallel to the scanning direction. Exposure device.
4. The plurality of second light-transmitting portions and the second light-shielding portion are mirror images of each other with respect to a center line of the second region parallel to the scanning direction. The exposure apparatus according to any one of the above.
5. The photomask is a first photomask;
   The exposure apparatus further includes a second photomask, and exposes the photo-alignment film through the first and second photomasks while scanning at least one of the light source and the substrate,
   The second photomask has a third region and a fourth region adjacent to the third region in the vertical direction,
   The third region has a plurality of third light transmitting parts in a third light shielding part,
   The plurality of third light transmitting parts are arranged in a vertical direction,
   The fourth region has a plurality of fourth light transmitting parts in a fourth light shielding part,
   The plurality of fourth light transmissive portions are smaller than the plurality of third light transmissive portions,
   The plurality of fourth light transmission parts are arranged in the vertical direction and discretely dispersed in the scanning direction,
   The part of the photo-alignment film is exposed through the plurality of second light transmitting portions and exposed through the plurality of fourth light transmitting portions. Exposure equipment.
6. 6. The exposure apparatus according to claim 5, wherein the aperture ratio of the fourth area decreases with increasing distance from the third area.
7. The plurality of second light transmitting portions are provided corresponding to the fourth light shielding portions,
   The exposure apparatus according to claim 5, wherein the plurality of fourth light transmitting portions are provided corresponding to the second light shielding portions.
8. The first and second photomasks are arranged such that a center line of the second region parallel to the scanning direction coincides with a center line of the fourth region parallel to the scanning direction,
   The exposure according to any one of claims 5 to 7, wherein the plurality of second light transmitting portions and the plurality of fourth light transmitting portions are mirror images of each other with respect to the center lines. apparatus.
9. When a straight line parallel to the scanning direction is a scanning line,
   The exposure apparatus according to claim 1, wherein the plurality of second light transmitting portions existing on the same scanning line are arranged at substantially equal intervals.
10. The exposure apparatus according to any one of claims 1 to 9, wherein the plurality of first light transmitting parts are discretely dispersed in the scanning direction.
11. The exposure apparatus according to claim 10, wherein a region between the first light transmitting portions adjacent to each other in the scanning direction is shielded from light.
12. A method of manufacturing a liquid crystal display device comprising a photo-alignment film provided on a substrate,
    The manufacturing method includes an exposure step of exposing the photo-alignment film through a photomask while scanning at least one of a light source and the substrate,
    When a direction in which at least one of the light source and the substrate is scanned is a scanning direction and a direction perpendicular to the scanning direction is a vertical direction,
    The photomask has a first region and a second region adjacent to the first region in the vertical direction,
    The first region has a plurality of first light transmitting parts in the first light shielding part,
    The plurality of first light transmission parts are arranged in a vertical direction,
    The second region has a plurality of second light transmitting parts in the second light shielding part,
    The plurality of second light transmission parts are smaller than the plurality of first light transmission parts,
    The method for manufacturing a liquid crystal display device, wherein the plurality of second light transmitting portions are arranged in a vertical direction and are dispersed in a scanning direction.
13. The method of manufacturing a liquid crystal display device according to claim 12, wherein the aperture ratio of the second region decreases with increasing distance from the first region.
14. The plurality of second light-transmitting parts and the second light-shielding part are provided symmetrically with respect to a center line of the second region parallel to the scanning direction. A method for manufacturing a liquid crystal display device.
15. The plurality of second light-transmitting portions and the second light-shielding portion are mirror images of each other with respect to a center line of the second region parallel to the scanning direction. The manufacturing method of the liquid crystal display device in any one.
16. The photomask is a first photomask;
    The exposure step exposes the photo-alignment film through the first photomass and the second photomask while scanning at least one of the light source and the substrate,
    The second photomask has a third region and a fourth region adjacent to the third region in the vertical direction,
    The third region has a plurality of third light transmitting parts in a third light shielding part,
    The plurality of third light transmitting parts are arranged in a vertical direction,
    The fourth region has a plurality of fourth light transmitting parts in a fourth light shielding part,
    The plurality of fourth light transmissive portions are smaller than the plurality of third light transmissive portions,
    The plurality of fourth light transmission parts are arranged in the vertical direction and discretely dispersed in the scanning direction,
    The part of the photo-alignment film is exposed through the plurality of second light-transmitting portions and exposed through the plurality of fourth light-transmitting portions. Liquid crystal display device manufacturing method.
17. The method of manufacturing a liquid crystal display device according to claim 16, wherein the aperture ratio of the fourth region decreases with increasing distance from the third region.
18. The plurality of second light transmitting portions are provided corresponding to the fourth light shielding portions,
    18. The method of manufacturing a liquid crystal display device according to claim 16, wherein the plurality of fourth light transmission parts are provided corresponding to the second light shielding parts. 19.
19. The first and second photomasks are arranged such that a center line of the second region parallel to the scanning direction coincides with a center line of the fourth region parallel to the scanning direction,
    The liquid crystal according to any one of claims 16 to 18, wherein the plurality of second light-transmitting portions and the plurality of fourth light-transmitting portions are mirror images of each other with respect to the center lines. Manufacturing method of display device.
20. When a straight line parallel to the scanning direction is a scanning line,
    The method of manufacturing a liquid crystal display device according to claim 12 or 13, wherein the plurality of second light transmitting portions existing on the same scanning line are arranged at substantially equal intervals.
21. The method for manufacturing a liquid crystal display device according to any one of claims 12 to 20, wherein the plurality of first light-transmitting portions are discretely dispersed in the scanning direction.
22. The method for manufacturing a liquid crystal display device according to claim 21, wherein a region between the first light-transmitting portions adjacent to each other in the scanning direction is shielded from light.
23. 13. The photo-alignment film is exposed in the exposure step so as to form in each pixel two regions that are exposed in antiparallel directions when the substrate is viewed in plan. 23. A method of manufacturing a liquid crystal display device according to any one of items 1 to 22.
24. A liquid crystal display device produced by the method for producing a liquid crystal display device according to any one of claims 12 to 23.
25. The liquid crystal display device includes a vertical alignment type liquid crystal layer,
    The liquid crystal display device according to claim 24, wherein the liquid crystal layer contains a liquid crystal material having a negative dielectric anisotropy.
26. The liquid crystal display device includes a horizontal alignment type liquid crystal layer,
    The liquid crystal display device according to claim 24, wherein the liquid crystal layer contains a liquid crystal material having a positive dielectric anisotropy.
27. 27. The liquid crystal display device according to claim 25, wherein the liquid crystal layer contains twisted nematic liquid crystal.
28. The liquid crystal display device according to any one of claims 24 to 27, wherein the liquid crystal display device has two or more domains.

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