WO2011077977A1

WO2011077977A1 - Substrate processing device and substrate processing method

Info

Publication number: WO2011077977A1
Application number: PCT/JP2010/072269
Authority: WO
Inventors: 昌彦沖
Original assignee: シャープ株式会社
Priority date: 2009-12-21
Filing date: 2010-12-10
Publication date: 2011-06-30
Also published as: CN102656509A; CN102656509B

Abstract

Provided is a substrate processing device in which movement of floating mist between processing tanks is suppressed. A substrate processing device (100) for processing a substrate (20) is provided with: a first processing tank (10A) which includes a conveying roller (32) that can convey the substrate (20); and a second processing tank (10B) which is linked to the first processing tank (10A). The conveying roller (32) extends to and is present in the second processing tank (10B), a pair of liquid-removing curtain devices (15A, 15B) are disposed in a boundary region (60) between the first processing tank (10A) and the second processing tank (10B), and at least one of the conveying rollers (30) disposed between the pair of liquid-removing curtain devices (15A, 15B) has air blow holes (35) formed at both ends (36) of a conveying shaft (34).

Description

Substrate processing apparatus and substrate processing method

The present invention relates to a substrate processing apparatus and a substrate processing method. In particular, the present invention relates to an apparatus for cleaning a substrate such as mother glass for a liquid crystal panel.
Note that this application claims priority based on Japanese Patent Application No. 2009-289241 filed on Dec. 21, 2009, the entire contents of which are incorporated herein by reference. .

A liquid crystal panel, which is a component of a liquid crystal display device (LCD), has a structure in which a pair of glass substrates are opposed to each other with a predetermined gap secured. With the increase in size and mass production of liquid crystal panels, the glass substrates (mother glass) for liquid crystal panels have been increasing year by year, and the liquid crystal panel production line is used to transport such large glass substrates. A substrate transfer device is provided in the factory.

In recent years, a processing apparatus that performs processing on a glass substrate for a liquid crystal panel often performs various types of processing while conveying the substrate from the viewpoint of efficiency (for example, Patent Document 1). Moreover, the apparatus which wash | cleans it, conveying a glass substrate is also disclosed by patent document 2, for example.

FIG. 1 is a diagram showing a configuration of a substrate processing apparatus 1000 disclosed in Patent Document 1. As shown in FIG. The substrate processing apparatus 1000 shown in FIG. 1 includes a substrate introduction unit 120, a substrate processing unit 130, and a substrate derivation unit 140 in series.

First, in the substrate introduction part 120, an upstream side device 110 and an upstream side crack detection device 111 are arranged. The upstream apparatus 110 continues to place the substrate 200 on the substrate introduction unit 120, and then the substrate 200 is conveyed by the roller conveyor 150.

Next, the substrate processing unit 130 includes a chemical washing unit 130A, a water washing unit 130B, and a drying unit 130C. The chemical washing section 130A is provided with a chemical supply nozzle 121 and a brush 122 for brushing processing. The washing unit 130B is divided into a low-pressure water supply unit 124, a high-pressure water supply unit 125, an ultrasonic cleaning water supply unit 126, and a pure water supply unit 127. In each of the supply units 124 to 127, cleaning water supply nozzles 124 a to 127 a are disposed on both the upper and lower sides of the conveyor 150. The drying unit 130C performs a drying process on the substrate 200 derived from the water washing unit 130B. Inside the drying unit 130C, a pair of upper and lower air knives 128 are arranged so as to sandwich the conveyor 150 therebetween.

Also, the substrate lead-out unit 140 is provided with a downstream device 114 and a downstream crack detection device 115. The downstream side device 114 leads the substrate 200 downstream.

Here, after the substrate 200 is introduced to the conveyance start position P1, it is conveyed by the conveyor 150, and then moves to the substrate stop position P2. Then, the substrate processing unit 130 in the substrate processing apparatus 1000 can clean and dry the substrate 200 while transporting it.

JP 2007-225324 A JP-A-3-29919

The inventor of the present application has found that there are the following problems when actually using a substrate processing apparatus (for example, the substrate processing apparatus 1000 shown in FIG. 1).

FIG. 2 is a schematic cross-sectional view showing a part of the substrate processing apparatus 2000 verified by the present inventors. The substrate processing apparatus 2000 shown in FIG. 2 includes a substrate processing unit 230 including a first processing tank 230A, a second processing tank 230B, and a third processing tank 230C. A conveyor 250 that conveys the substrate 200 is disposed in the first processing tank 230A, the second processing tank 230B, and the third processing tank 230C. The first processing tank 230A, the second processing tank 230B, and the third processing tank 230C each have a box-like structure, and an opening 290 for moving the substrate 200 between the processing tanks. (290A, 290B) are provided.

In the example shown in FIG. 2, the second treatment tank 230B is a wet-type cleaning treatment tank (eg, a water washing tank), and the third treatment tank 230C is a dry-type washing treatment tank (eg, a drying tank). . A nozzle 210 for cleaning water is disposed in the second treatment tank 230B. An air shower 212 is arranged in the third treatment tank 230C. In this example, the first treatment tank 230A is a wet-type washing treatment tank (for example, a chemical solution washing tank). Further, exhaust ducts 240 are provided in the first treatment tanks 230A to 230C.

In the configuration of the substrate processing apparatus 2000, liquid droplets in the wet type processing tank 230B do not go to the dry type processing tank 230C. Specifically, the processing tank 230B and the processing tank 230C are each provided with a duct, and liquid droplets (floating mist) in the wet type processing tank 230B are sucked. In addition, an air knife 215 that blows out air and creates an air wall is disposed in the processing tank 230B and the processing tank 230C so that liquid droplets in the wet-type processing tank 230B do not move. The air knife 215 is a liquid cutting curtain device, and the substrate 200 can be moved in the opening 290B by the wall of air blown from the air knife 215, and the splash of the liquid is blocked.

However, according to the observation of the present inventor, it was actually found that an airflow 300 flowing from the wet type processing tank 230B to the dry type processing tank 230C is generated despite the presence of the air knife 215. The droplets 310 of the liquid riding on the airflow 300 may move from the processing bath 230B to the processing bath 230C and adhere to the substrate 200 located in the processing bath 230C. It is not preferable that a foreign substance (here, splash) 310 adheres to the substrate 200 after cleaning because it may cause a defect in the manufacturing process of the next process.

The inventor of the present application estimated the cause of the generation of the airflow 300, and reached the following conclusion. FIG. 3 is a perspective view showing the periphery of the air knife 215. 4 and 5 are top views showing the periphery of the air knife 215. FIG.

As shown in FIG. 3, the width W2 of the air knife 215 extends to cover the width W1 of the substrate 200. However, as can be seen from FIG. 4, there is a gap S between the end 215e of the air knife 215 and the wall surface 230e of the processing bath 230B (or processing bath 230C). Then, as shown in FIG. 5, even when the width W of the opening 290B is the same as or narrower than the width W2 of the air knife 215, an air flow 300 passing through the gap S and the opening 290B is generated while avoiding the air knife 215. Can do. When liquid droplets get on such an air flow 300, the treatment tank 230C may adhere to the substrate 200.

The present invention has been made in view of such a point, and a main object thereof is to provide a substrate processing apparatus in which movement of liquid droplets (floating mist) between processing tanks is suppressed.

A substrate processing apparatus according to the present invention is a substrate processing apparatus for processing a substrate, and includes a first processing tank including a transport roller capable of transporting a substrate, and a second processing tank connected to the first processing tank. The transport roller from the first processing tank extends in the second processing tank, and a boundary region between the first processing tank and the second processing tank includes a pair of liquids. A cutting curtain device is arranged, and at least one of the conveying rollers arranged between the pair of liquid cutting curtain devices has air blow holes at both ends of a conveying shaft constituting a central portion of the conveying roller. Is a conveyance roller formed.
In a preferred embodiment, the first processing tank is a wet-type processing tank, and the second processing tank is a dry-type processing tank.
In a preferred embodiment, the width of the transport shaft is larger than the width of the liquid draining curtain device, and a portion of the both ends of the transport shaft located outside the liquid draining curtain device is The air blow hole is formed.
In a preferred embodiment, the transport shaft has a hollow structure, and a gas to be ejected from the air blow hole is introduced into the transport shaft.
In a preferred embodiment, each of the pair of liquid curtain devices is composed of an upper curtain portion and a lower curtain portion.
In a preferred embodiment, the substrate is a mother glass for a liquid crystal panel.
A substrate processing method according to the present invention is a substrate processing method for processing a substrate. The step (a) of loading a substrate into a first processing tank by a transport roller, and the substrate is moved by the transport roller while moving the substrate. A first processing step (b) for processing the substrate in one processing tank, and a step of carrying the substrate from the first processing tank into a second processing tank connected to the first processing tank by the transport roller ( c) and a second processing step (d) of processing the substrate in the second processing tank while moving the substrate by the transport roller, and the first processing tank and the second processing tank In the boundary region, a pair of liquid curtain devices emits gas to block the movement of floating mist between the first treatment tank and the second treatment tank. Placed between At least one of the transport rollers blocks the movement of the floating mist that goes around the outside of the pair of liquid draining curtain devices by discharging gas from both ends of the transport shaft that constitutes the center of the transport roller. ing.
In a preferred embodiment, a wet type substrate cleaning process is executed in the first processing step (b), and a dry type substrate cleaning process is executed in the second processing step (d).
In a preferred embodiment, the substrate is a mother glass for a liquid crystal panel.
The conveyance roller according to the present invention is a conveyance roller for conveying a substrate, and includes a conveyance shaft and a substrate contact portion that is provided on an outer surface of the conveyance shaft and contacts the substrate, and the conveyance shaft has a hollow structure. Air blow holes for ejecting gas are formed at both ends of the transport shaft.

In the substrate processing apparatus of the present invention, a pair of liquid-cutting curtain devices are disposed in a boundary region between the first processing tank and the second processing tank, and a transport roller is disposed between the pair of liquid-cutting curtain devices. At least one of them is a transport roller having air blow holes formed at both ends of the transport shaft. Therefore, the movement of the liquid splash (floating mist) which goes around to both ends of the transport shaft can be suppressed by the air blown out from the air blow holes formed at both ends of the transport shaft.

It is a figure which shows the structure of the conventional substrate processing apparatus 1000. FIG. 2 is a cross-sectional view showing a configuration of a substrate processing apparatus 2000. FIG. 3 is a perspective view showing a configuration around an air knife 215. FIG. 4 is a top view showing a configuration around an air knife 215. FIG. 4 is a top view showing a configuration around an air knife 215. FIG. It is sectional drawing which shows the structure of the substrate processing apparatus 100 which concerns on embodiment of this invention. It is a top view which shows the structure of the conveyance roller 30 and the air knife 15 which concern on embodiment of this invention. It is a perspective view which shows the structure of the conveyance roller 30 which concerns on embodiment of this invention. It is sectional drawing which shows the modification of the substrate processing apparatus 100 which concerns on embodiment of this invention.

Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the following drawings, components having substantially the same function are denoted by the same reference numerals for the sake of brevity. In addition, this invention is not limited to the following embodiment.

FIG. 6 schematically shows the configuration of the substrate processing apparatus 100 according to the embodiment of the present invention. The substrate processing apparatus 100 of this embodiment is an apparatus for processing the substrate 20, and is connected to the first processing tank 10A including a transfer roller 32 (32a) capable of transferring the substrate 20 and the first processing tank 10A. And a second treatment tank 10B. The substrate 20 of this embodiment is, for example, a substrate for a liquid crystal panel, a substrate for a PDP (plasma display panel), or the like. The substrate 20 in the example shown in FIG. 6 is a mother glass for a liquid crystal panel (for example, an 8th generation to 10th generation mother glass).

The second treatment tank 10B is provided with a conveyance roller 32 (32b), and this conveyance roller 32 (32b) is an extension of the conveyance roller 32 (32a) of the first treatment tank 10A. Each of the first processing tank 10A and the second processing tank 10B in the present embodiment has a box shape. The first treatment tank 10A has an opening 11A on the second treatment tank 10B side, while the second treatment tank 10B has an opening 11B on the first treatment tank 10A side. The

openings

11A and 11B have a shape that allows the substrate 20 to pass through, and a substrate conveyor 33 including transport rollers 32 is provided through the first processing tank 10A and the second processing tank 10B. The transport roller 32 can rotate as indicated by an arrow 55, and the substrate 20 moves on the transport roller 32 from the first processing tank 10A to the second processing tank 10B along the rotation (arrow 50). . An opening 13A is provided on the upstream side of the first processing tank 10A, and an opening 13B is provided on the downstream side of the second processing tank 10B. The substrate conveyor 33 including the transport rollers 32 extends both to the upstream side of the first processing tank 10A and to the downstream side of the second processing tank 10B.

The first treatment tank 10A of the present embodiment is a wet-type treatment tank, and the second treatment tank 10B is a dry-type treatment tank. In the example shown in FIG. 6, wet-type substrate cleaning processing can be executed in the first processing tank 10A, while dry-type substrate cleaning processing can be executed in the second processing tank 10B. In the first treatment tank 10 A, the cleaning liquid nozzles 12 are arranged both above and below the transport roller 32. Although not shown, a cleaning brush may be disposed in the first treatment tank 10A. When the first processing tank 10A is a chemical cleaning tank, chemical liquid is ejected from the cleaning liquid nozzle 12, and when the first processing tank 10A is a water cleaning tank, water (for example, low pressure) is supplied from the cleaning liquid nozzle 12. Water, high-pressure water, ultrasonic cleaning water, pure water, etc.) are jetted. Moreover, the air shower 14 is arrange | positioned at the 2nd processing tank 10B. From the air shower 14, for example, dry air is jetted. Moreover, the duct 40 is provided in the 1st processing tank 10A and the 2nd processing tank 10B, and the air in each processing tank can be sucked out.

Also, a pair of

liquid curtain devices

15A and 15B are disposed in the boundary region 60 between the first treatment tank 10A and the second treatment tank 10B. The liquid curtain device 15 (15A, 15B) is an air knife that blows out air to create an air wall. The movement of the floating mist can be blocked by discharging gas (air) from the liquid draining curtain (air knife) 15. Specifically, the liquid splash (floating mist) generated in the first treatment tank 10A enters the second treatment tank 10B through the

openings

11A and 11B existing in the boundary region 60. However, the liquid curtain 15 (15A, 15B) prevents the floating mist from entering. In the configuration example shown in FIG. 6, the liquid draining curtain device 15 A of the first processing tank 10 A includes an upper curtain portion and a lower curtain portion with the conveyance roller 32 interposed therebetween. Similarly, the liquid curtain device 15B of the second treatment tank 10B is also composed of an upper curtain portion and a lower curtain portion with the conveyance roller 32 interposed therebetween.

In the configuration of the present embodiment, among the transport rollers 32 constituting the substrate conveyor 33, the air 19 can be ejected from both ends of the transport rollers 30 disposed between the pair of

liquid curtain devices

15A and 15B. ing. That is, at least one of the transport rollers 30 (30a, 30b) disposed between the pair of

liquid curtain devices

15A and 15B has air blow holes at both ends of the transport shaft constituting the central portion of the transport roller. It is the formed conveyance roller 30, and the air 19 is injected from the air blow hole. In the example shown in FIG. 6, the conveyance roller 30a provided with the air blow hole is arranged in the first treatment tank 10A, and the conveyance roller 30b provided with the air blow hole is arranged also in the second treatment tank 10B. .

FIG. 7 is a top view showing the periphery of the transport roller 30 (30b) in the second treatment tank 10B. The conveyance roller 30 b of the present embodiment includes a substrate contact portion (disk portion) 31 that contacts the substrate 20 and a conveyance shaft 34 that extends through the center of the substrate contact portion 31. The substrate contact portion 31 is provided on the outer surface of the transport shaft 34, but the substrate contact portion 31 and the transport shaft 34 may be integrated. Further, the transport shaft 34 has a hollow shape (cylindrical shape), and air blow holes 35 are formed at both ends 36 of the transport shaft 34. In the configuration of the present embodiment, the width W3 of the transport shaft 34 is larger than the width W2 of the liquid curtain device 15 (15B). An air blow hole 35 is formed in a part (a part located in the region 65) of the both ends 36 of the transport shaft 34 located outside the liquid curtain device 15 (15 B).

FIG. 8 is an enlarged perspective view showing the periphery of both end portions 36 of the transport roller 30. Since the conveying shaft 34 of the conveying roller 30 has a hollow structure, when air is introduced into the conveying shaft 34, the air 19 can be ejected from the air blow hole 35. In order to introduce air into the conveying shaft 34, an air introducing tube 38 may be connected to the end of the conveying shaft 34 and air may be introduced from the tube 38. The air introduced from the tube 38 is, for example, dry air, but other gases (for example, nitrogen, argon, etc.) may be used. From the viewpoint of the production line, the same gas (for example, dry air) used for the liquid curtain device 15B (and / or the air shower 14) used in the second treatment tank 10B is introduced from the tube 38 to the transport roller 30. It is efficient to do.

In the substrate processing apparatus 100 of the present embodiment, as shown in FIG. 7, a pair of liquid curtain devices 15 A and 15 B are disposed in a boundary region 60 between the first processing tank 10 A and the second processing tank 10 B. . At least one of the transport rollers arranged between the pair of

liquid curtain devices

15A and 15B is a transport roller 30 (30a and / or 30b) in which an air blow hole 35 is formed. Therefore, the floating mist 92 generated in the first treatment tank 10A rides on the airflow 90, passes around the outside of the liquid cutting curtain device 15A, passes through the

openings

11A and 11B, and then the liquid cutting curtain device. Even if it tries to go around the outside of 15 B, the movement of the floating mist 92 can be suppressed by the air 19 from the air blow hole 35. That is, the movement (arrow 90) of the floating mist 92 that wraps around the both end portions 36 of the transport shaft 34 can be suppressed by the air 19 ejected from the air blow hole 35.

According to the configuration of the present embodiment, the floating mist 92 from the first treatment tank 10A to the second treatment tank 10B is caused by the air wall 17 from the liquid

draining curtain devices

15A and 15B and the air blow 19 from the air blow hole 35. Movement can be suppressed. As a result, it is possible to suppress the floating mist (that is, foreign matter) 92 from adhering to the substrate 20 existing in the second processing tank, and thus it is possible to reduce the cause of defects in the manufacturing process of the next process. .

The dimensions of the configuration of the present embodiment will be described as an example as follows. The width W2 of the liquid curtain device 15 (15A, 15B) is 250 to 3230 mm, for example, and the width W3 of the transport shaft 34 is 300 to 3500 mm, for example. The diameter of the conveying shaft 34 is, for example, 25 to 50 mm. The diameter (in the case of a circle) of the air blow hole 35 formed in the transport shaft 34 is, for example, 0.1 to 2.0 mm. The air blow hole 35 may be formed only in the upper region and the lower region of the conveyance shaft 34 in addition to the case where the air blow hole 35 is formed on the entire outer periphery of the conveyance shaft 34.

In the example shown in FIG. 7, the description has been made with the configuration in which the conveyance roller 30b with the air blow hole 35 is provided on the second processing tank 10B side, but the air blow hole 35 is also provided on the first processing tank 10A side. When the attached conveyance roller 30a is provided, the effect of suppressing the movement of the floating mist 92 can be enhanced. Moreover, in this embodiment, although the conveyance roller 30 (30a, 30b) with the air blow hole 35 is arrange | positioned between a pair of liquid

cutting curtain apparatus

15A, 15B, a pair of liquid

cutting curtain apparatus

15A, 15B is arranged. You may arrange | position the conveyance roller 30 with the air blow hole 35 in area | regions (namely, upstream of curtain apparatus 15A, or downstream of curtain apparatus 15B) other than between. In addition, air blow holes 35 are formed in both end portions 36 of the transport shaft 34 in the transport roller 30 of the present embodiment. However, air blow holes 35 are formed in portions other than both end portions 36 (for example, the central portion). Thus, the air blow 19 can be generated.

Further, in the substrate processing method of the present embodiment, first, after the substrate 20 is carried into the first processing tank 10A by the transport roller 32, the substrate 20 is moved by the transport roller 32 while the substrate 20 is moved by the first processing tank 10A. To process. Next, after the substrate 20 is carried into the second processing tank 10B by the transport roller 32, the substrate 20 is processed in the second processing tank 10B while the substrate 20 is moved by the transport roller 32. In the above-described embodiment, the cleaning process by the wet process is performed in the first processing tank 10A, and the drying process by the dry process is performed in the second processing tank 10B. Is also possible. Specifically, after the dry treatment is performed in the first treatment tank 10A, the wet treatment can be performed in the second treatment tank 10B, and in this case, the first treatment tank 10A flows into the first treatment tank 10A. The movement of the floating mist 92 can be suppressed by the mechanism (15A, 15B, 30) of the present embodiment.

In addition, the substrate processing of the present embodiment can be applied not only to the cleaning and drying process of the substrate 20 but also to other processing. For example, the present invention can be applied to a coating process and a drying process of the substrate 20. Furthermore, even when the first treatment tank 10A is a wet process and the second treatment tank 10B is a wet process, the floating mist 92 of a liquid (for example, a chemical solution) used in the first treatment tank 10A is second. If the manufacturing process is hindered by flowing into the treatment tank 10B, the mechanism of this embodiment can be applied. Even if the first treatment tank 10A is a dry treatment and the second treatment tank 10B is a dry treatment, suspended matters (for example, suspended particles) used in the first treatment tank 10A are the second treatment tank. Even when it is desired to suppress the flow into 10B, the mechanism of this embodiment can be used.

FIG. 9 is a cross-sectional view showing a modified example of the substrate processing apparatus 100 of the present embodiment. In the substrate processing apparatus 100 shown in FIG. 9, dry processing is performed in the first processing tank 10A, and wet processing is performed in the second processing tank 10B. Specifically, the heater 45 for heating the substrate 20 is disposed in the first processing tank 10A, and the first process is performed before the wet process (for example, the cleaning process) is performed in the second processing tank 10B. A heating process (preliminary process for the next process) of the substrate 20 is performed in the tank 10A.

In the configuration shown in FIG. 9, when floating mist flows from the second processing tank 10 B into the first processing tank 10 A and adheres to the substrate 20 in the first processing tank 10 A, the floating mist is dried and stained on the substrate 20. There is a possibility. If the stain cannot be removed by the cleaning process in the second processing tank 10B, there is a possibility that it will develop into a cause of defects in a later manufacturing process. Here, since the pair of

liquid curtain devices

15A and 15B and the transport roller 30 (30a and 30b) with the air blow holes 35 are provided, the effect of suppressing such movement of the floating mist can be achieved. Obtainable.

As mentioned above, although this invention has been demonstrated by suitable embodiment, such description is not a limitation matter and, of course, various modifications are possible.

According to the present invention, it is possible to provide a substrate processing apparatus that suppresses the movement of floating mist between processing tanks.

DESCRIPTION OF SYMBOLS 10A 1st processing tank 10B 2nd processing tank

11A Opening part

11B Opening part 12 Nozzle

13A Opening part

13B Opening part 14 Air shower 15 Liquid cutting curtain apparatus (air knife)
17 Air (Air wall)
19 Air (Air blow)
20 Substrate 30 Conveying Roller 31 Substrate Contacting Section 32 Conveying Roller 33 Substrate Conveyor 34 Conveying Shaft 35 Air Blow Hole 36 Both Ends of Conveying Shaft 38 Air Introducing Tube 40 Duct 45 Heater 90 Air Flow 92 Floating Mist 100 Substrate Processing Device 121 Chemical Solution Supply Nozzle 122 Brush 124 Low-pressure water supply unit 124a to 127a Nozzle 125 High-pressure water supply unit 126 Ultrasonic cleaning water supply unit 127 Pure water supply unit 128 Air knife 130 Substrate processing unit 130A Chemical cleaning unit 130B Water-washing unit 130C Drying unit 200 Substrate 1000 Substrate processing apparatus 2000 Substrate processing equipment

Claims

A substrate processing apparatus for processing a substrate,
A first processing tank including a transfer roller capable of transferring a substrate;
A second treatment tank connected to the first treatment tank,
In the second processing tank, the conveying roller from the first processing tank is extended and exists,
In a boundary region between the first treatment tank and the second treatment tank, a pair of liquid draining curtain devices are disposed,
At least one of the transport rollers disposed between the pair of liquid curtain devices is a transport roller in which air blow holes are formed at both ends of a transport shaft constituting a central portion of the transport roller. Substrate processing equipment.
The first treatment tank is a wet-type treatment tank, and
The substrate processing apparatus according to claim 1, wherein the second processing tank is a dry processing tank.
The width of the transport shaft is larger than the width of the liquid curtain device,
3. The substrate processing apparatus according to claim 1, wherein the air blow hole is formed in a portion of the both ends of the transport shaft located outside the liquid curtain device.
The transport shaft has a hollow structure,
4. The substrate processing apparatus according to claim 1, wherein a gas to be ejected from the air blow hole is introduced into the conveyance shaft.
The substrate processing apparatus according to any one of claims 1 to 4, wherein each of the pair of liquid curtain devices includes an upper curtain portion and a lower curtain portion.
The substrate processing apparatus according to any one of claims 1 to 5, wherein the substrate is a mother glass for a liquid crystal panel.
A substrate processing method for processing a substrate, comprising:
A step (a) of carrying the substrate into the first processing tank by the transport roller;
A first processing step (b) for processing the substrate in the first processing tank while moving the substrate by the transport roller;
(C) carrying the substrate from the first processing tank into the second processing tank connected to the first processing tank by the transport roller;
A second processing step (d) of processing the substrate in the second processing tank while moving the substrate by the transport roller, and
In a boundary region between the first treatment tank and the second treatment tank, a pair of liquid curtain devices emits gas, thereby moving the floating mist between the first treatment tank and the second treatment tank. Shut off,
In at least one of the transport rollers disposed between the pair of liquid cutting curtain devices, the pair of liquids is generated by discharging gas from both ends of the transport shaft constituting the central portion of the transport roller. A substrate processing method that blocks the movement of floating mist that wraps around the outside of a cut curtain device.
In the first processing step (b), a wet type substrate cleaning process is executed, and
The substrate processing method according to claim 7, wherein in the second processing step (d), a dry-type substrate cleaning process is performed.
The substrate processing method according to claim 7 or 8, wherein the substrate is a mother glass for a liquid crystal panel.
A transport roller for transporting a substrate,
A conveying shaft;
A substrate contact portion provided on the outer surface of the transport shaft and in contact with the substrate;
The transport shaft has a hollow structure,
The conveyance roller in which the air blow hole for ejecting gas is formed in the both ends of the said conveyance shaft.