WO2011074381A1 - Conveyance device for film substrate - Google Patents

Conveyance device for film substrate Download PDF

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Publication number
WO2011074381A1
WO2011074381A1 PCT/JP2010/070787 JP2010070787W WO2011074381A1 WO 2011074381 A1 WO2011074381 A1 WO 2011074381A1 JP 2010070787 W JP2010070787 W JP 2010070787W WO 2011074381 A1 WO2011074381 A1 WO 2011074381A1
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WO
WIPO (PCT)
Prior art keywords
substrate
film substrate
grip
grip roller
angle
Prior art date
Application number
PCT/JP2010/070787
Other languages
French (fr)
Japanese (ja)
Inventor
正紀 西澤
横山 勝治
隆典 山田
Original Assignee
富士電機ホールディングス株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 富士電機ホールディングス株式会社 filed Critical 富士電機ホールディングス株式会社
Priority to EP10837410.9A priority Critical patent/EP2514852A4/en
Priority to US13/512,213 priority patent/US20130043294A1/en
Priority to CN201080053146.2A priority patent/CN102770579A/en
Publication of WO2011074381A1 publication Critical patent/WO2011074381A1/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65HHANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H23/00Registering, tensioning, smoothing or guiding webs
    • B65H23/02Registering, tensioning, smoothing or guiding webs transversely
    • B65H23/032Controlling transverse register of web
    • B65H23/0324Controlling transverse register of web by acting on lateral regions of the web
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65HHANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H23/00Registering, tensioning, smoothing or guiding webs
    • B65H23/02Registering, tensioning, smoothing or guiding webs transversely
    • B65H23/032Controlling transverse register of web
    • B65H23/038Controlling transverse register of web by rollers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65HHANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H9/00Registering, e.g. orientating, articles; Devices therefor
    • B65H9/16Inclined tape, roller, or like article-forwarding side registers
    • B65H9/166Roller
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65HHANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2301/00Handling processes for sheets or webs
    • B65H2301/30Orientation, displacement, position of the handled material
    • B65H2301/32Orientation of handled material
    • B65H2301/323Hanging
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65HHANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2403/00Power transmission; Driving means
    • B65H2403/90Machine drive
    • B65H2403/94Other features of machine drive
    • B65H2403/942Bidirectional powered handling device
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65HHANDLING THIN OR FILAMENTARY MATERIAL, e.g. SHEETS, WEBS, CABLES
    • B65H2404/00Parts for transporting or guiding the handled material
    • B65H2404/10Rollers
    • B65H2404/14Roller pairs
    • B65H2404/142Roller pairs arranged on movable frame
    • B65H2404/1421Roller pairs arranged on movable frame rotating, pivoting or oscillating around an axis, e.g. parallel to the roller axis
    • B65H2404/14212Roller pairs arranged on movable frame rotating, pivoting or oscillating around an axis, e.g. parallel to the roller axis rotating, pivoting or oscillating around an axis perpendicular to the roller axis

Definitions

  • the present invention relates to a film substrate transport apparatus in which a film substrate (hereinafter, referred to as a “substrate”) is disposed and transported in a vertical posture with one end upper side in the width direction.
  • a film substrate hereinafter, referred to as a “substrate”
  • production apparatus An apparatus for producing a thin film laminate (hereinafter, referred to as "production apparatus") is used to form a photoelectric conversion layer or the like including a thin film photoelectric conversion element on the surface of a substrate.
  • This manufacturing apparatus is configured such that the substrate is formed in an airtight state in the film forming chamber, and the substrate taken up by the unwinding core is further transferred to the film forming chamber in order to transport the substrate into the film forming chamber. After being sent out to pass through to the inside of the film forming chamber, they are wound up by the winding core.
  • the vertical direction is to arrange and transfer the substrate in the vertical posture with one end in the width direction
  • a lay transport method is adopted.
  • the transport apparatus of this vertical transport system is excellent in that contamination of the substrate is prevented by the difficulty in depositing particles on the substrate surface, and the space of the manufacturing apparatus can be reduced by vertically placing the substrate. There is.
  • the substrate since the substrate is mainly pulled and held between the unwinding core and the winding core, the substrate tends to sag downward by its own weight, and may also meander in the width direction.
  • a structure in which a grip roller for adjusting the position of the substrate in the width direction is provided.
  • a plurality of paired grip rollers are provided to sandwich the upper end portion and the lower end portion of the substrate, and the grip roller on the upper end portion side is the upper side with respect to the substrate feeding direction.
  • the grip roller on the lower end side is disposed to be inclined downward with respect to the forward feeding direction of the substrate.
  • an elastic body is provided on the outer peripheral surface of the grip roller for protecting the substrate and the like.
  • the gripping force acting between the gripping roller and the substrate is reduced, and a sufficient lifting force for the substrate can not be obtained. Therefore, in Patent Document 1, in response to the deterioration of the elastic body, the gripping force is increased by increasing the force with which the pair of gripping rollers sandwiches the substrate (hereinafter referred to as "substrate gripping force").
  • the grip roller on the upper end portion side is disposed to be inclined only upward with respect to the forward feeding direction of the substrate, and the grip roller on the lower end portion side is downwardly directed to the forward feeding direction of the substrate.
  • the side is only tilted towards the side. Therefore, when the substrates are transported in both the forward feed direction and the reverse feed direction, these grip rollers can adjust the substrate transported in the forward feed direction with high accuracy, but the substrates transported in the reverse feed direction are high. It is difficult to adjust the position with accuracy.
  • Patent Document 1 when the substrate gripping force of the grip roller whose outer peripheral surface is an elastic body is increased, the elastic body on the outer peripheral surface is crushed, and the cross sectional shape of the outer peripheral surface changes into an elliptical shape, There is a possibility that the diameter of the grip roller may change. In such a case, it is difficult to move the substrate to a desired position because a desired gripping force can not be obtained and a sufficient force for lifting the substrate can not be obtained. Thus, the accuracy of the position adjustment of the substrate is reduced.
  • the present invention has been made in view of such circumstances, and its object is to provide a film substrate capable of adjusting the position of each of the substrates transported in both the forward feed direction and the reverse feed direction with high accuracy. It is in providing a conveying apparatus.
  • the film substrate transport apparatus of the present invention is a film substrate transport apparatus which arranges and transports a strip-shaped film substrate in a vertical posture with one end on the upper side in the width direction, At least a pair of first grip rollers disposed so as to sandwich the upper end portion of the film substrate, and the rotation shaft angle of the first grip roller makes the rotation direction of the first grip roller upward with respect to the transport direction
  • a first angle adjustment mechanism is provided to adjust the inclination direction and the inclination angle of the first grip roller so that it can be inclined to the side.
  • a second angle adjusting mechanism capable of adjusting the inclination direction and the inclination angle of the second grip roller so that the rotation direction of the roller can be inclined downward with respect to the transport direction.
  • the film substrate transport apparatus further includes detection means for detecting the height position of the width direction end of the film substrate, and the first grip is detected when the detection means detects positional deviation of the film substrate.
  • the roller and / or the second grip roller is controlled by the first angle adjusting mechanism and / or the second angle adjusting mechanism to be inclined in an inclination direction corresponding to the transport direction of the film substrate .
  • the first angle adjustment mechanism and / or the second angle adjustment mechanism may be used to correct the positional deviation of the substrate, and / or the first grip roller and / or the second It is controlled to change the inclination angle of the 2 grip rollers.
  • the film substrate conveying apparatus is a film substrate conveying apparatus for arranging and conveying a strip-shaped film substrate in a vertical posture with one end on the upper side in the width direction, and the upper end of the film substrate At least a pair of first grip rollers disposed in a sandwiching manner, and the rotation angle of the first grip roller can be inclined so that the rotation direction of the first grip roller is on the upper side with respect to the transport direction And a first angle adjustment mechanism that makes it possible to adjust the inclination direction and the inclination angle of the first grip roller.
  • At least a pair of second grip rollers disposed so as to sandwich the lower end portion of the film substrate, and the rotation angle of the second grip roller makes the rotation direction of the second grip roller downward.
  • a second angle adjusting mechanism for adjusting an inclination direction and an inclination angle of the second grip roller so as to be able to be inclined.
  • a detection means for detecting the height position of the width direction end of the film substrate is further provided, and when the detection means detects the positional deviation of the film substrate, the first grip roller and / or the second A grip roller is controlled to be inclined in an inclination direction corresponding to the transport direction of the film substrate by the first angle adjustment mechanism and / or the second angle adjustment mechanism. Therefore, highly accurate position adjustment is possible with respect to both the film substrate transported in the forward feeding direction and the reverse feeding direction.
  • the first angle adjustment mechanism and / or the second angle adjustment mechanism may be used to correct the positional deviation of the substrate, and / or the first grip roller and / or the second
  • the control is performed so as to change the inclination angle of the second grip roller.
  • the gripping force of the first grip roller is reduced due to the wear of the first grip roller, and the force for lifting the film substrate
  • the inclination of the first grip roller is increased, the amount of movement of the film substrate in the width direction can be increased to correct the positional adjustment of the film substrate. Therefore, it is possible to prevent an excessive load from being applied to the film substrate without increasing the force for sandwiching the film substrate by the first grip roller.
  • the film substrate can be made by reducing the inclination of the first grip roller.
  • the positional adjustment of the film substrate can be corrected by reducing the amount of movement in the width direction of the film substrate. Therefore, it is possible to prevent the positional adjustment accuracy of the film substrate from being lowered.
  • FIG. 3 It is a cross-sectional top view which shows typically the manufacturing apparatus of the thin film laminated body in 1st Embodiment of this invention.
  • A) is a cross-sectional plan view schematically showing the film formation chamber of FIG. 1 in an enlarged manner
  • (b) is a cross-sectional view taken along the line CC of FIG.
  • (A) is a schematic front view which shows an angle adjustment mechanism in case the rotating shaft of a grip roller is arrange
  • (b) is a figure. It is a schematic side view of the angle adjustment mechanism of 3 (a), and (c) is DD sectional drawing of FIG. 3 (a).
  • FIG. 4 (A) is a schematic front view which shows the angle adjustment mechanism which inclines a grip roller so that the position of the board
  • (A) is a schematic front view which shows the angle adjustment mechanism which inclines a grip roller so that the position of the board
  • Fig. 7 is a cross-sectional view taken along the line D "-D" in FIG.
  • FIG. 3 is a cross-sectional view taken along the line CC in FIG. 2A in the second embodiment of the present invention. It is a graph which shows the relationship between the inclination angle of a grip roller, and the force which lifts the film board
  • a thin film laminate manufacturing apparatus (hereinafter referred to as “manufacturing apparatus”) 1 including a film substrate conveying apparatus (hereinafter referred to as “carrier apparatus”), a belt-like film substrate (hereinafter referred to as While being arranged and transported in a vertical posture with one end on the upper side in the width direction, the thin film is formed on the surface of the substrate 2.
  • the width direction of the substrate 2 is illustrated along the vertical direction, but the present invention is not limited to this.
  • the manufacturing apparatus 1 is provided with a winding chamber 3 for winding the substrate 2 and a winding chamber 4 for winding the substrate 2.
  • a winding chamber 3 for winding the substrate 2
  • a winding chamber 4 for winding the substrate 2.
  • six film forming chambers 5a to 5f are provided between the chamber 4 and the chamber 4.
  • the substrate 2 is fed in a direction of forward feeding from the unwinding chamber 3 to the winding chamber 4 (hereinafter, indicated by an arrow A in the drawing) and a reverse feeding direction from the winding chamber 4 to the unwinding chamber 3 (hereinafter, in the drawing , And can be transported.
  • an unwinding core 3 a capable of unwinding the wound substrate 2 is provided rotatably about a rotation axis along the width direction of the substrate 2.
  • five rollers 3 b to 3 f are provided in the width direction of the substrate 2 downstream of the unwinding core 3 a in the forward direction.
  • the unwinding core 3a and the rollers 3b to 3f are configured to rotate the substrate 2 so as to be able to be transported in the forward feeding direction and the reverse feeding direction.
  • substrate 2 shown in FIG. 1, tension control, etc. is an example and it is not limited to this, According to the specification of the manufacturing apparatus 1, it can change. It is also possible not to provide a roller for conveyance drive of substrate 2 and tension control.
  • a winding core 4 a configured to be able to wind the substrate 2 is provided rotatably about a rotation axis along the width direction of the substrate 2.
  • seven rollers 4b to 4h are provided inside the winding chamber 4 as an example for conveying drive of the substrate 2, tension control, etc., and the width of the substrate 2 on the upstream side of the winding core 4a in the forward direction. It is provided to be rotatable about a rotational axis along the direction.
  • the winding core 4a and the rollers 4b to 4h are configured to rotate so as to be able to transport the substrate 2 in the forward feeding direction and the reverse feeding direction.
  • substrate 2 shown in FIG. 1, tension control, etc. is an example and it is not limited to this, According to the specification of the manufacturing apparatus 1, it can change. It is also possible not to provide a roller for conveyance drive of substrate 2 and tension control.
  • FIGS. 2 (a) and 2 (b) show a state in which the substrate 2 is fed in the forward feeding direction (indicated by the arrow A), and the first grip roller 6 is fed in the forward feeding direction. It corresponds to the substrate 2.
  • high voltage electrodes 7a to 7f and ground electrodes 8a to 8f are disposed to face each other, and the substrate 2 is provided with high voltage electrodes 7a to 7f and ground electrodes 8a to 8f. It is configured to pass between.
  • the lengths along the width direction of the substrate 2 of the high voltage electrodes 7a to 7f and the ground electrodes 8a to 8f are respectively shorter than the width of the substrate 2, and the upper end portion and the lower end portion of the substrate 2 in the width direction
  • the thin film laminated body is not formed into a film.
  • a gas for film formation is supplied to the inside of the film formation chambers 5a to 5f.
  • the insides of the film forming chambers 5a to 5f are configured to be capable of maintaining an airtight state.
  • a thin film is formed on the substrate 2 when the substrate 2 is located between the high voltage electrodes 7a to 7f and the ground electrodes 8a to 8f in the film forming chambers 5a to 5f. Become.
  • a method of forming a film on the surface of the substrate 2 for example, it is conceivable to use a method such as chemical vapor deposition (CVD) or physical vapor deposition (PVD).
  • CVD chemical vapor deposition
  • PVD physical vapor deposition
  • the number of film forming chambers shown in FIG. 1 is an example and is not limited to this, and can be changed according to the specification of the manufacturing apparatus 1.
  • a heating chamber for heating the substrate 2 may be provided.
  • the manufacturing apparatus 1 is provided with detection means 9 for detecting the position of the substrate 2 in the width direction.
  • the detection unit 9 may be configured to detect the position of the edge portion in the width direction of the substrate 2.
  • the detection means 9 is preferably a non-contact sensor in particular, and may be, for example, a transmissive laser sensor, a reflective photosensor or the like. The detection means 9 is connected to the control means 10.
  • the pair of first grip rollers 6 is configured to be rotatable around the rotation shaft 6 a, and is disposed so as to sandwich the upper end portion of the substrate 2 between the adjacent film forming chambers. Therefore, the pair of first grip rollers 6 sandwich the portion of the substrate 2 on which the thin film laminate is not formed.
  • the outer peripheral surface 6b of the first grip roller 6 may be formed of an elastic body.
  • heat resistant rubber such as silicone rubber or fluoro rubber may be used.
  • the outer peripheral surface 6b of the first grip roller 6 may be formed of a synthetic resin such as PTFE or polyimide, or may be formed of a material coated with stainless steel, iron, chrome or the like.
  • the outer peripheral surface 6b of the first grip roller 6 may be formed of another material as long as predetermined performance such as protection of the substrate 2 and grip is obtained.
  • Such first grip roller 6 is configured to be adjustable in inclination.
  • the first angle adjustment mechanism 11 for adjusting the inclination of the first grip roller 6 will be described with reference to FIGS. 3 (a) to 3 (c).
  • the rotation axis 6a of the first grip roller 6 is adjusted by the first angle adjustment mechanism 11 to the neutral state in which the rotation axis 6a is arranged along the width direction of the substrate 2.
  • a roller shaft 6 c is disposed on the first grip roller 6 so as to extend upward from the upper end along the width direction of the substrate 2.
  • the upper end of the roller shaft 6 c is rotatably attached to the roller attachment portion 12.
  • a link 13 extending upward from the roller attachment portion 12 along the width direction of the substrate 2 is disposed.
  • An engagement roller 14 is provided at the top of the link 13.
  • a link mounting portion 13 a is provided on the link 13 at the middle in the width direction of the substrate 2 between the roller mounting portion 12 and the engagement roller 14.
  • This link mounting portion 13 a corresponds to the link 13 on the surface of the substrate 2. It is configured to be rotatable around a link rotation shaft 13 b extending in the width direction with respect to the above, and is attached to the support portion 15. Therefore, the link 13 is rotatable with respect to the support portion 15.
  • biasing means 16 is disposed between the link 13 and the support portion 15 along the transport direction of the substrate 2.
  • the biasing means 16 may be configured to be able to return the link 13 to the neutral position by using a coil spring, a plate spring, a torsion spring, a rubber member or the like.
  • the actuator 17 is disposed above the link 13.
  • the actuator 17 includes an arm 18 disposed along the width direction with respect to the surface of the substrate 2.
  • the tip 18 a of the arm 18 is engaged with an engagement roller 14 attached to the link 13.
  • a rotating shaft 19 extending along the width direction of the substrate 2 is attached to the proximal end 18 b of the arm 18.
  • the lower end of the rotating shaft 19 is attached to the proximal end 18 b of the arm 18, and the upper end of the rotating shaft 19 is attached to the drive source 20. Therefore, the arm 18 can be rotated by rotational driving of the drive source 20.
  • the drive source 20 is supported by the support portion 15, and the drive source 20 of the actuator 17 is connected to the control means 10.
  • the substrate 2 wound around the unwinding core 3a is unwound while being driven and guided by the rollers 3b to 3f.
  • the substrate 2 exits the unwinding chamber 3 and is sequentially transported in the film forming chambers 5a to 5f along the forward feeding direction, and various thin films are formed on the surface of the substrate 2 in each of the film forming chambers 5a to 5f. Is deposited.
  • the film-formed substrate 2 is conveyed into the winding chamber 4 and wound around the winding core 4a while being driven and guided by the rollers 4b to 4h. In addition, the substrate 2 is transported along the reverse feed direction, as needed.
  • FIG. 2 (b) When the detection means 9 (see FIG. 2 (b)) detects a downward displacement of the substrate 2 transported in the forward direction, the detection means 9 controls the control means 10 (see FIG. 2 (b)) Send a signal to Next, the control means 10 sends a signal to the drive source 20 of the actuator 17, and this drive source 20 is controlled to rotate so as to move the tip 18a of the arm 18 in the reverse feed direction. At this time, the engagement roller 14 engaged with the tip 18a of the arm 18 also moves in the reverse feeding direction, and the link 13 rotates about the link rotation shaft 13b.
  • the inclination angle theta 1 is inclined with respect to the width direction of the substrate 2 It will be That is, the first grip roller 6 is inclined upward with respect to the forward feeding direction of the substrate 2.
  • link 13 is biased to the first gripping roller 6 by the biasing means 16 so as to return to the neutral state.
  • FIG. 2 (b) When the detection means 9 (see FIG. 2 (b)) detects a downward displacement of the substrate 2 transported in the reverse feed direction, the detection means 9 refers to the control means 10 (FIG. 2 (b)). Send a signal to). Next, the control means 10 sends a signal to the drive source 20 of the actuator 17, and the drive source 20 is controlled to rotate so as to move the tip 18a of the arm 18 in the forward direction. At this time, the engagement roller 14 engaged with the leading end 18a of the arm 18 also moves in the forward feeding direction, and the link 13 rotates around the link rotation shaft 13b.
  • the first grip roller 6 has an inclination angle ⁇ 2 with respect to the width direction of the substrate 2 so that the lower side of the first grip roller 6 faces the reverse direction along the surface of the substrate 2. It will be tilted. That is, the first grip roller 6 is inclined upward with respect to the reverse feeding direction of the substrate 2. Incidentally, in a state where the first grip roller 6 is tilted inclination angle theta 2, the link 13 is biased to the first gripping roller 6 by the biasing means 16 so as to return to the neutral state.
  • the control unit 10 controls the drive source 20 of the actuator 17, the position adjustment of the substrate 2 is modified.
  • the detection means 9 detects that the substrate 2 after position correction has deviated to the upper side, the lifting force becomes high because the grip force of the first grip roller 6 is too high. so as to reduce the first angle of inclination theta 1 or theta 2 of the grip roller 6, the control unit 10 controls the drive source 20 of the actuator 17, the position adjustment of the substrate 2 is modified.
  • the manufacturing apparatus of the thin film laminated body in 2nd Embodiment of this invention is demonstrated below.
  • the basic configuration of the thin film stack manufacturing apparatus according to the second embodiment is the same as the thin film stack manufacturing apparatus according to the first embodiment.
  • the same elements as in the first embodiment will be described using the same reference numerals and names as in the first embodiment.
  • a configuration different from the first embodiment will be described.
  • a pair of second grip rollers 6 ′ configured to further sandwich the lower end portion of the substrate 2 is provided. Similar to the first grip roller 6, the second grip roller 6 'has a rotating shaft 6a' and an outer peripheral surface 6b '. Further, although not shown, the second grip roller 6 'can be inclined along the outer circumferential surface 6b of the substrate 2 with the second grip roller 6' downward with respect to the transport direction.
  • a second angle adjustment mechanism is provided which can adjust the tilt direction and the tilt angle so as to tilt in both the forward feeding direction and the reverse feeding direction with respect to the transport direction.
  • the basic configuration of the second angle adjustment mechanism corresponds to the second grip roller 6 ′ and is similar to the first angle adjustment mechanism 11. Note that FIG.
  • FIG 8 shows a state in which the substrate 2 is sent in the forward feeding direction (indicated by the arrow A), and the second grip roller 6 ′ is the second corresponding to the substrate 2 sent in the forward feeding direction.
  • the upper side of the grip roller 6 ' is inclined in the forward feeding direction.
  • the first and / or second grip rollers 6, 6 ' are the first angle adjustment mechanism 11 and / or the second angle.
  • the adjustment mechanism makes it possible to adjust the inclination direction and the inclination angle so as to incline in both the forward feed direction and the reverse feed direction in the transport direction of the substrate 2, so that the substrate 2 is transported in the forward feed direction and the reverse feed direction.
  • the position can be adjusted with high accuracy for both
  • the grip force of the first grip roller 6 is reduced due to the wear of the first grip roller 6, and the force for lifting the substrate 2 is If the inclination of the first grip roller 6 is increased, the displacement of the substrate 2 in the width direction can be increased, and the positional adjustment of the substrate 2 can be corrected. Therefore, it is possible to prevent an excessive load from being applied to the substrate 2 without increasing the force for sandwiching the substrate 2 by the first grip roller 6.
  • the grip force of the first grip roller 6 is too high due to variation or the like and the force for lifting the substrate 2 is too large, the width of the substrate 2 can be reduced by decreasing the inclination of the first grip roller 6.
  • the positional adjustment of the substrate 2 can be corrected by reducing the amount of movement of the direction. Therefore, the positional adjustment accuracy of the substrate 2 can be prevented from decreasing.
  • the first and / or second grip rollers 6, 6 ' are configured to be able to adjust the force to hold the substrate 2 (hereinafter referred to as "substrate holding force"). It may be done. For example, as the grip force of the first grip roller 6 is reduced, a sufficient lifting force for the substrate 2 can not be obtained, and it is detected that the substrate 2 after position correction is still shifted downward. When 9 is detected, the control means 10 controls the pair of first grip rollers 6 so that the substrate gripping force of the pair of first grip rollers 6 is increased, and the position adjustment of the substrate 2 is corrected. It is also good.
  • control unit 10 may control the pair of first grip rollers 6 to correct the positional adjustment of the substrate 2 so as to reduce the substrate gripping force between the pair of first grip rollers 6.
  • the transport section between the unwinding chamber 3 and the film forming chamber 5a, the transport section between five adjacent film forming chambers, the winding chamber 4 and the film forming chamber The first and / or second grip rollers 6, 6 'may be provided in at least one of the conveyance sections between 5f, and the first and / or second grip rollers 6, 6' may be provided.
  • the number of transport sections provided with ' can be varied to optimally position the substrate 2.
  • the number of first and / or second grip rollers 6, 6 'provided in each conveyance section may be two or more. The same effect as the embodiment of the present invention can be obtained.
  • a drive source for rotating the first and / or second grip rollers 6, 6 'instead of the roller mounting portion 12 is provided, the first and / or the first.
  • the second grip rollers 6, 6 ' may be configured to be rotatable by the drive source.
  • this drive source may be connected to the control means 10 to control the rotation of the first and / or second grip rollers 6, 6 '. The same effect as the embodiment of the present invention can be obtained.
  • the relationship between the tilt angle ⁇ 1 or ⁇ 2 of the first grip roller 6 and the lifting force F of the substrate 2 of the first grip roller 6 is a solid line when the substrate gripping force is 4.4 N.
  • a broken line Q indicates a case where the substrate holding force is 8.9 N
  • a dashed dotted line R indicates a case where the substrate holding force is 16.3 N.
  • the lifting force F is also proportionally increased when the inclination angle ⁇ 1 or ⁇ 2 is increased.
  • the tilt angle ⁇ 1 or ⁇ 2 may be about 3.5 ° when the substrate holding force is 4.4N.
  • the inclination angle ⁇ 1 or ⁇ 2 may be approximately 2 °.
  • the inclination angle ⁇ 1 or ⁇ 2 may be approximately 1 °.
  • Production device for thin film laminate production device
  • Film substrate (substrate) 6 first grip roller 6 'second grip roller 6a, 6a' rotation shaft 6b, 6b 'outer peripheral surface
  • detection means 11 angle adjustment mechanism A, B, C, D, D', D '' arrow F lifting force ⁇ 1 , ⁇ 2 Inclination angle
  • Solid line Q Broken line

Abstract

A conveyance device for a film substrate, capable of highly accurately adjusting the position of individual substrates which are conveyed respectively in the forward feed direction and in the reverse feed direction. A conveyance device for a film substrate, configured to convey the band-like film substrate (2) in a vertical position in which one end of the film substrate in the widthwise direction thereof positioned on the upper side. The conveyance device for a film substrate is provided with at least a pair of first grip rollers (6) which is disposed so as to sandwich the upper end of the film substrate (2), and also with a first angle adjustment mechanism (11) which can adjust the tilt direction and tilt angle of the first grip rollers in such a manner that the angle of the rotation axis of the first grip rollers (6) is adjusted so that the rotational direction of the first grip rollers (6) is directed above the conveyance direction.

Description

フィルム基板の搬送装置Film substrate transport device
 フィルム基板(以下、「基板」と呼ぶ)が、その幅方向について片端部上側とした縦姿勢で配置されて搬送される、フィルム基板の搬送装置に関する。 The present invention relates to a film substrate transport apparatus in which a film substrate (hereinafter, referred to as a “substrate”) is disposed and transported in a vertical posture with one end upper side in the width direction.
 薄膜積層体の製造装置(以下、「製造装置」という)は、基板の表面に薄膜光電変換素子から成る光電変換層などを成膜することに用いられている。この製造装置は、その成膜室内において基板が気密状態で成膜される構成となっており、さらに成膜室内に基板を搬送するため、巻出しコアに巻き取られた基板が、成膜室に向けて送り出されて、成膜室内を通過した後に、巻取りコアによって巻き取られる構成となっている。 An apparatus for producing a thin film laminate (hereinafter, referred to as "production apparatus") is used to form a photoelectric conversion layer or the like including a thin film photoelectric conversion element on the surface of a substrate. This manufacturing apparatus is configured such that the substrate is formed in an airtight state in the film forming chamber, and the substrate taken up by the unwinding core is further transferred to the film forming chamber in order to transport the substrate into the film forming chamber. After being sent out to pass through to the inside of the film forming chamber, they are wound up by the winding core.
 このような製造装置に主に設けられるフィルム基板の搬送装置(以下、「搬送装置」という)の基板搬送方式に関して、基板をその幅方向について片端部上側とした縦姿勢で配置して搬送する縦置き搬送方式が採用されることがある。この縦置き搬送方式の搬送装置においては、パーティクルが基板表面に堆積し難いことによって基板の汚染が防止される点、基板を縦置きとしたことによって製造装置のスペースを低減できる点などで優れている。その一方で、基板は、主に巻出しコアと巻取りコアとの間で引っ張られて保持されるので、基板は、自重により下方側に垂れ下がる傾向にあり、幅方向に蛇行するおそれもある。このような場合、基板の幅方向の位置ズレが発生し、基板は幅方向に撓むこととなる。この撓みによって基板に偏った応力集中が発生して、シワが発生し、このシワによって基板に成膜された薄膜光電変換素子などの特性が低下するので、問題である。 With regard to the substrate transfer method of a film substrate transfer device (hereinafter referred to as a “transfer device”) mainly provided in such a manufacturing apparatus, the vertical direction is to arrange and transfer the substrate in the vertical posture with one end in the width direction There is a case where a lay transport method is adopted. The transport apparatus of this vertical transport system is excellent in that contamination of the substrate is prevented by the difficulty in depositing particles on the substrate surface, and the space of the manufacturing apparatus can be reduced by vertically placing the substrate. There is. On the other hand, since the substrate is mainly pulled and held between the unwinding core and the winding core, the substrate tends to sag downward by its own weight, and may also meander in the width direction. In such a case, positional deviation in the width direction of the substrate occurs, and the substrate is bent in the width direction. This deflection generates a stress concentration unevenly on the substrate to cause wrinkles, and the wrinkles deteriorate the characteristics of the thin film photoelectric conversion element or the like formed on the substrate, which is a problem.
 そこで、特許文献1のように、基板を順送り方向に搬送する搬送装置において、基板を幅方向に位置調節するためのグリップローラを設けた構造が採用されている。このような製造装置においては、複数の対になったグリップローラが、基板の上端部および下端部をそれぞれ挟むように設けられ、上端部側のグリップローラは、基板の順送り方向に対して上方側に向けて傾けて配置され、下端部側のグリップローラは、基板の順送り方向に対して下方側に向けて傾けて配置されている。 Therefore, as in Patent Document 1, in the transport apparatus that transports the substrate in the forward direction, a structure is adopted in which a grip roller for adjusting the position of the substrate in the width direction is provided. In such a manufacturing apparatus, a plurality of paired grip rollers are provided to sandwich the upper end portion and the lower end portion of the substrate, and the grip roller on the upper end portion side is the upper side with respect to the substrate feeding direction. The grip roller on the lower end side is disposed to be inclined downward with respect to the forward feeding direction of the substrate.
 また、グリップローラの外周表面には、基板の保護などのために弾性体が設けられている。しかしながら、この弾性体が摩耗などにより劣化すると、グリップローラと基板との間で作用するグリップ力が低下し、基板を持ち上げる力が十分に得られなくなる。そこで、特許文献1では、弾性体の劣化に対応して、対になったグリップローラが基板を挟む力(以下、「基板挟持力」と呼ぶ)を増加させて、グリップ力を増加させている。 In addition, an elastic body is provided on the outer peripheral surface of the grip roller for protecting the substrate and the like. However, if the elastic body is deteriorated due to wear or the like, the gripping force acting between the gripping roller and the substrate is reduced, and a sufficient lifting force for the substrate can not be obtained. Therefore, in Patent Document 1, in response to the deterioration of the elastic body, the gripping force is increased by increasing the force with which the pair of gripping rollers sandwiches the substrate (hereinafter referred to as "substrate gripping force"). .
特開2009-38276号公報JP, 2009-38276, A
 しかしながら、特許文献1においては、上端部側のグリップローラは、基板の順送り方向に対して上方側にのみ向けて傾けて配置され、下端部側のグリップローラは、基板の順送り方向に対して下方側にのみに向けて傾けて配置されている。そのため、順送り方向および逆送り方向の両方に基板が搬送される場合、これらのグリップローラは、順送り方向に搬送される基板を高い精度で位置調節できるが、逆送り方向に搬送される基板を高い精度で位置調節することが困難となっている。 However, in Patent Document 1, the grip roller on the upper end portion side is disposed to be inclined only upward with respect to the forward feeding direction of the substrate, and the grip roller on the lower end portion side is downwardly directed to the forward feeding direction of the substrate. The side is only tilted towards the side. Therefore, when the substrates are transported in both the forward feed direction and the reverse feed direction, these grip rollers can adjust the substrate transported in the forward feed direction with high accuracy, but the substrates transported in the reverse feed direction are high. It is difficult to adjust the position with accuracy.
 また、特許文献1において、外周表面が弾性体となっているグリップローラの基板挟持力を増加させた場合、外周表面の弾性体が潰れ、外周表面の横断面形状が楕円状に変化して、グリップローラの径が変化するおそれがある。このような場合、所望のグリップ力が得られず、基板を持上げる力が十分に得られないので、基板を所望の位置に移動させることが困難となる。よって、基板の位置調節の精度が低下することとなる。 Further, in Patent Document 1, when the substrate gripping force of the grip roller whose outer peripheral surface is an elastic body is increased, the elastic body on the outer peripheral surface is crushed, and the cross sectional shape of the outer peripheral surface changes into an elliptical shape, There is a possibility that the diameter of the grip roller may change. In such a case, it is difficult to move the substrate to a desired position because a desired gripping force can not be obtained and a sufficient force for lifting the substrate can not be obtained. Thus, the accuracy of the position adjustment of the substrate is reduced.
 本発明は、このような実情に鑑みてなされたものであって、その目的は、順送り方向および逆送り方向の両方に搬送される基板のそれぞれを、高い精度で位置調節可能とするフィルム基板の搬送装置を提供することにある。 The present invention has been made in view of such circumstances, and its object is to provide a film substrate capable of adjusting the position of each of the substrates transported in both the forward feed direction and the reverse feed direction with high accuracy. It is in providing a conveying apparatus.
 課題を解決するために本発明のフィルム基板の搬送装置は、帯状のフィルム基板を、その幅方向について片端部を上側とした縦姿勢で配置して搬送するフィルム基板の搬送装置であって、前記フィルム基板の上端部を挟むように配設される少なくとも一対の第1のグリップローラと、前記第1のグリップローラの回転軸角度が前記第1のグリップローラの回転方向を搬送方向に対して上方側とするように傾け可能となるように、前記第1のグリップローラの傾斜方向および傾斜角度を調節可能とする第1の角度調節機構とを備えている。 In order to solve the problems, the film substrate transport apparatus of the present invention is a film substrate transport apparatus which arranges and transports a strip-shaped film substrate in a vertical posture with one end on the upper side in the width direction, At least a pair of first grip rollers disposed so as to sandwich the upper end portion of the film substrate, and the rotation shaft angle of the first grip roller makes the rotation direction of the first grip roller upward with respect to the transport direction A first angle adjustment mechanism is provided to adjust the inclination direction and the inclination angle of the first grip roller so that it can be inclined to the side.
 本発明のフィルム基板の搬送装置では、前記フィルム基板の下端部を挟むように配設される少なくとも一対の第2のグリップローラと、前記第2のグリップローラの回転軸角度が前記第2のグリップローラの回転方向を搬送方向に対して下方側とするように傾け可能なるように、前記第2のグリップローラの傾斜方向および傾斜角度を調節可能とする第2の角度調節機構とをさらに備えている。 In the film substrate transport apparatus according to the present invention, at least a pair of second grip rollers disposed so as to sandwich the lower end portion of the film substrate, and the rotation axis angle of the second grip roller is the second grip And a second angle adjusting mechanism capable of adjusting the inclination direction and the inclination angle of the second grip roller so that the rotation direction of the roller can be inclined downward with respect to the transport direction. There is.
 本発明のフィルム基板の搬送装置では、前記フィルム基板の幅方向端部の高さ位置を検知する検知手段をさらに備え、前記検知手段が前記フィルム基板の位置ズレを検知すると、前記第1のグリップローラおよび/または前記第2のグリップローラが、前記第1の角度調節機構および/または前記第2の角度調節機構によって、前記フィルム基板の搬送方向に対応した傾斜方向に傾けられるように制御される。 The film substrate transport apparatus according to the present invention further includes detection means for detecting the height position of the width direction end of the film substrate, and the first grip is detected when the detection means detects positional deviation of the film substrate. The roller and / or the second grip roller is controlled by the first angle adjusting mechanism and / or the second angle adjusting mechanism to be inclined in an inclination direction corresponding to the transport direction of the film substrate .
 本発明のフィルム基板の搬送装置では、前記第1の角度調節機構および/または前記第2の角度調節機構が、前記基板の位置ズレを修正するために前記第1のグリップローラおよび/または前記第2のグリップローラの傾斜角度を変化させるように制御される。 In the film substrate transport device of the present invention, the first angle adjustment mechanism and / or the second angle adjustment mechanism may be used to correct the positional deviation of the substrate, and / or the first grip roller and / or the second It is controlled to change the inclination angle of the 2 grip rollers.
 本発明のフィルム基板の搬送装置によれば、以下の効果を得ることができる。
 本発明のフィルム基板の搬送装置は、帯状のフィルム基板を、その幅方向について片端部を上側とした縦姿勢で配置して搬送するフィルム基板の搬送装置であって、前記フィルム基板の上端部を挟むように配設される少なくとも一対の第1のグリップローラと、前記第1のグリップローラの回転角度が前記第1のグリップローラの回転方向を搬送方向に対して上方側とするように傾け可能となるように、前記第1のグリップローラの傾斜方向および傾斜角度を調節可能とする第1の角度調節機構とを備えている。
 また、前記フィルム基板の下端部を挟むように配設される少なくとも一対の第2のグリップローラと、前記第2のグリップローラの回転角度が前記第2のグリップローラの回転方向を下方側とするように傾け可能となるように、前記第2のグリップローラの傾斜方向および傾斜角度を調節可能とする第2の角度調節機構とをさらに備えている。
 さらに、前記フィルム基板の幅方向端部の高さ位置を検知する検知手段をさらに備え、前記検知手段が前記フィルム基板の位置ズレを検知すると、前記第1のグリップローラおよび/または前記第2のグリップローラが、前記第1の角度調節機構および/または前記第2の角度調節機構によって、前記フィルム基板の搬送方向に対応した傾斜方向に傾けられるように制御される。
 そのため、順送り方向および逆送り方向に搬送される前記フィルム基板の両方に対して、精度の高い位置調節が可能となる。
According to the film substrate transport apparatus of the present invention, the following effects can be obtained.
The film substrate conveying apparatus according to the present invention is a film substrate conveying apparatus for arranging and conveying a strip-shaped film substrate in a vertical posture with one end on the upper side in the width direction, and the upper end of the film substrate At least a pair of first grip rollers disposed in a sandwiching manner, and the rotation angle of the first grip roller can be inclined so that the rotation direction of the first grip roller is on the upper side with respect to the transport direction And a first angle adjustment mechanism that makes it possible to adjust the inclination direction and the inclination angle of the first grip roller.
Further, at least a pair of second grip rollers disposed so as to sandwich the lower end portion of the film substrate, and the rotation angle of the second grip roller makes the rotation direction of the second grip roller downward. And a second angle adjusting mechanism for adjusting an inclination direction and an inclination angle of the second grip roller so as to be able to be inclined.
Furthermore, a detection means for detecting the height position of the width direction end of the film substrate is further provided, and when the detection means detects the positional deviation of the film substrate, the first grip roller and / or the second A grip roller is controlled to be inclined in an inclination direction corresponding to the transport direction of the film substrate by the first angle adjustment mechanism and / or the second angle adjustment mechanism.
Therefore, highly accurate position adjustment is possible with respect to both the film substrate transported in the forward feeding direction and the reverse feeding direction.
 本発明のフィルム基板の搬送装置では、前記第1の角度調節機構および/または前記第2の角度調節機構が、前記基板の位置ズレを修正するために前記第1のグリップローラおよび/または前記第2のグリップローラの傾斜角度を変化させるように制御されるので、例えば、前記第1のグリップローラの摩耗などによって前記第1のグリップローラのグリップ力が低下して、前記フィルム基板を持上げる力が十分に得られない場合に、前記第1のグリップローラの傾斜を大きくすれば、前記フィルム基板の幅方向の移動量を大きくして、前記フィルム基板の位置調節を修正できる。そのため、前記第1のグリップローラにより前記フィルム基板を挟む力を増加させずに、前記フィルム基板に余分な負荷がかかることを防止できる。一方で、前記第1のグリップローラのグリップ力がバラツキなどにより高くなりすぎ、前記フィルム基板を持上げる力が大きくなりすぎる場合に、前記第1のグリップローラの傾斜を小さくすれば、前記フィルム基板の幅方向の移動量を小さくして、前記フィルム基板の位置調節を修正できる。よって、前記フィルム基板の位置調節精度が低下することを防止できる。 In the film substrate transport device of the present invention, the first angle adjustment mechanism and / or the second angle adjustment mechanism may be used to correct the positional deviation of the substrate, and / or the first grip roller and / or the second The control is performed so as to change the inclination angle of the second grip roller. For example, the gripping force of the first grip roller is reduced due to the wear of the first grip roller, and the force for lifting the film substrate If the inclination of the first grip roller is increased, the amount of movement of the film substrate in the width direction can be increased to correct the positional adjustment of the film substrate. Therefore, it is possible to prevent an excessive load from being applied to the film substrate without increasing the force for sandwiching the film substrate by the first grip roller. On the other hand, when the grip force of the first grip roller becomes too high due to variation or the like and the force for lifting the film substrate becomes too large, the film substrate can be made by reducing the inclination of the first grip roller. The positional adjustment of the film substrate can be corrected by reducing the amount of movement in the width direction of the film substrate. Therefore, it is possible to prevent the positional adjustment accuracy of the film substrate from being lowered.
本発明の第1実施形態における薄膜積層体の製造装置を模式的に示す断面平面図である。It is a cross-sectional top view which shows typically the manufacturing apparatus of the thin film laminated body in 1st Embodiment of this invention. (a)は、図1の成膜室を拡大して模式的に示す断面平面図であり、(b)は、図2(a)のC-C断面図である。(A) is a cross-sectional plan view schematically showing the film formation chamber of FIG. 1 in an enlarged manner, and (b) is a cross-sectional view taken along the line CC of FIG. (a)は、本発明の第1実施形態において、グリップローラの回転軸がフィルム基板の幅方向に沿って配置される場合の角度調節機構を示す概略正面図であり、(b)は、図3(a)の角度調節機構の概略側面図であり、(c)は、図3(a)のD-D断面図である。(A) is a schematic front view which shows an angle adjustment mechanism in case the rotating shaft of a grip roller is arrange | positioned along the width direction of a film board | substrate in 1st Embodiment of this invention, (b) is a figure. It is a schematic side view of the angle adjustment mechanism of 3 (a), and (c) is DD sectional drawing of FIG. 3 (a). (a)は、本発明の第1実施形態において、順送り方向に搬送される基板の位置を調節するようにグリップローラを傾けている角度調節機構を示す概略正面図であり、(b)は、図4(a)のD’-D’断面図である。(A) is a schematic front view which shows the angle adjustment mechanism which inclines a grip roller so that the position of the board | substrate conveyed in a forward direction may be adjusted in 1st Embodiment of this invention, (b), It is a D'-D 'sectional view of FIG. 4 (a). 図4(a)のグリップローラを示す概略拡大正面図である。It is a schematic enlarged front view which shows the grip roller of Fig.4 (a). (a)は、本発明の第1実施形態において、逆送り方向に搬送される基板の位置を調節するようにグリップローラを傾けている角度調節機構を示す概略正面図であり、(b)は、図6(a)のD’’-D’’断面図である。(A) is a schematic front view which shows the angle adjustment mechanism which inclines a grip roller so that the position of the board | substrate conveyed in a reverse feed direction may be adjusted in 1st Embodiment of this invention, (b) Fig. 7 is a cross-sectional view taken along the line D "-D" in FIG. 図6(a)のグリップローラを示す概略拡大正面図である。It is a schematic enlarged front view which shows the grip roller of Fig.6 (a). 本発明の第2実施形態における図2(a)のC-C断面図である。FIG. 3 is a cross-sectional view taken along the line CC in FIG. 2A in the second embodiment of the present invention. グリップローラの傾斜角度とグリップローラのフィルム基板を持ち上げる力との関係を示すグラフである。It is a graph which shows the relationship between the inclination angle of a grip roller, and the force which lifts the film board | substrate of a grip roller.
 [第1実施形態]
 本発明の第1実施形態におけるフィルム基板の搬送装置について以下に説明する。
 図1を参照すると、フィルム基板の搬送装置(以下、「搬送装置」と呼ぶ)を含む薄膜積層体の製造装置(以下、「製造装置」と呼ぶ)1においては、帯状のフィルム基板(以下、「基板」と呼ぶ)2が、その幅方向について片端部を上側とした縦姿勢で配置されて搬送されるとともに、基板2の表面に薄膜が成膜される構成となっている。なお、第1実施形態では、基板2の幅方向を鉛直方向に沿わせた状態で図示して説明するが、これに限定されない。
 この基板2を搬送するため、製造装置1には、基板2を巻出すための巻出し室3と基板2を巻き取るための巻取り室4とが設けられており、巻出し室3と巻取り室4との間には一例として6つの成膜室5a~5fが設けられている。また、基板2は、巻出し室3から巻取り室4に向かう順送り方向(以下、図面において矢印Aで示す)と、巻取り室4から巻出し室3に向かう逆送り方向(以下、図面において矢印Bで示す)とに搬送可能に構成されている。さらに、巻出し室3および成膜室5aの間の搬送区間と、5つの隣接する成膜室同士間の搬送区間と、巻取り室4および成膜室5fの間の搬送区間とには、一例として、第1のグリップローラ6がそれぞれ1対ずつ設けられている。
First Embodiment
The film substrate transport apparatus according to the first embodiment of the present invention will be described below.
Referring to FIG. 1, in a thin film laminate manufacturing apparatus (hereinafter referred to as “manufacturing apparatus”) 1 including a film substrate conveying apparatus (hereinafter referred to as “carrier apparatus”), a belt-like film substrate (hereinafter referred to as While being arranged and transported in a vertical posture with one end on the upper side in the width direction, the thin film is formed on the surface of the substrate 2. In the first embodiment, the width direction of the substrate 2 is illustrated along the vertical direction, but the present invention is not limited to this.
In order to transport the substrate 2, the manufacturing apparatus 1 is provided with a winding chamber 3 for winding the substrate 2 and a winding chamber 4 for winding the substrate 2. As an example, six film forming chambers 5a to 5f are provided between the chamber 4 and the chamber 4. Further, the substrate 2 is fed in a direction of forward feeding from the unwinding chamber 3 to the winding chamber 4 (hereinafter, indicated by an arrow A in the drawing) and a reverse feeding direction from the winding chamber 4 to the unwinding chamber 3 (hereinafter, in the drawing , And can be transported. Further, a conveyance section between the unwinding chamber 3 and the film formation chamber 5a, a conveyance section between five adjacent film formation chambers, and a conveyance section between the winding chamber 4 and the film formation chamber 5f, As an example, one pair of first grip rollers 6 is provided.
 巻出し室3の内部には、巻き取った基板2を巻出し可能な巻出しコア3aが、基板2の幅方向に沿った回転軸を中心に回転可能に設けられている。また、巻出し室3の内部には、基板2の搬送駆動、張力制御などのために、一例として5つのローラ3b~3fが、巻出しコア3aより順送り方向下流側に、基板2の幅方向に沿った回転軸を中心に回転可能な状態で設けられている。巻出しコア3aおよびローラ3b~3fは、基板2を順送り方向および逆送り方向に搬送可能に回転する構成となっている。なお、図1に示した基板2の搬送駆動、張力制御などのためのローラの数は、一例であってこれに限定されず、製造装置1の仕様に対応して変更可能である。基板2の搬送駆動、張力制御などのためのローラを設けない構成としてもよい。 Inside the unwinding chamber 3, an unwinding core 3 a capable of unwinding the wound substrate 2 is provided rotatably about a rotation axis along the width direction of the substrate 2. Further, in the inside of the unwinding chamber 3, for example, five rollers 3 b to 3 f are provided in the width direction of the substrate 2 downstream of the unwinding core 3 a in the forward direction. Provided so as to be rotatable about a rotational axis along the axis. The unwinding core 3a and the rollers 3b to 3f are configured to rotate the substrate 2 so as to be able to be transported in the forward feeding direction and the reverse feeding direction. In addition, the number of rollers for the conveyance drive of the board | substrate 2 shown in FIG. 1, tension control, etc. is an example and it is not limited to this, According to the specification of the manufacturing apparatus 1, it can change. It is also possible not to provide a roller for conveyance drive of substrate 2 and tension control.
 巻取り室4の内部には、基板2を巻取り可能に構成した巻取りコア4aが、基板2の幅方向に沿った回転軸を中心に回転可能に設けられている。また、巻取り室4の内部には、基板2の搬送駆動、張力制御などのために、一例として、7つのローラ4b~4hが、巻取りコア4aより順送り方向上流側に、基板2の幅方向に沿った回転軸を中心に回転可能な状態で設けられている。巻取りコア4aおよびローラ4b~4hは、基板2を順送り方向および逆送り方向に搬送可能に回転する構成となっている。なお、図1に示した基板2の搬送駆動、張力制御などのためのローラの数は、一例であってこれに限定されず、製造装置1の仕様に対応して変更可能である。基板2の搬送駆動、張力制御などのためのローラを設けない構成としてもよい。 Inside the winding chamber 4, a winding core 4 a configured to be able to wind the substrate 2 is provided rotatably about a rotation axis along the width direction of the substrate 2. Further, seven rollers 4b to 4h are provided inside the winding chamber 4 as an example for conveying drive of the substrate 2, tension control, etc., and the width of the substrate 2 on the upstream side of the winding core 4a in the forward direction. It is provided to be rotatable about a rotational axis along the direction. The winding core 4a and the rollers 4b to 4h are configured to rotate so as to be able to transport the substrate 2 in the forward feeding direction and the reverse feeding direction. In addition, the number of rollers for the conveyance drive of the board | substrate 2 shown in FIG. 1, tension control, etc. is an example and it is not limited to this, According to the specification of the manufacturing apparatus 1, it can change. It is also possible not to provide a roller for conveyance drive of substrate 2 and tension control.
 図2(a)および図2(b)を参照して、成膜室5a~5fの構造を説明する。なお、図2(a)および図2(b)では、基板2が順送り方向(矢印Aで示す)に送られている状態を示しており、第1のグリップローラ6は、順送り方向に送られる基板2に対応した状態となっている。成膜室5a~5fの内部には、高電圧電極7a~7fと接地電極8a~8fとがそれぞれ対向して配置されており、基板2は高電圧電極7a~7fと接地電極8a~8fとの間を通過するように構成されている。高電圧電極7a~7fおよび接地電極8a~8fの基板2の幅方向に沿った長さは、それぞれ基板2の幅よりも短くなっており、基板2の幅方向の上端部および下端部には、薄膜積層体が成膜されない構成となっている。成膜室5a~5fの内部には、成膜用のガスが供給される構成となっている。成膜室5a~5fの内部は、気密状態を維持可能に構成されている。このような成膜室5a~5fの内部において、基板2が高電圧電極7a~7fと接地電極8a~8fとの間のそれぞれに位置する際に、薄膜が基板2に成膜されることとなる。基板2の表面を成膜する方法については、例えば、CVD(Chemical Vapor Deposition、化学蒸着)、PVD(Physical Vapor Deposition、物理蒸着)などの方法を用いることが考えられる。なお、図1に示した成膜室の数は、一例であってこれに限定されず、製造装置1の仕様に対応して変更可能である。また、成膜室以外にも、基板2を加熱するための加熱室などが設けられていてもよい。 The structures of the film forming chambers 5a to 5f will be described with reference to FIGS. 2 (a) and 2 (b). 2 (a) and 2 (b) show a state in which the substrate 2 is fed in the forward feeding direction (indicated by the arrow A), and the first grip roller 6 is fed in the forward feeding direction. It corresponds to the substrate 2. Inside the film forming chambers 5a to 5f, high voltage electrodes 7a to 7f and ground electrodes 8a to 8f are disposed to face each other, and the substrate 2 is provided with high voltage electrodes 7a to 7f and ground electrodes 8a to 8f. It is configured to pass between. The lengths along the width direction of the substrate 2 of the high voltage electrodes 7a to 7f and the ground electrodes 8a to 8f are respectively shorter than the width of the substrate 2, and the upper end portion and the lower end portion of the substrate 2 in the width direction The thin film laminated body is not formed into a film. A gas for film formation is supplied to the inside of the film formation chambers 5a to 5f. The insides of the film forming chambers 5a to 5f are configured to be capable of maintaining an airtight state. A thin film is formed on the substrate 2 when the substrate 2 is located between the high voltage electrodes 7a to 7f and the ground electrodes 8a to 8f in the film forming chambers 5a to 5f. Become. As a method of forming a film on the surface of the substrate 2, for example, it is conceivable to use a method such as chemical vapor deposition (CVD) or physical vapor deposition (PVD). The number of film forming chambers shown in FIG. 1 is an example and is not limited to this, and can be changed according to the specification of the manufacturing apparatus 1. In addition to the film formation chamber, a heating chamber for heating the substrate 2 may be provided.
 また、製造装置1には、基板2の幅方向の位置を検知する検知手段9が設けられている。この検知手段9は、例えば、基板2における幅方向の縁部分の位置を検出可能に構成されているとよい。さらに、検知手段9は、特に非接触式センサであると好ましく、一例として、透過型のレーザーセンサ、反射型のフォトセンサなどであるとよい。検知手段9は制御手段10に接続されている。 In addition, the manufacturing apparatus 1 is provided with detection means 9 for detecting the position of the substrate 2 in the width direction. For example, the detection unit 9 may be configured to detect the position of the edge portion in the width direction of the substrate 2. Furthermore, the detection means 9 is preferably a non-contact sensor in particular, and may be, for example, a transmissive laser sensor, a reflective photosensor or the like. The detection means 9 is connected to the control means 10.
 一対の第1のグリップローラ6は、回転軸6aを中心に回転可能に構成されており、隣接する成膜室同士の間で基板2の上端部を挟むように配置されている。そのため、一対の第1のグリップローラ6は、基板2の薄膜積層体が成膜されていない部分を挟むこととなる。また、この第1のグリップローラ6の外周表面6bは、弾性体によって形成されるとよい。例えば、弾性体として、シリコンゴム、フッ素ゴムなどの耐熱性ゴムが用いられるとよい。他の例としては、第1のグリップローラ6の外周表面6bは、PTFE、ポリイミドなどの合成樹脂によって形成されてもよく、ステンレス、鉄、クロムメッキなどを施した素材によって形成されてもよい。さらには、第1のグリップローラ6の外周表面6bは、基板2の保護、グリップ力などの所定の性能が得られれば、他の素材によって形成されてもよい。 The pair of first grip rollers 6 is configured to be rotatable around the rotation shaft 6 a, and is disposed so as to sandwich the upper end portion of the substrate 2 between the adjacent film forming chambers. Therefore, the pair of first grip rollers 6 sandwich the portion of the substrate 2 on which the thin film laminate is not formed. The outer peripheral surface 6b of the first grip roller 6 may be formed of an elastic body. For example, as an elastic body, heat resistant rubber such as silicone rubber or fluoro rubber may be used. As another example, the outer peripheral surface 6b of the first grip roller 6 may be formed of a synthetic resin such as PTFE or polyimide, or may be formed of a material coated with stainless steel, iron, chrome or the like. Furthermore, the outer peripheral surface 6b of the first grip roller 6 may be formed of another material as long as predetermined performance such as protection of the substrate 2 and grip is obtained.
 このような第1のグリップローラ6は、その傾斜を調節可能に構成されている。第1のグリップローラ6の傾斜を調節する第1の角度調節機構11について、図3(a)~図3(c)を参照して説明する。図3(a)~図3(c)では、第1の角度調節機構11によって、第1のグリップローラ6の回転軸6aが基板2の幅方向に沿って配置された中立状態に調節されている。第1のグリップローラ6には、その上端から基板2の幅方向に沿って上方側に延びるように、ローラシャフト6cが配設されている。ローラシャフト6cの上端は、ローラ取付部12に回転可能に取り付けられている。また、ローラ取付部12から基板2の幅方向に沿って上方側に延びるリンク13が配設されている。リンク13の上部には、係合ローラ14が設けられている。リンク13には、ローラ取付部12と係合ローラ14との間における基板2の幅方向中間にリンク取付部13aが設けられており、このリンク取付部13aは、リンク13を、基板2の表面に対して幅方向に延びるリンク回転軸13bを中心に回転可能とするように構成されており、かつ支持部15に取付けられている。そのため、リンク13は、支持部15に対して回転可能となっている。また、リンク13と支持部15との間には、基板2の搬送方向に沿って付勢手段16が配設されている。この付勢手段16は、コイルバネ、板バネ、トーションバネ、ゴム部材などを用いて、リンク13を中立位置に復帰可能とするように構成されているとよい。 Such first grip roller 6 is configured to be adjustable in inclination. The first angle adjustment mechanism 11 for adjusting the inclination of the first grip roller 6 will be described with reference to FIGS. 3 (a) to 3 (c). In FIGS. 3A to 3C, the rotation axis 6a of the first grip roller 6 is adjusted by the first angle adjustment mechanism 11 to the neutral state in which the rotation axis 6a is arranged along the width direction of the substrate 2. There is. A roller shaft 6 c is disposed on the first grip roller 6 so as to extend upward from the upper end along the width direction of the substrate 2. The upper end of the roller shaft 6 c is rotatably attached to the roller attachment portion 12. In addition, a link 13 extending upward from the roller attachment portion 12 along the width direction of the substrate 2 is disposed. An engagement roller 14 is provided at the top of the link 13. A link mounting portion 13 a is provided on the link 13 at the middle in the width direction of the substrate 2 between the roller mounting portion 12 and the engagement roller 14. This link mounting portion 13 a corresponds to the link 13 on the surface of the substrate 2. It is configured to be rotatable around a link rotation shaft 13 b extending in the width direction with respect to the above, and is attached to the support portion 15. Therefore, the link 13 is rotatable with respect to the support portion 15. Further, biasing means 16 is disposed between the link 13 and the support portion 15 along the transport direction of the substrate 2. The biasing means 16 may be configured to be able to return the link 13 to the neutral position by using a coil spring, a plate spring, a torsion spring, a rubber member or the like.
 リンク13の上方にはアクチュエータ17が配設されている。アクチュエータ17は、基板2の表面に対して幅方向に沿って配置されるアーム18を備えている。アーム18の先端部18aは、リンク13に取付けられた係合ローラ14と係合している。一方で、アーム18の基端部18bには、基板2の幅方向に沿って延びる回転シャフト19が取り付けられている。回転シャフト19の下端はアーム18の基端部18bに取付けられ、回転シャフト19の上端は駆動源20に取付けられている。そのため、駆動源20の回転駆動によってアーム18が回転可能となっている。なお、この駆動源20は支持部15によって支持されており、アクチュエータ17の駆動源20は、制御手段10に接続されている。 An actuator 17 is disposed above the link 13. The actuator 17 includes an arm 18 disposed along the width direction with respect to the surface of the substrate 2. The tip 18 a of the arm 18 is engaged with an engagement roller 14 attached to the link 13. On the other hand, a rotating shaft 19 extending along the width direction of the substrate 2 is attached to the proximal end 18 b of the arm 18. The lower end of the rotating shaft 19 is attached to the proximal end 18 b of the arm 18, and the upper end of the rotating shaft 19 is attached to the drive source 20. Therefore, the arm 18 can be rotated by rotational driving of the drive source 20. The drive source 20 is supported by the support portion 15, and the drive source 20 of the actuator 17 is connected to the control means 10.
 本発明の第1実施形態における製造装置1の動作を説明する。
 製造装置1における基板2の搬送および成膜について、再び図1を参照しながら説明する。巻出し室3内において、巻出しコア3aに巻き取られた基板2が、ローラ3b~3fによって駆動かつガイドされながら巻き出される。この基板2が、巻出し室3を出て、順送り方向に沿って成膜室5a~5f内に順次搬送されて、成膜室5a~5f内のそれぞれでは、基板2の表面に各種の薄膜が成膜される。成膜された基板2は、巻取り室4内に搬送され、ローラ4b~4hによって駆動かつガイドされながら、巻取りコア4aに巻き取られる。また、必要に応じて、基板2が逆送り方向に沿って搬送される。
The operation of the manufacturing apparatus 1 in the first embodiment of the present invention will be described.
The transport and film formation of the substrate 2 in the manufacturing apparatus 1 will be described with reference to FIG. 1 again. In the unwinding chamber 3, the substrate 2 wound around the unwinding core 3a is unwound while being driven and guided by the rollers 3b to 3f. The substrate 2 exits the unwinding chamber 3 and is sequentially transported in the film forming chambers 5a to 5f along the forward feeding direction, and various thin films are formed on the surface of the substrate 2 in each of the film forming chambers 5a to 5f. Is deposited. The film-formed substrate 2 is conveyed into the winding chamber 4 and wound around the winding core 4a while being driven and guided by the rollers 4b to 4h. In addition, the substrate 2 is transported along the reverse feed direction, as needed.
 順送り方向に搬送される基板2の位置調節について、図4(a)、図4(b)および図5を参照しながら説明する。検知手段9(図2(b)を参照)が、順送り方向に搬送される基板2の下方側への位置ズレを検知した場合、検知手段9は制御手段10(図2(b)を参照)に信号を送る。次に、制御手段10がアクチュエータ17の駆動源20に信号を送り、この駆動源20が、アーム18の先端部18aを逆送り方向側に移動させるように、回転制御されることとなる。このとき、アーム18の先端部18aと係合する係合ローラ14も逆送り方向側に移動し、リンク13はリンク回転軸13bを中心に回転する。その結果、第1のグリップローラ6が、基板2の表面に沿って、第1のグリップローラ6の下側を順送り方向側に向けるように、基板2の幅方向に対して傾斜角度θ傾けられることとなる。すなわち、第1のグリップローラ6は、基板2の順送り方向に対して上方側に傾けたられた状態となる。なお、第1のグリップローラ6が傾斜角度θ傾いた状態では、リンク13は、付勢手段16によって第1のグリップローラ6を中立状態に復帰させるように付勢される。 The positional adjustment of the substrate 2 transported in the forward direction will be described with reference to FIGS. 4 (a), 4 (b) and 5. FIG. When the detection means 9 (see FIG. 2 (b)) detects a downward displacement of the substrate 2 transported in the forward direction, the detection means 9 controls the control means 10 (see FIG. 2 (b)) Send a signal to Next, the control means 10 sends a signal to the drive source 20 of the actuator 17, and this drive source 20 is controlled to rotate so as to move the tip 18a of the arm 18 in the reverse feed direction. At this time, the engagement roller 14 engaged with the tip 18a of the arm 18 also moves in the reverse feeding direction, and the link 13 rotates about the link rotation shaft 13b. As a result, the first grip roller 6, along the surface of the substrate 2, so as to direct the lower side of the first grip roller 6 in the forward direction, the inclination angle theta 1 is inclined with respect to the width direction of the substrate 2 It will be That is, the first grip roller 6 is inclined upward with respect to the forward feeding direction of the substrate 2. In a state where the first grip roller 6 is tilted inclination angle theta 1, link 13 is biased to the first gripping roller 6 by the biasing means 16 so as to return to the neutral state.
 逆送り方向に搬送される基板2の位置調節について、図6(a)、図6(b)および図7を参照しながら説明する。検知手段9(図2(b)を参照)が、逆送り方向に搬送される基板2の下方側への位置ズレを検知した場合、検知手段9は制御手段10(図2(b)を参照)に信号を送る。次に、制御手段10はアクチュエータ17の駆動源20に信号を送り、駆動源20がアーム18の先端部18aを順送り方向側に移動させるように回転制御される。このとき、アーム18の先端部18aと係合する係合ローラ14も順送り方向側に移動し、リンク13はリンク回転軸13bを中心に回転する。その結果、第1のグリップローラ6が、基板2の表面に沿って、第1のグリップローラ6の下側を逆送り方向側に向けるように、基板2の幅方向に対して傾斜角度θ傾けられることとなる。すなわち、第1のグリップローラ6は、基板2の逆送り方向に対して上方側に傾けたられた状態となる。なお、第1のグリップローラ6が傾斜角度θ傾いた状態で、リンク13は、付勢手段16によって第1のグリップローラ6を中立状態に復帰させるように付勢される。 The position adjustment of the substrate 2 transported in the reverse feed direction will be described with reference to FIGS. 6 (a), 6 (b) and 7. FIG. When the detection means 9 (see FIG. 2 (b)) detects a downward displacement of the substrate 2 transported in the reverse feed direction, the detection means 9 refers to the control means 10 (FIG. 2 (b)). Send a signal to). Next, the control means 10 sends a signal to the drive source 20 of the actuator 17, and the drive source 20 is controlled to rotate so as to move the tip 18a of the arm 18 in the forward direction. At this time, the engagement roller 14 engaged with the leading end 18a of the arm 18 also moves in the forward feeding direction, and the link 13 rotates around the link rotation shaft 13b. As a result, the first grip roller 6 has an inclination angle θ 2 with respect to the width direction of the substrate 2 so that the lower side of the first grip roller 6 faces the reverse direction along the surface of the substrate 2. It will be tilted. That is, the first grip roller 6 is inclined upward with respect to the reverse feeding direction of the substrate 2. Incidentally, in a state where the first grip roller 6 is tilted inclination angle theta 2, the link 13 is biased to the first gripping roller 6 by the biasing means 16 so as to return to the neutral state.
 ここで、第1のグリップローラ6のグリップ力が低下したことによって、十分な持ち上げ力が得られずに、位置修正した後の基板2が依然として下方側にずれていることを、検知手段9が検知した場合、第1のグリップローラ6の傾斜角度θまたはθを大きくするように、制御手段10がアクチュエータ17の駆動源20を制御し、基板2の位置調節が修正される。一方で、第1のグリップローラ6のグリップ力が高すぎることによって、持ち上げ力が高くなり、位置修正した後の基板2が上方側にずれていることを、検知手段9が検知した場合、第1のグリップローラ6の傾斜角度θまたはθを小さくするように、制御手段10がアクチュエータ17の駆動源20を制御し、基板2の位置調節が修正される。 Here, as the grip force of the first grip roller 6 is reduced, a sufficient lift force can not be obtained, and the detection means 9 indicates that the substrate 2 after position correction is still shifted downward. when detecting, so as to increase the inclination angle theta 1 or theta 2 of the first gripping roller 6, the control unit 10 controls the drive source 20 of the actuator 17, the position adjustment of the substrate 2 is modified. On the other hand, when the detection means 9 detects that the substrate 2 after position correction has deviated to the upper side, the lifting force becomes high because the grip force of the first grip roller 6 is too high. so as to reduce the first angle of inclination theta 1 or theta 2 of the grip roller 6, the control unit 10 controls the drive source 20 of the actuator 17, the position adjustment of the substrate 2 is modified.
 [第2実施形態]
 本発明の第2実施形態における薄膜積層体の製造装置について以下に説明する。第2実施形態における薄膜積層体の製造装置の基本的な構成は、第1実施形態における薄膜積層体の製造装置と同様になっている。第1実施形態と同様な要素は、第1実施形態と同様の符号および名称を用いて説明する。ここでは、第1実施形態と異なる構成について説明する。
Second Embodiment
The manufacturing apparatus of the thin film laminated body in 2nd Embodiment of this invention is demonstrated below. The basic configuration of the thin film stack manufacturing apparatus according to the second embodiment is the same as the thin film stack manufacturing apparatus according to the first embodiment. The same elements as in the first embodiment will be described using the same reference numerals and names as in the first embodiment. Here, a configuration different from the first embodiment will be described.
 図8に示すように、さらに基板2の下端部を挟むように構成された一対の第2のグリップローラ6’が設けられている。第2のグリップローラ6’は、第1のグリップローラ6と同様に、回転軸6a’と外周表面6b’とを有する。また、図示はしないが、第2のグリップローラ6’を、その外周表面6bを基板2の表面に沿わせて、かつ第2のグリップローラ6’を、搬送方向に対して下方側に傾け可能とするとともに、搬送方向に対して順送り方向および逆送り方向の両方に向けて傾けるように傾斜方向および傾斜角度を調節可能とする第2の角度調節機構が設けられている。この第2の角度調節機構の基本的な構成は、第2のグリップローラ6’に対応するとともに、第1の角度調節機構11と同様になっている。なお、図8では、基板2が順送り方向(矢印Aで示す)に送られている状態を示しており、第2のグリップローラ6’は、順送り方向に送られる基板2に対応して第2のグリップローラ6’の上側を順送り方向に向けて傾けた状態となっている。 As shown in FIG. 8, a pair of second grip rollers 6 ′ configured to further sandwich the lower end portion of the substrate 2 is provided. Similar to the first grip roller 6, the second grip roller 6 'has a rotating shaft 6a' and an outer peripheral surface 6b '. Further, although not shown, the second grip roller 6 'can be inclined along the outer circumferential surface 6b of the substrate 2 with the second grip roller 6' downward with respect to the transport direction. In addition, a second angle adjustment mechanism is provided which can adjust the tilt direction and the tilt angle so as to tilt in both the forward feeding direction and the reverse feeding direction with respect to the transport direction. The basic configuration of the second angle adjustment mechanism corresponds to the second grip roller 6 ′ and is similar to the first angle adjustment mechanism 11. Note that FIG. 8 shows a state in which the substrate 2 is sent in the forward feeding direction (indicated by the arrow A), and the second grip roller 6 ′ is the second corresponding to the substrate 2 sent in the forward feeding direction. The upper side of the grip roller 6 'is inclined in the forward feeding direction.
 以上のように本発明の第1実施形態および第2実施形態によれば、第1および/または第2のグリップローラ6,6’が、第1の角度調節機構11および/または第2の角度調節機構によって、基板2の搬送方向における順送り方向および逆送り方向の両方に向けて傾けるように傾斜方向および傾斜角度を調節可能となっているので、順送り方向および逆送り方向に搬送される基板2の両方に対して、高い精度で位置調節できる。 As described above, according to the first embodiment and the second embodiment of the present invention, the first and / or second grip rollers 6, 6 'are the first angle adjustment mechanism 11 and / or the second angle. The adjustment mechanism makes it possible to adjust the inclination direction and the inclination angle so as to incline in both the forward feed direction and the reverse feed direction in the transport direction of the substrate 2, so that the substrate 2 is transported in the forward feed direction and the reverse feed direction. The position can be adjusted with high accuracy for both
 本発明の第1実施形態および第2実施形態によれば、例えば、第1のグリップローラ6の摩耗などによって、第1のグリップローラ6のグリップ力が低下して、基板2を持上げる力が十分に得られない場合に、第1のグリップローラ6の傾斜を大きくすれば、基板2の幅方向の移動量を大きくして、基板2の位置調節を修正できる。そのため、第1のグリップローラ6により基板2を挟む力を増加させず、基板2に余分な負荷がかかることを防止できる。一方で、第1のグリップローラ6のグリップ力がバラツキなどにより高くなりすぎて、基板2を持上げる力が大きすぎる場合に、第1のグリップローラ6の傾斜を小さくすれば、基板2の幅方向の移動量を小さくして、基板2の位置調節を修正できる。よって、基板2の位置調節精度が低下することを防止できる。 According to the first embodiment and the second embodiment of the present invention, for example, the grip force of the first grip roller 6 is reduced due to the wear of the first grip roller 6, and the force for lifting the substrate 2 is If the inclination of the first grip roller 6 is increased, the displacement of the substrate 2 in the width direction can be increased, and the positional adjustment of the substrate 2 can be corrected. Therefore, it is possible to prevent an excessive load from being applied to the substrate 2 without increasing the force for sandwiching the substrate 2 by the first grip roller 6. On the other hand, when the grip force of the first grip roller 6 is too high due to variation or the like and the force for lifting the substrate 2 is too large, the width of the substrate 2 can be reduced by decreasing the inclination of the first grip roller 6. The positional adjustment of the substrate 2 can be corrected by reducing the amount of movement of the direction. Therefore, the positional adjustment accuracy of the substrate 2 can be prevented from decreasing.
 ここまで本発明の実施形態について述べたが、本発明は既述の実施形態に限定されるものではなく、本発明の技術的思想に基づいて各種の変形および変更が可能である。 Although the embodiments of the present invention have been described above, the present invention is not limited to the above-described embodiments, and various modifications and changes are possible based on the technical idea of the present invention.
 本発明の実施形態の第1変形例として、第1および/または第2のグリップローラ6,6’は、その基板2を挟む力(以下、「基板挟持力」と呼ぶ)を調節可能に構成されてもよい。例えば、第1のグリップローラ6のグリップ力が低下したことによって、基板2を持ち上げる力が十分に得られずに、位置修正した後の基板2が依然として下方側にずれていることを、検知手段9が検知した場合、一対の第1のグリップローラ6における基板挟持力を大きくするように、制御手段10が一対の第1のグリップローラ6を制御して、基板2の位置調節が修正されてもよい。一方で、第1のグリップローラ6のグリップ力が高すぎることによって、基板2を持ち上げる力が高くなり、位置修正した後の基板2が上方側にずれていることを、検知手段9が検知した場合、一対の第1のグリップローラ6における基板挟持力を小さくするように、制御手段10が一対の第1のグリップローラ6を制御して、基板2の位置調節が修正されてもよい。本発明の実施形態と同様の効果が得られる。 As a first modification of the embodiment of the present invention, the first and / or second grip rollers 6, 6 'are configured to be able to adjust the force to hold the substrate 2 (hereinafter referred to as "substrate holding force"). It may be done. For example, as the grip force of the first grip roller 6 is reduced, a sufficient lifting force for the substrate 2 can not be obtained, and it is detected that the substrate 2 after position correction is still shifted downward. When 9 is detected, the control means 10 controls the pair of first grip rollers 6 so that the substrate gripping force of the pair of first grip rollers 6 is increased, and the position adjustment of the substrate 2 is corrected. It is also good. On the other hand, when the grip force of the first grip roller 6 is too high, the force for lifting the substrate 2 is high, and the detection means 9 detects that the substrate 2 after position correction is shifted upward. In this case, the control unit 10 may control the pair of first grip rollers 6 to correct the positional adjustment of the substrate 2 so as to reduce the substrate gripping force between the pair of first grip rollers 6. The same effect as the embodiment of the present invention can be obtained.
 本発明の実施形態の第2変形例として、巻出し室3および成膜室5aの間の搬送区間と、5つの隣接する成膜室同士間の搬送区間と、巻取り室4および成膜室5fの間の搬送区間との少なくとも1つに、第1および/または第2のグリップローラ6,6’が設けられる構成であってもよく、第1および/または第2のグリップローラ6,6’を設けた搬送区間の数は基板2を最適に位置調節するように変更可能である。加えて、各搬送区間に設けられる第1および/または第2のグリップローラ6,6’の数が2つ以上であってもよい。本発明の実施形態と同様の効果が得られる。 As a second modification of the embodiment of the present invention, the transport section between the unwinding chamber 3 and the film forming chamber 5a, the transport section between five adjacent film forming chambers, the winding chamber 4 and the film forming chamber The first and / or second grip rollers 6, 6 'may be provided in at least one of the conveyance sections between 5f, and the first and / or second grip rollers 6, 6' may be provided. The number of transport sections provided with 'can be varied to optimally position the substrate 2. In addition, the number of first and / or second grip rollers 6, 6 'provided in each conveyance section may be two or more. The same effect as the embodiment of the present invention can be obtained.
 本発明の実施形態の第3変形例として、ローラ取付部12の代わりに第1および/または第2のグリップローラ6,6’を回転させるための駆動源が設けられて、第1および/または第2のグリップローラ6,6’が駆動源によって自ら回転可能に構成されていてもよい。また、この駆動源が制御手段10に接続されて、第1および/または第2のグリップローラ6,6’の回転が制御されてもよい。本発明の実施形態と同様の効果が得られる。 As a third modification of the embodiment of the present invention, a drive source for rotating the first and / or second grip rollers 6, 6 'instead of the roller mounting portion 12 is provided, the first and / or the first. The second grip rollers 6, 6 'may be configured to be rotatable by the drive source. Also, this drive source may be connected to the control means 10 to control the rotation of the first and / or second grip rollers 6, 6 '. The same effect as the embodiment of the present invention can be obtained.
 [実施例]
 本発明の第1実施形態の製造装置1を用いた実施例を説明する。本発明の実施例では、一対の第1のグリップローラ6における基板挟持力を4.4N、8.9Nまたは16.3Nとした場合において、第1のグリップローラ6の傾斜角度θまたはθを0°~8°の間で変化させたとき、一対の第1のグリップローラ6における基板2を持上げる力(以下、「持上げ力」という)Fの変化を測定した。
[Example]
An example using the manufacturing apparatus 1 of the first embodiment of the present invention will be described. In the embodiment of the present invention, when the substrate gripping force between the pair of first grip rollers 6 is 4.4 N, 8.9 N or 16.3 N, the inclination angle θ 1 or θ 2 of the first grip roller 6 Was changed between 0 ° and 8 °, a change in the lifting force F (hereinafter referred to as “lifting force”) of the pair of first grip rollers 6 was measured.
 図9では、第1のグリップローラ6の傾斜角度θまたはθと、第1のグリップローラ6の基板2の持上げ力Fとの関係について、基板挟持力が4.4Nである場合を実線Pで示し、基板挟持力が8.9Nである場合を破線Qで示し、基板挟持力が16.3Nである場合を一点鎖線Rで示す。 In FIG. 9, the relationship between the tilt angle θ 1 or θ 2 of the first grip roller 6 and the lifting force F of the substrate 2 of the first grip roller 6 is a solid line when the substrate gripping force is 4.4 N. A broken line Q indicates a case where the substrate holding force is 8.9 N, and a dashed dotted line R indicates a case where the substrate holding force is 16.3 N.
 図9を参照すると、傾斜角度θまたはθを増加させたときに、持上げ力Fも比例して増加していることが確認できる。例えば、基板2を持上げる力Fを約2N得ようとするならば、基板挟持力が4.4Nである場合、傾斜角度θまたはθを約3.5°とするとよい。基板挟持力が8.9Nである場合には、傾斜角度θまたはθを約2°とするとよい。基板挟持力が16.3Nである場合には、傾斜角度θまたはθを約1°とするとよい。以上より、本発明の実施例においては、一対の第1のグリップローラ6における基板挟持力を増加させる代わりに、第1のグリップローラ6の傾斜角度θまたはθを増加させることによって、持上げ力Fが増加する関係について確認できた。 Referring to FIG. 9, it can be confirmed that the lifting force F is also proportionally increased when the inclination angle θ 1 or θ 2 is increased. For example, if it is intended to obtain a force F for lifting the substrate 2 of about 2N, the tilt angle θ 1 or θ 2 may be about 3.5 ° when the substrate holding force is 4.4N. When the substrate holding force is 8.9 N, the inclination angle θ 1 or θ 2 may be approximately 2 °. When the substrate gripping force is 16.3 N, the inclination angle θ 1 or θ 2 may be approximately 1 °. From the above, in the embodiment of the present invention, instead of increasing the substrate holding force in the first gripping roller 6 of the pair, by increasing the inclination angle theta 1 or theta 2 of the first gripping roller 6, lifting We could confirm the relationship that force F increases.
1 薄膜積層体の製造装置(製造装置)
2 フィルム基板(基板)
6 第1のグリップローラ
6’ 第2のグリップローラ
6a,6a’ 回転軸
6b,6b’ 外周表面
9 検知手段
11 角度調節機構
A,B,C,D,D’,D’’ 矢印
F 持上げ力
θ,θ 傾斜角度
P 実線
Q 破線
R 一点鎖線
1 Production device for thin film laminate (production device)
2 Film substrate (substrate)
6 first grip roller 6 'second grip roller 6a, 6a' rotation shaft 6b, 6b 'outer peripheral surface 9 detection means 11 angle adjustment mechanism A, B, C, D, D', D '' arrow F lifting force θ 1 , θ 2 Inclination angle P Solid line Q Broken line R Dot-and-dash line

Claims (4)

  1.  帯状のフィルム基板を、その幅方向について片端部を上側とした縦姿勢で配置して搬送するフィルム基板の搬送装置であって、
     前記フィルム基板の上端部を挟むように配設される少なくとも一対の第1のグリップローラと、
     前記第1のグリップローラの回転軸角度が前記第1のグリップローラの回転方向を搬送方向に対して上方側とするように傾け可能となるように、前記第1のグリップローラの傾斜方向および傾斜角度を調節可能とする第1の角度調節機構と
     を備えているフィルム基板の搬送装置。
    A film substrate conveying apparatus for arranging and conveying a strip-shaped film substrate in a vertical posture with one end on the upper side in the width direction,
    At least a pair of first grip rollers disposed so as to sandwich the upper end portion of the film substrate;
    Inclination direction and inclination of the first grip roller so that the rotation axis angle of the first grip roller can be inclined so that the rotation direction of the first grip roller is on the upper side with respect to the transport direction And a first angle adjusting mechanism capable of adjusting the angle.
  2.  前記フィルム基板の下端部を挟むように配設される少なくとも一対の第2のグリップローラと、
     前記第2のグリップローラの回転軸角度が前記第2のグリップローラの回転方向を搬送方向に対して下方側とするように傾け可能となるように、前記第2のグリップローラの傾斜方向および傾斜角度を調節可能とする第2の角度調節機構と
     をさらに備えている請求項1に記載のフィルム基板の搬送装置。
    At least a pair of second grip rollers disposed to sandwich the lower end portion of the film substrate;
    Inclination direction and inclination of the second grip roller so that the rotation axis angle of the second grip roller can be inclined so that the rotation direction of the second grip roller is lower with respect to the conveyance direction The film substrate transport apparatus according to claim 1, further comprising: a second angle adjustment mechanism capable of adjusting the angle.
  3.  前記フィルム基板の幅方向端部の高さ位置を検知する検知手段をさらに備え、
     前記検知手段が前記フィルム基板の位置ズレを検知すると、前記第1のグリップローラおよび/または前記第2のグリップローラが、前記第1の角度調節機構および/または前記第2の角度調節機構によって、前記フィルム基板の搬送方向に対応した傾斜方向に傾けられるように制御される、請求項1または2に記載のフィルム基板の搬送装置。
    It further comprises detection means for detecting the height position of the widthwise end of the film substrate,
    When the detection means detects displacement of the film substrate, the first grip roller and / or the second grip roller are operated by the first angle adjustment mechanism and / or the second angle adjustment mechanism. The film substrate transport device according to claim 1, wherein the transport device is controlled to be inclined in a tilt direction corresponding to the transport direction of the film substrate.
  4.  前記第1の角度調節機構および/または前記第2の角度調節機構が、前記基板の位置ズレを修正するために前記第1のグリップローラおよび/または前記第2のグリップローラの傾斜角度を変化させるように制御される、請求項1~3のいずれか一項に記載のフィルム基板の搬送装置。
     
    The first angle adjusting mechanism and / or the second angle adjusting mechanism change the inclination angle of the first grip roller and / or the second grip roller in order to correct the displacement of the substrate. The film substrate transport apparatus according to any one of claims 1 to 3, which is controlled as follows.
PCT/JP2010/070787 2009-12-14 2010-11-22 Conveyance device for film substrate WO2011074381A1 (en)

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