WO2011063310A3 - Physical vapor deposition (pvd) and cold anodization metal coloring - Google Patents

Physical vapor deposition (pvd) and cold anodization metal coloring Download PDF

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Publication number
WO2011063310A3
WO2011063310A3 PCT/US2010/057537 US2010057537W WO2011063310A3 WO 2011063310 A3 WO2011063310 A3 WO 2011063310A3 US 2010057537 W US2010057537 W US 2010057537W WO 2011063310 A3 WO2011063310 A3 WO 2011063310A3
Authority
WO
WIPO (PCT)
Prior art keywords
niobium
cold
anodized
pvd
coated metallic
Prior art date
Application number
PCT/US2010/057537
Other languages
French (fr)
Other versions
WO2011063310A2 (en
Inventor
Rui Zhao
Reed John Niederkorn
Kan ZHENG
Jun Wang
Xianqiu Liu
Original Assignee
Laird Technologies, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Laird Technologies, Inc. filed Critical Laird Technologies, Inc.
Priority to TW099140303A priority Critical patent/TW201221700A/en
Publication of WO2011063310A2 publication Critical patent/WO2011063310A2/en
Publication of WO2011063310A3 publication Critical patent/WO2011063310A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/26—Anodisation of refractory metals or alloys based thereon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/028—Physical treatment to alter the texture of the substrate surface, e.g. grinding, polishing
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment

Abstract

Exemplary embodiments of the present disclosure include colored metallic articles, which may include cold anodized, niobium-coated metallic substrates. Also disclosed herein are exemplary embodiments of methods relating to and/or for providing colored metallic articles, which may include cold anodized, niobium-coated metallic substrates. In an example embodiment, an article generally includes an anodized, niobium-coated metallic substrate having a hardness equal to or greater than about 350 HV (the Vickers Diamond Pyramid Hardness Number). An exemplary embodiment of a method generally includes anodizing a niobium-coated metallic substrate, such as to a hardness equal to or greater than about 350 HV (Vickers Diamond Pyramid Hardness Number) and/or at a temperature within a temperature range from about 0 degrees Celsius to about 5 degrees Celsius and with an electrical current within an electrical current range not exceeding about 1.5 Amps.
PCT/US2010/057537 2009-11-20 2010-11-20 Physical vapor deposition (pvd) and cold anodization metal coloring WO2011063310A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW099140303A TW201221700A (en) 2010-11-20 2010-11-22 Physical vapor deposition (PVD) and cold anodization metal coloring

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN2009102246128A CN102071448A (en) 2009-11-20 2009-11-20 PVD (Physical Vapor Deposition) and coloring of cold anodic oxidized metal
CN200910224612.8 2009-11-20

Publications (2)

Publication Number Publication Date
WO2011063310A2 WO2011063310A2 (en) 2011-05-26
WO2011063310A3 true WO2011063310A3 (en) 2011-10-13

Family

ID=44030197

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2010/057537 WO2011063310A2 (en) 2009-11-20 2010-11-20 Physical vapor deposition (pvd) and cold anodization metal coloring

Country Status (2)

Country Link
CN (1) CN102071448A (en)
WO (1) WO2011063310A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102534723B (en) * 2011-11-30 2015-03-11 景德镇陶瓷学院 Preparation method for ultrafast anode self-assembly double-pass porous nanometer ternary oxide and products prepared through same and purpose of products
DE102013015987B3 (en) * 2013-09-26 2015-03-26 Ic!-Berlin Brillen Gmbh Spectacle frame and method for producing a spectacle frame
CN104073856A (en) * 2014-06-26 2014-10-01 深圳惠科精密工业有限公司 Method for oxidating metal part
CN109652838B (en) * 2018-12-27 2021-05-18 浙江工业大学 Titanium-niobium alloy surface anodic oxidation coloring method
WO2024016182A1 (en) * 2022-07-19 2024-01-25 得利钟表制品厂有限公司 Surface modification method, color change method, and article

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05239692A (en) * 1991-11-27 1993-09-17 Electro Chem Eng Gmbh Method for producing oxide ceramic layer reformed at need on metal foaming barrier layer and article produced therefrom
JPH0660436B2 (en) * 1986-03-28 1994-08-10 ユ ツオン リユ Protective film for tantalum, niobium or its alloy articles and method for producing the same
KR20070060111A (en) * 2004-10-12 2007-06-12 미쓰비시 가가꾸 가부시키가이샤 Electrolyte solution, method for forming oxide coating film using same, multilayer body and method for producing same, and metal oxide film

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0660436B2 (en) * 1986-03-28 1994-08-10 ユ ツオン リユ Protective film for tantalum, niobium or its alloy articles and method for producing the same
JPH05239692A (en) * 1991-11-27 1993-09-17 Electro Chem Eng Gmbh Method for producing oxide ceramic layer reformed at need on metal foaming barrier layer and article produced therefrom
KR20070060111A (en) * 2004-10-12 2007-06-12 미쓰비시 가가꾸 가부시키가이샤 Electrolyte solution, method for forming oxide coating film using same, multilayer body and method for producing same, and metal oxide film

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
BIASON GOMES, M. A. ET AL.: "Anodization of niobium in sulphuric acid media", JOURNAL OF APPLIED ELECTROCHEMISTRY, vol. 21, no. 11, 1991, pages 1023 - 1026 *
HABAZAKI, H. ET AL.: "Growth of anodic oxide films on oxygen-containing niobium", ELECTROCHIMICA ACTA, vol. 50, 2 April 2005 (2005-04-02), pages 5334 - 5339 *

Also Published As

Publication number Publication date
WO2011063310A2 (en) 2011-05-26
CN102071448A (en) 2011-05-25

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