TW201221700A - Physical vapor deposition (PVD) and cold anodization metal coloring - Google Patents

Physical vapor deposition (PVD) and cold anodization metal coloring Download PDF

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Publication number
TW201221700A
TW201221700A TW099140303A TW99140303A TW201221700A TW 201221700 A TW201221700 A TW 201221700A TW 099140303 A TW099140303 A TW 099140303A TW 99140303 A TW99140303 A TW 99140303A TW 201221700 A TW201221700 A TW 201221700A
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Taiwan
Prior art keywords
metal substrate
coating
hardness
article
anodizing
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TW099140303A
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Chinese (zh)
Inventor
Rui Zhao
Reed John Niederkorn
Kan Zheng
Jun Wang
Xianqiu Liu
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Laird Technologies Inc
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Priority claimed from PCT/US2010/057537 external-priority patent/WO2011063310A2/en
Application filed by Laird Technologies Inc filed Critical Laird Technologies Inc
Publication of TW201221700A publication Critical patent/TW201221700A/en

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Abstract

Exemplary embodiments of the present disclosure include colored metallic articles, which may include cold anodized, niobium-coated metallic substrates. Also disclosed herein are exemplary embodiments of methods relating to and/or for providing colored metallic articles, which may include cold anodized, niobium-coated metallic substrates. In an example embodiment, an article generally includes an anodized, niobium-coated metallic substrate having a hardness equal to or greater than about 350 HV (the Vickers Diamond Pyramid Hardness Number). An exemplary embodiment of a method generally includes anodizing a niobium-coated metallic substrate, such as to a hardness equal to or greater than about 350 HV (Vickers Diamond Pyramid Hardness Number) and/or at a temperature within a temperature range from about 0 degrees Celsius to about 5 degrees Celsius and with an electrical current within an electrical current range not exceeding about 1.5 Amps.

Description

201221700 六、發明說明: 【發明所屬之技術領域】 》月主要涉及著色的金屬物件和關於及/或用於提供 者色的金屬物件的方法。 【先刖技術】 =部分提供關於本發明的背景信息,這些背景信息並 非一定是現有技術。 "便攜^終端(例如手機等)是流行的通訊方式。對於 消費者而5,在選擇和購買便攜式終端時,便攜式終端的 如顏色等美感外觀通常是一個重要因素。另一重要因素經 吊疋便攜式終端的耐用性。 【發明内容】 本。卩刀提供本發明的主要内容,這些内容不是對本發 明的全部範圍或所有特徵的综合描述。 —本發明的例示性具體實例包括著色的金屬物件,所述 著色的金屬物件可包括經冷陽氧處理的銳被覆金屬基板。 此處還公開了關於及/或用於提供著色的金屬物件的方法的 例示性具體實例,所述金屬物件可包括經冷陽極處理的銳 被覆金屬基板。 *在-個例示性具體實例中,物件主要包括硬度大於或 等於約350 HV (紙金剛石稜錐硬度數)的經陽極處理的銳 被覆金屬基板。 4 201221700 、、”陽極#例不性具體實例主要包括利用下述電流和 :度:極處理鈮被覆金屬基板,使其硬度大於或等於約35。 氏金剛石稜錐硬度數),所述電流和溫度處於用於 挺面鈮破覆金屬基板的硬度的電流範圍的溫度範圍内。 方法的另-例示性具體實例主要包括,在約〇。。〜約5 °c的溫度範圍的溫度下,使用在不超過約15安培的電流範 圍内的電流來陽極處理鈮被覆金屬基板。 通過此處所提供的描述,其他適用領域將變得顯而易 見。本發明内容中的描述和具體實例僅出於說明的目的, 並不意在限制本發明的:範圍。 【實施方式】 下面將參照附圖更加全面地描述例示性具體實例。 本發明的例示性具體實例包括著色的金屬物件,所述 著色的金屬物件可包括經冷陽極處理的鈮被覆金屬基板。 此處還公開了關於及/或用於提供著色的金屬物件的方法的 例示性具體實例’所述金屬物件可包括經冷陽極處理的銳 被覆金屬基板。 在一個例示性具體實例中,物件包括硬度等於或大於 約350 HV (維氏金剛石稜錐硬度數)的經陽極處理的鈮被 覆金屬基板。所述經陽極處理的銳被覆金屬基板可包括硬 度小於350 HV的金屬基板(例如,不銹鋼基板、鈦基板、 由其他金屬或合金製成的基板等)和一個或多個銳塗層。 僅作為實例,所述金屬基板可由起始硬度為200 HV的鈦或 201221700 J銹鋼製成。在一些實例中,金屬基板可包括具有一個或 夕個層或塗層(例如,鈦層或塗層、一個或多個由其他金 屬、合金等形成的塗層或層)的基^ (例如,由金屬、合 金'塑料等形成的基板)。在一個特定的例示性具體實: I金屬基板包括具有厚度A於丨微米的鈦層的不錄鋼, 圮使传鈦由此形成不銹鋼與鈮之間的插入層。 為提阿硬度,可以對鈮被覆金屬基板進行冷陽極處理 ^ 在0 c〜約5 °c的溫度範圍内的溫度等),直至其 硬度至少為35GHV以上。提高硬度可以改善耐到擦性、: #于磨f •生等。僅作為實例,經陽極處理的鈮被覆金屬 二板在—些具體實例式中可具有等於約350 HV的硬度,或201221700 VI. Description of the invention: [Technical field to which the invention pertains] The month mainly relates to colored metal objects and methods for and/or for providing metallic objects. [Priority Technology] = Partially providing background information about the present invention, which is not necessarily prior art. "Portable^ terminals (such as mobile phones) are popular communication methods. For the consumer 5, when selecting and purchasing a portable terminal, the aesthetic appearance of the portable terminal such as color is usually an important factor. Another important factor is the durability of the portable terminal. SUMMARY OF THE INVENTION This is a book. The present invention provides the main content of the present invention, which is not a comprehensive description of the full scope or all of the features of the present invention. - Illustrative specific examples of the invention include colored metal articles, which may include a cold coated oxygen-treated, sharp-coated metal substrate. Illustrative embodiments of a method for and/or for providing a colored metal article, which may include a cold-anodized, sharp-coated metal substrate, is also disclosed herein. * In an exemplary embodiment, the article primarily comprises an anodized, sharply coated metal substrate having a hardness greater than or equal to about 350 HV (paper diamond pyramid hardness number). 4 201221700, "Anode #examples of the specific examples mainly include the use of the following current and: degree: extremely treated 铌 coated metal substrate, so that its hardness is greater than or equal to about 35. The hardness of the diamond pyramid), the current and The temperature is in a temperature range for the current range of the hardness of the metal substrate for the facet. The other exemplary embodiment of the method mainly includes, at a temperature ranging from about 〇 to about 5 ° C, using The ruthenium-coated metal substrate is anodized at a current in a current range of no more than about 15 amps. Other areas of applicability will become apparent from the description provided herein. The description and specific examples in this summary are for illustrative purposes only. The present invention is not intended to limit the scope of the invention. [Embodiment] Exemplary embodiments will be described more fully hereinafter with reference to the accompanying drawings. Illustrative embodiments of the invention include colored metal articles, which may include The cold anodized tantalum is coated with a metal substrate. Examples of methods for and/or for providing colored metal objects are also disclosed herein. The metal article may comprise a cold-anoded, sharp-coated metal substrate. In an illustrative embodiment, the article comprises anodized with a hardness equal to or greater than about 350 HV (Vickers diamond hardness) The ruthenium-coated metal substrate may include a metal substrate having a hardness of less than 350 HV (for example, a stainless steel substrate, a titanium substrate, a substrate made of other metals or alloys, etc.) and one or more Sharp coating. By way of example only, the metal substrate may be made of titanium having a starting hardness of 200 HV or 201221700 J. In some examples, the metal substrate may include one or a layer or coating (eg, a base of a titanium layer or coating, one or more coatings or layers formed of other metals, alloys, etc. (for example, a substrate formed of a metal, an alloy 'plastic, etc.). In a specific exemplary embodiment: The I metal substrate comprises a non-recorded steel having a titanium layer having a thickness A of 丨μm, and the titanium is used to thereby form an intercalation layer between the stainless steel and the crucible. The coated metal substrate is subjected to cold anodic treatment ^ at a temperature ranging from 0 c to about 5 ° C, etc. until the hardness is at least 35 GHV. The hardness is improved to improve the rub resistance, and: By way of example only, an anodized tantalum coated metal plate may have a hardness equal to about 350 HV in some specific examples, or

在另-些具體實例中可具有約彻hv〜約刚 度,肖去· A 一 些具體實例中具有等於約400 HV的硬度, 或者在另一此且辟辱t 此 …、體貫例中具有專於約800 HV的硬度。在一 i,\例中、’可根據終端用戶或消費者的需要而調整硬 極,理、ft可通過改變一個或多個鈮塗層的厚度及/或改變陽 =理過程的-個或多個參數(例如,持續時間等)來進 積在ΪΓί具體實例中,通過物理氣相沉積(pvd)將銳沉 射、i弧n。可用於沉積鈮的例示性pvd過程包括磁控濺 蒸發及/或鐵濺射m具體實例< 例包括第—Γ銳被覆或沉積。例如’一些例示性具體實 具體實例二銳的物理氣相沉積。另外,一些例示性 L括位於鈮與基板的一種或多種基材(例如, 6 201221700 不銹鋼、鈦基板、其他金屬、合金、非金屬、 土材、等等)之間的一個或多個插入材料層或塗層(例如 鈦層或塗層、碳化鉻層'或塗層、氮化鉻層或塗層、碳化鈦 層或塗層、氮化鈦層或塗層、一個或多個由其他金屬、= 金等製成的塗層或層)。在一個特定的例示性具體實例中σ, 金屬基板包括具有厚$大於丨微米的鈦層或塗層的不銹 鋼。在泫例示性具體實例中,鈮被沉積在鈦上。 在各種例示性具體實例中,金屬基板包括被覆有銳的 上側和下側或者平坦表面。金屬基板的上側和下側均可包 括至少-個厚度為約〇」微米〜約3微求之間(例如,二 试米厚、1微米厚、2微米厚、3微米厚等)的鈮塗層。替 代性的具體實例可包括上側和下财僅有—側具有厚度為 約〇·1微米〜約3鮮的錕塗層的金屬基板。其他具^例 可:括金屬基板的邊緣;被覆有鈮。另外一些具體實例可包 括-個或多厚度未落入0」微米〜3微米的範圍内( 度大於3微米)的銳塗層。 士上所述,可以對鈮被覆金屬基板進行冷陽極處理以 提:硬度。除了提高硬度之外,冷陽極處理還可實現選擇 =色或顏色選擇。在陽極處理過程中,陽極處理電壓決 的厚度。氧化層的厚度又決定產生什麼顏色。形 决於氧化層的厚度,且產生於氧化表面反射的 涉。因此,可2面並由下面的金屬表面反射的光線的干 y^通過控制陽極處理電壓來選擇顏色。在一 些例示性具體實例中,陽極處理電壓可以例如至少部分地 201221700 根據選擇的顏色而落在約2〇 、力120伏的範圍内。 b處所公開的例示性過条。$ + Λ, ^ ^ ^ , 注過粒和方法,本發明的例示 !生具體貫例能夠在整個二維 « / . Μ ^ τ —維表面上實現豐富、均勻 及/或穩疋的著色。可以選擇、 鞏此欲胂m 谭凋整及/或設計著色,以滿足 '二、而用戶或消費者的需 色彩設計進行定制… 擇性者色可實現通過 或增加包含選摆識、改進美感外觀及/ D f, ' 物件(例如,外殼和電池蓋等) 費者的吸引力,或者增加電子設備(例如,膝 二:機、電腦游戲機等)或便攜式㈣(例如,手機 的其它外部特徵對消費者的吸引力。 另外,各種例示性具體實 的,W ^ k 耳例中的者色也可以是可再現 1歹J如規格為小於百分 —_ 圍的不同的顏… 。&極處理過程可產生大範 的顏色,包括白色、黑色、灰色 香檳多人匕灸巳、銀色、 '已知色、玫瑰紅色、紅色、p g t A 技 色 '鞋& 、巴梪色、黃色、綠色、青 藍色、靛藍色和紫色。 上例不性具體實例包括在經 基板的至少一 p八““ W被覆金屬 樹脂塗層f^ 4 )有至少一個 層(例如,聚胺甲酸,醋樹脂、紫外線固化樹脂、 ⑹平^宜的聚合物、等等)。樹脂塗層可對物件提供防指 出乎音外,本發明人已發現’樹脂塗層還會提供-個 提高物件咖 了用性“的耐用性又可以 牛(例如,電池蓋、電子設備外殼、手持妒詈 '、而卜。Ρ元件等)或包含該物件的產品(例如,手機 H便攜式終端等)的使用期或壽命,並改善其耐磨性。 8 201221700 樹脂塗層還可以改善強度和硬度。 此處還公開了例如關.於及/或用於提供著色的金屬物件 的方法等方法的例示性!具體實例。在例示性具體實例中, 方法包括利用下述電流和溫度,陽極處理鈮被覆金屬基板 (例如,硬度為約27〇 HV的鈦被覆不銹鋼基板等),其硬 度大於或等於約350 HV (維氏金剛石稜錐硬度數),所述 電流和溫度分別處於有助於提高鈮被覆金屬基板的硬度的 電流範圍(例如,約0它〜約等)内。在另一例示性具 體實例中,方法包括,在約代〜約51等)内。在另一例 不性具體實例中’方法^包括,在約代〜約5。〇的溫度範圍 内的溫度下,使用在不超過約5安培的電流範圍内的電流 來陽極處理鈮被覆金屬基板。 作為實例,陽極處理溫度可以$ 、5〇c或者為二者 之間的某些溫度(例如,2=c、2 5它、31、4<t、等等)。 另外’在整個陽極處理過程中,陽極處理不必在值溫下發 生相反’在一些具體實例中,陽極處理過程中的陽極處 理溫度可以波動,例如〇 〇Γ 1J如υ匕〜5 c。在其他具體實例中,在 整個或部分的陽極處理過程中 。 3Q往Τ 陽極處理溫度可以超過5 °C及/或低於〇°c。如此虚八 匕處所a開的’陽極處理溫度優選足 夠低或保持足夠低,以使作鼻陽拉南π & 使tF為%極處理的結果,鈮被覆金 屬基板的硬度得到提高。相 相比之下,在室溫(20〇C〜25。(:) "F的陽極處理通常不會潘姑4 如^ τ |更材枓的起始硬度得到任何提高。 在各種例示性具體實你丨& 金屬美板(你丨^ . 可以利用冷陽極處理將鈮被覆 ,土 ,。%極處理之前起始硬度為約27〇 HV並具 201221700 有1 〇微米以上厚度的鈦層/塗層的鈦被覆不銹鋼基板等 等)的硬度提高至35〇 HV以上的硬度(例如,350 HV、400 .·· HV、800 HV、400 HV〜800 HV範圍’内的硬度值、等等)。 溫度範圍和電流範圍可實現較慢的沉積、較高的塗層 密度、避免電流完全穿透金屬基板上的鈮塗層及/或更均勻 的著色。例如’利用較低的陽極處理溫度(例如,在〜 5 C的範圍内等)有助於防止陽極處坦溶液的溫度變得過高 和防止電流穿透鈮塗層。這還可以提高塗層密度。 為保持電流不超過1.5安培,在至少陽極處理的早期階 段,可以控制或抑制電流。在陽極處理的早期階段中,如 果未得到控制或抑制,起始電流傾向於較高。在例示性具 體實例中,可以控制或抑制電流,使得在陽極處理開始時 或早期階段中,電流可為約丨安培〜約15安培之間。接近 陽極處理結束時,電流可能為約〇〇1安培〜約〇1〇安培之 間,因為在已產生著色層之後(如此處所公開的),表面 將實質上作為較大的電阻工作或運行。 在各種例示性具體實例中,通過使用串聯的1〇歐姆〜 5〇〇歐姆的電阻(例如,具有隨時間而變的電阻的電阻器或 具有恆定電阻的電阻器)控制或抑制電流。工作中,串聯 的10歐姆〜500歐姆的電阻可以降低回路電流,將陽極處 理過程中的電流保持為15安培以下。這—點又有助於防止 電流穿透鈮塗層…卜,較低的電流可以減緩沉積速率和 降低陽極處理速度,這會使陽極處理過程更易於控制及/或 可實現將顏色製作得更加均勻。 201221700 陽極處理溶液可包含磷酸(H3p〇4 )、石肖酸(HN〇3 )、 硫酸(H2S04 )、水(h2〇 )和三乙醇胺(TEA )。在一個 例示性具體實例中,陽燁處理溶液包含1份磷酸(H3P〇4 )、 2份硝酸(HN〇3 )、4份硫酸(h2S04 )、9份水(H2〇 )和 1伤二乙醇胺(tea )。在其他具體實例中也可以使用替代 性陽極處理溶液。 如上所述’陽極處理可實現選擇著色或顏色選擇。原 因在於’陽極處理處理可產生大範圍的不同的顏色,包括 白色、黑色、灰色、金色、銀色、香檳色、棕色、玫塊紅 色、紅色、橙色、黃色、綠色、青色、藍色、靛藍色和紫 色。因此,方法的各種例示性具體實例包括控制陽極處理 電壓,以有選擇地確定氧化物厚度,由此從可通過所述陽 極處理獲得的下述多種顏色中選擇顏色,所述多種顏色包 括白色、黑色、灰色、金色、銀色、香檳色、才宗色、玫塊 ^色、紅色、撥色、黃色、綠色、青色、藍色、㈣色和 备、色,以使經陽極處理的鈮被覆金屬基板包含選擇的顏 4色。在一些例示性具體實例中,陽極處理電壓可例如至少 部分地根顏色選擇而綠約2G伏〜& 12G伏的範圍内。 在-些具體實例中,方法包括,陽極處理以使氧化物 又在約〇·3微米〜約2微米的範圍内。在一些實施方式 二:1、方法包# ’陽極處理約0.50分鐘〜約i分鐘(例如: 更短的〇秒、等等)。替代具體實例可包括更長或 户。 &理持㉟時間及/或不同的陽極處理的氧化物厚 201221700 在陽極處理之前,此處所公開的例示性方法可包括將 銳沉積或被覆在至少部分的金屬基板上(例如,不銹鋼、 鈦具有欽塗層或層的不錄鋼、具有·一個或多個碳化鉻、 氮化鉻、碳化鈦及/或氮化鈦的塗層或層的不銹鋼等等)^ 這可能需要例如通過執行一次或多次物理氣相沉積過程 (例如,磁控濺射、電弧蒸發' 蒸發及/或鐵濺射)將鈮完 全被或沉積在金屬基板的所有面上。另外,一些例示性具 體實例可包括,在將鈮被覆或沉積在金屬基板上之前,對 至少部分的金屬基板進行沖壓'表面處理及/或電拋光中的 一種或多種。 一些例示性具體實例包括在至少金屬基板(例如,鈦 被覆不銹鋼板、其上具有鈦層的不銹鋼基板等)的上下兩 個平坦表面或側面(例如,整個產品表面等)上進行第一 ,磁控制賤射、電狐蒸In other specific examples, there may be a Joch hv~about stiffness, and in some specific examples, there is a hardness equal to about 400 HV, or in another case and a humiliating t. At a hardness of about 800 HV. In an i, \example, 'the hard pole can be adjusted according to the needs of the end user or the consumer. The ft can be changed by changing the thickness of one or more enamel coatings and/or changing the yang process. A plurality of parameters (eg, duration, etc.) are accumulated in a specific example, with a sharp splatter, i-arc, by physical vapor deposition (pvd). Exemplary pvd processes that can be used to deposit germanium include magnetron sputtering evaporation and/or iron sputtering. Specific examples include, for example, the first coating or deposition. For example, 'some illustrative specific examples are two sharp physical vapor depositions. Additionally, some exemplary L include one or more intervening materials between one or more substrates of the crucible and the substrate (eg, 6 201221700 stainless steel, titanium substrates, other metals, alloys, non-metals, earth materials, etc.) Layer or coating (eg titanium layer or coating, chromium carbide layer or coating, chromium nitride layer or coating, titanium carbide layer or coating, titanium nitride layer or coating, one or more from other metals , = coating or layer made of gold, etc.). In a particular exemplary embodiment, σ, the metal substrate comprises a stainless steel having a titanium layer or coating having a thickness greater than 丨 microns. In an exemplary embodiment, ruthenium is deposited on titanium. In various exemplary embodiments, the metal substrate includes a top and bottom side or a flat surface that is covered with sharp. The upper side and the lower side of the metal substrate may each include at least one ruthenium coating having a thickness of between about 〇"micrometers to about three microfines (for example, two test thicknesses, one micron thickness, two micrometers thickness, three micrometers thickness, etc.). Floor. Specific examples of the substitution may include a metal substrate having a tantalum coating layer having a thickness of from about 1 μm to about 3 fresh on the upper side and the lower side. Other examples include: the edge of the metal substrate; covered with enamel. Other specific examples may include sharp coatings having one or more thicknesses that do not fall within the range of 0" microns to 3 microns (degrees greater than 3 microns). As described above, the ruthenium-coated metal substrate can be subjected to cold anodization to provide: hardness. In addition to increasing hardness, cold anode treatment also enables selection = color or color selection. The thickness of the anode treatment voltage during the anodizing process. The thickness of the oxide layer in turn determines what color is produced. It depends on the thickness of the oxide layer and is caused by the reflection of the oxidized surface. Therefore, the dryness of the light which can be reflected on both sides by the underlying metal surface is selected by controlling the anode processing voltage. In some exemplary embodiments, the anodized voltage may, for example, at least partially 201221700 fall within a range of about 2 Torr and a force of 120 volts depending on the color selected. An exemplary article disclosed at b. $ + Λ, ^ ^ ^ , granulation and methods, examples of the invention! A concrete example can achieve rich, uniform and/or stable coloring on the entire two-dimensional « / . Μ ^ τ - dimensional surface. You can choose, sculpt, and/or design coloring to meet the needs of the user or consumer's color design. The color of the person can be used to increase or enhance the aesthetics. Appearance and / D f, ' Objects (eg, casing and battery cover, etc.) are attractive to the consumer, either by adding electronic devices (eg, knees, computers, computer games, etc.) or portable (four) (eg, other exteriors of the phone) The characteristics are attractive to the consumer. In addition, various exemplary embodiments, the color in the W ^ k ear case can also be reproducible 1 歹 J such as the specification is less than the percentage _ circumference of the different colors .... & Extreme processing can produce a wide range of colors, including white, black, gray champagne, multi-person acupuncture, silver, 'known color, rose red, red, pgt A technology' shoes & 梪, 梪, yellow , green, cyan, indigo, and purple. The above specific examples include at least one layer of at least one p-eight" "W-coated metal resin coating f^ 4" on the substrate (for example, polyuric acid, Vinegar resin, UV solid Resin, flat ^ ⑹ suitable polymer, etc.). The resin coating can provide an anti-noise to the object, and the inventors have found that 'resin coating can also provide a durability to improve the durability of the object." For example, the battery cover, the electronic device casing, The life or life of a hand-held product, such as a device, or a product containing the object (for example, a mobile phone H portable terminal, etc.), and improved wear resistance. 8 201221700 Resin coating can also improve strength and Hardness. Illustrative, specific examples of methods such as, and/or for providing a colored metal article, are also disclosed herein. In an illustrative embodiment, the method includes utilizing the following current and temperature, anodizing铌 coated metal substrate (for example, a titanium-coated stainless steel substrate having a hardness of about 27 HV, etc.) having a hardness greater than or equal to about 350 HV (Vickers diamond pyramid hardness number), the current and temperature respectively contributing to improvement The current range of the hardness of the ruthenium-coated metal substrate (for example, about 0 Å to about Å, etc.). In another exemplary embodiment, the method includes, in the range of about 约~ about 51, etc. In one example, the method comprises: anodizing the ruthenium-coated metal substrate using a current in a current range of no more than about 5 amps at a temperature in the range of about ~about 5. 〇. The anode treatment temperature may be $, 5〇c or some temperature between the two (for example, 2=c, 2 5 it, 31, 4 <t, etc.). In addition, during the entire anode treatment, The anode treatment does not have to occur at the same value as the temperature. In some embodiments, the anode treatment temperature during the anode treatment may fluctuate, such as 〇〇Γ 1J such as υ匕 5 5 c. In other specific examples, in whole or in part During the anodizing process. 3Q to Τ The anode treatment temperature can exceed 5 ° C and / or lower than 〇 ° C. So the 'anode treatment temperature of the open space is preferably low enough or kept low enough to make the nose Ranan π & The result of tF being % pole treatment, the hardness of the ruthenium-coated metal substrate is improved. In contrast, at room temperature (20 〇C~25. (:) "F anodizing is usually not Will Pangu 4 such as ^ τ | more material Any increase in initial hardness is achieved. In various exemplary embodiments, you can use 冷 amp amp 金属 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以 可以The hardness of a titanium-coated stainless steel substrate having a titanium layer/coating having a thickness of 1 〇 micron or more, such as 201221700, is increased to a hardness of 35 HV or more (for example, 350 HV, 400 . . . HV, 800 HV, 400 HV~ Temperature values in the 800 HV range, etc.) Temperature range and current range enable slower deposition, higher coating density, avoidance of currents completely penetrating the ruthenium coating on the metal substrate and/or more uniform Coloring. For example, 'Using a lower anode treatment temperature (e.g., in the range of ~ 5 C, etc.) helps prevent the temperature of the anode solution from becoming too high and prevents current from penetrating the tantalum coating. This also increases the coating density. To keep the current no more than 1.5 amps, the current can be controlled or suppressed during at least the early stages of the anode treatment. In the early stages of anodizing, the initial current tends to be higher if not controlled or suppressed. In an exemplary embodiment, the current can be controlled or suppressed such that at the beginning or early stages of the anode treatment, the current can be between about ampere and about 15 amps. Near the end of the anodization, the current may be between about 1 amp and about 1 amp, since after the colored layer has been produced (as disclosed herein), the surface will essentially operate or operate as a larger resistor. In various exemplary embodiments, current is controlled or suppressed by using a series of 1 ohm ohm to 5 ohm ohmic resistors (e.g., resistors having a resistance that changes with time or resistors having a constant resistance). In operation, a series connection of 10 ohms to 500 ohms reduces the loop current and keeps the current during the anode process below 15 amps. This point helps to prevent current from penetrating the ruthenium coating... a lower current slows down the deposition rate and reduces the anode processing speed, which makes the anode process easier to control and/or makes the color more uniform . 201221700 The anodizing solution may comprise phosphoric acid (H3p〇4), tartaric acid (HN〇3), sulfuric acid (H2S04), water (h2〇), and triethanolamine (TEA). In an illustrative embodiment, the impotence treatment solution comprises 1 part of phosphoric acid (H3P〇4), 2 parts of nitric acid (HN〇3), 4 parts of sulfuric acid (h2S04), 9 parts of water (H2〇), and 1 injury of diethanolamine. (tea). Alternative anodizing solutions can also be used in other embodiments. As described above, the anodizing treatment can achieve selective coloring or color selection. The reason is that 'anode treatment can produce a wide range of different colors, including white, black, gray, gold, silver, champagne, brown, rose red, red, orange, yellow, green, cyan, blue, indigo And purple. Accordingly, various illustrative specific examples of the method include controlling an anode processing voltage to selectively determine an oxide thickness, thereby selecting a color from among a plurality of colors obtainable by the anode treatment, the plurality of colors including white, Black, gray, gold, silver, champagne, color, rose, color, red, color, yellow, green, cyan, blue, (four) color and preparation, color, so that the anodized enamel coated metal The substrate contains the selected color 4 colors. In some illustrative embodiments, the anodized voltage may be selected, for example, at least partially by root color and within a range of about 2 GV to < 12 GV. In some embodiments, the method includes anodizing such that the oxide is again in the range of from about 3 micrometers to about 2 micrometers. In some embodiments 2: 1, the method package # 'anode treatment is about 0.50 minutes to about i minutes (for example: shorter leap seconds, etc.). Alternative embodiments may include longer or household. & 35 time and / or different anodized oxide thickness 201221700 Prior to anodizing, the exemplary methods disclosed herein may include sharp deposition or coating on at least a portion of a metal substrate (eg, stainless steel, titanium Non-recorded steel with a coating or layer, stainless steel with a coating or layer of one or more chromium carbide, chromium nitride, titanium carbide and/or titanium nitride, etc.) ^ This may need to be performed, for example, once Or multiple physical vapor deposition processes (eg, magnetron sputtering, arc evaporation 'evaporation, and/or iron sputtering) to completely or deposit the tantalum on all sides of the metal substrate. Additionally, some illustrative specific examples can include one or more of stamping 'surface treatment and/or electropolishing at least a portion of the metal substrate prior to coating or depositing the tantalum on the metal substrate. Some illustrative specific examples include performing first, magnetic on at least two upper and lower flat surfaces or sides (eg, the entire product surface, etc.) of at least a metal substrate (eg, a titanium-coated stainless steel plate, a stainless steel substrate having a titanium layer thereon, etc.) Control spray, electric fox steam

次鈮的物理氣相沉積(PVD )(例如,磁控帝 發 '蒸發、鐵濺射等等)。在第一次PVD蘇 一些顆粒可能會下落或掉落在基板的表面上 程中’掉落的一個或多個顆粒的位置將暴露 12 201221700 成破覆或沉積過程之後,鈮_ 3微米的範圍内。例如,鈮塗層 洛在約〇. 1微米〜約 2微米、3微米。或者!例如銳 :。·1微米、1微米、 或大於約3微米。替代具體實例可::]於’力〇·1微米 該PVD過程提# 了 ^栝僅有一次PVD過裎, k柱杈供了足夠好的鈮沉 洗滌和鈮再被覆過程。 因而可以省略超音波 一些例示性具體實例也可以 極處理之後泠佑 括在除極處理之前或陽 極處理之後塗佈、沉積或被覆Secondary vapor deposition (PVD) (for example, magnetron evaporation, iron sputtering, etc.). In the first PVD, some particles may fall or fall on the surface of the substrate. The position of one or more particles dropped will be exposed to 12 201221700 after the fracture or deposition process, within the range of 铌 3 μm. . For example, the ruthenium coating is about 1 micrometer to about 2 micrometers and 3 micrometers. or! For example, sharp :. • 1 micron, 1 micron, or greater than about 3 microns. An alternative example can be::] ‘力〇·1 micron. The PVD process raises # 栝 栝 only one PVD over 裎, k column 杈 provides a good enough sinking and 铌 re-coating process. Thus, the ultrasonic waves may be omitted. Some exemplary embodiments may also be applied after the pole treatment, including coating, deposition or coating before the pole treatment or after the anode treatment.

Hk .b A. ^ 、例如,聚胺甲酸酯酯 树月曰、議固化樹脂、.其他適宜的聚合物、")。如 上所述,樹脂塗層可對I物件提供防指紋保護,但本發明人 發現,樹脂塗層還提供了 一個出 丁 W枓的結果,即,提高 财用性。提高的耐用性又w担古& , 性又了以“物件(例如,電池蓋、 電子設備外殼、手持裝置或便攜式終端外部元件等)或包 含該物㈣以(例如’手機或其他便攜式終端等)的使 用期或壽命’ ϋ改善其耐磨性。樹脂塗層還可以改善強度 和硬度。 現在參照圖1說明體現本發明的一個或多個方面的物 件刚的例示性具體實:例,所述物# 100包括經冷陽極處 理的鈮被覆不銹鋼基板。如圖所示,物件100包括被覆或 沉積在金屬基板112上的第一層或上層1〇4和第二層戋下 層108。金屬基板U2可包括不銹鋼、鈦或其他適宜的材料。 在此實例中,上層104可包括形成厚度為〇 6微米+/_〇1微 米的著色頂層的鈮。下層108可包括形成厚度為2微米 +/-0.3微米的硬化層的碳化鉻、氮化鉻、碳化鈦、氮化欽及 13 201221700 /或鈦。另外,此部分所明確 太々胼、+,认& 士 15人寸、數值和材料(如 本文所述的所有尺寸、數值和材 艾目服土丨κ ^優出於說明的目的而 不具限制’因為可對本文所公$ Μ ^ V, # θ ^ 具體貫例進行不同的 構以使其具有不同的尺寸、形狀和材 板材料、其他被覆或沉積、等等)。具他基 ^ ; 例如,其他具體實例 可已括僅具有著色層而非這兩層的基 _ …丄〇 丞板。其他實例可包括 形成者色頂層及/或硬化層的鈮。: 圖2是說明方法2〇〇的例示性具體實例的各種過程、 操作或步驟(由框2〇4〜框228表示)的工藝流程圖。如圖 所示’方法200包括框204處的沖壓及/或表面處理基板(例 如,欽被覆的不錄鋼基板等)。例如,根據特定的最終用 途(例如’電池蓋、電子設備外殼、手持裝置或便攜式終 端外部元件、等等),在金屬基板上沖壓出一個或多個開 口、窗口、孔或其他表面特徵、基板可進行拋光或去毛刺 過程·#表面處理’以除去毛刺或銳邊,不然它們可能會產 生尖端放電。 在框2 0 8處,基於使基板的一個或多個銳邊或切割邊 /· 平滑的目的,可以對基板進行電拋光。電拋光通過使銳邊 平滑而有助於避免電流釋放,否則在陽極處理過程中銳邊 處則可能發生這種電流釋放。 在框21 2處,通過物理氣相沉積(例如,磁控滅射、 電弧蒸發、蒸發、鐵濺射、等等)可在基板的上側及/或下 側或者平坦表面上被覆或沉積鈮。 框216包括超音波洗滌,以有助於為框220的鈮再被 201221700 覆過程暴露和準備不穩定的被覆位置。在m2處的第一 人PVD銳被覆過程中,—些顆粒可能會下落或掉落在基板 的表面上。在㉟224處的陽極處理過程中,掉落的顆粒的 位置將暴露。為避免此情況’方法細包括框216處的超 ^皮洗條及其後的_ 22G處的第二次錕被覆或沉積過程。 這有助於確保基板的上嗰和下侧完全為鈮所被覆,以及第 一次被覆或沉積過程中所暴露的位置得到再被覆。框220 處的第二次被覆或沉積過程完成如後,銳塗層的厚度可為 約0.0 1微米〜3微米等。 框224包括在約〇t〜約5χ:的溫度範圍内的溫度下, 利用例如不超過約1 ·5安培的電流,來冷陽極處理銳被覆金 屬基板,使其硬度大於或等於約35〇 hv (維氏金剛石棱錐 a數)#用0 C〜:> c的陽極處理溫度,有助於防止陽 冬,理:合液的溫度變得過高和防止電流穿透鈮塗層。還可 乂提冋塗層密度。可以控制或抑制電A,使得在陽極處理 幵1始時或早期階段中,電流可為約i安培〜約1.5安培。接 近陽極處理結束時,電瘐可能為約0.01安培〜約0.10安 培一因為在已產生著色層之後(如此處所公開的),表面 將貫處上作為較大的電阻工作或運行。 七陽極處理溶液可包貪磷酸(H3p〇4)、硝酸(hno3)、 L酉夂(H2S04)、水(H:2〇 ) *三乙醇胺(TEA )。在一個 例讀具體實例中’陽極處理溶液包含1份«(H3P04)、 ^硝S文(hn〇3)、4份硫酸(h2s〇4)、9份水(H20)和 知一乙醇胺(TEA)。在其它具體實例中也可以使用替代 15 201221700 性陽極處理溶液。 如上所述,陽極處理可實現選擇性著色或顏色選擇。 因此,框224還可包括控制陽極處3丨£電壓,以有選擇地確 定氧化物厚度,由此從可通過所述陽極處理獲得的下述多 種顏色中選擇顏色,所述多種顏色包括白色、黑色、灰色' 金色、銀色、香檳色、棕色、玫瑰紅色、紅色、橙色、黃 色、綠色、青色、藍色、靛藍色和紫色。在一些例示性具 體實例中,陽極處理電壓可例如至少部分地根據選擇的顏 色而落在約20伏〜約1 20伏的範圍内。 在框228處,可塗佈諸如聚胺甲酸酯酯樹脂、紫外線 固化樹脂、其他適宜的聚合物等樹^塗層。樹脂塗層可對 物件提供防指紋保護。此外,本發明人已發現,樹脂塗層 還會提供一個出乎意料的結果,即,提高耐用性。提高的 耐用性又可以提高物件(例如,電‘蓋、電子設備外殼、 手持裝置或便攜式終端外部元件等)或包含該物件的產品 (例如,手機或其他便攜式終端等)的使用期或壽命,並 改善其耐磨性。樹脂塗層還可以改善強度和硬度。 圖3是表不可用於控制陽極處理時的電流的例示性電 路300的電路圖,所述陽極處理例如是在方法2〇〇的框224 處的冷陽極處理(圖2)或在方法4〇〇的框416處的冷陽極 處理(圖4)等。如圖所示,電路3〇〇包括直流(DC)電 源304和申聯的1〇歐姆〜5〇〇歐姆的電阻3〇8,電阻3〇8 可以是具有隨時間而變的電阻的電阻器或者具有恆定電阻 的電阻器)。圖3中還顯示了電極3丨2和3丨6,以及陽極處 16 201221700 理槽或容器320。工作中’串聯的1〇歐姆〜5〇〇歐姆的電 阻308可以降低回路電流,從而將陽極μ μ 保持為1.5培以下。這—點又有助於防止更高的電流穿透銳 塗層。另夕卜’較低的電流可以減緩沉積速率和降低陽極處 理速度,這會使陽極處理過程更易於控制及/或可實現將顏 色製作得更加均句。在例示性具體實例中,可以控制或抑 制電2,使得在陽極處理開始時或早期階段中,電流可為 ’勺1 t培約1.5安培。接近陽極處理結束時,電流可能為 約0.01安培〜、約〇·1〇ί培,因為在已產生著色層之後(如 此處所公開的)’表面將實質上作為較大的電阻工作或運 行。 圖4疋說明方法400的例示性具體實例的各種過程、 操作或步驟(由框4〇4〜框42〇表示)的卫藝流程圖。如圖 所不,方法400僅包括框412處的一次鈮物理氣相沉積, 並且不包括超音波洗滌。這不同於上述已說明的方法, 方法200中包括框216處的超音波洗滌及框處的第二 :銳被覆或沉積過程。利用方法彻,框412處的鈮被覆或 、:積過程提供了較好的銳沉積(無掉落的顆粒),因而不 必進仃超音波洗滌和第二次鈮被覆或沉積過程。方法4㈧ 的框4〇4、408、416和420處的其他過程、操作或步驟可 與對應的框204 ' 208、224和228相同或相似。 例不性具體實例的提供使得本發明更為詳盡,並可將 其範圍充分傳達給本領域技術人員。為使本發明的具體實 例侍到全面了解,本說,書描述了大量具體細節,例如具 17 201221700 體成刀。又備和方法的實例。對於本領域技術人員而言顯 而易見的疋’不必採用具體細節,例示性具體實例可以以 不同开/式體現,並且不應將其理解為是對本發 制。在-些例示性具體實例中,對於公知的方法、公= 设備結構和公知的技術沒有詳細描述。 、 此處所使用的術語僅出於描述特定例示性具體實例的 目的’並非旨在作出限制。此處所用的單數形式也音在包 入” “七紅: 月楚地表明了並非如此。術語‘‘包 3 、匕括和“具有”是開放性的,因此是指存在所 述的特徵 '整體、步驟,〇,, 相仔在所 ^步驟、#作、元件 除一種或多種其他特徵、整體、步驟、操作、—也= 及/或它們㈣合的存在或加人。此處所述的方成刀 程和操作不應被理解為必須按照所討論或說明的順序來^ =:非特別指定了它們的執行順序。還應知 用另外的或替代的步驟。 Ύ 乂才木 當元件或層被描述為在其他元件或声“ “ 到”、“連接到”或“偶聯到”盆他2 、接合 直接地在其他元件或層上、接合到 ,層時,它可以 元件或層,也可以在二者之間 連接到或偶聯到其他 <间仔在插入元件式思 χ 當元件被描述為“直接在”其他元件或層“上,,。目反, 接合到”、“直接連接到” 4 ‘‘直接偶㈣,,甘、‘直接 層時’則不存在插入元件或層。應 、他元件或 述元件之間的關係的其他詞語(例如二:式理解用於摇 “直接位於…之間,,、“相鄰,,與“直接相與 18 201221700 如此處所用’詞語“及/或,,包括相關列出 種的任何以全部組合。 )種或夕 雖然詞語“第一 ”,、“第二” =,,a 久括;放上、、 寻' 可用於此處 毡述各種兀件、成分、區域、層 成分.、區域、層及/或部分不庙一 t疋廷些元件、 a及/a 口P刀不應受這些詞語的限士 語可能僅用於將一種元丨件、成分、區域、 區域、層或部分區分開來。此虛 s 。1^刀/、另一 ,, L刀開木此處所用的諸如“第_,,、 ‘‘ 一 和其他數字詞語箅U往_卄·;p * 下"…不暗含順序或次序,除非上 β ® V 了,的弟凡件、成分、區 域、層或…以稱作第二元件、成分、區域、層或部分, 而不脫離例示性具體實例的教導。 sΡ刀 為便於描述,此處可使用空間相 :内:::外'“之下”、“下”、“下部”、:°上: 上邛等,其用於描述附圖中所干的一ii-K 斟於1仙Μ 固甲所不的種兀件或特徵相 的二之外—種或多種元件或特徵的關係。除了圖中所示 ==方空間相關的詞語還旨在涵蓋使用或工作中的 例如,如果圖中的設備被翻轉,則被描 他:件或特徵‘‘下,,或‘‘之下”的元件將被定向 :下”^件她的“上方”。因此,例示性的詞語 轉9 〇度或在個方向。設備可以被另外定向(旋 應據此進行理解。此處所用的空間相關的描述詞 不將公開的給定參數的特定值和值的特定範圍,並 不將可用在此處所公開的一個或多個實例中的其他值和值 19 201221700 的靶圍排除在外。此外,可以設想,此處所述的具體參數 的任何兩個特定值都可定義適用於給定的參數的值的範圍 的编點(即,公開給定的參數的第一個值和第二個值可以 解釋為公開了第一個值與第二個值之間的任意值也都可用 於忒給定的參數)。類似地,可以設想,參數的值的兩個 以上範圍的公開(無論這些範圍是否嵌套、重疊或不同) 包括利用公開的範圍的端點所能主猛的值的範圍的所有可 能組合。 具體貫例的上述描述基於說明和描述的目的而提供。 攻些描述並不意在窮舉或限制本發明。特定具體實例的各 元件或特徵通常不限於該特定具體.實例,適用時可以互 換’並可用在選定的具體實例中,即使沒有具體顯示或描 述。同一具體實例也可以以許多方式變化。不應認為這些 變化脫離了本發明,所有這些修改都包含於本發明範圍内。 【圖式簡單說明】 此處所描述的附圖僅出於說明所選定的具體實例的目 的’而非為了說明所有可能的實施,這些附圖並不意在限 制本發明的範圍。 圖1說明的是包括或包括經冷陽極處理的鈮被覆不銹 鋼基板的物件的例示性具體實例; 圖2是說明關於及/或用於提供著色的金屬物件的方法 的例不性具體實例的工藝流程圖,所述著色的金屬物件包 括經冷陽極處理的鈮被覆金屬基板; 20 201221700 圖3疋表不可用》控制冷陽極處理銳被覆金屬基板時 的電流的示例性電路的電路圖;並且 的金屬物件的方法的另 所述著色的金屬物件包 圖4是關於及/或用於提供著色 一例示性具體實例的工藝流程圖, 括經冷陽極處理的鈮被覆金屬基板 【主要元件符號說明】 «»»、 21Hk.b A. ^, for example, polyurethane esters, eucalyptus, solidified resins, other suitable polymers, "). As described above, the resin coating can provide anti-fingerprint protection for the I article, but the inventors have found that the resin coating also provides a result of improving the profitability. Increased durability, in addition to the "object (for example, battery cover, electronic device housing, handheld device or portable terminal external components, etc.) or contains the object (four) to (such as 'mobile phones or other portable terminals The service life or lifetime of the device is improved to improve the wear resistance. The resin coating can also improve the strength and hardness. An exemplary embodiment of the article that embodies one or more aspects of the present invention will now be described with reference to FIG. The article #100 includes a cold anodized tantalum coated stainless steel substrate. As shown, the article 100 includes a first layer or upper layer 1〇4 and a second layer under layer 108 that are coated or deposited on the metal substrate 112. Substrate U2 may comprise stainless steel, titanium or other suitable material. In this example, upper layer 104 may comprise tantalum forming a colored top layer having a thickness of 〇6 microns + / _ 〇 1 micron. Lower layer 108 may comprise a thickness of 2 microns + /-0.3 micron hardened layer of chromium carbide, chromium nitride, titanium carbide, nitride and 13 201221700 / or titanium. In addition, this part is clearly too 々胼, +, recognize & 15 people, value and material All dimensions, values, and materials, as described herein, are not limited by the purpose of the description 'because the specific construction of the text $ Μ ^ V, # θ ^ can be different Having different sizes, shapes and slab materials, other coatings or deposits, etc.). For example, other specific examples may include a base having only a colored layer instead of the two layers. Other examples may include the formation of a top layer and/or a hardened layer of the hardened layer.: Figure 2 is a diagram showing various processes, operations or steps of an exemplary embodiment of the method 2 (represented by blocks 2 to 4 Process flow diagram. As shown, the method 200 includes stamping and/or surface treating substrates at frame 204 (eg, a non-recorded steel substrate, etc.), for example, depending on the particular end use (eg, 'battery cover , an electronic device housing, a handheld device or a portable terminal external component, etc.), stamping one or more openings, windows, holes or other surface features on the metal substrate, the substrate can be polished or deburred. #surface treatment 'To remove burrs or sharp edges, otherwise they may produce tip discharges. At block 208, the substrate may be electropolished for the purpose of smoothing one or more sharp edges or cut edges of the substrate. Polishing helps to avoid current release by smoothing the sharp edges that would otherwise occur at the sharp edges during the anodization process. At block 21 2, by physical vapor deposition (eg, magnetron extinction, Arc evaporation, evaporation, iron sputtering, etc.) may be coated or deposited on the upper and/or lower side or flat surface of the substrate. Block 216 includes ultrasonic cleaning to aid in the enthalpy of frame 220 by 201221700 The overlay process exposes and prepares for unstable coating locations. During the first person PVD sharp coating at m2, some of the particles may fall or fall on the surface of the substrate. During the anodizing process at 35224, the location of the dropped particles will be exposed. To avoid this, the method includes a super-skin strip at block 216 and a second ruthenium coating or deposition process at _ 22G. This helps to ensure that the upper and lower sides of the substrate are completely covered by the crucible and that the exposed locations during the first coating or deposition are recoated. After the second coating or deposition process at block 220 is completed, the thickness of the sharp coating may be about 0.01 μm to 3 μm or the like. Block 224 includes cold anodizing the sharply coated metal substrate to a hardness greater than or equal to about 35 〇 hv at a temperature in the temperature range of from about 〇t to about 5 χ using, for example, no more than about 1.25 amps of current. (Vickers diamond pyramid a number) #0 0~:> The anode treatment temperature of c helps prevent the yang, and the temperature of the liquid mixture becomes too high and prevents the current from penetrating the ruthenium coating. It is also possible to increase the coating density. The electricity A can be controlled or suppressed such that the current can be from about 1 amp to about 1.5 amps at the beginning or in the early stages of the anodic treatment. At the end of the anodizing treatment, the electric raft may be from about 0.01 amps to about 0.10 amps. Because after the colored layer has been produced (as disclosed herein), the surface will work or operate as a larger electrical resistance. The seven anodizing solution may comprise glucosinolate (H3p〇4), nitric acid (hno3), L酉夂(H2S04), water (H:2〇)*triethanolamine (TEA). In a specific example of the example, the anodizing solution contains 1 part of «(H3P04), ^N S (hn〇3), 4 parts of sulfuric acid (h2s〇4), 9 parts of water (H20) and nitrileamine (TEA). ). Alternative 15 201221700 anodizing solutions can also be used in other embodiments. As noted above, anodizing can achieve selective coloring or color selection. Accordingly, block 224 can also include controlling the voltage at the anode to selectively determine the oxide thickness, thereby selecting a color from a plurality of colors, including white, that are obtainable by the anodizing process. Black, gray 'gold, silver, champagne, brown, rose red, red, orange, yellow, green, cyan, blue, indigo, and purple. In some illustrative embodiments, the anodized voltage may fall, for example, at least partially within a range of from about 20 volts to about 12 volts depending on the color selected. At block 228, a coating such as a polyurethane resin, an ultraviolet curable resin, other suitable polymers, and the like can be applied. The resin coating provides anti-fingerprint protection for the object. Furthermore, the inventors have found that the resin coating also provides an unexpected result, i.e., improved durability. Increased durability in turn can increase the useful life or life of an item (eg, an electrical cover, an electronic device housing, a handheld device or a portable terminal external component, etc.) or a product containing the object (eg, a cell phone or other portable terminal, etc.) And improve its wear resistance. The resin coating also improves strength and hardness. 3 is a circuit diagram of an exemplary circuit 300 that is not useful for controlling current flow during anodization, such as cold anodization (FIG. 2) at block 224 of method 2A or at method 4 Cold anodization (Fig. 4) at block 416, and the like. As shown, the circuit 3 includes a direct current (DC) power source 304 and a 1 ohm ohm to 5 ohm ohm resistor 3 〇 8 which may be a resistor having a resistance as a function of time. Or a resistor with a constant resistance). Also shown in Figure 3 are electrodes 3丨2 and 3丨6, and at the anode 16 201221700 tank or vessel 320. In operation, a series of 1 ohm ohms to 5 ohms ohms 308 can reduce the loop current, thereby keeping the anode μ μ below 1.5 amps. This point in turn helps prevent higher currents from penetrating the sharp coating. In addition, lower currents can slow down the deposition rate and reduce the anode processing speed, which makes the anode processing easier to control and/or makes coloring more uniform. In an exemplary embodiment, the electricity 2 can be controlled or suppressed such that at the beginning or in the early stages of the anode treatment, the current can be 'spoon 1 t to about 1.5 amps. Near the end of the anodization process, the current may be about 0.01 amps to about 10,000 Å because the surface will function or operate substantially as a larger resistance after the colored layer has been produced (as disclosed herein). 4A illustrates a flow chart of various processes, operations, or steps (represented by block 4〇4 to block 42A) of an illustrative embodiment of method 400. As shown, the method 400 includes only one 铌 physical vapor deposition at block 412 and does not include ultrasonic cleaning. This differs from the method described above in that method 200 includes ultrasonic washing at block 216 and a second at the frame: a sharp coating or deposition process. By using the method, the ruthenium coating or the:product process at block 412 provides better sharp deposition (no falling particles) and thus does not require ultrasonic cleaning and a second ruthenium coating or deposition process. Other processes, operations, or steps at blocks 4, 4, 408, 416, and 420 of method 4 (VIII) may be the same or similar to corresponding blocks 204' 208, 224, and 228. The present invention is set forth in more detail, and the scope of the invention may be fully conveyed by those skilled in the art. In order to give a comprehensive understanding of the specific examples of the present invention, the book describes a large number of specific details, such as the tool of the 201221700. An example of a method of preparation. It is obvious that those skilled in the art will not be able to devise specific details, and the exemplary embodiments may be embodied in different ways and should not be construed as being in the present invention. In the exemplified embodiments, well-known methods, public equipment structures, and well-known techniques are not described in detail. The terminology used herein is for the purpose of describing the particular exemplary embodiments of the embodiments The singular form used here is also included in the "seven red: the moon shows that this is not the case. The terms ''package 3', 'include' and 'have' are open-ended, and thus refer to the presence of the features described as 'integral, step, step, step, step, step, element, element, or other feature. , the whole, the steps, the operations, the - and / or the existence or addition of them. The procedures and operations described herein are not to be understood as necessarily having to be in the order in which they are discussed or illustrated. It is also known to use additional or alternative steps.元件 乂 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当 当It can be a component or a layer, or it can be connected or coupled between the two. In the insertion of the component, the component is described as being "directly on" other components or layers. Inverted, joined to ", "directly connected to" 4 ''direct couple (four),, Gan, 'direct layer' does not have inserted elements or layers. Other words that should be, between, or between the elements ( For example, the formula: is used to shake "directly between,", "adjacent," and "directly with 18 201221700 as used herein," and / or, including any combination of the listed species. Although the words "first", "second" =,, a long-term; put, and find 'can be used here to describe various elements, components, regions, layer components., regions, Layers and / or parts of the temple, some elements, a and / a mouth P knife should not be limited by these words may be used only for a meta element, composition, region, region, layer or part of the area Separate. This virtual s. 1^ knife /, another,, L knife open wood used here such as "the _,,, '' a and other numerical words 箅U to _ 卄 ·; p * under " ...does not imply a sequence or order, unless the upper part of the ® ® V, the part, composition, region, layer or ... is called the second The elements, components, regions, layers or sections are not departing from the teachings of the illustrative embodiments. s boring tool For ease of description, the spatial phase can be used here: inner::: outer 'lower', 'lower', lower part,: ° upper: upper jaw, etc., which is used to describe the dry A ii-K 斟 1 1 1 1 1 1 1 1 1 1 1 固 固 固 固 固 固 固 固 固 固 固 固 固 固 固 固 固 固 固 固In addition to the words shown in the figure == square space related words are also intended to cover use or work. For example, if the device in the figure is flipped, it is described as: under the feature or feature 'under, ' or under '' The component will be directed: "Here" her "above". Thus, the illustrative words turn 9 degrees or in one direction. The device may be otherwise oriented (the rotation is understood accordingly. The spatially related descriptors used herein do not disclose a particular range of values and values for a given parameter and will not be available for one or more of the disclosures disclosed herein. The other values in the example and the target perimeter of the value 19 201221700 are excluded. Furthermore, it is conceivable that any two specific values of the specific parameters described herein can define the extents of the range of values applicable to a given parameter. (ie, exposing the first and second values of a given parameter can be interpreted as exposing that any value between the first value and the second value can also be used for the given parameter.) Similarly It is contemplated that the disclosure of more than two ranges of values of a parameter (whether or not these ranges are nested, overlapping, or different) includes all possible combinations of ranges of values that can be utilized by the endpoints of the disclosed range. The above description is provided for the purpose of illustration and description. It is not intended to be exhaustive or to limit the invention. The present invention may be interchanged and used in selected specific examples, even if not specifically shown or described. The same specific examples may be varied in many ways. These variations are not to be considered as departing from the scope of the invention. BRIEF DESCRIPTION OF THE DRAWINGS The accompanying drawings, which are for the purpose of illustration Is an illustrative specific example of an article comprising or including a cold anodized crucible-coated stainless steel substrate; FIG. 2 is a process flow diagram illustrating an exemplary embodiment of a method for and/or for providing a colored metal article, The colored metal article comprises a cold-anodized ruthenium-coated metal substrate; 20 201221700 FIG. 3 is not available. A circuit diagram of an exemplary circuit for controlling a current when a cold anode is coated with a sharp-coated metal substrate; and a metal object method Another colored metal article package of FIG. 4 is related to and/or used to provide a coloring example. Process flow diagram for a body example, including a cold-anodized tantalum-coated metal substrate [Major component symbol description] «»», 21

Claims (1)

I 201221700 七、申請專利範圍: 1. 一種方法,其包括以下述電流和溫度陽極處理鈮被覆 金屬基板,使其硬度等於或大於約35〇 HV (維氏金剛石棱 錐硬度數),該電流和溫度處於提高該鈮被覆金屬基板的 硬度的電流範圍和溫度範圍内。 2. 種方法,其包括在約0 °C〜約5 °C的溫度範圍内的 溫度下,使用在不超過約15安培的芎流範圍内的電流來陽 極處理銳被覆金屬基板。 3. 如申睛專利範圍第2項所述之方法,其中,該陽極處 理包括陽極處理該鈮被覆金屬基板,使其硬度等於、或大於 約3 5 0 Η V (維氏金剛石稜錐硬度數)。 4. 如申請專利範圍第1項之方法,其中該溫度範圍為約 0〇C 〜約 5。。。 5_如申請專利範圍第1項之方法,其中該電流範圍不超 過約1.5安培。 & 6. 如申請專利範圍第1或第2項之方法,其中,預先確 定該溫度範圍及/或該電流範圍中的至少一個,以實現較慢 的沉積、較高的塗層密度、避免電流穿透鈮塗層及/或更均 勻的著色。 7. 如申請專利範圍第1或第2項之方法,其中陽極處理 包括使用包含磷酸(h3po4)、硝酸(nho3)、硫酸(H2S〇4)、 水(HjO )和三乙醇胺(TEA )的陽極處理溶液。 8 _如申請專利範圍第7項之方法,其中,該陽極處理溶 液包含1份磷酸(H3P〇4 ) 、2份硝酸(HN〇3) 、4份硫酸 22 201221700 (H2S04)、9份水(H2〇h〇1份三乙醇胺(ΤΕ幻。 9. 如申請專利範圍帛i或.第2項之方法,其進一步包括 使用铌被覆至少-部分金屬基板,由此提供該銳被覆金屬 基板。 10. 如申請專利範圍第i或第2項之方法,《進一步包 括使用銳完全被.覆至少金屬基板的上側和下側,由此提供 該鈮被覆金屬基板。 11. 如申請專利範圍第i或第2項之方法,《進一步包 括在至乂 °卩为金屬基板上沉積鈮,由此提供該被覆金屬 基板。 12. 士申„月專利範圍第nj員之方法,其中沉積祝包括至 少一次鈮的物理相沉積。 3.士申吻專圍第"項之方法,其中沉積祝包括在 至少該金屬基板的上側和下側上沉積鈮。 14 j中„月專利|巳圍第丄i $之方法,其中沉積银包括磁 控濺射、電弧蒸發、蒸發及/或鐵濺射。 15_如申請專利範圍第i或第2項之方法其中該方法 鈮的第一物理氣相沉積; 在該鈮的第—物理氣相沉積之後的超音波洗蘇; 在該超音波洗膝之後的銳的第二物理氣相沉積。 覆 層 16.如申請專利範或U項之方法,対該銳被 金屬基板包括厚度在約0·1微米〜約3微米範圍内的銳塗 23 201221700 2項之方法,其進—步包 覆至少一部分該鈮被覆金 17.如申請專利範圍第1或第 括: 在陽極處理之前使用樹脂被 屬基板;及/或 •-部分經陽極處理 其中該樹脂塗層提 其中該樹脂包括聚 在陽極處理之後使用樹脂被覆至少 的該鈮被覆金屬基板。 1 8·如申請專利範圍第i 7項之方法 高該鈮被覆金基板的耐用性。 1 9.如申請專利範圍第丨7項之方法, 如甲酸酯酯樹脂及/或紫外線固化樹脂。 第1或第2項之方法,其中該陽極 歐姆〜500歐姆電阻的控制電流。 處 20.如申請專利範圍 理包括使用串聯的1〇 21·如申請專利範圍第i或第2項之方法,其中,該陽 :處理包括使用具有隨時間而變的電阻的電阻器或具有恆 定電阻的電阻器控制電流。 22·如申請專利範圍第1或第2項之方法,其中該陽極 处理包括在至少該陽極處理的早期階段中抑制起始電流。 23.如申請專利範圍第i或第2項之方法’其中該銳被 '至屬基板包括含有以下成分的金屬基板: 不銹鋼;及/或 鈦;及/或 不銹鋼和厚度為約〇1〇微米或以上的鈦層;及/或 硬度小於3S0HV的金屬;及/或 硬度小於3S0HV的金屬合金。 24 201221700 24. 如申凊專利範圍第丨或第2項之方法,其中,該陽 極處理此實現經陽極處理的該鈮被覆金屬基板的選擇性著 色。 25. 如申請專利範圍第丨或第2項之方法,其中該陽極 處理包括從能夠通過該陽極處理獲得的多種顏色中選擇顏 色’該多種顏色包括白色、黑色、灰色、金色、銀色、香 檳色、棕色、玫瑰紅色、紅色、撥色、黃色、'綠色、青色、 藍色、狄藍色和紫色,以使經陽極處理的該鈮被覆金屬基 板包含該選擇的顏色。 26’如申明專利範圍第1或第2項之方法,其中該陽極 處理包括控制該陽極處理電壓,以有選擇地確定氧化物厚 度和顏色。 •如申請專利範圍第1或第2項之方法,其中該方法 包括陽極處理該鈮被覆金屬基板,使其硬度處於約 〜約800 HV的範圍内。 28. 如申請專利範圍第.1或第2項之方法,其中該方法 包括: 陽極處理以使氧化物厚度處於約0.30微米〜約2微米 的範圍内;及/或 陽極處理約〇·5分鐘〜約丨分鐘。 29. 如申請專利範圍第1或第2項之方法,其中該金屬 土板^括不銹鋼和厚度為〇 . i 〇微米或以上的鈦層,以使該 ’’屬土板在陽極處理之前的硬度為約270只乂。 3〇.如申請專利範圍第1或第2項之方法,其進-步包 25 201221700 括在將銳被覆或沉積在該金屬基板上之前,對至少一部分 該金屬基板進行沖壓、表面處理及/或電拋光中的一種或多 種。 3 1. —種物件,其物件包含硬度等於或大於約3 5 〇 ηV (維氏金剛石稜硬度數)的經陽極處理的妮被覆金屬基 板’該經陽極處理的錕被覆金屬基板包含硬度小於3 5 〇 HV 的金屬基板和一個或多個厚度為約〇. 1微米〜3微米之間的 銳塗層。 3 2.如申請專利範圍第3 1項之物件,其中該金屬基板包 括一個或多個完全被覆有鈮的側面。 3 3.如申請專利範圍第3 1項之物件,其中該金屬基板包 括一個或多個側面’各側面包括至少一.個厚度為約〇丨微米 〜3微米之間的鈮塗層。 34. 如申請專利範圍第3 1的物件,其中該鈮塗層包括至 少一個鈮的物理氣相沉積。 35. 如申請專利範圍第31項之物件,其中該鈮塗層包括 鈮的第一和第二物理氣相沉積。 3 6.如申請專利範圍第3 1項之物件,其進一步物件包括 在至少一部分該經陽極處理的鈮被覆金屬基板上的一個或 多個樹脂塗層。 3 7.如申請專利範圍第3 6項之物件,其中該一個或多個 才对脂塗層被構造為使得該物件的财用性得到提高。 3 8.如申凊專利範圍第3 7項之物件,其中該一個或多個 樹脂塗層包括聚胺曱酸酯酯樹脂及/或紫外線固化樹脂。 26 201221700 括不^如中請專利範圍第31項之物件,其中該金屬基板包 栝不銹鋼及/或鈦。 4 〇 ·如申請專利範圍f 3 i項之物件,纟中該金屬基板包 舌一種或多種金屬及/或一種或多種金屬合金。 41·如申請專利範圍第31項之物件,其中該金屬基板包 括不銹鋼和鈦層,使得該鈦層設置在所述鈮和不銹鋼之間。 42.如申請專利範圍第31項之物件,其中該物件包括為 白色、黑色、灰色、金色、銀色、香檳色、掠色、玫塊紅 色、紅色、橙色、黃色、綠色、青色、藍色、散藍色和紫 色之一的顏色。 43.如申請專利範圍第31項之物件,其中該經陽極處理 的鈮被覆金屬基板具有處於約4〇〇 Hv〜約8〇〇 Hv的範圍 内的硬度。 44.如申請專利範圍第3 1項之物件,其中該經陽極處理 的鈮被覆金屬基板包括厚度為約〇_3微米〜約2微米的陽極 處理的氧化物。 45. —種便攜式終端,其包含申請專利範圍第3丨〜44項 中任一項之物件。 46. 如申請專利範圍第45項之便攜式終端,其中該經陽 極處理的妮被覆金屬基板包括電池蓋及/或至少一部分外 殼。 八、圖式: (如次頁) 27I 201221700 VII. Patent Application Range: 1. A method comprising anodizing a metal substrate coated with a current having a hardness equal to or greater than about 35 HV (Vickers diamond hardness), the current and temperature It is in a current range and a temperature range in which the hardness of the ruthenium-coated metal substrate is increased. 2. A method comprising treating an acutely coated metal substrate with an anode using a current in a turbulent flow range of no more than about 15 amps at a temperature in the range of from about 0 °C to about 5 °C. 3. The method of claim 2, wherein the anodizing comprises anodizing the tantalum-coated metal substrate to have a hardness equal to or greater than about 3500 ΗV (Vickers diamond pyramid hardness number) ). 4. The method of claim 1, wherein the temperature range is from about 0 〇C to about 5. . . 5_ The method of claim 1, wherein the current range does not exceed about 1.5 amps. 6. The method of claim 1 or 2, wherein at least one of the temperature range and/or the current range is predetermined to achieve slower deposition, higher coating density, and avoidance Current penetrates the ruthenium coating and/or more uniform coloration. 7. The method of claim 1 or 2, wherein the anodizing comprises using an anode comprising phosphoric acid (h3po4), nitric acid (nho3), sulfuric acid (H2S〇4), water (HjO) and triethanolamine (TEA) Treat the solution. 8 _ The method of claim 7, wherein the anodizing solution comprises 1 part of phosphoric acid (H3P〇4), 2 parts of nitric acid (HN〇3), 4 parts of sulfuric acid 22 201221700 (H2S04), 9 parts of water ( H2〇h〇1 part of triethanolamine. 9. The method of claim ii or the method of claim 2, further comprising coating at least a portion of the metal substrate with ruthenium, thereby providing the sharp-coated metal substrate. The method of claim i or the second aspect of the invention, the method further comprising: covering the upper side and the lower side of the at least the metal substrate by using a sharp, thereby providing the tantalum-coated metal substrate. 11. If the application scope is i or The method of item 2, further comprising depositing a crucible on the metal substrate to thereby provide the coated metal substrate. 12. The method of the nj member of the patent application, wherein the deposition includes at least one time. The physical phase deposition. 3. The method of the stipulation of the article, wherein the deposition includes depositing yttrium on at least the upper and lower sides of the metal substrate. 14 j „月专利|巳围丄i $ a method in which depositing silver includes Magnetron sputtering, arc evaporation, evaporation, and/or iron sputtering. 15_ The method of claim i or 2, wherein the first physical vapor deposition of the method; the first physical gas in the crucible Ultrasonic wash after phase deposition; sharp second physical vapor deposition after the ultrasonic wash of the knee. Coating 16. As claimed in the patent specification or U, the sharp metal substrate comprises a thickness of about Sharp coating 23 in the range of 0. 1 micron to about 3 micrometers. The method of claim 2, wherein the method further comprises coating at least a portion of the ruthenium coated gold. 17. Patent application No. 1 or suffix: using a resin before anodizing The substrate is subjected to anodization; and the portion is subjected to anodization, wherein the resin coating is carried out, wherein the resin comprises at least the tantalum-coated metal substrate coated with a resin after the anode treatment. 1 8 as claimed in item i 7 The method is high in the durability of the coated gold substrate. 1 9. The method of claim 7, such as a formate ester resin and/or an ultraviolet curable resin. The method of item 1 or 2, wherein Anode ohm The control current of a 500 ohm resistor. The method of claim 20 includes the use of a series connection of 1 〇 21 · as in the method of claim i or 2, wherein the treatment includes the use of having a change over time. A resistor or a resistor having a constant resistance controls the current. The method of claim 1 or 2, wherein the anodic treatment comprises suppressing the initial current in at least an early stage of the anode treatment. The method of claim i or 2, wherein the substrate is comprised of a metal substrate comprising: stainless steel; and/or titanium; and/or stainless steel and having a thickness of about 1 micron or more. a titanium layer; and/or a metal having a hardness of less than 3S0HV; and/or a metal alloy having a hardness of less than 3S0HV. The method of claim 2, wherein the anode treatment selectively achieves color selective treatment of the anodized metal substrate. 25. The method of claim 2, wherein the anodizing comprises selecting a color from a plurality of colors obtainable by the anodizing process, the plurality of colors including white, black, gray, gold, silver, champagne , brown, rose red, red, dialed, yellow, 'green, cyan, blue, dazzle blue, and purple, such that the anodized tantalum coated metal substrate contains the selected color. The method of claim 1 wherein the anode treatment comprises controlling the anode treatment voltage to selectively determine oxide thickness and color. The method of claim 1 or 2, wherein the method comprises anodizing the tantalum-coated metal substrate to have a hardness in the range of from about 〜800 HV. 28. The method of claim 1, wherein the method comprises: anodizing to provide an oxide thickness in the range of from about 0.30 microns to about 2 microns; and/or anodizing for about 5 minutes. ~ About 丨 minutes. 29. The method of claim 1 or 2, wherein the metal earth plate comprises stainless steel and a titanium layer having a thickness of 〇.i 〇 micron or more, such that the slate is before the anodizing treatment. The hardness is about 270 乂. 3. The method of claim 1 or 2, wherein the step 25 201221700 includes stamping, surface treating, and/or at least a portion of the metal substrate before sharply coating or depositing on the metal substrate. Or one or more of electropolishing. 3 1. An object comprising an anodized N-coated metal substrate having a hardness equal to or greater than about 3 5 〇ηV (Vickers diamond hardness). The anodized ruthenium-coated metal substrate comprises a hardness of less than 3 5 〇 HV metal substrate and one or more sharp coatings between about 1 μm and 3 μm thick. 3. 2. The article of claim 3, wherein the metal substrate comprises one or more sides that are completely covered with a file. 3. The article of claim 3, wherein the metal substrate comprises one or more sides' each side comprising at least one tantalum coating having a thickness between about 〇丨 microns and about 3 microns. 34. The article of claim 31, wherein the bismuth coating comprises physical vapor deposition of at least one bismuth. 35. The article of claim 31, wherein the bismuth coating comprises first and second physical vapor deposition of ruthenium. 3. The article of claim 3, wherein the further article comprises one or more resin coatings on at least a portion of the anodized tantalum coated metal substrate. 3. The article of claim 36, wherein the one or more of the lipid coating is constructed such that the article is more economical. 3. The article of claim 3, wherein the one or more resin coatings comprise a polyurethane ester resin and/or an ultraviolet curable resin. 26 201221700 Included in the object of claim 31, wherein the metal substrate is made of stainless steel and/or titanium. 4 〇 · As claimed in the patent scope f 3 i, the metal substrate encloses one or more metals and/or one or more metal alloys. 41. The article of claim 31, wherein the metal substrate comprises a layer of stainless steel and titanium such that the layer of titanium is disposed between the crucible and the stainless steel. 42. The article of claim 31, wherein the object comprises white, black, gray, gold, silver, champagne, grazing, rose, red, orange, yellow, green, cyan, blue, The color of one of the scattered blue and purple. 43. The article of claim 31, wherein the anodized tantalum coated metal substrate has a hardness in the range of from about 4 〇〇 Hv to about 8 〇〇 Hv. 44. The article of claim 3, wherein the anodized ruthenium-coated metal substrate comprises an anodized oxide having a thickness of from about 〇3 μm to about 2 μm. 45. A portable terminal comprising the object of any one of claims 3 to 44. 46. The portable terminal of claim 45, wherein the anode-coated metal substrate comprises a battery cover and/or at least a portion of the outer casing. Eight, the pattern: (such as the next page) 27
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI692549B (en) * 2018-06-22 2020-05-01 美商惠普發展公司有限責任合夥企業 Nickel-free sealing of anodized metal substrates

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI692549B (en) * 2018-06-22 2020-05-01 美商惠普發展公司有限責任合夥企業 Nickel-free sealing of anodized metal substrates

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