WO2011062391A3 - 기계적 성질이 향상된 반사 방지 피막용 조성물 - Google Patents
기계적 성질이 향상된 반사 방지 피막용 조성물 Download PDFInfo
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- WO2011062391A3 WO2011062391A3 PCT/KR2010/007828 KR2010007828W WO2011062391A3 WO 2011062391 A3 WO2011062391 A3 WO 2011062391A3 KR 2010007828 W KR2010007828 W KR 2010007828W WO 2011062391 A3 WO2011062391 A3 WO 2011062391A3
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- WIPO (PCT)
- Prior art keywords
- mechanical properties
- composition
- reflection film
- improved mechanical
- film
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/02—Polysilicates
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/16—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which all the silicon atoms are connected by linkages other than oxygen atoms
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Abstract
본 발명은 기계적 성질이 향상된 반사 방지 피막용 조성물에 관한 것으로서, 보다 상세하게는 일반식 C2H4Si(OR)3 (R는 탄소수 6 이하의 알킬기)로 표현되는 비닐기 치환 3관능성 실레인을 구성 성분으로서 포함하는 평균 분자량 500 ~ 300,000의 폴리머와, 미셀 형성제와, 열 라디칼 개시제 및 용매를 포함하는 기계적 성질이 향상된 반사 방지 피막용 조성물을 제공한다. 이로써, 미셀형성제에 의해 구현되는 피막의 구조가 기계적 강도의 저하를 초래함에도 불구하고, 상기 폴리머의 열처리를 통하여 그 구조내에 Si(-C)n-Si 결합이 형성될 수 있도록 함으로써 피막의 우수한 기계적 성질을 기존 물질대비 향상시킬 수 있는 효과가 있다.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012539802A JP2013511740A (ja) | 2009-11-20 | 2010-11-08 | 機械的性質が向上した反射防止被膜用組成物 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2009-0112867 | 2009-11-20 | ||
KR1020090112867A KR101133695B1 (ko) | 2009-11-20 | 2009-11-20 | 기계적 성질이 향상된 반사 방지 피막용 조성물 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2011062391A2 WO2011062391A2 (ko) | 2011-05-26 |
WO2011062391A3 true WO2011062391A3 (ko) | 2011-11-03 |
Family
ID=44060168
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2010/007828 WO2011062391A2 (ko) | 2009-11-20 | 2010-11-08 | 기계적 성질이 향상된 반사 방지 피막용 조성물 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2013511740A (ko) |
KR (1) | KR101133695B1 (ko) |
WO (1) | WO2011062391A2 (ko) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101749174B1 (ko) * | 2016-01-18 | 2017-06-21 | 영창케미칼 주식회사 | 반사방지 코팅액 조성물 및 이를 이용한 반사방지 코팅막 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20050083890A (ko) * | 2002-11-20 | 2005-08-26 | 닛토덴코 가부시키가이샤 | 경화성 수지 조성물, 경화막, 및 반사방지 필름 |
KR20090030196A (ko) * | 2007-09-19 | 2009-03-24 | 조근호 | 반사 방지 필름 |
KR20090043397A (ko) * | 2007-10-29 | 2009-05-06 | 에스케이씨 주식회사 | 알콕시 실란계 중합체 용액과 이를 이용한 저굴절 코팅조성물, 고굴절 대전방지 하드코팅 조성물 및 이들을 사용한 반사방지 코팅 필름 |
KR20110013148A (ko) * | 2009-07-31 | 2011-02-09 | 주식회사 에이피엠 | 피막 형성용 도포 조성물 및 그 조성물이 도포되는 피막 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2874007B1 (fr) * | 2004-08-03 | 2007-11-23 | Essilor Int | Procede de fabrication d'un substrat revetu d'une couche mesoporeuse et son application en optique |
JP4996946B2 (ja) * | 2007-03-02 | 2012-08-08 | 富士フイルム株式会社 | 反射防止膜形成用組成物、反射防止膜および光学デバイス |
JP5437662B2 (ja) * | 2008-03-03 | 2014-03-12 | 学校法人慶應義塾 | 反射防止膜及びその形成方法 |
-
2009
- 2009-11-20 KR KR1020090112867A patent/KR101133695B1/ko not_active IP Right Cessation
-
2010
- 2010-11-08 JP JP2012539802A patent/JP2013511740A/ja active Pending
- 2010-11-08 WO PCT/KR2010/007828 patent/WO2011062391A2/ko active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20050083890A (ko) * | 2002-11-20 | 2005-08-26 | 닛토덴코 가부시키가이샤 | 경화성 수지 조성물, 경화막, 및 반사방지 필름 |
KR20090030196A (ko) * | 2007-09-19 | 2009-03-24 | 조근호 | 반사 방지 필름 |
KR20090030195A (ko) * | 2007-09-19 | 2009-03-24 | 조근호 | 기재에 반사방지 효과를 부여하는 투명 필름 |
KR20090043397A (ko) * | 2007-10-29 | 2009-05-06 | 에스케이씨 주식회사 | 알콕시 실란계 중합체 용액과 이를 이용한 저굴절 코팅조성물, 고굴절 대전방지 하드코팅 조성물 및 이들을 사용한 반사방지 코팅 필름 |
KR20110013148A (ko) * | 2009-07-31 | 2011-02-09 | 주식회사 에이피엠 | 피막 형성용 도포 조성물 및 그 조성물이 도포되는 피막 |
Also Published As
Publication number | Publication date |
---|---|
JP2013511740A (ja) | 2013-04-04 |
WO2011062391A2 (ko) | 2011-05-26 |
KR20110056157A (ko) | 2011-05-26 |
KR101133695B1 (ko) | 2012-04-06 |
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