WO2011047286A3 - Cylindrical laser with high frequency discharge excitation - Google Patents
Cylindrical laser with high frequency discharge excitation Download PDFInfo
- Publication number
- WO2011047286A3 WO2011047286A3 PCT/US2010/052879 US2010052879W WO2011047286A3 WO 2011047286 A3 WO2011047286 A3 WO 2011047286A3 US 2010052879 W US2010052879 W US 2010052879W WO 2011047286 A3 WO2011047286 A3 WO 2011047286A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- vessel
- external
- laser
- cylindrical
- high frequency
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/032—Constructional details of gas laser discharge tubes for confinement of the discharge, e.g. by special features of the discharge constricting tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/041—Arrangements for thermal management for gas lasers
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Abstract
Disclosed is a subsonic transfer gas flow laser utilizing high frequency discharge excitation (HFDE) applied in a narrow gap of gas dynamic channel formed between two parallel non-concentric cylindrical vessels. The laser body consists of an external cylindrical metal vessel and an internal cylindrical dielectric vessel positioned interior to the external vessel. The vessels are sealed and form an aerodynamic channel for a closed loop circulation of a laser gas medium which circulates through the channel via a turbo blower. An electrode-less cavity design is utilized by placing a single electrode on the external surface of cylindrical dielectric vessel and the dielectrically insulated external metal vessel is electrically grounded. The optical resonator is placed within or partially downstream or entirely downstream of the plasma chamber. The gas dynamic channel within the optical resonator cavity may have the angle of opening along the gas flow direction.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP10824179A EP2489105A2 (en) | 2009-10-15 | 2010-10-15 | Cylindrical laser with high frequency discharge excitation |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
RU2009138084/28A RU2411619C1 (en) | 2009-10-15 | 2009-10-15 | High-frequency discharge excited gas laser |
RU2009138084 | 2009-10-15 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2011047286A2 WO2011047286A2 (en) | 2011-04-21 |
WO2011047286A3 true WO2011047286A3 (en) | 2011-08-25 |
Family
ID=43876896
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2010/052879 WO2011047286A2 (en) | 2009-10-15 | 2010-10-15 | Cylindrical laser with high frequency discharge excitation |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP2489105A2 (en) |
RU (1) | RU2411619C1 (en) |
WO (1) | WO2011047286A2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11095088B1 (en) | 2018-02-21 | 2021-08-17 | Zoyka Llc | Multi-pass coaxial molecular gas laser |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4635270A (en) * | 1982-11-12 | 1987-01-06 | Battelle-Institut E.V. | Laser apparatus |
EP0429652A1 (en) * | 1989-01-23 | 1991-06-05 | Fanuc Ltd. | High-frequency discharge-excited laser |
JP2509638B2 (en) * | 1987-10-29 | 1996-06-26 | ファナック株式会社 | RF discharge excitation laser device |
JP2006060256A (en) * | 2005-11-07 | 2006-03-02 | Kyocera Corp | Ceramic electrode member |
-
2009
- 2009-10-15 RU RU2009138084/28A patent/RU2411619C1/en active IP Right Revival
-
2010
- 2010-10-15 WO PCT/US2010/052879 patent/WO2011047286A2/en active Application Filing
- 2010-10-15 EP EP10824179A patent/EP2489105A2/en not_active Withdrawn
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4635270A (en) * | 1982-11-12 | 1987-01-06 | Battelle-Institut E.V. | Laser apparatus |
JP2509638B2 (en) * | 1987-10-29 | 1996-06-26 | ファナック株式会社 | RF discharge excitation laser device |
EP0429652A1 (en) * | 1989-01-23 | 1991-06-05 | Fanuc Ltd. | High-frequency discharge-excited laser |
JP2006060256A (en) * | 2005-11-07 | 2006-03-02 | Kyocera Corp | Ceramic electrode member |
Also Published As
Publication number | Publication date |
---|---|
WO2011047286A2 (en) | 2011-04-21 |
EP2489105A2 (en) | 2012-08-22 |
RU2411619C1 (en) | 2011-02-10 |
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