WO2010126254A3 - Source supplying unit, thin film depositing apparatus, and method for depositing thin film - Google Patents
Source supplying unit, thin film depositing apparatus, and method for depositing thin film Download PDFInfo
- Publication number
- WO2010126254A3 WO2010126254A3 PCT/KR2010/002543 KR2010002543W WO2010126254A3 WO 2010126254 A3 WO2010126254 A3 WO 2010126254A3 KR 2010002543 W KR2010002543 W KR 2010002543W WO 2010126254 A3 WO2010126254 A3 WO 2010126254A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- source material
- thin film
- depositing
- supplying unit
- source
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/544—Controlling the film thickness or evaporation rate using measurement in the gas phase
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201080019359.3A CN102414798B (en) | 2009-04-27 | 2010-04-23 | Source supplying unit, thin film depositing apparatus, and method for depositing thin film |
JP2012508391A JP5372243B2 (en) | 2009-04-27 | 2010-04-23 | Raw material supply unit, thin film deposition apparatus and thin film deposition method |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2009-0036633 | 2009-04-27 | ||
KR1020090036633A KR100936378B1 (en) | 2009-04-27 | 2009-04-27 | Unit for supplying source and apparatus for depositioning thin film and method for depositioning thin film |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2010126254A2 WO2010126254A2 (en) | 2010-11-04 |
WO2010126254A3 true WO2010126254A3 (en) | 2011-01-20 |
Family
ID=41809671
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/KR2010/002543 WO2010126254A2 (en) | 2009-04-27 | 2010-04-23 | Source supplying unit, thin film depositing apparatus, and method for depositing thin film |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5372243B2 (en) |
KR (1) | KR100936378B1 (en) |
CN (1) | CN102414798B (en) |
TW (1) | TWI386501B (en) |
WO (1) | WO2010126254A2 (en) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101172275B1 (en) * | 2009-12-31 | 2012-08-08 | 에스엔유 프리시젼 주식회사 | Vaporizing apparatus and control method for the same |
KR101252912B1 (en) * | 2010-08-11 | 2013-04-09 | 주식회사 야스 | Evaporator With Heater Inserted |
CN102373422A (en) * | 2010-08-24 | 2012-03-14 | 鸿富锦精密工业(深圳)有限公司 | Vacuum coating system |
KR101359636B1 (en) * | 2012-07-04 | 2014-02-06 | 주식회사 선익시스템 | Organic matter feedign apparatus and method |
JP5837869B2 (en) * | 2012-12-06 | 2015-12-24 | 株式会社フジキン | Raw material vaporizer |
KR101461738B1 (en) | 2012-12-21 | 2014-11-14 | 주식회사 포스코 | Apparatus for heating materials and coatting system having the same |
KR101456264B1 (en) * | 2012-12-27 | 2014-11-03 | 주식회사 선익시스템 | Thin Film Deposition Apparatus |
KR101499527B1 (en) * | 2013-06-14 | 2015-03-10 | 엘아이지에이디피 주식회사 | Evaporating Apparatus And Evaporating Method |
WO2014208789A1 (en) * | 2013-06-25 | 2014-12-31 | 에스엔유 프리시젼 주식회사 | Thin film deposition device provided with supply unit |
KR102285385B1 (en) | 2014-08-04 | 2021-08-04 | 삼성디스플레이 주식회사 | Apparatus for manufacturing display apparatus |
KR101713112B1 (en) * | 2016-07-26 | 2017-03-08 | 에스엔유 프리시젼 주식회사 | Deposition material supply apparatus which can continuously charged |
KR102493131B1 (en) * | 2018-02-06 | 2023-01-31 | 삼성디스플레이 주식회사 | Apparatus for deposition a organic material, and deposition method of a organic material using the same |
CN111036467A (en) * | 2018-10-15 | 2020-04-21 | 许铭案 | Three-in-one spraying machine |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11229149A (en) * | 1998-02-18 | 1999-08-24 | Nissin Electric Co Ltd | Liquid raw material vaporization film forming device and liquid raw material vaporization film forming method |
US20010022272A1 (en) * | 1998-08-03 | 2001-09-20 | George Plester | Methods for measuring the degree of ionization and the rate of evaporation in a vapor deposition coating system |
WO2005116290A1 (en) * | 2004-05-27 | 2005-12-08 | Sidrabe, Inc. | Method and apparatus for vacuum deposition by vaporizing metals and metal alloys |
WO2008040329A1 (en) * | 2006-09-29 | 2008-04-10 | Von Ardenne Anlagentechnik Gmbh | Vacuum coating method, and arrangement for carrying out said method |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6233762A (en) * | 1985-08-06 | 1987-02-13 | Hitachi Ltd | Vacuum deposition device |
JPS63243264A (en) * | 1987-03-31 | 1988-10-11 | Matsushita Electric Ind Co Ltd | Apparatus for producing thin film |
JPH11229144A (en) * | 1998-02-12 | 1999-08-24 | Hitachi Tool Eng Ltd | Coated tool |
TW200304955A (en) * | 2002-04-05 | 2003-10-16 | Matsushita Electric Ind Co Ltd | Method and apparatus for producing resin thin film |
JP2003342716A (en) * | 2002-05-27 | 2003-12-03 | Sumitomo Electric Ind Ltd | METHOD FOR GROWING GaN CRYSTAL |
WO2005116296A1 (en) * | 2004-05-25 | 2005-12-08 | Kurita Water Industries Ltd. | Method of cooling water treatment and treatment chemical |
JP4046294B2 (en) * | 2005-09-30 | 2008-02-13 | 学校法人慶應義塾 | Apparatus for generating bubbles or droplets in liquid and method for generating bubbles or droplets in liquid |
KR100729097B1 (en) * | 2005-12-28 | 2007-06-14 | 삼성에스디아이 주식회사 | Evaporation source and method for thin film evaporation using the same |
-
2009
- 2009-04-27 KR KR1020090036633A patent/KR100936378B1/en not_active IP Right Cessation
-
2010
- 2010-04-23 CN CN201080019359.3A patent/CN102414798B/en not_active Expired - Fee Related
- 2010-04-23 WO PCT/KR2010/002543 patent/WO2010126254A2/en active Application Filing
- 2010-04-23 JP JP2012508391A patent/JP5372243B2/en not_active Expired - Fee Related
- 2010-04-26 TW TW99113051A patent/TWI386501B/en not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11229149A (en) * | 1998-02-18 | 1999-08-24 | Nissin Electric Co Ltd | Liquid raw material vaporization film forming device and liquid raw material vaporization film forming method |
US20010022272A1 (en) * | 1998-08-03 | 2001-09-20 | George Plester | Methods for measuring the degree of ionization and the rate of evaporation in a vapor deposition coating system |
WO2005116290A1 (en) * | 2004-05-27 | 2005-12-08 | Sidrabe, Inc. | Method and apparatus for vacuum deposition by vaporizing metals and metal alloys |
WO2008040329A1 (en) * | 2006-09-29 | 2008-04-10 | Von Ardenne Anlagentechnik Gmbh | Vacuum coating method, and arrangement for carrying out said method |
Also Published As
Publication number | Publication date |
---|---|
TWI386501B (en) | 2013-02-21 |
CN102414798A (en) | 2012-04-11 |
JP2012525499A (en) | 2012-10-22 |
JP5372243B2 (en) | 2013-12-18 |
TW201105810A (en) | 2011-02-16 |
CN102414798B (en) | 2014-05-14 |
WO2010126254A2 (en) | 2010-11-04 |
KR100936378B1 (en) | 2010-01-13 |
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