WO2010123133A1 - Dispositif d'affichage à électroluminescence organique - Google Patents

Dispositif d'affichage à électroluminescence organique Download PDF

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Publication number
WO2010123133A1
WO2010123133A1 PCT/JP2010/057312 JP2010057312W WO2010123133A1 WO 2010123133 A1 WO2010123133 A1 WO 2010123133A1 JP 2010057312 W JP2010057312 W JP 2010057312W WO 2010123133 A1 WO2010123133 A1 WO 2010123133A1
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WIPO (PCT)
Prior art keywords
layer
light
organic electroluminescence
electroluminescence display
display device
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PCT/JP2010/057312
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English (en)
Inventor
Hidemasa Hosoda
Takeharu Tani
Shinichiro Sonoda
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Fujifilm Corporation
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Publication of WO2010123133A1 publication Critical patent/WO2010123133A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/875—Arrangements for extracting light from the devices
    • H10K59/877—Arrangements for extracting light from the devices comprising scattering means
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/80—Constructional details
    • H10K59/875—Arrangements for extracting light from the devices
    • H10K59/879—Arrangements for extracting light from the devices comprising refractive means, e.g. lenses
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/331—Nanoparticles used in non-emissive layers, e.g. in packaging layer

Definitions

  • the present invention relates to an organic electroluminescence display device which yields high light extraction efficiency and reduces image bleeding.
  • the organic electroluminescence display device (organic EL display device) is a self-light-emitting display device and is used for display, lighting, etc.
  • the organic electroluminescence display has advantages in terms of display performance, such as high visibility in comparison with conventional CRTs or LCDs and absence of viewing angle dependency. Also, it has such advantages that the display can be reduced in weight and thickness. Further, besides advantages in terms of reduction in weight and thickness, there is a possibility that the organic electroluminescence lighting will be capable of realizing lighting in a heretofore unrealizable form by using a flexible substrate.
  • the organic electroluminescence display device has excellent characteristics, ' however, in general, the refractive indices of layers constituting the display device, including a light-emitting layer, are higher than the refractive index of air.
  • the refractive index/indices of thin organic layer(s) such as the light-emitting layer is/are in the range of 1.6 to 2.1.
  • the light emitted is liable to be totally reflected at the interface, and the light extraction efficiency is less than 20%, which means that most of the light is lost.
  • an organic electroluminescence display portion in a generally known organic electroluminescence display device includes a substrate and also includes, over this substrate, a pair of electrode layers and organic compound layer(s) placed between the pair of electrode layers.
  • the organic compound layer(s) include a light-emitting layer, and the organic electroluminescence display device discharges, from the light extraction surface side, light emitted by the light-emitting layer.
  • an organic electroluminescence display device wherein an optical path of light emitted by the light-emitting layer is controlled, and an optical control layer for discharging, from the light extraction surface side, the light emitted by the light-emitting layer is placed over the optical path.
  • light extraction efficiency improves but there is such a problem that the light emitted is waveguided in radial directions as opposed to a desired light discharge direction by waveguiding components present in the light-emitting layer, the optical control layer and the substrate and thus crosstalk (mutual interference) which is due to image bleeding is caused by the above-mentioned light and light emitted from an adjacent light-emitting display portion (pixel) .
  • an organic electroluminescence display device wherein a light-permeable layer is placed over an optical path. Formed of a material having a low refractive index, this light-permeable layer is capable of guiding in a desired direction the light emitted from the light-emitting layer and suppressing the spread of the light which is due to waveguiding components present on the optical path of the guided light.
  • an organic electroluminescence display device provided with a light-emitting element including a first electrode, a second electrode, and a light-emitting layer placed between the first and second electrodes, wherein part of light emitted from the light-emitting layer is extracted as radiant light, and wherein the first electrode, a light-extracting layer which extracts the radiant light, the light-emitting layer, and a low refractive index layer which has a refractive index lower than the average refractive index of the light-extracting layer are disposed in this order with respect to the direction in which the radiant light is extracted (refer to PTL l).
  • an organic electroluminescence display device provided with an organic electroluminescence element including a first electrode and a second electrode and also including, between the first and second electrodes, pixel layer(s) formed of a light-emitting portion incorporating at least a light-emitting layer, and a transparent member positioned in the direction in which purified light is extracted from the pixel layer(s), wherein a diffraction grating is provided between the pixel layer(s) and the transparent member, and a low refractive index layer formed of a material which has a refractive index lower than the refractive index of the material constituting the transparent member is provided between the diffraction grating and the transparent member (refer to PTL 2).
  • An object of the present invention is to provide an organic electroluminescence display device which yields high light extraction efficiency and reduces image bleeding.
  • the present inventors have noted the relationship between the distance between adjacent pixels and the thickness of layers constituting an organic electroluminescence display portion and found that the above-mentioned object can be achieved by regulating the relationship under a fixed condition. Specifically, as shown in FIG. 8, they have found that 2R/t, which is the ratio of a distance 2R, i.e. the distance between adjacent pixels, to a thickness t of the layers, changes in a manner similar to an exponential logarithm such that image bleeding is reduced, and virtually no image bleeding is caused when the ratio is regulated under a fixed condition.
  • An organic electroluminescence display device including a plurality of organic electroluminescence display portions in a surface of the organic electroluminescence display device, wherein each organic electroluminescence display portion includes a pair of electrode layers, an organic compound layer which includes a light-emitting layer and which is placed between the electrode layers, a light-permeable layer which transmits light emitted from the light-emitting layer, and an optical control layer which controls an optical path of the light, wherein the electrode layer on the opposite side to the light extraction surface side is in charge of reflection of the light, wherein the organic electroluminescence display portions are formed as pixels which include subpixels, with each pixel including at least one of a red subpixel, a green subpixel and a blue subpixel, and wherein the relationship 9 ⁇ 2R/t is satisfied, where 2R denotes the shortest distance between adjacent subpixels of the same color among the
  • An organic electroluminescence display device including a plurality of organic electroluminescence display portions in a surface of the organic electroluminescence display device, wherein each organic electroluminescence display portion includes a pair of electrode layers, an organic compound layer which includes a light-emitting layer and which is placed between the electrode layers, a light-permeable layer which transmits light emitted from the light-emitting layer, an optical control layer which controls an optical path of the light, and a reflective layer which reflects the light, wherein the electrode layer on the opposite side to the light extraction surface side is in charge of transmission of the light, wherein the reflective layer is formed on the opposite side to the light extraction surface side relative to the electrode layer on the opposite side to the light extraction surface side, wherein the organic electroluminescence display portions are formed as pixels which include subpixels, with each pixel including at least one of a red subpixel, a green subpixel and a blue subpixel, and wherein the relationship 9 ⁇ 2R/t is satisfied, where 2R denotes the shortest
  • ⁇ 3> The organic electroluminescence display device according to ⁇ 2>, wherein the refractive index of the light-permeable layer with respect to light in the visible wavelength region among the light emitted from the light-emitting layer ranges from 1.0 to 1.5.
  • the optical control layer includes a layer containing fine particles.
  • ⁇ 5> The organic electroluminescence display device according to ⁇ 4>, wherein the layer containing fine particles contains at least fine particles and a matrix agent, and a refractive index N of the matrix agent with respect to light in the visible wavelength region among the light emitted from the light-emitting layer satisfies the relationship 1.5 ⁇ N.
  • ⁇ 6> The organic electroluminescence display device according to ⁇ 5>, wherein the refractive index N satisfies the relationship 1.65 ⁇ N.
  • ⁇ 7> The organic electroluminescence display device according to any one of ⁇ 1> to ⁇ 6>, wherein the optical control layer includes a concavo-convex layer.
  • ⁇ 8> The organic electroluminescence display device according to any one of ⁇ 1> to ⁇ 7>, wherein the light-permeable layer, the optical control layer and the light-emitting layer are disposed in this order as seen from the light extraction surface side, and the light-permeable layer and the optical control layer are adjacent to each other.
  • ⁇ 9> The organic electroluminescence display device according to any one of ⁇ 1> to ⁇ 7>, wherein the light-permeable layer, the optical control layer and the light-emitting layer are disposed in this order as seen from the light extraction surface side, and the light-permeable layer and the optical control layer are disposed with another layer placed in between.
  • FIG. 1 is a partial cross-sectional view showing the layer structure of an organic electroluminescence display device 100 according to an embodiment of the present invention.
  • FIG. 2 is a partial cross-sectional view showing the layer structure of an organic electroluminescence display device 200 according to another embodiment of the present invention.
  • FIG. 3 is a partial cross-sectional view showing the layer structure of an organic electroluminescence display device 300 according to yet another embodiment of the present invention.
  • FIG. 4 is a partial cross-sectional view showing the layer structure of an organic electroluminescence display device 400 according to yet another embodiment of the present invention.
  • FIG. 5 is a partial cross-sectional view showing the layer structure of an organic electroluminescence display device 500 according to yet another embodiment of the present invention.
  • FIG. 6 is a schematic plan view of an organic electroluminescence display device of the present invention.
  • FIG. 7 is a drawing schematically showing a method for measuring image bleeding regarding organic electroluminescence display devices in Examples and Comparative Examples.
  • FIG. 8 is a graph showing the relationship between image bleeding and 2R/t that is the ratio of a distance 2R, which is the distance between adjacent pixels, to a thickness t of layers constituting an organic electroluminescence display portion.
  • An organic electroluminescence display device of the present invention includes a plurality of organic electroluminescence display portions in a surface of the organic electroluminescence display device. ⁇ Organic Electroluminescence Display Portions>
  • each organic electroluminescence display portion includes a pair of electrode layers, an organic compound layer, a light-permeable layer and an optical control layer and, if necessary, includes other layer(s), and the organic electroluminescence display portions are formed as pixels which include subpixels, with each pixel including at least one of a red subpixel, a green subpixel and a blue subpixel.
  • the electrode layer on the opposite side to the light extraction surface side, included in the pair of electrode layers is in charge of reflection of light.
  • the expression “is in charge of reflection of light” means “has a function of repeatedly utilizing light by reflecting the light” and means that a layer which is in charge of an optical path of light emitted from the after-mentioned light-emitting layer included in the organic compound layer is not present on the opposite side to the light extraction surface side relative to the electrode layer on the opposite side to the light extraction surface side (in other words, not present at the back of the electrode layer on the opposite side to the light extraction surface side).
  • each organic electroluminescence display portion includes a pair of electrode layers, an organic compound layer, a light-permeable layer, an optical control layer and a reflective layer and, if necessary, includes other layer(s), and the organic electroluminescence display portions are formed as pixels which include subpixels, with each pixel including at least one of a red subpixel, a green subpixel and a blue subpixel.
  • the electrode layer on the opposite side to the light extraction surface side, included in the pair of electrode layers is in charge of transmission of light
  • the reflective layer is formed on the opposite side to the light extraction surface side relative to the electrode layer on the opposite side to the light extraction surface side .
  • the expression "the electrode layer on the opposite side to the light extraction surface side, included in the pair of electrode layers, is in charge of transmission of light” means that it transmits light emitted from the after-mentioned light-emitting layer included in the organic compound layer and that a layer which is in charge of an optical path of light emitted from the light-emitting layer is present on the opposite side to the light extraction surface side relative to the electrode layer on the opposite side to the light extraction surface side (in other words, present at the back of the electrode layer on the opposite side to the light extraction surface side) .
  • the pair of electrode layers are composed of an anode and a cathode and are formed as layers which apply positive and negative voltages to the organic compound layer so as to make a light-emitting layer, included in the organic compound layer, emit light.
  • the electrode layer on the light extraction surface side is formed as a transparent electrode layer.
  • the electrode layer on the opposite side to the light extraction surface side may or may not be a transparent electrode layer.
  • the transparent electrode layer on the light extraction surface side may be the anode or the cathode.
  • the term "transparent electrode layer on the light extraction surface side” means that an optical path of light emitted from the light-emitting layer is present at least in a region on the opposite side to the light-emitting layer relative to the electrode layer on the light extraction surface side, and the scope of this transparent electrode layer includes a semitransparent electrode layer (semipermeable electrode layer) .
  • a semitransparent electrode layer as the semipermeable electrode layer, a very thin silver film or the like can be suitably used.
  • the refractive index of the transparent electrode layer with respect to light is not particularly limited; however, it is preferably 1.5 or greater, more preferably 1.8 or greater.
  • 1.8 which is the refractive index of a light-emitting layer of a general organic electroluminescence element
  • high-angle waveguide light in the light-emitting layer can be extracted to the electrode.
  • the refractive index is less than 1.8, which is the refractive index of a light-emitting layer of a general organic electroluminescence element, high-angle components of light in the light-emitting layer are totally reflected between the light-emitting layer and the electrode layer, and thus there are components of light unable to be extracted to the outside.
  • the refractive index with respect to light means the refractive index with respect to light in the visible wavelength region among the light emitted from the after-mentioned light-emitting layer.
  • the visible wavelength region is the wavelength range of 380 nm to 800 nm.
  • the thickness of the transparent electrode layer may be suitably selected according to the electrode employed. Note that the after-mentioned thicknesses of the anode and the cathode are preferable.
  • Anode The anode is, in general, satisfactory as long as it functions as an electrode which supplies electron holes to the organic compound layer.
  • the shape, structure, size and the like of the anode are not particularly limited and may be suitably selected from electrode materials known in the art, according to the use or purpose of the organic electroluminescence display device .
  • the anode is generally provided as a transparent anode.
  • Suitable examples of the material for the anode include metals, alloys, metal oxides, conductive compounds, and mixtures thereof.
  • Specific examples of the material for the anode include conductive metal oxides such as tin oxides (ATO and FTO) doped with antimony, fluorine, etc., tin oxide, zinc oxide, indium oxide, indium tin oxide (ITO) and indium zinc oxide (IZO).' metals such as gold, silver, chromium and nickel.' mixtures or laminates of these metals and conductive metal oxides, inorganic conductive materials such as copper iodide and copper sulfide; organic conductive materials such as polyaniline, polythiophene and polypyrrole; and laminates of these materials and ITO.
  • ATO and FTO tin oxides
  • ITO indium tin oxide
  • IZO indium zinc oxide
  • metals such as gold, silver, chromium and nickel.' mixtures or laminates of these metals and conductive
  • the anode may be formed over a substrate, for example in accordance with a method appropriately selected from wet methods such as printing and coating, physical methods such as vacuum vapor deposition, sputtering and ion plating, and chemical methods such as CVD and plasma CVD, in view of its suitability for the material constituting the anode.
  • a method appropriately selected from wet methods such as printing and coating, physical methods such as vacuum vapor deposition, sputtering and ion plating, and chemical methods such as CVD and plasma CVD, in view of its suitability for the material constituting the anode.
  • the anode may be formed in accordance with direct-current or high-frequency sputtering, vacuum vapor deposition, ion plating or the like.
  • the anode is preferably formed over the substrate.
  • the anode may be formed over the whole or part of the surface on one side of the substrate.
  • Patterning at the time of the formation of the anode may be carried out by chemical etching such as photolithography or physical etching such as with a laser; also, it may be carried out by vacuum vapor deposition, sputtering, etc. with placement of a mask, or carried out by a lift-off method, printing or the like.
  • the thickness of the anode may be suitably selected according to the material constituting the anode and so cannot be unequivocally stipulated; however, it generally ranges from approximately 10 nm to approximately 50 ⁇ m, preferably from 50 nm to 20 ⁇ m.
  • the resistance value of the anode is preferably 10 3 ⁇ /sq. or less, more preferably 10 2 ⁇ /sq. or less.
  • the anode is transparent, it may be colorless and transparent or may be colored and transparent.
  • the light transmittance be 60% or more, more preferably 70% or more.
  • the transparent anode is preferably formed at a low temperature of 150 0 C or less, using ITO or IZO .
  • Cathode Cathode
  • the cathode is, in general, satisfactory as long as it functions as an electrode which injects electrons into the organic compound layer.
  • the shape, structure, size and the like of the cathode are not particularly limited and may be suitably selected from electrode materials known in the art, according to the use or purpose of the organic electroluminescence display device.
  • Examples of the material constituting the cathode include metals, alloys, metal oxides, electroconductive compounds, and mixtures thereof.
  • Specific examples of the material include alkali metals (such as Li, Na, K and Cs), alkaline earth metals (such as Mg and Ca), gold, silver, lead, aluminum, sodium-potassium alloy, lithium-aluminum alloy, magnesium-silver alloy, indium, and rare earth metals (such as ytterbium). These may be used individually, " nevertheless, in terms of securing a favorable balance between stability and electron injection capability, use of a combination of two or more of these is suitable.
  • the material constituting the cathode are alkali metals and alkaline earth metals in terms of electron injection capability, and aluminum-based materials in terms of storage stability.
  • aluminum-based materials means any of aluminum, an alloy composed of aluminum and 0.01% by mass to 10% by mass of an alkali metal or an alkaline earth metal, and a mixture thereof (e.g. lithium-aluminum alloy or magnesium-aluminum alloy).
  • aluminum-based materials means any of aluminum, an alloy composed of aluminum and 0.01% by mass to 10% by mass of an alkali metal or an alkaline earth metal, and a mixture thereof (e.g. lithium-aluminum alloy or magnesium-aluminum alloy).
  • the method for forming the cathode is not particularly limited and the cathode may be formed in accordance with a method known in the art.
  • the cathode may be formed, for example in accordance with a method appropriately selected from wet methods such as printing and coating, physical methods such as vacuum vapor deposition, sputtering and ion plating, and chemical methods such as CVD and plasma CVD, in view of its suitability for the material constituting the cathode.
  • wet methods such as printing and coating
  • physical methods such as vacuum vapor deposition, sputtering and ion plating
  • chemical methods such as CVD and plasma CVD
  • Patterning at the time of the formation of the cathode may be carried out by chemical etching such as photolithography or physical etching such as with a laser; also, it may be carried out by vacuum vapor deposition, sputtering, etc. with placement of a mask, or carried out by a lift-off method, printing or the like.
  • the cathode is preferably formed over the organic compound layer. In this case, the cathode may be formed over the whole or part of the organic compound layer.
  • a dielectric layer having a thickness of 0.1 nm to 5 nm, made of a fluoride, oxide, etc. of an alkali metal or alkaline earth metal, may be interposed between the cathode and the organic compound layer.
  • This dielectric layer may be viewed as a kind of electron injection layer.
  • the dielectric layer can be formed by vacuum vapor deposition, sputtering or ion plating, for example.
  • the thickness of the cathode may be suitably selected according to the material constituting the cathode and so cannot be unequivocally stipulated," however, it generally ranges from approximately 10 nm to approximately 5 ⁇ m, preferably from 50 nm to 1 ⁇ m.
  • the cathode may be transparent or opaque.
  • the transparent cathode can be formed by thinly forming a film of the material for the cathode so as to have a thickness of 1 nm to 10 nm and laying a layer of a transparent conductive material such as ITO or IZO over the film.
  • a transparent conductive material such as ITO or IZO
  • the organic compound layer is placed between the pair of electrode layers and formed as a layer including at least a light-emitting layer. If necessary, the organic compound layer includes layer(s) such as a hole transport layer, an electron transport layer, a charge blocking layer, a hole injection layer, an electron injection layer, etc. besides the light-emitting layer.
  • layer(s) such as a hole transport layer, an electron transport layer, a charge blocking layer, a hole injection layer, an electron injection layer, etc. besides the light-emitting layer.
  • the method for forming the layer(s) constituting the organic compound layer is not particularly limited," examples thereof include dry formation methods such as vapor deposition and sputtering, wet coating, transfer methods, printing, and inkjet methods.
  • the thickness of the organic compound layer is not particularly limited; nevertheless, it is preferred that the thickness be in the range of 2 nm to 500 nm, and more preferred in view of improvement in light extraction efficiency that the thickness be in the range of 2 nm to 300 nm.
  • the organic electroluminescence display portions are formed as pixels each including at least one of a red subpixel, a green subpixel and a blue subpixel.
  • a structure known in the art may be employed; for example, as described on pp. 33-37 of the September 2000 issue of "Monthly DISPLAY", there is a tricolor light emission method wherein subpixels are formed such that the light-emitting layers in the organic compound layers serve as light-emitting layers which respectively emit lights corresponding to red, green and blue, and any of these subpixels of red, green and blue is provided.
  • - Light-permeable Layer -
  • the light-permeable layer is a layer transmitting light emitted from the light-emitting layer and is formed of a material having a low refractive index.
  • the refractive index of the light-permeable layer with respect to light preferably ranges from 1.0 to 1.5, more preferably from 1.0 to
  • the thickness of the light-permeable layer is not particularly limited.
  • the thickness is preferably 50 nm or greater, more preferably 100 nm or greater, particularly preferably 200 nm or greater.
  • the light-permeable layer When the light-permeable layer is so thin as to have a thickness of less than 50 nm, seepage of evanescent light intensifies, and total reflection angular components are also waveguided to the substrate side.
  • This light-permeable layer is not particularly limited.
  • it is preferably a layer formed of a fluoride-based material, alkoxysilane, aerogel, air, etc.
  • the method of forming the light-permeable layer may be suitably selected according to the material constituting the light-permeable layer, and examples of the method include vapor deposition methods such as PVD and CVD, and coating methods such as spin coating.
  • the fluoride-based material is not particularly limited; nevertheless, use of magnesium fluoride, sodium fluoride, calcium fluoride, lanthanum fluoride, lithium fluoride or the like as the fluoride-based material is preferable in that a layer having a low refractive index can be obtained.
  • the aerogel is not particularly limited; however, silica aerogel or the like is preferable in that a layer having a low refractive index can be obtained.
  • the optical control layer is formed as a layer to control an optical path of light emitted from the light-emitting layer, and has a function of changing the direction of the light.
  • the optical control layer includes at least one of the following: a scattering layer, a diffraction grating layer, a concavo-convex layer, a microlens layer and a hologram.
  • the refractive index of the optical control layer with respect to light is not particularly limited.
  • the refractive index be 1.5 or greater, more preferred that the refractive index be 1.6 or greater, and particularly preferred that the refractive index be 1.8 or greater because of its closeness to the refractive index of the light-emitting layer.
  • the thickness of the optical control layer is not particularly limited. For example, it is preferably 100 ⁇ m or less, more preferably 10 ⁇ m or less, particularly preferably 1 ⁇ m or less. Bleeding occurs more easily as the thickness of the optical control layer increases, although this depends upon the distance between pixels.
  • the optical control layer is not particularly limited as long as it controls the optical path of the light. Examples thereof include a scattering layer, a laminate of the scattering layer and an optical waveguide formation layer, and a laminate of the scattering layer and a sealing layer.
  • the scattering layer is not particularly limited and may be suitably selected according to the purpose. Examples thereof include a layer containing fine particles, a porous layer, a prism layer, and a material layer with a roughened surface.
  • the optical waveguide formation layer When the refractive index of the optical waveguide formation layer is made close to the refractive index of the light-emitting layer, the optical waveguide formation layer has a function of reducing total reflection components in the light-emitting layer and guiding high-angle optical components in the light-emitting layer to the optical control layer.
  • the optical waveguide formation layer is formed of an optical waveguide formation resin which has a function of reducing the occurrence of a short circuit between the electrodes of the organic electroluminescence display device and improving the performance of the device, when bumpiness at the top of the optical control layer is reduced for flattening.
  • the thickness of the optical waveguide formation layer is not particularly limited; however, the thickness is preferably 100 ⁇ m or less, more preferably 10 ⁇ m or less.
  • the refractive index of the optical waveguide formation layer with respect to light is not particularly limited; however, it is preferably 1.5 or greater, more preferably 1.8 or greater.
  • the optical waveguide formation resin is not particularly limited! however, preference is given to halogen resins, chalcogen resins, resins containing aromatic rings in their structures, and resins containing inorganic fine particles which are 10 nm or less in diameter.
  • the sealing layer has a function of preventing entry of water vapor and gases such as oxygen that cause degradation of the organic electroluminescence display device.
  • the thickness of the sealing layer is not particularly limited; however, it is preferred that the thickness be in the range of 100 nm to 10 ⁇ m, and more preferred in terms of sealing performance that the thickness be in the range of 300 nm to 10 ⁇ m.
  • the refractive index of the sealing layer with respect to light is not particularly limited; however, it is preferably 1.5 or greater, more preferably 1.7 or greater.
  • the material constituting the sealing layer is preferably SiON, SiNx, ZnS, ZnSe, etc.
  • the method for forming the sealing layer is not particularly limited and may be formed in accordance with a method known in the art, such as CVD.
  • the layer containing fine particles is preferably formed as a layer containing at least a matrix agent and fine particles. Also, the fine particles may be composed of first fine particles and second fine particles.
  • the refractive index of the layer containing fine particles with respect to light is not particularly limited; however, it is preferably 1.5 or greater, more preferably 1.65 or greater.
  • the thickness of the layer containing fine particles is not particularly limited and may be suitably selected according to the purpose; however, it is preferably less than 5 ⁇ m.
  • the matrix agent contains an organic resin material as a base material, and the organic resin material is not particularly limited and may be suitably selected according to the purpose.
  • the organic resin material include imide resins, acrylic resins, ether resins and silane resins.
  • the refractive index, denoted by N, of the matrix agent with respect to light is not particularly limited; however, preference is given to 1.5 ⁇ N, and greater preference is given to 1.65 ⁇ N.
  • the first fine particles are not particularly limited and may be suitably selected according to the purpose.
  • examples thereof include inorganic fine particles such as fine particles of zinc oxide (refractive index: 1.9 to 2.0), alumina (refractive index: approximately 1.7), titanium oxide (Ti ⁇ 2) (refractive index: approximately 2.6) and zirconia (Zr ⁇ 2) (refractive index: approximately 2.3) ; and organic fine particles such as fine particles of melamine (refractive index: approximately 1.6) and benzoguanamine (refractive index: approximately 1.65) .
  • fine particles of zinc oxide, titanium oxide (TiOa) and zirconia (ZrOa) are preferable in that their refractive indices are large and so effectiveness can be expected even when they are used in small amounts.
  • the mass average particle diameter of the first fine particles is not particularly limited and may be suitably selected according to the purpose.' however, it is preferably less than 50 nm.
  • a refractive index ni of the organic resin material to which the first fine particles have been added is possibly unable to be made close enough to a refractive index ⁇ .2 of the light-emitting layer in the organic electroluminescence display device.
  • the mass average particle diameter of the first fine particles is measured and calculated through observation with a transmission electron microscope (TEM).
  • the first fine particles are preferably dispersed (monodispersed) as primary particles in the layer containing fine particles.
  • the dispersion of the first fine particles as primary particles in the layer containing fine particles makes it possible to improve light extraction efficiency further.
  • the method for dispersing the first fine particles as primary particles in the layer containing fine particles is not particularly limited and may be suitably selected according to the purpose.
  • Examples of the method include ultrasonic irradiation to a particle-containing solution, surface treatment of fine particles with an organic material such as a silane coupling agent, addition of the after-mentioned dispersant for fine particles, and physical pulverization after the mixing of the dispersant and particles.
  • the second fine particles are not particularly limited and may be suitably selected according to the purpose.
  • Examples thereof include inorganic fine particles such as fine particles of zinc oxide (refractive index: 1.9 to 2.0), alumina (refractive index: approximately 1.7), titanium oxide (Ti ⁇ 2) (refractive index: approximately 2.6) and zirconia (ZrOa) (refractive index: approximately 2.3); and organic fine particles such as fine particles of melamine (refractive index: approximately 1.6) and benzoguanamine (refractive index: approximately 1.65).
  • fine particles of zinc oxide (refractive index: 1.9 to 2.0), titanium oxide (TiOa) (refractive index: approximately 2.6) and zirconia (ZrOa) (refractive index: approximately 2.3) are preferable in that their refractive indices are large.
  • the mass average particle diameter of the second fine particles is not particularly limited and may be suitably selected according to the purpose.” however, it preferably ranges from 50 nm to 5 ⁇ m. When the mass average particle diameter of the second fine particles is less than 50 nm, it may be impossible to give adequate light scattering effects to the layer containing fine particles. When it is greater than 5 ⁇ m, problems such as image bleeding and a reduction in light use efficiency may become serious at the time of pixel-bypixel light emission, owing to degradation of surface flatness or increase in layer thickness.
  • the mass average particle diameter of the second fine particles is measured and calculated through observation with a transmission electron microscope (TEM) .
  • the second fine particles are preferably dispersed
  • the dispersion of the second fine particles as primary particles in the layer containing fine particles makes it possible to improve light extraction efficiency further.
  • the method for dispersing the second fine particles as primary particles in the layer containing fine particles is not particularly limited and may be suitably selected according to the purpose. Examples of the method include ultrasonic irradiation to a particle-containing solution, surface treatment of fine particles with an organic material such as a silane coupling agent, addition of the after-mentioned dispersant for fine particles, and physical pulverization after the mixing of the dispersant and particles. Whether or not the second fine particles are dispersed as primary particles can be confirmed based upon a particle size distribution measured using a particle size distribution analyzer.
  • One specific method of forming the layer containing fine particles is a method of adding fine particles of titanium oxide, etc. to a DPHA solution (matrix agent solution) prepared by mixing propylene glycol monomethyl ether acetate (PGMEA) with dipentaerythritol hexaacrylate (DPHA) at a mass ratio of 17-3 (PGMEA:DPHA), and then applying this mixture of the DPHA solution and the fine particles by spin coating.
  • DPHA solution matrix agent solution
  • DPHA dipentaerythritol hexaacrylate
  • the concavo-convex layer is not particularly limited as long as it includes a concavo-convex structure; however, preference is given to a layer formed such that the concavo-convex structure is flattened by a flattening film.
  • optical control layer which includes the concavo-convex layer, it is possible to extract light that has previously been unable to be extracted in the art, to the outside, by scattering or diffracting the light so as to change the direction of the light.
  • the thickness of the concavo-convex layer is not particularly limited; however, it preferably ranges from 100 nm to 10 ⁇ m, more preferably from 300 nm to 10 ⁇ m.
  • the structure of convex portions in the concavo-convex structure is not particularly limited.
  • the convex portions may be shaped like cylinders, squares, spheres or the like.
  • the concavo-convex structure may be formed non-periodically but is preferably formed periodically.
  • the period (pitch) of the concavo-convex structure is not particularly limited, ' however, it preferably ranges from 400 nm to 5 ⁇ m.
  • the depth of concave portions in the concavo-convex structure is not particularly limited; however, it preferably ranges from 100 nm to 5 ⁇ m, more preferably from 300 nm to 5 ⁇ m.
  • the method of forming the concavo-convex structure is not particularly limited and may be suitably selected according to the purpose. Examples thereof include lithography, etching and imprinting which are known in the art.
  • the material for the flattening film is not particularly limited; however, it is preferably a highly refractive material.
  • the highly refractive material is not particularly limited,' however, preference is given to SiON, SiNx, Zr ⁇ 2, Ti ⁇ 2, ZnS, halogen resins, chalcogen resins, resins containing aromatic rings in their structures, and resins containing inorganic fine particles which are 10 nm or less in diameter.
  • the refractive index of the highly refractive material with respect to light is not particularly limited; however, it is preferably 1.5 or greater, more preferably 1.65 or greater.
  • Microlens Layer —
  • the microlens layer is formed as a layer made by disposing a plurality of microlenses over a fixative. With the optical control layer which includes the microlens layer, it is possible to change the direction of light according to the shape of the lens.
  • the shape of the microlenses is not particularly limited, and the microlenses may be shaped like spheres, ellipses, trapezoids or the like. As for the disposition of the microlenses, preference is given to a square lattice, a honeycomb shape or the like .
  • each microlens is not particularly limited; however, it preferably ranges from 1 ⁇ m to 500 ⁇ m, more preferably from 5 ⁇ m to 500 ⁇ m.
  • the fixative is not particularly limited as long as it can fix the microlenses. Examples thereof include immersion oil.
  • the thickness of the microlens layer is not particularly limited; however, it preferably ranges from 1 ⁇ m to 500 ⁇ m, more preferably from 5 ⁇ m to 500 ⁇ m.
  • the reflective layer is a layer which has a function of repeatedly utilizing light by reflecting the light. Also, the reflective layer may serve also as an electrode.
  • the reflective layer is formed on the opposite side to the light extraction surface side relative to the electrode layer on the opposite side to the light extraction surface side.
  • the material constituting the reflective layer is not particularly limited. Examples thereof include silver and aluminum.
  • the other layer(s) is/are not particularly limited and may be suitably selected according to the purpose. Examples thereof include a substrate and a buffer layer.
  • the substrate is not particularly limited and may be suitably selected according to the purpose ; however, it is preferably a substrate which does not scatter or attenuate light emitted from the organic compound layer.
  • Specific examples thereof include inorganic materials such as yttria-stabilized zirconia (YSZ) and glass; polyesters such as polyethylene terephthalate, polybutylene phthalate and polyethylene naphthalate; and organic materials such as polystyrenes, polycarbonates, polyethersulfones, polyarylates, polyimides, polycycloolefins, norbornene resins and poly(chlorotrifluoroethylene) .
  • YSZ yttria-stabilized zirconia
  • polyesters such as polyethylene terephthalate, polybutylene phthalate and polyethylene naphthalate
  • organic materials such as polystyrenes, polycarbonates, polyethersulfones, polyarylates, polyimides, polycycloole
  • the substrate use of alkali-free glass is preferable in view of reducing ionis eluted from the glass.
  • soda-lime glass use of soda-lime glass barrier-coated with silica or the like is preferable.
  • the organic material is preferably superior in heat resistance, dimensional stability, solvent resistance, electrical insulation property and processability.
  • the shape, structure, size and the like of the substrate are not particularly limited and may be suitably selected according to the use, purpose, etc. of the organic electroluminescence display device.
  • the substrate is preferably shaped like a plate.
  • the structure of the substrate may be a single-layer structure or a laminated structure.
  • the substrate may be formed of a single member or of two or more members.
  • the substrate may be colorless and transparent or may be colored and transparent. It is preferred that the substrate be colorless and transparent because light emitted from the light-emitting layer is not scattered, attenuated, etc.
  • a moisture permeation preventing layer may be provided on a front or back surface of the substrate.
  • the material for the moisture permeation preventing layer As the material for the moisture permeation preventing layer (gas barrier layer), an inorganic material such as silicon nitride or silicon oxide is suitable .
  • the moisture permeation preventing layer (gas barrier layer) can, for example, be formed by high-frequency sputtering.
  • Buffer Layer —
  • the buffer layer is a layer which has a function of improving adhesion between an underlying layer for the buffer layer and the optical control layer and preventing entry of the material constituting the optical control layer into the light-permeable layer.
  • the buffer layer is preferably placed between the light-permeable layer and the optical control layer.
  • the material constituting the buffer layer is not particularly limited. Examples thereof include SiON and SiNx.
  • the thickness of the buffer layer is preferably 10 nm or greater, more preferably 50 nm or greater.
  • the organic electroluminescence display portions are formed as pixels which include subpixels, with each pixel including at least one of a red subpixel, a green subpixel and a blue subpixel, and the organic electroluminescence display device of the present invention includes the organic electroluminescence display portions in a surface of the organic electroluminescence display device.
  • the organic electroluminescence display device is constructed such that the relationship 9 ⁇ 2R/t is satisfied, where 2R denotes the shortest distance between adjacent subpixels of the same color among the subpixels, and t denotes the total thickness of the organic compound layer, the transparent electrode layer and the optical control layer. When 2R/t is 9 or greater, it is possible to reduce image bleeding (see FIG. 8) .
  • 2R/t is less than 9, a problem of image bleeding becomes serious. Also, 2R/t is preferably 15 or greater, more preferably 40 or greater.
  • any of the organic compound layer, the transparent electrode layer and the optical control layer, the total thickness of these layers being denoted by t, is formed as a common layer which does not become discrete between pixels (subpixels)i according to the present invention, in the common layer shared by the pixels, it is possible to reduce image bleeding related to the waveguiding of light.
  • 2R i.e. the shortest distance between adjacent subpixels of the same color among the subpixels
  • FIG. 6 is a schematic plan view of an organic electroluminescence display device of the present invention.
  • This organic electroluminescence display device includes pixels 50a, 50b, 50c and 5Od in its surface .
  • Each of the pixels 50a, 50b, 50c and 5Od includes a red subpixel (51R), a green subpixel (51G) and a blue subpixel (51B) .
  • the distance between the subpixel 51R in the pixel 50a and the subpixel 51R in the pixel 50b is shorter than that between the subpixel 51R in the pixel 50a and the subpixel 51R in the pixel 50c or the subpixel 51R in the pixel 5Od and is therefore the shortest distance between subpixels of the same color. Accordingly, in this case, the distance between the subpixel 51R in the pixel 50a and the subpixel 51R in the pixel 50b is defined as 2R.
  • the distance 2R can be measured through observation with a microscope or the like.
  • the thickness t can be measured through cross-sectional observation with an SEM (scanning electron microscope) or the like .
  • Image bleeding can be measured as follows - the organic electroluminescence display portions in a light-emitting state are placed under a microscope, and a light-emitting image is captured by a CCD camera! as to this light-emitting image, the amount of luminance on the X line is taken in several lines, which is followed by data processing for averaging the amounts, and a graph is thus created for the measurement (see FIG. 7) .
  • FIG. 1 is a partial cross-sectional view showing the layer structure of an organic electroluminescence display device 100 according to an embodiment of the present invention.
  • a transparent substrate 1 a light-permeable layer 2, a scattering layer 3 (optical control layer), a transparent electrode layer 4, a light-emitting layer 5 and a reflective electrode layer 6 are disposed in this order as seen from the light extraction surface side.
  • FIG. 2 is a partial cross-sectional view showing the layer structure of an organic electroluminescence display device 200 according to an embodiment of the present invention.
  • a transparent substrate 1, a light-permeable layer 2, a buffer layer 7, a scattering layer 3 (optical control layer), a transparent electrode layer 4, a light-emitting layer 5 and a reflective electrode layer 6 are disposed in this order as seen from the light extraction surface side.
  • FIG. 3 is a partial cross-sectional view showing the layer structure of an organic electroluminescence display device 300 according to an embodiment of the present invention.
  • a transparent substrate 1, a light-permeable layer 2, a transparent electrode layer 4, a light-emitting layer 5, a transparent electrode layer 4, a scattering layer 3 (optical control layer) and a reflective layer 8 are disposed in this order as seen from the light extraction surface side.
  • the organic electroluminescence display device 300 having such a layer structure since light emitted by the light-emitting layer 5 is repeatedly utilized in the transparent electrode layer 4, the light-emitting layer 5, the transparent electrode layer 4 and the scattering layer 3 (optical control layer) and extracted to the outside by the scattering layer 3 (optical control layer), it is possible to improve light extraction efficiency.
  • FIG. 4 is a partial cross-sectional view showing the layer structure of an organic electroluminescence display device 400 according to an embodiment of the present invention.
  • a light-permeable layer 2 a transparent electrode layer 4, a light-emitting layer 5, a transparent electrode layer 4, a scattering layer 3 (optical control layer), a reflective layer 8 and a substrate 9 are disposed in this order as seen from the light extraction surface side.
  • the scattering layer 3 optical control layer
  • the light-emitting layer 5 since light emitted by the light-emitting layer 5 is repeatedly utilized in the transparent electrode layer 4, the scattering layer 3 (optical control layer) and the light-emitting layer 5 and extracted to the outside by the scattering layer 3 (optical control layer), it is possible to improve light extraction efficiency.
  • FIG. 5 is a partial cross-sectional view showing the layer structure of an organic electroluminescence display device 500 according to an embodiment of the present invention.
  • a light-permeable layer 2 a scattering layer 3 (optical control layer), a sealing layer 10 (optical control layer), a transparent electrode layer 4, a light-emitting layer 5, a reflective electrode layer 6 and a substrate 9 are disposed in this order as seen from the light extraction surface side.
  • the organic electroluminescence display device 500 having such a layer structure, since light emitted by the light-emitting layer 5 is repeatedly utilized in the scattering layer 3 (optical control layer), the sealing layer 10 (optical control layer), the transparent electrode layer 4 and the light-emitting layer 5 and extracted to the outside by the scattering layer 3 (optical control layer), it is possible to improve light extraction efficiency.
  • DPHA dipentaerythritol hexaacrylate
  • the thickness of the scattering layer after the drying was 0.8 ⁇ m.
  • a transparent electrode layer made of an ITO film (electrode layer on the light extraction surface side) (0.25 ⁇ m in thickness), an organic compound layer (0.35 ⁇ m in thickness) and a reflective electrode layer were, in this order, formed in vacuum over the scattering layer, and an organic electroluminescence display portion was thus produced.
  • the total thickness of the scattering layer (optical control layer), the organic compound layer and the ITO electrode layer was 1.4 ⁇ m.
  • Organic electroluminescence display portions similar to the organic electroluminescence display portion were provided on the glass substrate such that the distance between pixels was 100 ⁇ m, and an organic electroluminescence display device according to Example 1 was thus produced.
  • the distance between pixels (100 ⁇ m) is equivalent to the shortest distance between adjacent subpixels of the same color, which also applies in the after-mentioned Examples and Comparative Examples.
  • each organic electroluminescence display portion had a layer structure 1 in which the substrate, the light-permeable layer, the optical control layer, the transparent electrode layer, the organic compound layer and the reflective electrode layer were disposed in this order as seen from the light extraction surface side (see FIG. l) .
  • Example 2 Example 2
  • Dispersion Liquid 2 A dispersion liquid 2 was prepared in the same manner as the preparation of the dispersion liquid 1 except that the amount of the titanium oxide added was changed from 0.05 parts by mass to 0.017 parts by mass, and the amount of the dispersant SOLSPERSE 36000 added was changed from 0.005 parts by mass to 0.0017 parts by mass.
  • the amount of the titanium oxide added was changed from 0.05 parts by mass to 0.017 parts by mass
  • the amount of the dispersant SOLSPERSE 36000 added was changed from 0.005 parts by mass to 0.0017 parts by mass.
  • Example 2 An organic electroluminescence display device according to Example 2 was produced in the same manner as in Example 1 except that the scattering layer (optical control layer) was formed using the dispersion liquid 2 instead of the dispersion liquid 1, the thickness of the scattering layer after the drying was changed from 0.8 ⁇ m to 2.4 ⁇ m and, as a result, the total thickness of the scattering layer (optical control layer), the organic compound layer and the ITO electrode layer was changed from 1.4 ⁇ m to 3.0 ⁇ m. (Example 3) - Preparation of Dispersion Liquid 3 -
  • a dispersion liquid 3 was prepared in the same manner as the preparation of the dispersion liquid 1 except that the amount of the titanium oxide added was changed from 0.05 parts by mass to 0.004 parts by mass, and the amount of the dispersant SOLSPERSE 36000 added was changed from 0.005 parts by mass to 0.0004 parts by mass.
  • Example 3 An organic electroluminescence display device according to Example 3 was produced in the same manner as in Example 1 except that the scattering layer (optical control layer) was formed using the dispersion liquid 3 instead of the dispersion liquid 1, the thickness of the scattering layer after the drying was changed from 0.8 ⁇ m to 9.4 ⁇ m and, as a result, the total thickness of the scattering layer (optical control layer), the organic compound layer and the ITO electrode layer was changed from 1.4 ⁇ m to 10.0 ⁇ m. (Example 4)
  • a dispersion liquid 4 was prepared in the same manner as the preparation of the dispersion liquid 1 except that the amount of the titanium oxide added was changed from 0.05 parts by mass to 0.1 parts by mass, and the amount of the dispersant SOLSPERSE 36000 added was changed from 0.005 parts by mass to 0.01 parts by mass.
  • Example 4 An organic electroluminescence display device according to Example 4 was produced in the same manner as in Example 1 except that the scattering layer (optical control layer) was formed using the dispersion liquid 4 instead of the dispersion liquid 1 (there was no change in the thickness of the scattering layer) . (Example 5)
  • Dispersion liquid 5 was prepared in the same manner as the preparation of the dispersion liquid 1 except that the amount of the titanium oxide added was changed from 0.05 parts by mass to 0.01 parts by mass, and the amount of the dispersant SOLSPERSE 36000 added was changed from 0.005 parts by mass to 0.001 parts by mass.
  • the amount of the titanium oxide added was changed from 0.05 parts by mass to 0.01 parts by mass, and the amount of the dispersant SOLSPERSE 36000 added was changed from 0.005 parts by mass to 0.001 parts by mass.
  • Example 5 An organic electroluminescence display device according to Example 5 was produced in the same manner as in Example 1 except that the scattering layer (optical control layer) was formed using the dispersion liquid 5 instead of the dispersion liquid 1 (there was no change in the thickness of the scattering layer) . (Example 6)
  • PGMEA propylene glycol monomethyl ether acetate
  • Example 6 An organic electroluminescence display device according to Example 6 was produced in the same manner as in Example 1 except that the scattering layer (optical control layer) was formed using the dispersion liquid 6 instead of the dispersion liquid 1 (there was no change in the thickness of the scattering layer) . (Example 7)
  • each organic electroluminescence display portion had a layer structure 2 in which the substrate, the light-permeable layer, the optical control layer (buffer layer), the transparent electrode layer, the organic compound layer and the reflective electrode layer were disposed in this order as seen from the light extraction surface side.
  • a tetramethoxysilane solution prepared by mixing polyethylene glycol (PEG) with ethanol was applied onto the glass substrate by spin coating.
  • the solution-coated substrate was kept at room temperature in a container filled with ammonia vapor so as to promote gelation of the solution, and a wet gel was thus formed.
  • the substrate with the wet gel which has undergone the gelation, was immersed in ethanol so as to replace ingredients of the wet gel, such as ammonia and water, with ethanol.
  • This thin film immersed in the ethanol was supercritically dried.
  • CTX-807-AP manufactured by ASAHI GLASS CO.
  • the total thickness of the scattering layer, the transparent electrode layer made of an ITO film, the organic compound layer, and the transparent electrode layer made of an IZO film was 1.4 ⁇ m.
  • each organic electroluminescence display portion had a layer structure 3 in which the light-permeable layer, the transparent electrode layer, the organic compound layer, the transparent electrode layer, the optical control layer, the reflective layer and the substrate were disposed in this order as seen from the light extraction surface side (see FIG. 4) .
  • Example 9 each organic electroluminescence display portion had a layer structure 3 in which the light-permeable layer, the transparent electrode layer, the organic compound layer, the transparent electrode layer, the optical control layer, the reflective layer and the substrate were disposed in this order as seen from the light extraction surface side (see FIG. 4) .
  • An organic electroluminescence display device was produced in the same manner as in Example 8 except that the thickness of the scattering layer was changed from 0.8 ⁇ m to 0.6 ⁇ m, and that the transparent electrode layer made of an ITO film (0.38 ⁇ m in thickness), the organic compound layer (0.4 ⁇ m in thickness) and a Ag semipermeable electrode layer (electrode layer on the light extraction surface side) (0.02 ⁇ m in thickness) were, in this order, formed in vacuum over the scattering layer instead of forming in vacuum the transparent electrode layer made of an ITO film, the organic compound layer, and the transparent electrode layer made of an IZO film (electrode layer on the light extraction surface side), in this order, over the scattering layer.
  • the total thickness of the scattering layer, the semipermeable electrode layer (Ag layer), the organic compound layer, and the transparent electrode layer made of an ITO film was 1.4 ⁇ m.
  • each organic electroluminescence display portion had a layer structure 4 in which the light-permeable layer, the semipermeable electrode layer, the organic compound layer, the transparent electrode layer, the optical control layer, the reflective layer and the substrate were disposed in this order as seen from the light extraction surface side.
  • Example 10 each organic electroluminescence display portion had a layer structure 4 in which the light-permeable layer, the semipermeable electrode layer, the organic compound layer, the transparent electrode layer, the optical control layer, the reflective layer and the substrate were disposed in this order as seen from the light extraction surface side.
  • a reflective electrode layer, an organic compound layer (0.38 ⁇ m in thickness), and a semipermeable electrode layer made of a Ag film (electrode layer on the light extraction surface side) (0.02 ⁇ m in thickness) were, in this order, formed in vacuum over another glass substrate, then the glass substrates were stuck together such that the transparent electrode layer over the other glass substrate was in contact with the optical waveguide formation resin layer over the one glass substrate, which was followed by UV curing, and an organic electroluminescence display portion was thus produced.
  • the total thickness of the optical control layers (scattering layer and optical waveguide formation resin layer), the organic compound layer and the transparent electrode layer was 5 ⁇ m.
  • Organic electroluminescence display portions similar to the organic electroluminescence display portion were produced such that the distance between pixels was 100 ⁇ m, and an organic electroluminescence display device according to Example 10 was thus produced.
  • each organic electroluminescence display portion had a layer structure 5 in which the substrate, the light-permeable layer, the optical control layers (scattering layer and optical waveguide formation resin layer), the transparent electrode layer, the organic compound layer, the reflective electrode layer and the substrate were disposed in this order as seen from the light extraction surface side.
  • An organic electroluminescence display device was produced in the same manner as in Example 1 except that, instead of applying the dispersion liquid 1 by spin coating, the DPHA solution was applied by spin coating and the optical control layer was not formed. (Comparative Example 2)
  • a dispersion liquid 7 was prepared in the same manner as the preparation of the dispersion liquid 1 except that the amount of the titanium oxide added was changed from 0.05 parts by mass to 0.003 parts by mass, and the amount of the dispersant SOLSPERSE 36000 added was changed from 0.005 parts by mass to 0.0003 parts by mass.
  • An organic electroluminescence display device was produced in the same manner as in Example 1 except that the scattering layer was formed using the dispersion liquid 7 instead of the dispersion liquid 1, the thickness of the scattering layer after the drying was changed from 0.8 ⁇ m to 14.4 ⁇ m and, as a result, the total thickness of the scattering layer, the organic compound layer and the ITO electrode layer was changed from 1.4 ⁇ m to 15.0 ⁇ m.
  • Comparative Example 3 Comparative Example 3
  • a dispersion liquid 8 was prepared in the same manner as the preparation of the dispersion liquid 1 except that the amount of the titanium oxide added was changed from 0.05 parts by mass to 0.001 parts by mass, and the amount of the dispersant SOLSPERSE 36000 added was changed from 0.005 parts by mass to 0.0001 parts by mass.
  • An organic electroluminescence display device was produced in the same manner as in Example 1 except that the scattering layer (optical control layer) was formed using the dispersion liquid 8 instead of the dispersion liquid 1, the thickness of the scattering layer after the drying was changed from 0.8 ⁇ m to 29.4 ⁇ m and, as a result, the total thickness of the scattering layer (optical control layer), the organic compound layer and the ITO electrode layer was changed from 1.4 ⁇ m to 30.0 ⁇ m. (Comparative Example 4)
  • An organic electroluminescence display device according to Comparative Example 4 was produced in the same manner as in
  • Example 6 except that, instead of applying the dispersion liquid 6 by spin coating, the copolymer solution was applied by spin coating and the optical control layer was not formed.
  • Comparative Example 5 An organic electroluminescence display device according to
  • Comparative Example 5 was produced in the same manner as in Example 6 except that the thickness of the scattering layer (optical control layer) after the drying was changed from 0.8 ⁇ m to 19.4 ⁇ m and, as a result, the total thickness of the scattering layer (optical control layer) , the organic compound layer and the ITO electrode layer was changed from 1.4 ⁇ m to 20 ⁇ m. (Comparative Example 6)
  • An organic electroluminescence display device was produced in the same manner as in Example 8 except that, instead of applying the dispersion liquid 1 by spin coating, the DPHA solution was applied by spin coating and the optical control layer was not formed. (Comparative Example 7)
  • An organic electroluminescence display device according to Comparative Example 7 was produced in the same manner as in
  • Example 8 except that the thickness of the scattering layer (optical control layer) after the drying was changed from 0.8 ⁇ m to 19.4 ⁇ m and, as a result, the total thickness of the scattering layer (optical control layer), the organic compound layer and the ITO electrode layer was changed from 1.4 ⁇ m to 20 ⁇ m. (Comparative Example 8)
  • An organic electroluminescence display device was produced in the same manner as in Example 9 except that, instead of applying the dispersion liquid 1 by spin coating, the DPHA solution was applied by spin coating and the optical control layer was not formed. (Comparative Example 9)
  • An organic electroluminescence display device was produced in the same manner as in Example 9 except that the thickness of the scattering layer (optical control layer) after the drying was changed from 0.6 ⁇ m to 19.2 ⁇ m and, as a result, the total thickness of the scattering layer (optical control layer), the Ag semipermeable electrode layer and the organic compound layer was changed from 1.4 ⁇ m to 20 ⁇ m. (Comparative Example 10)
  • An organic electroluminescence display device was produced in the same manner as in Example 10 except that, instead of applying the dispersion liquid 1 by spin coating, the DPHA solution was applied by spin coating and the optical control layer was not formed. (Comparative Example 11)
  • An organic electroluminescence display device was produced in the same manner as in Example 10 except that the thickness of the optical waveguide formation resin layer was changed from 4 ⁇ m to 16 ⁇ m and the total thickness of the optical control layers (scattering layer and optical waveguide formation resin layer), the organic compound layer and the transparent electrode layer was changed from 5 ⁇ m to 17 ⁇ m. (Example 11)
  • An organic electroluminescence display device was produced in the same manner as in Example 1 except that, instead of the scattering layer, a concavo-convex layer having a concavo-convex structure was formed as the optical control layer.
  • the concavo-convex layer was formed as follows ⁇ a thin Si ⁇ 2 film was deposited on the light-permeable layer by CVD so as to have a thickness of 1 ⁇ m. This thin Si ⁇ 2 film was subjected to lithography and dry-etching with a chlorine-based gas so as to form a Cr metal pattern.
  • this Cr metal pattern was dry-etched with a fluorine-based gas so as to form a plurality of convex portions in the shape of columns, each of which had an outer diameter (diameter) of 1.4 ⁇ m and a height of 1.2 ⁇ m, at a period of 1.8 ⁇ m and thus to obtain a concavo-convex structure.
  • the refractive index of the thin Si ⁇ 2 film in the absence of the Cr metal was 1.5.
  • An SiON layer (having a refractive index of 1.7 to 1.9) as a highly refractive material, which had a thickness of 2 ⁇ m, was formed over the concavo-convex structure by CVD so as to fill concave portions of the concavo-convex structure for flattening, and the concavo-convex layer (2 ⁇ m in thickness) was thus formed.
  • An organic electroluminescence display device according to
  • Example 11 was produced in the same manner as in Example 1 except that the transparent electrode layer made of an ITO film (electrode layer on the light extraction surface side), the organic compound layer and the reflective electrode layer were, in this order, formed in vacuum over the concavo-convex layer and an organic electroluminescence display portion was thus produced.
  • the total thickness of the optical control layer (concavo-convex layer), the organic compound layer and the transparent electrode layer was 2.6 ⁇ m.
  • An organic electroluminescence display device was produced in the same manner as in Example 11 except that the thickness of the concavo-convex layer composed of the thin Si ⁇ 2 film and the SiON layer was changed from 2 ⁇ m to 3.6 ⁇ m and the total thickness of the optical control layer, the organic compound layer and the transparent electrode layer was changed from 2.6 ⁇ m to 4.2 ⁇ m. (Example 13)
  • Example 14 An organic electroluminescence display device according to Example 13 was produced in the same manner as in Example 11 except that the thickness of the concavo-convex layer was changed from 2 ⁇ m to 10.5 ⁇ m and the total thickness of the optical control layer, the organic compound layer and the transparent electrode layer was changed from 2.6 ⁇ m to 11.1 ⁇ m.
  • Example 14 An organic electroluminescence display device according to Example 14 was produced in the same manner as in Example 7 except that, instead of the scattering layer, the concavo-convex layer having the concavo-convex structure, described in Example 11, was formed as the optical control layer, and that the total thickness of the optical control layer, the organic compound layer and the transparent electrode layer was changed from 1.4 ⁇ m to 2.6 ⁇ m. (Example 15)
  • Example 15 An organic electroluminescence display device according to Example 15 was produced in the same manner as in Example 8 except that, instead of the scattering layer, the concavo-convex layer having the concavo-convex structure, described in Example 11, was formed as the optical control layer, and that the total thickness of the optical control layer, the organic compound layer and the transparent electrode layer was changed from 1.4 ⁇ m to 2.6 ⁇ m. (Example 16)
  • An organic electroluminescence display device was produced in the same manner as in Example 9 except that, instead of the scattering layer, the concavo-convex layer having the concavo-convex structure, described in Example 11, was formed as the optical control layer. (Example 17)
  • a reflective electrode layer, an organic compound layer, and a semipermeable electrode layer made of a Ag film were, in this order, formed in vacuum over another glass substrate, then the glass substrates were stuck together such that the transparent electrode layer over the other glass substrate was in contact with the optical waveguide formation resin layer over the one glass substrate, which was followed by UV curing, and an organic electroluminescence display device according to Example 17 was thus produced.
  • the total thickness of the optical control layers (concavo-convex layer and optical waveguide formation resin layer), the organic compound layer and the transparent electrode layer was 2.6 ⁇ m.
  • each organic electroluminescence display portion had a layer structure 5 in which the substrate, the light-permeable layer, the optical control layers (concavo-convex layer and optical waveguide formation resin layer), the transparent electrode layer, the organic compound layer, the reflective electrode layer and the substrate were disposed in this order as seen from the light extraction surface side.
  • the optical control layers concavo-convex layer and optical waveguide formation resin layer
  • An organic electroluminescence display device was produced in the same manner as in Example 11 except that the thickness of the concavo-convex layer was changed from 2 ⁇ m to 16.1 ⁇ m and the total thickness of the optical control layer, the organic compound layer and the transparent electrode layer was changed from 2.6 ⁇ m to 16.7 ⁇ m. (Comparative Example 14)
  • An organic electroluminescence display device according to Comparative Example 14 was produced in the same manner as in Example 11 except that the thickness of the concavo-convex layer was changed from 2 ⁇ m to 32.7 ⁇ m and the total thickness of the optical control layer, the organic compound layer and the transparent electrode layer was changed from 2.6 ⁇ m to 33.3 ⁇ m.
  • Comparative Example 15 An organic electroluminescence display device according to
  • Comparative Example 15 was produced in the same manner as in Example 15 except that the optical control layer was not formed. (Comparative Example 16)
  • An organic electroluminescence display device according to Comparative Example 16 was produced in the same manner as in
  • Example 15 except that the thickness of the concavo-convex layer was changed from 2 ⁇ m to 19.4 ⁇ m and the total thickness of the optical control layer, the organic compound layer and the transparent electrode layer was changed from 2.6 ⁇ m to 20.0 ⁇ m.
  • Comparative Example 17 Comparative Example 17
  • An organic electroluminescence display device according to Comparative Example 17 was produced in the same manner as in Example 16 except that the optical control layer was not formed. (Comparative Example 18) An organic electroluminescence display device according to
  • Comparative Example 18 was produced in the same manner as in Example 16 except that the thickness of the concavo-convex layer was changed from 2 ⁇ m to 19.4 ⁇ m and the total thickness of the optical control layer, the organic compound layer and the transparent electrode layer was changed from 2.6 ⁇ m to 20.0 ⁇ m. (Comparative Example 19)
  • An organic electroluminescence display device was produced in the same manner as in Example 17 except that the thickness of the concavo-convex layer was changed from 2 ⁇ m to 16.1 ⁇ m and the total thickness of the optical control layer, the organic compound layer and the transparent electrode layer was changed from 2.6 ⁇ m to 16.7 ⁇ m. (Example 18)
  • the dispersion liquid 1 was applied onto the SiON layer by spin coating, which was followed by drying at 100 0 C for 30 minutes, and a scattering layer (optical control layer) having a thickness of 0.8 ⁇ m was thus formed.
  • This optical control layer was sealed with glass, with an air layer as a light-permeable layer being situated in between, and an organic electroluminescence display portion was thus produced.
  • the total thickness of the organic compound layer, the transparent electrode layer and the optical control layers (sealing layer and scattering layer) was 2.4 ⁇ m.
  • Organic electroluminescence display portions similar to the organic electroluminescence display portion were provided on the glass substrate such that the distance between pixels was 100 ⁇ m, and an organic electroluminescence display device according to
  • Example 18 was thus produced.
  • each organic electroluminescence display portion had a layer structure 6 in which the transparent substrate, the light-permeable layer, the optical control layers (sealing layer and scattering layer), the transparent electrode layer, the organic compound layer, the reflective electrode layer and the substrate were disposed in this order as seen from the light extraction surface side
  • Example 20 was produced in the same manner as in Example 18 except that, instead of the transparent electrode layer made of an ITO film, a semipermeable electrode layer made of a Ag film was formed in vacuum as the electrode layer on the light extraction surface side (there was no change in the thickness of the electrode layer) .
  • Example 21 An organic electroluminescence display device according to
  • Example 21 was produced in the same manner as in Example 18 except that a scattering layer composed of 10 ⁇ m of a film of an immersion oil (TYPE B, manufactured by Cargill, Incorporated) and 100 ⁇ m of a microlens with its back surface polished (Product Code : 11- 1254- 100-000, manufactured by SUSS MicroOptics) was provided, instead of the scattering layer made of the dispersion liquid 1, on the SiON layer (sealing layer) and that, as a result, the total thickness of the organic compound layer, the transparent electrode layer and the optical control layers (sealing layer and scattering layer) was changed from 100 ⁇ m to 110 ⁇ m and the distance between pixels was changed from 100 ⁇ m to 1,000 ⁇ m. (Example 22)
  • An organic electroluminescence display device was produced in the same manner as in Example 19 except that a scattering layer composed of 10 ⁇ m of a film of an immersion oil (TYPE B, manufactured by Cargill, Incorporated) and 100 ⁇ m of a microlens with its back surface polished (Product Code: 11- 1254- 100-000, manufactured by SUSS MicroOptics) was provided, instead of the scattering layer made of the dispersion liquid 1, on the SiNx layer (sealing layer) and that, as a result, the total thickness of the organic compound layer, the transparent electrode layer and the optical control layers (sealing layer and scattering layer) was changed from 100 ⁇ m to 110 ⁇ m and the distance between pixels was changed from 100 ⁇ m to 1,000 ⁇ m. (Comparative Example 21)
  • An organic electroluminescence display device was produced in the same manner as in Example 18 except that, instead of applying the dispersion liquid 1 by spin coating, the DPHA solution was applied by spin coating and the optical control layer was not formed. (Comparative Example 22)
  • An organic electroluminescence display device was produced in the same manner as in Example 18 except that the scattering layer was formed using the dispersion liquid 8 instead of the dispersion liquid 1 , the thickness of the scattering layer after the drying was changed from 0.8 ⁇ m to 29.4 ⁇ m and, as a result, the total thickness of the organic compound layer, the transparent electrode layer and the optical control layers (sealing layer and scattering layer) was changed from 2.4 ⁇ m to 30.0 ⁇ m.
  • An organic electroluminescence display device was produced in the same manner as in Example 19 except that, instead of applying the dispersion liquid 1 by spin coating, the DPHA solution was applied by spin coating and the optical control layer was not formed. (Comparative Example 24)
  • An organic electroluminescence display device was produced in the same manner as in Example 19 except that the scattering layer was formed using the dispersion liquid 8 instead of the dispersion liquid 1, the thickness of the scattering layer after the drying was changed from 0.8 ⁇ m to 29.4 ⁇ m and, as a result, the total thickness of the organic compound layer, the transparent electrode layer and the optical control layers (sealing layer and scattering layer) was changed from 2.4 ⁇ m to 30.0 ⁇ m.
  • An organic electroluminescence display device was produced in the same manner as in Example 20 except that, instead of applying the dispersion liquid 1 by spin coating, the DPHA solution was applied by spin coating and the optical control layer was not formed. (Comparative Example 26)
  • An organic electroluminescence display device was produced in the same manner as in Example 20 except that the scattering layer was formed using the dispersion liquid 8 instead of the dispersion liquid 1, the thickness of the scattering layer after the drying was changed from 0.8 ⁇ m to 29.4 ⁇ m and, as a result, the total thickness of the organic compound layer, the semipermeable electrode layer and the optical control layers (sealing layer and scattering layer) was changed from 2.4 ⁇ m to 30.0 ⁇ m.
  • An organic electroluminescence display device according to Comparative Example 27 was produced in the same manner as in Example 21 except that, instead of the microlens, quartz glass having the same thickness was used and the scattering layer was not formed. (Comparative Example 28)
  • An organic electroluminescence display device was produced in the same manner as in Example 21 except that the thickness of the microlens was changed from 100 ⁇ m to 500 ⁇ m and, as a result, the total thickness of the organic compound layer, the transparent electrode layer and the optical control layers was changed from 110 ⁇ m to 510 ⁇ m.
  • Comparative Example 29 Comparative Example 29
  • An organic electroluminescence display device according to Comparative Example 29 was produced in the same manner as in
  • Example 22 except that, instead of the microlens, quartz glass having the same thickness was used and the scattering layer was not formed. (Comparative Example 30)
  • An organic electroluminescence display device was produced in the same manner as in Example 22 except that the thickness of the microlens was changed from 100 ⁇ m to 500 ⁇ m and, as a result, the total thickness of the organic compound layer, the transparent electrode layer and the optical control layers was changed from 110 ⁇ m to 510 ⁇ m. (Evaluation Method) - Image Bleeding -
  • the organic electroluminescence display portions in a light-emitting state were placed under a microscope, and then a light-emitting image was captured by a CCD camera (see FIG. 7).
  • the amount of luminance on the X line was taken in several lines, which was followed by data processing for averaging the amounts, and a graph was thus created (see FIG. 7).
  • an organic electroluminescence display device of the present invention yields high light extraction efficiency and reduces image bleeding, it can be suitably used as a display device in a variety of types of devices.

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Abstract

L'invention porte sur un dispositif d'affichage à électroluminescence organique comprenant des parties d'affichage à électroluminescence organique, chaque partie d'affichage comprenant une paire de couches d'électrode, une couche de composé organique qui comprend une couche d'émission de lumière et est placée entre les couches d'électrodes, une couche perméable à la lumière qui transmet une lumière émise à partir de la couche d'émission de lumière, et une couche de commande optique qui commande un trajet optique de la lumière, dans lequel la couche d'électrode sur le côté opposé au côté surface d'extraction de lumière est en charge de refléter la lumière, dans laquelle les parties d'affichage sont formées en tant que pixels comprenant des sous-pixels, avec chaque pixel comprenant au moins l'un parmi un sous-pixel rouge, un sous-pixel vert et un sous-pixel bleu, et dans lequel 9 ≤ 2R / t est satisfaite (2R : distance la plus courte entre des sous-pixels adjacents de la même couleur ; t : épaisseur totale de la couche de composé organique, de la couche d'électrode sur le côté surface d'extraction de lumière et de la couche de commande optique).
PCT/JP2010/057312 2009-04-20 2010-04-20 Dispositif d'affichage à électroluminescence organique WO2010123133A1 (fr)

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WO2014080513A1 (fr) * 2012-11-26 2014-05-30 パイオニア株式会社 Dispositif électroluminescent et procédé de production de dispositif électroluminescent
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JP2022155374A (ja) * 2021-03-30 2022-10-13 日東電工株式会社 光学積層体、光学積層体の製造方法、光学部材、光学装置、光学部材の製造方法、及び光学装置の製造方法

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