WO2010122972A1 - Liquid raw material vaporizer - Google Patents
Liquid raw material vaporizer Download PDFInfo
- Publication number
- WO2010122972A1 WO2010122972A1 PCT/JP2010/056908 JP2010056908W WO2010122972A1 WO 2010122972 A1 WO2010122972 A1 WO 2010122972A1 JP 2010056908 W JP2010056908 W JP 2010056908W WO 2010122972 A1 WO2010122972 A1 WO 2010122972A1
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- WIPO (PCT)
- Prior art keywords
- raw material
- liquid raw
- liquid
- heater
- container
- Prior art date
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01B—BOILING; BOILING APPARATUS ; EVAPORATION; EVAPORATION APPARATUS
- B01B1/00—Boiling; Boiling apparatus for physical or chemical purposes ; Evaporation in general
- B01B1/02—Preventing foaming
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D1/00—Evaporating
- B01D1/14—Evaporating with heated gases or vapours or liquids in contact with the liquid
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D1/00—Evaporating
- B01D1/30—Accessories for evaporators ; Constructional details thereof
Definitions
- the present invention relates to a liquid raw material vaporizer that vaporizes a liquid raw material by a bubbling method using a carrier gas.
- a liquid source container for storing a liquid source and a carrier gas for bubbling the liquid source stored in the liquid source container with a carrier gas Some have an introduction pipe and a bubbling gas output pipe connected to the upper space (gas phase) of the liquid source container and for supplying the bubbling gas outside the liquid source container. And the front-end
- the liquid raw material is vaporized in the bubbles, so that the gasified raw material is supplied to the outside together with the carrier gas.
- a heater for heating the stored liquid material to a constant temperature is provided on the outer surface of the liquid material container, and the liquid material is configured to have a uniform temperature distribution.
- the liquid source container is large, the bubble moving region generated by the bubbling nozzle is limited to a part, so the stirring effect of the liquid source due to the bubbles cannot be obtained, and the temperature distribution of the liquid source is reduced. There is a problem that it is difficult to keep it uniform. If the liquid source container is enlarged, it is difficult to heat the liquid source so that the temperature distribution of the liquid source is uniform only by providing a heater on the outer surface of the liquid source container.
- a bubbling nozzle may be provided so that the bubbles hit the inner surface of the liquid source container, and the liquid source may be stirred.
- the bubbles adhere to the inner surface of the liquid source, and the bubbles recombine with each other. The problem will be that the bubbles will become enlarged.
- the present invention has been made to solve the above problems all at once, and prevents recombination of bubbles to suppress the enlargement of bubbles and make the temperature distribution of the stored liquid raw material uniform. This is the main desired issue.
- the liquid raw material vaporizer includes a liquid raw material container in which the liquid raw material is stored, a first heater that is provided on at least the side wall of the liquid raw material container and heats the stored liquid raw material, A second heater provided inside the liquid source container for heating the stored liquid source, and immersed in the stored liquid source, and between the second heater and the side wall And a plurality of bubble generators for discharging and bubbling a carrier gas into the liquid raw material, and a gas supply pipe for supplying the carrier gas to the bubble generator.
- the 1st heater and the 2nd heater are provided in the side wall and internal central part of a liquid source container, temperature distribution of the liquid source stored in the liquid source container is made uniform. Can be easily. Further, since the bubble generator is provided between the second heater and the inner surface of the side wall, it is possible to make it difficult for the air bubbles to come into contact with the second heater and the inner surface of the side wall. Can be prevented. Further, convection can be formed in the liquid source container, and the liquid source can be stirred. Furthermore, by providing a plurality of bubble generators, even if the liquid source container is large, the agitation effect of the liquid source can be sufficiently exerted by the bubbles generated by each bubble generator and stored. The temperature distribution of the liquid raw material can be made uniform easily.
- the temperature distribution of the liquid source can be made more uniform by the bubbles generated by the bubble generator.
- the vicinity of the second heater is in the temperature gradient region generated between the second heater and the liquid raw material, and in the state where bubbles are generated, the influence of the bubbles attached to the second heater. Is a position that can be substantially ignored.
- the plurality of bubble generators be provided radially and equidistantly about the central axis of the liquid material container.
- the plurality of bubble generators In order to make the temperature distribution of the liquid material uniform with high accuracy by making the bubbles generated from each bubble generator constant, the plurality of bubble generators have the same configuration, and the gas supply pipes are It is desirable to provide a constant flow device for supplying a carrier gas having a constant flow rate to the plurality of bubble generators.
- the recombination of bubbles can be prevented to suppress the enlargement of bubbles, and the temperature of the liquid material stored in the liquid material container can be made uniform.
- FIG. 1 is an overall configuration diagram of a liquid raw material vaporizer according to an embodiment of the present invention. It is a schematic diagram which shows the arrangement
- the liquid source vaporization apparatus 100 is a device that vaporizes and supplies a liquid source serving as a film forming source to a film forming apparatus using a CVD method or the like by a bubbling method, as shown in FIG.
- a liquid raw material container 2 in which a liquid raw material such as tetraethoxysilane (TEOS) is stored, and provided on the side wall, upper wall, and lower wall of the liquid raw material container 2 for heating the stored liquid raw material to a predetermined temperature.
- TEOS tetraethoxysilane
- a plurality of bubble generators 5 provided between the second heater 4 and the side wall for discharging and bubbling a carrier gas into the liquid raw material, and a carrier such as nitrogen or argon in the bubble generator 5 Gas supply Comprising a gas supply pipe 6, the.
- the liquid raw material container 2 is a stainless steel sealed container having a substantially rotating body shape.
- an upper space (gas phase) formed in a state where the liquid raw material is stored the vaporized liquid raw material after bubbling is used as a carrier gas.
- a gas outlet pipe 7 for supplying to a film forming apparatus (not shown) is connected.
- the figure in which the gas outlet pipe 7 is connected to the upper wall of the liquid raw material container 2 in FIG. 1 is shown.
- the first heater 3 is provided in contact with or close to the entire outer surface of the side wall, upper wall, and lower wall of the liquid source container 2. Further, the second heater 4 is supported and provided on the upper wall so as to extend in the vertical direction at the inner central portion of the liquid source container 2. Note that the first heater 3 and the second heater 4 are heated to the same temperature (for example, 50 ° C.) by a control unit (not shown) in order to heat the liquid raw material to a predetermined temperature (for example, 50 ° C.). .
- the bubble generator 5 discharges a carrier gas into the liquid raw material to form a large number of bubbles having a predetermined diameter, and the configuration of each bubble generator 5 is the same.
- the diameter of the bubble is such that the liquid source vaporizes and saturates in the bubble, and is about 1 mm, for example.
- the flow rate of the carrier gas supplied to the bubble generator 5 is determined by a mass flow controller (MFC) 8 and a constant flow device, which will be described later.
- MFC mass flow controller
- the bubble generator 5 is provided in the vicinity of the bottom of the liquid raw material container 2. Specifically, the bubble generator 5 is positioned below the second heater 4 and radially outside the second heater 4. Is provided. More specifically, the bubble generator 5 is provided so that bubbles generated by the bubble generator 5 pass through the vicinity of the inner surface of the side wall of the liquid source container 2 and the vicinity of the second heater 4. In the present embodiment, the bubble generator 5 extends from the vicinity of the second heater 4 to the vicinity of the side wall of the container 2 between the second heater 4 and the side wall of the container 2 as shown in FIG. Is provided. That is, in the vertical projection, the second heater 4 and the side wall of the container 2 and the bubble generator 5 are provided so as not to overlap each other. Further, as shown in FIG. 2, the bubble generators 5 are provided radially and equidistantly about the central axis C of the liquid raw material container 2.
- the vicinity of the second heater 4 is a temperature gradient region generated between the second heater 4 and the liquid material (“temperature gradient region on the second heater side” in FIG. 3). ) And in a state where bubbles are generated, the position is such that the influence of the bubbles attached to the second heater 4 can be substantially ignored.
- the vicinity of the inner surface of the side wall refers to the inner surface of the side wall in the temperature gradient region (the “temperature gradient region on the side wall side” in FIG. 3) generated between the inner surface of the side wall and the liquid raw material. This is a position where the effect of vaporization efficiency due to the adhesion of bubbles to the surface can be substantially ignored.
- the temperature gradient region is a region where the temperature of the liquid material changes as the liquid material moves away from the heaters 3 and 4 in the horizontal direction at the liquid surface or a predetermined depth.
- FIG. 3 shows the temperature distribution of the liquid source at a predetermined depth X and its temperature gradient region.
- the temperature gradient region generated between the second heater 4 and the liquid raw material is different when the operation of the second heater 4 starts (at the start of heating) and when the heating is stable, and is heated more than the temperature gradient region at the start of the operation.
- the stable temperature gradient region is narrower. Therefore, in order to bring the bubble generator 5 as close as possible to the second heater 4, it is preferable that the bubble generator 5 is provided in a temperature gradient region generated between the inner surface of the side wall and the liquid raw material at the time of stable heating.
- the temperature gradient region generated between the inner surface of the side wall and the liquid raw material is different at the start of operation of the first heater 3 (at the start of heating) and at the time of stable heating, and more stable than the temperature gradient region at the start of operation.
- the temperature gradient region at the time is narrower. Therefore, in order to bring the bubble generator 5 as close as possible to the inner surface of the side wall, it is preferable that the bubble generator 5 is provided in a temperature gradient region generated between the inner surface of the side wall and the liquid material at the time of stable heating.
- the gas supply pipe 6 is provided by being inserted into the liquid source container 2 from the upper wall, and is provided along the second heater 4 in this embodiment. Specifically, the gas supply pipe 6 is provided by being inserted from the upper wall of the liquid source container 2 into the inside, and extends along the second heater 4 to the lower end of the lower end thereof, and the lower end of the main pipe 61. And a plurality of branch pipes 62 extending in the radial direction of the liquid raw material container 2.
- the main pipe 61 is provided so that its pipe axis is substantially parallel to the central axis C of the liquid source container 2, and the branch pipe 62 is radially and radially in a direction substantially perpendicular to the pipe axis of the main pipe 61. Are branched at equal intervals.
- the bubble generator 5 is connected to the tip of the branch pipe 62. That is, the gas supply pipe 6 is configured to be branched on the lower side below the lower end of the second heater 4.
- the main pipe 61 is provided with a mass flow controller (MFC) 8 for controlling the flow rate of the carrier gas and a preheater 9 for preheating the carrier gas.
- MFC mass flow controller
- the pipe of only the main pipe 61 exists in the upper part of the bubble generator 5, so that the pipe structure of the upper part of the bubble generator 5 can be simplified, and the bubbles generated from the bubble generator 5 come into contact with the pipe. Can be suppressed as much as possible.
- the branch pipe 62 and the bubble generator 5 are connected by a pipe joint 10 such as a VCR joint, for example.
- the orifice as a constant flow device is comprised by making small the opening diameter of the cyclic
- FIG. The pipe joints 10 of the respective branch passages 62 and the respective bubble generators 5 have the same configuration, and the sealing material 11 therein also has the same configuration. Thereby, it is comprised so that the supply flow rate of the carrier gas supplied to each bubble generator 5 may become the same.
- the carrier gas supply pipe is composed of one main pipe and a plurality of branch pipes, but one carrier gas supply pipe is provided for each bubble generator without branching the carrier gas supply pipe. May be provided. Further, a plurality of bubble generators may be grouped, and a carrier gas supply pipe similar to that of the above embodiment may be provided for each group.
- connection position of the carrier gas supply pipe is not limited to the upper wall of the liquid source container, and may be a side wall or a lower wall.
- the constant flow device provided in the branch pipe of a carrier gas supply pipe is comprised using the sealing material provided in a VCR joint inside, it is made to provide a constant flow device separately on a branch pipe. Also good.
- FIG. 5 by supplying a plurality of bubble generators as a group, carrier gas supply pipes 6A and 6B are provided for each group, and switching valves V are provided in the supply pipes 6A and 6B. You may comprise so that the liquid raw material may be vaporized by switching the pipes 6A and 6B.
- a pressure sensor P for measuring the pressure in each of the supply pipes 6A and 6B is provided, and the bubble generator 5 is clogged when the pressure in one of the supply pipes used is increased to a predetermined value or more. Therefore, bubbles are generated by switching to the other supply pipe.
- FIG. 5 by supplying a plurality of bubble generators as a group, carrier gas supply pipes 6A and 6B are provided for each group, and switching valves V are provided in the supply pipes 6A and 6B. You may comprise so that the liquid raw material may be vaporized by switching the pipes 6A and 6B.
- a pressure sensor P for measuring the pressure in each of the supply pipes 6A and 6B is provided, and the bubble generator 5 is c
- FIG 5 shows a configuration in which the carrier gas supply pipes 6A and 6B merge on the upstream side and a pressure sensor P is provided at the junction to measure the pressure.
- a pressure sensor P is provided at the junction to measure the pressure.
- the liquid material vaporization apparatus of the above embodiment is configured using a plurality of bubble generators.
- a single bubble generator having an annular shape (for example, an annular shape) is used to surround the second heater. It may be configured.
- the four bubble generators are provided.
- the number of bubble generators can be appropriately changed depending on the configuration of the flow rate of the carrier gas or the size and shape of the liquid source container.
- the bubble generators are provided radially at equal intervals, but the arrangement mode of the bubble generators can be changed as appropriate depending on the configuration in the liquid source container.
- the liquid raw material vaporizer of the embodiment does not have the second heater, the liquid raw material can be vaporized, but if the liquid raw material container is enlarged, the vaporization efficiency is lowered. On the other hand, if the liquid material container is small, the liquid material can be sufficiently vaporized only by the first heater.
- the liquid source vaporizer is provided on at least the side wall of the liquid source container in which the liquid source is stored and the liquid source container, and heats the stored liquid source And a plurality of bubble generators for immersing in the stored liquid raw material, releasing a carrier gas into the liquid raw material and bubbling, and supplying the carrier gas to the bubble generator It is desirable that a plurality of bubble generators be provided so that bubbles generated by the plurality of bubble generators pass in the vicinity of the inner surface of the side wall of the liquid raw material container.
- the recombination of bubbles can be prevented to suppress the enlargement of bubbles, and the temperature of the liquid raw material stored in the liquid raw material container can be made uniform.
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
2 ・・・液体原料容器
3 ・・・第1のヒータ
4 ・・・第2のヒータ
5 ・・・気泡発生器
6 ・・・ガス供給管 DESCRIPTION OF
このように構成した本実施形態に係る液体原料気化装置100によれば、液体原料容器2の側壁及び内部中央部に第1のヒータ3及び第2のヒータ4を設けているので、液体原料容器2内に貯留された液体原料の温度分布の均一化を容易にすることができる。また、気泡発生器5を第2のヒータ4及び側壁内面の間に設けているので、第2のヒータ4及び側壁内面に気泡を接触しにくくすることができ、それらに気泡が付着することによる気泡の肥大化を防ぐことができる。また、複数の気泡発生器5を設けることによって、液体原料容器2が大型のものであっても、各気泡発生器5により生じた気泡により液体原料の攪拌効果を十分に発揮することができ、貯留された液体原料の温度分布の均一化を容易にすることができる。 <Effect of this embodiment>
According to the liquid raw
なお、本発明は前記実施形態に限られるものではない。 <Other modified embodiments>
The present invention is not limited to the above embodiment.
Claims (4)
- 液体原料が貯留される液体原料容器と、
前記液体原料容器の少なくとも側壁に設けられて、貯留された液体原料を加熱するための第1のヒータと、
前記液体原料容器の内部に設けられて、貯留された液体原料を加熱するための第2のヒータと、
貯留された液体原料中に浸漬されるとともに、前記第2のヒータ及び側壁との間に設けられ、前記液体原料中にキャリアガスを放出してバブリングするための複数の気泡発生器と、
前記気泡発生器にキャリアガスを供給するガス供給管と、を備える液体原料気化装置。 A liquid source container in which the liquid source is stored;
A first heater provided on at least a side wall of the liquid source container for heating the stored liquid source;
A second heater provided in the liquid source container for heating the stored liquid source;
A plurality of bubble generators that are immersed in the stored liquid raw material and provided between the second heater and the side wall, for discharging a carrier gas into the liquid raw material and bubbling;
A liquid raw material vaporizer comprising: a gas supply pipe for supplying a carrier gas to the bubble generator. - 前記複数の気泡発生器により生じる気泡が、前記液体原料容器の側壁内面の近傍及び前記第2のヒータの近傍を通過するように、前記複数の気泡発生器が設けられている請求項1記載の液体原料気化装置。 2. The plurality of bubble generators are provided so that bubbles generated by the plurality of bubble generators pass through the vicinity of the inner surface of the side wall of the liquid source container and the vicinity of the second heater. Liquid raw material vaporizer.
- 前記複数の気泡発生器が、前記液体原料容器の中心軸を中心として放射状に且つ等間隔に設けられている請求項1記載の液体原料気化装置。 The liquid raw material vaporizer according to claim 1, wherein the plurality of bubble generators are provided radially and equidistantly about a central axis of the liquid raw material container.
- 前記複数の気泡発生器が同一の構成のものであり、前記ガス供給管が、前記複数の気泡発生器に一定流量のキャリアガスを供給するための定流量器を備える請求項1記載の液体原料気化装置。 The liquid material according to claim 1, wherein the plurality of bubble generators have the same configuration, and the gas supply pipe includes a constant flow device for supplying a carrier gas having a constant flow rate to the plurality of bubble generators. Vaporizer.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2010800137038A CN102365388A (en) | 2009-04-21 | 2010-04-19 | Liquid raw material vaporizer |
US13/265,845 US20120042838A1 (en) | 2009-04-21 | 2010-04-19 | Liquid source vaporizer |
JP2010515300A JP5702139B2 (en) | 2009-04-21 | 2010-04-19 | Liquid raw material vaporizer |
Applications Claiming Priority (2)
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JP2009103228 | 2009-04-21 | ||
JP2009-103228 | 2009-04-21 |
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WO2010122972A1 true WO2010122972A1 (en) | 2010-10-28 |
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PCT/JP2010/056908 WO2010122972A1 (en) | 2009-04-21 | 2010-04-19 | Liquid raw material vaporizer |
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US (1) | US20120042838A1 (en) |
JP (1) | JP5702139B2 (en) |
CN (1) | CN102365388A (en) |
WO (1) | WO2010122972A1 (en) |
Cited By (1)
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JP2015134964A (en) * | 2014-01-17 | 2015-07-27 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC | Delivery device, method of manufacturing the same, and article including the same |
Families Citing this family (6)
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CN103454383A (en) * | 2013-09-05 | 2013-12-18 | 长三角(嘉兴)纳米科技产业发展研究院 | Dynamic response performance test system for gas sensor |
CN103710683B (en) * | 2014-01-09 | 2016-08-17 | 北京七星华创电子股份有限公司 | A kind of source bottle being applied to atomic layer deposition apparatus |
JP6712440B2 (en) * | 2015-03-13 | 2020-06-24 | 株式会社堀場エステック | Liquid material vaporizer, liquid material vaporization system |
US10480070B2 (en) * | 2016-05-12 | 2019-11-19 | Versum Materials Us, Llc | Delivery container with flow distributor |
CN110658352B (en) * | 2019-10-14 | 2022-05-13 | 中国科学技术大学 | Sample introduction device |
CN111991828B (en) * | 2020-09-29 | 2022-04-15 | 广州市爱百伊生物技术有限公司 | Device and method for purifying tender repair essence |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04218675A (en) * | 1990-12-18 | 1992-08-10 | Mitsubishi Electric Corp | Vaporizer |
JPH05138008A (en) * | 1990-10-22 | 1993-06-01 | Watkins Johnson Co | Liquid source bubbler |
JPH06267852A (en) * | 1993-03-12 | 1994-09-22 | Hitachi Ltd | Evaporation apparatus for liquid raw material |
JP2002131113A (en) * | 2000-10-11 | 2002-05-09 | Applied Materials Inc | Sensor, liquid storage container and bubbling detection method |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4212663A (en) * | 1978-01-26 | 1980-07-15 | Corning Glass Works | Reactants delivery system for optical waveguide manufacturing |
US4979830A (en) * | 1989-10-02 | 1990-12-25 | Gte Products Corporation/Gte Laboratories, Inc. | Method for fluidized bed circulation control |
US5365889A (en) * | 1992-11-13 | 1994-11-22 | Fostyer Wheeler Energy Corporation | Fluidized bed reactor and system and method utilizing same |
US6135433A (en) * | 1998-02-27 | 2000-10-24 | Air Liquide America Corporation | Continuous gas saturation system and method |
US6178925B1 (en) * | 1999-09-29 | 2001-01-30 | Advanced Technology Materials, Inc. | Burst pulse cleaning method and apparatus for liquid delivery system |
KR100502575B1 (en) * | 2001-02-13 | 2005-07-20 | 신창근 | Heat exchanging type boiler |
JP3828821B2 (en) * | 2002-03-13 | 2006-10-04 | 株式会社堀場エステック | Liquid material vaporizer |
JP2003340265A (en) * | 2002-05-24 | 2003-12-02 | Sumitomo Electric Ind Ltd | Method and apparatus for vaporizing liquid raw material, and apparatus for producing glass base material |
US7186385B2 (en) * | 2002-07-17 | 2007-03-06 | Applied Materials, Inc. | Apparatus for providing gas to a processing chamber |
JP4553245B2 (en) * | 2004-09-30 | 2010-09-29 | 東京エレクトロン株式会社 | Vaporizer, film forming apparatus and film forming method |
KR100678467B1 (en) * | 2005-01-12 | 2007-02-02 | 삼성전자주식회사 | Substrate dryer and drying method using that |
JP2006322683A (en) * | 2005-05-20 | 2006-11-30 | Mitsubishi Heavy Ind Ltd | Steam generator |
US8603580B2 (en) * | 2005-11-28 | 2013-12-10 | Msp Corporation | High stability and high capacity precursor vapor generation for thin film deposition |
JP4324619B2 (en) * | 2007-03-29 | 2009-09-02 | 東京エレクトロン株式会社 | Vaporization apparatus, film forming apparatus, and vaporization method |
US7954459B2 (en) * | 2007-06-27 | 2011-06-07 | The Boeing Company | Method and apparatus for vaporizing liquid |
US8110146B2 (en) * | 2007-11-27 | 2012-02-07 | Seiko Instruments Inc. | Embedded block humidifier, automatic thin slice manufacturing device, and automatic thin slice specimen manufacturing apparatus |
-
2010
- 2010-04-19 US US13/265,845 patent/US20120042838A1/en not_active Abandoned
- 2010-04-19 JP JP2010515300A patent/JP5702139B2/en active Active
- 2010-04-19 CN CN2010800137038A patent/CN102365388A/en active Pending
- 2010-04-19 WO PCT/JP2010/056908 patent/WO2010122972A1/en active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05138008A (en) * | 1990-10-22 | 1993-06-01 | Watkins Johnson Co | Liquid source bubbler |
JPH04218675A (en) * | 1990-12-18 | 1992-08-10 | Mitsubishi Electric Corp | Vaporizer |
JPH06267852A (en) * | 1993-03-12 | 1994-09-22 | Hitachi Ltd | Evaporation apparatus for liquid raw material |
JP2002131113A (en) * | 2000-10-11 | 2002-05-09 | Applied Materials Inc | Sensor, liquid storage container and bubbling detection method |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2015134964A (en) * | 2014-01-17 | 2015-07-27 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC | Delivery device, method of manufacturing the same, and article including the same |
Also Published As
Publication number | Publication date |
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JP5702139B2 (en) | 2015-04-15 |
JPWO2010122972A1 (en) | 2012-10-25 |
CN102365388A (en) | 2012-02-29 |
US20120042838A1 (en) | 2012-02-23 |
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