WO2010090488A2 - Conductive pattern and manufacturing method thereof - Google Patents

Conductive pattern and manufacturing method thereof Download PDF

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Publication number
WO2010090488A2
WO2010090488A2 PCT/KR2010/000763 KR2010000763W WO2010090488A2 WO 2010090488 A2 WO2010090488 A2 WO 2010090488A2 KR 2010000763 W KR2010000763 W KR 2010000763W WO 2010090488 A2 WO2010090488 A2 WO 2010090488A2
Authority
WO
WIPO (PCT)
Prior art keywords
conductive pattern
manufacturing
pattern
conductive
etching resist
Prior art date
Application number
PCT/KR2010/000763
Other languages
French (fr)
Korean (ko)
Other versions
WO2010090488A3 (en
Inventor
황지영
황인석
이동욱
박민춘
이승헌
전상기
손용구
구범모
Original Assignee
주식회사 엘지화학
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020090127756A external-priority patent/KR20100090628A/en
Application filed by 주식회사 엘지화학 filed Critical 주식회사 엘지화학
Priority to JP2011549071A priority Critical patent/JP5486019B2/en
Priority to US13/148,251 priority patent/US8637776B2/en
Priority to CN201080007007.6A priority patent/CN102308365B/en
Priority to EP10738772.2A priority patent/EP2395541B1/en
Publication of WO2010090488A2 publication Critical patent/WO2010090488A2/en
Publication of WO2010090488A3 publication Critical patent/WO2010090488A3/en
Priority to US14/080,980 priority patent/US9615450B2/en

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0224—Electrodes
    • H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/01—Tools for processing; Objects used during processing
    • H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
    • H05K2203/0143—Using a roller; Specific shape thereof; Providing locally adhesive portions thereon
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
    • H05K2203/1184—Underetching, e.g. etching of substrate under conductors or etching of conductor under dielectrics; Means for allowing or controlling underetching
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0079—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the method of application or removal of the mask

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Sustainable Energy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Sustainable Development (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Electric Cables (AREA)

Abstract

The present invention provides a method for manufacturing a conductive pattern, and the conductive pattern manufactured by the same. The method comprises the steps of: a) forming a conductive film on a substrate; b) forming an etching resist patter on the conductive film; and c) over-etching the conductive film by using the etching resist pattern in order to form the conductive pattern having a line width narrower than the etching resist pattern. The invention is able to efficiently and economically provide the conductive pattern having an ultra-fine line width.
PCT/KR2010/000763 2009-02-06 2010-02-08 Conductive pattern and manufacturing method thereof WO2010090488A2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2011549071A JP5486019B2 (en) 2009-02-06 2010-02-08 Conductive pattern and manufacturing method thereof
US13/148,251 US8637776B2 (en) 2009-02-06 2010-02-08 Conductive pattern and manufacturing method thereof
CN201080007007.6A CN102308365B (en) 2009-02-06 2010-02-08 An conductive pattern and method for manufacturing same
EP10738772.2A EP2395541B1 (en) 2009-02-06 2010-02-08 Manufacturing method for conductive pattern
US14/080,980 US9615450B2 (en) 2009-02-06 2013-11-15 Conductive pattern and manufacturing method thereof

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR20090009750 2009-02-06
KR10-2009-0009750 2009-02-06
KR1020090127756A KR20100090628A (en) 2009-02-06 2009-12-21 Preparation method for insulated conductive pattern
KR10-2009-0127756 2009-12-21

Related Child Applications (2)

Application Number Title Priority Date Filing Date
US13/148,251 A-371-Of-International US8637776B2 (en) 2009-02-06 2010-02-08 Conductive pattern and manufacturing method thereof
US14/080,980 Continuation US9615450B2 (en) 2009-02-06 2013-11-15 Conductive pattern and manufacturing method thereof

Publications (2)

Publication Number Publication Date
WO2010090488A2 true WO2010090488A2 (en) 2010-08-12
WO2010090488A3 WO2010090488A3 (en) 2010-11-18

Family

ID=42542532

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2010/000763 WO2010090488A2 (en) 2009-02-06 2010-02-08 Conductive pattern and manufacturing method thereof

Country Status (1)

Country Link
WO (1) WO2010090488A2 (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20090009750A (en) 2007-07-20 2009-01-23 후프 휠스벡 운트 퓌르스트 게엠베하 운트 콤파니 카게 Locking device with arresting part
KR20090127756A (en) 2008-06-09 2009-12-14 주식회사 삼양옵틱스 Method for manufacturing hybrid lens

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100269520B1 (en) * 1997-07-29 2000-10-16 구본준 Thin-film transistor, liquid-crystal display and manufacturing method thereof
JP3854889B2 (en) * 2001-04-19 2006-12-06 キヤノン株式会社 Method for producing metal or metal compound pattern and method for producing electron source
KR101192746B1 (en) * 2004-11-12 2012-10-18 엘지디스플레이 주식회사 Method of Fabricating Thin Film Transistor Substrate of Poly-type

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20090009750A (en) 2007-07-20 2009-01-23 후프 휠스벡 운트 퓌르스트 게엠베하 운트 콤파니 카게 Locking device with arresting part
KR20090127756A (en) 2008-06-09 2009-12-14 주식회사 삼양옵틱스 Method for manufacturing hybrid lens

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP2395541A4

Also Published As

Publication number Publication date
WO2010090488A3 (en) 2010-11-18

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