WO2010071107A1 - Thermosetting modified polyamide resin composition - Google Patents

Thermosetting modified polyamide resin composition Download PDF

Info

Publication number
WO2010071107A1
WO2010071107A1 PCT/JP2009/070825 JP2009070825W WO2010071107A1 WO 2010071107 A1 WO2010071107 A1 WO 2010071107A1 JP 2009070825 W JP2009070825 W JP 2009070825W WO 2010071107 A1 WO2010071107 A1 WO 2010071107A1
Authority
WO
WIPO (PCT)
Prior art keywords
modified polyimide
polyimide resin
resin composition
parts
mass
Prior art date
Application number
PCT/JP2009/070825
Other languages
French (fr)
Japanese (ja)
Inventor
慶太 高橋
村上 徹
修 池上
亮一 高澤
Original Assignee
宇部興産株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2008318589A external-priority patent/JP5621190B2/en
Application filed by 宇部興産株式会社 filed Critical 宇部興産株式会社
Publication of WO2010071107A1 publication Critical patent/WO2010071107A1/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40High-molecular-weight compounds
    • C08G18/64Macromolecular compounds not provided for by groups C08G18/42 - C08G18/63
    • C08G18/6415Macromolecular compounds not provided for by groups C08G18/42 - C08G18/63 having nitrogen
    • C08G18/6438Polyimides or polyesterimides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/30Low-molecular-weight compounds
    • C08G18/34Carboxylic acids; Esters thereof with monohydroxyl compounds
    • C08G18/348Hydroxycarboxylic acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00Polymeric products of isocyanates or isothiocyanates
    • C08G18/06Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72Polyisocyanates or polyisothiocyanates
    • C08G18/74Polyisocyanates or polyisothiocyanates cyclic
    • C08G18/76Polyisocyanates or polyisothiocyanates cyclic aromatic
    • C08G18/7657Polyisocyanates or polyisothiocyanates cyclic aromatic containing two or more aromatic rings
    • C08G18/7664Polyisocyanates or polyisothiocyanates cyclic aromatic containing two or more aromatic rings containing alkylene polyphenyl groups
    • C08G18/7671Polyisocyanates or polyisothiocyanates cyclic aromatic containing two or more aromatic rings containing alkylene polyphenyl groups containing only one alkylene bisphenyl group
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/0622Polycondensates containing six-membered rings, not condensed with other rings, with nitrogen atoms as the only ring hetero atoms
    • C08G73/0638Polycondensates containing six-membered rings, not condensed with other rings, with nitrogen atoms as the only ring hetero atoms with at least three nitrogen atoms in the ring
    • C08G73/0644Poly(1,3,5)triazines
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/08Polyhydrazides; Polytriazoles; Polyaminotriazoles; Polyoxadiazoles
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1085Polyimides with diamino moieties or tetracarboxylic segments containing heterocyclic moieties
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
    • H01B3/303Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups H01B3/38 or H01B3/302
    • H01B3/306Polyimides or polyesterimides
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
    • H01B3/40Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes epoxy resins
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
    • H01B3/44Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins
    • H01B3/447Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins from acrylic compounds
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/0353Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00Polymer mixtures characterised by other features
    • C08L2205/02Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/06Polyhydrazides; Polytriazoles; Polyamino-triazoles; Polyoxadiazoles
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0393Flexible materials
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0137Materials
    • H05K2201/0154Polyimide
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01Dielectrics
    • H05K2201/0137Materials
    • H05K2201/0158Polyalkene or polyolefin, e.g. polyethylene [PE], polypropylene [PP]

Definitions

  • the present invention relates to a modified polyimide resin composition and a cured film thereof.
  • the cured film obtained by heat-treating this modified polyimide resin composition can be suitably used as an insulating film (protective film) for the flexible wiring board.
  • Patent Document 1 describes a modified polyimide resin into which a soft segment made of a polycarbonate segment or a polybutadiene segment is introduced.
  • Patent Document 2 describes a modified polyimide resin into which a soft segment composed of a polybutadiene segment is introduced and a thermosetting composition composed of the modified polyimide resin.
  • Patent Document 3 describes a modified polyimide resin into which a soft segment composed of a polycarbonate segment is introduced and a thermosetting composition composed of the modified polyimide resin.
  • thermosetting compositions epoxy resins and / or polyisocyanate compounds are used as components responsible for the curing reaction, but the resulting cured film has a surface hardness and tackiness due to the soft segment. In some cases, there was room for improvement. Furthermore, when it was going to obtain a cured film with high surface hardness using these thermosetting compositions, there existed a problem that it was difficult to suppress the curvature accompanying heat hardening.
  • a cured film made of these compositions requires a high level of bending resistance as well as sufficient surface hardness.
  • An object of the present invention is to provide a thermosetting modified polyimide resin composition including a modified polyimide resin into which a soft segment composed of a polybutadiene segment or a polycarbonate segment is introduced. It is an object of the present invention to provide a thermosetting modified polyimide resin composition that can improve tackiness and can suitably suppress warpage that occurs with heat curing.
  • the cured film obtained by heat-treating this thermosetting modified polyimide resin composition is excellent in electrical insulation, heat resistance, flexibility, etc., and particularly improved in surface hardness, tackiness, and warpage. It can be suitably used as an insulating film for flexible wiring boards.
  • an object of one embodiment of the present invention is to provide a thermosetting modified polyimide resin composition capable of improving the folding resistance of a cured film obtained by heat treatment.
  • the cured film obtained by heat-treating this thermosetting modified polyimide resin composition is excellent in electrical insulation, heat resistance, flexibility, etc., and particularly has improved folding resistance in addition to surface hardness. It can be suitably used as an insulating film for flexible wiring boards.
  • thermosetting modified polyimide resin composition comprising a modified polyimide resin into which a soft segment composed of a polybutadiene segment or a polycarbonate segment has been introduced, is cured together with the modified polyimide resin.
  • the present inventors have found that the surface hardness, tackiness, and warpage of a cured film obtained by heat treatment are improved by using a guanamine resin as a component responsible for the reaction.
  • the present inventors performed heat treatment by adding acrylic resin beads in a modified polyimide resin composition configured to include a modified polyimide resin into which a soft segment composed of a polybutadiene segment or a polycarbonate segment is introduced. It has been found that the surface hardness of the resulting cured film can be improved and the folding resistance can also be improved.
  • the present invention relates to a modified polyimide resin composition
  • a modified polyimide resin composition comprising a modified polyimide resin into which a soft segment composed of a polybutadiene segment or a polycarbonate segment is introduced, and a guanamine resin.
  • one aspect of the present invention relates to a modified polyimide resin composition further containing acrylic beads.
  • a modified polyimide resin composition comprising a modified polyimide resin introduced with a soft segment comprising a polybutadiene segment or a polycarbonate segment
  • the surface hardness of the cured film obtained by heat treatment, tackiness, and A modified polyimide resin composition with improved warpage can be provided.
  • the cured film obtained by heat-treating this modified polyimide resin composition is excellent in electrical insulation, heat resistance, flexibility and the like, and particularly has improved surface hardness, tackiness and warpage. It can be suitably used as insulation for wiring boards.
  • the embodiment containing acrylic resin beads it is possible to provide a modified polyimide resin composition that can improve surface hardness and fold resistance.
  • the cured film obtained by heat-treating this modified polyimide resin composition has improved folding resistance and can be suitably used as an insulating film for flexible wiring boards.
  • This application discloses a first aspect containing a guanamine resin and a second aspect containing acrylic resin beads.
  • a modified polyimide resin composition comprising a modified polyimide resin into which a soft segment composed of a polybutadiene segment or a polycarbonate segment is introduced, and a guanamine resin.
  • the modified polyimide resin composition according to item (1) further comprising an epoxy resin.
  • the modified polyimide resin composition as described in (1) or (2) above wherein 1 to 60 parts by mass of guanamine resin is contained per 100 parts by mass of the modified polyimide resin.
  • a modified polyimide resin composition comprising an acrylic resin bead in a modified polyimide resin composition comprising a modified polyimide resin into which a soft segment comprising a polybutadiene segment or a polycarbonate segment is introduced.
  • the surface hardness of the cured film obtained by heat treatment in the modified polyimide resin solution composition comprising a modified polyimide resin into which a soft segment made of a polybutadiene segment or a polycarbonate segment is introduced.
  • the modified polyimide resin composition which can improve folding resistance can be provided.
  • the cured film obtained by heat-treating this modified polyimide resin composition is excellent in electrical insulation, heat resistance, flexibility and the like, and in particular, has improved surface hardness and fold resistance. It can be suitably used as an insulating film.
  • the first aspect and the second aspect disclosed in the present application can constitute the invention independently as described below. However, both effects can be obtained by simultaneously satisfying the definition of the first aspect and the definition of the second aspect.
  • the first aspect is preferably satisfied, that is, preferably contains a guanamine resin, and further satisfies the provisions of the items (2) to (4) of the first aspect. Furthermore, it is preferable to satisfy the items described for the first aspect in the following description.
  • the modified polyimide resin of the present invention is a modified polyimide resin in which a soft segment composed of a polybutadiene segment or a polycarbonate segment is introduced into a hard segment having an imide structure.
  • the modified polyimide resin is not particularly limited as long as it has both the hard segment and the soft segment.
  • it can be obtained by preparing a prepolymer having a terminal isocyanate group from diol and diisocyanate, and reacting the prepolymer with an aromatic tetracarboxylic acid component.
  • an alcoholic hydroxyl-terminated imide oligomer is prepared in advance, and obtained by reacting the alcoholic hydroxyl-terminated imide oligomer, polybutadiene diol or polycarbonate diol, and diisocyanate. Can do. The latter is more preferable because the resulting modified polyimide resin has better solubility and heat resistance.
  • a feature of the present invention is a modified polyimide resin composition
  • a modified polyimide resin composition comprising a modified polyimide resin into which a soft segment composed of a polybutadiene segment or a polycarbonate segment prepared as described above is introduced, and is cured together with the modified polyimide resin.
  • guanamine resin as a component responsible for the reaction, the surface hardness, tackiness, and warpage of the cured film obtained by heat treatment are improved.
  • the modified polyimide resin is preferably obtained by reacting a diisocyanate compound, polybutadiene diol or polycarbonate diol, and an alcoholic hydroxyl-terminated imide oligomer represented by the following chemical formula (1).
  • R represents a divalent hydrocarbon group
  • X represents a tetravalent group excluding the carboxyl group of tetracarboxylic acid
  • Y represents a divalent group excluding the amino group of diamine
  • m represents It is an integer from 0 to 50.
  • the diisocyanate compound may be any compound as long as it has two isocyanate groups in one molecule.
  • an aliphatic, alicyclic or aromatic diisocyanate preferably an aliphatic, alicyclic or aromatic diisocyanate having 2 to 30 carbon atoms excluding an isocyanate group, specifically 1,4- Tetramethylene diisocyanate, 1,5-pentamethylene diisocyanate, 1,6-hexamethylene diisocyanate, 2,2,4-trimethyl-1,6-hexamethylene diisocyanate, lysine diisocyanate, 3-isocyanate methyl-3,5,5 -Trimethylcyclohexyl isocyanate (isophorone diisocyanate), 1,3-bis (isocyanate methyl) -cyclohexane, 4,4'-dicyclohexylmethane diisocyanate, tolylene diisocyanate, 4,4'-diphenylmethane diisocyanate,
  • the polybutadiene diol preferably has a number average molecular weight of 500 to 10,000, more preferably 1,000 to 5,000. When the number average molecular weight is less than 500, it is difficult to obtain suitable flexibility, and when the number average molecular weight exceeds 10,000, the heat resistance and solvent resistance may be deteriorated.
  • the polybutadiene diol may have a double bond in the molecule or may be a hydrogenated double bond in the molecule, but the double bond remains in the molecule.
  • a hydrogenated polybutadiene diol in which a double bond in the molecule is hydrogenated is preferable because it may cause a crosslinking reaction and lose flexibility.
  • Preferred examples of the polybutadiene diol used in the present invention include GI-1000 and GI-2000 manufactured by Nippon Soda Co., Ltd., R-45EPI manufactured by Idemitsu Petrochemical Co., Ltd., and Polytail H manufactured by Mitsubishi Chemical Co., Ltd. it can.
  • the polycarbonate diol preferably has a number average molecular weight of 500 to 10,000, more preferably 1,000 to 5,000. When the number average molecular weight is less than 500, it is difficult to obtain suitable flexibility, and when the number average molecular weight exceeds 10,000, the heat resistance and solvent resistance may be deteriorated.
  • the polycarbonate diol used in the present invention includes UH-CARB, UD-CARB, UC-CARB, manufactured by Ube Industries, Ltd., PLACEL CD-PL, PLACEL CD-H, manufactured by Daicel Chemical Industries, Ltd., and Kuraray Co., Ltd. The Kuraray polyol C series made by the company etc. can be illustrated suitably. These polybutadiene diols and polycarbonate diols are used alone or in combination of two or more.
  • the alcoholic hydroxyl group-terminated imide oligomer represented by the chemical formula (1) is obtained from a tetracarboxylic acid component and an amine component composed of a diamine compound and a monoamine compound having one alcoholic hydroxyl group.
  • m represents an integer of 0 to 50, preferably 0 to 20, more preferably 0 to 10, particularly 1 to 5. When m is 50 or more, it takes time to dissolve, or the flexibility of the resulting cured film is inferior.
  • aromatic tetracarboxylic acids or acid dianhydrides or esterified products of lower alcohols thereof are suitable, and 2,3,3 ′, 4′-biphenyltetracarboxylic acid, 3,3 ', 4,4'-biphenyltetracarboxylic acid, 2,2', 3,3'-biphenyltetracarboxylic acid, 3,3 ', 4,4'-diphenyl ether tetracarboxylic acid, 3,3', 4,4 '-Diphenylsulfonetetracarboxylic acid, 3,3', 4,4'-benzophenonetetracarboxylic acid, 2,2-bis (3,4-benzenedicarboxylic acid) hexafluoropropane, pyromellitic acid, 1,4-bis (3,4-benzenedicarboxylic acid) benzene, 2,2-bis [4- (3,4-phenoxydica
  • tetracarboxylic acid component examples include fats such as cyclopentanetetracarboxylic acid, 1,2,4,5-cyclohexanetetracarboxylic acid, and 3-methyl-4-cyclohexene-1,2,4,5-tetracarboxylic acid. Cyclic tetracarboxylic acids or acid dianhydrides or esterified products of lower alcohols can also be used.
  • aromatic, alicyclic and aliphatic diamines can be used.
  • aromatic diamine one benzene such as 1,4-diaminobenzene, 1,3-diaminobenzene, 2,4-diaminotoluene, 1,4-diamino-2,5-dihalogenobenzene is used.
  • diamines bis (4-aminophenyl) ether, bis (3-aminophenyl) ether, bis (4-aminophenyl) sulfone, bis (3-aminophenyl) sulfone, bis (4-aminophenyl) methane
  • bis (4-aminophenyl) sulfide bis (3-aminophenyl) sulfide, 2,2-bis (4-aminophenyl) propane, 2,2-bis (3-amino) Phenyl) propane, 2,2-bis (4-aminophenyl) hexafluoropropane, o-dianisidine, o-tolidine, tolidine
  • Diamines containing two benzenes such as sulfonic acids, 1,4-bis (4-aminophenoxy) benzene, 1,4-bis (3-aminophenoxy) benzene, 1,4-bis (4-bis (4-bis (4-aminophene, 1,4-
  • the monoamine compound having one alcoholic hydroxyl group is a hydrocarbon compound having one alcoholic hydroxyl group and one amino group in the molecule, and preferably has a carbon number such as aminoethanol, aminopropanol, and aminobutanol.
  • Examples thereof include an aliphatic monoamine compound having 1 to 10 alcoholic hydroxyl groups and an alicyclic monoamine compound having an alcoholic hydroxyl group having 3 to 20 carbon atoms such as aminocyclohexanol.
  • the alcoholic hydroxyl-terminated imide oligomer comprises a tetracarboxylic acid component and an amine component composed of a diamine compound and a monoamine compound having one hydroxyl group, an acid anhydride group (or two adjacent carboxyl groups, etc.) of the tetracarboxylic acid component. ) And the number of equivalents of the amino group of the amine component so as to be approximately equal to each other, polymerization and imidization reaction can be performed in an organic solvent.
  • a tetracarboxylic acid component (particularly tetracarboxylic dianhydride), an amine component composed of a diamine compound and a monoamine compound having a hydroxyl group, an acid anhydride group (or an adjacent dicarboxylic acid group) and an amine component.
  • the oligomer having an amide-acid bond is obtained by reacting each component in an organic polar solvent at a reaction temperature of about 100 ° C. or lower, particularly 80 ° C. or lower, in such a proportion that the amino group of Then, the amide-acid oligomer (also called amic acid oligomer) is added with an imidizing agent at a low temperature of about 0 ° C. to 140 ° C.
  • toluene or xylene may be added and reacted while removing condensed water by azeotropy.
  • Examples of the organic solvent used for producing the alcoholic hydroxyl-terminated imide oligomer include amides such as N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, and N-methylcaprolactam.
  • Solvents solvents containing sulfur atoms such as dimethyl sulfoxide, hexamethylphosphamide, dimethyl sulfone, tetramethylene sulfone, dimethyltetramethylene sulfone, phenol solvents such as cresol, phenol, xylenol, diethylene glycol dimethyl ether (diglyme), triethylene glycol Diglyme solvents such as dimethyl ether (triglyme) and tetraglyme, lactone solvents such as ⁇ -butyrolactone, isophorone, cyclohexanone, 3,3,5-trime Ketones solvents such as Le cyclohexanone, pyridine, ethylene glycol, dioxane, and the like tetramethylurea.
  • sulfur atoms such as dimethyl sulfoxide, hexamethylphosphamide, dimethyl sulfone, tetramethylene sulfone, dimethylte
  • the alcoholic hydroxyl-terminated imide oligomer produced as described above may be a mixture of a plurality of oligomers having different m in the chemical formula (1).
  • a mixture composed of a plurality of imide oligomers having different m may be used separately for each imide oligomer, but can be suitably used as it is without separation.
  • m (average value of m in the case of a mixture) of the bifunctional hydroxyl-terminated imide oligomer can be controlled by the charging ratio (molar ratio) of the diamine compound and the monoamine compound in the amine component at the time of production.
  • a diisocyanate compound, a polybutadiene diol or a polycarbonate diol, and an alcoholic hydroxyl group-terminated imide oligomer may be reacted at the same time.
  • the diisocyanate compound and the polybutadiene diol or the polycarbonate diol are converted into a hydroxyl group. It can react suitably so that it may become an excess amount, and it can obtain suitably by making a terminal isocyanate compound react, and then making an alcoholic hydroxyl group terminal imide oligomer react with the said terminal isocyanate compound.
  • These reactions can be carried out without solvent or in an organic solvent, usually at a reaction temperature of 30 ° C.
  • the organic solvent a solvent used for producing the above-mentioned alcoholic hydroxyl group-terminated imide oligomer can be preferably used. Details of the modified polyimide resin are as described in more detail in Patent Documents 1 to 3.
  • a modified polyimide resin composition may be obtained by replacing a part of polybutadiene diol or polycarbonate diol (usually about 5 to 40 mol% in the diol component) with a reactive polar group-containing diol. Is suitable for curing by heating.
  • a reactive polar group-containing diol a diol compound having an active hydrogen as a substituent, for example, a diol compound having a carboxyl group or a phenolic hydroxyl group is preferable, and the number of carbons having a carboxyl group or a phenolic hydroxyl group as a substituent is particularly preferred.
  • a diol compound having 1 to 30 carbon atoms and 2 to 20 carbon atoms is preferred.
  • examples of the diol compound having a carboxyl group include 2,2-bis (hydroxymethyl) propionic acid and 2,2-bis (hydroxymethyl) butyric acid.
  • examples of the diol compound having a phenolic hydroxyl group include 2,6-bis (hydroxymethyl) -phenol and 2,6-bis (hydroxymethyl) -p-cresol.
  • the modified polyimide resin composition of the present invention comprises at least 100 parts by weight of a modified polyimide resin into which a soft segment comprising (A component) polybutadiene segment or polycarbonate segment is introduced, and (B component) 1 to 60 parts by weight of guanamine resin, preferably 1 to 50 parts by mass, more preferably 3 to 40 parts by mass, particularly preferably 3 to 30 parts by mass, and an organic solvent.
  • the guanamine resin is a component responsible for the curing reaction of the modified polyimide resin composition of the present invention. If the content of the guanamine resin is less than the above range, the effect of the present invention cannot be obtained. If the content exceeds the above range, the modified polyimide resin into which the soft segment composed of the polybutadiene segment or the polycarbonate segment is introduced has excellent characteristics. Insulation, heat resistance, flexibility, etc. may be reduced.
  • modified polyimide resin composition of the present invention 0.1 to 30 parts by mass, preferably 0.1 to 20 parts by mass, more preferably 0, of (C component) epoxy resin as a component responsible for the curing reaction. It is preferable to contain 5 to 10 parts by mass since the low-temperature curability can be improved.
  • guanamine resin a benzoguanamine resin which is a condensate of benzoguanamine and formaldehyde is preferable.
  • benzoguanamine resins lower alkyl etherified benzoguanamine resins obtained by etherifying some or all of the methylol groups of the methylolated benzoguanamine resin with a lower alcohol are particularly preferable.
  • benzoguanamine resin examples include Cymel 1123 (mixed etherified benzoguanamine resin of methyl ether and ethyl ether), Cymel 1123-10 (mixed etherified benzoguanamine resin of methyl ether and butyl ether) manufactured by Nippon Cytec Industries, Inc. Cymel 1128 (Butyl etherified benzoguanamine resin), Mycoat 102 (Methyletherified benzoguanamine resin), Mycoat 132 (Methyl and butyl mixed etherified benzoguanamine / melamine co-condensation resin), Mycoat 136 (Methyl) manufactured by Nihon Cytec Industries, Ltd.
  • a mixed etherified benzoguanamine resin of ether and butyl ether) and the like can be preferably mentioned.
  • the epoxy resin is preferably a liquid or solid epoxy resin having an epoxy equivalent of about 100 to 4000 and a molecular weight of about 300 to 10,000.
  • bisphenol A type or bisphenol F type epoxy resin manufactured by Japan Epoxy Resin Co., Ltd .: Epicoat 806, Epicoat 825, Epicoat 828, Epicoat 1001, Epicoat 1002, Epicoat 1003, Epicoat 1004, Epicoat 1055AF, Epicoat 1004AF, Epicoat 1007, Epicoat 1009, Epicoat 1010, etc.
  • Trifunctional or higher epoxy resin Japan Epoxy Resin: Epicoat 152, Epicoat 154, Epicoat 180 series, Epicoat 157 series, Epicoat 1032 series, Sumitomo Chemical Co., Ltd .: Sumiepoxy ELM100, Daicel Chemical Kogyo Co., Ltd .: EHPE3150, Ciba Geigy: MT0163, etc.
  • terminal epoxidized oligomer Ube
  • the modified polyimide resin composition of the present invention 1 to 50 parts by mass, preferably 2 to 40 parts by mass, more preferably 5 to 30 parts by mass of two or more phenolic hydroxyl groups with respect to 100 parts by mass of the modified polyimide resin. It can contain the compound which has.
  • the compound having two or more phenolic hydroxyl groups include hydroquinone, 4,4'-dihydroxybiphenyl, and phenol resins such as phenol novolac and cresol novolac.
  • phenol resins Meiwa Kasei Co., Ltd.
  • the modified polyimide resin composition usually contains a solvent.
  • the organic solvent used in the synthesis of the modified polyimide resin can be used as it is, but preferably a nitrogen-containing solvent such as N, N-dimethylacetamide, N, N-diethylacetamide, N , N-dimethylformamide, N, N-diethylformamide, N-methyl-2-pyrrolidone, 1,3-dimethyl-2-imidazolidinone, N-methylcaprolactam, etc., sulfur-containing atomic solvents such as dimethyl sulfoxide, diethyl sulfoxide , Dimethylsulfone, diethylsulfone, hexamethylsulfuramide, and other oxygen-containing solvents such as phenolic solvents cresol, phenol, xylenol, diglyme-based solvents diethylene glycol dimethyl ether (diglyme), triethylene glycol dimethyl ether ( (Liglyme), tetraglyme
  • N-methyl-2-pyrrolidone, N, N-dimethylsulfoxide, N, N-dimethylformamide, N, N-diethylformamide, N, N-dimethylacetamide, N, N-diethylacetamide, ⁇ -butyrolactone, tri Ethylene glycol dimethyl ether or the like can be preferably used.
  • the thermosetting modified polyimide resin composition of the present invention preferably contains a curing catalyst such as a curing accelerating catalyst for accelerating the crosslinking reaction by heat treatment.
  • the modified polyimide resin composition may contain fine fillers, pigments such as organic color pigments and inorganic color pigments, antifoaming agents, leveling agents and the like.
  • the fine filler for example, conventionally known fine inorganic fillers such as silica, alumina, potassium carbonate, talc, barium sulfate, or fine organic fillers such as acrylic resin beads and urethane resin beads can be preferably cited. it can.
  • the above-mentioned acrylic resin beads and urethane resin beads are preferably spherical particles that can be easily obtained by suspension polymerization of methyl methacrylate or the like.
  • the acrylic resin beads and urethane resin beads used in the present invention are preferably contained as fillers in the solution composition, and are preferably spherical crosslinked acrylic resin beads or crosslinked urethane resin beads.
  • the average particle size of the fine inorganic or organic filler is not particularly limited, but 0.001 to 20 ⁇ m, preferably 0.01 to 10 ⁇ m, more preferably 0.01 to 5 ⁇ m is suitable.
  • the modified polyimide resin composition of the present invention is not particularly limited, but the solution viscosity at room temperature (25 ° C.) is 5 to 1000 Pa ⁇ s, particularly 10 to 100 Pa ⁇ s, more preferably 10 to 60 Pa ⁇ s. However, it is preferable because workability such as screen printing, solution physical properties, and properties of the obtained cured insulating film are good.
  • the modified polyimide resin composition of the present invention can be suitably used for forming an insulating film (protective film) for electrical and electronic parts on which chip parts such as IC chips are mounted.
  • an insulating film protecting film
  • the solvent is removed by heat treatment at a temperature of about 5 to 60 minutes, and then cured by heat treatment at about 100 to 210 ° C., preferably at 110 to 200 ° C. for 5 to 120 minutes, preferably about 10 to 60 minutes.
  • a cured insulating film having an elastic modulus of 10 to 500 MPa is preferably formed.
  • the modified polyimide resin composition of the present invention has improved surface hardness and tackiness, is easy to suppress warpage, and not only provides strong adhesion to a sealing material or anisotropic conductive material. High flexibility, excellent electrical properties, good adhesion to conductive metals and substrates, heat resistance, solder heat resistance, solvent resistance (for example, acetone, isopropanol, methyl ethyl ketone, N-methyl-2) A cured insulating film having excellent solvent resistance to pyrrolidone), chemical resistance, flex resistance, and the like can be formed.
  • composition for a modified polyimide resin insulating film of the present invention forms an insulating film having good performance as described above by heat treatment at a relatively low temperature of about 120 to 160 ° C., particularly about 120 ° C. (130 ° C. or less). It is possible. Therefore, it can also be suitably used as an interlayer adhesive for a multilayer wiring board.
  • the modified polyimide resin of the present invention is a modified polyimide resin in which a soft segment composed of a polybutadiene segment or a polycarbonate segment is introduced into a hard segment having an imide structure, as described in the first embodiment.
  • a feature of the present invention is that a modified polyimide resin composition comprising a modified polyimide resin into which a soft segment composed of a polybutadiene segment or a polycarbonate segment prepared as described above is introduced, wherein acrylic resin beads are used as a filler.
  • a modified polyimide resin composition comprising a modified polyimide resin into which a soft segment composed of a polybutadiene segment or a polycarbonate segment prepared as described above is introduced, wherein acrylic resin beads are used as a filler.
  • modified polyimide resin those described in the first embodiment can be used.
  • the modified polyimide resin composition of the present invention preferably comprises (A) 100 parts by mass of a modified polyimide resin into which a soft segment composed of a polybutadiene segment or a polycarbonate segment is introduced, (B) an epoxy compound, a polyvalent isocyanate compound, and an amino resin. At least one curable compound selected from the group consisting of 1 to 100 parts by weight, preferably 2 to 80 parts by weight, particularly 10 to 60 parts by weight, (C) 1 to 80 parts by weight of acrylic resin beads, and (D) an organic solvent. Consists of including.
  • the curable compound (B) can be used alone or in combination of two or more, but a combination of an epoxy compound and a polyvalent isocyanate compound or a combination of an epoxy compound and an amino resin is particularly preferable. If the amount used is more than the above range, the electrical insulation properties of the insulating film after curing will be reduced or tackiness will appear, and if it is too small, the heat resistance and chemical resistance of the insulating film after curing will deteriorate. Said range is preferred.
  • a guanamine resin which is a kind of amino resin is selected as the curable compound (B), and an epoxy resin is preferably used in combination.
  • the epoxy compound described in the first aspect can be used.
  • the isocyanate compound may be any compound as long as it has two or more isocyanate groups in one molecule.
  • isocyanate compounds include aliphatic, alicyclic or aromatic diisocyanates such as 1,4-tetramethylene diisocyanate, 1,5-pentamethylene diisocyanate, 1,6-hexamethylene diisocyanate.
  • the isocyanate compound may be derived from an aliphatic, alicyclic or aromatic polyisocyanate, such as isocyanurate-modified polyisocyanate, burette-modified polyisocyanate, urethane-modified polyisocyanate, etc. .
  • a blocked polyvalent isocyanate in which an isocyanate group of the polyvalent isocyanate is blocked with a blocking agent is preferably used.
  • block polyvalent isocyanate in particular, Bernock D-500 (tolylene diisocyanate blocked), D-550 (1,6-hexamethylene diisocyanate blocked) manufactured by Dainippon Ink and Chemicals, Ltd., Takeda Mitsui Takenate Takenate B-830 (tolylene diisocyanate blocked), B-815N (4,4'-methylenebis (cyclohexyl isocyanate) blocked), B-842N (1,3-bis ( Isocyanatomethyl) cyclohexane blocked), B-846N (1,3-bis (isocyanatemethyl) cyclohexane blocked), B-874N (isophorone diisocyanate blocked), B-882N (1,6-hexamethylene) Diisocyanate broth ), Duranate MF-B60X (1,6-hexamethylene diisocyanate blocked), Asura Kasei Co., Ltd., Duranate MF-K60X (1,6-hexamethylene di
  • amino resin examples include, but are not limited to, a lower alkyl etherified melamine resin or a lower alkyl etherified benzoguanamine resin obtained by etherifying a part or all of the methylol groups of a methylolated melamine resin or a methylolated benzoguanamine resin with a lower alcohol. Is preferred.
  • the melamine resin include, for example, Uban 20SE, 225 (all manufactured by Mitsui Toatsu), Super Becamine J820-60, L-117-60, L-109-65, 437-508- Butyl etherified melamine resins such as 60, L-118-60, G821-60 (all manufactured by Dainippon Ink and Chemicals); Cymel 300, 303, 325, 327, 350, 730, 736, 738 (all manufactured by Nihon Cytec Industries, Inc.), Melan 522, 523 (all manufactured by Hitachi Chemical Co., Ltd.), Nicarak MS001, MX 430, MX 650 (all manufactured by Sanwa Chemical Co., Ltd.), Sumimar M-55 M-100, M-40S (both manufactured by Sumitomo Chemical Co., Ltd.), Resimin 740, 747 (both Monsan Methyl etherified melamine resins such as Cymel 232, 266, XV-514, 1130 (all manufactured by
  • benzoguanamine resin those described in the first aspect can be used. When such a benzoguanamine resin is contained, it is the invention of the first aspect at the same time.
  • acrylic resin beads (acrylic resin fine powder) used in the present invention spherical particles that are easily obtained by suspension polymerization of methyl methacrylate or the like are suitable.
  • the acrylic resin beads used in the present invention are preferably contained as a filler in the solution composition, and are preferably spherical crosslinked acrylic resin beads.
  • the average particle diameter of the acrylic resin beads is not particularly limited, but is 1 to 20 ⁇ m, preferably 1 to 10 ⁇ m, more preferably 1 to 5 ⁇ m. Those having an average particle size of 1 ⁇ m or less are difficult to obtain, and when the average particle size is increased, the effect of improving the folding resistance is reduced or the insulating film for a flexible wiring board made of fine wiring is used. Since it cannot be performed, it is not suitable.
  • acrylic resin beads include Art Pearl G-400, G-800, GR-400, GR-800, J-4PY, J-4P, J-4PY, J-5P, J-, manufactured by Negami Kogyo Co., Ltd.
  • Preferred examples include 7P, J7PY, S-5P, and the like.
  • the modified polyimide resin composition of the present invention has 2 or more phenolic hydroxyl groups of 1 to 50 parts by mass, preferably 2 to 40 parts by mass, more preferably 5 to 30 parts by mass with respect to 100 parts by mass of the modified polyimide resin.
  • Compounds can be included. The compound having two or more phenolic hydroxyl groups has been described in the first embodiment.
  • solvent of the modified polyimide resin composition those described in the first embodiment can be used.
  • the modified polyimide resin composition of the present invention may contain a curing catalyst such as a curing accelerating catalyst for accelerating the crosslinking reaction by heat treatment. Furthermore, the modified polyimide resin composition may contain fine fillers other than acrylic resin beads, pigments such as organic color pigments and inorganic color pigments, antifoaming agents and leveling agents. As fine fillers other than acrylic resin beads, conventionally known fine inorganic fillers such as silica, alumina, potassium carbonate, talc and barium sulfate can be preferably exemplified.
  • the modified polyimide resin composition of the present invention is not particularly limited, but the solution viscosity at room temperature (25 ° C.) is 5 to 1000 Pa ⁇ s, particularly 10 to 100 Pa ⁇ s, more preferably 10 to 60 Pa ⁇ s. It is suitable in view of workability such as printing, solution properties, and characteristics of the obtained cured insulating film.
  • the modified polyimide resin composition of the present invention can be suitably used for forming an insulating film (protective film) for electrical and electronic parts on which chip parts such as IC chips are mounted.
  • an insulating film protecting film
  • the solvent is removed by heat treatment at a temperature of about 5 to 60 minutes, and then cured by heat treatment at about 100 to 210 ° C., preferably at 110 to 200 ° C. for 5 to 120 minutes, preferably about 10 to 60 minutes.
  • a cured insulating film having an elastic modulus of 10 to 500 MPa is preferably formed.
  • the modified polyimide resin composition of the present invention provides strong adhesion to a sealing material or anisotropic conductive material in addition to improved surface hardness and fold resistance, and is less likely to warp and has flexibility. High, excellent electrical properties, good adhesion to conductive metals and substrates, heat resistance, solder heat resistance, solvent resistance (for example, resistance to acetone, isopropanol, methyl ethyl ketone, N-methyl-2-pyrrolidone) A cured insulating film excellent in solvent resistance, chemical resistance, flex resistance and the like can be formed.
  • composition for a modified polyimide resin insulating film of the present invention can form an insulating film having good performance as described above, particularly by heat treatment at a relatively low temperature of about 160 ° C. Therefore, it can also be suitably used as an interlayer adhesive for a multilayer wiring board.
  • the test method is as follows: a test piece is placed on a hot plate heated to each set temperature (here, 110 ° C., 120 ° C., 130 ° C., and 140 ° C.) and heated to the same temperature as the hot plate. The weight (300 g in weight) was placed on the test piece for 30 seconds and the weight was lifted. When the weight was pulled up, the state where the test piece was caught on the weight was regarded as unacceptable (x), and the state where it was allowed to stand on the hot plate was regarded as acceptable ( ⁇ ). The test was performed three times at each set temperature.
  • each set temperature here, 110 ° C., 120 ° C., 130 ° C., and 140 ° C.
  • MIT folding test After forming a circuit having a wiring width of 15 ⁇ m, an inter-wiring distance of 15 ⁇ m, and a circuit length of 20 cm on the surface of the base material using a two-layer CCL in which a 7 ⁇ m-thick copper layer is laminated on a 35 ⁇ m-thick polyimide layer, A flexible substrate having a surface plated with 3 ⁇ m thick Sn was prepared. A coating film of the modified polyimide resin composition of the sample is formed on the circuit area of the flexible substrate using a screen printing machine (manufactured by Neo Techno Japan, semi-automatic screen printing machine NT-15SS-U). Then, a test piece was prepared by heating and curing at 120 ° C. for 90 minutes to form a cured film having a thickness of 10 ⁇ m.
  • a film of the modified polyimide resin composition of the sample is formed on the glass coated with a release agent, and this is cured by heating at 80 ° C. for 30 minutes and then at 120 ° C. for 90 minutes to form a cured film having a thickness of 60 ⁇ m. After that, the cured film was peeled off from the glass and cut into a size of 5 cm ⁇ 10 cm was used as a test piece.
  • test piece was immersed in acetone for 30 minutes, the mass of the test piece before and after immersion was measured, and the residual ratio of the mass was defined as the gel fraction.
  • a coating film of the modified polyimide resin composition of the sample was formed on the surface of the polyimide film having a thickness of 25 ⁇ m by using an applicator, and this was cured by heat treatment at 80 ° C. for 30 minutes and then at 120 ° C. for 90 minutes to form a 10 ⁇ m thick film.
  • a cured film was formed.
  • a laminate of the polyimide film and the cured film was cut into a 5 cm square to obtain a test piece. The test piece was placed on a horizontal base with the cured film facing upward, and the gap between the four corners of the test piece and the horizontal base was measured with a caliper, and the average value of each gap was defined as the “warp” amount.
  • the resulting modified polyimide resin solution was a solution having a polymer solid content concentration of 45.7% by weight and a viscosity of 389 Pa ⁇ s.
  • Example A-1 In the modified polyimide resin solution obtained in Reference Example 2, in a glass container, 20 parts by mass of guanamine resin Mycoat 136 (M136) and 4.1 parts of epoxy resin ceroxide 2021P with respect to 100 parts by mass of the modified polyimide resin.
  • Example A-2 The same procedure as in Example A-1 except that Mycoat 136 (M136) of guanamine resin was changed to 5 parts by weight, and 25 parts by weight of Aerosil # 50 and 30 parts by weight of barium sulfate B54 were used as the filler. A modified polyimide resin composition was obtained. This modified polyimide resin composition was evaluated in the same manner as in Example A-1. The results are shown in Table 1.
  • Example A-1 A modified polyimide resin composition was obtained in the same manner as in Example A-1, except that 4.5 parts by mass of B830, which is a diisocyanate compound, was used instead of the guanamine resin as a curing component. This modified polyimide resin composition was evaluated in the same manner as in Example A-1. The results are shown in Table 1.
  • Example A-2 A modified polyimide resin composition was obtained in the same manner as in Example A-1, except that 20 parts by mass of melamine resin Cymel 211 (C211) was used instead of the curable guanamine resin. This modified polyimide resin composition was evaluated in the same manner as in Example A-1. The results are shown in Table 1.
  • Example A-3 A modified polyimide resin composition was obtained in the same manner as in Example A-1, except that 20 parts by mass of melamine resin Cymel 236 (C236) was used instead of the curable guanamine resin. This modified polyimide resin composition was evaluated in the same manner as in Example A-1. The results are shown in Table 1.
  • Example B-1 In a glass container, in the modified polyimide resin solution obtained in Reference Example 2, 3.5 parts by mass of epoxy resin ceroxide 2021P with respect to 100 parts by mass of modified polyimide resin, 10 parts by mass of amino resin (guanamine resin) M136, 2.5 parts by mass of phenol resin H-1 and 0.5 parts by mass of amine-based curing catalyst 2E4MZ, 0.5 parts by mass of diazabicycloundecene, 7 parts by mass of Aerosil R972, acrylic resin beads (Art 15 parts by mass of Pearl J4PY) and 7.5 parts by mass of LF-1983 as a surfactant were added, and the mixture was stirred and kneaded to obtain a uniformly mixed modified polyimide resin composition. Moreover, about the cured film of this modified polyimide resin composition, tensile elasticity modulus, bendability, board
  • Example B-2 A modified polyimide resin composition was obtained in the same manner as in Example B-1, except that the acrylic resin beads (Art Pearl J4PY) were changed from 15 parts by mass to 20 parts by mass.
  • This modified polyimide resin composition was evaluated in the same manner as in Example B-1. The results are shown in Table 2.
  • Example B-3 A modified polyimide resin composition was obtained in the same manner as in Example B-1, except that the acrylic resin beads (Art Pearl J4PY) were changed from 15 parts by mass to 30 parts by mass.
  • This modified polyimide resin composition was evaluated in the same manner as in Example B-1. The results are shown in Table 2.
  • Example B-4 A modified polyimide resin composition was obtained in the same manner as in Example B-1, except that the acrylic resin beads (Art Pearl J4PY) were changed from 15 parts by mass to 50 parts by mass.
  • This modified polyimide resin composition was evaluated in the same manner as in Example B-1. The results are shown in Table 2.
  • Example B-5 A modified polyimide resin composition was obtained in the same manner as in Example B-2 except that the acrylic resin beads (Art Pearl J4PY) were changed to acrylic resin beads (Art Pearl J7PY).
  • This modified polyimide resin composition was evaluated in the same manner as in Example B-1. The results are shown in Table 2.
  • Example B-1 A modified polyimide resin composition was obtained in the same manner as in Example B-2 except that the acrylic resin beads (Art Pearl J4PY) were changed to amino resin beads (Eposter M05). This modified polyimide resin composition was evaluated in the same manner as in Example B-1. The results are shown in Table 2.
  • Example B-2 A modified polyimide resin composition was obtained in the same manner as in Example B-2 except that the acrylic resin beads (Art Pearl J4PY) were changed to urethane resin beads (Art Pearl JB-1000T). This modified polyimide resin composition was evaluated in the same manner as in Example B-1. The results are shown in Table 2.
  • Example B-3 A modified polyimide resin composition was obtained in the same manner as in Example B-2 except that the acrylic resin beads (Art Pearl J4PY) were changed to urethane resin beads (Art Pearl C-800). This modified polyimide resin composition was evaluated in the same manner as in Example B-1. The results are shown in Table 2.
  • a modified polyimide resin composition comprising a modified polyimide resin introduced with a soft segment comprising a polybutadiene segment or a polycarbonate segment
  • the surface hardness, tackiness, and warpage of the cured film obtained by heat treatment are reduced.
  • An improved modified polyimide resin composition can be provided.
  • the cured film obtained by heat-treating this modified polyimide resin composition is excellent in electrical insulation, heat resistance, flexibility and the like, and particularly has improved surface hardness, tackiness and warpage. It can be suitably used as an insulating film for a wiring board.
  • a modified polyimide resin solution composition comprising a modified polyimide resin into which a soft segment comprising a polybutadiene segment or a polycarbonate segment is introduced, the surface hardness and resistance of a cured film obtained by heat treatment are obtained.
  • a modified polyimide resin solution composition capable of improving the foldability can be provided.
  • the cured film obtained by heat-treating this modified polyimide resin solution composition is excellent in electrical insulation, heat resistance, flexibility and the like, and in particular, has improved surface hardness and fold resistance. It can be suitably used as an insulating film for a plate.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)

Abstract

The modified polyamide resin composition contains a modified polyamide resin, into which soft segments made of polybutadiene segments or polycarbonate segments are introduced, and a guanamine resin. When the modified polyamide resin composition is thermally treated, a cured film with excellent electric insulating properties, heat resistance, and flexibility as well as improved surface hardness, tackiness, and warping can be obtained.

Description

熱硬化性変性ポリイミド樹脂組成物Thermosetting modified polyimide resin composition
 本発明は、変性ポリイミド樹脂組成物およびその硬化膜に関する。この変性ポリイミド樹脂組成物を加熱処理して得られる硬化膜は、柔軟性配線基板の絶縁膜(保護膜)として好適に用いることができる。 The present invention relates to a modified polyimide resin composition and a cured film thereof. The cured film obtained by heat-treating this modified polyimide resin composition can be suitably used as an insulating film (protective film) for the flexible wiring board.
 特許文献1には、ポリカーボネートセグメントやポリブタジエンセグメントからなるソフトセグメントを導入した変性ポリイミド樹脂が記載されている。 Patent Document 1 describes a modified polyimide resin into which a soft segment made of a polycarbonate segment or a polybutadiene segment is introduced.
 特許文献2には、ポリブタジエンセグメントからなるソフトセグメントを導入した変性ポリイミド樹脂及び該変性ポリイミド樹脂からなる熱硬化性組成物が記載されている。 Patent Document 2 describes a modified polyimide resin into which a soft segment composed of a polybutadiene segment is introduced and a thermosetting composition composed of the modified polyimide resin.
 特許文献3には、ポリカーボネートセグメントからなるソフトセグメントを導入した変性ポリイミド樹脂及び該変性ポリイミド樹脂からなる熱硬化性組成物が記載されている。 Patent Document 3 describes a modified polyimide resin into which a soft segment composed of a polycarbonate segment is introduced and a thermosetting composition composed of the modified polyimide resin.
 これらの熱硬化性組成物では、硬化反応を担う成分としてエポキシ樹脂及び/又は多価イソシアネート化合物が用いられているが、得られる硬化膜は、ソフトセグメントのために表面硬度やタック性の面で不十分な場合があり、改良の余地があった。さらに、これらの熱硬化性組成物を用いて表面硬度が高い硬化膜を得ようとすると、加熱硬化に伴う反りを抑制し難いという問題があった。 In these thermosetting compositions, epoxy resins and / or polyisocyanate compounds are used as components responsible for the curing reaction, but the resulting cured film has a surface hardness and tackiness due to the soft segment. In some cases, there was room for improvement. Furthermore, when it was going to obtain a cured film with high surface hardness using these thermosetting compositions, there existed a problem that it was difficult to suppress the curvature accompanying heat hardening.
 また、例えばフレキシブル基板の絶縁膜として用いる場合には耐折れ性が要求されるので、これらの組成物からなる硬化膜においては、充分な表面硬度と共に高いレベルの耐折れ性も必要とされる。 Also, for example, when used as an insulating film of a flexible substrate, bending resistance is required. Therefore, a cured film made of these compositions requires a high level of bending resistance as well as sufficient surface hardness.
特開平7-113004号Japanese Patent Laid-Open No. 7-113004 特開2006-104462号JP 2006-104462 A 特開2006-307183号JP 2006-307183 A
 本発明の目的は、ポリブタジエンセグメント或いはポリカーボネートセグメントからなるソフトセグメントが導入された変性ポリイミド樹脂を含んで構成された熱硬化性変性ポリイミド樹脂組成物において、加熱処理して得られる硬化膜の表面硬度やタック性を改良することができ、且つ加熱硬化に伴って発生する反りを好適に抑制することができる熱硬化性変性ポリイミド樹脂組成物を提供することである。この熱硬化性変性ポリイミド樹脂組成物を加熱処理して得られる硬化膜は、電気絶縁性、耐熱性、柔軟性などが優れると共に、特に表面硬度、タック性、及び反りが改良されたものであり、柔軟性配線板用の絶縁膜として好適に用いることができる。 An object of the present invention is to provide a thermosetting modified polyimide resin composition including a modified polyimide resin into which a soft segment composed of a polybutadiene segment or a polycarbonate segment is introduced. It is an object of the present invention to provide a thermosetting modified polyimide resin composition that can improve tackiness and can suitably suppress warpage that occurs with heat curing. The cured film obtained by heat-treating this thermosetting modified polyimide resin composition is excellent in electrical insulation, heat resistance, flexibility, etc., and particularly improved in surface hardness, tackiness, and warpage. It can be suitably used as an insulating film for flexible wiring boards.
 さらに、本発明の1つの態様の目的は、加熱処理して得られる硬化膜の耐折れ性も改良することができる熱硬化性変性ポリイミド樹脂組成物を提供することである。この熱硬化性変性ポリイミド樹脂組成物を加熱処理して得られる硬化膜は、電気絶縁性、耐熱性、柔軟性などが優れると共に、特に表面硬度に加えて耐折れ性が改良されたものであり、柔軟性配線板用の絶縁膜として好適に用いることができる。 Furthermore, an object of one embodiment of the present invention is to provide a thermosetting modified polyimide resin composition capable of improving the folding resistance of a cured film obtained by heat treatment. The cured film obtained by heat-treating this thermosetting modified polyimide resin composition is excellent in electrical insulation, heat resistance, flexibility, etc., and particularly has improved folding resistance in addition to surface hardness. It can be suitably used as an insulating film for flexible wiring boards.
 本発明者らは、種々検討した結果、ポリブタジエンセグメント或いはポリカーボネートセグメントからなるソフトセグメントが導入された変性ポリイミド樹脂を含んで構成された熱硬化性変性ポリイミド樹脂組成物において、前記変性ポリイミド樹脂と共に、硬化反応を担う成分としてグアナミン樹脂を用いることによって、加熱処理して得られる硬化膜の表面硬度、タック性、及び反りが改良されることを見出して本発明に到達した。 As a result of various studies, the present inventors have found that a thermosetting modified polyimide resin composition comprising a modified polyimide resin into which a soft segment composed of a polybutadiene segment or a polycarbonate segment has been introduced, is cured together with the modified polyimide resin. The present inventors have found that the surface hardness, tackiness, and warpage of a cured film obtained by heat treatment are improved by using a guanamine resin as a component responsible for the reaction.
 さらに、本発明者らは、ポリブタジエンセグメント或いはポリカーボネートセグメントからなるソフトセグメントが導入された変性ポリイミド樹脂を含んで構成された変性ポリイミド樹脂組成物において、アクリル樹脂ビーズを添加することによって、加熱処理して得られる硬化膜の表面硬度を改良すると共に耐折れ性をも改良することができることを見出して本発明に到達した。 Furthermore, the present inventors performed heat treatment by adding acrylic resin beads in a modified polyimide resin composition configured to include a modified polyimide resin into which a soft segment composed of a polybutadiene segment or a polycarbonate segment is introduced. It has been found that the surface hardness of the resulting cured film can be improved and the folding resistance can also be improved.
 本発明は、ポリブタジエンセグメント又はポリカーボネートセグメントからなるソフトセグメントが導入された変性ポリイミド樹脂と、グアナミン樹脂とを含有することを特徴とする変性ポリイミド樹脂組成物に関する。 The present invention relates to a modified polyimide resin composition comprising a modified polyimide resin into which a soft segment composed of a polybutadiene segment or a polycarbonate segment is introduced, and a guanamine resin.
 また、本発明の一つの態様は、さらにアクリルビーズを含有する変性ポリイミド樹脂組成物に関する。 Moreover, one aspect of the present invention relates to a modified polyimide resin composition further containing acrylic beads.
 本発明によれば、ポリブタジエンセグメント或いはポリカーボネートセグメントからなるソフトセグメントを導入した変性ポリイミド樹脂を含んで構成された変性ポリイミド樹脂組成物において、加熱処理して得られる硬化膜の表面硬度、タック性、及び反りが改良された変性ポリイミド樹脂組成物を提供することができる。この変性ポリイミド樹脂組成物を加熱処理して得られる硬化膜は、電気絶縁性、耐熱性、柔軟性などが優れると共に、特に表面硬度、タック性及び反りが改良されたものであるから、柔軟性配線板用の絶縁護として好適に用いることができる。 According to the present invention, in a modified polyimide resin composition comprising a modified polyimide resin introduced with a soft segment comprising a polybutadiene segment or a polycarbonate segment, the surface hardness of the cured film obtained by heat treatment, tackiness, and A modified polyimide resin composition with improved warpage can be provided. The cured film obtained by heat-treating this modified polyimide resin composition is excellent in electrical insulation, heat resistance, flexibility and the like, and particularly has improved surface hardness, tackiness and warpage. It can be suitably used as insulation for wiring boards.
 さらに、アクリル樹脂ビーズを含有する態様によれば、表面硬度及び耐折れ性を改良することができる変性ポリイミド樹脂組成物を提供することができる。この変性ポリイミド樹脂組成物を加熱処理して得られる硬化膜は、加えて耐折れ性が改良されたものであり、柔軟性配線板用の絶縁膜として好適に用いることができる。 Furthermore, according to the embodiment containing acrylic resin beads, it is possible to provide a modified polyimide resin composition that can improve surface hardness and fold resistance. The cured film obtained by heat-treating this modified polyimide resin composition has improved folding resistance and can be suitably used as an insulating film for flexible wiring boards.
 本出願は、グアナミン樹脂を含有する第1の態様と、アクリル樹脂ビーズを含有する第2の態様を開示している。 This application discloses a first aspect containing a guanamine resin and a second aspect containing acrylic resin beads.
 本出願が開示する第1の態様をまとめると以下のとおりである。
(1) ポリブタジエンセグメント又はポリカーボネートセグメントからなるソフトセグメントが導入された変性ポリイミド樹脂と、グアナミン樹脂とを含有することを特徴とする変性ポリイミド樹脂組成物。
(2) さらに、エポキシ樹脂を含有することを特徴とする前記項(1)に記載の変性ポリイミド樹脂組成物。
(3) 変性ポリイミド樹脂100質量部に対して、グアナミン樹脂を1~60質量部含有することを特徴とする前記項(1)または(2)に記載の変性ポリイミド樹脂組成物。
(4) グアナミン樹脂がベンゾグアナミンとホルムアルデヒドとの縮合物であることを特徴とする前記項(1)~(3)のいずれかに記載の変性ポリイミド樹脂組成物。
(5) 前記項(1)~(4)のいずれかの変性ポリイミド樹脂組成物を加熱処理して得られたことを特徴とする硬化膜。
The first aspect disclosed in the present application is summarized as follows.
(1) A modified polyimide resin composition comprising a modified polyimide resin into which a soft segment composed of a polybutadiene segment or a polycarbonate segment is introduced, and a guanamine resin.
(2) The modified polyimide resin composition according to item (1), further comprising an epoxy resin.
(3) The modified polyimide resin composition as described in (1) or (2) above, wherein 1 to 60 parts by mass of guanamine resin is contained per 100 parts by mass of the modified polyimide resin.
(4) The modified polyimide resin composition as described in any one of (1) to (3) above, wherein the guanamine resin is a condensate of benzoguanamine and formaldehyde.
(5) A cured film obtained by heat-treating the modified polyimide resin composition according to any one of items (1) to (4).
 また、本出願が開示する第2の態様をまとめると次のとおりである。
(1) ポリブタジエンセグメント或いはポリカーボネートセグメントからなるソフトセグメントが導入された変性ポリイミド樹脂を含んで構成された変性ポリイミド樹脂組成物において、アクリル樹脂ビーズを含有することを特徴とする変性ポリイミド樹脂組成物。
Further, the second aspect disclosed by the present application is summarized as follows.
(1) A modified polyimide resin composition comprising an acrylic resin bead in a modified polyimide resin composition comprising a modified polyimide resin into which a soft segment comprising a polybutadiene segment or a polycarbonate segment is introduced.
(2) 変性ポリイミド樹脂100質量部に対してアクリル樹脂ビーズを10~80質量部、好ましくは20~60質量部、より好ましくは20~40質量部の割合で含有することを特徴とする前記項(1)に記載の変性ポリイミド樹脂組成物。 (2) The item described above, wherein the acrylic resin beads are contained in an amount of 10 to 80 parts by weight, preferably 20 to 60 parts by weight, more preferably 20 to 40 parts by weight with respect to 100 parts by weight of the modified polyimide resin. The modified polyimide resin composition as described in (1).
(3) アクリル樹脂ビーズの平均粒子径が10μm以下、好ましくは5μm以下であることを特徴とする前記項(1)または(2)に記載の変性ポリイミド樹脂組成物。 (3) The modified polyimide resin composition as described in (1) or (2) above, wherein the acrylic resin beads have an average particle size of 10 μm or less, preferably 5 μm or less.
(4) さらに、エポキシ化合物、多価イソシアネート化合物、及びアミノ樹脂からなる群から選択された少なくとも一つの硬化性化合物を含有することを特徴とする前記項(1)~(3)のいずれかに記載の変性ポリイミド樹脂組成物。 (4) Further comprising at least one curable compound selected from the group consisting of an epoxy compound, a polyvalent isocyanate compound, and an amino resin, according to any one of the above items (1) to (3), The modified polyimide resin composition as described.
(5) 前記項(1)~(4)のいずれかに記載の変性ポリイミド樹脂組成物を加熱処理して得られたことを特徴とする硬化膜。 (5) A cured film obtained by heat-treating the modified polyimide resin composition according to any one of (1) to (4).
 第2の態様の発明によれば、ポリブタジエンセグメント或いはポリカーボネートセグメントからなるソフトセグメントを導入した変性ポリイミド樹脂を含んで構成された変性ポリイミド樹脂溶液組成物において、加熱処理して得られる硬化膜の表面硬度及び耐折れ性を改良することができる変性ポリイミド樹脂組成物を提供することができる。この変性ポリイミド樹脂組成物を加熱処理して得られる硬化膜は、電気絶縁性、耐熱性、柔軟性などが優れると共に、特に表面硬度及び耐折れ性が改良されたものであり、柔軟性配線板用の絶縁膜として好適に用いることができる。 According to the invention of the second aspect, the surface hardness of the cured film obtained by heat treatment in the modified polyimide resin solution composition comprising a modified polyimide resin into which a soft segment made of a polybutadiene segment or a polycarbonate segment is introduced. And the modified polyimide resin composition which can improve folding resistance can be provided. The cured film obtained by heat-treating this modified polyimide resin composition is excellent in electrical insulation, heat resistance, flexibility and the like, and in particular, has improved surface hardness and fold resistance. It can be suitably used as an insulating film.
 本出願が開示している第1の態様および第2の態様は、以下に説明するとおり、それぞれ独立して発明を構成できるものである。しかしながら、第1の態様の規定と第2の態様の規定を同時に満たすことにより、両方の効果を得ることができる。本発明の第2の態様において、好ましくは前記第1の態様が満たされること、即ち、好ましくグアナミン樹脂を含有し、さらには第1の態様の項(2)~(4)の規定を満たすことが好ましく、さらには、以下の説明で第1の態様について説明する事項を満たすことが好ましい。 The first aspect and the second aspect disclosed in the present application can constitute the invention independently as described below. However, both effects can be obtained by simultaneously satisfying the definition of the first aspect and the definition of the second aspect. In the second aspect of the present invention, the first aspect is preferably satisfied, that is, preferably contains a guanamine resin, and further satisfies the provisions of the items (2) to (4) of the first aspect. Furthermore, it is preferable to satisfy the items described for the first aspect in the following description.
 まず本発明の第1の態様について説明する。 First, the first aspect of the present invention will be described.
 本発明の変性ポリイミド樹脂は、イミド構造を有するハードセグメントに、ポリブタジエンセグメント或いはポリカーボネートセグメントからなるソフトセグメントが導入された変性ポリイミド樹脂である。この変性ポリイミド樹脂は、前記ハードセグメントと前記ソフトセグメントとを併せ持つものであれば特に限定されない。例えば、特許文献1に記載されているように、ジオールとジイソシアネートとから末端イソシアネート基を有するプレポリマーを調製し、前記プレポリマーと芳香族テトラカルボン酸成分とを反応させることによって得ることができる。また、特許文献2及び3に記載されているように、予めアルコール性水酸基末端イミドオリゴマーを調製し、前記アルコール性水酸基末端イミドオリゴマーと、ポリブタジエンジオール又はポリカーボネートジオールと、ジイソシアネートとを反応させて得ることができる。後者の方が、得られる変性ポリイミド樹脂の溶解性と耐熱性とが優れるのでより好ましい。 The modified polyimide resin of the present invention is a modified polyimide resin in which a soft segment composed of a polybutadiene segment or a polycarbonate segment is introduced into a hard segment having an imide structure. The modified polyimide resin is not particularly limited as long as it has both the hard segment and the soft segment. For example, as described in Patent Document 1, it can be obtained by preparing a prepolymer having a terminal isocyanate group from diol and diisocyanate, and reacting the prepolymer with an aromatic tetracarboxylic acid component. Moreover, as described in Patent Documents 2 and 3, an alcoholic hydroxyl-terminated imide oligomer is prepared in advance, and obtained by reacting the alcoholic hydroxyl-terminated imide oligomer, polybutadiene diol or polycarbonate diol, and diisocyanate. Can do. The latter is more preferable because the resulting modified polyimide resin has better solubility and heat resistance.
 本発明の特徴は、前述のようにして調製されたポリブタジエンセグメント或いはポリカーボネートセグメントからなるソフトセグメントが導入された変性ポリイミド樹脂を含んで構成された変性ポリイミド樹脂組成物において、前記変性ポリイミド樹脂と共に、硬化反応を担う成分としてグアナミン樹脂を用いることによって、加熱処理して得られる硬化膜の表面硬度、タック性、及び反りが改良したことにある。 A feature of the present invention is a modified polyimide resin composition comprising a modified polyimide resin into which a soft segment composed of a polybutadiene segment or a polycarbonate segment prepared as described above is introduced, and is cured together with the modified polyimide resin. By using guanamine resin as a component responsible for the reaction, the surface hardness, tackiness, and warpage of the cured film obtained by heat treatment are improved.
 以下では、アルコール性水酸基末端イミドオリゴマーを用いて調製された変性ポリイミド樹脂の場合について説明するが、本発明はこのようにして調整された変性ポリイミド樹脂の場合に限定されるものではない。 Hereinafter, the case of a modified polyimide resin prepared using an alcoholic hydroxyl-terminated imide oligomer will be described, but the present invention is not limited to the modified polyimide resin thus prepared.
 変性ポリイミド樹脂は、好ましくは、ジイソシアネート化合物、ポリブタジエンジオール或いはポリカーボネートジオール、及び下記化学式(1)で示されるアルコール性水酸基末端イミドオリゴマーを反応して得られる。 The modified polyimide resin is preferably obtained by reacting a diisocyanate compound, polybutadiene diol or polycarbonate diol, and an alcoholic hydroxyl-terminated imide oligomer represented by the following chemical formula (1).
Figure JPOXMLDOC01-appb-C000001
 式中、Rは2価の炭化水素基を示し、Xはテトラカルボン酸のカルボキシル基を除いた4価の基を示し、Yはジアミンのアミノ基を除いた2価の基を示し、mは0~50の整数である。
Figure JPOXMLDOC01-appb-C000001
In the formula, R represents a divalent hydrocarbon group, X represents a tetravalent group excluding the carboxyl group of tetracarboxylic acid, Y represents a divalent group excluding the amino group of diamine, and m represents It is an integer from 0 to 50.
 ジイソシアネート化合物としては、1分子中にイソシアネート基を2個有するものであればどのようなものでもよい。例えば、脂肪族、脂環族又は芳香族のジイソシアネート、好ましくはイソシアネート基を除いて炭素数が2~30の脂肪族、脂環族又は芳香族のジイソシアネートであり、具体的には1,4-テトラメチレンジイソシアネート、1,5-ペンタメチレンジイソシアネート、1,6-ヘキサメチレンジイソシアネート、2,2,4-トリメチル-1,6-へキサメチレンジイソシアネート、リジンジイソシアネート、3-イソシアネートメチル-3,5,5-トリメチルシクロヘキシルイソシアネート(イソホロンジイソシアネート)、1,3-ビス(イソシアネートメチル)-シクロヘキサン、4,4’-ジシクロヘキシルメタンジイソシアネート、トリレンジイソシアネート、4,4’-ジフェニルメタンジイソシアネート、1,5-ナフタレンジイソシアネート、トリジンジイソシアネート、キシリレンジイソシアネート等を例示することができる。また、前記ジイソシアネート化合物は、イソシアネート基をブロック化剤でブロックしたブロックジイソシアネートを好適に用いることができる。 The diisocyanate compound may be any compound as long as it has two isocyanate groups in one molecule. For example, an aliphatic, alicyclic or aromatic diisocyanate, preferably an aliphatic, alicyclic or aromatic diisocyanate having 2 to 30 carbon atoms excluding an isocyanate group, specifically 1,4- Tetramethylene diisocyanate, 1,5-pentamethylene diisocyanate, 1,6-hexamethylene diisocyanate, 2,2,4-trimethyl-1,6-hexamethylene diisocyanate, lysine diisocyanate, 3-isocyanate methyl-3,5,5 -Trimethylcyclohexyl isocyanate (isophorone diisocyanate), 1,3-bis (isocyanate methyl) -cyclohexane, 4,4'-dicyclohexylmethane diisocyanate, tolylene diisocyanate, 4,4'-diphenylmethane diisocyanate, 1,5-naphth Diisocyanate, tolidine diisocyanate, can be mentioned xylylene diisocyanate and the like. Moreover, the said diisocyanate compound can use suitably the block diisocyanate which blocked the isocyanate group with the blocking agent.
 ポリブタジエンジオールは、数平均分子量が500~10000のものが好ましく、1000~5000のものがより好ましい。数平均分子量が500未満になると好適な柔軟性が得難くなり、また数平均分子量が10000を越えると耐熱性や耐溶剤性が悪くなることがあるので前記程度のものが好適である。また、本発明においてポリブタジエンジオールは、分子内に二重結合を有していても、分子内の二重結合を水添したものであってもよいが、分子内に二重結合が残っていると架橋反応を起こして柔軟性がなくなる場合があるので、分子内の二重結合を水添された水添ポリブタジエンジオールが好ましい。本発明で用いられるポリブタジエンジオールとしては、日本曹達株式会社製のGI-1000、GI-2000、出光石油化学株式会社製のR-45EPI、三菱化学株式会社製のポリテールHなどを好適に挙げることができる。 The polybutadiene diol preferably has a number average molecular weight of 500 to 10,000, more preferably 1,000 to 5,000. When the number average molecular weight is less than 500, it is difficult to obtain suitable flexibility, and when the number average molecular weight exceeds 10,000, the heat resistance and solvent resistance may be deteriorated. In the present invention, the polybutadiene diol may have a double bond in the molecule or may be a hydrogenated double bond in the molecule, but the double bond remains in the molecule. A hydrogenated polybutadiene diol in which a double bond in the molecule is hydrogenated is preferable because it may cause a crosslinking reaction and lose flexibility. Preferred examples of the polybutadiene diol used in the present invention include GI-1000 and GI-2000 manufactured by Nippon Soda Co., Ltd., R-45EPI manufactured by Idemitsu Petrochemical Co., Ltd., and Polytail H manufactured by Mitsubishi Chemical Co., Ltd. it can.
 ポリカーボネートジオールは、数平均分子量が500~10000のものが好ましく、1000~5000のものがよりこのましい。数平均分子量が500未満になると好適な柔軟性が得難くなり、また数平均分子量が10000を越えると耐熱性や耐溶剤性が悪くなることがあるので前記程度のものが好適である。また、本発明で用いられるポリカーボネートジオールとしては、宇部興産株式会社製のUH-CARB、UD-CARB、UC-CARB、ダイセル化学工業株式会社製のPLACCEL CD-PL、PLACCEL CD-H、クラレ株式会社製のクラレポリオールCシリーズなどを好適に例示することができる。これらのポリブタジエンジオールやポリカーボネートジオールは、単独で、または二種類以上を組合せて用いられる。 The polycarbonate diol preferably has a number average molecular weight of 500 to 10,000, more preferably 1,000 to 5,000. When the number average molecular weight is less than 500, it is difficult to obtain suitable flexibility, and when the number average molecular weight exceeds 10,000, the heat resistance and solvent resistance may be deteriorated. The polycarbonate diol used in the present invention includes UH-CARB, UD-CARB, UC-CARB, manufactured by Ube Industries, Ltd., PLACEL CD-PL, PLACEL CD-H, manufactured by Daicel Chemical Industries, Ltd., and Kuraray Co., Ltd. The Kuraray polyol C series made by the company etc. can be illustrated suitably. These polybutadiene diols and polycarbonate diols are used alone or in combination of two or more.
 前記化学式(1)で示されるアルコール性水酸基末端イミドオリゴマーは、テトラカルボン酸成分と、ジアミン化合物及びアルコール性水酸基を1個有するモノアミン化合物からなるアミン成分とから得られる。前記式中mは0~50の整数を示し、好ましくは0~20であり、より好ましくは0~10であり、特に1~5である。mが50以上では溶解に時間が掛るようになったり、得られる硬化膜の柔軟性が劣るようになったりするので前記程度のものが好適である。 The alcoholic hydroxyl group-terminated imide oligomer represented by the chemical formula (1) is obtained from a tetracarboxylic acid component and an amine component composed of a diamine compound and a monoamine compound having one alcoholic hydroxyl group. In the above formula, m represents an integer of 0 to 50, preferably 0 to 20, more preferably 0 to 10, particularly 1 to 5. When m is 50 or more, it takes time to dissolve, or the flexibility of the resulting cured film is inferior.
 前記テトラカルボン酸成分としては、芳香族テトラカルボン酸、又はそれらの酸二無水物や低級アルコールのエステル化物が好適であり、2,3,3’,4’-ビフェニルテトラカルボン酸、3,3’,4,4’-ビフェニルテトラカルボン酸、2,2’,3,3’-ビフェニルテトラカルボン酸、3,3’,4,4’-ジフェニルエーテルテトラカルボン酸、3,3’,4,4’-ジフェニルスルホンテトラカルボン酸、3,3’,4,4’-ベンゾフェノンテトラカルボン酸、2,2-ビス(3,4-ベンゼンジカルボン酸)ヘキサフルオロプロパン、ピロメリット酸、1,4-ビス(3,4-ベンゼンジカルボン酸)ベンゼン、2,2-ビス〔4-(3,4-フェノキシジカルボン酸)フェニル〕プロパン、2,3,6,7-ナフタレンテトラカルボン酸、1,2,5,6-ナフタレンテトラカルボン酸、1,2,4,5-ナフタレンテトラカルボン酸、1,4,5,8-ナフタレンテトラカルボン酸、1,1-ビス(2,3-ジカルボキシフェニル)エタンなどの芳香族テトラカルボン酸、又はそれらの酸二無水物や低級アルコールのエステル化物を好適に例示できる。また、テトラカルボン酸成分としては、シクロペンタンテトラカルボン酸、1,2,4,5-シクロヘキサンテトラカルボン酸、3-メチル-4-シクロヘキセン-1,2,4,5-テトラカルボン酸などの脂環族テトラカルボン酸、又はそれらの酸二無水物や低級アルコールのエステル化物を用いることもできる。 As the tetracarboxylic acid component, aromatic tetracarboxylic acids, or acid dianhydrides or esterified products of lower alcohols thereof are suitable, and 2,3,3 ′, 4′-biphenyltetracarboxylic acid, 3,3 ', 4,4'-biphenyltetracarboxylic acid, 2,2', 3,3'-biphenyltetracarboxylic acid, 3,3 ', 4,4'-diphenyl ether tetracarboxylic acid, 3,3', 4,4 '-Diphenylsulfonetetracarboxylic acid, 3,3', 4,4'-benzophenonetetracarboxylic acid, 2,2-bis (3,4-benzenedicarboxylic acid) hexafluoropropane, pyromellitic acid, 1,4-bis (3,4-benzenedicarboxylic acid) benzene, 2,2-bis [4- (3,4-phenoxydicarboxylic acid) phenyl] propane, 2,3,6,7-naphtha Tetracarboxylic acid, 1,2,5,6-naphthalenetetracarboxylic acid, 1,2,4,5-naphthalenetetracarboxylic acid, 1,4,5,8-naphthalenetetracarboxylic acid, 1,1-bis ( Preferable examples include aromatic tetracarboxylic acids such as 2,3-dicarboxyphenyl) ethane, or acid dianhydrides and esterified products of lower alcohols. Examples of the tetracarboxylic acid component include fats such as cyclopentanetetracarboxylic acid, 1,2,4,5-cyclohexanetetracarboxylic acid, and 3-methyl-4-cyclohexene-1,2,4,5-tetracarboxylic acid. Cyclic tetracarboxylic acids or acid dianhydrides or esterified products of lower alcohols can also be used.
 前記ジアミン化合物としては、芳香族、脂環式及び脂肪族ジアミンを用いることができる。具体的には、芳香族ジアミンとしては1,4-ジアミノベンゼン、1,3-ジアミノベンゼン、2,4-ジアミノトルエン、1,4-ジアミノ-2,5-ジハロゲノベンゼンなどのベンゼン1個を含むジアミン類、ビス(4-アミノフェニル)エ-テル、ビス(3-アミノフェニル)エーテル、ビス(4-アミノフェニル)スルホン、ビス(3-アミノフェニル)スルホン、ビス(4-アミノフェニル)メタン、ビス(3-アミノフェニル)メタン、ビス(4-アミノフェニル)スルフィド、ビス(3-アミノフェニル)スルフィド、2,2-ビス(4-アミノフェニル)プロパン、2,2-ビス(3-アミノフェニル)プロパン、2,2-ビス(4-アミノフェニル)ヘキサフルオロプロパン、o-ジアニシジン、o-トリジン、トリジンスルホン酸類などのベンゼン2個を含むジアミン類、1,4-ビス(4-アミノフェノキシ)ベンゼン、1,4-ビス(3-アミノフェノキシ)ベンゼン、1,4-ビス(4-アミノフェニル)ベンゼン、1,4-ビス(3-アミノフェニル)ベンゼン、α,α’-ビス(4-アミノフェニル)-1,4-ジイソプロピルベンゼン、α,α’-ビス(4-アミノフェニル)-1,3-ジイソプロピルベンゼンなどのベンゼン3個を含むジアミン類、2,2-ビス〔4-(4-アミノフェノキシ)フェニル〕プロパン、2,2-ビス〔4-(4-アミノフェノキシ)フェニル〕ヘキサフルオロプロパン、2,2-ビス〔4-(4-アミノフェノキシ)フェニル〕スルホン、4,4’-(4-アミノフェノキシ)ビフェニル、9,9-ビス(4-アミノフェニル)フルオレン、5,10-ビス(4-アミノフェニル)アントラセンなどのベンゼン4個以上を含むジアミン類など、脂環式ジアミンとしてはイソホロンジアミン、ノルボルネンジアミン、1,2-ジアミノシクロヘキサン、1,3-ジアミノシクロヘキサン、1,4-ジアミノシクロヘキサン、4,4’-メチレンビス(シクロヘキシルアミン)など、脂肪族ジアミンとしてはヘキサメチレンジアミン、ジアミノドデカンなどを挙げることができる。なかでも脂環式ジアミンは耐熱性と溶解性を併せ持つアルコール性水酸基末端イミドオリゴマー得ることができるので特に好適である。 As the diamine compound, aromatic, alicyclic and aliphatic diamines can be used. Specifically, as the aromatic diamine, one benzene such as 1,4-diaminobenzene, 1,3-diaminobenzene, 2,4-diaminotoluene, 1,4-diamino-2,5-dihalogenobenzene is used. Containing diamines, bis (4-aminophenyl) ether, bis (3-aminophenyl) ether, bis (4-aminophenyl) sulfone, bis (3-aminophenyl) sulfone, bis (4-aminophenyl) methane Bis (3-aminophenyl) methane, bis (4-aminophenyl) sulfide, bis (3-aminophenyl) sulfide, 2,2-bis (4-aminophenyl) propane, 2,2-bis (3-amino) Phenyl) propane, 2,2-bis (4-aminophenyl) hexafluoropropane, o-dianisidine, o-tolidine, tolidine Diamines containing two benzenes such as sulfonic acids, 1,4-bis (4-aminophenoxy) benzene, 1,4-bis (3-aminophenoxy) benzene, 1,4-bis (4-aminophenyl) benzene 1,4-bis (3-aminophenyl) benzene, α, α'-bis (4-aminophenyl) -1,4-diisopropylbenzene, α, α'-bis (4-aminophenyl) -1,3 Diamines containing three benzenes such as diisopropylbenzene, 2,2-bis [4- (4-aminophenoxy) phenyl] propane, 2,2-bis [4- (4-aminophenoxy) phenyl] hexafluoropropane 2,2-bis [4- (4-aminophenoxy) phenyl] sulfone, 4,4 ′-(4-aminophenoxy) biphenyl, 9,9-bis (4-amino) Nopyl) fluorene, diamines containing 4 or more benzenes such as 5,10-bis (4-aminophenyl) anthracene, and the like, and cycloaliphatic diamines include isophorone diamine, norbornene diamine, 1,2-diaminocyclohexane, 1,3 Examples of aliphatic diamines such as -diaminocyclohexane, 1,4-diaminocyclohexane and 4,4'-methylenebis (cyclohexylamine) include hexamethylenediamine and diaminododecane. Among these, alicyclic diamines are particularly suitable because they can provide an alcoholic hydroxyl-terminated imide oligomer having both heat resistance and solubility.
 前記アルコール性水酸基を1個有するモノアミン化合物としては、分子中にアルコール性水酸基とアミノ基とを各1個有する炭化水素化合物であり、好ましくは、アミノエタノール、アミノプロパノール、アミノブタノールなどの炭素数が1~10のアルコール性水酸基を有する脂肪族モノアミン化合物、アミノシクロヘキサノールなどの炭素数が3~20のアルコール性水酸基を有する脂環式モノアミン化合物を挙げることができる。 The monoamine compound having one alcoholic hydroxyl group is a hydrocarbon compound having one alcoholic hydroxyl group and one amino group in the molecule, and preferably has a carbon number such as aminoethanol, aminopropanol, and aminobutanol. Examples thereof include an aliphatic monoamine compound having 1 to 10 alcoholic hydroxyl groups and an alicyclic monoamine compound having an alcoholic hydroxyl group having 3 to 20 carbon atoms such as aminocyclohexanol.
 アルコール性水酸基末端イミドオリゴマーは、テトラカルボン酸成分と、ジアミン化合物及び水酸基を1個有するモノアミン化合物からなるアミン成分とを、テトラカルボン酸成分の酸無水物基(あるいは隣接する二個のカルボキル基等)の当量数と、アミン成分のアミノ基の当量数とが略等量となるようにして、有機溶媒中で重合及びイミド化反応させて得ることができる。具体的には、テトラカルボン酸成分(特にテトラカルボン酸二無水物)と、ジアミン化合物と水酸基を有するモノアミン化合物からなるアミン成分とを、酸無水物基(または隣接するジカルボン酸基)とアミン成分のアミノ基とが略当量となるような割合で使用して、各成分を有機極性溶媒中で、約100℃以下、特に80℃以下の反応温度で反応させてアミド-酸結合を有するオリゴマーを生成し、次いで、そのアミド-酸オリゴマー(アミック酸オリゴマーともいう)を、約0℃~140℃の低温でイミド化剤を添加するか或いは140℃~250℃の高温で加熱して脱水・イミド化させる方法によって得ることができる。脱水・イミド化反応のとき、トルエンやキシレンを加えて、共沸によって縮合水を除去しながら反応させてもよい。 The alcoholic hydroxyl-terminated imide oligomer comprises a tetracarboxylic acid component and an amine component composed of a diamine compound and a monoamine compound having one hydroxyl group, an acid anhydride group (or two adjacent carboxyl groups, etc.) of the tetracarboxylic acid component. ) And the number of equivalents of the amino group of the amine component so as to be approximately equal to each other, polymerization and imidization reaction can be performed in an organic solvent. Specifically, a tetracarboxylic acid component (particularly tetracarboxylic dianhydride), an amine component composed of a diamine compound and a monoamine compound having a hydroxyl group, an acid anhydride group (or an adjacent dicarboxylic acid group) and an amine component. The oligomer having an amide-acid bond is obtained by reacting each component in an organic polar solvent at a reaction temperature of about 100 ° C. or lower, particularly 80 ° C. or lower, in such a proportion that the amino group of Then, the amide-acid oligomer (also called amic acid oligomer) is added with an imidizing agent at a low temperature of about 0 ° C. to 140 ° C. or heated at a high temperature of 140 ° C. to 250 ° C. It can be obtained by the method of making it. In the dehydration / imidation reaction, toluene or xylene may be added and reacted while removing condensed water by azeotropy.
 アルコール性水酸基末端イミドオリゴマーを製造する際に使用される有機溶媒としては、N,N-ジメチルホルムアミド、N,N-ジメチルアセトアミド、N-メチル-2-ピロリドン、N-メチルカプロラクタム、などのアミド類溶媒、ジメチルスルホキシド、ヘキサメチルフォスホルムアミド、ジメチルスルホン、テトラメチレンスルホン、ジメチルテトラメチレンスルホンなどの硫黄原子を含有する溶媒、クレゾール、フェノール、キシレノールなどのフェノール類溶媒、ジエチレングリコールジメチルエーテル(ジグライム)、トリエチレングリコールジメチルエーテル(トリグライム)、テトラグライムなどのジグライム類溶媒、γ-ブチロラクトンなどのラクトン類溶媒、イソホロン、シクロヘキサノン、3,3,5-トリメチルシクロヘキサノンなどのケトン類溶媒、ピリジン、エチレングリコール、ジオキサン、テトラメチル尿素などがある。 Examples of the organic solvent used for producing the alcoholic hydroxyl-terminated imide oligomer include amides such as N, N-dimethylformamide, N, N-dimethylacetamide, N-methyl-2-pyrrolidone, and N-methylcaprolactam. Solvents, solvents containing sulfur atoms such as dimethyl sulfoxide, hexamethylphosphamide, dimethyl sulfone, tetramethylene sulfone, dimethyltetramethylene sulfone, phenol solvents such as cresol, phenol, xylenol, diethylene glycol dimethyl ether (diglyme), triethylene glycol Diglyme solvents such as dimethyl ether (triglyme) and tetraglyme, lactone solvents such as γ-butyrolactone, isophorone, cyclohexanone, 3,3,5-trime Ketones solvents such as Le cyclohexanone, pyridine, ethylene glycol, dioxane, and the like tetramethylurea.
 前述のようにして製造したアルコール性水酸基末端イミドオリゴマーは、前記化学式(1)中のmが異なる複数のオリゴマーの混合物になることがある。本発明では、mが異なる複数のイミドオリゴマーからなる混合物を、それぞれのイミドオリゴマーに分離して用いても構わないが、分離しないで混合物のままで好適に用いることができる。なお、2官能性水酸基末端イミドオリゴマーのm(混合物の場合はmの平均値)は、製造時のアミン成分中のジアミン化合物とモノアミン化合物との仕込み比(モル比)によって制御することができる。 The alcoholic hydroxyl-terminated imide oligomer produced as described above may be a mixture of a plurality of oligomers having different m in the chemical formula (1). In the present invention, a mixture composed of a plurality of imide oligomers having different m may be used separately for each imide oligomer, but can be suitably used as it is without separation. In addition, m (average value of m in the case of a mixture) of the bifunctional hydroxyl-terminated imide oligomer can be controlled by the charging ratio (molar ratio) of the diamine compound and the monoamine compound in the amine component at the time of production.
 変性ポリイミド樹脂は、ジイソシアネート化合物、ポリブタジエンジオール或いはポリカーボネートジオール、及びアルコール性水酸基末端イミドオリゴマーを同時に反応させてもよいが、好ましくは、ジイソシアネート化合物と、ポリブタジエンジオール或いはポリカーボネートジオールとを、イソシアネート基が水酸基に対して過剰量になるようにして反応させて末端イソシアネート化合物を調製し、次いで、前記末端イソシアネート化合物にアルコール性水酸基末端イミドオリゴマーを反応させることによって好適に得ることができる。これらの反応は無溶媒或いは有機溶媒中で、通常は、反応温度30℃~150℃、反応時間1~10時間、好ましくは不活性雰囲気下で行うことができる。有機溶媒は、前述のアルコール性水酸基末端イミドオリゴマーを製造する際に使用される溶媒が好適に使用できる。また、変性ポリイミド樹脂の詳細については特許文献1~3にさらに詳しく記載されているとおりである。 In the modified polyimide resin, a diisocyanate compound, a polybutadiene diol or a polycarbonate diol, and an alcoholic hydroxyl group-terminated imide oligomer may be reacted at the same time. Preferably, the diisocyanate compound and the polybutadiene diol or the polycarbonate diol are converted into a hydroxyl group. It can react suitably so that it may become an excess amount, and it can obtain suitably by making a terminal isocyanate compound react, and then making an alcoholic hydroxyl group terminal imide oligomer react with the said terminal isocyanate compound. These reactions can be carried out without solvent or in an organic solvent, usually at a reaction temperature of 30 ° C. to 150 ° C., for a reaction time of 1 to 10 hours, preferably in an inert atmosphere. As the organic solvent, a solvent used for producing the above-mentioned alcoholic hydroxyl group-terminated imide oligomer can be preferably used. Details of the modified polyimide resin are as described in more detail in Patent Documents 1 to 3.
 また、本発明の変性ポリイミド樹脂では、ポリブタジエンジオール或いはポリカーボネートジオールの一部(通常はジオール成分中の5~40モル%程度)を、反応性極性基含有ジオールに置き換えることが、変性ポリイミド樹脂組成物を加熱処理によって硬化させる際に好適である。反応性極性基含有ジオールとしては、置換基として活性水素を有するジオール化合物、例えばカルボキシル基やフェノール性水酸基を持ったジオール化合物が好ましく、特に置換基としてカルボキシル基やフェノール性水酸基を持った炭素数が1~30更に炭素数が2~20のジオール化合物が好適である。具体的には、カルボキシル基を有するジオール化合物として、2,2-ビス(ヒドロキシメチル)プロピオン酸、2,2-ビス(ヒドロキシメチル)酪酸などを挙げることができる。フェノール性水酸基を有するジオール化合物として、2,6-ビス(ヒドロキシメチル)-フェノール、2,6-ビス(ヒドロキシメチル)-p-クレゾールなどを挙げることができる。 In the modified polyimide resin of the present invention, a modified polyimide resin composition may be obtained by replacing a part of polybutadiene diol or polycarbonate diol (usually about 5 to 40 mol% in the diol component) with a reactive polar group-containing diol. Is suitable for curing by heating. As the reactive polar group-containing diol, a diol compound having an active hydrogen as a substituent, for example, a diol compound having a carboxyl group or a phenolic hydroxyl group is preferable, and the number of carbons having a carboxyl group or a phenolic hydroxyl group as a substituent is particularly preferred. A diol compound having 1 to 30 carbon atoms and 2 to 20 carbon atoms is preferred. Specifically, examples of the diol compound having a carboxyl group include 2,2-bis (hydroxymethyl) propionic acid and 2,2-bis (hydroxymethyl) butyric acid. Examples of the diol compound having a phenolic hydroxyl group include 2,6-bis (hydroxymethyl) -phenol and 2,6-bis (hydroxymethyl) -p-cresol.
 本発明の変性ポリイミド樹脂組成物は、少なくとも(A成分)ポリブタジエンセグメント或いはポリカーボネートセグメントからなるソフトセグメントを導入した変性ポリイミド樹脂100質量部、(B成分)グアナミン樹脂1~60質量部、好ましくは1~50質量部、より好ましくは3~40質量部、特に好ましくは3~30質量部、及び有機溶媒を含んで構成される。 The modified polyimide resin composition of the present invention comprises at least 100 parts by weight of a modified polyimide resin into which a soft segment comprising (A component) polybutadiene segment or polycarbonate segment is introduced, and (B component) 1 to 60 parts by weight of guanamine resin, preferably 1 to 50 parts by mass, more preferably 3 to 40 parts by mass, particularly preferably 3 to 30 parts by mass, and an organic solvent.
 (B成分)グアナミン樹脂は、本発明の変性ポリイミド樹脂組成物の硬化反応を担う成分である。グアナミン樹脂の含有量が前記範囲未満では本発明の効果を得ることができなくなり、前記範囲を超えるとポリブタジエンセグメント或いはポリカーボネートセグメントからなるソフトセグメントが導入された変性ポリイミド樹脂が有する優れた特性である電気絶縁性、耐熱性、柔軟性などが低下することがある。 (Component B) The guanamine resin is a component responsible for the curing reaction of the modified polyimide resin composition of the present invention. If the content of the guanamine resin is less than the above range, the effect of the present invention cannot be obtained. If the content exceeds the above range, the modified polyimide resin into which the soft segment composed of the polybutadiene segment or the polycarbonate segment is introduced has excellent characteristics. Insulation, heat resistance, flexibility, etc. may be reduced.
 本発明の変性ポリイミド樹脂組成物においては、硬化反応を担う成分として、さらに、(C成分)エポキシ樹脂を、0.1~30質量部、好ましくは0.1~20質量部、より好ましくは0.5~10質量部含有することが、低温硬化性を高めることができるので好適である。 In the modified polyimide resin composition of the present invention, 0.1 to 30 parts by mass, preferably 0.1 to 20 parts by mass, more preferably 0, of (C component) epoxy resin as a component responsible for the curing reaction. It is preferable to contain 5 to 10 parts by mass since the low-temperature curability can be improved.
 前記グアナミン樹脂としては、ベンゾグアナミンとホルムアルデヒドとの縮合物であるベンゾグアナミン樹脂が好適である。そして、ベンゾグアナミン樹脂のなかでも、メチロール化ベンゾグアナミン樹脂のメチロール基の一部又は全部を低級アルコールによってエーテル化した低級アルキルエーテル化ベンゾグアナミン樹脂が特に好ましい。 As the guanamine resin, a benzoguanamine resin which is a condensate of benzoguanamine and formaldehyde is preferable. Of the benzoguanamine resins, lower alkyl etherified benzoguanamine resins obtained by etherifying some or all of the methylol groups of the methylolated benzoguanamine resin with a lower alcohol are particularly preferable.
 ベンゾグアナミン樹脂の具体例としては、日本サイテックインダストリーズ社製の、サイメル1123(メチルエーテルとエチルエーテルとの混合エーテル化ベンゾグアナミン樹脂)、サイメル1123-10(メチルエーテルとブチルエーテルとの混合エーテル化ベンゾグアナミン樹脂)、サイメル1128(ブチルエーテル化ベンゾグアナミン樹脂)、マイコート102(メチルエーテル化ベンゾグアナミン樹脂)、マイコート132(メチル・ブチル混合エーテル化のベンゾグアナミン・メラミン共縮合樹脂)、日本サイテックインダストリーズ社製のマイコート136(メチルエーテルとブチルエーテルとの混合エーテル化ベンゾグアナミン樹脂)等を好適に挙げることができる。 Specific examples of the benzoguanamine resin include Cymel 1123 (mixed etherified benzoguanamine resin of methyl ether and ethyl ether), Cymel 1123-10 (mixed etherified benzoguanamine resin of methyl ether and butyl ether) manufactured by Nippon Cytec Industries, Inc. Cymel 1128 (Butyl etherified benzoguanamine resin), Mycoat 102 (Methyletherified benzoguanamine resin), Mycoat 132 (Methyl and butyl mixed etherified benzoguanamine / melamine co-condensation resin), Mycoat 136 (Methyl) manufactured by Nihon Cytec Industries, Ltd. A mixed etherified benzoguanamine resin of ether and butyl ether) and the like can be preferably mentioned.
 エポキシ樹脂としては、エポキシ当量が100~4000程度であって、分子量が300~10000程度である液状又は固体状のエポキシ樹脂が好ましい。例えば、ビスフェノールA型やビスフェノールF型のエポキシ樹脂(ジャパンエポキシレジン社製:エピコート806、エピコート825、エピコート828、エピコート1001、エピコート1002、エピコート1003、エピコート1004、エピコート1055、エピコート1004AF、エピコート1007、エピコート1009、エピコート1010など)、3官能以上のエポキシ樹脂(ジャパンエポキシレジン社製:エピコート152、エピコート154、エピコート180シリーズ、エピコート157シリーズ、エピコート1032シリーズ、住友化学工業株式会社製:スミエポキシELM100、ダイセル化学工業株式会社製:EHPE3150、チバガイギー製:MT0163など)、末端エポキシ化オリゴマー(宇部興産株式会社製のハイカーETBN1300×40、ナガセケムテックス株式会社製のデナレックスR-45EPTなど)、エポキシ化ポリブタジエン(日本石油化学株式会社製:E-1000-8、E-1800-6.5、ダイセル化学工業株式会社製:エポリードPB3600など)、脂環式エポキシ樹脂(ダイセル化学株式会社性:セロキサイド2021P、セロキサイド2080、エポリードGT400、EHPE)などを挙げることができる。なかでも、エポキシ化ポリブタジエンや脂環式エポキシ樹脂を用いると低ソリ性を得やすいので好適である。 The epoxy resin is preferably a liquid or solid epoxy resin having an epoxy equivalent of about 100 to 4000 and a molecular weight of about 300 to 10,000. For example, bisphenol A type or bisphenol F type epoxy resin (manufactured by Japan Epoxy Resin Co., Ltd .: Epicoat 806, Epicoat 825, Epicoat 828, Epicoat 1001, Epicoat 1002, Epicoat 1003, Epicoat 1004, Epicoat 1055AF, Epicoat 1004AF, Epicoat 1007, Epicoat 1009, Epicoat 1010, etc.) Trifunctional or higher epoxy resin (Japan Epoxy Resin: Epicoat 152, Epicoat 154, Epicoat 180 series, Epicoat 157 series, Epicoat 1032 series, Sumitomo Chemical Co., Ltd .: Sumiepoxy ELM100, Daicel Chemical Kogyo Co., Ltd .: EHPE3150, Ciba Geigy: MT0163, etc.), terminal epoxidized oligomer (Ube) Hiker ETBN 1300 × 40 manufactured by Sansei Co., Ltd., Denarex R-45EPT manufactured by Nagase ChemteX Corporation), epoxidized polybutadiene (manufactured by Nippon Petrochemical Co., Ltd .: E-1000-8, E-1800-6.5, Daicel) Chemical Industry Co., Ltd .: Epolide PB3600, etc.), and alicyclic epoxy resins (Daicel Chemical Co., Ltd .: Celoxide 2021P, Celoxide 2080, Epolide GT400, EHPE) and the like can be mentioned. Of these, use of epoxidized polybutadiene or alicyclic epoxy resin is preferable because low warpage is easily obtained.
 本発明の変性ポリイミド樹脂組成物においては、変性ポリイミド樹脂100質量部に対して1~50質量部、好ましくは2~40質量部、より好ましくは5~30質量部のフェノール性水酸基を2個以上有する化合物を含有することができる。フェノール性水酸基を2個以上有する化合物としては、例えば、ヒドロキノン、4,4’-ジヒドロキシビフェニルや、フェノールノボラック、クレゾールノボラック等のフェノール樹脂を挙げることができる。フェノール樹脂としては、明和化成株式会社製フェノールノボラックH-1、H-2、H-3、H-4、H-5、オルソクレゾールノボラックMER-130、トリフェノールメタン型MEH-7500、テトラキスフェノール型MEH-7600、ナフトール型MEH-7700、フェノールアラルキル型MEH-7800、MEH-7851、トリフェノール型R-3、ビスフェノールノボラック型MEP-6309、MEP-6309E、液状フェノールノボラックMEH-8000H、MEH-8005、MEH-8010、MEH-8015、MEH-8205などを挙げることができる。 In the modified polyimide resin composition of the present invention, 1 to 50 parts by mass, preferably 2 to 40 parts by mass, more preferably 5 to 30 parts by mass of two or more phenolic hydroxyl groups with respect to 100 parts by mass of the modified polyimide resin. It can contain the compound which has. Examples of the compound having two or more phenolic hydroxyl groups include hydroquinone, 4,4'-dihydroxybiphenyl, and phenol resins such as phenol novolac and cresol novolac. As phenol resins, Meiwa Kasei Co., Ltd. phenol novolacs H-1, H-2, H-3, H-4, H-5, orthocresol novolac MER-130, triphenolmethane type MEH-7500, tetrakisphenol type MEH-7600, naphthol type MEH-7700, phenol aralkyl type MEH-7800, MEH-7785, triphenol type R-3, bisphenol novolac type MEP-6309, MEP-6309E, liquid phenol novolak MEH-8000H, MEH-8005, MEH-8010, MEH-8015, MEH-8205 and the like can be mentioned.
 変性ポリイミド樹脂組成物は、通常溶媒を含有している。溶媒としては、変性ポリイミド樹脂を合成する際に使用した有機溶媒をそのまま使用することができるが、好適には、含窒素系溶媒、例えばN,N-ジメチルアセトアミド、N,N-ジエチルアセトアミド、N,N-ジメチルホルムアミド、N,N-ジエチルホルムアミド、N-メチル-2-ピロリドン、1,3-ジメチル-2-イミダゾリジノン、N-メチルカプロラクタムなど、含硫黄原子溶媒、例えばジメチルスルホキシド、ジエチルスルホキシド、ジメチルスルホン、ジエチルスルホン、ヘキサメチルスルホルアミドなど、含酸素溶媒、例えばフェノール系溶媒のクレゾール、フェノール、キシレノールなど、ジグライム系溶媒のジエチレングリコールジメチルエーテル(ジグライム)、トリエチレングリコールジメチルエーテル(トリグライム)、テトラグライムなど、ケトン系溶媒のアセトン、アセトフェノン、プロピオフェノン、シクロヘキサノン、イソホロンなど、エーテル系溶剤のエチレングリコール、ジオキサン、テトラヒドロフランなど、ラクトン系溶媒のγ-ブチロラクトンなど、を挙げることができる。特に、N-メチル-2-ピロリドン、N,N-ジメチルスルホキシド、N,N-ジメチルホルムアミド、N,N-ジエチルホルムアミド、N,N-ジメチルアセトアミド、N,N-ジエチルアセトアミド、γ-ブチロラクトン、トリエチレングリコールジメチルエーテルなどを好適に使用することができる。 The modified polyimide resin composition usually contains a solvent. As the solvent, the organic solvent used in the synthesis of the modified polyimide resin can be used as it is, but preferably a nitrogen-containing solvent such as N, N-dimethylacetamide, N, N-diethylacetamide, N , N-dimethylformamide, N, N-diethylformamide, N-methyl-2-pyrrolidone, 1,3-dimethyl-2-imidazolidinone, N-methylcaprolactam, etc., sulfur-containing atomic solvents such as dimethyl sulfoxide, diethyl sulfoxide , Dimethylsulfone, diethylsulfone, hexamethylsulfuramide, and other oxygen-containing solvents such as phenolic solvents cresol, phenol, xylenol, diglyme-based solvents diethylene glycol dimethyl ether (diglyme), triethylene glycol dimethyl ether ( (Liglyme), tetraglyme, etc., ketone solvents such as acetone, acetophenone, propiophenone, cyclohexanone, isophorone, ether solvents such as ethylene glycol, dioxane, tetrahydrofuran, etc., and lactone solvents such as γ-butyrolactone. . In particular, N-methyl-2-pyrrolidone, N, N-dimethylsulfoxide, N, N-dimethylformamide, N, N-diethylformamide, N, N-dimethylacetamide, N, N-diethylacetamide, γ-butyrolactone, tri Ethylene glycol dimethyl ether or the like can be preferably used.
 本発明の熱硬化変性ポリイミド樹脂組成物は、加熱処理によって架橋反応を促進するための硬化促進触媒などからなる硬化触媒を含有するのが好適である。さらに、変性ポリイミド樹脂組成物は、微細なフィラー、有機着色顔料、無機着色顔料などの顔料、消泡剤やレベリング剤などを含有してもよい。微細なフィラーとしては、例えばシリカ、アルミナ、炭酸カリウム、タルク、硫酸バリウムなどの従来公知の微細な無機充てん材、或いはアクリル樹脂ビーズやウレタン樹脂ビーズなどの微細な有機充てん剤を好適に挙げることができる。 The thermosetting modified polyimide resin composition of the present invention preferably contains a curing catalyst such as a curing accelerating catalyst for accelerating the crosslinking reaction by heat treatment. Furthermore, the modified polyimide resin composition may contain fine fillers, pigments such as organic color pigments and inorganic color pigments, antifoaming agents, leveling agents and the like. As the fine filler, for example, conventionally known fine inorganic fillers such as silica, alumina, potassium carbonate, talc, barium sulfate, or fine organic fillers such as acrylic resin beads and urethane resin beads can be preferably cited. it can.
 前記アクリル樹脂ビーズやウレタン樹脂ビーズは、メタクリル酸メチルなどを懸濁重合させることによって容易に得られる真球状のものが好適である。また、本発明で用いるアクリル樹脂ビーズやウレタン樹脂ビーズは、溶液組成物に充てん材として好適に含有されるものであるから、好ましくは球状の架橋アクリル樹脂ビーズ或いは架橋ウレタン樹脂ビーズである。 The above-mentioned acrylic resin beads and urethane resin beads are preferably spherical particles that can be easily obtained by suspension polymerization of methyl methacrylate or the like. The acrylic resin beads and urethane resin beads used in the present invention are preferably contained as fillers in the solution composition, and are preferably spherical crosslinked acrylic resin beads or crosslinked urethane resin beads.
 微細な無機或いは有機充てん剤の平均粒子径は、特に限定されるものではないが0.001~20μm、好ましくは0.01~10μm、より好ましくは0.01~5μmのものが好適である。 The average particle size of the fine inorganic or organic filler is not particularly limited, but 0.001 to 20 μm, preferably 0.01 to 10 μm, more preferably 0.01 to 5 μm is suitable.
 本発明の変性ポリイミド樹脂組成物は、特に限定するものではないが、室温(25℃)での溶液粘度が5~1000Pa・s、特に10~100Pa・s、更に10~60Pa・sであることがスクリーン印刷などの作業性や溶液物性、さらに得られる硬化絶縁膜の特性が良好であることなどから好適である。 The modified polyimide resin composition of the present invention is not particularly limited, but the solution viscosity at room temperature (25 ° C.) is 5 to 1000 Pa · s, particularly 10 to 100 Pa · s, more preferably 10 to 60 Pa · s. However, it is preferable because workability such as screen printing, solution physical properties, and properties of the obtained cured insulating film are good.
 本発明の変性ポリイミド樹脂組成物は、ICチップなどのチップ部品を実装する電気電子部品の絶縁膜(保護膜)を形成するために好適に用いることができる。例えば、導電性金属箔で形成された配線パターンを有する絶縁フィルムのパターン面に、乾燥膜の厚さが3~60μm程度となるようにスクリーン印刷などによって印刷して塗布した後、50~100℃程度の温度で5~60分間程度加熱処理して溶媒を除去し、次いで100~210℃程度好適には110~200℃で5~120分間好適には10~60分間程度で加熱処理して硬化させ、好適には弾性率が10~500MPaの硬化絶縁膜を形成することが好ましい。 The modified polyimide resin composition of the present invention can be suitably used for forming an insulating film (protective film) for electrical and electronic parts on which chip parts such as IC chips are mounted. For example, after printing and applying to the pattern surface of an insulating film having a wiring pattern formed of a conductive metal foil by screen printing or the like so that the thickness of the dry film is about 3 to 60 μm, 50 to 100 ° C. The solvent is removed by heat treatment at a temperature of about 5 to 60 minutes, and then cured by heat treatment at about 100 to 210 ° C., preferably at 110 to 200 ° C. for 5 to 120 minutes, preferably about 10 to 60 minutes. Preferably, a cured insulating film having an elastic modulus of 10 to 500 MPa is preferably formed.
 本発明の変性ポリイミド樹脂用組成物は、改良された表面硬度やタック性を有し、反りの抑制が容易であり、封止材料や異方性導電材料に対する強い密着性が得られるのみならず、柔軟性が高く、電気特性が優れ、導電性金属、基材との密着性が良好であり、耐熱性、半田耐熱性、耐溶剤性(例えば、アセトン、イソプロパノール、メチルエチルケトン、N-メチル-2-ピロリドンに対する耐溶剤性)、耐薬品性、耐屈曲性などが優れた硬化絶縁膜を形成することができる。 The modified polyimide resin composition of the present invention has improved surface hardness and tackiness, is easy to suppress warpage, and not only provides strong adhesion to a sealing material or anisotropic conductive material. High flexibility, excellent electrical properties, good adhesion to conductive metals and substrates, heat resistance, solder heat resistance, solvent resistance (for example, acetone, isopropanol, methyl ethyl ketone, N-methyl-2) A cured insulating film having excellent solvent resistance to pyrrolidone), chemical resistance, flex resistance, and the like can be formed.
 本発明の変性ポリイミド樹脂絶縁膜用組成物は、120~160℃程度特に120℃程度(130℃以下)の比較的低温の加熱処理によって前記のような良好な性能を持った絶縁膜を形成することが可能である。従って、多層配線基板の層間接着剤などにも好適に使用することもできる。 The composition for a modified polyimide resin insulating film of the present invention forms an insulating film having good performance as described above by heat treatment at a relatively low temperature of about 120 to 160 ° C., particularly about 120 ° C. (130 ° C. or less). It is possible. Therefore, it can also be suitably used as an interlayer adhesive for a multilayer wiring board.
 次に本発明の第2の態様を説明する。尚、以下の説明において、「第1の態様と同様」または「第1の態様で説明したとおり」等と記載したときは、好ましい形態も第1の態様において説明した形態であることを意味する。 Next, the second aspect of the present invention will be described. In the following description, when “same as the first mode” or “as described in the first mode” is described, it means that the preferable mode is also the mode described in the first mode. .
 本発明の変性ポリイミド樹脂は、イミド構造を有するハードセグメントに、ポリブタジエンセグメント或いはポリカーボネートセグメントからなるソフトセグメントが導入された変性ポリイミド樹脂であり、前述の第1の態様で説明したとおりである。 The modified polyimide resin of the present invention is a modified polyimide resin in which a soft segment composed of a polybutadiene segment or a polycarbonate segment is introduced into a hard segment having an imide structure, as described in the first embodiment.
 本発明の特徴は、前述のようにして調製されたポリブタジエンセグメント或いはポリカーボネートセグメントからなるソフトセグメントが導入された変性ポリイミド樹脂を含んで構成された変性ポリイミド樹脂組成物において、充てん材としてアクリル樹脂ビーズを添加することによって、加熱処理して得られる硬化膜の表面硬度と耐折れ性とを同時に改良したことにある。 A feature of the present invention is that a modified polyimide resin composition comprising a modified polyimide resin into which a soft segment composed of a polybutadiene segment or a polycarbonate segment prepared as described above is introduced, wherein acrylic resin beads are used as a filler. By adding, the surface hardness and fold resistance of the cured film obtained by heat treatment are improved at the same time.
 以下では、アルコール性水酸基末端イミドオリゴマーを用いて調製された変性ポリイミド樹脂の場合について説明するが、本発明はこのようにして調整された変性ポリイミド樹脂の場合に限定されるものではない。 Hereinafter, the case of a modified polyimide resin prepared using an alcoholic hydroxyl-terminated imide oligomer will be described, but the present invention is not limited to the modified polyimide resin thus prepared.
 変性ポリイミド樹脂は、第1の態様において説明したものを使用することができる。 As the modified polyimide resin, those described in the first embodiment can be used.
 本発明の変性ポリイミド樹脂組成物は、好適には(A)ポリブタジエンセグメント或いはポリカーボネートセグメントからなるソフトセグメントを導入した変性ポリイミド樹脂100質量部、(B)エポキシ化合物、多価イソシアネート化合物、及びアミノ樹脂からなる群から選択された少なくとも一つの硬化性化合物1~100質量部好ましくは2~80質量部特に10~60質量部、(C)アクリル樹脂ビーズ1~80質量部、および(D)有機溶媒を含んで構成される。 The modified polyimide resin composition of the present invention preferably comprises (A) 100 parts by mass of a modified polyimide resin into which a soft segment composed of a polybutadiene segment or a polycarbonate segment is introduced, (B) an epoxy compound, a polyvalent isocyanate compound, and an amino resin. At least one curable compound selected from the group consisting of 1 to 100 parts by weight, preferably 2 to 80 parts by weight, particularly 10 to 60 parts by weight, (C) 1 to 80 parts by weight of acrylic resin beads, and (D) an organic solvent. Consists of including.
 硬化性化合物(B)は、単独或いは複数組合せて使用できるが、特にエポキシ化合物と多価イソシアネート化合物との組合せ、或いはエポキシ化合物とアミノ樹脂との組合せが好適である。使用量は、前記範囲よりも多すぎると硬化後の絶縁膜の電気絶縁性が低下したりタック性が現れたりし、少なすぎると硬化後の絶縁膜の耐熱性、耐薬品性が悪くなるので前記範囲が好ましい。 The curable compound (B) can be used alone or in combination of two or more, but a combination of an epoxy compound and a polyvalent isocyanate compound or a combination of an epoxy compound and an amino resin is particularly preferable. If the amount used is more than the above range, the electrical insulation properties of the insulating film after curing will be reduced or tackiness will appear, and if it is too small, the heat resistance and chemical resistance of the insulating film after curing will deteriorate. Said range is preferred.
 前述の第1の態様の効果を得るには、硬化性化合物(B)として、アミノ樹脂の一種であるグアナミン樹脂が選ばれ、好ましくはエポキシ樹脂が併用される。 In order to obtain the effect of the first aspect, a guanamine resin which is a kind of amino resin is selected as the curable compound (B), and an epoxy resin is preferably used in combination.
 前記エポキシ化合物は、第1の態様において説明したものを使用することができる。 The epoxy compound described in the first aspect can be used.
 前記イソシアネート化合物としては、1分子中にイソシアネート基を2個以上有するものであればどのようなものでもよい。このようなイソシアネート化合物として、脂肪族、脂環族または芳香族のジイソシアネート等があり、例えば1,4-テトラメチレンジイソシアネ-ト、1,5-ペンタメチレンジイソシアネート、1,6-ヘキサメチレンジイソシアネート、2,2,4-トリメチル-1,6-へキサメチレンジイソシアネート、リジンジイソシアネート、3-イソシアネートメチル-3,5,5-トリメチルシクロヘキシルイソシアネート(イソホロンジイソシアネート)、1,3-ビス(イソシアネートメチル)-シクロヘキサン、4,4’-ジシクロヘキシルメタンジイソシアネート、トリレンジイソシアネ-ト、4,4’-ジフェニルメタンジイソシアネート、1,5-ナフタレンジイソシアネート、トリジンジイソシアネート、キシリレンジイソシアネート等を挙げることが出来る。 The isocyanate compound may be any compound as long as it has two or more isocyanate groups in one molecule. Examples of such isocyanate compounds include aliphatic, alicyclic or aromatic diisocyanates such as 1,4-tetramethylene diisocyanate, 1,5-pentamethylene diisocyanate, 1,6-hexamethylene diisocyanate. 2,2,4-trimethyl-1,6-hexamethylene diisocyanate, lysine diisocyanate, 3-isocyanate methyl-3,5,5-trimethylcyclohexyl isocyanate (isophorone diisocyanate), 1,3-bis (isocyanate methyl)- Cyclohexane, 4,4'-dicyclohexylmethane diisocyanate, tolylene diisocyanate, 4,4'-diphenylmethane diisocyanate, 1,5-naphthalene diisocyanate, tolidine diisocyanate, xylylene diisocyanate Aneto, etc. can be mentioned.
 更に、イソシアネート化合物として、脂肪族、脂環族または芳香族の多価イソシアネートから誘導されるもの、例えばイソシアヌレート変性多価イソシアネート、ビュレット変性多価イソシアネート、ウレタン変性多価イソシアネート等であってもよい。 Further, the isocyanate compound may be derived from an aliphatic, alicyclic or aromatic polyisocyanate, such as isocyanurate-modified polyisocyanate, burette-modified polyisocyanate, urethane-modified polyisocyanate, etc. .
 また、イソシアネート化合物は、多価イソシアネートのイソシアネート基をブロック化剤でブロックされたブロック多価イソシアネートが好適に使用される。 Further, as the isocyanate compound, a blocked polyvalent isocyanate in which an isocyanate group of the polyvalent isocyanate is blocked with a blocking agent is preferably used.
 前記ブロック多価イソシアネートとしては、特に、大日本インキ化学工業株式会社製のバーノックD-500(トリレンジイソシアネートブロック化体)、D-550(1,6-ヘキサメチレンジイソシアネートブロック化体)、三井武田ケミカル株式会社製のタケネートタケネートB-830(トリレンジイソシアネートブロック化体)、B-815N(4,4’-メチレンビス(シクロヘキシルイソシアネート)ブロック化体)、B-842N(1,3-ビス(イソシアネートメチル)シクロヘキサンブロック化体)、B-846N(1,3-ビス(イソシアネートメチル)シクロヘキサンブロック化体)、B-874N(イソホロンンジイソシアネートブロック化体)、B-882N(1,6-ヘキサメチレンジイソシアネートブロック化体)、旭化成株式会社製のデュラネートMF-B60X(1,6-ヘキサメチレンジイソシアネートブロック化体)、デュラネートMF-K60X(1,6-ヘキサメチレンジイソシアネートブロック化体)、デュラネートME20-B80(1,6-ヘキサメチレンジイソシアネートブロック化体)、第一工業製薬社製のエラストロンBN-P17(4,4’-ジフェニルメタンジイソシアネート ブッロク化体)、エラストロンBN-04、エラストロンBN-08、エラストロンBN-44、エラストロンBN-45(以上、ウレタン変性多価イソシアネートブッロク化体1分子当たり3~5官能、いずれも水エマルジョン品で乾燥単離後使用可能)などを好適に使用することができる。 As the block polyvalent isocyanate, in particular, Bernock D-500 (tolylene diisocyanate blocked), D-550 (1,6-hexamethylene diisocyanate blocked) manufactured by Dainippon Ink and Chemicals, Ltd., Takeda Mitsui Takenate Takenate B-830 (tolylene diisocyanate blocked), B-815N (4,4'-methylenebis (cyclohexyl isocyanate) blocked), B-842N (1,3-bis ( Isocyanatomethyl) cyclohexane blocked), B-846N (1,3-bis (isocyanatemethyl) cyclohexane blocked), B-874N (isophorone diisocyanate blocked), B-882N (1,6-hexamethylene) Diisocyanate broth ), Duranate MF-B60X (1,6-hexamethylene diisocyanate blocked), Asura Kasei Co., Ltd., Duranate MF-K60X (1,6-hexamethylene diisocyanate blocked), Duranate ME20-B80 (1) , 6-hexamethylene diisocyanate blocked), Elastolon BN-P17 (4,4′-diphenylmethane diisocyanate block) produced by Daiichi Kogyo Seiyaku Co., Ltd., Elastolon BN-04, Elastolon BN-08, Elastolon BN-44, Elastrone BN-45 (above, 3 to 5 functional groups per molecule of urethane-modified polyisocyanate block, all can be used after being dried and isolated in a water emulsion product) can be preferably used.
 前記アミノ樹脂としては、限定するものではないが、メチロール化メラミン樹脂或いはメチロール化ベンゾグアナミン樹脂のメチロール基の一部又は全部を低級アルコールによってエーテル化した低級アルキルエーテル化メラミン樹脂或いは低級アルキルエーテル化ベンゾグアナミン樹脂が好ましい。 Examples of the amino resin include, but are not limited to, a lower alkyl etherified melamine resin or a lower alkyl etherified benzoguanamine resin obtained by etherifying a part or all of the methylol groups of a methylolated melamine resin or a methylolated benzoguanamine resin with a lower alcohol. Is preferred.
 メラミン樹脂の具体例としては、例えばユーバン20SE、同225(いずれも三井東圧社製)、スーパーベッカミンJ820-60、同L-117-60、同L-109-65、同437-508-60、同L-118-60、同G821-60(いずれも大日本インキ化学工業社製)等のブチルエーテル化メラミン樹脂;サイメル300、同303、同325、同327、同350、同730、同736、同738(いずれも日本サイテックインダストリーズ社製)、メラン522、同523(いずれも日立化成社製)、ニカラックMS001、同MX430、同MX650(いずれも三和ケミカル社製)、スミマールM-55、同M-100、同M-40S(いずれも住友化学社製)、レジミン740、同747(いずれもモンサント社製)等のメチルエーテル化メラミン樹脂;サイメル232、同266、同XV-514、同1130(いずれも日本サイテックインダストリーズ社製)、ニカラックMX500、同MX600、同MS95(いずれも三和ケミカル社製)、レジミン753、同755(いずれもモンサント社製)、スミマールM-66B(住友化学社製)等のメチルエーテルとブチルエーテルとの混合エーテル化メラミン樹脂等を挙げることができる。 Specific examples of the melamine resin include, for example, Uban 20SE, 225 (all manufactured by Mitsui Toatsu), Super Becamine J820-60, L-117-60, L-109-65, 437-508- Butyl etherified melamine resins such as 60, L-118-60, G821-60 (all manufactured by Dainippon Ink and Chemicals); Cymel 300, 303, 325, 327, 350, 730, 736, 738 (all manufactured by Nihon Cytec Industries, Inc.), Melan 522, 523 (all manufactured by Hitachi Chemical Co., Ltd.), Nicarak MS001, MX 430, MX 650 (all manufactured by Sanwa Chemical Co., Ltd.), Sumimar M-55 M-100, M-40S (both manufactured by Sumitomo Chemical Co., Ltd.), Resimin 740, 747 (both Monsan Methyl etherified melamine resins such as Cymel 232, 266, XV-514, 1130 (all manufactured by Nihon Cytec Industries), Nicalak MX500, MX600, MS95 (all manufactured by Sanwa Chemical Co., Ltd.) ), Resimin 753, 755 (both manufactured by Monsanto Co., Ltd.), Summar M-66B (manufactured by Sumitomo Chemical Co., Ltd.), and the like.
 ベンゾグアナミン樹脂の具体例は、第1の態様において説明したものを使用することができる。このようなベンゾグアナミン樹脂を含有すると、同時に第1の態様の発明ということになる。 As a specific example of the benzoguanamine resin, those described in the first aspect can be used. When such a benzoguanamine resin is contained, it is the invention of the first aspect at the same time.
 本発明で用いるアクリル樹脂ビーズ(アクリル樹脂微粉末)は、メタクリル酸メチルなどを懸濁重合させることによって容易に得られる真球状のものが好適である。また、本発明で用いるアクリル樹脂ビーズは、溶液組成物に充てん材として好適に含有されるものであるから、好ましくは球状の架橋アクリル樹脂ビーズである。 As the acrylic resin beads (acrylic resin fine powder) used in the present invention, spherical particles that are easily obtained by suspension polymerization of methyl methacrylate or the like are suitable. The acrylic resin beads used in the present invention are preferably contained as a filler in the solution composition, and are preferably spherical crosslinked acrylic resin beads.
 アクリル樹脂ビーズの平均粒子径は、特に限定されるものではないが1~20μm、好ましくは1~10μm、より好ましくは1~5μmのものである。平均粒子径が1μm以下のものは入手が困難であり、平均粒子径が大きくなると、耐折れ性の改良効果が少なくなったり、微細な配線からなる柔軟性配線板用の絶縁膜として用いることができなくなったりするので、好適ではない。 The average particle diameter of the acrylic resin beads is not particularly limited, but is 1 to 20 μm, preferably 1 to 10 μm, more preferably 1 to 5 μm. Those having an average particle size of 1 μm or less are difficult to obtain, and when the average particle size is increased, the effect of improving the folding resistance is reduced or the insulating film for a flexible wiring board made of fine wiring is used. Since it cannot be performed, it is not suitable.
 アクリル樹脂ビーズの具体例としては、根上工業社製のアートパールG-400、G-800、GR-400、GR-800、J-4PY、J-4P、J-4PY、J-5P、J-7P、J7PY、S-5P等を好適に挙げることができる。 Specific examples of acrylic resin beads include Art Pearl G-400, G-800, GR-400, GR-800, J-4PY, J-4P, J-4PY, J-5P, J-, manufactured by Negami Kogyo Co., Ltd. Preferred examples include 7P, J7PY, S-5P, and the like.
 本発明の変性ポリイミド樹脂組成物は、変性ポリイミド樹脂100質量部に対して1~50質量部、好ましくは2~40質量部、より好ましくは5~30質量部のフェノール性水酸基を2個以上有する化合物を含有することができる。フェノール性水酸基を2個以上有する化合物は、第1の態様において説明した。 The modified polyimide resin composition of the present invention has 2 or more phenolic hydroxyl groups of 1 to 50 parts by mass, preferably 2 to 40 parts by mass, more preferably 5 to 30 parts by mass with respect to 100 parts by mass of the modified polyimide resin. Compounds can be included. The compound having two or more phenolic hydroxyl groups has been described in the first embodiment.
 変性ポリイミド樹脂組成物の溶媒については、第1の態様において説明したものを使用することができる。 As the solvent of the modified polyimide resin composition, those described in the first embodiment can be used.
 本発明の変性ポリイミド樹脂組成物は、加熱処理によって架橋反応を促進するための硬化促進触媒などからなる硬化触媒を含有してもよい。さらに、変性ポリイミド樹脂組成物は、アクリル樹脂ビーズ以外の微細なフィラー、有機着色顔料、無機着色顔料などの顔料、消泡剤やレベリング剤などを含有してもよい。アクリル樹脂ビーズ以外の微細なフィラーとしては、例えばシリカ、アルミナ、炭酸カリウム、タルク、硫酸バリウムなどの従来公知の微細な無機充てん材を好適に挙げることができる。 The modified polyimide resin composition of the present invention may contain a curing catalyst such as a curing accelerating catalyst for accelerating the crosslinking reaction by heat treatment. Furthermore, the modified polyimide resin composition may contain fine fillers other than acrylic resin beads, pigments such as organic color pigments and inorganic color pigments, antifoaming agents and leveling agents. As fine fillers other than acrylic resin beads, conventionally known fine inorganic fillers such as silica, alumina, potassium carbonate, talc and barium sulfate can be preferably exemplified.
 本発明の変性ポリイミド樹脂組成物は、特に限定するものではないが、室温(25℃)での溶液粘度が5~1000Pa・s特に10~100Pa・s更に10~60Pa・sであることがスクリーン印刷などの作業性や溶液物性、得られる硬化絶縁膜の特性上などから適当である。 The modified polyimide resin composition of the present invention is not particularly limited, but the solution viscosity at room temperature (25 ° C.) is 5 to 1000 Pa · s, particularly 10 to 100 Pa · s, more preferably 10 to 60 Pa · s. It is suitable in view of workability such as printing, solution properties, and characteristics of the obtained cured insulating film.
 本発明の変性ポリイミド樹脂組成物は、ICチップなどのチップ部品を実装する電気電子部品の絶縁膜(保護膜)を形成するために好適に用いることができる。例えば、導電性金属箔で形成された配線パターンを有する絶縁フィルムのパターン面に、乾燥膜の厚さが3~60μm程度となるようにスクリーン印刷などによって印刷して塗布した後、50~100℃程度の温度で5~60分間程度加熱処理して溶媒を除去し、次いで100~210℃程度好適には110~200℃で5~120分間好適には10~60分間程度で加熱処理して硬化させ、好適には弾性率が10~500MPaの硬化絶縁膜を形成することが好ましい。 The modified polyimide resin composition of the present invention can be suitably used for forming an insulating film (protective film) for electrical and electronic parts on which chip parts such as IC chips are mounted. For example, after printing and applying to the pattern surface of an insulating film having a wiring pattern formed of a conductive metal foil by screen printing or the like so that the thickness of the dry film is about 3 to 60 μm, 50 to 100 ° C. The solvent is removed by heat treatment at a temperature of about 5 to 60 minutes, and then cured by heat treatment at about 100 to 210 ° C., preferably at 110 to 200 ° C. for 5 to 120 minutes, preferably about 10 to 60 minutes. Preferably, a cured insulating film having an elastic modulus of 10 to 500 MPa is preferably formed.
 本発明の変性ポリイミド樹脂用組成物は、改良された表面硬度及び耐折れ性に加えて、封止材料や異方性導電材料に対する強い密着性が得られ、反りが発生し難く、柔軟性が高く、電気特性が優れ、導電性金属、基材との密着性が良好であり、耐熱性、半田耐熱性、耐溶剤性(例えば、アセトン、イソプロパノール、メチルエチルケトン、N-メチル-2-ピロリドンに対する耐溶剤性)、耐薬品性、耐屈曲性などが優れた硬化絶縁膜を形成することができる。 The modified polyimide resin composition of the present invention provides strong adhesion to a sealing material or anisotropic conductive material in addition to improved surface hardness and fold resistance, and is less likely to warp and has flexibility. High, excellent electrical properties, good adhesion to conductive metals and substrates, heat resistance, solder heat resistance, solvent resistance (for example, resistance to acetone, isopropanol, methyl ethyl ketone, N-methyl-2-pyrrolidone) A cured insulating film excellent in solvent resistance, chemical resistance, flex resistance and the like can be formed.
 本発明の変性ポリイミド樹脂絶縁膜用組成物は、特に160℃程度の比較的低温の加熱処理によって前記のような良好な性能を持った絶縁膜を形成することが可能である。従って、多層配線基板の層間接着剤などにも好適に使用することもできる。 The composition for a modified polyimide resin insulating film of the present invention can form an insulating film having good performance as described above, particularly by heat treatment at a relatively low temperature of about 160 ° C. Therefore, it can also be suitably used as an interlayer adhesive for a multilayer wiring board.
 以下、実施例及び比較例によって本発明を更に説明する。尚、本発明は以下の実施例に限定されるものではない。 Hereinafter, the present invention will be further described with reference to examples and comparative examples. The present invention is not limited to the following examples.
 以下の各例において測定、評価は次の方法で行った。
〔タック性試験〕
 35μm厚のポリイミドフィルム上にアプリケーターを用い試料の変性ポリイミド樹脂組成物の塗膜を形成し、これを80℃で30分間次いで120℃で90分間加熱処理して硬化させて、10μm厚の硬化膜を形成した後、このポリイミドフィルムと硬化膜との積層体を、2.5cm×10cmの大きさにカットものを試験片とした。
In the following examples, measurement and evaluation were performed by the following methods.
[Tackiness test]
A coating film of a modified polyimide resin composition of a sample is formed on a polyimide film having a thickness of 35 μm by using an applicator, and this is cured by heating at 80 ° C. for 30 minutes and then at 120 ° C. for 90 minutes to cure the cured film having a thickness of 10 μm. After forming this, the laminate of this polyimide film and cured film was cut into a size of 2.5 cm × 10 cm as a test piece.
 試験方法は、各設定温度(ここでは、110℃、120℃、130℃、140℃の各温度)に加温したホットプレート上に試験片を置き、ホットプレートと同じ温度に加温したステンレス製の錘(重量300g)を試験片の上に30秒間乗せ錘を引き上げた。錘を引き上げた際に、錘に試験片が引っ付いた状態を不合格(×)とし、ホットプレート上に静置された状態を合格(○)とした。なお、試験は各設定温度で3回行った。 The test method is as follows: a test piece is placed on a hot plate heated to each set temperature (here, 110 ° C., 120 ° C., 130 ° C., and 140 ° C.) and heated to the same temperature as the hot plate. The weight (300 g in weight) was placed on the test piece for 30 seconds and the weight was lifted. When the weight was pulled up, the state where the test piece was caught on the weight was regarded as unacceptable (x), and the state where it was allowed to stand on the hot plate was regarded as acceptable (◯). The test was performed three times at each set temperature.
〔MIT式耐折試験〕
 35μm厚のポリイミド層に7μm厚の銅層が積層された2層CCLを基材とし、前記基材表面に配線幅15μm、配線間距離15μm、回路長20cmの回路を形成した後で、その回路表面に3μm厚のSnメッキを施したフレキシブル基板を作成した。このフレキシブル基板の回路領域に、スクリーン印刷機(ネオテクノジャパン製、半自動スクリーン印刷機 NT-15SS-U)を用いて試料の変性ポリイミド樹脂組成物の塗膜を形成し、これを80℃で30分間次いで120℃で90分間加熱処理して硬化させて、10μm厚の硬化膜を形成したものを試験片とした。
[MIT folding test]
After forming a circuit having a wiring width of 15 μm, an inter-wiring distance of 15 μm, and a circuit length of 20 cm on the surface of the base material using a two-layer CCL in which a 7 μm-thick copper layer is laminated on a 35 μm-thick polyimide layer, A flexible substrate having a surface plated with 3 μm thick Sn was prepared. A coating film of the modified polyimide resin composition of the sample is formed on the circuit area of the flexible substrate using a screen printing machine (manufactured by Neo Techno Japan, semi-automatic screen printing machine NT-15SS-U). Then, a test piece was prepared by heating and curing at 120 ° C. for 90 minutes to form a cured film having a thickness of 10 μm.
 この試験片を、MIT式耐柔疲労試験機 DA型(東洋精機製作所製)にて、JIS P 8115に準拠して耐折れ性を測定した。測定は、90°折り曲げ(R=0.5)、折り曲げ速度90回/分の条件で行った。 The fold resistance of this test piece was measured according to JIS P 8115 with an MIT type soft fatigue tester DA type (manufactured by Toyo Seiki Seisakusho). The measurement was performed under the conditions of 90 ° bending (R = 0.5) and a bending speed of 90 times / minute.
〔鉛筆硬度試験〕
 50μm厚の銅箔表面にアプリケーターを用い試料の変性ポリイミド樹脂組成物の塗膜を形成し、これを80℃で30分間次いで120℃で90分間加熱処理して硬化させて、20μm厚の硬化膜を形成したものを試験片とした。得られた試験片の硬化膜を、装置として鉛筆引掻塗膜硬さ試験機(東洋精機製作所製)、鉛筆として4B~2H(三菱UNI)を用いてJIS-K5600-5-4の手順に従い鉛筆硬度の測定を行った。
[Pencil hardness test]
A coating film of a modified polyimide resin composition as a sample is formed on the surface of a 50 μm thick copper foil using an applicator and cured by heating at 80 ° C. for 30 minutes and then at 120 ° C. for 90 minutes to obtain a cured film having a thickness of 20 μm. A specimen was formed as a test piece. The cured film of the obtained test piece was subjected to the procedure of JIS-K5600-5-4 using a pencil scratch coating film hardness tester (manufactured by Toyo Seiki Seisakusho) as an apparatus and 4B-2H (Mitsubishi UNI) as a pencil. Pencil hardness was measured.
〔ゲル分率の測定〕
 剥離剤をコートした硝子上に試料の変性ポリイミド樹脂組成物の塗膜を形成し、これを80℃で30分間次いで120℃で90分間加熱処理して硬化させて、60μm厚の硬化膜を形成した後、その硬化膜を硝子から剥離し、5cm×10cmの大きさにカットしたものを試験片とした。
[Measurement of gel fraction]
A film of the modified polyimide resin composition of the sample is formed on the glass coated with a release agent, and this is cured by heating at 80 ° C. for 30 minutes and then at 120 ° C. for 90 minutes to form a cured film having a thickness of 60 μm. After that, the cured film was peeled off from the glass and cut into a size of 5 cm × 10 cm was used as a test piece.
 試験片を30分間アセトン中に浸漬し、浸漬前後の試験片の質量を測定し、質量の残存率をゲル分率とした。 The test piece was immersed in acetone for 30 minutes, the mass of the test piece before and after immersion was measured, and the residual ratio of the mass was defined as the gel fraction.
 ゲル分率(質量%)=[(アセトン浸漬後の質量)/(アセトン浸漬前の質量)]×100 Gel fraction (mass%) = [(mass after acetone immersion) / (mass before acetone immersion)] × 100
〔引張弾性率、伸び〕
 80℃で30分間次いで120℃で90分間加熱処理して、70μm厚のシート状硬化膜を作成し、これを、幅1cm、長さ7cmに切り出して試験片とした。温度25℃、湿度50%RHの雰囲気下で、クロスヘッド速度50mm/分、チャック間距離5cmで引張弾性率及び伸びを測定した。
[Tensile modulus, elongation]
A heat treatment was performed at 80 ° C. for 30 minutes and then at 120 ° C. for 90 minutes to prepare a 70 μm thick sheet-like cured film. Tensile modulus and elongation were measured at a crosshead speed of 50 mm / min and a distance between chucks of 5 cm in an atmosphere of a temperature of 25 ° C. and a humidity of 50% RH.
〔反り〕
 25μm厚のポリイミドフィルム表面に、アプリケーターを用いて試料の変性ポリイミド樹脂組成物の塗膜を形成し、これを80℃で30分間次いで120℃で90分間加熱処理して硬化させて、10μm厚の硬化膜を形成した。このポリイミドフィルムと硬化膜との積層体を、5cm角に切り出して試験片とした。この試験片を、硬化膜を上にして、水平な台に乗せ試験片の4つの角と水平な台との隙間をノギスで測定し、各隙間の平均値を「反り」量とした。
〔warp〕
A coating film of the modified polyimide resin composition of the sample was formed on the surface of the polyimide film having a thickness of 25 μm by using an applicator, and this was cured by heat treatment at 80 ° C. for 30 minutes and then at 120 ° C. for 90 minutes to form a 10 μm thick film. A cured film was formed. A laminate of the polyimide film and the cured film was cut into a 5 cm square to obtain a test piece. The test piece was placed on a horizontal base with the cured film facing upward, and the gap between the four corners of the test piece and the horizontal base was measured with a caliper, and the average value of each gap was defined as the “warp” amount.
 以下の各例で使用した化合物、硬化剤、硬化触媒及び充てん材等について説明する。
〔テトラカルボン酸成分〕
2,3,3’,4’-ビフェニルテトラカルボン酸二無水物(宇部興産株式会社製)
〔ジアミン化合物〕
イソホロンジアミン(和光純薬株式会社製)
〔アルコール性水酸基を1個有するモノアミン化合物〕
3-アミノプロパノール(和光純薬株式会社製)
〔溶媒〕
γ―ブチロラクトン(三菱化学株式会社製)
〔ポリカーボネートジオール〕
ETERNACOLL UH-200(宇部興産株式会社製、平均分子量1997)
〔反応性極性基含有ジオール〕
2,2-ビス(ヒドロキシメチル)プロピオン酸(東京化成株式会社製)
〔ジイソシアネート化合物〕
4,4’-ジフェニルメタンジイソシアネート(日本ポリウレタン工業株式会社製)
〔グアナミン樹脂〕
マイコート136 (日本サイテックインダストリーズ株式会社製、メチルエーテルとブチルエーテルとの混合エーテル化ベンゾグアナミン樹脂、イミノ基型)
〔メラミン樹脂〕
サイメル211 (日本サイテックインダストリーズ株式会社製、メチルエーテルとブチルエーテルとの混合エーテル化メラミン樹脂、イミノ基型)
サイメル236 (日本サイテックインダストリーズ株式会社製、メチルエーテルとブチルエーテルとの混合エーテル化メラミン樹脂、完全アルキル化型)
〔エポキシ化合物〕
セロキサイト2021P (ダイセル化学工業株式会社製)
〔ジイソシアネート化合物〕
タケネートB-830 (三井化学ポリウレタン株式会社製、トリレンジイソシアネートブロック化体)
〔フェノール性水酸基を2個以上有する化合物(フェノール樹脂)〕
H-1(明和化成株式会社、フェノールノボラック)
〔微粉状シリカ〕
アエロジルR972(日本アエロジル社製 比表面積(BET法):110m/g)
アエロジル#50(日本アエロジル社製 平均粒径30nm)
サイロホービック100(富士シリシア化学社製 疎水性シリカゲル)
〔硫酸バリウム〕
BARIFINE B-30:(堺化学工業株式会社製、平均粒子径0.3μm)
〔硬化触媒〕
キュアゾール2E4MZ(四国化成工業株式会社製、2-エチル-4-メチルイミダゾール)
ジアザビシクロウンデセン(DBU:アルドリッチ社製)
〔消泡剤〕
ディスパロンOX-881(楠本化成社製)
〔アクリル樹脂ビーズ〕
アートパールJ4PY (根上工業株式会社製、 平均粒径2.2μm)
アートパールJ7PY (根上工業株式会社製、 平均粒径6.6μm)
〔ウレタン樹脂ビーズ〕
アートパールC-800 (根上工業株式会社製、 平均粒径6.6μm)
アートパールJB-1000T (根上工業株式会社製、 平均粒径3.5μm)
〔アミノ樹脂ビーズ〕
エポスターM05 (日本触媒株式会社製、 4~6μm)
〔界面活性剤〕
LF-1983 (楠本化成株式会社製)
The compounds, curing agents, curing catalysts and fillers used in the following examples will be described.
[Tetracarboxylic acid component]
2,3,3 ′, 4′-biphenyltetracarboxylic dianhydride (manufactured by Ube Industries, Ltd.)
[Diamine compound]
Isophoronediamine (manufactured by Wako Pure Chemical Industries, Ltd.)
[Monoamine compound having one alcoholic hydroxyl group]
3-Aminopropanol (Wako Pure Chemical Industries, Ltd.)
〔solvent〕
γ-Butyrolactone (Mitsubishi Chemical Corporation)
[Polycarbonate diol]
ETERNACOLL UH-200 (Ube Industries, Ltd., average molecular weight 1997)
(Reactive polar group-containing diol)
2,2-bis (hydroxymethyl) propionic acid (manufactured by Tokyo Chemical Industry Co., Ltd.)
[Diisocyanate compound]
4,4'-Diphenylmethane diisocyanate (Nippon Polyurethane Industry Co., Ltd.)
[Guanamine resin]
Mycoat 136 (Nippon Cytec Industries, Ltd., mixed etherified benzoguanamine resin of methyl ether and butyl ether, imino group type)
[Melamine resin]
Cymel 211 (Nippon Cytec Industries, Ltd., mixed etherified melamine resin of methyl ether and butyl ether, imino group type)
Cymel 236 (manufactured by Nippon Cytec Industries, Ltd., mixed etherified melamine resin of methyl ether and butyl ether, fully alkylated type)
[Epoxy compound]
Celoxite 2021P (manufactured by Daicel Chemical Industries, Ltd.)
[Diisocyanate compound]
Takenate B-830 (Mitsui Chemicals Polyurethanes, Tolylene Diisocyanate blocked)
[Compounds having two or more phenolic hydroxyl groups (phenolic resin)]
H-1 (Maywa Kasei Co., Ltd., phenol novolak)
[Fine powder silica]
Aerosil R972 (Nippon Aerosil Co., Ltd., specific surface area (BET method): 110 m 2 / g)
Aerosil # 50 (Nippon Aerosil Co., Ltd. average particle size 30 nm)
Silo Hovic 100 (Fuji Silysia Chemical Hydrophobic Silica Gel)
[Barium sulfate]
BARIFINE B-30: (manufactured by Sakai Chemical Industry Co., Ltd., average particle size: 0.3 μm)
[Curing catalyst]
Curesol 2E4MZ (manufactured by Shikoku Chemicals Co., Ltd., 2-ethyl-4-methylimidazole)
Diazabicycloundecene (DBU: Aldrich)
[Defoamer]
Disparon OX-881 (manufactured by Enomoto Kasei)
[Acrylic resin beads]
Art Pearl J4PY (Negami Kogyo Co., Ltd., average particle size 2.2μm)
Art Pearl J7PY (Negami Kogyo Co., Ltd., average particle size 6.6μm)
[Urethane resin beads]
Art Pearl C-800 (Negami Kogyo Co., Ltd., average particle size 6.6μm)
Art Pearl JB-1000T (Negami Kogyo Co., Ltd., average particle size 3.5μm)
[Amino resin beads]
D poster M05 (Nippon Shokubai Co., Ltd., 4-6μm)
[Surfactant]
LF-1983 (Made by Enomoto Kasei Co., Ltd.)
〔参考例1〕
 アルコール性水酸基末端イミドオリゴマー溶液の製造方法
 攪拌機、窒素導入管、ディーンスタークレシバーを備えた容量5リットルのガラス製セパラブルフラスコに、2,3,3’,4’-ビフェニルテトラカルボン酸二無水物1471g(5モル)、エタノール507g(11モル)及びγ-ブチロラクトン2092gを仕込み、窒素雰囲気下、90℃で1時間撹拌した。次いで、3-アミノプロパノール376g(5モル)、イソホロンジアミン426g(2.5モル)を仕込み、窒素雰囲気下、120℃で2時間、180℃2時間加熱し、イミド化反応により生じた水を反応液中に窒素を吹き込むことで除去した。このアルコール性水酸基末端イミドオリゴマー溶液は、固形分51.6%であった。
[Reference Example 1]
Method for producing alcoholic hydroxyl-terminated imide oligomer solution 2,5,3 ', 4'-biphenyltetracarboxylic dianhydride was added to a 5 liter glass separable flask equipped with a stirrer, a nitrogen inlet tube, and a Dean-Star cleaver. 1471 g (5 mol), ethanol 507 g (11 mol) and γ-butyrolactone 2092 g were charged and stirred at 90 ° C. for 1 hour in a nitrogen atmosphere. Next, 376 g (5 mol) of 3-aminopropanol and 426 g (2.5 mol) of isophoronediamine were charged and heated in a nitrogen atmosphere at 120 ° C. for 2 hours and 180 ° C. for 2 hours to react with water generated by the imidization reaction. It was removed by blowing nitrogen into the liquid. This alcoholic hydroxyl group-terminated imide oligomer solution had a solid content of 51.6%.
〔参考例2〕
 変性ポリイミド樹脂溶液の製造方法
 攪拌機、窒素導入管を備えた容量5リットルのガラス製セパラブルフラスコに、ETERNACOLL UH-200 1198.20g(0.60モル)、参考例1で合成したアルコール性水酸基末端イミドオリゴマー溶液 974.13g、2,2-ビス(4-ヒドロキシメチル)プロピオン酸 80.48g(0.60モル)及びγ-ブチロラクトン2228.90gを仕込み、窒素雰囲気下、50℃で1時間撹拌した。次いで、4,4’-ジフェニルメタンジイソシアネート 429.00g(1.71モル)を加え、60℃で3時間、80℃で10時間撹拌した。得られた変性ポリイミド樹脂溶液は、ポリマ-固形分濃度45.7重量%、粘度389Pa・sの溶液であった。
[Reference Example 2]
Method for Producing Modified Polyimide Resin Solution In a 5 liter glass separable flask equipped with a stirrer and a nitrogen inlet tube, ETERNACOLL UH-200 1198.20 g (0.60 mol), the alcoholic hydroxyl group terminal synthesized in Reference Example 1 974.13 g of an imide oligomer solution, 80.48 g (0.60 mol) of 2,2-bis (4-hydroxymethyl) propionic acid and 2228.90 g of γ-butyrolactone were charged and stirred at 50 ° C. for 1 hour in a nitrogen atmosphere. . Subsequently, 429.00 g (1.71 mol) of 4,4′-diphenylmethane diisocyanate was added, and the mixture was stirred at 60 ° C. for 3 hours and at 80 ° C. for 10 hours. The resulting modified polyimide resin solution was a solution having a polymer solid content concentration of 45.7% by weight and a viscosity of 389 Pa · s.
〔実施例A-1〕
 ガラス製容器に、参考例2で得た変性ポリイミド樹脂溶液に、変性ポリイミド樹脂100質量部に対して、グアナミン樹脂のマイコート136(M136)を20質量部、エポキシ樹脂のセロキサイト2021Pを4.1質量部、フェノール樹脂のH-1を2.5質量部、及びアミン系硬化触媒の2E4MZを0.5質量部、ジアザビシクロウンデセンを0.5質量部、更にアエロジルR972を7質量部、サイロホービック100を5質量部、消泡剤のOX881を7.5質量部加え、攪拌・混練して、均一に混合された変性ポリイミド樹脂組成物を得た。また、この変性ポリイミド樹脂組成物の硬化膜について、タック性、鉛筆硬度、ゲル分率、反りについて評価した。それらの結果を表1に示す。
[Example A-1]
In the modified polyimide resin solution obtained in Reference Example 2, in a glass container, 20 parts by mass of guanamine resin Mycoat 136 (M136) and 4.1 parts of epoxy resin ceroxide 2021P with respect to 100 parts by mass of the modified polyimide resin. Parts by weight, 2.5 parts by weight of phenolic resin H-1 and 0.5 parts by weight of amine-based curing catalyst 2E4MZ, 0.5 parts by weight of diazabicycloundecene, and further 7 parts by weight of Aerosil R972, 5 parts by mass of Silo Hovic 100 and 7.5 parts by mass of OX881 as an antifoaming agent were added, and the mixture was stirred and kneaded to obtain a uniformly mixed modified polyimide resin composition. Moreover, about the cured film of this modified polyimide resin composition, tack property, pencil hardness, gel fraction, and curvature were evaluated. The results are shown in Table 1.
〔実施例A-2〕
 グアナミン樹脂のマイコート136(M136)を5質量部に変更し、充てん材としてアエロジル#50を25質量部及び硫酸バリウムB54を30重量部を用いたこと以外は実施例A-1と同様にして変性ポリイミド樹脂組成物を得た。この変性ポリイミド樹脂組成物について、実施例A-1と同様にして評価した。それらの結果を表1に示す。
Example A-2
The same procedure as in Example A-1 except that Mycoat 136 (M136) of guanamine resin was changed to 5 parts by weight, and 25 parts by weight of Aerosil # 50 and 30 parts by weight of barium sulfate B54 were used as the filler. A modified polyimide resin composition was obtained. This modified polyimide resin composition was evaluated in the same manner as in Example A-1. The results are shown in Table 1.
〔比較例A-1〕
 硬化成分のグアナミン樹脂の代わりに、ジイソシアネート化合物であるB830を4.5質量部用いたこと以外は実施例A-1と同様にして変性ポリイミド樹脂組成物を得た。この変性ポリイミド樹脂組成物について、実施例A-1と同様にして評価した。それらの結果を表1に示す。
[Comparative Example A-1]
A modified polyimide resin composition was obtained in the same manner as in Example A-1, except that 4.5 parts by mass of B830, which is a diisocyanate compound, was used instead of the guanamine resin as a curing component. This modified polyimide resin composition was evaluated in the same manner as in Example A-1. The results are shown in Table 1.
〔比較例A-2〕
 硬化成分のグアナミン樹脂の代わりに、メラミン樹脂のサイメル211(C211)を20質量部用いたこと以外は実施例A-1と同様にして変性ポリイミド樹脂組成物を得た。この変性ポリイミド樹脂組成物について、実施例A-1と同様にして評価した。それらの結果を表1に示す。
[Comparative Example A-2]
A modified polyimide resin composition was obtained in the same manner as in Example A-1, except that 20 parts by mass of melamine resin Cymel 211 (C211) was used instead of the curable guanamine resin. This modified polyimide resin composition was evaluated in the same manner as in Example A-1. The results are shown in Table 1.
〔比較例A-3〕
 硬化成分のグアナミン樹脂の代わりに、メラミン樹脂のサイメル236(C236)を20質量部用いたこと以外は実施例A-1と同様にして変性ポリイミド樹脂組成物を得た。この変性ポリイミド樹脂組成物について、実施例A-1と同様にして評価した。それらの結果を表1に示す。
[Comparative Example A-3]
A modified polyimide resin composition was obtained in the same manner as in Example A-1, except that 20 parts by mass of melamine resin Cymel 236 (C236) was used instead of the curable guanamine resin. This modified polyimide resin composition was evaluated in the same manner as in Example A-1. The results are shown in Table 1.
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
〔実施例B-1〕
 ガラス製容器に、参考例2で得た変性ポリイミド樹脂溶液に、変性ポリイミド樹脂100質量部に対してエポキシ樹脂のセロキサイト2021Pを3.5質量部、アミノ樹脂(グアナミン樹脂)M136を10質量部、フェノール樹脂H-1を2.5質量部及びアミン系硬化触媒の2E4MZを0.5質量部、ジアザビシクロウンデセンを0.5質量部、更にアエロジルR972を7質量部、アクリル樹脂ビーズ(アートパールJ4PY)を15質量部、界面活性剤としてLF-1983を7.5質量部を加え、攪拌・混練して、均一に混合された変性ポリイミド樹脂組成物を得た。また、この変性ポリイミド樹脂組成物の硬化膜について、引張弾性率、折り曲げ性、基板反り量、鉛筆硬度、について評価した。それらの結果を表2に示す。
[Example B-1]
In a glass container, in the modified polyimide resin solution obtained in Reference Example 2, 3.5 parts by mass of epoxy resin ceroxide 2021P with respect to 100 parts by mass of modified polyimide resin, 10 parts by mass of amino resin (guanamine resin) M136, 2.5 parts by mass of phenol resin H-1 and 0.5 parts by mass of amine-based curing catalyst 2E4MZ, 0.5 parts by mass of diazabicycloundecene, 7 parts by mass of Aerosil R972, acrylic resin beads (Art 15 parts by mass of Pearl J4PY) and 7.5 parts by mass of LF-1983 as a surfactant were added, and the mixture was stirred and kneaded to obtain a uniformly mixed modified polyimide resin composition. Moreover, about the cured film of this modified polyimide resin composition, tensile elasticity modulus, bendability, board | substrate curvature amount, and pencil hardness were evaluated. The results are shown in Table 2.
〔実施例B-2〕
 アクリル樹脂ビーズ(アートパールJ4PY)を15質量部から20質量部に変更したこと以外は実施例B-1と同様にして変性ポリイミド樹脂組成物を得た。この変性ポリイミド樹脂組成物について、実施例B-1と同様にして評価した。それらの結果を表2に示す。
[Example B-2]
A modified polyimide resin composition was obtained in the same manner as in Example B-1, except that the acrylic resin beads (Art Pearl J4PY) were changed from 15 parts by mass to 20 parts by mass. This modified polyimide resin composition was evaluated in the same manner as in Example B-1. The results are shown in Table 2.
〔実施例B-3〕
 アクリル樹脂ビーズ(アートパールJ4PY)を15質量部から30質量部に変更したこと以外は実施例B-1と同様にして変性ポリイミド樹脂組成物を得た。この変性ポリイミド樹脂組成物について、実施例B-1と同様にして評価した。それらの結果を表2に示す。
Example B-3
A modified polyimide resin composition was obtained in the same manner as in Example B-1, except that the acrylic resin beads (Art Pearl J4PY) were changed from 15 parts by mass to 30 parts by mass. This modified polyimide resin composition was evaluated in the same manner as in Example B-1. The results are shown in Table 2.
〔実施例B-4〕
 アクリル樹脂ビーズ(アートパールJ4PY)を15質量部から50質量部に変更したこと以外は実施例B-1と同様にして変性ポリイミド樹脂組成物を得た。この変性ポリイミド樹脂組成物について、実施例B-1と同様にして評価した。それらの結果を表2に示す。
[Example B-4]
A modified polyimide resin composition was obtained in the same manner as in Example B-1, except that the acrylic resin beads (Art Pearl J4PY) were changed from 15 parts by mass to 50 parts by mass. This modified polyimide resin composition was evaluated in the same manner as in Example B-1. The results are shown in Table 2.
〔実施例B-5〕
 アクリル樹脂ビーズ(アートパールJ4PY)をアクリル樹脂ビーズ(アートパールJ7PY)に変更したこと以外は実施例B-2と同様にして変性ポリイミド樹脂組成物を得た。この変性ポリイミド樹脂組成物について、実施例B-1と同様にして評価した。それらの結果を表2に示す。
[Example B-5]
A modified polyimide resin composition was obtained in the same manner as in Example B-2 except that the acrylic resin beads (Art Pearl J4PY) were changed to acrylic resin beads (Art Pearl J7PY). This modified polyimide resin composition was evaluated in the same manner as in Example B-1. The results are shown in Table 2.
〔比較例B-1〕
 アクリル樹脂ビーズ(アートパールJ4PY)をアミノ樹脂ビーズ(エポスターM05)に変更したこと以外は実施例B-2と同様にして変性ポリイミド樹脂組成物を得た。この変性ポリイミド樹脂組成物について、実施例B-1と同様にして評価した。それらの結果を表2に示す。
[Comparative Example B-1]
A modified polyimide resin composition was obtained in the same manner as in Example B-2 except that the acrylic resin beads (Art Pearl J4PY) were changed to amino resin beads (Eposter M05). This modified polyimide resin composition was evaluated in the same manner as in Example B-1. The results are shown in Table 2.
〔比較例B-2〕
 アクリル樹脂ビーズ(アートパールJ4PY)をウレタン樹脂ビーズ(アートパールJB-1000T)に変更したこと以外は実施例B-2と同様にして変性ポリイミド樹脂組成物を得た。この変性ポリイミド樹脂組成物について、実施例B-1と同様にして評価した。それらの結果を表2に示す。
[Comparative Example B-2]
A modified polyimide resin composition was obtained in the same manner as in Example B-2 except that the acrylic resin beads (Art Pearl J4PY) were changed to urethane resin beads (Art Pearl JB-1000T). This modified polyimide resin composition was evaluated in the same manner as in Example B-1. The results are shown in Table 2.
〔比較例B-3〕
 アクリル樹脂ビーズ(アートパールJ4PY)をウレタン樹脂ビーズ(アートパールC-800)に変更したこと以外は実施例B-2と同様にして変性ポリイミド樹脂組成物を得た。この変性ポリイミド樹脂組成物について、実施例B-1と同様にして評価した。それらの結果を表2に示す。
[Comparative Example B-3]
A modified polyimide resin composition was obtained in the same manner as in Example B-2 except that the acrylic resin beads (Art Pearl J4PY) were changed to urethane resin beads (Art Pearl C-800). This modified polyimide resin composition was evaluated in the same manner as in Example B-1. The results are shown in Table 2.
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003
 本発明によって、ポリブタジエンセグメント或いはポリカーボネートセグメントからなるソフトセグメントを導入した変性ポリイミド樹脂を含んで構成された変性ポリイミド樹脂組成物において、加熱処理して得られる硬化膜の表面硬度、タック性、及び反りが改良された変性ポリイミド樹脂組成物を提供することができる。この変性ポリイミド樹脂組成物を加熱処理して得られる硬化膜は、電気絶縁性、耐熱性、柔軟性などが優れると共に、特に表面硬度、タック性及び反りが改良されたものであるから、柔軟性配線板用の絶縁膜として好適に用いることができる。 According to the present invention, in a modified polyimide resin composition comprising a modified polyimide resin introduced with a soft segment comprising a polybutadiene segment or a polycarbonate segment, the surface hardness, tackiness, and warpage of the cured film obtained by heat treatment are reduced. An improved modified polyimide resin composition can be provided. The cured film obtained by heat-treating this modified polyimide resin composition is excellent in electrical insulation, heat resistance, flexibility and the like, and particularly has improved surface hardness, tackiness and warpage. It can be suitably used as an insulating film for a wiring board.
 本発明の一つの態様によって、ポリブタジエンセグメント或いはポリカーボネートセグメントからなるソフトセグメントを導入した変性ポリイミド樹脂を含んで構成された変性ポリイミド樹脂溶液組成物において、加熱処理して得られる硬化膜の表面硬度及び耐折れ性を改良することができる変性ポリイミド樹脂溶液組成物を提供することができる。この変性ポリイミド樹脂溶液組成物を加熱処理して得られる硬化膜は、電気絶縁性、耐熱性、柔軟性などが優れると共に、特に表面硬度及び耐折れ性が改良されたものであり、柔軟性配線板用の絶縁膜として好適に用いることができる。 According to one embodiment of the present invention, in a modified polyimide resin solution composition comprising a modified polyimide resin into which a soft segment comprising a polybutadiene segment or a polycarbonate segment is introduced, the surface hardness and resistance of a cured film obtained by heat treatment are obtained. A modified polyimide resin solution composition capable of improving the foldability can be provided. The cured film obtained by heat-treating this modified polyimide resin solution composition is excellent in electrical insulation, heat resistance, flexibility and the like, and in particular, has improved surface hardness and fold resistance. It can be suitably used as an insulating film for a plate.

Claims (10)

  1.  ポリブタジエンセグメント又はポリカーボネートセグメントからなるソフトセグメントが導入された変性ポリイミド樹脂と、グアナミン樹脂とを含有することを特徴とする変性ポリイミド樹脂組成物。 A modified polyimide resin composition comprising a modified polyimide resin into which a soft segment composed of a polybutadiene segment or a polycarbonate segment is introduced, and a guanamine resin.
  2.  さらに、エポキシ樹脂を含有することを特徴とする請求項1に記載の変性ポリイミド樹脂組成物。 The modified polyimide resin composition according to claim 1, further comprising an epoxy resin.
  3.  変性ポリイミド樹脂100質量部に対して、グアナミン樹脂を1~60質量部含有することを特徴とする請求項1または2に記載の変性ポリイミド樹脂組成物。 The modified polyimide resin composition according to claim 1 or 2, wherein the modified polyimide resin composition contains 1 to 60 parts by mass of a guanamine resin with respect to 100 parts by mass of the modified polyimide resin.
  4.  グアナミン樹脂がベンゾグアナミンとホルムアルデヒドとの縮合物であることを特徴とする請求項1~3のいずれかに記載の変性ポリイミド樹脂組成物。 The modified polyimide resin composition according to any one of claims 1 to 3, wherein the guanamine resin is a condensate of benzoguanamine and formaldehyde.
  5.  アクリル樹脂ビーズをさらに含有することを特徴とする請求項1~4のいずれかに記載の変性ポリイミド樹脂組成物。 The modified polyimide resin composition according to any one of claims 1 to 4, further comprising acrylic resin beads.
  6.  変性ポリイミド樹脂100質量部に対してアクリル樹脂ビーズを10~80質量部の割合で含有したことを特徴とする請求項5に記載の変性ポリイミド樹脂組成物。 6. The modified polyimide resin composition according to claim 5, wherein acrylic resin beads are contained at a ratio of 10 to 80 parts by mass with respect to 100 parts by mass of the modified polyimide resin.
  7.  アクリル樹脂ビーズの平均粒子径が10μm以下であることを特徴とする請求項5または6に記載の変性ポリイミド樹脂組成物。 The modified polyimide resin composition according to claim 5 or 6, wherein the acrylic resin beads have an average particle size of 10 µm or less.
  8.  有機溶媒を含有すること特徴とする請求項1~7のいずれかに記載の変性ポリイミド樹脂組成物。 The modified polyimide resin composition according to any one of claims 1 to 7, further comprising an organic solvent.
  9.  請求項1~8のいずれかの変性ポリイミド樹脂組成物を加熱処理して得られたことを特徴とする硬化膜。 A cured film obtained by heat-treating the modified polyimide resin composition according to any one of claims 1 to 8.
  10.  柔軟性配線板の絶縁膜である請求項9に記載の硬化膜。 10. The cured film according to claim 9, which is an insulating film of a flexible wiring board.
PCT/JP2009/070825 2008-12-15 2009-12-14 Thermosetting modified polyamide resin composition WO2010071107A1 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2008318588 2008-12-15
JP2008-318589 2008-12-15
JP2008318589A JP5621190B2 (en) 2008-12-15 2008-12-15 Modified polyimide resin composition
JP2008-318588 2008-12-15

Publications (1)

Publication Number Publication Date
WO2010071107A1 true WO2010071107A1 (en) 2010-06-24

Family

ID=42268777

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2009/070825 WO2010071107A1 (en) 2008-12-15 2009-12-14 Thermosetting modified polyamide resin composition

Country Status (2)

Country Link
TW (1) TW201030061A (en)
WO (1) WO2010071107A1 (en)

Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0337283A (en) * 1989-07-03 1991-02-18 Hitachi Chem Co Ltd Heat-resistant coating material and copper sheet coated therewith
JPH11199669A (en) * 1998-01-14 1999-07-27 Ajinomoto Co Inc Modified polyimide resin and thermoset resin composition containing the same
JP2001302795A (en) * 2000-04-25 2001-10-31 Hitachi Chem Co Ltd Polyamide-imide resin composition and coating film forming material
JP2002526618A (en) * 1998-10-06 2002-08-20 ヘンケル・テロソン・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング Impact resistant epoxy resin composition
JP2003165905A (en) * 2001-11-29 2003-06-10 Du Pont Toray Co Ltd Aromatic polyimide film, manufacturing method therefor, and use thereof
JP2006104462A (en) * 2004-09-10 2006-04-20 Ube Ind Ltd Modified polyimide resin including polybutadiene, its composition and cured insulating film
JP2006117848A (en) * 2004-10-22 2006-05-11 Kaneka Corp Thermosetting resin composition and its use
WO2006118105A1 (en) * 2005-04-28 2006-11-09 Ni Material Co., Ltd. Thermosetting resin composition
JP2006307183A (en) * 2005-03-28 2006-11-09 Ube Ind Ltd Modified polyimide resin containing polycarbonate, its composition and cured insulation film
JP2007224242A (en) * 2006-02-27 2007-09-06 Tamura Kaken Co Ltd Thermosetting resin composition, resin film in b stage and multilayer build-up base plate
JP2008066735A (en) * 2007-09-10 2008-03-21 Hitachi Chem Co Ltd Method for forming protective film of flexible wiring board
JP2008297388A (en) * 2007-05-30 2008-12-11 Toyobo Co Ltd Modified polyimide resin composition, paste containing the composition and electronic part manufactured by using the paste

Patent Citations (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0337283A (en) * 1989-07-03 1991-02-18 Hitachi Chem Co Ltd Heat-resistant coating material and copper sheet coated therewith
JPH11199669A (en) * 1998-01-14 1999-07-27 Ajinomoto Co Inc Modified polyimide resin and thermoset resin composition containing the same
JP2002526618A (en) * 1998-10-06 2002-08-20 ヘンケル・テロソン・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング Impact resistant epoxy resin composition
JP2001302795A (en) * 2000-04-25 2001-10-31 Hitachi Chem Co Ltd Polyamide-imide resin composition and coating film forming material
JP2003165905A (en) * 2001-11-29 2003-06-10 Du Pont Toray Co Ltd Aromatic polyimide film, manufacturing method therefor, and use thereof
JP2006104462A (en) * 2004-09-10 2006-04-20 Ube Ind Ltd Modified polyimide resin including polybutadiene, its composition and cured insulating film
JP2006117848A (en) * 2004-10-22 2006-05-11 Kaneka Corp Thermosetting resin composition and its use
JP2006307183A (en) * 2005-03-28 2006-11-09 Ube Ind Ltd Modified polyimide resin containing polycarbonate, its composition and cured insulation film
WO2006118105A1 (en) * 2005-04-28 2006-11-09 Ni Material Co., Ltd. Thermosetting resin composition
JP2007224242A (en) * 2006-02-27 2007-09-06 Tamura Kaken Co Ltd Thermosetting resin composition, resin film in b stage and multilayer build-up base plate
JP2008297388A (en) * 2007-05-30 2008-12-11 Toyobo Co Ltd Modified polyimide resin composition, paste containing the composition and electronic part manufactured by using the paste
JP2008066735A (en) * 2007-09-10 2008-03-21 Hitachi Chem Co Ltd Method for forming protective film of flexible wiring board

Also Published As

Publication number Publication date
TW201030061A (en) 2010-08-16

Similar Documents

Publication Publication Date Title
JP5321560B2 (en) Modified polyimide resin containing polybutadiene, composition thereof and cured insulating film
JP5135698B2 (en) Modified polyimide resin containing polycarbonate, composition thereof and cured insulating film
JP4650176B2 (en) Modified polyimide resin containing polybutadiene, composition thereof and cured insulating film
JP4701914B2 (en) Flexible wiring board for tape carrier package with improved flame resistance
JP4238452B2 (en) Composition for polyimide insulating film, insulating film and method for forming insulating film
JP4211569B2 (en) Composition for polyimide siloxane insulating film, insulating film, and method for forming insulating film
WO2011004756A1 (en) Thermosetting composition for protective film for wiring board
JPWO2005080505A1 (en) Polyimide siloxane solution composition
JP4107215B2 (en) Composition for polysiloxane insulating film, insulating film, and method for forming insulating film
JP2002012664A (en) Method for producing polyimide polymer, composition for polyimide-based insulation film
JP5017894B2 (en) Modified polyimide resin composition
JP5659783B2 (en) Method for mounting flexible wiring board and polyimidesiloxane resin composition
JP5578192B2 (en) Modified polyimide resin composition
JP4218282B2 (en) Composition for polyimidesiloxane insulating film, insulating film, and method for forming insulating film
JP5621190B2 (en) Modified polyimide resin composition
JP5428823B2 (en) Thermosetting modified polyimide resin composition
JP5354443B2 (en) Polyimide ink composition, protective film, and flexible printed wiring board
JP4654721B2 (en) Polyimide siloxane composition
JP4915400B2 (en) Electronic component mounting method
WO2010071107A1 (en) Thermosetting modified polyamide resin composition
JP5167834B2 (en) Electronic component mounting method
JP2006156452A (en) Flexible wiring board for tape carrier package with improved burning resistance

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 09833410

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 09833410

Country of ref document: EP

Kind code of ref document: A1