WO2010064449A1 - Lighting device, exposure device, and device manufacturing method - Google Patents

Abstract

The lighting device is equipped with a light source unit that emits illuminating light from a light emitting part disposed at a first height relative to a reference plane; a first optical system that has a light incidence part which is disposed at a second height lower than the first height relative to the reference plane, and that illuminates an object with the illuminating light that enters the light incidence part; and a second optical system that has an optical axis which is tilted relative to the reference plane at a height between the first height and the second height and that guides the illuminating light emitted from the light emitting part to the light incidence part.

Description

Illumination apparatus, exposure apparatus, and device manufacturing method

The present invention relates to an illumination apparatus, an exposure apparatus, and a device manufacturing method.
This application claims priority based on Japanese Patent Application No. 2008-309921 for which it applied on December 4, 2008, and uses the content here.

For example, an exposure apparatus used in a manufacturing process of an electronic device such as a flat panel display has an illumination device that illuminates a mask with exposure light, and exposes the substrate with exposure light through the mask. The following patent document discloses an example of a technique related to a lighting device.

JP 05-0456605 A JP 07-135149 A

The lighting device is desirably small. When the lighting device is increased in size, for example, the device cost may increase, or the space occupied by the lighting device may increase and the facility cost may increase. Further, when the lighting device is enlarged, it may be difficult to smoothly perform the maintenance work of the lighting device, for example.

An object of an aspect of the present invention is to provide an illumination apparatus, an exposure apparatus, and a device manufacturing method that can suppress an increase in size.

According to the first aspect of the present invention, there is provided a lighting device that illuminates an object, a light source device that emits illumination light from an emission unit disposed at a first height with respect to a reference surface, and the reference surface. A first optical system having an incident portion disposed at a second height lower than the first height and irradiating the object with the illumination light incident on the incident portion, the first height, and the first height And a second optical system that has an optical axis that is inclined with respect to the reference plane between two heights and guides the illumination light emitted from the emission unit to the incident unit. .

According to the second aspect of the present invention, there is provided an illumination device that illuminates an object, the light source device that emits illumination light, and a plurality of incident portions, and the illumination light incident on the plurality of incident portions. A first optical system that irradiates the object, a plurality of second light sources arranged to correspond to each of the plurality of light source devices and the incident portion, and a plurality of second light beams that guide the illumination light emitted from the light source device to the incident portion. There is provided an illuminating device including an optical system, wherein the plurality of incident portions are arranged radially with respect to an axis intersecting an installation surface on which the first optical system is provided.

According to a third aspect of the present invention, there is provided an illumination device that illuminates an object, a light source device that emits illumination light, a first optical system that receives the illumination light and irradiates the object, and the light source Provided is an illumination device comprising: a second optical system that guides the illumination light emitted from the device to the first optical system; and a moving mechanism that supports and moves at least a part of the first optical system. .

According to the fourth aspect of the present invention, the first support mechanism that supports the pattern holding member on which the pattern is formed, the second support mechanism that supports the photosensitive substrate, the pattern holding member is illuminated, and the pattern is And an illumination device according to any one of the first, second, and third aspects for exposing the photosensitive substrate through the exposure apparatus.

According to the fifth aspect of the present invention, using the exposure apparatus according to the fourth aspect, the pattern is transferred to the photosensitive substrate, the photosensitive substrate to which the pattern is transferred is developed, and the pattern is developed. There is provided a device manufacturing method including forming a transfer pattern layer having a corresponding shape on the photosensitive substrate and processing the photosensitive substrate through the transfer pattern layer.

According to the aspect of the present invention, there are provided an illumination apparatus, an exposure apparatus, and a device manufacturing method capable of suppressing an increase in size.

It is a figure which shows the external appearance of the exposure apparatus which concerns on this embodiment. It is a block diagram which shows the outline of the exposure apparatus which concerns on this embodiment. It is a front view which shows the outline of the exposure apparatus which concerns on this embodiment. It is the figure which looked at the illuminating device which concerns on this embodiment from the upper direction. It is a block diagram which shows the outline of the illuminating device which concerns on this embodiment. It is a block diagram which shows the outline of the illuminating device which concerns on this embodiment. It is the figure which looked at the 1st optical system concerning this embodiment, and a part of body from the + Y side. It is the figure which looked at the 1st optical system concerning this embodiment, and a part of body from the + Z side. It is a figure which shows an example of operation | movement of the 1st optical system which concerns on this embodiment. It is a figure which shows an example of operation | movement of the 1st optical system which concerns on this embodiment. It is a flowchart for demonstrating an example of the manufacturing process of a device.

Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each part will be described with reference to this XYZ orthogonal coordinate system. A predetermined direction in the horizontal plane is defined as an X-axis direction, a direction orthogonal to the X-axis direction in the horizontal plane is defined as a Y-axis direction, and a direction orthogonal to each of the X-axis direction and the Y-axis direction (that is, a vertical direction) is defined as a Z-axis direction. Further, the rotation (inclination) directions around the X axis, Y axis, and Z axis are the θX, θY, and θZ directions, respectively.

FIG. 1 is a perspective view showing an external appearance of an exposure apparatus EX according to the present embodiment, FIG. 2 is a perspective view showing an outline of the exposure apparatus EX, and FIG. 3 is a front view. 1, 2, and 3, the exposure apparatus EX includes a mask stage 1 that can move while supporting the mask M, a substrate stage 2 that can move while supporting the substrate P, and the exposure light EL. An illumination apparatus IS for illuminating with the above, a projection system PS for projecting an image of the pattern of the mask M illuminated with the exposure light EL onto the substrate P, a chamber apparatus 3 for accommodating at least the projection system PS, and at least supporting the projection system PS. And a control device 5 that controls the overall operation of the exposure apparatus EX.

The mask M includes a reticle on which a device pattern projected onto the substrate P is formed, and has a light transmissive plate such as a glass plate and a light shielding pattern formed on the plate with a light shielding material such as chrome. . The pattern formed on the light-transmitting plate is not limited to the light-shielding pattern, and may be at least one of a phase pattern and a dimming pattern. In this embodiment, a transmissive mask is used as the mask M, but a reflective mask may be used.

The substrate P includes a photosensitive substrate for manufacturing a device, and has, for example, a base material such as a glass plate and a photosensitive film formed on the base material. The photosensitive film is a film of a photosensitive material applied to a substrate.

The chamber device 3 forms a substantially closed internal space 3K. The chamber device 3 controls the environment (temperature, humidity, cleanliness, pressure, etc.) of the internal space. The body 4 is disposed in the internal space 3K.

The body 4 includes, for example, a base plate 7 disposed on a support surface (for example, floor surface) FL in a clean room via a vibration isolator 6, a first column 8 disposed on the base plate 7, and a first column 8 And a second column 9 disposed on the surface. In the present embodiment, the body 4 supports each of the illumination device IS, the projection system PS, the mask stage 1, and the substrate stage 2.

In the present embodiment, the projection system PS has a plurality of projection optical systems PL. The illumination device IS has a plurality of illumination modules IL corresponding to the plurality of projection optical systems PL. In the present embodiment, as an example, the projection system PS has 11 projection optical systems PL, and the illumination apparatus IS has 11 illumination modules IL. Further, the exposure apparatus EX of the present embodiment projects an image of the pattern of the mask M onto the substrate P while moving the mask M and the substrate P synchronously in a predetermined scanning direction. That is, the exposure apparatus EX of the present embodiment is a so-called multi-lens scan exposure apparatus.

The illumination device IS can irradiate the exposure light EL to a predetermined illumination area. The illumination device IS illuminates each of a plurality of (11 places) illumination areas with the exposure light EL by using a plurality (11) of illumination modules IL. The illumination device IS illuminates a part of the mask M arranged in the illumination area with the exposure light EL having a uniform illuminance distribution. In the present embodiment, bright lines (g line, h line, i line) emitted from a mercury lamp are used as the exposure light EL emitted from the illumination device IS. As shown in FIGS. 1 and 3, in the present embodiment, a part of the illumination device IS is disposed on the upper surface 3 </ b> T of the chamber device 3. In the present embodiment, the upper surface 3T is substantially parallel to the XY plane.

The mask stage 1 is movable with respect to the illumination area while supporting the mask M. The mask stage 1 supports the mask M so that the lower surface (pattern formation surface) of the mask M and the XY plane are substantially parallel. The mask stage 1 is supported so as to be movable with respect to the guide surface 9G of the second column 9. The mask stage 1 is movable in three directions, that is, the X axis, the Y axis, and the θZ direction by the operation of a drive system such as a linear motor.

Projection system PS can irradiate exposure light EL to a predetermined projection area. The projection system PS projects an image of the pattern of the mask M onto each of a plurality of (11 places) different projection areas by a plurality (11 pieces) of the projection optical system PL. The projection system PS projects an image of the pattern of the mask M at a predetermined projection magnification onto a part of the substrate P arranged in the projection area. In the present embodiment, the projection system PS is supported on the support surface 8T of the first column 8.

The substrate stage 2 is movable with respect to the projection area while supporting the substrate P. The substrate stage 2 holds the substrate P so that the surface (exposure surface) of the substrate P and the XY plane are substantially parallel. The substrate stage 2 is supported so as to be movable with respect to the guide surface 7G of the base plate 7. The substrate stage 2 can be moved in six directions including an X axis, a Y axis, a Z axis, a θX, a θY, and a θZ direction by operation of a drive system such as a linear motor.

The position information of the mask stage 1 and the substrate stage 2 is measured by an interferometer system (not shown). When performing exposure processing of the substrate P or when performing predetermined measurement processing, the position control of the mask stage 1 (mask M) and the substrate stage 2 (substrate P) is performed based on the measurement result of the interferometer system. Executed.

The illumination device IS illuminates the mask M supported on the mask stage 1 with the exposure light EL, and exposes the substrate P supported on the substrate stage 2 through the pattern of the mask M. The projection system PS projects an image of the pattern of the mask M supported by the mask stage 1 onto the substrate P supported by the substrate stage 2. The illumination device IS exposes the substrate P through the projection system PS.

FIG. 4 is a view of a part of the illumination device IS according to the present embodiment as viewed from above. 1, 2, 3, and 4, the illumination device IS includes a light source device 11 that emits exposure light EL from an emission unit 10 that is disposed at a first height with respect to the upper surface 3 </ b> T of the chamber device 3. A first optical system 13 having an incident part 12 disposed at a second height lower than the first height with respect to the upper surface 3T, and irradiating the mask M with the exposure light EL incident on the incident part 12; A second optical system 14 having an optical axis AX inclined with respect to the upper surface 3T between the height and the second height and guiding the exposure light EL emitted from the emission unit 10 to the incidence unit 12 is provided.

The lighting device IS includes a plurality of light source devices 11. In the present embodiment, the illumination device IS includes five light source devices 11. The plurality of light source devices 11 each include an emission unit 10. Each of the plurality of injection units 10 is disposed at a first height with respect to the upper surface 3T. In the following description, the plurality of light source devices 11 are collectively referred to as a light source unit 11U as appropriate. The light source unit 11U emits the exposure light EL from the plurality of emission units 10 arranged at the first height with respect to the upper surface 3T.

The first optical system 13 has a plurality of incident portions 12. A plurality of (five) incident portions 12 are provided corresponding to the plurality of light source devices 11. The plurality of incident portions 12 are radially arranged with respect to the Z axis intersecting the upper surface 3T at the second height with respect to the upper surface 3T. The first optical system 13 irradiates the mask M with the exposure light EL incident on the incident portion 12.

A plurality (five) of second optical systems 14 are arranged corresponding to the plurality of emitting units 10 and the plurality of incident units 12. Each of the optical axes AX of the plurality of second optical systems 14 is inclined with respect to the upper surface 3T. In the XY plane, the plurality of second optical systems 14 are arranged along the radial direction with respect to the Z axis. Each of the plurality of second optical systems 14 guides the exposure light EL emitted from the emission unit 10 to the incident unit 12.

5 and 6 are configuration diagrams showing an outline of the illumination device IS. 5 and 6 show one light source device 11 and the second optical system 14 among the five light source devices 11 and the second optical system 14. Hereinafter, one light source device 11 and the second optical system 14 will be described. Since the other light source device 11 and the second optical system 14 have substantially the same configuration as the one light source device 11 and the second optical system 14 shown in FIGS. 5 and 6, description thereof is omitted.

As shown in FIGS. 5 and 6, the light source device 11 includes a mercury lamp 15, an elliptical mirror 16 having a reflecting surface 16 </ b> R that reflects light emitted from the mercury lamp 15, and at least one of the light from the elliptical mirror 16. And a dichroic mirror 17 that reflects the portion. The light source device 11 includes a housing (lamp house) 18 that houses a mercury lamp 15, an elliptical mirror 16, and a dichroic mirror 17. The reflecting surface 16R faces upward (+ Z direction). The emission unit 10 emits the exposure light EL from the dichroic mirror 17.

The mercury lamp 15 is held by the holding mechanism 70. The external shape of the mercury lamp 15 held by the holding mechanism 70 is long in the Z-axis direction. In the present embodiment, the elliptical mirror 16 is disposed so that the reflecting surface 16R faces upward (+ Z direction). Therefore, for example, when exchanging the mercury lamp 15 or performing maintenance work on the mercury lamp 15, the accessibility and workability to the mercury lamp 15 are good. The emission unit 10 is disposed on the upper portion of the housing 18, and is emitted from the mercury lamp 15. Injected from the unit 10.

The second optical system 14 includes a shutter device 19 capable of blocking the progress of light from the dichroic mirror 17, a relay optical system 20 including a collimating lens 20A and a condensing lens 20B on which light from the dichroic mirror 17 is incident, and a predetermined optical system. And an interference filter 21 that allows only light in the wavelength region to pass therethrough. The optical axis AX of the second optical system 14 includes the optical axis of the relay optical system 20.

As shown in FIGS. 1, 2, 4, and 6, the illumination device IS includes a housing 30 that houses the second optical system 14. A handle 31 is disposed on the upper surface of the housing 30 in the vicinity of the incident portion 12. The operator can perform maintenance work on the lighting device IS while holding the handle 31. In particular, when an operator performs work on the upper surface of the housing 30, the handle 31 is effective.

As shown in FIG. 4, in the present embodiment, the lighting device IS includes a gas supply device 80 that supplies gas to the internal space of the housing 30. The gas supply device 80 supplies a clean and temperature-adjusted gas to the internal space of the housing 30. In the present embodiment, the internal spaces of the plurality of housings 30 are connected via the flow path of the tube member 81. The gas supply device 80 supplies gas to the internal space of the housing 30 disposed on the most −Y side among the plurality (five) of housings 30. The gas supplied to the internal space of the housing 30 is supplied to the internal space of another housing 30 through the flow path of the tube member 81. Of the plurality of (five) housings 30, the gas discharged from the inner space of the housing 30 disposed on the most + Y side is returned to the gas supply device 80.

In this embodiment, the gas supply device 80 supplies chemical clean gas (air) to the internal space of the housing 30. The gas supply device 80 includes a filter device including a particle filter that removes particles, such as a HEPA filter and a ULPA filter, and a chemical filter that can remove chemical substances. The gas supply device 80 supplies chemical clean gas through the filter device to the internal space of the housing 30.

For example, when chemical substances (cloudy substances) such as ammonia gas, sulfur oxides, and organosilicon compounds are present in the internal space of the housing 30, the surface of the optical element of the second optical system 14 is contaminated (fogging occurs. )there is a possibility. According to the present embodiment, the gas supply device 80 supplies the gas in which the chemical substance is sufficiently reduced to the internal space of the housing 30, so that it is possible to suppress the deterioration of the optical characteristics of the second optical system 14. .

As shown in FIGS. 2, 3, 5, and 6, the first optical system 13 includes a first partial optical system 22 and a second partial optical system 23. The first partial optical system 22 includes an incident portion 12 where the exposure light EL from the second optical system 14 is incident, a plurality of exit ends 24 capable of emitting the exposure light EL, and a plurality of exposure light EL incident from the incident portion 12. And an optical fiber unit 25 led to each of the exit ends 24 of the optical fiber. The first partial optical system 22 includes a branching optical system that branches the exposure light EL incident from the incident unit 12 to each of the plurality of exit ends 24 and emits the light from each of the exit ends 24.

In the present embodiment, the light source device 11, the second optical system 14, and a part of the first partial optical system 22 (optical fiber unit 25) are arranged on the upper surface 3T.

In the present embodiment, since the incident part 12 is arranged at a position lower than the emission part 10 and the second optical system 14 is arranged so that the optical axis AX is inclined with respect to the upper surface 3T (XY plane), the illumination device IS. Space saving (miniaturization) can be achieved. When the incident part 12 is arranged at the same height as the emission part 10, for example, the optical fiber unit 25 may be increased in size. In the present embodiment, since the incident portion 12 is disposed at a position lower than the emission portion 10, the size can be reduced. Moreover, the usage-amount of an optical fiber can be suppressed because the optical fiber unit 25 is reduced in size. Therefore, an increase in device cost can be suppressed.

In the present embodiment, the plurality of incident portions 12 and the optical axis AX of the second optical system 14 connected to the incident portions 12 are arranged radially with respect to the Z axis. Space saving (miniaturization) can be achieved. Further, since the space between the plurality of second optical systems 14 is ensured while realizing a reduction in size of the illumination device IS, for example, maintenance work or the like of the illumination device IS by an operator can be performed smoothly. . In addition, the structures and optical path lengths of the plurality of second optical systems 14 can be matched.

The second partial optical system 23 has a plurality of illumination modules IL. A plurality of illumination modules IL are provided so as to correspond to the plurality of emission ends 24. A plurality of emission ends 24 are provided corresponding to the plurality of illumination modules IL. That is, in the present embodiment, eleven injection ends 24 are provided. The exposure light EL from the second optical system 14 enters the incident portion 12 of the first partial optical system 22 and is emitted from each of the plurality of emission ends 24. The illumination module IL irradiates the mask M with the exposure light EL emitted from the emission end 24.

FIG. 5 shows two illumination modules IL among the plurality of illumination modules IL. Hereinafter, one illumination module IL among the plurality of illumination modules IL will be described with reference to FIG. 5. The illumination module IL includes a shutter device 26 that can block the progress of the exposure light EL from the exit end 24, a collimator lens 27 to which the exposure light EL from the exit end 24 is supplied, and the exposure light EL from the collimator lens 27. A fly eye integrator 28 to be supplied and a condenser lens 29 to which exposure light EL from the fly eye integrator 28 is supplied are provided. The exposure light EL emitted from the condenser lens 29 is applied to the illumination area. The illumination module IL illuminates the illumination area with the exposure light EL having a uniform illuminance distribution.

This completes the description of one illumination module IL. The other illumination modules IL have substantially the same configuration as the one illumination module IL shown in FIG.

As shown in FIGS. 2, 3, 5, and 6, the illumination device IS includes a first housing 33 that houses an optical element of the first portion 32 of the second partial optical system 23, and an optical portion of the second portion 34. And a second housing 35 for housing the element. In the present embodiment, the first portion 32 includes a shutter device 26, a collimating lens 27, and a fly eye integrator 28 for each of the plurality of illumination modules IL. The second portion 34 includes a condenser lens 29 for each of the plurality of illumination modules IL. The first housing 33 is supported by a housing 36 that houses the first partial optical system 22. The second housing 35 is supported by the first housing 33. The second housing 35 (second portion 34) is disposed on the lower side (−Z side) of the first housing 33 (first portion 32). The second portion 34 is disposed closer to the mask stage 1 than the first portion 32.

The illumination device IS includes a moving mechanism 40 that can move while supporting at least a part of the first optical system 13. The moving mechanism 40 is movable while supporting a housing that houses the first optical system 13. In the present embodiment, the moving mechanism 40 includes a first moving mechanism 41 that can move while supporting the first partial optical system 22, and a second movement that can move while supporting at least a part of the second partial optical system 23. And a mechanism 42. The first moving mechanism 41 is movable while supporting the housing 36 that houses the first partial optical system 22. The second moving mechanism 42 is movable while supporting a second housing 35 that houses the second partial optical system 23 (second portion 34).

7 is a view of the first optical system 13 and a part of the body 4 (second column 9) as seen from the + Y side, and FIG. 8 is a view as seen from the + Z side. Hereinafter, the first moving mechanism 41 will be described.

As shown in FIGS. 3, 7, and 8, the housing 36 that houses the first partial optical system 22 has a flange 36 </ b> F. The housing 36 is supported on the upper surface 9T of the second column 9 via a flange 36F. The housing 36 supports the first housing 33. The first housing 33 supports the second housing 35.

The first moving mechanism 41 includes a first guide mechanism 43 that is disposed on the body 4 and guides the movement of the housing 36. The first guide mechanism 43 is disposed on the upper surface 9T of the second column 9, and has a guide member 43G that is long in the Y-axis direction. The guide member 43G includes a convex portion protruding in the + Z direction from the upper surface 9T. A plurality of rollers are arranged on the guide member 43G. The flange 36F of the housing 36 is provided with a recess 36G corresponding to the guide member 43G. The housing 36 (flange 36F) that houses the first partial optical system 22 is movable in the Y-axis direction while being guided by the guide member 43G. As the housing 36 moves, the first and second housings 33 and 35 move together. That is, the first moving mechanism 41 can guide the upper surface 9T of the second column 9 so that the first optical system 13 ( housings 36, 33, 35) slides in the Y-axis direction. The guide member 43G may be detachably disposed on the second column 9. Further, the first guide mechanism 43 may guide the movement of the optical fiber unit 25 while leaving the housing 36.

The second column 9 is formed with a recess (passage, space) 90 through which at least a part of the first optical system 13 passes when the first optical system 13 is moved (sliding). The recess 90 is long in the Y-axis direction. Thereby, the movement of the 1st optical system 13 is not prevented.

In addition, the 1st guide mechanism 43 may have a recessed part formed in the upper surface 9T, and may provide the convex part corresponding to a recessed part in the flange 36F.

During operation of the exposure apparatus EX (during a normal exposure sequence), the position of the first optical system 13 (flange 36F) is fixed by a fixing mechanism (not shown). The fixing mechanism fixes the flange 36F so that the first optical system 13 is disposed on the optical path of the exposure light EL. The fixing mechanism includes, for example, a bolt member that can fix the second column 9 and the flange 36F.

Further, when the exposure apparatus EX is in operation, the recess 90 is covered with a lid member that constitutes a part of the chamber apparatus 3. Thereby, the internal space 3K can be substantially closed. On the other hand, when the first optical system 13 is moved, the lid member is removed and the recess 90 is opened. Thereby, the movement of the 1st optical system 13 is not prevented.

When the first optical system 13 is moved in the + Y direction, the connection between the housing 36 of the first partial optical system 22 and the housing 30 of the second optical system 14 is released. As shown in FIG. 8, the second optical system 14 on the most + Y side among the plurality of second optical systems 14 is retracted from between the housing 36 and the light source device 11. Thereby, the 1st optical system 13 can be moved smoothly.

The first optical system 13 can be removed from the body 4 by moving the housing 36 in the + Y direction. Further, the first optical system 13 can be removed from the body 4 and at least a part of the first optical system 13 (for example, the optical fiber unit 25) can be replaced. As described above, in the present embodiment, since the optical fiber unit 25 is downsized, the replacement operation can be performed smoothly.

Next, the second moving mechanism 42 will be described. The second moving mechanism 42 can move the second portion 34 (second housing 35) relative to the first portion 32 (first housing 33).

9A and 9B are diagrams illustrating an example of the operation of the second moving mechanism 42. FIG. As shown in FIGS. 2, 6, 7, 9A, and 9B, the second moving mechanism 42 includes a second guide mechanism 44 that is disposed in the first housing 33 and guides the movement of the second housing 35. .

The second guide mechanism 44 is disposed on the side surfaces of the first housing 33 on the + Y side and the −Y side, and has a guide member 44G that is long in the X-axis direction. The guide member 44G is provided in the first housing 33 and has a convex portion that is long in the X-axis direction. The second housing 35 is provided with a recess corresponding to the guide member 44G. The second housing 35 that accommodates the second portion 34 is movable in the X-axis direction while being guided by the guide member 44G. The second moving mechanism 42 guides the second housing 35 to slide relative to the first housing 33 in the X-axis direction intersecting the optical axis of the optical element of the first portion 32 substantially parallel to the Z-axis. Can do.

The second guide mechanism 44 may have a recess formed in the first housing 33, and the second housing 35 may be provided with a projection corresponding to the recess.

During operation of the exposure apparatus EX (during a normal exposure sequence), the position of the second portion 34 (second housing 35) is fixed by a fixing mechanism (not shown). The fixing mechanism fixes the second housing 35 so that the second portion 34 is disposed on the optical path of the exposure light EL.

FIG. 9A shows a state in which the second portion 34 is disposed on the optical path of the exposure light EL. The second housing 35 can be moved so that the second portion 34 can be retracted from the optical path of the exposure light EL so as to change from the state shown in FIG. 9A to the state shown in FIG. 9B. In the present embodiment, the second housing 35 can be removed from the first housing 33 and the second portion 34 (second housing 35) can be replaced.

Also, maintenance work or adjustment of the optical element of the first portion 32 in a state where the second housing 35 is moved with respect to the first housing 33, that is, in a state where the second portion 34 is retracted from the optical path of the exposure light EL. Work can be performed. By moving the second housing 35 with respect to the first housing 33, the operator can smoothly access the optical element of the first portion 32 through the opening at the lower end of the first housing 33. Therefore, maintenance work, adjustment work, etc. can be executed with good workability.

As described above, according to the present embodiment, an increase in the size of the illumination device IS can be suppressed. Moreover, according to this embodiment, the maintenance work, adjustment work, etc. of the illuminating device IS can be executed smoothly.

In the above-described embodiment, the case where a plurality of the light source devices 11 and the second optical system 14 are arranged has been described as an example, but one may be used. Further, the number of the incident portions 12 may be one according to the light source device 11 and the second optical system 14.

In the above-described embodiment, the case where the number of the emission ends 24 is larger than the number of the incident portions 12 has been described as an example, but the number of the emission ends 24 may be smaller than the number of the incident portions 12. Further, one injection end 24 may be provided. Moreover, the illumination module IL and the projection optical system PL may be one.

As the substrate P in the above-described embodiment, not only a glass substrate for a display device but also a semiconductor wafer for manufacturing a semiconductor device, a ceramic wafer for a thin film magnetic head, or an original mask (reticle) used in an exposure apparatus ( Synthetic quartz, silicon wafer) or the like is applied.

As the exposure apparatus EX, a step-and-scan type scanning exposure apparatus (scanning stepper) that scans and exposes the substrate P with the exposure light EL through the pattern of the mask M by moving the mask M and the substrate P synchronously. In addition, the pattern of the mask M is collectively exposed while the mask M and the substrate P are stationary, and is applied to a step-and-repeat type projection exposure apparatus (stepper) that sequentially moves the substrate P stepwise. Can do.

The present invention also relates to a twin-stage type exposure having a plurality of substrate stages as disclosed in US Pat. No. 6,341,007, US Pat. No. 6,208,407, US Pat. No. 6,262,796, and the like. It can also be applied to devices.

Further, the present invention relates to a substrate stage for holding a substrate as disclosed in US Pat. No. 6,897,963, European Patent Application No. 1713113, etc., and a reference mark without holding the substrate. The present invention can also be applied to an exposure apparatus that includes a formed reference member and / or a measurement stage on which various photoelectric sensors are mounted. An exposure apparatus including a plurality of substrate stages and measurement stages can be employed.

The type of the exposure apparatus EX is not limited to an exposure apparatus for manufacturing a liquid crystal display element or a display, but an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern on a substrate P, a thin film magnetic head, an image sensor (CCD) In addition, the present invention can be widely applied to an exposure apparatus for manufacturing a micromachine, MEMS, DNA chip, reticle, mask, or the like.

In each of the above-described embodiments, the position information of each stage is measured using an interferometer system including a laser interferometer. However, the present invention is not limited to this. For example, a scale (diffraction grating) provided in each stage You may use the encoder system which detects this.

In the above-described embodiment, a light-transmitting mask in which a predetermined light-shielding pattern (or phase pattern / dimming pattern) is formed on a light-transmitting substrate is used. As disclosed in US Pat. No. 6,778,257, a variable shaped mask (also called an electronic mask, an active mask, or an image generator) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed. ) May be used. Further, a pattern forming apparatus including a self-luminous image display element may be provided instead of the variable molding mask including the non-luminous image display element.

The exposure apparatus EX of the above-described embodiment is manufactured by assembling various subsystems including each component so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. When the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

As shown in FIG. 10, a microdevice such as a semiconductor device includes a step 201 for designing a function / performance of the microdevice, a step 202 for producing a mask (reticle) based on the design step, and a substrate as a substrate of the device. In step 203, according to the above-described embodiment, the substrate is exposed with the exposure light from the mask pattern, the pattern is transferred to the substrate P, the substrate to which the pattern is transferred is developed, and the pattern corresponds to the pattern. Substrate processing step 204 including forming a transfer pattern layer having a shape on the substrate and processing the substrate through the transfer pattern layer, device assembly step (including processing processes such as a dicing process, a bonding process, and a packaging process) 205, manufactured through inspection step 206 and the like.

It should be noted that the requirements of the above-described embodiments and modifications can be combined as appropriate. Some components may not be used. In addition, as long as it is permitted by law, the disclosure of all published publications and US patents related to the exposure apparatus and the like cited in the above-described embodiments and modifications are incorporated herein by reference.

In the above-described embodiment, the case where the illumination apparatus is applied to the exposure apparatus has been described as an example. However, the present invention can also be applied to an apparatus that uses illumination light, such as a substrate inspection apparatus.

DESCRIPTION OF SYMBOLS 1 ... Mask stage, 2 ... Substrate stage, 3 ... Chamber apparatus, 3T ... Upper surface, 4 ... Body, 5 ... Control apparatus, 7 ... Base plate, 8 ... 1st column, 9 ... 2nd column, 10 ... Injection | emission part, 11 DESCRIPTION OF SYMBOLS ... Light source device, 12 ... Incident part, 13 ... 1st optical system, 14 ... 2nd optical system, 22 ... 1st partial optical system, 23 ... 2nd partial optical system, 25 ... Optical fiber unit, 30 ... Housing, 31 ... handle, 32 ... first part, 33 ... first housing, 34 ... second part, 35 ... second housing, 36 ... housing, 40 ... moving mechanism, 41 ... first moving mechanism, 42 ... second moving mechanism, 43 ... 1st guide mechanism, 44 ... 2nd guide mechanism, AX ... Optical axis, EL ... Exposure light, IL ... Illumination module, IS ... Illumination device, M ... Mask, P ... Substrate, PL ... Projection optical system, PS ... Projection system

Claims (15)

1. An illumination device for illuminating an object,
   A light source device that emits illumination light from an emitting portion disposed at a first height with respect to a reference plane;
   A first optical system having an incident portion disposed at a second height lower than the first height with respect to the reference surface, and irradiating the object with the illumination light incident on the incident portion;
   A second optical system having an optical axis inclined with respect to the reference plane between the first height and the second height, and guiding the illumination light emitted from the emitting portion to the incident portion. A lighting device provided.
2. A housing for accommodating the second optical system;
   The lighting device according to claim 1, further comprising a handle disposed on an upper surface of the housing in the vicinity of the incident portion.
3. The first optical system has a plurality of the incident portions,
   3. The illumination device according to claim 1, wherein a plurality of the light source devices and the second optical system are arranged corresponding to the plurality of incident portions.
4. 4. The illumination device according to claim 3, wherein the plurality of incident portions are arranged radially with respect to an axis that intersects the reference plane.
5. An illumination device for illuminating an object,
   A light source device for emitting illumination light;
   A first optical system having a plurality of incident portions and irradiating the illumination light incident on the plurality of incident portions;
   A plurality of second optical systems arranged to correspond to each of the plurality of light source devices and the incident portion, and guiding the illumination light emitted from the light source device to the incident portion,
   The plurality of incident portions are illuminating devices arranged radially with respect to an axis intersecting with an installation surface on which the first optical system is provided.
6. The illumination device according to claim 4 or 5, wherein the plurality of second optical systems are arranged along a radial direction with respect to the axis.
7. The illumination device according to any one of claims 1 to 6, further comprising a moving mechanism that can move while supporting at least a part of the first optical system.
8. An illumination device for illuminating an object,
   A light source device for emitting illumination light;
   A first optical system that receives the illumination light and irradiates the object;
   A second optical system for guiding the illumination light emitted from the light source device to the first optical system;
   A moving mechanism that supports and moves at least a part of the first optical system.
9. The first optical system is emitted from the first partial optical system having an optical fiber that receives the illumination light guided from the first optical system and guides the illumination light to a plurality of emission ends, and the first partial optical system. A second partial optical system for irradiating the object with the illumination light,
   The illumination device according to claim 7 or 8, wherein the moving mechanism moves while supporting the first partial optical system.
10. The lighting device according to claim 9, wherein the moving mechanism includes a first guide mechanism that is disposed on a body that supports the lighting device and guides the movement of the first partial optical system with respect to the body.
11. The lighting device according to claim 9 or 10, wherein the moving mechanism is capable of moving at least a part of the second partial optical system.
12. The second partial optical system has a first part and a second part,
    The lighting device according to claim 11, wherein the moving mechanism includes a second guide mechanism that is disposed in a first housing that houses the first part and guides the movement of the second housing that houses the second part.
13. A first support mechanism for supporting a pattern holding member on which a pattern is formed;
    A second support mechanism for supporting the photosensitive substrate;
    13. An exposure apparatus comprising: an illumination device according to claim 1 that illuminates the pattern holding member and exposes the photosensitive substrate through the pattern.
14. A plurality of projection optical systems that project an image of the pattern of the pattern holding member supported by the first support mechanism onto the photosensitive substrate supported by the second support mechanism;
    The exposure apparatus according to claim 13, wherein the illumination apparatus exposes the photosensitive substrate through a plurality of the projection optical systems.
15. Using the exposure apparatus according to claim 13 or 14, transferring the pattern to the photosensitive substrate;
    Developing the photosensitive substrate to which the pattern is transferred, and forming a transfer pattern layer having a shape corresponding to the pattern on the photosensitive substrate;
    Processing the photosensitive substrate via the transfer pattern layer.

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