JP6323492B2 - Light source device - Google Patents

Description

The present invention relates to a light source equipment.

  An exposure apparatus used in a photolithography process irradiates a mask with exposure light emitted from a light source device, and exposes a substrate through a mask pattern. The following patent document discloses an example of a technique related to a light source device that emits light emitted from a lamp.

JP 2004-296125 A JP 2007-335106 A

  If the temperature of the member constituting the light source device is excessively increased, the member may be thermally deformed or damaged, and the desired performance cannot be exhibited. As a result, the operation rate of the light source device may be reduced. In addition, even when work (maintenance work, recovery work, replacement work, etc.) when the performance of the light source device is deteriorated cannot be performed smoothly, the operation rate of the light source device may be lowered. As a result, the operation rate of the exposure apparatus and device productivity may be reduced.

  An object of an aspect of the present invention is to provide a light source device and an exposure apparatus that can suppress a reduction in operating rate. Moreover, the aspect of this invention aims at providing the device manufacturing method which can suppress the fall of productivity.

  According to the first aspect of the present invention, there is provided a light source device that emits light emitted from a lamp, wherein the light source device is provided around an opening in which at least a part of the lamp is disposed, and the light. There is provided a light source device comprising: a reflecting mirror having a concave reflecting surface that reflects the light; and a reflecting surface air supply unit that guides gas to at least the reflecting surface in the vicinity of the opening.

  According to the second aspect of the present invention, there is provided a light source device that emits light emitted from a lamp, wherein the cable is connected to a base portion of the lamp, and at least a part of the cable irradiated with the light. There is provided a light source device including a cable air supply unit that guides gas.

  According to a third aspect of the present invention, there is provided a light source device that emits light emitted from a lamp, wherein the light source device is provided around an opening in which at least a part of the lamp is disposed, and the light. A reflecting mirror having a concave reflecting surface for reflecting light, a flange connected to an edge of an exit of the reflecting mirror from which light reflected by the reflecting surface is emitted, and arranged around the reflecting mirror A holding body part having one end connected to the flange part and a plate part connected to the other end of the holding body part, the holding member holding the reflecting mirror, the flange part and the holding A light shielding member disposed in at least part of the periphery of the back surface of the reflecting mirror on the opposite side to the reflecting surface in the internal space of the holding member formed by the main body portion and the plate portion An apparatus is provided.

  According to a fourth aspect of the present invention, there is provided a light source device that emits light emitted from a lamp, having an insertion slot into which a cap portion of the lamp is inserted, and holding the cap portion detachably. A mechanism member, a housing member having an entrance and exit and capable of accommodating the holding mechanism that holds the lamp, and a first state in which the holding mechanism fixes the lamp and the fixing of the lamp are released. An operation lever that can move so as to change from one of the second states to the other, and a movable range of the operation lever that is moved together with the holding mechanism in a state where the base is inserted into the insertion port. And a light source device including a restriction mechanism.

  According to a fifth aspect of the present invention, there is provided a light source device that emits light emitted from a lamp, having a reflecting mirror that is disposed at least at a part of the periphery of the lamp, and an entrance / exit, A housing member that accommodates the lamp and the reflecting mirror; and a drawer member that is movable below the lamp and the reflecting mirror through the entrance and that can collect foreign matter in the internal space of the housing member. A light source device is provided.

  According to the sixth aspect of the present invention, the first support mechanism that supports the pattern holding member on which the pattern is formed, the second support mechanism that supports the photosensitive substrate, and any one of the first to fifth aspects. There is provided an exposure apparatus comprising: an illumination device that irradiates the pattern holding member with light emitted from the light source device and exposes the photosensitive substrate through the pattern.

  According to the seventh aspect of the present invention, using the exposure apparatus of the sixth aspect, the pattern is transferred to the photosensitive substrate, the photosensitive substrate to which the pattern is transferred is developed, and the pattern is formed. There is provided a device manufacturing method including forming a transfer pattern layer having a corresponding shape on the photosensitive substrate and processing the photosensitive substrate through the transfer pattern layer.

  According to the aspects of the present invention, there are provided an illumination device and an exposure device that can suppress a reduction in operating rate. Moreover, according to the aspect of this invention, the device manufacturing method which can suppress the fall of productivity is provided.

It is a schematic block diagram which shows an example of the exposure apparatus which concerns on this embodiment. It is a schematic block diagram which shows an example of the light source device which concerns on this embodiment. It is a figure which shows the holding member which concerns on this embodiment. It is a figure which shows the supporting member which concerns on this embodiment. It is the figure which looked at the holding member and support member concerning this embodiment from the upper part. It is the schematic diagram which looked at the 1st air supply part and reflective surface which concern on this embodiment from upper direction. It is a schematic diagram which shows the 2nd air supply part and cable which concern on this embodiment. It is a figure which shows an example of the holding mechanism which concerns on this embodiment. It is a figure which shows an example of the holding mechanism which concerns on this embodiment. It is a figure which shows an example of the holding mechanism which concerns on this embodiment. It is a figure which shows the wire member which concerns on this embodiment. It is a figure for demonstrating an example of operation | movement of the light source device which concerns on this embodiment. It is a figure for demonstrating the stopper mechanism which concerns on this embodiment. It is a figure for demonstrating an example of operation | movement of the light source device which concerns on this embodiment. It is a figure for demonstrating an example of operation | movement of the light source device which concerns on this embodiment. It is a flowchart for demonstrating an example of the manufacturing process of a device.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each part will be described with reference to this XYZ orthogonal coordinate system. A predetermined direction in the horizontal plane is defined as an X-axis direction, a direction orthogonal to the X-axis direction in the horizontal plane is defined as a Y-axis direction, and a direction orthogonal to each of the X-axis direction and the Y-axis direction (that is, a vertical direction) is defined as a Z-axis direction. Further, the rotation (inclination) directions around the X axis, Y axis, and Z axis are the θX, θY, and θZ directions, respectively.

  FIG. 1 is a schematic block diagram that shows an example of an exposure apparatus EX according to the present embodiment. In FIG. 1, an exposure apparatus EX includes a mask stage 14 that can move while supporting a mask M on which a pattern is formed, a substrate stage 15 that can move while supporting a substrate P, and exposure light EL emitted from a lamp 1. Of the light source device 20 that emits light, the illumination device IL that irradiates the mask M with the exposure light EL emitted from the light source device 20 and illuminates the mask M with the exposure light EL, and the mask M illuminated with the exposure light EL. A projection optical system PL that projects a pattern image onto a substrate P and a control device 16 that controls the operation of the entire exposure apparatus EX are provided.

  The mask M includes a reticle on which a device pattern projected onto the substrate P is formed, and has a light transmissive plate such as a glass plate and a light shielding pattern formed on the plate with a light shielding material such as chrome. . The pattern formed on the light-transmitting plate is not limited to the light-shielding pattern, and may be at least one of a phase pattern and a dimming pattern. In this embodiment, a transmissive mask is used as the mask M, but a reflective mask may be used.

  The substrate P includes a photosensitive substrate for manufacturing a device, and includes a base material such as a semiconductor wafer or a glass plate, and a photosensitive film formed on the base material. The photosensitive film is, for example, a film of a photosensitive material applied to a base material.

  The light source device 20 includes a lamp 1 that generates exposure light EL, a holding mechanism 21 that holds the lamp 1, a reflecting mirror 2 that is disposed at least part of the periphery of the lamp 1, and at least the lamp 1 and the reflecting mirror 2. A housing member (lamp house) 22 is provided. In the present embodiment, the lamp 1 is a discharge lamp. The lamp 1 may be an incandescent lamp. The reflecting mirror 2 has a concave reflecting surface 2R that reflects the exposure light EL emitted from the lamp 1. In the present embodiment, the reflecting mirror 2 is an elliptical mirror, and the reflecting surface 2R is a spheroidal surface (a surface formed by rotating a part of an ellipse around its axis). The reflecting surface 2R of the reflecting mirror 2 may be a paraboloid or a spherical surface. In the following description, the reflecting mirror 2 is appropriately referred to as an elliptical mirror 2.

The illumination device IL includes a dichroic mirror 3, a shutter 4, a collimator lens 5, a wavelength selection filter 6, an optical integrator 7, a field lens 8, a half mirror 9, a relay lens 10, a blind device 11, a condenser lens 12, a bending mirror 13, and the like. It has. The illumination device IL can irradiate the exposure light EL to a predetermined illumination area.
The illumination device IL illuminates a part of the mask M arranged in the illumination area with the exposure light EL having a uniform illuminance distribution.

  The light source device 20 may include the dichroic mirror 3. For example, the dichroic mirror 3 may be disposed inside the housing member 22.

  The mask stage 14 is movable with respect to the illumination area while supporting the mask M. The mask stage 14 is movable in three directions including the X axis, the Y axis, and the θZ direction by the operation of a drive system 14D such as a linear motor.

  Projection optical system PL can irradiate exposure light EL to a predetermined projection area. The projection optical system PL projects an image of the pattern of the mask M on a part of the substrate P arranged in the projection area at a predetermined projection magnification. The projection optical system PL of the present embodiment is a reduction system whose projection magnification is, for example, 1/4, 1/5, 1/8 or the like. Note that the projection optical system PL may be either an equal magnification system or an enlargement system. The projection optical system PL may be any of a refractive system that does not include a reflective optical element, a reflective system that does not include a refractive optical element, and a catadioptric system that includes a reflective optical element and a refractive optical element. Further, the projection optical system PL may form either an inverted image or an erect image.

  The substrate stage 15 is movable with respect to the projection area while supporting the substrate P. The substrate stage 15 can be moved in six directions including an X axis, a Y axis, a Z axis, a θX, a θY, and a θZ direction by operation of a drive system 15D such as a linear motor.

  Position information of the mask stage 14 and the substrate stage 15 is measured by interferometer systems 14L and 15L, respectively. When performing exposure processing of the substrate P or when performing predetermined measurement processing, the mask stage 14 (mask M) and the substrate stage 15 (substrate P) are determined based on the measurement results of the interferometer systems 14L and 15L. Position control is executed.

  The illumination device IL illuminates the mask M supported by the mask stage 14 with the exposure light EL, and exposes the substrate P supported by the substrate stage 15 through the pattern of the mask M. The projection optical system PL projects an image of the pattern of the mask M supported by the mask stage 14 onto the substrate P supported by the substrate stage 15. The illumination device IL exposes the substrate P through the projection optical system PL.

  FIG. 2 is a diagram illustrating a configuration of the light source device 20 according to the present embodiment. As shown in FIG. 2, the light source device 20 includes a lamp 1, an elliptical mirror 2, a holding mechanism 21 that holds the lamp 1, a holding member 23 that holds the elliptical mirror 2, and a supporting member that supports the holding member 23. 24, a housing member 22 capable of accommodating the lamp 1, the elliptical mirror 2, the holding mechanism 21, the holding member 23, and the support member 24, and a drawer member 25 capable of collecting foreign matter in the internal space 22H of the housing member 22. I have.

  The lamp 1 includes an ultra high pressure mercury lamp having a cathode and an anode. The lamp 1 emits light by evaporating mercury sealed in the arc tube. The lamp 1 has a first base part 1A and a second base part 1B. The first base part 1A is provided on the anode side, and the second base part 1B is provided on the cathode side. The first and second base portions 1A and 1B are metal members such as molybdenum, for example. The lamp 1 receives electric power through the first and second cap portions 1A and 1B. The first base 1 </ b> A is connected to the cable 26. The second base part 1 </ b> B is connected to the holding mechanism 21. At least a part of the cable 26 is disposed at a position where the exposure light EL emitted from the lamp 1 or the exposure light EL reflected by the reflecting surface 2R is irradiated.

  The elliptical mirror 2 has an opening 2A in which at least a part of the lamp 1 is disposed, and a reflection surface 2R provided around the opening 2A and reflecting the exposure light EL emitted from the lamp 1. The exposure light EL reflected by the reflecting surface 2R is emitted from the exit port 2B of the elliptical mirror 2. The exit 2B is larger than the opening 2A and is disposed at a position close to the second focal point of the elliptical mirror 2. The elliptical mirror 2 has a base material made of glass or the like and a dielectric conductive film formed on the surface of the base material. The reflective surface 2R is formed of a dielectric conductive film. The dielectric conductive film is formed on the substrate by a vapor deposition method. Of the light emitted from the lamp 1, light having a specific wavelength (exposure light EL) is reflected by the reflecting surface 2 </ b> R, and light having a wavelength other than the specific wavelength passes through the elliptical mirror 2.

  FIG. 3 is a view showing the holding member 23. As shown in FIGS. 2 and 3, the holding member 23 is disposed around the elliptical mirror 2 and the flange portion 27 connected to the edge of the injection port 2 </ b> B of the elliptical mirror 2, and the upper end is connected to the flange portion 27. A cylindrical holding main body portion 28 and a plate portion 29 connected to the lower end of the holding main body portion 28. The flange portion 27, the holding main body portion 28, and the plate portion 29 are integrated. The flange portion 27 is fixed to the edge portion of the injection port 2B. The plate part 29 supports the lower part of the elliptical mirror 2.

  Further, the holding member 23 includes an internal space 30 formed by the flange portion 27, the holding main body portion 28, and the plate portion 29, and the back surface 2S of the elliptical mirror 2 on the opposite side to the reflecting surface 2R in the internal space 30. And a light shielding member 31 disposed at least at a part of the periphery. In the present embodiment, the light shielding member 31 includes first and second light shielding members 31 </ b> A and 31 </ b> B disposed around the back surface 2 </ b> S of the elliptical mirror 2. Each of the first and second light shielding members 31 </ b> A and 31 </ b> B is a cylindrical member surrounding the elliptical mirror 2. The first light shielding member 31 </ b> A is smaller than the second light shielding member 31 </ b> B, and is supported by the holding main body 28 and the elliptical mirror 2 in the internal space 30. The second light shielding member 31 </ b> B is supported by the holding main body portion 28 and the plate portion 29 so as to face the back surface 2 </ b> S of the elliptical mirror 2 in the internal space 30. The holding main body 28 is disposed around the second light shielding member 31B. The holding body 28 is not limited to a cylindrical shape, and a structure in which an opening is appropriately provided on the side surface of the cylinder, a frame structure (for example, a structure in which bar-shaped frames are arranged in a cylindrical surface, a mesh structure, etc. ) Etc.

  4 is a view showing the support member 24, and FIG. 5 is a view of the support member 24 and the holding member 23 supported by the support member 24 as viewed from above. As shown in FIGS. 2, 4, and 5, the support member 24 is disposed on at least a part of the periphery of the holding member 23. The support member 24 includes a first portion 24A that supports the holding member 23 and a second portion 24B that supports the holding mechanism 21. The first portion 24 </ b> A is a first plate member 32 having an upper surface 32 </ b> T that supports the flange portion 27 and an inner space 33 that is connected to the lower surface of the plate member 32 and in which at least a part of the holding member 23 is disposed. Member 34. The second portion 24B includes a second member 37 that is connected to the lower surface of the first member 34 and has a space 36 in which at least a part of the holding mechanism 21 is disposed.

  The plate member 32 has a gas inlet port 38 disposed at at least a part of the upper surface 32T, a gas outlet port 39, and an internal flow path 40 connecting the gas inlet port 38 and the gas outlet port 39. As shown in FIG. 5, the outer shape of the upper surface 32T is a quadrangle, and the gas inlets 38 are formed in the vicinity of each of the four corners of the upper surface 32T and in a predetermined region on the −X side with respect to the flange portion 27. Yes. The gas flowing in from the gas inlet 38 flows through the internal flow path 40 and flows out from the gas outlet 39.

  As shown in FIG. 2, the light source device 20 is irradiated with at least a first air supply unit (reflection surface air supply unit) 41 that guides gas to the reflection surface 2R of the elliptical mirror 2 near the opening 2A and the exposure light EL. A second air supply portion (cable air supply portion) 42 for introducing gas to at least a part of the cable 26 and a third air supply portion (back surface air supply portion) 43 for introducing gas to the back surface 2S of the elliptical mirror 2. ing.

  The first air supply unit 41 includes a first air supply port 41A and a tube member 41T. The first air supply port 41A is disposed at a position facing the reflecting surface 2R. The first air supply port 41A is disposed at the tip of the tube member 41T. The first air supply port 41A is connected to a gas supply device (not shown) via the internal flow path of the tube member 41T. The gas supply device supplies clean and temperature-adjusted gas to the first air supply unit 41. The first air supply unit 41 derives the clean and temperature-adjusted gas from the first air supply port 41A and guides it to the reflection surface 2R in the vicinity of the opening 2A.

  FIG. 6 is a schematic view of the first air inlet 41A, the tube member 41T, and the reflecting surface 2R as viewed from above. As shown in FIGS. 2 and 6, in the present embodiment, two first air supply ports 41A and two tube members 41T are arranged. The two first air supply ports 41A are arranged symmetrically with respect to the center of the opening 2A. The first air supply port 41A derives the gas supplied from the gas supply device toward the reflecting surface 2R and causes the gas to flow along the reflecting surface 2R.

  The second air supply unit 42 includes a second air supply port 42A and a tube member 42T. The second air supply port 42 </ b> A is disposed at a position facing the outer surface of the cable 26. The second air inlet 42A is disposed at the tip of the tube member 42T. The second air supply port 42A is connected to a gas supply device (not shown) via the internal flow path of the tube member 42T. The gas supply device supplies clean and temperature-adjusted gas to the second air supply unit 42. The second air supply unit 42 guides the clean and temperature-adjusted gas from the second air supply port 42 </ b> A to the outer surface of the cable 26.

  FIG. 7 is a schematic diagram showing the second air supply port 42 </ b> A, the tube member 42 </ b> T, and the cable 26. In the present embodiment, the cable 26 is a wiring part capable of supplying power to the first base part 1A as disclosed in US Patent Application Publication No. 2008/0218049 and International Publication No. 2008/026709. 26A and the tube part 26B in which the flow path through which the gas supplied to the 1st nozzle | cap | die part 1A flows was formed. The gas flowing through the tube part 26B is supplied to the first base part 1A and cools the first base part 1A. The second air supply unit 42 guides the gas supplied from the gas supply device to at least a part of the cable 26 irradiated with the exposure light EL.

  The 3rd air supply part 43 is arrange | positioned in the at least one part of the holding member 23 which can oppose the back surface 2S. The third air supply unit 43 is disposed in the holding main body unit 28. As shown in FIG. 2, the gas outlet 39 is disposed in the vicinity of the third air supply unit 43. When the holding member 23 is supported by the support member 24, the position of the third air supply unit 43 and the position of the gas outlet 39 are matched. The gas outlet 39 supplies the gas that flows in from the gas inlet 38 and flows through the internal flow path 40 to the third air supply unit 43. The third air supply unit 43 guides at least part of the gas from the gas outlet 39 to the back surface 2S.

The light shielding member 31 guides the gas guided from the third air supply unit 43 along the back surface 2S.
As shown in FIGS. 2 and 3, the first light shielding member 31 </ b> A is held in the internal space 30 so as to face the third air supply portion 43 and not to block the third air supply portion 43. It arrange | positions between the main-body part 28 and the elliptical mirror 2. FIG. In the present embodiment, the upper end of the first surface 311 of the first light shielding member 31 </ b> A facing the third air supply unit 43 is connected to the inner surface of the holding main body 28 near the upper end of the third air supply unit 43. The lower end of the surface 311 is disposed at a position away from the third air supply unit 43 (the inner surface of the holding main body unit 28).

The second light shielding member 31B is disposed between the holding main body portion 28 and the plate portion 29 so as to face the back surface 2S in the internal space 30 and not to block the third air supply portion 43. .
In the present embodiment, the upper end of the second surface 312 of the second light shielding member 31B facing the first surface 311 with a gap is connected to the inner surface of the holding main body portion 28 near the lower end of the third air supply portion 43, The lower end of the second surface 312 is connected to the upper surface of the plate portion 29.

  The holding member 23 is disposed at a position different from the third air supply unit 43 and has an exhaust port 44 that discharges at least a part of the gas guided from the third air supply unit 43. The exhaust port 44 discharges at least a part of the gas in the internal space 30 through which the gas is guided from the third air supply unit 43 from the internal space 30. In the present embodiment, the exhaust port 44 is disposed in the plate portion 29. The exhaust port 44 is disposed in a part of the plate portion 29 between the back surface 2S of the elliptical mirror 2 and the second surface 312 of the second light shielding member 31B.

  As shown in FIG. 2, the housing member 22 has an air supply port 45 that guides external gas to the internal space 22H. In the present embodiment, at least one of the air supply ports 45 is formed on the upper plate of the housing member 22. Further, the housing member 22 has an exhaust port (not shown) for discharging the gas in the internal space 22H to the outside. For example, as disclosed in Japanese Patent Application Laid-Open No. 2004-296125, a fan device is arranged in the vicinity of the exhaust port in the internal space 22H. By operating the fan device, external gas is guided to the internal space 22H of the housing member 22 through the air supply port 45. At least a part of the gas guided from the air supply port 45 flows into the gas inlet 38 and is supplied to the third air supply unit 43 via the internal flow path 40 and the gas outlet 39. The third air supply unit 43 guides the gas to the back surface 2S. The gas guided by the light shielding member 31 and flowing through the internal space 30 along the back surface 2 </ b> S is discharged from the exhaust port 44. At least a part of the gas discharged from the exhaust port 44 is discharged to the outside of the housing member 22 from the exhaust port where the fan device is disposed.

  Next, the holding mechanism 21 will be described. The holding mechanism 21 includes an insertion port 46 into which the second base portion 1B of the lamp 1 is inserted, and includes the holding mechanism 21 that detachably holds the second base portion 1B. As described above, the holding mechanism 21 is supported by the support member 24 (second portion).

  8, 9, and 10 are diagrams illustrating an example of the holding mechanism 21. FIG. The holding mechanism 21 includes a cylindrical member 47 having an insertion port 46 into which the second base part 1B at the lower end of the lamp 1 is inserted, a moving member 48 arranged around the cylindrical member 47 and movable in the Z-axis direction, A compression coil spring 50 disposed around the guide member 49; a connecting member 51 disposed at the lower end of the compression coil spring 50, which applies a force in the −Z direction generated by the compression coil spring 50 to the moving member 48; When the member 48 moves in the −Z direction, the roller 52 is opposed to the pressed surface 1BT of the second cap portion 1B, and retracts to a position that does not face the pressed surface 1BT when the moving member 48 moves in the + Z direction. An arm 53, a switching link mechanism 54 that applies a driving force toward the + Z direction to the moving member 48, and a rotation lever 55 that operates the switching link mechanism 54. By operating the rotation lever 55 provided in the holding mechanism 21, the holding mechanism 21 releases the first state in which the lamp 1 (second base part 1B) is fixed and the lamp 1 (second base part 1B) is fixed. The second state can be changed from one to the other. FIG. 10A shows a first state where the lamp 1 is fixed, and FIG. 10B shows a second state where the lamp 1 is released. The holding mechanism 21 that detachably holds the second cap portion 1B of the lamp 1 is disclosed in US Patent Application Publication No. 2008/0218049 and International Publication No. 2008/026709.

  FIG. 11 is a schematic view of the light source device 20 as viewed from the −Y side. As shown in FIG. 11, the light source device 20 includes a wire member 56 having one end connected to the housing member 22 and the other end connected to the rotation lever 55. A force can be applied to the rotary lever 55 via the wire member 56.

  FIG. 12 is a diagram illustrating an example of the operation of the light source device 20. In the present embodiment, the housing member 22 has an opening 22K on the −X side. The opening 22K is sufficiently large. As shown in FIG. 12, the support member 24, the holding mechanism 21 supported by the support member 24, the lamp 1, the holding member 23, and the elliptical mirror 2 can pass through the opening 22K. That is, the opening 22K functions as an entrance / exit. The housing member 22 includes a door member that can close the opening 22K. When the support member 24 is disposed inside the housing member 22, the opening 22K is closed by the door member.

  As shown in FIG. 2, the light source device 20 is provided on the housing member 22 and guide mechanism 57 that guides the support member 24 in the X-axis direction with respect to the housing member 22 so that the support member 24 passes through the opening 22K. Have The guide mechanism 57 is disposed inside the housing member 22. When the support member 24 is taken out from the inside of the housing member 22 through the opening 22K, or when the support member 24 is inserted into the housing member 22 from the outside through the opening 22K, the support member 24 is guided by the guide mechanism 57. You can move while.

  The light source device 20 includes a stopper mechanism 58 that fixes the position of the support member 24 accommodated in the housing member 22. The stopper mechanism 58 is provided on the housing member 22 and includes a stopper member 58A that can come into contact with the convex member 24T disposed on the support member 24, and a support mechanism 58B that rotatably supports the stopper member 58A. The support mechanism 58B is disposed on the inner surface of the housing member 22 in the vicinity of the opening 22K.

  FIG. 13 is a diagram illustrating an example of the operation of the stopper mechanism 58. As shown in FIG. 13A, in a state where the support member 24 is accommodated in the housing member 22, the stopper member 58A rotates so as to face the convex member 24T, and comes into contact with the convex member 24T. The position of is fixed. Thereby, it is suppressed that the supporting member 24 comes out of the housing member 22 through the opening 22K. Further, as shown in FIG. 13B, when the stopper member 58A rotates so as not to face the convex member 24T, the support member 24 passes through the opening 22K and comes out of the housing member 22. it can.

  FIG. 14 shows an example of the movement of the support member 24 from the outside to the inside of the housing member 22. When the support member 24 is accommodated in the housing member 22, the support member 24 moves into the housing member 22 in a state where the second base portion 1 </ b> B is inserted into the insertion port 46 of the holding mechanism 21. The holding mechanism 21 is supported by the support member 24 and moves into the housing member 22 together with the support member 24. Further, the rotation lever 55 provided in the holding mechanism 21 also moves into the housing member 22 together with the holding mechanism 21.

  The wire member 56 having one end connected to the housing member 22 and the other end connected to the rotation lever 55 restricts the movable range of the rotation lever 55 moved together with the holding mechanism 21. The wire member 56 moves in the X-axis direction of the rotary lever 55 that is moved together with the holding mechanism 21 when the support member 24 that supports the holding mechanism 21 moves in the housing member 22 from the opening 22K (+ X direction). Regulate the possible range.

  For example, as shown in FIG. 14A, the second cap portion 1B is inserted into the insertion slot 46, and the holding mechanism 21 is in the second state (the lamp 1 is not fixed by the holding mechanism 21). ), When the support member 24 moves to the inside of the housing member 22, the movable range (the movable range in the + X direction from the opening 22 </ b> K) of the rotation lever 55 in the X-axis direction is restricted by the wire member 56. Is done. In the present embodiment, as shown in FIG. 14B, the wire member 56 is related to the X-axis direction so that the moving distance of the rotary lever 55 from the opening 22K in the X-axis direction does not exceed a predetermined distance L1. The movable range of the rotation lever 55 is restricted. The wire member 56 operates the rotating lever 55 so that the moving distance of a predetermined portion of the rotating lever 55 (for example, the tip of the rotating lever 55) does not exceed the predetermined distance L1. As a result, as shown in FIG. 14C, the rotation lever 55 is fixed by the wire member 56 so that the holding mechanism 21 is in the first state (the second base portion 1B is fixed to the holding mechanism 21). )Operate.

As described above, the wire member 56 has the second base portion 1B when the predetermined portion of the rotary lever 55 enters the opening 22K by a predetermined distance L1 or more with the second base portion 1B inserted into the insertion port 46. The rotation lever 55 can be operated so that is fixed to the holding mechanism 21.
Thereby, even when the support member 24 is accommodated in the housing member 22 in a state where the second base part 1B is not fixed to the holding mechanism 21, the support member 24 (holding mechanism 21) is moved. The rotation lever 55 can be operated so that the second base part 1B is fixed to the holding mechanism 21. Therefore, it is possible to suppress the occurrence of a problem that power is supplied to the lamp 1 in a state where the second base portion 1B is not fixed to the holding mechanism 21.

  The drawer member 25 can pass through the opening 22K. The drawer member 25 is movable below the lamp 1 and the elliptical mirror 2. The drawer member 25 is movable below the lamp 1 and the elliptical mirror 2 through the opening 22K. As shown in FIG. 2, in the present embodiment, the drawer member 25 is movable below the support member 24. The housing member 22 has a guide mechanism that guides the housing member 22 in the X-axis direction so that the drawer member 25 passes through the opening 22K. When the drawer member 25 is taken out from the inside of the housing member 22 through the opening 22K, or when the drawer member 25 is inserted into the housing member 22 from the outside through the opening 22K, the drawer member 25 is guided by the guide mechanism. Can move.

  The drawer member 25 has an opening 25K in the upper part. The drawer member 25 can collect foreign matter in the internal space 22H of the housing member 22. The drawer member 25 can collect foreign matter generated from at least one of the lamp 1 and the elliptical mirror 2, for example. When at least one of the lamp 1 and the elliptical mirror 2 is broken, the foreign matter generated from the lamp 1 and the elliptical mirror 2 is collected by the pull-out member 25 disposed below by the action of gravity. Thereby, a foreign material can be collect | recovered smoothly. In the present embodiment, a guide member 59 that guides foreign matter in the internal space 22H of the housing member 22 to the opening 25K of the drawer member 25 is disposed in the internal space 22H of the housing member 22. The guide member 59 is disposed at least at a part around the support member 24. The gap between the lower end of the guide member 59 and the drawer member 25 is sufficiently small. Thereby, the foreign material can be collected by the drawer member 25 while suppressing the scattering of the foreign material.

  Next, an example of the operation of the light source device 20 will be described. In order to emit the exposure light EL from the light source device 20, electric power is supplied to the lamp 1. At least a part of the light generated from the lamp 1 is reflected by the reflecting surface 2R of the elliptical mirror 2 and supplied to the illumination device IL. Further, the fan device is driven, and gas flows from the air supply port 45 into the internal space 22H of the housing member 22. The first air supply unit 41 guides gas to the reflecting surface 2 </ b> R, and the second air supply unit 42 guides gas to the cable 26.

  The reflection surface 2R in the vicinity of the opening 2A is disposed at a position close to the lamp 1, and is heated by the light generated from the lamp 1, and the temperature may rise excessively. In the present embodiment, since the first air supply unit 41 guides the gas to the reflecting surface 2R near the opening 2A, the elliptical mirror 2 can be cooled by the gas. Therefore, it is possible to prevent an excessive temperature rise of the elliptical mirror 2 in the vicinity of the opening 2A.

  In the present embodiment, the first air supply port 41 </ b> A of the first air supply unit 41 is disposed at a position facing the reflecting surface 2 </ b> R and hardly guides gas to the lamp 1. The optimum temperature of the lamp 1 for the lamp 1 to emit desired light is different from the heat resistant temperature of the elliptical mirror 2 (dielectric conductive film). In general, the optimum temperature of the lamp 1 is higher than the heat resistant temperature of the elliptical mirror 2. In the present embodiment, the first air supply unit 41 guides the gas to the reflecting surface 2 </ b> R without substantially guiding the gas to the lamp 1, so that the elliptical mirror 2 can be satisfactorily suppressed while suppressing the temperature drop of the lamp 1. Can be cooled.

At least a part of the cable 26 is disposed at a position where the exposure light EL is irradiated, and is heated by the exposure light EL, which may cause an excessive temperature rise. In the present embodiment, since the second air supply unit 42 guides the gas to at least a part of the cable 26 irradiated with the exposure light EL, the cable 26 can be cooled by the gas. Therefore, an excessive temperature rise of the cable 26 can be prevented in advance. In the present embodiment, the cable 26 includes a tube portion 26B through which a gas for cooling the first base portion 1A flows.
If the cable 26 is heated, the temperature of the gas supplied to the first base part 1A will rise, and it may be difficult to cool the first base part 1A. In the present embodiment, since the cable 26 is cooled by the gas guided by the second air supply unit 42, it is possible to prevent the temperature of the gas supplied to the first base unit 1A from rising.

  At least a part of the gas guided from the air supply port 45 of the housing member 22 to the internal space 22 </ b> H flows into the gas inlet 38. The gas that has flowed into the gas inlet 38 is supplied to the third air supply unit 43 via the internal flow path 40 and the gas outlet 39. The third air supply unit 43 guides the gas to the back surface 2S of the elliptical mirror 2. Thereby, the elliptical mirror 2 can be cooled. The gas that is guided from the third air supply unit 43 to the internal space 30 and flows through the internal space 30 is exhausted from the exhaust port 44. The fan device is driven at a predetermined driving amount so that the lamp 1 does not become lower than the optimum temperature by the gas guided from the air supply port 45 to the internal space 22H of the housing member 22.

  In the present embodiment, the light shielding member 31 (31A, 31B) functions as a guide member that guides the gas from the third air supply portion 43 along the back surface 2S, and can be favorably guided to the back surface 2S. . The first light shielding member 31 </ b> A is disposed so as to face the third air supply unit 43. Therefore, it is possible to prevent foreign matter in the internal space 22H from entering the third air supply unit 43. For example, when at least one of the lamp 1 and the elliptical mirror 2 is broken and foreign matter is generated, the foreign matter can be prevented from entering the third air supply unit 43.

  In addition, since the foreign matter in the internal space 22H of the housing member 22 is collected by the drawer member 25, the drawer member 25 can be pulled out and the foreign matter processing can be performed at once, and maintenance work, cleaning work, etc. can be performed. It can be executed smoothly.

  In the present embodiment, the elliptical mirror 2, the holding member 23, and the light shielding member 31 are integrated (unitized) to constitute an elliptical mirror unit. Since the elliptical mirror unit is easy to handle and easy to replace, maintenance work, replacement work, and the like can be performed smoothly. In addition, since the elliptical mirror 2 is disposed in the internal space 30 of the holding member 23, even when the elliptical mirror 2 is damaged, the holding member 23 can suppress scattering of foreign matters generated due to the damage.

  In addition, as described with reference to FIG. 14 and the like, in the present embodiment, the rotary lever 55 that is moved together with the support member 24 and the holding mechanism 21 in a state where the second base portion 1B is inserted into the insertion port 46. Since the wire member 56 that restricts the movable range (movable range) is provided, even if the holding mechanism 21 is accommodated in the housing member 22 without fixing the second base portion 1B, the wire member By the action of 56, the second base part 1B can be fixed by the holding mechanism 21.

  Next, an example of replacement work of the lamp 1 will be described. The replacement work of the lamp 1 is performed by an operator, for example.

  First, a procedure for taking out the lamp 1 disposed inside the housing member 22 will be described. The supply of power to the lamp 1 (first and second cap parts 1A, 1B) is stopped, and the lamp 1 is turned off. For example, the operation of the power supply device connected to the lamp 1 is stopped, and the supply of power to the lamp 1 is stopped. It is desirable not only to stop the operation of the power supply device, but also to operate the breaker (wiring breaker) to cut off the supply of power from the power company to the power supply device. After a first time (for example, 30 minutes) has elapsed since the lamp 1 was turned off, the door member is operated to open the opening 22K, and one end of the cable 26 is removed from the first base 1A. The other end of the cable 26 is also removed from the connector provided on the housing member 22. In this embodiment, the cable 26 can be removed without using a tool.

  Next, the stopper member 58A is operated to release the fixing to the support member 24 by the stopper mechanism 58. The fixing to the support member 24 can be released simply by operating the stopper member 58A without using a tool. Then, the support member 24 is brought out of the housing member 22 through the opening 22K. Since the guide mechanism 57 is provided, the support member 24 can be moved smoothly.

  After the support member 24 is brought out of the housing member 22, the rotation lever 55 is operated to release the fixing to the second base 1B (lamp 1) by the holding mechanism 21. The fixing to the second base part 1B can be released simply by operating the rotation lever 55 without using a tool.

  Then, the lamp 1 is removed from the holding mechanism 21. In the present embodiment, heat-resistant gloves are prepared, and the lamp 1 can be removed from the holding mechanism 21 using the heat-resistant gloves.

  Next, a procedure for attaching the new lamp 1 to the holding mechanism 21 and arranging it in the housing member 22 will be described. After the second base portion 1B of the new lamp 1 is inserted into the insertion port 46 of the holding mechanism 21, the rotary lever 55 is operated to fix the second base portion 1B (lamp 1) with the holding mechanism 21. The second base part 1 </ b> B can be fixed by the holding mechanism 21 only by operating the rotation lever 55 without using a tool.

  Then, the support member 24 is inserted into the housing member 22 through the opening 22K. Since the guide mechanism 57 is provided, the support member 24 can be moved smoothly. In the present embodiment, since the wire member 56 is provided, as described with reference to FIG. 14, the support member 24 is mounted in a state where the second base portion 1 </ b> B is not fixed to the holding mechanism 21. Even when it is accommodated in the housing member 22, the second base portion 1 </ b> B can be fixed by the holding mechanism 21 as the support member 24 (holding mechanism 21) moves.

  After the support member 24 is moved into the housing member 22, the stopper member 58 </ b> A is operated and the position of the support member 24 is fixed by the stopper mechanism 58. The support member 24 can be fixed by the stopper mechanism 58 without using a tool. Then, one end of the cable 26 is connected to the first base 1 </ b> A, and the other end is connected to a connector provided on the housing member 22. The cable 26 can be connected without using a tool. When one end of the cable 26 is not well connected to the first base portion 1A, a gap is formed between one end of the cable 26 and the first base portion 1A. It can be confirmed whether or not the first base part 1A is well connected. Similarly, it can be confirmed whether the other end of the cable 26 and the connector provided on the housing member 22 are well connected.

  After the cable 26 is attached, the door member is operated to close the opening 22K. Then, power is supplied to the lamp 1 to light the lamp 1. Thus, the replacement work of the lamp 1 is completed. In the present embodiment, the replacement work of the lamp 1 can be performed without using a tool.

  In the present embodiment, the elapsed time after the lamp 1 is turned off is measured. In the present embodiment, the control device 16 measures an elapsed time after the lamp 1 is turned off. The power supply device may measure. For example, when the lamp 1 is not replaced, if the time from when the lamp 1 is turned off to when it is turned on (re-lighted) is short, the lamp 1 may be deteriorated or damaged. After the lamp 1 is turned off, it is confirmed whether or not the elapsed time has exceeded a predetermined second time (for example, 15 minutes), and then the lamp 1 is turned on to prevent the lamp 1 from being damaged. Can do. In the present embodiment, the exposure apparatus EX includes a display device such as a flat panel display, and can display the elapsed time after the lamp 1 is turned off on the display device.

  As described above, according to the present embodiment, it is possible to suppress an excessive temperature rise of the elliptical mirror 2, the cable 26, and the like while maintaining the optimum temperature of the lamp 1. Therefore, the light source device 20 can exhibit the expected performance, and can suppress a reduction in the operating rate of the light source device 20.

  Further, according to the present embodiment, when the performance of the light source device 20 is deteriorated due to the breakage of the lamp 1 and the elliptical mirror 2, the maintenance work for the light source device 20 to exhibit the expected performance, Recovery work, replacement work, etc. can be executed smoothly with good workability. Therefore, it is possible to suppress a decrease in the operating rate of the light source device 20.

  In the above-described embodiment, the case where the restriction mechanism that restricts the movable range of the rotation lever 55 includes the wire member 56 has been described as an example. However, as illustrated in FIG. You may provide the convex member 56B fixed. The convex member 56B is fixed to the inner surface on the −Y side of the housing member 22 and protrudes to the + Y side. The convex member 56B is disposed at a predetermined distance L1 from the opening 22K. When the support member 24 moves from the opening 22K to the inside of the housing member 22 (+ X direction), the rotation lever 55B moved together with the holding mechanism 21 is restricted in the movable range in the X-axis direction by the convex member 56B. .

  For example, as shown in FIG. 15A, when the holding mechanism 21 is in the second state, when the support member 24 moves inside the housing member 22, as shown in FIG. 55B contacts the convex member 56B. When the support member 24 moves in the + X direction in a state where the rotary lever 55B and the convex member 56B are in contact with each other, as shown in FIG. 15C, the rotary lever 55B is held by the holding member 21 by the convex member 56B. It operates to be in the first state.

  In the above-described embodiment, the exposure apparatus EX includes a plurality of projection optical systems PL, and projects an image of the pattern of the mask M onto the substrate P while moving the mask M and the substrate P synchronously in a predetermined scanning direction. A so-called multi-lens scan exposure apparatus may be used.

  As the substrate P in the above-described embodiment, not only a glass substrate for a display device but also a semiconductor wafer for manufacturing a semiconductor device, a ceramic wafer for a thin film magnetic head, or an original mask (reticle) used in an exposure apparatus ( Synthetic quartz, silicon wafer) or the like is applied.

  As the exposure apparatus EX, a step-and-scan type scanning exposure apparatus (scanning stepper) that scans and exposes the substrate P with the exposure light EL through the pattern of the mask M by moving the mask M and the substrate P synchronously. In addition, the pattern of the mask M is collectively exposed while the mask M and the substrate P are stationary, and is applied to a step-and-repeat type projection exposure apparatus (stepper) that sequentially moves the substrate P stepwise. Can do.

  The present invention also relates to a twin-stage type exposure having a plurality of substrate stages as disclosed in US Pat. No. 6,341,007, US Pat. No. 6,208,407, US Pat. No. 6,262,796, and the like. It can also be applied to devices.

  Further, the present invention relates to a substrate stage for holding a substrate as disclosed in US Pat. No. 6,897,963, European Patent Application No. 1713113, etc., and a reference mark without holding the substrate. The present invention can also be applied to an exposure apparatus that includes a formed reference member and / or a measurement stage on which various photoelectric sensors are mounted. An exposure apparatus including a plurality of substrate stages and measurement stages can be employed.

  The type of the exposure apparatus EX is not limited to an exposure apparatus for manufacturing a liquid crystal display element or a display, but an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern on a substrate P, a thin film magnetic head, an image sensor (CCD) In addition, the present invention can be widely applied to an exposure apparatus for manufacturing a micromachine, MEMS, DNA chip, reticle, mask, or the like.

  In each of the above-described embodiments, the position information of each stage is measured using an interferometer system including a laser interferometer. However, the present invention is not limited to this. For example, a scale (diffraction grating) provided in each stage You may use the encoder system which detects this.

  In the above-described embodiment, a light-transmitting mask in which a predetermined light-shielding pattern (or phase pattern / dimming pattern) is formed on a light-transmitting substrate is used. As disclosed in US Pat. No. 6,778,257, a variable shaped mask (also called an electronic mask, an active mask, or an image generator) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed. ) May be used. Further, a pattern forming apparatus including a self-luminous image display element may be provided instead of the variable molding mask including the non-luminous image display element.

The exposure apparatus EX of the above-described embodiment is manufactured by assembling various subsystems including the respective constituent elements recited in the claims of the present application so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. Is done. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy.
The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. When the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  As shown in FIG. 16, a microdevice such as a semiconductor device includes a step 201 for designing a function / performance of the microdevice, a step 202 for producing a mask (reticle) based on the design step, and a substrate as a substrate of the device. In step 203, according to the above-described embodiment, the substrate is exposed with the exposure light from the mask pattern, the pattern is transferred to the substrate P, the substrate to which the pattern is transferred is developed, and the pattern corresponds to the pattern. Substrate processing step 204 including forming a transfer pattern layer having a shape on the substrate and processing the substrate through the transfer pattern layer, device assembly step (including processing processes such as a dicing process, a bonding process, and a packaging process) 205, manufactured through inspection step 206 and the like.

  Note that the requirements of the above-described embodiments and modifications can be combined as appropriate. Some components may not be used. In addition, as long as it is permitted by law, the disclosure of all published publications and US patents related to the exposure apparatus and the like cited in the above-described embodiments and modifications are incorporated herein by reference.

  DESCRIPTION OF SYMBOLS 1 ... Lamp, 1A ... 1st nozzle | cap | die part, 1B ... 2nd nozzle | cap | die part, 2 ... Reflector, 2A ... Opening part, 2B ... Ejection port, 2R ... Reflective surface, 2S ... Back surface, 14 ... Mask stage, 15 ... Substrate Stage, 20 ... Light source device, 21 ... Holding mechanism, 22 ... Housing member, 22H ... Internal space, 22K ... Opening, 23 ... Holding member, 25 ... Drawer member, 26 ... Cable, 27 ... Flange part, 28 ... Holding body part , 29 ... Plate portion, 30 ... Internal space, 32T ... Upper surface, 31 ... Light shielding member, 31A ... First light shielding member, 31B ... Second light shielding member, 38 ... Gas inlet, 39 ... Gas outlet, 40 ... Internal flow Road 41: First air supply portion 42 ... Second air supply portion 43 ... Third air supply portion 44 ... Exhaust port 46 ... Insertion port 55 ... Rotating lever 56 ... Wire member 57 ... Guide mechanism 58 ... stopper mechanism, EL ... exposure light, IL ... Akira apparatus, M ... mask, P ... substrate, PL ... projection optical system

Claims (8)

A mounting portion to which the lamp can be attached and detached, and a switching portion for switching between a first state in which the lamp is mounted on the mounting portion and a second state in which the mounting of the lamp on the mounting portion is released, A lamp holder for holding the lamp;
For a given direction, and a container for yield capacity and said lamp and said lamp holding portion,
An air supply unit for supplying a gas for cooling a cable connected to supply electric power to the lamp ,
In the switching unit, a second lamp different from the first lamp is inserted into the mounting unit from which the first lamp from which the cable has been removed and power supply has been stopped is removed, and the lamp holding unit, the housing unit, When the second lamp and the lamp holding part are housed in the housing part from outside the housing part so that the relative distance in the predetermined direction is changed, the second state is switched to the first state ,
The air supply unit is a light source device that supplies the gas to the cable connected to the second lamp in the first state . It further comprises a connecting part for connecting the switching part and the accommodating part,
The switching unit, if the length of the connecting portion with respect to the predetermined direction is a predetermined length, the light source apparatus according to claim 1 for switching to the first state. The light source device according to claim 2 , wherein the connecting portion limits a relative movable distance of the lamp holding portion with respect to the housing portion to the predetermined length with respect to the predetermined direction. The light source device according to claim 2 , wherein the connection unit regulates a movable range of the switching unit with respect to the predetermined direction. A contact portion that is provided in the housing portion and contacts the switching portion;
2. The light source according to claim 1 , wherein the switching unit switches from the second state to the first state when the lamp holding unit is moved in the predetermined direction and the switching unit and the contact unit are contacted. apparatus. The switching unit includes a light source device according to any one of claims 1 to 5 for switching a relative position between said mounting portion with respect to the predetermined direction changes from the second state to the first state. The light source device according to any one of claims 1 to 6 , further comprising a regulating member that does not change a relative positional relationship between the lamp holding unit and the housing unit with respect to the predetermined direction. The light source device according to any one of claims 1 to 7 , wherein the lamp is attached to and detached from the mounting portion in a direction intersecting the predetermined direction.

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