JP5470984B2 - Illumination apparatus, exposure apparatus, and device manufacturing method - Google Patents

Description

  The present invention relates to an illumination apparatus, an exposure apparatus, and a device manufacturing method.

  An exposure apparatus used in a manufacturing process of a micro device, an electronic device, or the like has an illumination device that illuminates a mask with exposure light, and exposes a photosensitive substrate with exposure light through the mask. The following patent document discloses an example of a technique related to a lighting device.

JP 05-045605 A JP 07-135149 A

  One of the performances required for the lighting device is suppression of a decrease in lighting efficiency. For example, an illumination device used in an exposure apparatus is required to illuminate a mask with sufficient illuminance while suppressing loss of exposure light. If the illumination apparatus cannot illuminate the mask with sufficient illuminance, the throughput of the exposure apparatus may be reduced (exposure processing is delayed), and productivity may be reduced.

  An object of this invention is to provide the illuminating device, exposure apparatus, and device manufacturing method which can suppress the fall of illumination efficiency.

  According to the first aspect of the present invention, there is provided an illuminating device that illuminates an object with illumination light emitted from a light source, and has a concave curved reflection surface disposed at a part of the periphery of the light source. A first reflecting member that reflects the illumination light, a light guide optical system that guides the illumination light reflected by the first reflection member to the object, and a part of the illumination light that is provided in the light guide optical system to pass the object A limiting member that limits at least one of the illumination light irradiation range and numerical aperture, and illumination light that is provided in the light guide optical system and reflected by the first reflecting member, other than the first partial light that can pass through the limiting member And a second reflecting member that reflects at least a part of the second partial light and reversely travels the optical path of the illumination light to enter the first reflecting member.

  According to the second aspect of the present invention, the first support mechanism that supports the pattern holding member on which the pattern is formed, the second support mechanism that supports the photosensitive substrate, the pattern holding member is illuminated, and the pattern holding member is illuminated via the pattern. An exposure apparatus comprising: a lighting device according to a first aspect that exposes a photosensitive substrate.

  According to the third aspect of the present invention, using the exposure apparatus of the second aspect, a transfer step of transferring the pattern to the photosensitive substrate, and developing the photosensitive substrate to which the pattern has been transferred, have a shape corresponding to the pattern. There is provided a device manufacturing method including a developing step of forming a transfer pattern layer on a photosensitive substrate and a processing step of processing the photosensitive substrate via the transfer pattern layer.

  ADVANTAGE OF THE INVENTION According to this invention, the illuminating device, exposure apparatus, and device manufacturing method which can suppress the fall of illumination efficiency are provided.

It is a schematic block diagram which shows an example of exposure apparatus provided with the illuminating device which concerns on 1st Embodiment. It is a perspective view which shows an example of exposure apparatus provided with the illuminating device which concerns on 1st Embodiment. It is a figure which shows an example of the 2nd reflection member which concerns on 1st Embodiment. It is a figure which shows the relationship between the entrance which concerns on 1st Embodiment, and the 2nd light source image containing 1st partial light and 2nd partial light. It is a figure for demonstrating the effect | action of the 2nd reflection member which concerns on 1st Embodiment. It is a figure for demonstrating the effect | action of the 2nd reflection member which concerns on 1st Embodiment. It is a figure for demonstrating the effect | action of the 2nd reflection member which concerns on 1st Embodiment. It is a figure which shows an example of the illuminating device which concerns on 2nd Embodiment. It is a figure which shows an example of the illuminating device which concerns on 3rd Embodiment. It is a figure which shows an example of the illuminating device which concerns on 4th Embodiment. It is a flowchart for demonstrating an example of the manufacturing process of a device.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each member will be described with reference to this XYZ orthogonal coordinate system. A predetermined direction in the horizontal plane is defined as an X-axis direction, a direction orthogonal to the X-axis direction in the horizontal plane is defined as a Y-axis direction, and a direction orthogonal to each of the X-axis direction and the Y-axis direction (that is, a vertical direction) is defined as a Z-axis direction. Further, the rotation (inclination) directions around the X axis, Y axis, and Z axis are the θX, θY, and θZ directions, respectively.

<First Embodiment>
A first embodiment will be described. FIG. 1 is a schematic block diagram showing an example of an exposure apparatus EX provided with an illumination apparatus IS according to the first embodiment, and FIG. 2 is a perspective view.

  1 and 2, the exposure apparatus EX includes a mask stage 1 that can move while supporting a mask M, a substrate stage 2 that can move while supporting a substrate P, and illumination that illuminates the mask M with exposure light EL. The apparatus IS, the projection apparatus PS which projects the image of the pattern of the mask M illuminated by the exposure light EL onto the substrate P, and the control apparatus 3 which controls the operation of the entire exposure apparatus EX.

  The mask M includes a reticle on which a device pattern projected onto the substrate P is formed. The substrate P is a photosensitive substrate, and includes, for example, a base material such as a glass plate and a photosensitive film (coated photosensitive agent) formed on the base material. In the present embodiment, the substrate P includes a large glass plate, and the size of one side of the substrate P is, for example, 500 mm or more. In the present embodiment, a rectangular glass plate having a side of about 3000 mm is used as the base material of the substrate P.

  In the present embodiment, the projection apparatus PS has a plurality of projection optical systems PL. The illumination device IS has a plurality of illumination modules IL corresponding to the plurality of projection optical systems PL. Further, the exposure apparatus EX of the present embodiment projects an image of the pattern of the mask M onto the substrate P while moving the mask M and the substrate P synchronously in a predetermined scanning direction. That is, the exposure apparatus EX of the present embodiment is a so-called multi-lens scan exposure apparatus.

  In the present embodiment, the projection apparatus PS has seven projection optical systems PL, and the illumination apparatus LS has seven illumination modules IL. The number of projection optical systems PL and illumination modules IL is not limited to seven. For example, the projection apparatus PS has eleven projection optical systems PL, and the illumination apparatus IS has eleven illumination modules IL. Also good.

  The illumination device IS can irradiate the predetermined illumination area IR with the exposure light EL. The illumination area IR corresponds to an irradiation area of the exposure light EL emitted from each illumination module IL. In the present embodiment, the illumination device IS illuminates each of the seven different illumination areas IR with the exposure light EL. The illumination device IS illuminates a portion of the mask M arranged in the illumination area IR with the exposure light EL having a uniform illuminance distribution.

  The illumination device IS illuminates the mask M with the exposure light EL emitted from the light source 5. In the present embodiment, the light source 5 is a mercury lamp (extra-high pressure mercury lamp). In the present embodiment, bright lines (g line, h line, i line) emitted from a mercury lamp are used as the exposure light EL irradiated to the mask M.

  The mask stage 1 is movable with respect to the illumination region IR while supporting the mask M. The mask stage 1 supports the mask M so that the lower surface (pattern formation surface) of the mask M and the XY plane are substantially parallel. The mask stage 1 is movable in three directions including the X axis, the Y axis, and the θZ direction while supporting the mask M.

  The projection apparatus PS can irradiate the predetermined projection region PR with the exposure light EL. The projection area PR corresponds to an irradiation area of the exposure light EL emitted from each projection optical system PL. In the present embodiment, the projection apparatus PS projects a pattern image on each of seven different projection regions PR. The projection apparatus PS projects an image of the pattern of the mask M on the portion of the substrate P arranged in the projection region PR at a predetermined projection magnification.

  The substrate stage 2 is movable with respect to the projection region PR while supporting the substrate P. The substrate stage 2 supports the substrate P so that the surface (exposure surface) of the substrate P and the XY plane are substantially parallel. The substrate stage 2 is movable in six directions including the X axis, the Y axis, the Z axis, the θX, the θY, and the θZ directions while supporting the substrate P.

  As shown in FIGS. 1 and 2, the illumination device IS has a concave curved reflecting surface 6 disposed at a part of the periphery of the light source 5 made of a mercury lamp, and is emitted from the light source 5 by the reflecting surface 6. The first reflecting member 7 that reflects the exposure light EL, the light guide optical system 8 that guides the exposure light EL reflected by the first reflection member 7 to the mask M, and the light guide optical system 8 are provided. Are provided in the light guide optical system 8 and the limiting members 9 and 10 that allow a part of the exposure light EL from the light to pass through and restrict at least one of the irradiation range and numerical aperture of the exposure light EL to the mask M, and the first reflection member Of the exposure light EL reflected by 7, at least a part of the exposure light EL other than the exposure light EL that can pass through the limiting members 9, 10 is reflected, and the optical path of the exposure light EL is moved backward to make the first reflection member 7. And a second reflecting member 11 that is incident on the second reflecting member 11.

  In the present embodiment, the concave curved reflecting surface 6 has two focal points. In this embodiment, the 1st reflection member 7 is an elliptical mirror provided with the reflective surface 6 which has a 1st focus and a 2nd focus.

  The light guide optical system 8 includes a dichroic mirror 12 that reflects at least part of the exposure light EL from the first reflecting member 7, and a relay optical system 13 that optically relays the exposure light EL supplied from the dichroic mirror 12. The light transmission element 14 to which the exposure light EL from the relay optical system 13 is supplied, the collimator lens 15 to which the exposure light EL from the light transmission element 14 is supplied, and the exposure light EL from the collimator lens 15 are supplied. The exposure light EL from the fly eye integrator 9, the aperture stop 10 having a predetermined opening, which is disposed in the vicinity of the light emission surface of the fly eye integrator 9, and the exposure light EL from the fly eye integrator 9 is supplied to the mask M. And a condenser lens 16 for irradiating.

  In the present embodiment, a plurality of light sources 5 are provided. A plurality of first reflecting members 7 are provided according to the light source 5. A plurality of second reflecting members 11 are also provided according to the light source 5. In this embodiment, three each of the light source 5, the 1st reflection member 7, and the 2nd reflection member 11 is provided. A plurality (three) of the dichroic mirror 12 and the relay optical system 13 are also provided in accordance with the light source 5. That is, the illumination device IS has three illumination units IU each including the light source 5, the first reflection member 7, the dichroic mirror 12, the relay optical system 13, and the second reflection member 11.

  The light guide optical system 8 includes a plurality of (seven) illumination modules IL described above. Each of the illumination modules IL includes a collimating lens 15, a fly eye integrator 9, an aperture stop 10, and a condenser lens 16. In other words, in the present embodiment, seven collimating lenses 15, fly eye integrators 9, aperture stops 10, and condenser lenses 16 are provided between the optical transmission element 14 and the mask M.

  The light transmission element 14 transmits the exposure light EL from the three relay optical systems 13 to each of the plurality of illumination modules IL. The light transmission element 14 has a plurality of (three) entrances 17 provided according to the light source 5 (illumination unit IU) and a plurality (seven) exits 18 provided according to the illumination module IL. The exposure light EL incident on the plurality of incident ports 17 is combined and transmitted to each of the illumination modules IL.

  The three lighting units IU have the same configuration. Hereinafter, among the three illumination units IU, one illumination unit IU will be described, and description of the other illumination units IU will be omitted.

  Similarly, the seven illumination modules IL have the same configuration. Hereinafter, one illumination module IL will be described, and description of the other illumination modules IL will be omitted.

  The first reflecting member 7 has a first focal point and a second focal point. The first focal point is closer to the reflecting surface 6 than the second focal point. The first reflecting member 7 is arranged with the first focus close to the reflecting surface 6 out of the first focus and the second focus aligned with the light source 5.

  The first reflecting member 7 reflects the exposure light EL emitted from the light source 5 to form a first light source image IM1 of the light source 5. At least a part of the exposure light EL emitted from the light source 5 is reflected by the dichroic mirror 12 and collected at the second focal point of the first reflecting member 7. The first reflecting member 7 forms the first light source image IM1 of the light source 5 at the second focal point.

  The dichroic mirror 12 reflects the exposure light EL in a specific wavelength region out of the incident exposure light EL. The exposure light EL emitted from the light source 5 and reflected by the dichroic mirror 12 enters the relay optical system 13.

  The relay optical system 13 optically relays the exposure light EL emitted from the first light source image IM1. The relay optical system 13 optically relays the first light source image IM1 to form a second light source image IM2.

  In the present embodiment, the relay optical system 13 includes a first relay optical system 13A to which the exposure light EL from the dichroic mirror 12 is supplied, and a second relay optical to which the exposure light EL from the first relay optical system 13A is supplied. System 13B. Each of the first and second relay optical systems 13A and 13B includes a collimating lens 19 and a condensing lens 20. The first relay optical system 13 </ b> A has an interference filter 21. The interference filter 21 is disposed between the collimating lens 19 and the condenser lens 20. The interference filter 21 allows only the exposure light EL in a predetermined wavelength region out of the exposure light EL supplied from the collimator lens 19 to be supplied to the condenser lens 20.

  The light transmission element 14 has an incident port 17 into which at least a part of the exposure light EL from the relay optical system 13 is incident. The light transmission element 14 transmits the exposure light EL incident from the incident port 17 to each of the plurality of illumination modules IL. To supply. The optical transmission element 14 includes an incident port 17 through which the exposure light EL is incident, an emission port 18 through which the exposure light EL is emitted, and a transmission unit 22 that transmits the exposure light EL from the incident port 17 to the emission port 18.

  A plurality (three) of entrances 17 are provided according to the light source 5 (illumination unit IU). A plurality of (seven) injection ports 18 are provided according to the illumination module IL. The transmission unit 22 includes an optical fiber, synthesizes the exposure light EL incident on the plurality of incident ports 17, branches the beams, and transmits them to each of the plurality of emission ports 18.

  The incident port 17 is disposed in the vicinity of the image plane of the second light source image IM2 formed by the relay optical system 13. The exposure light EL emitted from the relay optical system 13 enters the incident port 17. The exposure light EL that has entered the entrance port 17 is supplied to the exit port 18 via the transmission unit 22. The exit 18 supplies the exposure light EL to the illumination module IL. Thus, in the present embodiment, the light guide optical system 8 combines the exposure light EL that has entered the plurality of entrances 17 and guides it to the mask M via the plurality of illumination modules IL.

  The illumination module IL includes a shutter device 24 that can block the progress of the exposure light EL from the exit port 18, a collimator lens 15, a fly eye integrator 9, an aperture stop 10, and a condenser lens 16.

  The collimator lens 15 converts the exposure light EL (diverged light) emitted from the emission port 18 of the light transmission element 14 into substantially parallel exposure light EL (parallel light) and supplies the converted light to the fly eye integrator 15.

  The fly eye integrator 9 has a plurality of lens elements 9E. The lens element 9E has a positive refractive power. The entrance surface of each lens element 9E is formed in a spherical shape with a convex surface facing the entrance side, and the exit surface is formed in a spherical shape with the convex surface facing the exit side. A plurality of lens elements 9E are arranged in the XY plane. Each lens element 9E of the fly-eye integrator 9 functions as a limiting member that limits the irradiation range (illumination region IR) of the exposure light EL on the lower surface of the mask M.

  The limiting member that limits the illumination range may be a field stop arranged at a position substantially conjugate with the mask M.

  The exposure light EL emitted from the emission port 18 and incident on the fly eye integrator 9 via the collimator lens 15 is divided into wavefronts by a plurality of lens elements 9E. A light source image is formed in the vicinity of the exit surface (rear focal plane) of the plurality of lens elements 9E, and a secondary light source is formed by the plurality of light source images. That is, a substantial surface light source is formed in the vicinity of the exit surface (rear focal plane) of the fly eye integrator 9.

  The aperture stop 10 is disposed in the vicinity of the light exit surface of the fly eye integrator 9, that is, in the rear focal plane of the fly eye integrator 9. The aperture stop 10 is a circular aperture stop for normal illumination, an aperture stop for annular illumination, an aperture stop for dipole illumination (bipolar illumination), an aperture stop for cross pole illumination (quadrupole illumination), and a small coherence. It includes at least one of a small circular aperture stop for a factor (σ value).

  Of the exposure light EL emitted from the secondary light source formed on the rear focal plane of the fly-eye integrator 9, the exposure light EL that has passed through the aperture of the aperture stop 10 enters the condenser lens 16. The aperture stop 10 functions as a limiting member that limits the exposure light EL for the mask M and limits the numerical aperture.

  The condenser lens 16 collects the exposure light EL supplied from the fly eye integrator 9 (secondary light source) and irradiates the mask M with it. The exposure light EL emitted from the condenser lens 16 is applied to the illumination area IR. The exposure light EL emitted from each lens element 9E of the fly eye integrator 9 is applied to the mask M in a superimposed manner via the condenser lens 16. The illumination module IL illuminates the illumination region IR with exposure light EL having a uniform illuminance distribution.

  Next, the second reflecting member 11 will be described with reference to FIGS.

  In the present embodiment, the second reflecting member 11 is provided on at least a part of the periphery of the incident port 17. As shown in FIG. 3, in the present embodiment, the second reflecting member 11 is an annular member. The second reflecting member 11 has a reflecting surface 23 disposed around the entrance port 17. The reflecting surface 23 is disposed so as to face the relay optical system 13.

  In the present embodiment, the second reflecting member 11 is an annular member made of metal such as aluminum. The reflecting surface 23 is formed by mirror-finishing the surface of the annular member. In the present embodiment, the reflecting surface 23 is a flat surface. In the present embodiment, the reflecting surface 23 is disposed substantially perpendicular to the optical axis of the relay optical system 13.

  The second reflection member 11 includes at least a part of the exposure light EL other than the exposure light EL that can pass through the limiting member including the fly eye integrator 9 and the aperture stop 10 among the exposure light EL reflected by the first reflection member 7. The light is reflected and reverses the optical path of the exposure light EL to enter the first reflecting member 7.

  For example, when the size of the light source 5 (the size of the bright spot) is larger than the illumination range limited by the limiting member, the exposure that is not incident on the limiting member (lens element 9E) out of the exposure light EL emitted from the light source 5 is exposed. There is a possibility that excessive exposure light EL that cannot pass through the light EL, that is, the limiting member (lens element 9E) may be generated.

  Further, when the light emission angle of the light source 5 is larger than the numerical aperture limited by the limiting member (aperture stop 10), the exposure light EL emitted from the light source 5 cannot pass through the limiting member (aperture stop 10). Excessive exposure light EL may be generated.

  Here, in the following description, the exposure light EL that can pass through the limiting member among the exposure light EL emitted from the light source 5 is appropriately referred to as first partial light EL1, and exposure light EL other than the first partial light EL1. Is appropriately referred to as second partial light EL2.

  The first partial light EL1 is exposure light EL that passes through the limiting member and is irradiated onto the mask M. The second partial light EL2 is excessive exposure light EL that cannot pass through the limiting member. When the second partial light EL2 increases, the illumination efficiency may be reduced.

  FIG. 4 is a schematic diagram showing the relationship among the three incident ports 17, the second light source image IM2 including the first partial light EL1 and the second partial light EL2, and the intensities of the first partial light EL1 and the second partial light EL2. FIG. In FIG. 4, a region A1 indicates a region irradiated with the first partial light EL1, and a region A2 indicates a region irradiated with the second partial light EL2. The outer shape of the region A2 indicates the outer shape of the second light source image IM2. For example, even when the size of the entrance 17 is approximately the same as or larger than the size of the second light source image IM2, and the second partial light EL2 can enter the entrance 17, the second partial light EL2 The restricting member including the aperture stop 10 cannot pass. Therefore, the second partial light EL2 becomes excessive exposure light EL.

  The second reflecting member 11 reflects at least part of the second partial light EL <b> 2, reverses the optical path of the exposure light EL, and enters the first reflecting member 7. In other words, the second reflecting member 11 reflects the second partial light EL <b> 2 from the first reflecting member 7 that cannot pass through the limiting members 9 and 10 so as to return to the first reflecting member 7. Thereby, the fall of illumination efficiency is suppressed.

  FIG. 5 is a diagram for explaining the operation of the second reflecting member 11. FIG. 5 shows the positional relationship between the first reflecting member 7, the light source 5 arranged at the first focal point of the first reflecting member 7, and the second focal point (first light source image IM1). The exposure light EL emitted from the light source 5 is reflected at the first position p1 of the reflection surface 6, travels toward the second focus, and passes through the second focus. The exposure light EL that has passed through the second focal point is reflected by the reflecting surface 23 of the second reflecting member 11 disposed on the image plane of the second light source image IM2, and travels backward in the optical path of the exposure light EL, thereby causing the second focal point. And enters the first position p1 of the reflecting surface 6. The exposure light EL that has entered the first position p1 of the reflecting surface 6 is reflected at the first position p1 of the reflecting surface 6 and enters the second position p2 of the reflecting surface 6 that is different from the first position p1. The exposure light EL that has entered the second position p2 of the reflection surface 6 is reflected at the second position p2 of the reflection surface 6, travels toward the second focus, and passes through the second focus.

  Thus, the exposure light EL from the reflective surface 6 is reflected by disposing the reflective surface 23 of the second reflective member 11 at a position conjugate with the second focal point (image surface position of the second light source image IM2). It can be reflected back to the surface 6.

  FIG. 6 shows the relationship between the first reflecting member 7, the light source 5 arranged at the first focal point of the first reflecting member 7, and the second reflecting member 11 arranged near the image plane of the second light source image IM2. Show. FIG. 7 is an enlarged view of FIG. 6 and shows the vicinity of the second reflecting member 11. FIG. 6 is a diagram schematically showing the relationship among the light source 5, the first reflecting member 7, and the second reflecting member 11, and the second focus (first light source image IM1) is not shown. .

  6 and 7, the exposure light EL emitted from the light source 5 is reflected at the third position p3 of the reflecting surface 6 and travels toward the second light source image IM2. At least a part of the exposure light EL traveling toward the second light source image IM2 is incident on the reflecting surface 23 of the second reflecting member 11 disposed in the vicinity of the image surface of the second light source image IM2. The reflecting surface 23 returns the second partial light EL2 that cannot pass through the limiting members 9 and 10 out of the exposure light EL reflected by the reflecting surface 6 of the first reflecting member 7 to the first reflecting member 6. It is arranged at a position where it can be reflected.

  The second partial light EL2 of the exposure light EL incident on the reflection surface 23 is reflected by the reflection surface 23, travels backward in the optical path of the exposure light EL, and a fourth position p4 of the reflection surface 6 different from the third position p3. Is incident on. The exposure light EL that has entered the fourth position p4 of the reflecting surface 6 is reflected at the fourth position p4 of the reflecting surface 6 and enters a fifth position p5 of the reflecting surface 6 that is different from the fourth position p4. The exposure light EL that has entered the fifth position p5 of the reflecting surface 6 is reflected at the fifth position p5 of the reflecting surface 6 and travels toward the second light source image IM2.

  In the present embodiment, the light is emitted from the light source 5 to the optical path K1 of the second partial light LE2 that is emitted from the light source 5 and reflected by the reflecting surface 6 (third position p3) of the first reflecting member 7, and the first reflection. Reflected by the reflecting surface 6 (third position p3) of the member 7, reflected by the second reflecting member 11 so as to be returned to the first reflecting member 7, and reflected by the reflecting surface 6 (fourth, fifth) of the first reflecting member 7. The optical path K2 of the second partial light EL2 re-reflected at the positions p4 and p5) changes. For example, the optical path K2 changes with respect to the optical path K1 according to the shape of the reflecting surface 6 and the like. The exposure light EL reflected at the fifth position p5 of the reflection surface 6 does not enter the reflection surface 23 of the second reflection member 11, passes through the opening 11K of the second reflection member 11, and serves as the first partial light EL1. Then, the light enters the incident port 17 and is transmitted to the limiting members 9 and 10.

  Thus, according to the present embodiment, the second reflecting member 11 reflects the second partial light EL2 so as to re-enter the first reflecting member 7, thereby changing the optical path of the second partial light EL2. Thus, the second partial light EL2 can be converted into the first partial light EL1. Therefore, generation | occurrence | production of the excess exposure light EL which cannot pass through the limiting members 9 and 10 can be suppressed, and the fall of illumination efficiency can be suppressed.

  Next, an example of the operation of the exposure apparatus EX will be described. After the mask M is supported on the mask stage 1 and the substrate P is supported on the substrate stage 2, the control device 3 starts an exposure process for the substrate P. The control device 3 emits the exposure light EL from the illumination device IS, and illuminates the mask M supported by the mask stage 1 with the exposure light EL. The image of the pattern of the mask M illuminated with the exposure light EL is projected onto the substrate P supported by the substrate stage 2. In this way, the illumination device IS illuminates the mask M with the exposure light EL, and irradiates the substrate P with the exposure light EL through the pattern of the mask M and the projection device PS, thereby exposing the substrate P.

  As described above, the exposure apparatus EX is a multi-lens scan exposure apparatus. The control device 3 controls the mask stage 1 and the substrate stage 2 to illuminate the mask M with the exposure light EL while moving the mask M and the substrate P synchronously in the scanning direction, and exposes the exposure light via the pattern of the mask M. The substrate P is exposed with EL. In the present embodiment, the scanning direction (synchronous movement direction) of the substrate P is the X-axis direction, and the scanning direction (synchronous movement direction) of the mask M is also the X-axis direction. The control device 3 moves the substrate P in the X axis direction with respect to the projection region PR, and in synchronization with the movement of the substrate P in the X axis direction, moves the mask M in the X axis direction with respect to the illumination region IR. While moving, the illumination region IR is irradiated with the exposure light EL, and the exposure light EL from the mask M is irradiated onto the projection region PR via the projection device PS. Thereby, the substrate P is exposed with the exposure light EL irradiated to the projection region PR via the mask M and the projection device PS, and the pattern image of the mask M is projected onto the substrate P.

  As described above, according to the present embodiment, the optical path of the exposure light EL is reversed by reflecting at least a part of the second partial light EL2 other than the first partial light EL1 that can pass through the limiting members 9 and 10. Since the second reflecting member 11 is provided to be advanced and incident on the first reflecting member 7, even if the first reflecting member 7 generates the second partial light EL2, at least a part of the second partial light EL2 is The first partial light EL1 can be converted. According to this embodiment, the second reflecting member 11 can convert the second partial light EL2 into the first partial light EL1 by changing the optical path of the second partial light EL2. Therefore, a decrease in illumination efficiency of the illumination device IS can be suppressed, and a decrease in throughput of the exposure apparatus EX can be suppressed.

  In the present embodiment, the case where the reflecting surface 23 of the second reflecting member 11 is annular and disposed around the incident port 17 has been described as an example. It may be arranged.

Second Embodiment
Next, a second embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted. The second embodiment is a modification of the first embodiment, and the position at which the second reflecting member is arranged is different from the first embodiment.

  FIG. 8 is a diagram illustrating a part of the illumination device IS according to the second embodiment. In the present embodiment, the second reflecting member 11 is disposed in the relay optical system 13. The second reflecting member 11 is disposed between the first relay optical system 13A and the second relay optical system 13B. The second reflecting member 11 is disposed in the vicinity of the image plane of the light source image IM11 of the light source 5 formed by the first relay optical system 13A.

  Also in the present embodiment, the second partial light EL2 can be reflected back to the first reflecting member 6 and converted into the first partial light EL1.

  In the present embodiment, the reflecting surface 23 of the second reflecting member 11 may be disposed around the light source image IM11 or may be disposed at least at a part of the periphery.

  In the present embodiment, since the second reflecting member 11 is disposed at a position close to the first reflecting member 7, the distance between the second reflecting member 11 and the first reflecting member 7 can be shortened. It can suppress that the light quantity of the partial light EL2 attenuates.

<Third Embodiment>
Next, a third embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 9 is a diagram illustrating a part of the illumination device IS according to the third embodiment. In the present embodiment, the second reflecting member 11 is disposed in the relay optical system 13 and the reflecting member 11A disposed near the image plane of the first light source image IM1 of the light source 5 formed by the first reflecting member 7. And a reflecting member 11B. The reflecting member 11B is disposed in the vicinity of the rear focal plane of the optical system disposed on the first light source image IM1 side of the reflecting member 11B in the relay optical system 13.

  Also in the present embodiment, the second partial light EL2 can be reflected back to the first reflecting member 6 and converted into the first partial light EL1.

  In the present embodiment, the reflecting member 11A reflects the second partial light EL2 before the second partial light EL2 passes through the interference filter 21, so that the amount of light of the second partial light EL2 is attenuated. Can be suppressed.

  In the present embodiment, the reflecting surface 23 of the reflecting member 11A may be disposed around the light source image IM1, or may be disposed at least at a part of the periphery.

  In the first to third embodiments described above, the case where the reflecting surface 23 is disposed substantially perpendicular to the optical axis of the relay optical system 13 has been described as an example. It may be inclined with respect to the axis. For example, the reflective surface 23 may be conical.

<Fourth embodiment>
Next, a fourth embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  The fourth embodiment is a modification of the second embodiment. The second reflecting member 11R according to the fourth embodiment has a reflecting surface 23R that is at least partially curved.

  FIG. 10 is a diagram illustrating a part of the illumination device IS according to the fourth embodiment. The second reflecting member 11 </ b> R is disposed in the relay optical system 13. The second reflecting member 11R is disposed near the image plane of the light source image IM11 of the light source 5 formed by the first relay optical system 13A.

  Note that the second reflecting member 11R may be disposed in the vicinity of the image plane of the first light source image IM1, or may be disposed in the vicinity of the image plane of the second light source image IM2.

  The reflecting surface 23R includes a curved surface and has lens power. Thereby, the reflecting surface 23R can reflect the second partial light EL2 from the first reflecting member 7 in a desired direction.

  In the first to fourth embodiments described above, the light guide optical system 8 includes the relay optical system 13, but the relay optical system 13 may be omitted. Further, the entrance 17 of the light transmission element 14 may be disposed in the vicinity of the image plane of the first light source image IM1 of the light source 5 formed by the first reflecting member 7. Further, the second reflecting member 11 (11R) may be provided in at least a part of the periphery of the incident port 17 disposed in the vicinity of the image plane of the first light source image IM1.

  In each of the above-described embodiments, the light guide optical system 8 includes the light transmission element 14, but the light transmission element 14 may be omitted. Further, in each of the above-described embodiments, the case where the exposure apparatus EX is a multi-lens scan exposure apparatus having a plurality of projection optical systems PL and illumination modules IL has been described as an example. There may be one or only one illumination module IL.

  In the above-described embodiments, the first reflecting member 7 is an elliptical mirror, but is not limited to an elliptical mirror. For example, you may arrange | position the 1st reflective member which has a reflective surface which has a paraboloid in at least one part of the circumference | surroundings of the light source 5. FIG. Also by doing so, the mask M can be illuminated by the exposure light EL emitted from the light source 5.

  In each of the embodiments described above, an auxiliary optical system that forms the first light source image IM1 may be provided in cooperation with the first reflecting member 7. For example, as an auxiliary optical system, an optical system having a lens power is disposed between the first reflecting member 7 and the relay optical system 13 at a position where the exposure light EL from the first reflecting member 7 can enter. May be. The optical system can form the first light source image IM1 better in cooperation with the first reflecting member 7.

  As the substrate P in the above-described embodiment, not only a glass substrate for a display device but also a semiconductor wafer for manufacturing a semiconductor device, a ceramic wafer for a thin film magnetic head, or an original mask (reticle) used in an exposure apparatus ( Synthetic quartz, silicon wafer) or the like is applied.

  As the exposure apparatus EX, a step-and-scan type scanning exposure apparatus (scanning stepper) that scans and exposes the substrate P with the exposure light EL through the pattern of the mask M by moving the mask M and the substrate P synchronously. In addition, the pattern of the mask M is collectively exposed while the mask M and the substrate P are stationary, and is applied to a step-and-repeat type projection exposure apparatus (stepper) that sequentially moves the substrate P stepwise. Can do.

  Further, as the exposure apparatus EX, the present invention can be applied to a proximity type exposure apparatus, a mirror projection aligner, and the like.

  The present invention also relates to a twin-stage type exposure having a plurality of substrate stages as disclosed in US Pat. No. 6,341,007, US Pat. No. 6,208,407, US Pat. No. 6,262,796, and the like. It can also be applied to devices.

  Further, the present invention relates to a substrate stage for holding a substrate as disclosed in US Pat. No. 6,897,963, European Patent Application No. 1713113, etc., and a reference mark without holding the substrate. The present invention can also be applied to an exposure apparatus that includes a formed reference member and / or a measurement stage on which various photoelectric sensors are mounted. An exposure apparatus including a plurality of substrate stages and measurement stages can be employed.

  The type of the exposure apparatus EX is not limited to an exposure apparatus for manufacturing a liquid crystal display element or a display, but an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern on a substrate P, a thin film magnetic head, an image sensor (CCD) In addition, the present invention can be widely applied to an exposure apparatus for manufacturing a micromachine, MEMS, DNA chip, reticle, mask, or the like.

  In each of the above-described embodiments, a light transmissive mask in which a predetermined light shielding pattern (or phase pattern / dimming pattern) is formed on a light transmissive plate is used as the mask M. For example, as disclosed in US Pat. No. 6,778,257, a variable shaped mask (an electronic mask, an active mask, or an active mask) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed. Alternatively, an image generator may be used. The variable shaping mask includes, for example, a DMD (Digital Micro-mirror Device) which is a kind of non-light emitting image display element (spatial light modulator). The variable shaping mask is not limited to DMD, and a non-light emitting image display element described below may be used instead of DMD. Here, the non-light-emitting image display element is an element that spatially modulates the amplitude (intensity), phase, or polarization state of light traveling in a predetermined direction, and a transmissive liquid crystal modulator is a transmissive liquid crystal modulator. An electrochromic display (ECD) etc. are mentioned as an example other than a display element (LCD: Liquid Crystal Display). In addition to the DMD described above, the reflective spatial light modulator includes a reflective mirror array, a reflective liquid crystal display element, an electrophoretic display (EPD), electronic paper (or electronic ink), and a light diffraction type. An example is a light valve (Grating Light Valve).

  The exposure apparatus EX of the above-described embodiment is manufactured by assembling various subsystems including the respective constituent elements recited in the claims of the present application so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. Is done. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. When the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  As shown in FIG. 11, a device such as a semiconductor device, a display device, or an electronic device is manufactured in step 201 for designing the function / performance of the device, in step 202 for producing a mask M based on this design step, and in manufacturing a substrate P. Step 203, in accordance with the above-described embodiment, the substrate P is exposed with the exposure light EL from the pattern of the mask M, the pattern P is transferred to the substrate P, and the substrate P to which the pattern is transferred is developed to form a pattern. Device assembly including processing steps for processing the substrate P through the transfer pattern layer, such as a substrate processing step 204 including a development step for forming a transfer pattern layer having a corresponding shape on the substrate P, a dicing step, a bonding step, and a packaging step It is manufactured through step 205, inspection step 206, and the like.

  Note that the requirements of the above-described embodiments and modifications can be combined as appropriate. Some components may not be used. In addition, as long as it is permitted by law, the disclosure of all published publications and US patents related to the exposure apparatus and the like cited in the above-described embodiments and modifications are incorporated herein by reference.

  In the above-described embodiment, the illumination apparatus IS is described as being applied to the exposure apparatus EX that exposes the substrate, but is not limited to the exposure apparatus EX. For example, the illumination device IS of the present invention can be applied to, for example, an inspection device that sequentially inspects and inspects a plurality of regions to be processed provided on the substrate P with a microscope or the like.

  DESCRIPTION OF SYMBOLS 1 ... Mask stage, 2 ... Substrate stage, 3 ... Control apparatus, 5 ... Light source, 6 ... Reflecting surface, 7 ... 1st reflection member, 8 ... Light guide optical system, 9 ... Fly eye integrator (restriction member), 10 ... Aperture stop (restricting member), 11 ... second reflecting member, 13 ... relay optical system, 14 ... light transmission element, 17 ... incident aperture, 18 ... exit aperture, 23 ... reflecting surface, EL ... exposure light, EL1 ... first Partial light, EL2 ... second partial light, EX ... exposure device, IL ... illumination module, IM1 ... first light source image, IM2 ... second light source image, IS ... illumination device, M ... mask, P ... substrate, PS ... projection Equipment, PL ... Projection optical system

Claims (14)

An illumination device that illuminates an object with illumination light emitted from a light source,
A first reflecting member having a concave curved reflecting surface disposed at a part of the periphery of the light source, and reflecting the illumination light by the reflecting surface to form a first light source image of the light source ;
A light guide optical system for guiding the illumination light reflected by the first reflecting member to the object;
A limiting member that is provided in the light guide optical system, allows a part of the illumination light to pass therethrough, and restricts at least one of an illumination range and a numerical aperture of the illumination light on the object;
Provided in at least one of the vicinity of the position where the first light source image is formed and the vicinity of the position optically conjugate with the position where the first light source image is formed , and the first reflecting member reflects A second part of the illumination light that reflects at least a part of the second partial light other than the first partial light that can pass through the limiting member, and reversely travels the optical path of the illumination light to enter the first reflective member. A reflective member;
Equipped with a,
Wherein the return light is returned to the second reflection from said member first reflecting member, it passes the restriction member is reflected by the first reflecting member illumination device. Before Kishirubeko optical system includes a relay optical system for forming a second light source image and relays the first light source image optically,
The lighting device according to claim 1, wherein the second reflecting member is disposed in the vicinity of at least one of the first light source image and the second light source image. Before Symbol the second reflecting member, the lighting apparatus according to claim 1, wherein is arranged near the image plane of the first light source image. Before Kishirubeko optical system includes a relay optical system for optically relay the illumination light emitted from the first light source image,
The lighting device according to claim 1, wherein the second reflecting member is disposed in the relay optical system.   5. The illumination device according to claim 4, wherein the second reflecting member is disposed in the vicinity of a rear focal plane of the optical system disposed on the first light source image side of the second reflecting member in the relay optical system. Before Kishirubeko optical system is incident to the first light source image and the relay optical system for forming a second light source image optically relays, from the light inlet disposed near the image plane of the second light source image An optical transmission element that transmits the illumination light,
The lighting device according to claim 1, wherein the second reflecting member is provided at least at a part around the entrance. Before Kishirubeko optical system includes an optical transmission element for transmitting the illumination light incident from the light inlet disposed near the image plane of the first light source image,
The lighting device according to claim 1, wherein the second reflecting member is provided at least at a part around the entrance. A plurality of the light sources are provided, and a plurality of the incident portions are provided according to the light sources,
The illumination device according to claim 6 or 7, wherein the light guide optical system synthesizes the illumination light incident on the plurality of entrances and guides the illumination light to the object.   The illuminating device according to claim 2, further comprising an auxiliary optical system that forms the first light source image in cooperation with the first reflecting member.   An illumination device that illuminates an object with illumination light emitted from a plurality of light sources,
  A plurality of first reflecting members having a concave curved reflecting surface disposed in a part of the periphery of the light source, and reflecting the illumination light by the reflecting surface;
  A light guide optical system comprising a plurality of incident apertures corresponding to the plurality of light sources, combining the illumination light incident on the plurality of incident apertures, and guiding the illumination light to the object;
  A limiting member that is provided in the light guide optical system, allows a part of the illumination light to pass therethrough, and restricts at least one of an illumination range and a numerical aperture of the illumination light on the object;
  Of the illumination light that is provided in the light guide optical system and reflected by the first reflecting member, reflects at least a part of the second partial light other than the first partial light that can pass through the limiting member, and the illumination A second reflecting member that reversely travels an optical path of light and enters the first reflecting member;
With
  The first reflecting member reflects the illumination light to form a first light source image of the light source;
  The light guide optical system includes a relay optical system that optically relays the first light source image to form a second light source image, and the incident light that is incident from an incident port disposed in the vicinity of the image plane of the second light source image. An optical transmission element that transmits illumination light,
  The second reflection member is a lighting device provided at least at a part around the entrance. The concave curved reflecting surface has two focal points,
Wherein the first reflecting member, the lighting apparatus according to any one of claims 1-10 for the focus closer to the reflecting surface of the two focal are arranged to match the light source. A first support mechanism for supporting a pattern holding member on which a pattern is formed;
A second support mechanism for supporting the photosensitive substrate;
Wherein the pattern holding member illuminated, the exposure apparatus comprising an illumination device according to any one of claims 1 to 11 for exposing the photosensitive substrate through the pattern. A projection optical system that projects an image of the pattern of the pattern holding member supported by the first support mechanism onto the photosensitive substrate supported by the second support mechanism;
The exposure apparatus according to claim 12 , wherein the illumination apparatus exposes the photosensitive substrate through the projection optical system. A transfer step of transferring the pattern to the photosensitive substrate using the exposure apparatus according to claim 12 or 13 ,
Developing the photosensitive substrate to which the pattern has been transferred, and forming a transfer pattern layer having a shape corresponding to the pattern on the photosensitive substrate;
And a processing step of processing the photosensitive substrate through the transfer pattern layer.

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