JP2010118383A - Illumination apparatus, exposure apparatus and device manufacturing method - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide an illumination apparatus capable of suppressing deterioration in the efficiency of illumination. <P>SOLUTION: The illumination apparatus irradiates: an object with an illumination light to illuminate the object. The illumination apparatus includes an illumination optical system including a transmissive optical element having a polygonal transmitting surface capable of transmitting an illumination light and irradiating the object with an illumination light transmitting the transmissive optical element and forming an illumination region of a shape corresponding to the polygon on the object; and an introducing optical system for introducing a plurality of illumination lights emitted from different light sources from the in-plane of the transmissive surface or a position centered at a predetermined point in a conjugate region substantially conjugated with the transmissive surface into the illumination optical system per illumination light. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to an illumination apparatus, an exposure apparatus, and a device manufacturing method.

An exposure apparatus used in a microdevice manufacturing process has an illumination apparatus that illuminates a mask with exposure light, and exposes the substrate with exposure light through the mask. The following patent document discloses an example of a technique related to a lighting device having a plurality of light sources.
JP 05-045605 A JP 07-135149 A

  One of the performances required for the lighting device is suppression of a decrease in lighting efficiency. For example, an illumination device used in an exposure apparatus is required to illuminate a mask with sufficient illuminance while suppressing loss of exposure light. If the illumination apparatus cannot illuminate the mask with sufficient illuminance, the throughput of the exposure apparatus may be reduced (exposure processing is delayed), and productivity may be reduced.

  An object of this invention is to provide the illuminating device, exposure apparatus, and device manufacturing method which can suppress the fall of illumination efficiency.

  According to a first aspect of the present invention, in an illumination device that illuminates an object by illuminating illumination light, the illumination device includes a transmissive optical element having a polygonal transmission surface through which the illumination light can be transmitted, An illumination optical system that irradiates the transmitted illumination light to form an illumination area having a shape corresponding to the polygonal shape on the object, and a plurality of illumination lights emitted from different light sources for each illumination light. There is provided an illuminating device including an introducing optical system that introduces the irradiation optical system from a position centered on a predetermined point in a transmissive surface or a conjugate region that is substantially conjugated with the transmissive surface.

  According to the second aspect of the present invention, the first support mechanism that supports the pattern holding member on which the pattern is formed, the second support mechanism that supports the photosensitive substrate, the pattern holding member is illuminated, and the pattern is And an illumination device according to a first aspect for exposing the photosensitive substrate via the exposure device.

  According to the third aspect of the present invention, using the exposure apparatus of the second aspect, a transfer step of transferring the pattern to the photosensitive substrate, developing the photosensitive substrate to which the pattern has been transferred, and developing the pattern There is provided a device manufacturing method including a developing step of forming a transfer pattern layer having a shape corresponding to the above on the photosensitive substrate, and a processing step of processing the photosensitive substrate through the transfer pattern layer.

  ADVANTAGE OF THE INVENTION According to this invention, the illuminating device, exposure apparatus, and device manufacturing method which can suppress the fall of illumination efficiency are provided.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings, but the present invention is not limited thereto. In the following description, an XYZ orthogonal coordinate system is set, and the positional relationship of each member will be described with reference to this XYZ orthogonal coordinate system. A predetermined direction in the horizontal plane is defined as an X-axis direction, a direction orthogonal to the X-axis direction in the horizontal plane is defined as a Y-axis direction, and a direction orthogonal to each of the X-axis direction and the Y-axis direction (that is, a vertical direction) is defined as a Z-axis direction. In addition, the rotation (inclination) directions around the X axis, the Y axis, and the Z axis are the θX, θY, and θZ directions, respectively.

<First Embodiment>
A first embodiment will be described. FIG. 1 is a schematic block diagram that shows an example of an exposure apparatus EX that includes an illumination apparatus IL according to the first embodiment.

  In FIG. 1, an exposure apparatus EX includes a mask stage 51 that can move while supporting a mask M, a substrate stage 52 that can move while supporting a substrate P, and an exposure light EL on the mask M supported by the mask stage 51. , And an illumination device IL that illuminates the mask M, a projection optical system PL that projects an image of the pattern of the mask M illuminated by the exposure light EL onto the substrate P supported by the substrate stage 52, and exposure. And a control device 53 that controls the operation of the entire device EX.

  In this embodiment, the mask M includes a reticle on which a device pattern projected onto the substrate P is formed, and is formed of a light-transmitting plate such as a glass plate and a light-shielding material such as chromium on the plate. A light shielding pattern. The pattern formed on the light-transmitting plate is not limited to the light-shielding pattern, and may be at least one of a phase pattern and a dimming pattern. In this embodiment, a transmissive mask is used as the mask M, but a reflective mask may be used.

  The substrate P includes a photosensitive substrate for manufacturing a device, and includes, for example, a base material such as a glass plate and a photosensitive film formed on the base material.

  The illumination device IL can form an illumination region IR on the mask M supported by the mask stage 51. The illumination area IR includes an irradiation area of the exposure light EL emitted from the illumination device IL. The illumination device IL irradiates the illumination area IR with the exposure light EL, and illuminates at least a part of the mask M arranged in the illumination area IR with the exposure light EL. In the present embodiment, for example, bright lines (g line, h line, i line) emitted from a mercury lamp are used as the exposure light EL emitted from the illumination device IL.

  The mask stage 51 is movable with respect to the illumination region IR while supporting the mask M. In the present embodiment, the mask stage 51 supports the mask M so that the lower surface (pattern forming surface) of the mask M and the XY plane are substantially parallel. In the present embodiment, the mask stage 51 is movable in three directions including the X axis, the Y axis, and the θZ direction while supporting the mask M by the operation of a drive system such as a linear motor.

  The projection optical system PL can form a projection region PR on the substrate P supported by the substrate stage 52. Projection region PR includes an irradiation region of exposure light EL emitted from projection optical system PL. The projection optical system PL projects an image of the pattern of the mask M supported by the mask stage 51 onto the substrate P supported by the substrate stage 52. The projection optical system PL irradiates the projection region PR with the exposure light EL, and projects an image of the pattern of the mask M onto at least a part of the substrate P disposed in the projection region PR.

  The substrate stage 52 is movable with respect to the projection region PR while supporting the substrate P. In the present embodiment, the substrate stage 52 holds the substrate P so that the surface (exposure surface) of the substrate P and the XY plane are substantially parallel. In the present embodiment, the substrate stage 52 moves in six directions of the X axis, Y axis, Z axis, θX, θY, and θZ directions while holding the substrate P by the operation of a drive system such as a linear motor. Is possible.

  In the present embodiment, the positional information of the mask stage 51 and the substrate stage 52 is measured by an interferometer system (not shown). When performing exposure processing of the substrate P or when performing predetermined measurement processing, the position control of the mask stage 51 (mask M) and the substrate stage 52 (substrate P) is performed based on the measurement result of the interferometer system. Executed.

  Next, the illumination device IL will be described. In FIG. 1, an illuminating device IL includes an irradiation optical system 40 that forms an illumination area IR on a mask M, and first and second exposure lights EL1 and EL2 emitted from the first and second light sources 1A and 1B. An introduction optical system 30 that introduces the first and second exposure lights EL1 and EL2 into the irradiation optical system 40 is provided. The introduction optical system 30 includes a first optical system 31 that introduces the first exposure light EL1 generated from the first light source 1A to the irradiation optical system 40, and an irradiation optical system 40 that emits the second exposure light EL2 generated from the second light source 1B. And a second optical system 32 to be introduced.

  The first optical system 31 includes an elliptic mirror 2A that reflects the first exposure light EL1 generated from the first light source 1A, a dichroic mirror 3A that reflects at least part of the first exposure light EL1 from the elliptic mirror 2A, and a dichroic. A relay device 7A including a shutter device 4A capable of blocking the progress of the first exposure light EL1 from the mirror 3A, a collimating lens 5A to which the first exposure light EL1 from the dichroic mirror 3A is supplied, and a condenser lens 6A; An interference filter 8A, a condensing lens 9A to which the first exposure light EL1 from the relay optical system 7A is supplied, and a mirror 10A for reflecting the first exposure light EL1 from the condensing lens 9A are provided.

  The second optical system 32 includes an elliptical mirror 2B that reflects the second exposure light EL2 generated from the second light source 1B, a dichroic mirror 3B that reflects at least part of the second exposure light EL2 from the elliptical mirror 2B, and a dichroic. A shutter device 4B capable of blocking the progress of the second exposure light EL2 from the mirror 3B, a relay optical system 7B including a collimator lens 5B and a condenser lens 6B to which the second exposure light EL2 from the dichroic mirror 3B is supplied; An interference filter 8B and a light guide unit 10B including an optical fiber 9B to which the second exposure light EL2 from the relay optical system 7B is supplied.

  In the present embodiment, the first light source 1A includes an ultrahigh pressure mercury lamp. The first light source 1A is disposed at the first focal position of the elliptical mirror 2A. At least a part of the first exposure light EL1 emitted from the first light source 1A is reflected by the dichroic mirror 3A and collected at the second focal position of the elliptical mirror 2A. The shutter device 4A can be arranged in the vicinity of the second focal position of the elliptical mirror 2A. The dichroic mirror 3A reflects light in a specific wavelength region out of incident light. The light emitted from the first light source 1A and reflected by the dichroic mirror 3A enters the collimating lens 5A of the relay optical system 7A. The interference filter 8A is disposed between the collimating lens 5A and the condenser lens 6A. The interference filter 8A is disposed in the vicinity of the pupil plane of the relay optical system 7A. The interference filter 8A passes only light in a predetermined wavelength region out of the light supplied from the collimator lens 5A and supplies the light to the condenser lens 6A. The condensing lens 6A condenses the first exposure light EL1 from the interference filter 8A at the position 11, and forms an image of the first light source 1A at the position 11.

  The first exposure light EL1 condensed at the position 11 is diverged and then supplied to the condenser lens 9A. The condensing lens 9A condenses the first exposure light EL1 from the position 11 to the position 12, and forms an image of the first light source 1A at the position 12. In the following description, the surface including the position 12 is appropriately referred to as a secondary light source surface 13. In the present embodiment, the first optical system 31 forms an image of the first light source 1 </ b> A on the secondary light source surface 13.

  The structures and positional relationships of the second light source 1B, the elliptical mirror 2B, the dichroic mirror 3B, the shutter device 4B, the relay optical system 7B including the collimating lens 5B and the condenser lens 6B, and the interference filter 8B of the second optical system 32 are as follows. Since the first light source 1A, the elliptical mirror 2A, the dichroic mirror 3A, the shutter device 4A, the relay optical system 7A including the collimating lens 5A and the condensing lens 6A, and the interference filter 8A are similar in structure and positional relationship, description thereof will be given. Is omitted. The condensing lens 6B of the second optical system 32 condenses the second exposure light EL2 from the interference filter 8B at the position 14, and forms an image of the second light source 1B at the position 14.

  The light guide unit 10 </ b> B includes an incident member 15 having an incident end face 15 </ b> B and an optical fiber 9 </ b> B connected to the incident member 15. The incident end face 15B is disposed in the vicinity of the position 14, that is, in the vicinity of the image of the second light source 1B formed by the relay optical system 7B. The second exposure light EL2 emitted from the relay optical system 7B is incident on the incident end face 15B.

  The second exposure light EL2 incident on the incident end face 15B is guided to the optical fiber 9B. The light guide unit 10B has a plurality of emission end faces 16B of the optical fiber 9B, and the second exposure light EL2 incident from the incident end face 15B is emitted from each of the plurality of emission end faces 16B. In the present embodiment, the second optical system 32 divides the second exposure light EL2 generated from the second light source 1B into a plurality of second exposure light EL2 using the light guide unit 10B, and from each exit end face 16B. Eject.

  In the present embodiment, each of the emission end surfaces 16 </ b> B is disposed on the secondary light source surface 13. The second optical system 32 including the optical fiber 9B guides the second exposure light EL2 to the secondary light source surface 13 through the optical fiber 9B.

  Thus, in the present embodiment, the first exposure light EL1 generated from the first light source 1A is guided to the secondary light source surface 13 by the first optical system 31, and the second exposure light generated from the second light source 1B. EL 2 is guided to the secondary light source surface 13 by the second optical system 32. The first and second exposure lights EL1 and EL2 generated from the first and second light sources 1A and 1B and guided to the secondary light source surface 13 by the first and second optical systems 31 and 32 are applied to the irradiation optical system 40. be introduced. In the following description, the first and second exposure lights EL1 and EL2 introduced from the secondary light source surface 13 to the irradiation optical system 40 are appropriately referred to as exposure light EL.

  The irradiation optical system 40 includes a collimating lens 17 to which exposure light EL from the secondary light source surface 13 is supplied, a fly-eye lens 18 to which exposure light EL from the collimating lens 17 is supplied, and exposure from the fly-eye lens 18. A condenser lens 19 that is supplied with the light EL and that irradiates the mask M with the exposure light EL is provided.

  The collimating lens 17 converts the exposure light EL (diverging light) from the secondary light source surface 13 into substantially parallel exposure light EL (parallel light), and supplies it to the fly-eye lens 18.

  The fly eye lens 18 has a plurality of element lenses 18E. The element lens 18 </ b> E has an incident end surface 20 on which the exposure light EL from the collimating lens 17 is incident, and an exit end surface 21 disposed on the opposite side of the incident end surface 20. A plurality of element lenses 18E are arranged in the XY plane. In the present embodiment, a plurality of element lenses 18E are arranged so that the outer shape of the fly-eye lens 18 in the XY plane is substantially square.

  The exposure light EL supplied from the collimating lens 17 and incident on the fly-eye lens 18 is divided into wavefronts by a plurality of element lenses 18E. Images of the first and second light sources 1A and 1B are formed on the rear focal planes of the plurality of element lenses 18E, and a secondary light source is formed by the images of the plurality of first and second light sources 1A and 1B. Is done. That is, a substantial surface light source is formed on the rear focal plane of the fly-eye lens 18. In the present embodiment, the rear focal plane of the fly-eye lens 18 (element lens 18E) exists in the vicinity of the exit end face 21.

  The condenser lens 19 collects the exposure light EL supplied from the fly eye lens 18 (secondary light source) and irradiates the pattern formation surface of the mask M with the exposure light EL. The exposure light EL emitted from each element lens 18E of the fly-eye lens 18 is applied to the pattern forming surface of the mask M in a superimposed manner via the condenser lens 19.

  Each element lens 18E of the fly-eye lens 18 is a transmissive optical element that can transmit the exposure light EL. The exposure light EL incident on the incident end face 20 and transmitted through the incident end face 20 passes through the element lens 18E, passes through the exit end face 21, and exits from the exit end face 21. In the present embodiment, the element lens 18E has a polygonal cross section, and the incident end face 20 and the exit end face 21 are polygonal. Thus, the element lens 18E has the polygonal entrance end face 20 and exit end face 21 through which the exposure light EL can be transmitted.

  In the present embodiment, each element lens 18E of the fly-eye lens 18 functions as an area setting unit that sets the illumination area IR of the exposure light EL on the pattern forming surface of the mask M. In the present embodiment, the element lens 18E sets the illumination area IR on the pattern formation surface (XY plane) of the mask M to a polygonal shape. The shape of the illumination region IR corresponds to the shape of the incident end face 20 of the element lens 18E. In the present embodiment, the shape of the illumination region IR corresponding to the polygonal shape of the incident end face 20 is a similar shape to the polygonal shape.

  The irradiation optical system 40 irradiates the mask M with the exposure light EL transmitted through the fly-eye lens 18 via the condenser lens 19, and has an illumination region having a shape corresponding to the polygonal shape of the incident end face 20 (similar shape to the polygonal shape). An IR is formed on the mask M.

  In the present embodiment, the element lens 18E sets the illumination area IR on the pattern formation surface (XY plane) of the mask M to a rectangular shape. In the present embodiment, the illumination region IR has an edge (edge) substantially parallel to the X-axis direction and an edge (edge) substantially parallel to the Y-axis direction.

  FIG. 2 is a plan view showing an example of the secondary light source surface 13. In the present embodiment, the secondary light source surface 13 is a substantially conjugate surface with respect to the emission end surface 21 of the fly-eye lens 18 (element lens 18E). As described above, in the present embodiment, images of the first and second light sources 1A and 1B are formed on the rear focal plane of the fly-eye lens 18 (element lens 18E), and the secondary light source surface 13 is emitted. This is a conjugate plane with respect to the rear focal plane of the fly eye lens 18 in the vicinity of the end face 21.

  As shown in FIG. 2, the first and second exposure lights EL1 and EL2 generated from the first and second light sources 1A and 1B are out of the secondary light source surface 13 by the first and second optical systems 31 and 32, respectively. The light is guided into a conjugate region 23 that is substantially conjugated with each exit end face 21 of the plurality of element lenses 18E.

  The conjugate region 23 has a shape corresponding to the polygonal shape of the incident end face 20. The conjugate region 23 has a similar shape to the polygonal shape of the incident end face 20. In the present embodiment, the conjugate region 23 has a rectangular shape. Almost all of the exposure light EL that is guided to the conjugate region 23 by the introduction optical system 30 including the first and second optical systems 31 and 32 and passes through the conjugate region 23 can be supplied to the incident end face 20.

  The first optical system 31 forms an image of the first light source 1 </ b> A in the conjugate region 23. The first optical system 31 can guide the first exposure light EL1 generated from the first light source 1A to the conjugate region 23. The first optical system 31 can guide the first exposure light EL1 generated from the first light source 1A to a position around a predetermined point C in the conjugate region 23.

  The second optical system 32 can guide the second exposure light EL2 generated from the second light source 1B to the conjugate region 23. The second optical system 32 guides the second exposure light EL2 generated from the second light source 1B to a position around a predetermined point C in the conjugate region 23. A plurality of emission end faces 6B of the optical fiber 9B are provided, and the second optical system 32 divides the second exposure light EL2 generated from the second light source 1B through the optical fiber 9B and centers on a predetermined point C. It leads to a different position of the conjugate region 23.

  In the present embodiment, the predetermined point C is an intersection between the optical axis of the irradiation optical system 40 and the conjugate region 23. In the present embodiment, the optical axis of the irradiation optical system 40 is equal to the optical axis of the condenser lens 19 (coaxial). In the present embodiment, the predetermined point C is the center point of the conjugate region 23. That is, in the present embodiment, the center point of the conjugate region 23 and the optical axis of the irradiation optical system 40 intersect.

  The position centered on the predetermined point C is at least one of a position including the predetermined point C, a position on the circumference centered on the predetermined point C, and a position on each vertex of a polygon centered on the predetermined point C. including. As shown in FIG. 2, in the present embodiment, the first optical system 31 guides the first exposure light EL1 generated from the first light source 1A to substantially the center of the conjugate region 23 including the predetermined point C. In the present embodiment, in the conjugate region 23, the irradiation region (the light source image of the first light source 1A) irradiated with the first exposure light EL1 has a substantially circular shape, and the center of the irradiation region of the first exposure light EL1. , Substantially coincides with the predetermined point C.

  The second optical system 32 divides the second exposure light EL2 generated from the second light source 1B and guides it to each of a plurality of positions around the first exposure light EL1 in the conjugate region 23. As described above, in the present embodiment, the light guide unit 10B has a plurality of emission end faces 16B of the optical fibers 9B. In the present embodiment, the light guide unit 10B has four exit end faces 16B of the optical fiber 9B. Accordingly, the second exposure light EL2 emitted from each of the four emission end faces 16B is supplied to each of the four positions around the first exposure light EL1 in the conjugate region 23. The second optical system 32 irradiates the second exposure light EL <b> 2 from each exit end face 16 </ b> B, and outputs the second exposure light at a plurality of (four) positions around the irradiation region of the first exposure light EL <b> 1 in the conjugate region 23. An irradiation area of EL2 is formed. Further, in the present embodiment, the second optical system 32 guides the plurality of divided second exposure lights EL2 in the conjugate region 23 to a rotationally symmetric position with respect to the predetermined point C.

  In the present embodiment, the emission end face 16B has a substantially triangular shape, and in the conjugate region 23, each of the irradiation regions irradiated with the second exposure light EL2 has a substantially triangular shape. The irradiation areas of the four second exposure lights EL2 have substantially the same shape and size (congruent). In the present embodiment, the second optical system 32 has a substantially circular first exposure light EL1 such that two sides intersecting at right angles to the irradiation region of the second exposure light EL2 are along the corner of the conjugate region 23. The second exposure light EL2 is irradiated around the irradiation region.

  Further, in the present embodiment, as shown in FIG. 2, the introduction optical system 30 including the first and second optical systems 31 and 32 has a conjugate region 23 in which the first exposure light EL1 and the second exposure light EL2 respectively. The first and second exposure lights EL1 and EL2 are supplied to the conjugate region 23 so as not to overlap each other.

  The first exposure light EL1 guided to the conjugate region 23 by the first optical system 31 is introduced into the irradiation optical system 40, and the second exposure light EL2 guided to the conjugate region 23 by the second optical system 32 is applied to the irradiation optics. Introduced into system 40. The exposure light EL (first and second exposure light EL1, EL2) introduced into the irradiation optical system 40 via the conjugate region 23 by the introduction optical system 30 including the first and second optical systems 31, 32 is a mask stage. The mask 51 supported by 51 is irradiated.

  Thus, in this embodiment, the introduction optical system 30 converts the first and second exposure light beams EL1 and EL2 generated from the different first and second light sources 1A and 1B into the first and second optical systems 31 and 32, respectively. Are introduced into the irradiation optical system 40 from a position centered on a predetermined point C in the conjugate region 23 for each of the first and second exposure lights EL1, EL2.

  In addition, the introduction optical system 30 divides the second exposure light EL2 generated from the second light source 1B into a plurality of second exposure lights EL2 using the second optical system 32, and the plurality of second exposure lights EL2 are divided. The light is introduced into the irradiation optical system 40 from different positions in the conjugate region 23 with the predetermined point C as the center. The second optical system 32 introduces the plurality of second exposure light beams EL2 into the irradiation optical system 40 from a rotationally symmetric position with respect to the predetermined point C.

  In the present embodiment, the introduction optical system 30 introduces the first exposure light EL1 and the second exposure light EL2 from different positions in the conjugate region 23 to the irradiation optical system 40. The introduction optical system 30 introduces the first exposure light EL1 from the center of the conjugate region 23 to the irradiation optical system 40, and introduces the second exposure light EL2 from the periphery of the first exposure light EL1 to the irradiation optical system 40. .

  Next, an example of the operation of the exposure apparatus EX according to the present embodiment will be described. After the mask M is supported on the mask stage 51 and the substrate P is supported on the substrate stage 52, the control device 53 starts an exposure process for the substrate P. The control device 53 emits the exposure light EL from the illumination device IL, and illuminates the mask M supported by the mask stage 51 with the exposure light EL. The image of the pattern of the mask M illuminated with the exposure light EL is projected onto the substrate P supported by the substrate stage 52. Thus, in the present embodiment, the illumination device IL illuminates the mask M, irradiates the substrate P with the exposure light EL via the pattern of the mask M and the projection optical system PL, and exposes the substrate P. To do.

  The exposure apparatus EX of the present embodiment is a scanning exposure apparatus that projects an image of the pattern of the mask M onto the substrate P while synchronously moving the mask M and the substrate P in a predetermined scanning direction. The control device 53 controls the mask stage 51 and the substrate stage 52 to illuminate the mask M with the exposure light EL while moving the mask M and the substrate P synchronously in the scanning direction, and exposes the exposure light via the pattern of the mask M. The substrate P is exposed with EL. In the present embodiment, the scanning direction (synchronous movement direction) of the substrate P is the X-axis direction, and the scanning direction (synchronous movement direction) of the mask M is also the X-axis direction. The control device 53 moves the substrate P in the X-axis direction relative to the projection region PR, and in synchronization with the movement of the substrate P in the X-axis direction, moves the mask M in the X-axis direction relative to the illumination region IR. While moving, the exposure region EL is irradiated with the exposure light EL, and the exposure light EL from the mask M is irradiated onto the projection region PR via the projection optical system PL. Thereby, the substrate P is exposed with the exposure light EL irradiated to the projection region PR via the mask M and the projection optical system PL, and an image of the pattern of the mask M is projected onto the substrate P.

  As described above, according to the present embodiment, the first and second exposure lights EL1 and EL2 emitted from the first and second light sources 1A and 1B are provided for each of the first and second exposure lights EL1 and EL2. Since the light is introduced into the irradiation optical system 40 from a position centering on the predetermined point C of the conjugate region 23 substantially conjugate with each incident end face 20 of the plurality of element lenses 18E, a decrease in illumination efficiency is suppressed, and the first and first The mask M can be illuminated with sufficient illuminance while suppressing the loss of the two exposure lights EL1, EL2. Therefore, the substrate P can be exposed satisfactorily.

  In the present embodiment, the introduction optical system 30 introduces the first and second exposure light beams EL1 and EL2 from the position centered on the predetermined point C in the conjugate region 23. A decrease in illumination performance of the illumination device IL, such as a decrease in telecentricity of the illumination device IL, can be suppressed. In the present embodiment, the introduction optical system 30 introduces the first and second exposure light beams EL1 and EL2 from the rotationally symmetric position with respect to the predetermined point C to the irradiation optical system 40. Even when the mask M is illuminated using only the exposure light from one of the second light sources 1A and 1B, a decrease in illumination performance can be suppressed.

  In the above-described embodiment, the exit end face 16B of the optical fiber 9B is disposed in substantially the same plane as the conjugate region 23 (secondary light source surface 13). For example, as shown in FIG. The exit end face 16B of 9B can be formed so as to be inclined with respect to the extending direction of the optical fiber 9B, and can be disposed in the conjugate region 23 (secondary light source surface 13). By doing so, for example, the first exposure light EL1 from the first light source 1A is suppressed from being blocked by the optical fiber 9B, and is smoothly supplied to the conjugate region 23.

  In the above-described embodiment, the irradiation region of the first exposure light EL1 in the conjugate region 23 is formed so as to include the predetermined point C, and the irradiation region of the second exposure light EL2 is relative to the predetermined point C. Although the case where it is formed at four places around the irradiation area of the first exposure light EL1 that is symmetrical has been described as an example, the irradiation area of the second exposure light EL2 is, for example, as shown in FIG. May be formed at two locations around the irradiation region of the first exposure light beam EL1 that are symmetrical with respect to the first exposure light beam EL1.

  Further, as shown in FIG. 5, the irradiation regions of the first exposure light EL1 in the conjugate region 23 may be arranged at four places around the predetermined point C. In the example shown in FIG. 5, the irradiation areas of the four first exposure lights EL1 have substantially the same shape (triangular shape) and size (congruent), and are arranged at positions symmetrical with respect to the predetermined point C.

  In the above-described embodiment, the case where the second exposure light EL2 is divided into a plurality of second exposure light EL2 and then supplied to the conjugate region 23 has been described as an example. For example, as shown in FIG. In addition, the second exposure light beam EL <b> 2 may be applied to an annular region centered on the predetermined point C in the conjugate region 23. In the example shown in FIG. 6, the second exposure light EL <b> 2 is applied to the rectangular annular region, but may be applied to the circular annular region. Further, in the example shown in FIG. 6, the second exposure light EL2 is applied to one annular region, but may be applied to a plurality of annular regions such as a double annular region. Further, the first exposure light EL <b> 1 may be applied to an annular region centered on the predetermined point C in the conjugate region 23.

<Second Embodiment>
Next, a second embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 7 is a diagram illustrating an example of the illumination device IL2 according to the second embodiment. A characteristic part of the second embodiment different from the first embodiment described above is that the second optical system 32B guides the second exposure light EL2 emitted from the emission end face 16B of the optical fiber 9B to the conjugate region 23. The optical system 24B is provided.

  In FIG. 7, the light guide optical system 24B reflects the second exposure light EL2 from the condensing lens 25B supplied with the second exposure light EL2 emitted from the emission end face 16B of the optical fiber 9B, and the condensing lens 25B. And a mirror 26B that leads to the conjugate region 23. In the present embodiment, the emission end face 16 </ b> B is disposed substantially perpendicular to the secondary light source surface 13. In the present embodiment, four exit end faces 16B are arranged, and four light guide optical systems 24B are arranged according to the exit end face 16B. For example, as described with reference to FIG. 2, irradiation regions of the first and second exposure light beams EL1 and EL2 are formed in the conjugate region 23 in a predetermined positional relationship.

  As described above, also in this embodiment, a decrease in illumination efficiency is suppressed, and the mask M can be illuminated with sufficient illuminance while suppressing the loss of the first and second exposure lights EL1, EL2. In the present embodiment, since the optical fiber 9B (exit end face 16B) is arranged away from the conjugate region 23, for example, the first exposure light EL1 from the first light source 1A is blocked by the optical fiber 9B. Suppressed and supplied smoothly to the conjugate region 23.

<Third Embodiment>
Next, a third embodiment will be described. In the following description, the same or equivalent components as those of the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.

  FIG. 8 is a diagram illustrating an example of the illumination device IL3 according to the third embodiment. In each of the above-described embodiments, the case where a wavefront division type fly-eye lens is used as the optical integrator has been described as an example. A characteristic part of the third embodiment different from the above-described embodiments is that an internal reflection type rod-shaped optical element (rod integrator) 27 is used as an optical integrator.

  In FIG. 8, the irradiation optical system 40C includes a collimating lens 17A to which the exposure light EL from the secondary light source surface 13 is supplied, a condenser lens 17B to which the exposure light EL from the collimating lens 17A is supplied, and a collimating lens 17A. Are provided with a rod integrator 27 to which the exposure light EL is supplied, and a condenser lens 19 to which the exposure light EL is supplied from the rod integrator 27 and irradiates the mask M with the exposure light EL.

  The rod integrator 27 has an incident end face 28 on which the exposure light EL from the condenser lens 17B is incident, and an exit end face 29 arranged on the opposite side of the incident end face 28.

  The rod integrator 27 is a transmissive optical element that can transmit the exposure light EL. The exposure light EL that is incident on the incident end face 28 and is transmitted through the incident end face 28 is reflected inside the rod integrator 27, is transmitted through the exit end face 29, and is emitted from the exit end face 29. In the present embodiment, the rod integrator 27 has a polygonal cross section, and the incident end face 28 and the exit end face 29 are polygonal. As described above, the rod integrator 27 has the polygonal entrance end face 28 and exit end face 29 through which the exposure light EL can be transmitted.

  In the present embodiment, the rod integrator 27 functions as an area setting unit that sets the illumination area IR of the exposure light EL on the pattern forming surface of the mask M. In the present embodiment, the rod integrator 27 sets the illumination area IR on the pattern formation surface (XY plane) of the mask M to a polygonal shape. The shape of the illumination region IR corresponds to the shapes of the incident end surface 28 and the exit end surface 29 of the rod integrator 27. In the present embodiment, the shape of the illumination region IR corresponding to the polygonal shapes of the incident end surface 28 and the emission end surface 29 is a similar shape to the polygonal shape.

  In the present embodiment, the rod integrator 27 sets the illumination region IR on the pattern forming surface (XY plane) of the mask M to a rectangular shape. In the present embodiment, the illumination region IR has an edge (edge) substantially parallel to the X-axis direction and an edge (edge) substantially parallel to the Y-axis direction.

  In the present embodiment, the secondary light source surface 13 (conjugate region 23) is a substantially conjugate surface with respect to the emission end surface 29 of the rod integrator 27.

  The introduction optical system 30 introduces the first and second exposure lights EL1 and EL2 from the conjugate region 23 substantially conjugate with the incident end face 28 of the rod integrator 27 to the irradiation optical system 40C. Almost all of the exposure light EL that is guided to the conjugate region 23 by the introduction optical system 30 including the first and second optical systems 31 and 32 and passes through the conjugate region 23 can be supplied to the incident end face 28.

  As described above, also in this embodiment, a decrease in illumination efficiency is suppressed, and the mask M can be illuminated with sufficient illuminance while suppressing the loss of the first and second exposure lights EL1, EL2.

  In the present embodiment, the introduction optical system 30 may introduce the first and second exposure lights EL1 and EL2 directly into the incident end face 28 of the rod integrator 27. That is, for example, the collimating lens 17A and the condensing lens 17B are omitted, and the incident end surface 28 of the rod integrator 27 is disposed in a plane including the position 12 where the image of the first light source 1A is formed (in the secondary light source surface 13). You may arrange.

  In the first to third embodiments described above, an example in which an optical fiber is used when dividing the exposure light emitted from the light source into a plurality of partial exposure lights has been described. For example, a prism element as shown in FIG. You may divide using 60. In FIG. 9, the prism element 60 has a so-called pyramid shape, and includes a first reflecting surface 61, a second reflecting surface 62, a third reflecting surface 63, and a fourth reflecting surface 64. For example, the second exposure light EL <b> 2 from the second light source 1 </ b> B is irradiated toward the vertex 65 of the prism element 60. The second exposure light EL2 irradiated toward the vertex 65 is reflected by each of the first to fourth reflection surfaces 61 to 64 and is divided into four second exposure light EL2. The second exposure light EL2 reflected by each of the first to fourth reflecting surfaces 61 to 64 travels in the radial direction with respect to the vertex 65, and is conjugated to the conjugate region 23 (by the light guide optical system including the mirrors 71 to 74). The secondary light source surface 13) is supplied.

  In each of the embodiments described above, the case where the illumination device IL (IL2, IL3) includes two light sources has been described as an example, but, of course, it may include three or more light sources.

  The substrate P in each of the above embodiments is not only a glass substrate for manufacturing a display device, but also a semiconductor wafer for manufacturing a semiconductor device, a ceramic wafer for a thin film magnetic head, or a mask or reticle used in an exposure apparatus. An original plate (synthetic quartz, silicon wafer) or the like is applied.

  As the exposure apparatus EX, in addition to the step-and-scan type scanning exposure apparatus (scanning stepper) that scans and exposes the pattern of the mask M by moving the mask M and the substrate P synchronously, the mask M and the substrate P Can be applied to a step-and-repeat type projection exposure apparatus (stepper) in which the pattern of the mask M is collectively exposed while the substrate P is stationary and the substrate P is sequentially moved stepwise.

  Further, in the step-and-repeat exposure, after the reduced image of the first pattern is transferred to the substrate P using the projection system while the first pattern and the substrate P are substantially stationary, the second pattern and the substrate P The reduced image of the second pattern may be partially overlapped with the first pattern and exposed onto the substrate P using the projection system in a state where P is substantially stationary (stitch type batch exposure apparatus). Further, the stitch type exposure apparatus can be applied to a step-and-stitch type exposure apparatus in which at least two patterns are partially transferred on the substrate P, and the substrate P is sequentially moved.

  Further, as disclosed in, for example, US Pat. No. 6,611,316, two mask patterns are synthesized on a substrate via a projection optical system, and one shot on the substrate is obtained by one scanning exposure. The present invention can also be applied to an exposure apparatus that performs double exposure of a region almost simultaneously.

  The present invention can also be applied to proximity type exposure apparatuses, mirror projection aligners, and the like.

  Further, as the exposure apparatus EX, a twin stage type having a plurality of substrate stages as disclosed in US Pat. No. 6,341,007, US Pat. No. 6,208,407, US Pat. No. 6,262,796, etc. It can also be applied to other exposure apparatuses.

  Further, as disclosed in US Pat. No. 6,897,963, European Patent Application No. 1713113, etc., a reference stage on which a reference mark is formed without holding the substrate, and a substrate stage that holds the substrate. The present invention can also be applied to an exposure apparatus that includes a member and / or a measurement stage equipped with a measuring instrument (measuring member) that measures exposure light. An exposure apparatus including a plurality of substrate stages and measurement stages can be employed.

  The type of the exposure apparatus EX is not limited to an exposure apparatus for manufacturing a liquid crystal display element or a display, but an exposure apparatus for manufacturing a semiconductor element that exposes a semiconductor element pattern on a substrate P, a thin film magnetic head, an image sensor (CCD) It can be widely applied to an exposure apparatus for manufacturing a micromachine, MEMS, DNA chip, reticle, mask, or the like.

  In each of the above-described embodiments, a light transmissive mask in which a predetermined light shielding pattern (or phase pattern / dimming pattern) is formed on a light transmissive plate is used as the mask M. For example, as disclosed in US Pat. No. 6,778,257, a variable shaped mask (an electronic mask, an active mask, or an active mask) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed. Alternatively, an image generator may be used. The variable shaping mask includes, for example, a DMD (Digital Micro-mirror Device) which is a kind of non-light emitting image display element (spatial light modulator). The variable shaping mask is not limited to DMD, and a non-light emitting image display element described below may be used instead of DMD. Here, the non-light-emitting image display element is an element that spatially modulates the amplitude (intensity), phase, or polarization state of light traveling in a predetermined direction, and a transmissive liquid crystal modulator is a transmissive liquid crystal modulator. An electrochromic display (ECD) etc. are mentioned as an example other than a display element (LCD: Liquid Crystal Display). In addition to the DMD described above, the reflective spatial light modulator includes a reflective mirror array, a reflective liquid crystal display element, an electrophoretic display (EPD), electronic paper (or electronic ink), and a light diffraction type. An example is a light valve (Grating Light Valve).

  In each of the embodiments described above, the exposure apparatus provided with the projection optical unit (projection optical system) has been described as an example. However, the present invention can be applied to an exposure apparatus and an exposure method that do not use the projection optical system. it can. Thus, even when the projection optical system is not used, the exposure light is irradiated onto the substrate via an optical member such as a lens.

  As described above, the exposure apparatus according to the present embodiment assembles various subsystems including the constituent elements recited in the claims of the present application so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. It is manufactured by. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. When the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  As shown in FIG. 10, a device such as a display device includes a step 201 for designing a function / performance of the device, a step 202 for producing a mask M based on the design step, a step 203 for producing a substrate P, and the above-described implementation. According to the form, the substrate P is exposed with the exposure light EL from the pattern of the mask M to transfer the pattern to the substrate P, and the substrate P to which the pattern is transferred is developed, and the transfer pattern having a shape corresponding to the pattern A substrate processing step 204 including a development process for forming a layer on the substrate P, a device assembly step 205 including a processing process for processing the substrate P through the transfer pattern layer, such as a dicing process, a bonding process, and a packaging process, and an inspection step It is manufactured through 206 and the like.

  Note that the requirements of the above-described embodiments can be combined as appropriate. In addition, the disclosures of all published publications and US patents related to the exposure apparatus and the like cited in the above-described embodiments and modifications are incorporated herein by reference.

It is a schematic block diagram which shows an example of the exposure apparatus provided with the illuminating device which concerns on 1st Embodiment. It is a figure which shows an example of the secondary light source surface which concerns on 1st Embodiment. It is a figure which shows an example of the emission end surface of an optical fiber. It is a figure which shows an example of a secondary light source surface. It is a figure which shows an example of a secondary light source surface. It is a figure which shows an example of a secondary light source surface. It is a schematic block diagram which shows an example of the illuminating device which concerns on 2nd Embodiment. It is a schematic block diagram which shows an example of the illuminating device which concerns on 3rd Embodiment. It is a figure which shows an example of the prism element which divides | segments exposure light. It is a flowchart which shows an example of the manufacturing process of a device.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1A ... 1st light source, 1B ... 2nd light source, 9B ... Optical fiber, 13 ... Secondary light source surface, 16B ... Ejection end surface, 18 ... Fly eye lens, 18E ... Element lens, 19 ... Condenser lens, 20 ... Incident end surface, DESCRIPTION OF SYMBOLS 21 ... Emission end surface, 23 ... Conjugated area | region, 27 ... Rod integrator, 28 ... Incident end surface, 29 ... Ejection end surface, 30 ... Introduction optical system, 31 ... 1st optical system, 32 ... 2nd optical system, 40 ... Irradiation optical system 51 ... Mask stage, 52 ... Substrate stage, C ... Predetermined point, EL ... Exposure light, EL1 ... First exposure light, EL2 ... Second exposure light, EX ... Exposure apparatus, IL ... Illumination apparatus, IR ... Illumination area, M ... Mask, P ... Substrate, PL ... Projection optical system, PR ... Projection area

Claims (19)

In an illumination device that illuminates an object by illuminating illumination light,
Including a transmission optical element having a polygonal transmission surface through which the illumination light can be transmitted, irradiating the illumination light transmitted through the transmission optical element, and forming an illumination area having a shape corresponding to the polygon on the object An irradiation optical system to be formed;
Introducing optics for introducing a plurality of the illumination lights emitted from different light sources into the irradiation optical system for each illumination light from a position centered on a predetermined point in the transmission surface or in a conjugate region substantially conjugate with the transmission surface And a lighting device.   The introduction optical system divides at least one of the plurality of illumination lights into a plurality of partial illumination lights, and introduces the plurality of partial illumination lights into the irradiation optical system from different positions centered on the predetermined point. Item 2. The lighting device according to Item 1.   The illumination device according to claim 2, wherein the introduction optical system introduces the plurality of partial illumination lights into the irradiation optical system from a rotationally symmetric position with respect to the predetermined point.   The illumination device according to any one of claims 1 to 3, wherein the predetermined point is an intersection of an optical axis of the irradiation optical system and the transmission surface or the conjugate region.   The lighting device according to claim 1, wherein the predetermined point is a center point of the transmission surface or the conjugate region.   The illumination apparatus according to claim 1, wherein the introduction optical system introduces a plurality of the illumination lights into the irradiation optical system from different positions in the transmission surface or the conjugate region.   The illumination device according to claim 1, wherein the introduction optical system forms at least one image of the light source on the transmission surface or the conjugate region.   The introduction optical system introduces the first illumination light of the plurality of illumination lights into the irradiation optical system from the transmission surface or the central portion of the conjugate region, and the second illumination light of the plurality of illumination lights. The illuminating device according to claim 1, wherein the illuminating optical system is introduced from around the first illumination light.   The introduction optical system includes: a first optical system that guides first illumination light generated from a first light source of the plurality of light sources to the transmission surface or the conjugate region; and a second light source of the plurality of light sources. The illumination device according to claim 1, further comprising: a second optical system that guides the generated second illumination light to the transmission surface or the conjugate region.   The illumination device according to claim 9, wherein the first optical system forms an image of the first light source on the transmission surface or the conjugate region.   The illumination device according to claim 9 or 10, wherein the second optical system includes an optical fiber, and guides the second illumination light to the transmission surface or the conjugate region via the optical fiber.   The illumination device according to claim 11, wherein an emission end surface of the optical fiber is formed to be inclined with respect to a direction in which the optical fiber is stretched, and is disposed on the transmission surface or the conjugate region. The transmission optical element is a fly-eye lens configured using a plurality of element lenses having the polygonal transmission surface,
The illumination device according to any one of claims 1 to 12, wherein the introduction optical system introduces a plurality of the illumination lights into the irradiation optical system from the conjugate region substantially conjugate with the exit end faces of the plurality of element lenses. . The transmission optical element is a rod-shaped optical element having the polygonal transmission surface,
The introduction optical system introduces a plurality of the illumination lights into the irradiation optical system from an incident end face of the rod-shaped optical element or the conjugate region substantially conjugate with the incident end face. Lighting equipment.   The lighting device according to claim 1, wherein the polygonal shape is a rectangular shape.   The lighting device according to claim 1, wherein a shape corresponding to the polygonal shape is a similar shape to the polygonal shape. A first support mechanism for supporting a pattern holding member on which a pattern is formed;
A second support mechanism for supporting the photosensitive substrate;
An exposure apparatus comprising: the illumination apparatus according to claim 1, which illuminates the pattern holding member and exposes the photosensitive substrate through the pattern. A projection optical system that projects an image of the pattern of the pattern holding member supported by the first support mechanism onto the photosensitive substrate supported by the second support mechanism;
The exposure apparatus according to claim 17, wherein the illumination device exposes the photosensitive substrate through the projection optical system. A transfer step of transferring the pattern to the photosensitive substrate using the exposure apparatus according to claim 17 or 18,
Developing the photosensitive substrate to which the pattern has been transferred, and forming a transfer pattern layer having a shape corresponding to the pattern on the photosensitive substrate;
And a processing step of processing the photosensitive substrate through the transfer pattern layer.

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