WO2010043304A1 - Procédé de production de microstructures dans un support d'information - Google Patents

Procédé de production de microstructures dans un support d'information Download PDF

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Publication number
WO2010043304A1
WO2010043304A1 PCT/EP2009/006939 EP2009006939W WO2010043304A1 WO 2010043304 A1 WO2010043304 A1 WO 2010043304A1 EP 2009006939 W EP2009006939 W EP 2009006939W WO 2010043304 A1 WO2010043304 A1 WO 2010043304A1
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WO
WIPO (PCT)
Prior art keywords
labeling
track
writing beam
label
writing
Prior art date
Application number
PCT/EP2009/006939
Other languages
German (de)
English (en)
Inventor
Steffen Noehte
Robert Thomann
Matthias Gerspach
Christoph Dietrich
Original Assignee
Tesa Scribos Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tesa Scribos Gmbh filed Critical Tesa Scribos Gmbh
Priority to EP09778726A priority Critical patent/EP2307930A1/fr
Priority to CN200980121896.6A priority patent/CN102057335B/zh
Publication of WO2010043304A1 publication Critical patent/WO2010043304A1/fr

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/024—Hologram nature or properties
    • G03H1/0244—Surface relief holograms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0476—Holographic printer
    • G03H2001/0478—Serial printer, i.e. point oriented processing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2222/00—Light sources or light beam properties
    • G03H2222/33—Pulsed light beam
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2222/00—Light sources or light beam properties
    • G03H2222/36—Scanning light beam
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/50—Reactivity or recording processes
    • G03H2260/62—Direct etching
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2270/00—Substrate bearing the hologram
    • G03H2270/20—Shape
    • G03H2270/22—Disc shaped
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2270/00—Substrate bearing the hologram
    • G03H2270/20—Shape
    • G03H2270/23—Ribbon shaped, e.g. holographic foil

Definitions

  • the present invention relates to a method for producing microstructures in a storage medium according to the preamble of claim 1 and to a lithograph for producing microstructures according to the preamble of claim 10. 5
  • artificially generated structures consist of a collection of individual structures, each having a size usually in the range of about 0.1 .mu.m to about 100 .mu.m, in particular to about 50 microns.
  • These individual structures are usually lithographically generated dots which together form the microstructure.
  • a preferred embodiment of such a microstructure is a computer-generated hologram.
  • Digital holograms are two-dimensional holograms consisting of individual points with different optical properties and from which images and / or data are reproduced when illuminated by a coherent electromagnetic wave, in particular a light wave, by diffraction in transmission or reflection.
  • the different optical properties of the individual dots can be transmission or reflection properties, for example caused by surface topography, varying optical path lengths in the material of the storage medium (refractive indices) or color values of the material.
  • the optical properties of the individual dots required to obtain a hologram are calculated by a computer, which are what are known as computer-generated holograms (CGH).
  • CGH computer-generated holograms
  • the individual points of the hologram inscribed in the memory material, wherein the focus of the write beam is in the region of the surface or in the material of the storage medium. Focusing causes a small area of influence on the material of the storage medium in the area of the focus, so that a multiplicity of points of the hologram can be written in a small area.
  • the optical property of each written point is set by a material change in the storage medium. It depends on the intensity of the writing beam.
  • the writing beam is moved in two dimensions with varying intensity relative to the surface of the storage medium.
  • the modulation of the intensity of the writing beam takes place either via an internal modulation of the light source, for example a laser diode, or via an external modulation of a writing beam outside the light source, for example with the aid of optoelectronic elements.
  • the light source may be formed as a pulsed laser whose pulse lengths are controllable, so that over the pulse lengths, a control of the intensity of the writing beam can be done.
  • the computer-generated hologram By scanning the intensity-modulated write beam, a surface with an irregular point distribution, the computer-generated hologram, thus arises.
  • This can be used to identify and individualize any objects.
  • it may contain, in particular, individualized information, such as a serial number, information about the distribution channel, etc.
  • An areal inscription can also be achieved, in particular, by using a Grating Light Valve (GLV), in that the GLV is used as a line light modulator and a relative movement of the writing beam (writing line) to the storage medium takes place in only one direction.
  • GLV is known, for example, from Silicon Light Machines.
  • Another way to achieve a flat label is to generate a plurality of individual beams by means of a beam multiplier. These then hit a multi-channel spatial light modulator, where they are individually modulated.
  • the individual beams reflected by the SLM are each essentially single-mode beams, and subsequent optics reproduce this plurality of individual beams onto the storage medium. Again, depending on the configuration, only a relative movement in one direction is required.
  • a high resolution is required, which can only be achieved by means of special lithographic systems.
  • the resolution of these systems should be about 25,000 dpi or more.
  • this form of holography only comparatively small areas are described. These are for example 1 - 50 mm 2 , with other sizes are possible in principle.
  • the accuracy of the writing raster should be about ⁇ 1 mm in both orthogonal directions in a lithographer for making computer-generated holograms of, for example, 1000 x 1000 dots on an area of 1 mm x 1 mm.
  • the write speed should be about 1-200 megapixels / second, so that, depending on size, a computer-generated hologram can be written in the time of about 0.1-1 second.
  • lithographic systems which fulfill the above-mentioned requirements (EP 1 377 880 B1, EP 1 373 981 B1).
  • These lithographic systems have in common that the inscription of the storage material is made in a defined labeling section.
  • the storage material usually a ribbon-shaped storage material or labels, which are arranged on a carrier tape, is moved along a labeling track through the labeling section.
  • the writing beam is moved over the storage material and its intensity is controlled according to the hologram to be written.
  • the label is discontinuous, since it has to wait until the next label has reached the labeling section.
  • the present invention is based on the problem to provide a method for the production of microstructures, in particular computer-generated holograms, in which memory materials can be labeled at a higher speed, as well as to specify a suitable lithograph.
  • the present invention solves the above-described problem in a method according to the preamble of claim 1 by the features of the characterizing part of claim 1 and in a method according to the preamble of claim 6 by the features of the characterizing part of claim 6.
  • a side-by-side solution provides a lithograph according to claim 12 ready.
  • Preferred embodiments and further developments are the subject of the respective subclaims.
  • the present invention is based initially on the finding that the production of a plurality of microstructures arranged one behind the other is subject to a dead time with the conventional methods. In this dead time, a material transport takes place in the labeling section of the writing beam, while the writing beam is not used during this time.
  • the writing beam is moved in one or two dimensions relative to the storage material and the microstructure, in particular a computer-generated hologram, is written. Since the provision of a write beam is associated with high costs, the provision of an additional write beam should be avoided as far as possible even when increasing the production cycle of lithographically generated microstructures. Therefore, in the present case, a method has been developed for keeping the dead time for the writing beam as low as possible. This is achieved by not only providing a single marking track as previously, on which the storage material is provided for labeling, but that at least one, possibly even more, further labeling tracks are provided. Labeling track is a web along which continuous or discontinuous storage material is provided for inscription with a microstructure, in particular a computer-generated hologram. This happens in particular in such a way that the storage material is moved along the labeling track in the direction of travel.
  • the write beam is then deflected after a write operation in the labeling section of a first labeling track on the labeling section of the next labeling track to make there another labeling process can.
  • the deflection of the write beam can be done relatively quickly, namely much faster than the material transport of the memory material, so that the dead time between the production of two microstructures is significantly reduced.
  • the writing beam is deflected from the labeling track to the labeling track until it is redirected to the first labeling track after reaching the last marking track.
  • the relative movement of the writing beam to the storage medium is preferably effected by a movement of the storage material in the running direction and a deflection of the writing beam transversely to the running direction.
  • the plurality of labeling tracks are provided parallel to each other. This is particularly advantageous in view of a space-saving arrangement and the simplest possible control of the transport of the storage medium and the deflection of the writing beam.
  • the labeling of a storage material provided along a labeling track is carried out only within a defined labeling section.
  • the writing beam can be moved only within this labeling section relative to the storage medium, there to make the pointwise labeling. It can be provided that the write beam is movable only perpendicular to the running direction of the storage material, so a flat label only by the combination of a movement of the memory material along the labeling track and a movement of the writing beam is made perpendicular to this direction. Alternatively, however, it can also be provided that the writing beam is movable both in a direction parallel to the marking track (X-direction) and perpendicular thereto (Y-direction).
  • the introduction of the microstructure into the storage material can take place in different ways.
  • the storage material may be continuously moved along the label track; in this case, a movement of the writing beam transversely, in particular perpendicularly, to the marking track is sufficient.
  • the storage material can also be moved discontinuously along the labeling track.
  • a planar control so in the X and Y direction of the writing beam is required.
  • a planar exposure by a line-shaped exposure for example by means of GLV or SLM
  • Labeling areas are provided on a label track.
  • the writing beam is after labeling of the storage material in a labeling area in another labeling area redirected on the same labeling track.
  • the storage material is accelerated and moved only after labeling in at least two labeling areas.
  • a deflection of the writing beam in the first labeling area is thus used that the deflection of the writing beam can be done faster than the material feed in the respective labeling area.
  • the material transport can then take place over a greater distance and thereby at an increased speed.
  • the material transport is thus discontinuous.
  • a material transport can already take place during the inscription within a labeling area.
  • Crucial is that the material transport does not have to wait until the next label can start. Limiting this is now only the deflection of the writing beam.
  • the deflection of the write beam is performed such that the light path of the write beam to be inscribed memory material remains substantially constant regardless of the respective labeling area or of the respective labeling track.
  • a height control for focusing the writing beam into the desired depth of the storage material is of crucial importance.
  • the light path should be constant from the source of the writing beam to the storage material to be inscribed, independently of the respective labeling track or the respective labeling section in which the storage material currently being written is arranged.
  • the lithograph can thus have a single height control, which carries out a uniform control of the writing beam for all marking tracks together. An additional effort for several height controls can be avoided.
  • the deflection of the write beam is such that the light path in
  • the deflection of the writing beam is electro-optical and / or electromechanical.
  • the deflection can be done for example by means of a galvanometer, a polygon or an electro-optical switch.
  • Such embodiments are particularly suitable for performing the fastest possible deflection of the writing beam and thus to reduce the dead time.
  • the storage material can be in strip form, for example. There are then preferably provided a plurality of such storage tapes, which are each moved along a labeling track. Alternatively, however, it is also possible for a single storage band to be provided that covers a plurality of labeling tracks or a plurality of labeling sections. The inscription is still carried out in each of the adjacent juxtaposed labeling tracks or the successively arranged labeling sections. In the case of a band-shaped storage material, after the inscription, the band is preferably further processed into individual labels, for example by a stamping or cutting process. Preferably, however, labels are used directly as storage material.
  • the individual labels into which a respective microstructure, in particular a computer-generated hologram, is then introduced, are arranged on a carrier tape.
  • the labels are arranged one behind the other along a labeling track, so that they each reach the labeling section by the movement of the carrier tape.
  • a separate carrier tape is provided for each labeling track, here too but only a single carrier tape may be provided which extends across the width of a plurality of labeling tracks.
  • a plurality of labels on the carrier tape are preferably arranged not only one behind the other along a labeling track, but also side by side (optionally offset in the opposite direction), so that in turn several labeling tracks are formed.
  • the storage material is moved on the labeling tracks in the case of a continuous further movement at the same speed or is moved in the case of a discontinuous further movement with the same timing, the timing for the individual labeling tracks can be offset in time.
  • the speed and timing are closely matched to the labeling duration for a microstructure and the time for the writing beam to shift from the labeling track to the labeling track.
  • a lithograph according to the invention for generating microstructures, in particular computer-generated holograms, in a memory material has a light source for generating the light beam, usually a laser, and drive means for moving the write beam within the labeling section. These drive means may be provided, for example, electromechanically and / or electro-optically. Furthermore, the lithographer has at least one objective for focusing the writing beam onto the storage material. Depending on the configuration, one or more lenses may form the focusing device for the writing beam. For generating the microstructures, a plurality of labeling tracks are then provided, on each of which storage material is arranged. So that the labeling can be carried out on the respective labeling tracks, the lithograph has a deflection means for deflecting the writing beam from one marking track to the next marking track.
  • Suitable deflecting means for the writing beam are electro-optical and / or electromechanical means, for example a galvanometer, a polygon or an electro-optical structure.
  • at least one lens is provided for each labeling track or each labeling section, whereby an optimal focusing of the writing beam for the respective labeling track can be achieved.
  • each labeling track is assigned at least one fixed labeling section, the writing beam can be moved only within this labeling section.
  • the individual labeling sections of the labeling tracks are arranged offset in a further preferred embodiment also to each other against the direction of travel. This makes it possible to achieve the same light path for the writing beam in the simplest possible way, regardless of the label track.
  • FIG. 1 in a schematic representation of a lithograph
  • Fig. 2 shows a schematic representation of the deflection of the writing beam in the
  • Fig. 3 is a schematic representation of a plan view of several labeling tracks
  • Fig. 4 in a schematic representation of an alternative to Fig. 2 deflection of the writing beam.
  • a lithograph 1 shows an exemplary embodiment of a lithograph 1 according to the invention for generating computer-generated holograms in a memory material 2, which is arranged on a carrier tape 3.
  • the storage material 2 is in the present case in the form of labels, which are each arranged one behind the other on a plurality of carrier tapes 3.
  • a light source 4 for generating a write beam 5 is here and preferably provided in the form of a laser, alternatively, a laser diode or other light source is possible.
  • the writing beam 5 is thus presently designed as a laser beam.
  • the lithograph 1 further comprises drive means (not shown) for moving the write beam 5 relative to the storage material 2.
  • the drive means are in the present case formed by a drive of the carrier tape 3 (not shown) in the X direction and a scanning mirror 6 for the writing beam 5.
  • the scanning mirror is designed as a galvanically driven scanning mirror 6 and in the present case makes it possible to move the writing beam 5 in a direction perpendicular to the plane of the drawing (FIG. 1) (Y-direction).
  • the drive means can also move the write beam directly in the X and Y directions.
  • the mirror 6 represents an X-scanning mirror arrangement.
  • the galvanic scanning mirror 6 it is also possible, for example, to use a rotatable polygon mirror.
  • the arranged on the carrier tape 3 storage material 2 is in this case continuously moved in the X direction at a constant speed, so that a flat label can be done by the superposition of the movement of the memory material in the X direction and the write beam in the Y direction.
  • the memory material 5, for example can be moved on clocked. The timing may be such that first a line of a hologram is written, then the memory material 2 is advanced one step, another line is written, etc. If the write beam 5 itself can be moved in the X and Y directions, the clocking can Also done so that the memory material 2 is moved into the labeling area, a complete caption takes place and while the writing beam is deflected to the next labeling track, the next memory material 2 is moved into the labeling area.
  • a beam expander or collimator 7 is furthermore arranged in the beam path behind the scanning mirror 6, in order to produce an expanded writing beam 5.
  • a system for autofocusing / height regulation of the writing beam 5 is preferably also provided on the storage material 2 (not shown). This system can be uniformly provided for all labeling tracks, so that the look is designed as simple as possible.
  • FIG. 2 shows the lithograph 1 in a schematic representation from a different perspective. It can be seen here that behind the beam-shaping optics 7 deflection means 10 are provided for deflecting the writing beam 5 from a first labeling track A to another labeling track B. Furthermore, the deflection means 10 are also suitable for making a deflection from the marking track B to a further marking track C and from the marking track C back to the marking track A.
  • the deflection means 10 are presently provided in the form of galvanomirrors.
  • Memory material 2 different, ie in the plane of Fig. 2 vertical
  • the arrangement of the lithograph 1 takes place here and preferably such that the
  • Total light path of the writing beam 5 for each labeling track is substantially identical. This allows an elaborate height adjustment, which is optimal for
  • Focusing the writing beam 5 is required to be avoided for each label track, but a common height control is sufficient.
  • Fig. 3 shows the labeling tracks A, B, C in plan view. It can be seen that memory material 2 is arranged in the form of labels on each labeling track A, B, C. Along each labeling track several labels 2 are arranged one behind the other on a carrier tape 3.
  • each a labeling area 11 is shown on the labeling tracks A, B, C also each a labeling area 11 is shown.
  • a label 2 can only be labeled with a computer-generated hologram if it is located within the respective labeling area 11.
  • the labeling areas 11 of the respective labeling tracks A, B, C are arranged offset from one another in the opposite direction to the running direction. By this staggered
  • the lithograph has, as before, a light source 4 in the form of a laser, a scanning mirror 6 and a beam shaping optics 7. In the light path behind the lithograph
  • Beam shaping optics 7 deflection means 10 are provided for deflecting the writing beam 5. In contrast to the embodiment described above, there is now no deflection of the writing beam 5 from one labeling track to the next labeling track, but from one labeling area 11 to the next
  • Fig. 4 shows labels 2 as a memory material, which are arranged one behind the other on a conveyor belt in the running direction (x-direction).
  • the first label 2a has just left the first labeling area 11a, while the second label 2b is completely arranged in the second labeling area 11b and is just labeled there.
  • the conveyor belt is moved evenly, so that the writing beam 5 only has to be moved in the direction perpendicular to the running direction of the labels 2 in order to achieve a flat inscription.
  • the writing beam is deflected by means of the deflection device 10 into the third labeling area 11c.
  • the third label 2c has already reached this area and can be labeled there.
  • the conveyor belt After writing the writing beam 5 is then redirected to the first labeling area 11a. During this latter deflection, the conveyor belt is accelerated, so that the next three labels 2 are transported to the respective labeling sections 11.
  • the conveyor belt during the deflection of the writing beam 5 is basically and only once during the deflection of the last to the first labeling area is moved at an increased speed.
  • the labels 2 are arranged on the conveyor belt in such a way that they all reach a labeling area 11 at the same time.
  • the deflection means 10 are also suitable, a deflection of the labeling track B to another labeling track C and of the Marking track C back to the marking track A make.
  • the deflection means 10 are presently provided in the form of galvanomirrors. Alternatively, for example, simple deflection mirrors, a polygon or electro-optical switches can be used. Furthermore, it becomes clear from FIG. 2 that not only is an objective 8 provided for focusing the writing beam 5, but that each labeling track A, B, C is assigned its own objective 8.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Holo Graphy (AREA)
  • Optical Recording Or Reproduction (AREA)
  • Optical Head (AREA)

Abstract

L'invention concerne un procédé de production de microstructures dans un support d'information, procédé selon lequel un jet d'écriture est dirigé sur une piste d'inscription, focalisé sur un matériau mémoire disposé sur cette piste et est déplacé par rapport au matériau mémoire, la microstructure étant inscrite par apport ponctuel d'énergie de rayonnement dans le matériau mémoire, ledit matériau mémoire continuant d'être déplacé – dans le sens d'acheminement -, en continu ou en discontinu, le long de la piste d'inscription. L'invention est caractérisée en ce qu'il est prévu au moins une autre piste d'inscription pour un autre support d'information, et en ce que le jet d'écriture est, après inscription d'un support d'information sur la première piste d'inscription, inversé sur la piste d'inscription suivante.
PCT/EP2009/006939 2008-10-14 2009-09-25 Procédé de production de microstructures dans un support d'information WO2010043304A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP09778726A EP2307930A1 (fr) 2008-10-14 2009-09-25 Procédé de production de microstructures dans un support d'information
CN200980121896.6A CN102057335B (zh) 2008-10-14 2009-09-25 用于在存储介质中产生微结构的方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE200810051204 DE102008051204A1 (de) 2008-10-14 2008-10-14 Verfahren zur Herstellung von Mikrostrukturen in einem Speichermedium
DE102008051204.4 2008-10-14

Publications (1)

Publication Number Publication Date
WO2010043304A1 true WO2010043304A1 (fr) 2010-04-22

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EP (1) EP2307930A1 (fr)
CN (1) CN102057335B (fr)
DE (1) DE102008051204A1 (fr)
WO (1) WO2010043304A1 (fr)

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CN109270798B (zh) * 2018-08-31 2020-11-03 北京航空航天大学 飞秒激光直写抗氧化铜微结构的方法以及铜离子墨水

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EP2307930A1 (fr) 2011-04-13

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