WO2010026628A1

WO2010026628A1 - Device and method for controlling electron beam plotting device and plotting method

Info

Publication number: WO2010026628A1
Application number: PCT/JP2008/065846
Authority: WO
Inventors: 寛顕鈴木; 章雄福島; 孝幸糟谷; 聡杉浦
Original assignee: パイオニア株式会社
Priority date: 2008-09-03
Filing date: 2008-09-03
Publication date: 2010-03-11
Also published as: JPWO2010026628A1; JP5232864B2

Abstract

Provided are a device and a method for controlling an electron beam plotting device which generates a plotting signal for plotting a pattern on a substrate by applying an electron beam according to a shape of an initial pattern which is different from a target pattern to be obtained finally.

Description

Control apparatus, control method, and drawing method for electron beam drawing apparatus

The present invention relates to a control device, a control method, and a drawing method for an electron beam drawing apparatus that performs pattern drawing by irradiating an electron beam.

Magnetic disks are used in personal computer (PC) storage devices, mobile devices, in-vehicle devices, and the like. In recent years, the application has been remarkably expanded and the surface recording density has been rapidly improved.

In a hard disk drive (HDD), position information for detecting a relative position between a magnetic head and a track on the magnetic disk is recorded on the magnetic disk as a servo pattern. In a magnetic disk, as shown in FIG. 1, a servo zone in which a servo pattern is recorded and a data zone in which data is recorded / reproduced are alternately arranged at regular angular intervals along a circumferential track. Can detect the recording or reproduction position at regular intervals during data recording or reproduction.

In order to manufacture such a high recording density hard disk, an electron beam mastering technique using an electron beam recording apparatus has been studied (for example, see Patent Document 1). An electron beam recording apparatus includes an electron gun that emits electrons, an electron lens that irradiates a substrate coated with a resist with an electron beam that converges the electrons, and blanking and beam deflection control that controls the irradiation position of the electron beam. System. At this time, a latent image is drawn on the resist where the electron beam is irradiated.

Here, as a high recording density magnetic disk, groove-like tracks such as Discrete Track Media (DTM) and Bit Patterned Media (BPM) are concentrically formed on the disk surface. What is formed is attracting attention. In view of this, an electron beam recording apparatus is required to be able to draw latent images corresponding to pits and marks of various shapes in order to manufacture a recording medium such as a hard disk having high-precision pits.
JP 2002-367178 A

An object of the present invention is to provide a control device, a control method, and a drawing method for an electron beam drawing apparatus capable of drawing on a resist in order to produce a recording medium having highly precise shaped pits. And

The control device according to claim 1 is a control device for an electron beam drawing device that irradiates an electron beam to draw a pattern on a substrate, and includes a drawing signal generator that generates a drawing signal for drawing an initial pattern. The drawing signal is generated based on the shape of the initial pattern different from the shape of the target pattern to be finally obtained.

The control method according to claim 8 generates a memory for storing pattern data for drawing a pattern on a substrate by irradiating an electron beam, and a drawing signal for drawing an initial pattern according to the pattern data. A drawing signal generator, wherein the drawing signal is generated based on a shape of the initial pattern different from a shape of a target pattern to be finally obtained It is characterized by.

According to a ninth aspect of the present invention, there is provided a drawing method using an electron beam recording apparatus that irradiates an electron beam while rotating and translating a substrate to draw a pattern on the substrate. A drawing method for drawing in a plurality of turns from the outer periphery to the outer periphery, wherein the exposure energy for each turn is changed for exposure for forming a portion corresponding to the first pattern.

According to a twelfth aspect of the present invention, there is provided a drawing method using an electron beam recording apparatus that draws a pattern on the substrate by irradiating an electron beam while rotating and translating the substrate. A drawing method for drawing a plurality of turns from the outer periphery to the outer periphery, wherein the exposure energy amount per unit area in the one pattern is changed for exposure for forming a portion corresponding to the one pattern. Yes.

Since the drawing signal for drawing the pattern on the substrate with the electron beam is generated based on the shape of the initial pattern different from the shape of the target pattern to be finally obtained, the drawing signal created by the electron beam drawing is used. The final pattern on the magnetic disk can be formed according to the shape of the target pattern regardless of the pattern error component existing in the process until the magnetic disk is manufactured. In particular, the corners of the pattern can be prevented from being rounded. Therefore, a magnetic disk having a highly accurate pattern can be formed.

It is a figure which shows the servo zone and data zone of the magnetic disc of a hard-disk apparatus. It is a flowchart which shows the specific process of a modal creation process. It is a figure which shows the state of the resist layer on the board | substrate of the exposure process of FIG. 2, and the image development process, and the master stamper of a transfer process. It is a figure which shows a servo zone and a data zone concretely. It is a figure which shows the specific process of a magnetic disc manufacturing process. It is a figure which shows schematic structure of an imprint apparatus. It is a figure which shows the whole structure of an electron beam drawing apparatus. It is a block diagram which shows typically the structure of the formatter in the apparatus of FIG. It is a figure which shows the drawing sequence which an EBR main-body part performs by control of a formatter. It is a figure which shows the drawing control of the concentric line by a formatter. It is a figure explaining deflection control of an electron beam to translational movement of a substrate. FIG. 5 is a top view of a substrate, and is a diagram for explaining deflection control of a formatter that draws lines LN1 to LN4 with a spiral beam locus (broken line) as a concentric beam locus (solid line). It is a figure which shows the shape of the pattern in a modal creation process at the time of drawing a rectangular pattern in an exposure process, the pattern in a transfer process, and the last pattern of a magnetic disk. It is a figure which shows the feedback operation | movement for correction | amendment of a drawing pattern. It is a figure which shows the shape of each of the drawing pattern in the exposure process in the case of making the last pattern of a magnetic disc into a rectangle, the pattern in a modal creation process, and the pattern in a transfer process. It is a figure which shows the drawing pattern of FIG. 15 per drawing line. It is a figure which shows the other shape of the drawing pattern in the exposure process in case the last pattern of a magnetic disc is made into a rectangle. FIG. 18 is a diagram schematically showing pit pieces V (1) to V (4) drawn on each of lines LN1 to LN4 of the drawing pattern of FIG. It is a flowchart which shows the procedure in the case of drawing pit piece V (j) (j = 1, 2, ...) to each of drawing line LN (j). It is a figure which shows typically the pit piece V (j) when the drawing shift by the outer periphery direction and inner periphery direction offset signal F8 and F9 is made. It is a figure which shows typically about adjustment of the dose amount profile of a radial direction. It is a figure which shows typically about adjustment of the dose amount profile of a tangential direction. It is a flowchart which shows drawing pattern automatic correction | amendment operation | movement. It is a block diagram which shows schematic structure for drawing pattern automatic correction | amendment operation | movement. It is a figure which shows the pattern drawing method by an electron beam. It is a figure which shows the pattern drawing method by an electron beam. It is a figure which shows the pattern drawing method by an electron beam. It is a figure which shows the pattern drawing method by an electron beam. It is a figure which shows the pattern drawing method by an electron beam. It is a figure which shows the pattern drawing method by an electron beam.

FIG. 2 shows an example of a modal creation process for creating a transfer mold (stamper) for manufacturing a magnetic disk substrate. A method for producing a stamper for producing a magnetic disk substrate will be described with reference to FIG. 2. First, the surface of a substrate made of a glass plate, a carbon substrate, or a silicon wafer is polished and cleaned (step S1), thereby making a smooth surface. A liquid resist material is applied on the substrate so as to have a uniform thickness by spin coating or the like (step S2), and then pre-baking is performed (step S3). As a result, the resist material is heated and dried to form a resist layer. This resist material is formed because an electron-withdrawing element such as chlorine, sulfur, fluorine or the like or a group having an electron-withdrawing function (hereinafter referred to as an electron-withdrawing group) is added to this resist material. The resist layer has improved electron absorption sensitivity.

Next, the resist layer on the substrate is irradiated with an electron beam from the upper surface side by an electron beam lithography apparatus, and the resist layer is exposed to form a latent image on the surface of the resist layer, thereby recording a data signal. Is performed (step S4). That is, as shown in FIG. 3, a pattern including mark portions (exposed portions by the electron beam) of the servo zone and the data zone is formed as a latent image 7 on the resist layer 6 of the substrate 4 by irradiating the substrate 4 with the electron beam. (Exposure process). After such a substrate 4 is taken out from the electron beam drawing apparatus, the resist layer 6 is developed (step S5), and the latent image portion 7 is removed by post-baking (step S6). An uneven pattern of each of the servo zone and the data zone including a plurality of grooves is formed on the upper surface (development process). In this way, the patterning process is performed on the resist layer 6.

Subsequently, an electrode film made of a metal material is formed on the upper surface of the resist layer 6 by a method such as sputtering, vapor deposition, electroless plating, or the like (step S7). .

Further, by using the above electrode film as an electrode and performing electroforming, Ni element is deposited on the upper surface of the electrode film, and a metal layer is laminated (step S8). Then, the master stamper in which the metal layer and the electrode film are integrated is formed by peeling the metal layer together with the electrode film from the surface of the substrate 4 and the resist layer 6 (step S9). That is, as shown in FIG. 3, a master stamper (transfer mold) 5 is manufactured from the substrate 4 on which the concavo-convex pattern is formed by a transfer process. The master stamper 5 is formed with a pattern consisting of a servo zone and a data zone as shown in FIG.

By performing electroforming on the surface of the master stamper on which the concavo-convex pattern is formed, a sub-master stamper having the concavo-convex pattern to which the master stamper pattern is transferred is formed (step S10). A plurality of baby stampers having the same shape as the master stamper are formed by performing an electroforming method on the surface on which the concavo-convex pattern is formed (step S11). A baby stamper can be used to injection-mold the magnetic disk substrate.

Next, a method for manufacturing a magnetic disk using the nanoimprint method based on a baby stamper will be described.

First, as shown in FIG. 5, first, a transfer layer 72 such as a resist is formed on the surface of a substrate material 71 made of aluminum or glass, and the substrate material 71 is set on a baby stamper 5a which is a mold. (Substrate set). The substrate material 71 is made of a nonmagnetic material such as glass. In the thermal imprint method, the transfer layer 72 to which the pattern is to be transferred is made of a resin having fluidity when heated to room temperature or a glass transition temperature or higher. In the UV (ultraviolet irradiation) imprint system, the transfer layer 72 to which the pattern is to be transferred is made of an ultraviolet curable resin that is cured (polymerized) by ultraviolet irradiation. Transfer is performed by applying pressure to the transfer layer 72 by the baby stamper 5a (step S21: transfer step). After the transfer layer 72 to which the concavo-convex pattern has been transferred is cured, the substrate material 71 after the transfer process obtained by peeling the substrate 71 and the baby stamper 5a is etched (step S22: etching process). The transfer layer 72 left after the etching process is peeled off (step S23: transfer layer removal process). As a result, the substrate 73 having the servo zone and the data zone formed on the surface as an uneven pattern is manufactured.

Next, the magnetic film 74 is formed on the uneven surface of the substrate 73 (step S24: magnetic body forming step). The magnetic film 74 is polished, and the magnetic film 74 remains only in the recesses on the surface of the substrate 73 (step S25: polishing process). That is, the patterns of the servo zone and the data zone are formed by a magnetic material. Then, the lubricating layer 75 is formed on the surface of the substrate 73 (step S26: lubricating layer forming step), and as a result, a magnetic disk is obtained.

FIG. 6 shows a schematic configuration of the imprint apparatus used in the transfer process of FIG. In this imprint apparatus, a working chamber 112 is formed in an apparatus casing 111, and an imprint apparatus main body is disposed therein. A transfer mold holding portion 114 that holds the baby stamper 5a with the transfer surface facing downward is fixed to the upper portion of the apparatus casing 111.

A lifting / pressurizing unit 117 is fixed to the lower part of the apparatus casing 111. The raising / lowering pressurizing unit 117 moves the table 118 provided on the movable part 117a above it up and down. The vertical movement of the table 118 by the elevating and pressing unit 117 is controlled by a control device (not shown). A substrate material 71 having a transfer layer 72 formed on the surface is placed on the table 118. The surface of the transfer layer 72 of the substrate material 71 is made to face the baby stamper 5a. When the lifting and lowering pressure unit 117 raises the table 118 together with the substrate material 1, the baby stamper 5 a is pressed against the transfer layer 72 by the pressure. As a result, the pattern of the baby stamper 5 a is transferred to the transfer layer 72.

The vacuum pump 115 is provided in the apparatus casing 111 to reduce the pressure of the working chamber 112 via the adjustment valve 116 during imprinting by the baby stamper 5a. This is to prevent bubbles from entering the baby stamper 5a and the transfer layer 72 and to remove degassing generated from the transfer layer 72 due to heating or a curing reaction.

FIG. 7 is a diagram showing the overall configuration of an electron beam lithography apparatus that can be adjusted according to the method of adjusting an electron beam lithography apparatus according to the present invention. This electron beam drawing apparatus is used in an exposure process when manufacturing the above-described transfer mold (stamper) for manufacturing a magnetic disk substrate.

As shown in FIG. 7, the electron beam drawing apparatus includes a vacuum chamber 11 including a stage driving device that rotates and translates a substrate 15 for a disk master, an electron beam column 20, and the stage driving device and the electron beam column 20. A block 10 including a driving system to be driven (hereinafter, referred to as a main body unit 10), a formatter 50 as a control device of an electron beam drawing apparatus that controls the main body unit 10, and a correction data generation unit 100 are included.

The substrate 15 for the master disc is placed on the turntable 16. For example, a resist material that is exposed to an electron beam is applied to a substrate 15 on a glass substrate, a carbon substrate, or a silicon substrate. The turntable 16 is rotationally driven with respect to the vertical axis (Z axis) of the main surface of the disk substrate by a spindle motor 17 which is a rotational drive device that rotationally drives the substrate 15. The spindle motor 17 is provided on a translation stage (hereinafter also simply referred to as a stage) 18. The stage 18 is coupled to a translation motor 19 which is a transfer (translation drive) device, and can move the spindle motor 17 and the turntable 16 in a predetermined direction in a plane parallel to the main surface of the substrate 15. Yes.

The substrate 15 is held by suction on the turntable 16. The turntable 16 is made of a dielectric, for example, ceramic, and has an electrostatic chucking mechanism (not shown). Such an electrostatic chucking mechanism includes a turntable 16 and an electrode made of a conductor provided in the turntable 16 for causing electrostatic polarization. A high voltage power source (not shown) is connected to the electrode, and the substrate 15 is held by suction by applying a voltage from the high voltage power source to the electrode.

On the stage 18, optical elements such as a reflection mirror 35A and an interferometer, which are a part of a laser position measurement system 35 described later, are arranged.

The vacuum chamber 11 is installed via an anti-vibration table (not shown) such as an air damper, and vibration transmission from the outside is suppressed. The vacuum chamber 11 is connected to a vacuum pump (not shown), and the interior of the vacuum chamber 11 is set to a vacuum atmosphere at a predetermined pressure by evacuating the chamber.

In the electron beam column 20, an electron gun (emitter) 21 for emitting an electron beam, a converging lens 22, a blanking electrode 23, an aperture 24, a beam deflection coil 25, an alignment coil 26, a deflection electrode 27, a focus lens 28, an objective The lenses 29 are arranged in this order.

The electron gun 21 emits an electron beam (EB) accelerated to several tens to 100 KeV by a cathode (not shown) to which a high voltage supplied from an acceleration high voltage power source (not shown) is applied. The converging lens 22 converges the emitted electron beam. The blanking electrode 23 performs on / off switching (ON / OFF) of the electron beam based on the modulation signal from the blanking drive unit 31. That is, by applying a voltage between the blanking electrodes 23 to greatly deflect the passing electron beam, the electron beam is prevented from passing through the aperture 24, and irradiation of the electron beam to the substrate 15 is turned off (non- Irradiation).

The alignment coil 26 corrects the position of the electron beam based on the correction signal from the beam position corrector 32. The deflection electrode 27 deflects the electron beam in the radial direction and the tangential direction based on a control signal from the deflection driving unit 33. Further, the deflection electrode 27 may be composed of a plurality of deflection electrodes for controlling the deflection in the radial direction and the tangential direction. By such deflection driving, the position of the electron beam spot formed on the surface of the resist coated on the substrate 15 is adjusted.

The focus lens 28 performs focus adjustment on the electron beam based on a focus drive signal (described later) supplied from the focus drive unit 34, and guides the electron beam subjected to the focus adjustment processing to the objective lens 29.

The objective lens 29 converges the electron beam supplied from the focus lens 28 and irradiates it on the surface of the resist. At this time, a latent image is formed at a position irradiated with the electron beam on the resist surface. Hereinafter, the formation of a latent image on the resist surface by such electron beam irradiation is referred to as “drawing”.

The vacuum chamber 11 is provided with a light source 36A and a light detector 36B for detecting the height of the main surface of the substrate 15. The photodetector 36B includes, for example, a position sensor, a CCD (Charge Coupled Device), etc., receives a light beam (laser light) emitted from the light source 36A and reflected by the surface of the substrate 15, and increases the received light signal. This is supplied to the thickness detector 36. The height detection unit 36 detects the height of the main surface of the substrate 15 based on the light reception signal, and supplies a height detection signal indicating the height to the focus driving unit 34.

The focus drive unit 34 generates a focus drive signal corresponding to the focus adjustment amount in the focus lens 28 according to the height detection signal or the focus adjustment signal FC (described later) and supplies the focus drive signal to the focus lens 28.

The laser position measurement system 35 measures the distance to the stage 18 with measurement laser light from a built-in light source (not shown), and supplies the measurement data, that is, position data of the stage 18 to the translation controller 37.

The translation controller 37 performs translation control of the X stage in synchronization with a translation clock signal (T-CLK) F4 which is a reference signal supplied from the formatter 50. The translation controller 37 generates a translation error signal based on the stage position data from the laser position measurement system 35 and sends it to the beam position corrector 32. As described above, the beam position corrector 32 corrects the position of the electron beam based on the translation error signal. The translation controller 37 generates a control signal for controlling the translation motor 19 and supplies it to the translation motor 19.

The rotation controller 38 controls the rotation of the spindle motor 17 in synchronization with a rotation clock signal (R-CLK) F5 which is a reference signal supplied from the formatter 50. More specifically, the spindle motor 17 is provided with a rotary encoder (not shown), and generates a rotation signal when the turntable 16 (that is, the substrate 15) is rotated by the spindle motor 17. The rotation signal includes an origin signal indicating the reference rotation position of the substrate 15 and a pulse signal (rotary encoder signal) for each predetermined rotation angle from the reference rotation position. The rotation signal is supplied to the rotation controller 38. The rotation controller 38 detects a rotation error of the turntable 16 based on the rotary encoder signal, and corrects the rotation of the spindle motor 17 based on the detected rotation error.

Various drawing control signals are supplied from the formatter 50 to the EBR interface circuit (EBR I / F) 39. More specifically, the focus adjustment signal FC, the modulation signal F1, and the deflection signal F3 are supplied from the formatter 50. The blanking drive unit 31 turns on / off the electron beam based on the modulation signal F1, and the deflection drive unit 33 deflects the irradiation direction of the electron beam based on the deflection signal F3. In response to the focus adjustment signal FC, the focus drive unit 34 generates a focus drive signal corresponding to the focus adjustment amount in the focus lens 28 and supplies the focus drive signal to the focus lens 28.

Here, various drawing control signals supplied from the formatter 50 and operations of the formatter 50 based on the control signals will be described in detail below.

FIG. 8 is a diagram showing an internal configuration of the formatter 50 as an EBR control device that controls the main body 10.

As shown in FIG. 8, the formatter 50 includes an EBR control signal generator (processor) 51, a clock signal generator 52, a memory 53, a formatter interface circuit (formatter I / F) 54, an input / output unit 55, and a display unit 56. Consists of.

The clock signal generator 52 is, for example, a clock signal corresponding to CLV (Constant Line Velocity) drawing or CAV (Constant Angular Velocity) drawing, or a rotation clock representing the driving amount of the spindle motor 17 and the translation motor 19 as described later. And generating a translation clock signal.

The memory 53 stores setting values and data related to various control signals described later. The memory 53 stores in advance a program for performing various types of drawing including test drawing (described later).

The input / output unit 55 accepts input of various operation commands from the user or various setting values used when controlling the main body unit 10, and outputs a signal representing the contents (operation command, setting value) as an EBR control signal. Supply to the generator 51. The display unit 56 displays the operation conditions, operation states, set values, and the like of the main body unit 10 and the formatter 50 according to a display command from the EBR control signal generator 51.

The EBR control signal generator 51 reads a program corresponding to an operation command from the input / output unit 55 from the memory 53, generates the following various control signals for controlling the main body unit 10 according to the program, This is supplied to the main body 10 via the interface circuit 54. During this time, the EBR control signal generator 51 receives the following start signal F6 supplied from the main body 10 via the formatter interface circuit 54.

・ Modulation signal F1 (F1-Modulation (/ Blanking)): A signal output by the formatter to turn on / off the electron beam. For example, when “Low”, the electron beam is blanked and the electron beam is turned off.

・ Sawtooth wave deflection signal F3 (F3-Saw-Tooth-Deflection-X), deflection signal F3: deflection signal for concentric spirals. A signal with polarity inversion of the ramp wave depending on the moving direction of the X stage.

· Translation clock signal F4 (F4-Translation-clock): Reference signal to the X stage output by the formatter. The EBR apparatus drives the translation stage (X stage) in synchronization with this signal. The pulse reference unit (ΔX) can be set on the formatter side. As a default value, for example, 632.991345 / 1024 nm. Also, ΔX / 2, ΔX / 4, ΔX / 8, etc. can be set.

Rotation clock signal F5 (F5-Rotation-clock): Reference signal to the rotating spindle output by the formatter. The default is, for example, 3600 pulse / rev. For example, the duty is 50%.

-Start signal F6 (F6- / Start): After the end signal F7 (below) is in the "High" state and the translation clock signal F4 and the rotation clock signal F5 become valid, the EBR device side synchronizes with these clocks. When the drawing start radius is reached, the drawing start signal F6 in the “Low” state is supplied to the formatter. As a result, the formatter starts drawing (signal output).

End signal F7 (F7-End): The formatter notifies the end of drawing (signal output) to the EBR device in the “High” state. The end signal F7 is maintained in the “Low” state during the period in which the translation clock signal F4 and the rotation clock signal F5 are valid. Upon receipt of this signal, the EBR apparatus switches the drawing start signal F6 to “High” and ends the current drawing operation.

・ Beam outer periphery direction offset signal F8 (F8-BeamOffsetOut), outer periphery direction offset signal F8, high speed offset (+) signal F8: Signals for offsetting the beam to the outer periphery at high speed.

・ Beam inner circumferential offset signal F9 (F9-BeamOffsetOut), inner circumferential offset signal F9, high-speed offset (−) signal F9: signals for offsetting the beam to the inner circumference at high speed.

Beam-tangential deflection signal F16 (F16-BeamTangentialDeflection), tangential deflection signal F16: Signals that deflect the beam in the tangential direction or circumferential direction (+ θ, -θ direction) at high speed.

Note that the interface may be configured such that controllable parameters such as acceleration voltage can be controlled.

Next, regarding the drawing operation by the main body 10 and the formatter 50 having the above-described configuration, a concentric line drawing operation for drawing a plurality of concentric lines on the test substrate 15 coated with a resist will be described with reference to FIGS. This will be described with reference to FIG.

[Concentric line drawing operation]
After the substrate 15 is set in the EBR main body 10, when the user performs a concentric line drawing command operation for drawing a concentric line by the input / output unit 55, the formatter 50 draws the concentric line drawing stored in the memory 53. The following control according to the program is sequentially executed.

First, as shown in FIG. 9, the formatter 50 starts sending the translation clock signal F4 and the rotation clock signal F5 to the main body 10 and sends an end signal F7 (F7-End) to be sent to the main body 10 ". Switching from the “High” state to the “Low” state (FIG. 9, time Tp). The translation clock signal F4 and the rotation clock signal F5 at this time are clock signals having a frequency (Fini) at the start of drawing. When the supply of the translation clock signal F4 and the rotation clock signal F5 is started, the main body 10 operates in synchronization with these clocks, and then the main body 10 becomes “Low” (when the drawing start radius is reached). An active) drawing start signal F6 (F6- / Start) is sent to the formatter 50.

In response to the “Low” (active) start signal F 6, the formatter 50 starts sending the modulation signal F 1 and the deflection signal F 3, which are drawing signals, to the main body 10 as shown in FIG. 9 or FIG. . As shown in FIG. 9 or FIG. 10, the deflection signal F3 is a sawtooth signal (analog voltage signal), and the reference voltage (V = Vref = The level changes linearly from 0 volt) to V = VD. At time T1, the deflection signal F3 is returned to the reference voltage Vref (= 0 volt), and the electron beam is returned to the reference deflection position (for example, a position perpendicular to the substrate 15). As a result, the substrate 15 translates at a constant speed based on the translation clock (T-CLK) F4 as shown in FIG. More specifically, the substrate 15 extends in the X direction from the position at the start of drawing (indicated by a broken line, the center of the substrate is indicated by O) to the position at the end of one rotation (indicated by a solid line, the center of the substrate is indicated by O ′) Translate. At this time, as shown in FIG. 11, the electron beam EB is deflected so as to follow the substrate 15 by the deflection signal F3. That is, as shown in FIG. 12, when the deflection (that is, the emission direction) of the electron beam EB is fixed, a spiral beam locus (shown by a broken line) is formed on the substrate 15, but the deflection signal F3. Thus, the main body 10 draws a concentric line LN1 (shown by a solid line). In the following description, a concentric line having a line number j (ie, LN = j) is described as LNj. Simultaneously with the end of drawing of the second line LN1 (T = T1), the deflection voltage is returned to the reference voltage (V = Vref = 0 volt, FIG. 10) by the deflection signal F3. That is, the electron beam is returned to the deflection position (reference deflection position) at the start of drawing of the line LN1, and the beam spot of the electron beam EB is at the same angular position as the angular position at the end of drawing of the line LN1 with respect to the center of the substrate 15. Returned. On the other hand, at this time, the radial position (radial position) of the beam spot on the substrate 15 with respect to the center of the substrate 15 has moved by the translational distance required for drawing the line LN1. At this time, this distance becomes a pitch q (referred to as a line pitch) between lines as shown in FIG.

Then, in the second to fourth rotations (REV = 2 to 4) of the substrate 15, the formatter 50 repeatedly executes the same control as described above, thereby the first concentric circles separated from each other by the line pitch q. The lines LN1 to LN4 are drawn (FIG. 12). In FIG. 12, the line pitch is shown enlarged for the sake of illustration.

Here, in order to accurately draw a concentric line having a desired line width on the resist surface, it is necessary to perform various adjustments of the main body 10 itself when the main body 10 is installed or periodically.

The EBR main body 10 includes a vacuum chamber 11, a stage driving device for mounting, rotating, and translating a circular substrate disposed in the vacuum chamber 11, an electron beam column 20 attached to the vacuum chamber 11, and a stage Various control systems for controlling the driving device and controlling the electron beam are provided.

The disk-shaped substrate 15 for the disk master is placed on the turntable 16. For example, a resist material that is exposed to an electron beam is applied on a substrate 15 such as a glass substrate or a silicon substrate. The turntable 16 is rotationally driven with respect to the vertical axis (Z axis) of the main surface of the disk substrate by a spindle motor 17 which is a rotational drive device that rotationally drives the substrate 15. The spindle motor 17 is provided on a translation stage (hereinafter also simply referred to as a stage) 18. The stage 18 is coupled to a translation motor 19 which is a transfer (translation drive) device, and can move the spindle motor 17 and the turntable 16 in a predetermined direction in a plane parallel to the main surface of the substrate 15. Yes.

The electron gun 21 emits an electron beam (EB) accelerated to several tens KeV to 100 Kev by a cathode (not shown) to which a high voltage supplied from an acceleration high-voltage power source (not shown) is applied. The converging lens 22 converges the emitted electron beam. The blanking electrode 23 performs on / off switching (ON / OFF) of the electron beam based on the modulation signal from the blanking control unit 31. That is, by applying a voltage between the blanking electrodes 23 to greatly deflect the passing electron beam, the electron beam is prevented from passing through the aperture 24, and irradiation of the electron beam to the substrate 15 is turned off (non- Irradiation).

The alignment coil 26 corrects the position of the electron beam based on the correction signal from the beam position corrector 32. The deflection electrode 27 controls the deflection of the electron beam in the radial direction and the tangential direction based on a control signal from the deflection control unit 33. Further, the deflection electrode 27 may be composed of a plurality of deflection electrodes for controlling the deflection in the radial direction and the tangential direction. By such deflection control, the position of the electron beam spot formed on the surface of the resist coated on the substrate 15 is adjusted.

The focus lens 28 performs focus adjustment on the electron beam based on a focus control signal (described later) supplied from the focus control unit 34, and guides the electron beam subjected to the focus adjustment processing to the objective lens 29.

The vacuum chamber 11 is provided with a light source 36A and a light detector 36B for detecting the height of the main surface of the substrate 15. The photodetector 36B includes, for example, a position sensor, a CCD (Charge Coupled Device), etc., receives a light beam (laser light) emitted from the light source 36A and reflected by the surface of the substrate 15, and increases the received light signal. This is supplied to the thickness detector 36. The height detection unit 36 detects the height of the main surface of the substrate 15 based on the light reception signal, and supplies a height detection signal indicating the height to the focus control unit 34.

The focus control unit 34 generates a focus control signal indicating a focus adjustment amount in the focus lens 28 according to the height detection signal or the focus adjustment signal FC (described later) and supplies the focus control signal to the focus lens 28.

Various control signals are supplied from the formatter 50 to the EBR interface circuit (EBR I / F) 39. More specifically, the focus adjustment signal FC, the modulation signal F1, and the deflection signal F3 are supplied from the formatter 50. The blanking control unit 31 performs blanking control (electron beam on / off) based on the modulation signal F1, and the deflection control unit 33 performs electron beam deflection control based on the deflection signal F3. In response to the focus adjustment signal FC, the focus control unit 34 generates a focus control signal indicating a focus adjustment amount in the focus lens 28 and supplies the focus control signal to the focus lens 28.

Here, various control signals supplied from the formatter 50 and operations of the formatter 50 based on the control signals will be described in detail below.

FIG. 8 is a diagram showing an internal configuration of the formatter 50 as an EBR control device that controls the EBR main body 10.

The memory 53 stores setting values related to various control signals described later, data related to a drawing pattern, and the like.

The input / output unit 55 receives input of various operation commands from the user or various setting values used when controlling the EBR main body unit 10, and performs EBR control on a signal representing the contents (operation command and setting value). This is supplied to the signal generator 51. The display unit 56 displays operation conditions, operation states, set values, and the like of the EBR main unit 10 and the formatter 50 according to a display command from the EBR control signal generator 51.

The EBR control signal generator 51 reads a program corresponding to an operation command from the input / output unit 55 from the memory 53, generates the following various control signals for controlling the EBR main unit 10 according to the program, and outputs these control signals. Supply to the EBR main unit 10 via the interface circuit 54. During this time, the EBR control signal generator 51 receives the following start signal F6 supplied from the EBR main unit 10 via the formatter interface circuit 54.

Next, with respect to the drawing operation by the EBR main body 10 and the formatter 50 having the above-described configuration, a concentric line drawing operation for drawing a plurality of concentric lines centering on the center point of the disk will be described with reference to FIGS. This will be described with reference to FIG.

[Concentric line drawing operation]
When the user performs a concentric line drawing command operation for drawing a concentric line by the input / output unit 55, the formatter 50 sequentially executes the following control according to the concentric line drawing program stored in the memory 53. .

First, as shown in FIG. 9, the formatter 50 starts sending the translation clock signal F4 and the rotation clock signal F5 to the EBR main body 10 and also sends an end signal F7 (F7-End) to be sent to the EBR main body 10. Is switched from the “High” state to the “Low” state (FIG. 9, time point Tp). The translation clock signal F4 and the rotation clock signal F5 at this time are clock signals having a frequency (Fini) at the start of drawing. When the supply of the translation clock signal F4 and the rotation clock signal F5 is started, the EBR main body 10 operates in synchronization with these clocks, and then the EBR main body 10 becomes “Low” when the drawing start radius is reached. The “(active) drawing start signal F6 (F6- / Start) is sent to the formatter 50.

In response to the “Low” (active) start signal F6, the formatter 50 sends the modulation signal F1 and the deflection signal F3, which are drawing signals indicating the initial pattern, to the EBR main body 10 as shown in FIG. On the other hand, transmission starts. As shown in FIG. 9 or FIG. 10, the deflection signal F3 is a sawtooth signal (analog voltage signal), and the reference voltage (V = Vref = The level changes linearly from 0 volt) to V = VD. At time T1, the deflection signal F3 is returned to the reference voltage Vref (= 0 volt), and the electron beam is returned to the reference deflection position (for example, a position perpendicular to the substrate 15). As a result, the substrate 15 translates at a constant speed based on the translation clock (T-CLK) F4 as shown in FIG. More specifically, the substrate 15 extends in the X direction from the position at the start of drawing (indicated by a broken line, the center of the substrate is indicated by O) to the position at the end of one rotation (indicated by a solid line, the center of the substrate is indicated by O ′) Translate. At this time, as shown in FIG. 11, the electron beam EB is deflected so as to follow the substrate 15 by the deflection signal F3. That is, as shown in FIG. 12, when the deflection (that is, the emission direction) of the electron beam EB is fixed, a spiral beam locus (shown by a broken line) is formed on the substrate 15, but the deflection signal F3. Thus, the EBR main body 10 draws a concentric line LN1 (shown by a solid line). In the following description, a concentric line having a line number j (ie, LN = j) is described as LNj.

At the same time as the drawing of the second line LN1 is completed (T = T1), the deflection voltage is returned to the reference voltage (V = Vref = 0 volt, FIG. 10) by the deflection signal F3. That is, the electron beam is returned to the deflection position (reference deflection position) at the start of drawing of the line LN1, and the beam spot of the electron beam EB is at the same angular position as the angular position at the end of drawing of the line LN1 with respect to the center of the substrate 15. Returned. On the other hand, at this time, the radial position (radial position) of the beam spot on the substrate 15 with respect to the center of the substrate 15 has moved by the translational distance required for drawing the line LN1. At this time, this distance becomes a pitch q (referred to as a line pitch) between lines as shown in FIG.

Then, in the second to fourth rotations (REV = 2 to 4) of the substrate 15, the formatter 50 repeatedly executes the same control as described above, thereby the first concentric circles separated from each other by the line pitch q. The line LN1 to the fourth line LN4 are drawn. In FIG. 12, the line pitch is shown enlarged for the sake of illustration.

Here, it is assumed that a rectangular pattern is drawn as shown in FIG. 13A in accordance with a drawing signal indicating an initial pattern in the exposure process of step S4 using such an electron beam drawing apparatus. The rectangle drawn on the resist layer on the substrate by the electron beam has four angles of approximately 90 degrees. Note that the dose distribution synthesized on the lines LN1 to LN4 is not a perfect rectangle but an elliptical shape with rounded corners. This is because the beam diameter is not a quadrangle, and the corners of the drawn rectangle are not completely perpendicular. Also, the dose distribution obtained by combining the dose amounts of the respective lines may have a shape in which each side swells instead of a rectangle.

Next, in the pattern formed on the baby stamper 5a of the mold formed in step S11, a rectangular corner is taken and rounded as shown in FIG. 13 (b), and is transferred by the nanoimprint method in the subsequent transfer process. The pattern is further rounded as shown in FIG. The final pattern of the magnetic disk formed in the lubricating layer forming step is close to an ellipse as shown in FIG. That is, if the rectangle is the target pattern, the final pattern has a different shape. How the shape error due to nanoimprinting affects the pattern shape differs depending on the nanoimprint method (thermal method, UV method), and depends on the method of applying pressure to the substrate and the method of peeling the substrate and mold. Is also different.

Therefore, as shown in FIG. 14, the latent image pattern P0 of the resist layer in the exposure process by the electron beam, the pattern P1 formed on the baby stamper 5a in the mold creation process, and the pattern P2 transferred in the transfer process of the nanoimprint method. In addition, according to the shape of at least one pattern of the final pattern P3 of the magnetic disk formed in the magnetic disk manufacturing process, correction is made into drawing signal data indicating an initial pattern for drawing on the resist layer on the substrate by the electron beam. Is done. In other words, one of pattern deformation due to dose distribution of electron beam exposure, pattern deformation due to mold creation process, pattern deformation due to nanoimprint, and pattern deformation that occurs during magnetic disk creation process from nano-imprinting to magnetic layer formation to lubricating layer formation The dose distribution of the initial pattern is determined in consideration of the total pattern deformation amount of one or a combination thereof.

In other words, the amount of deformation in each process is measured or calculated in advance, and even if deformation from the initial pattern occurs in each process, drawing is performed with an electron beam so that the final target pattern has the intended pattern shape. The initial pattern is adjusted (the amount of deformation generated in each process is added to determine the shape or dose distribution of the initial pattern as much as possible as the final target pattern).

Whether the final target pattern is the final pattern in the magnetic disk manufacturing process, the pattern after the nanoimprint process, the pattern after the mold creation process, or the pattern after the electron beam drawing process depends on the intention of the user who uses the apparatus. Also, the deformation amount reflected in the initial pattern is the pattern deformation due to the dose distribution of electron beam exposure, the pattern deformation due to the mold creation process, the pattern deformation due to nanoimprint, the magnetic disk formation process from the formation of the magnetic material after nanoimprinting to the formation of the lubricating layer May be the total deformation amount of the pattern deformations generated in step 1, or the total deformation amount of any one or a combination thereof. This also depends on the intention of the user who uses the apparatus.

There are various methods for drawing the initial pattern reflecting the deformation amount, such as changing the exposure time, the number of exposures, and the exposure amount (energy amount) as shown in FIGS. Hereinafter, an example of an initial pattern drawing method will be described.

Suppose the rectangle is the target pattern as the final pattern on the magnetic disk. In this case, the drawing pattern by the electron beam corresponding to the drawing signal indicating the initial pattern in the exposure process is a pattern in which the rectangular edges are emphasized as shown in FIG. That is, a pattern in which small rectangular protrusions are added to four rectangular corners. In the pattern formed on the baby stamper 5a of the mold formed in step S11, the protruding portion becomes small as shown in FIG. 15 (b), and the pattern transferred by the nanoimprint method in the subsequent transfer process is shown in FIG. As shown in FIG. As shown in FIG. 15D, the final pattern of the magnetic disk formed in the lubrication layer forming step has no protrusions and becomes a target rectangle.

The drawing pattern by the electron beam in FIG. 15A is formed by a plurality of drawing lines LN1 to LN4 and LN0, LN0 ', LN5, and LN5' as shown in FIG. LN0, LN0 ', LN5 and LN5' correspond to the protrusions.

Further, when a rectangle is a target pattern as the final pattern of the magnetic disk, it can be formed by four drawing lines LN1 to LN4 as shown in FIG. In this drawing, the first and fourth drawing lines LN1, LN4 are slightly longer at both ends than the second and third drawing lines LN2, LN3 between them as edge enhancement.

FIG. 18 schematically shows pit pieces V (j) (j = 1 to 4) drawn on each of the drawing lines LN1 to LN4. By drawing the drawing lines LN1 to LN4 (number of lines NLN = 4), a line of pits W (drawing pattern) (pit sequence WW) is drawn using the lines LN1 to LN4 as one track.

That is, the profile of the electron beam has a spread (generally, a Gaussian shape), and the dose profile (dose distribution) varies depending on the forward and back scattering of the irradiation beam. In the present embodiment, the formatter 50 controls the interval between drawing lines adjacent to each other so that the dose profile of each line overlaps. Accordingly, the dose amount profile by drawing (beam irradiation) of the lines LN1 to LN4 is a combination of these.

Therefore, by drawing a row of pit pieces (pit piece sequence) on each of the drawing lines LN1 to LN4, a pit sequence WW is drawn by combining these drawn pit pieces.

Next, referring to the drawing, a pit piece V (j) is drawn on a drawing line LN (j) by a formatter 50, and a plurality of pit pieces V (j) (j is a line number, j = 1, 2). ,...) Will be described in detail with respect to control for forming a pit W having an arbitrary shape and control for drawing a pit pattern WW composed of a row (pit sequence) of the pit W.

FIG. 19 is a flowchart showing a procedure for drawing a pit piece V (j) (j = 1, 2,...) On each drawing line LN (j). In the following description, an example in which pit pieces V (1) to V (4) are drawn on each of the drawing lines LN1 to LN4 (j = 1 to 4) will be described. A pit W having an arbitrary shape can be formed by the pit pieces V (1) to V (4).

First, the formatter 50 determines whether or not the irradiation position of the electron beam has reached the drawing start position on the drawing start line (LN1, i.e., j = 1) on the substrate 15 (step S31). If it is determined that the drawing start position has been reached, the formatter 50 generates and outputs a pattern to be drawn on the line (hereinafter also referred to as a line drawing pattern) based on the drawing data, and performs drawing (step S32). ). Here, the line drawing pattern is a row (pit piece sequence) of pit pieces V (1) to be drawn on the drawing line LN1, and the pit piece sequence of the line LN1 is, for example, k1 pit pieces V ( 1, k1). When k1 = 1, it indicates that drawing (beam irradiation) is continuously performed on the line LN1, and when k1 = 0, it indicates that drawing (beam irradiation) is not performed on the line LN1. In addition, a pit piece sequence VQ (j) including k1 to k4 pit pieces V (j, kj) is drawn on the lines LN1 to LN4, respectively.

In the present embodiment, among the pit piece sequences VQ (1) to VQ (4) drawn on the lines LN1 to LN4, the pit pieces V (1) are respectively placed at the same radial position (r) on the lines LN1 to LN4. ) To V (4) will be described as an example.

As shown in FIG. 20, the formatter 50 includes a pit piece drawing end point (hereinafter referred to as “drawing start point”) VS (1) from the pit piece drawing start point (hereinafter simply referred to as drawing start point) of the pit piece V (1) on the line LN1. This is simply referred to as a drawing end point.) Drawing (beam irradiation) is performed up to VE (1). Thereby, drawing of the pit piece V (1) is performed. Note that the drawing start position and drawing end point for each drawing line, or setting values for the pit piece drawing length described later are stored in the memory 53 or a storage unit provided in the EBR control signal generator (processor) 51. ing. The memory 53 stores hard disk initial pattern data (such as concentric patterns, track area patterns, servo area patterns, etc.) such as discrete track media and bit patterned media. The processor 51 generates a control signal for the EBR 10 using the initial pattern data.

As shown in FIG. 10, in the drawing of the line LN1, the outer peripheral direction and inner peripheral direction offset signals F8 and F9 which are beam shift signals (second deflection signals) in the radial direction are not output, and the beam is shifted at high speed. The amount is zero. Therefore, the pit piece sequence VQ (1) of the line is drawn without shifting from the line LN1.

As described above, when it is determined that the pit piece sequence VQ (1) is drawn on the line LN1 and the drawing of the line LN1 is finished (step S33), the formatter 50 increments the line number j (step S34). . Next, it is determined whether or not the drawing pattern WW has been drawn (step S35). Since the line number to be drawn is j = 2, the process proceeds to step S32.

The above steps S32 to S35 are executed for the line LN2, and the pit piece sequence VQ (2) is drawn on the line LN2. As shown in FIG. 10, in the drawing of the line LN2, the beam is deflected (+ shifted) in the outer circumferential direction by the outer circumferential offset signal F8, and the drawing is performed. Similarly to the pit piece V (1), the pit piece V (2) is drawn from the drawing start point VS (2) to the pit piece drawing end point VE (2), and the pit piece V (2) is drawn. Is done.

The drawing line LN3 is drawn from the drawing start point VS (3) to the pit piece drawing end point VE (3) in a state where the beam is deflected (−shifted) to the inner circumference by the inner circumference direction offset signal F9. The pit piece V (3) is drawn. The drawing line LN4 is not deflected by the outer and inner circumferential offset signals F8 and F9, but is drawn from the drawing start point VS (4) to the pit piece drawing end point VE (4). Drawing of the piece V (4) is performed.

When the drawing line LN4 has been drawn, it is determined that drawing of the drawing pattern WW has ended (step S35), and this control ends.

As described above, an arbitrarily shaped pit W can be formed by synthesizing the pit pieces V (1) to V (4). More specifically, the dose profile changes according to the overlapping of drawing of the pit pieces V (1) to V (4) or the beam intensity in drawing (beam irradiation). That is, the profile of the electron beam is broad (generally a Gaussian shape), and the dose profile changes depending on the forward and back scattering of the irradiation beam. Accordingly, the actual shape of the pit W (dose amount profile) is a combination of these. More specifically, as shown in FIG. 21, the dose profile in the radial direction can be adjusted by drawing the pit pieces V (1) to V (4). For example, the central portion in the radial direction can be strengthened as in the profile RA, or the edge portion in the radial direction can be strengthened as in the profile RB.

Alternatively, the formatter 50 outputs a tangential deflection signal F16 (third deflection signal) and deflects the beam in a tangential direction or a circumferential direction (+ θ, −θ direction) at a high speed when drawing the pit piece V (j). Thus, the dose profile in the tangential direction or the circumferential direction can be adjusted. As shown in FIG. 22, for example, the central portion in the tangential direction can be strengthened as in the profile TA, or the edge portion in the tangential direction can be strengthened as in the profile TB.

The offset amounts (offset signals F8 and F9) in the outer circumferential direction and the inner circumferential direction can be arbitrarily set, and the formatter 50 has a function of adjusting the offset amount according to the input overlapping degree.

As shown in FIG. 14, the baby stamper pattern P1 in the mold making process based on the substrate having the pattern by the drawing lines LN1 to LN4 drawn by the electron beam as described above, was transferred in the transfer process of the nanoimprint method. A feedback operation is performed to correct the pattern drawn on the resist layer on the substrate by the electron beam according to the shape of at least one of the pattern P2 and the final pattern P3 of the magnetic disk formed in the lubricating layer forming step. Is called. By adjusting the dose profile in the radial direction and / or tangential direction as the correction, the corner size of the drawing pattern changes. A desired final pattern can be obtained by repeating the above feedback operation.

In this way, by correcting the initial pattern of drawing, the final pattern on the magnetic disk can be targeted regardless of the pattern error component that exists in the process until the magnetic disk is manufactured based on the stamper created by electron beam drawing. It can be formed according to the shape of the pattern. Therefore, a magnetic disk having a highly accurate pattern can be formed.

In the above embodiment, at least one pattern of the baby stamper pattern in the mold creation process, the pattern transferred in the nanoimprint transfer process, and the final pattern of the magnetic disk formed in the lubricating layer formation process in the above embodiment. However, the initial pattern data may be automatically corrected as shown in FIG.

In the automatic correction of the pattern of FIG. 23, first, the final pattern of the magnetic disk formed in the lubricating layer forming step is acquired as an image (step S41). In the automatic correction, the initial pattern is corrected by correcting the data indicating the pattern shape to be formed (or drawn) on the magnetic disk instead of using the final pattern image of the magnetic disk actually formed. You may make it obtain.

When an image of the final pattern is obtained by photographing means (not shown), the final pattern is analyzed to detect an error (step S42). That is, an error from the target pattern at the corner portion of the final pattern is detected. For example, the maximum radial error and the maximum tangential error of each of the four corners are detected. An initial pattern correction amount is determined in accordance with the error (step S43). 17 and 18, the correction amount is an amount for adjusting the dose distribution in the tangential direction. The correction amount can be determined according to a predetermined data table. Then, a drawing signal of the initial pattern (pit piece sequences VQ (1) to VQ (4)) corrected according to the correction amount is generated (step S44). The drawing signal generated in step S34 is written in the memory 53 (step S45). Thereafter, an exposure process is executed according to the drawing signal written in the memory 53.

In accordance with the drawing signal of the initial pattern after the automatic correction, electron beam drawing is performed, a stamper is created based on the drawing pattern obtained thereby, and in the lubricating layer forming process in the manufacturing process of the magnetic disk based on the stamper If the final pattern of the magnetic disk is obtained, this automatic correction operation may be performed again.

In this way, by automatically correcting the initial pattern of drawing, the final pattern on the magnetic disk can be obtained regardless of the pattern error component existing in the process until the magnetic disk is manufactured based on the stamper created by electron beam drawing. It can be formed easily and in a short time according to the shape of the target pattern. Therefore, a magnetic disk having a highly accurate pattern can be formed.

In performing this automatic correction operation, a final pattern acquisition unit 81, an error detection unit 82, a correction amount calculation unit 83, and a drawing signal generation unit 84 are provided in the input stage of the formatter 50 as shown in FIG. The output of the final pattern acquisition unit 81 is supplied to the EBR control signal generator 51 via the input / output unit 55, and the EBR control signal generator 51 performs the above-described error detection, correction amount calculation, and drawing signal generation operations. You may do it.

Also, edge enhancement may be performed by drawing the same line multiple times. For example, by drawing all the above lines LN1 to LN4 or only the lines LN1 and LN4 four times, it is possible to prevent the corners from being rounded compared to the one-time drawing.

25 to 30 show a pattern drawing method using an electron beam for a target pattern finally formed on a recording medium such as a magnetic disk.

In the drawing method shown in FIG. 25, drawing is performed by irradiating an electron beam a plurality of times, and the irradiation inside the pit pattern is thinned out. For example, the electron beam irradiation is performed four times in the portion indicated by reference numeral A1 in FIG. 25, and the electron beam irradiation is performed three times in the portion indicated by reference numeral A2. As a result, the received light amount (energy amount) differs between the portion indicated by the reference symbol A1 and the portion indicated by the reference symbol A2.

In the drawing method shown in FIG. 26, dither is used. 26 is irradiated with an electron beam, and the portion indicated by B2 in FIG. 26 is not irradiated with an electron beam or deflected at high speed. As a result, an optimal dose distribution is obtained as the initial pattern.

In the drawing method shown in FIG. 27, LN1 and LN4, which are edge lines of the pit pattern, are tracked four times, and the electron beam irradiation is performed four times in the portion indicated by reference numeral C1, and the internal line of the pit pattern In LN2 and LN3, the tracking is performed three times, and the electron beam irradiation is performed three times in the portion indicated by reference numeral C2.

In the drawing method shown in FIG. 28, LN1 and LN4, which are the edge lines of the pit pattern, are tracked four times, and the portion indicated by reference numeral D1 is irradiated with the electron beam four times, and is indicated by reference numeral D2. In the portion, three times of electron beam irradiation are performed. In LN2 and LN3 which are the internal lines of the pit pattern, tracking is performed three times, and the electron beam irradiation is performed three times in the portion indicated by reference numeral D2.

In the drawing method of FIGS. 25 to 28, the exposure time or the number of exposures, or both the exposure time and the number of exposures) are changed, but pattern drawing can also be performed by changing the exposure amount (exposure energy amount).

In the drawing method shown in FIGS. 29 and 30, the amount of energy applied to the resist is changed using deflection. In the areas E1 and E2, the exposure amount per unit area is changed by deflecting the electron beam in the rotation direction of the disk substrate. In the regions E1 and E2, the electron beam is deflected at a predetermined speed in the direction opposite to the rotation. In the areas E1 and E2, the speed of beam deflection is added and the relative speed of the electron beam with respect to the substrate is increased compared to the other areas, so that the amount of energy applied to the resist layer is reduced.

Further, in the drawing method shown in FIGS. 29 and 30, the amount of energy irradiated to the resist layer may be changed by changing the acceleration voltage of the electron beam. In the regions E1 and E2, the acceleration voltage of the electron beam is decreased. The electrons irradiated to the areas E1 and E2 have kinetic energy reduced by the reduced acceleration voltage, and as a result, the exposure amount per unit area is reduced. In contrast to this, the acceleration voltage may be increased at the time of drawing an area (cross line area) other than the areas indicated by reference signs E1 and E2.

Furthermore, in the above-described embodiment, the formatter 50 is provided outside the EBR main body 10, but the formatter 50 may be mounted inside the EBR main body 10.

Further, the beam used in the present invention may be not only an electron beam but also an ion beam.

Claims

A control device for an electron beam drawing apparatus that irradiates an electron beam to draw a pattern on a substrate,
A drawing signal generator for generating a drawing signal for drawing an initial pattern;
The control apparatus according to claim 1, wherein the drawing signal is generated based on a shape of the initial pattern different from a shape of a target pattern to be finally obtained.
2. The control apparatus according to claim 1, wherein the initial pattern shape is a combined pattern of a pattern error component generated in a subsequent process of drawing an electron beam on the substrate and the target pattern.
The initial pattern shape includes a dose distribution error when drawing an electron beam on the substrate, and a shape error when transferring from a stamper created based on a pattern drawn by the electron beam to a magnetic disk substrate. The control device according to claim 1, wherein the control device takes into account any one of them.
4. The control device according to claim 1, wherein the initial pattern is a pattern obtained by converting the target pattern according to a predetermined rule.
5. The initial pattern is composed of a plurality of partial patterns, and the number of times of irradiation of an electron beam irradiated for drawing the plurality of partial patterns is different. Control device.
6. The control device according to claim 5, wherein the partial pattern constituting the outer peripheral portion of the initial pattern has a higher number of electron beam irradiations than the partial pattern constituting the interior of the initial pattern.
6. The control device according to claim 5, wherein the number of times of irradiation of the electron beam to the partial pattern constituting the corner portion of the initial pattern is greater than that of the other partial patterns.
A memory storing pattern data for drawing a pattern on a substrate by irradiating an electron beam, and a drawing signal generator for generating a drawing signal for drawing an initial pattern according to the pattern data A method for controlling an electron beam lithography apparatus, comprising:
The control method according to claim 1, wherein the drawing signal is generated based on a shape of the initial pattern different from a shape of a target pattern to be finally obtained.
A drawing method in which a portion corresponding to one pattern is drawn in a plurality of rounds from the inner periphery to the outer periphery using an electron beam recording apparatus that draws a pattern on the substrate by irradiating an electron beam while rotating and translating the substrate. There,
A drawing method, wherein exposure energy for each round is changed for exposure for forming a portion corresponding to the one pattern.
10. The drawing method according to claim 9, wherein the exposure amount of each round is decreased and increased sequentially between the inner and outer peripheries.
11. The drawing method according to claim 10, wherein the exposure time of each round is constant, and the exposure energy is decreased and increased sequentially between the inner and outer peripheries.
A drawing method in which a portion corresponding to one pattern is drawn in a plurality of rounds from the inner periphery to the outer periphery using an electron beam recording apparatus that draws a pattern on the substrate by irradiating an electron beam while rotating and translating the substrate. There,
An exposure method for forming a portion corresponding to the one pattern, wherein an exposure energy amount per unit area in the one pattern is changed.