JP2002367241A - Information recording device and information recording medium method as well as recording medium - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an information recording device which is capable of making a master disk of a high-density optical disk. SOLUTION: This information recording device for concentric track recording has a rotational driving section which supports and rotates the master disk formed with a resist, an exposure beam exit section which forms a spot by irradiating freely deflectably the master disk with an exposure beam and a relative movement driving section which causes the relative translational motion of the rotational driving section and the spot in the radial direction of the master disk. The information recording device described above has an exit control section which supplies the command to modulate the intensity of the exposure beam according to the data to be recorded to the exposure exit section, a movement control section which supplies the command to move the rotational driving section together with the rotating master disk by a track pitch at each one revolution of the master disk to the relative movement driving section and a deflection control section which successively moves from an exposure start position to the same direction as the moving direction of the rotational driving section by deflecting the exposure beam subjected to intensity modulation so as to make the spot equal to the track pitch of the rotational driving section and supplies the command to periodically repeat the deflection motion to intermittently turn the same to the exposure start position to the exposure beam exit section at the point of the time the spot moves to the exposure stop position in one revolution of the master disk.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an information recording apparatus using an exposure beam such as an electron beam, and more particularly to the manufacture of a master for a recording medium having tracks such as a read-only optical disk, a magneto-optical optical disk, and a phase-change optical disk. The present invention relates to an information recording apparatus for a manufacturing apparatus, an information recording method thereof, and a recording medium such as an optical disk copied from a master.

[0002]

2. Description of the Related Art As an optical recording medium on which data can be recorded, a recordable DVD-R (Digital Versatile Disc-Rec) is used.
ordable) or rewritable DVD-RW (Digital Ver.)
There are optical disks such as satileDisc-ReWritable). In these optical discs, generally, signals such as rotation control information such as a wobbling signal used for rotation control of the optical disc and address information necessary for position search at the time of recording data are recorded in advance in the form of a concave or convex portion when a master is manufactured. (Groove track or land track).

[0003] In these optical disks, a predetermined concavo-convex pattern along a track corresponding to a signal is recorded on a master, a disk stamper is formed from the recorded master, and a synthetic resin or the like is hot-pressed using the disk stamper. Alternatively, it is obtained by injection molding, performing metal vapor deposition on the recording surface on which the pattern has been transferred from the master, and then forming a light-transmitting substrate. The recording of the pattern on the master is performed by an information recording apparatus. By rotating the recording surface of the master and appropriately sending a header for irradiating the laser light beam in the radial direction, the irradiation spots of the laser light beam are almost equally spaced. Information pits or grooves are recorded on the master by turning on / off the laser beam in accordance with the rotation speed and the information content of the recording master on the track on the track. I was

[0004] In recent years, research and development of recording media of higher density than DVD have been promoted, and it is desired to make the track pitch extremely fine. However, in conventional track cutting, ie, mastering, of a master using a laser light beam, the recording resolution of the spot diameter of the recording laser light beam is limited by its wavelength and the numerical aperture NA of the objective lens.

Therefore, cutting of a master using electron beam exposure, which has a smaller spot diameter than a laser beam and can improve the recording resolution, has been studied. For example, Japanese Patent No. 3040887 (JP-A-6-131706)
No.) When the resist layer is exposed to an electron beam to form a concentric track pattern latent image using the disclosed apparatus, the recording surface of one rotation master is exposed to an electron beam, and the master is moved by a track pitch. Then, the operation of exposing the recording surface of the one-turn master with an electron beam, moving the master at a track pitch again, and stopping is repeated.

[0006]

In the case of the conventional method, in the electron beam exposure apparatus, the master is rapidly moved from the exposure of one rotation of the master at a fixed position to the next track pitch position. It takes time for the rotation to stabilize. Furthermore, since an advanced position detection and positioning mechanism is required to maintain such position accuracy, there is a problem that it is difficult to accurately expose a concentric track pattern.

SUMMARY OF THE INVENTION The present invention has been made in view of the above points, and has as its object to provide an information recording apparatus for producing a master disc capable of accurately producing concentric track patterns, a method thereof, and a recording medium. It is in.

[0008]

According to the present invention, there is provided an information recording apparatus, comprising: a rotation drive section for supporting and rotating a master on which a resist layer is formed; and a spot formed by irradiating an exposure beam on the master deflectably. An information recording apparatus for recording concentric tracks, comprising: an exposure beam emitting unit; and a relative movement driving unit that relatively translates the rotation driving unit and the spot in a radial direction of the master. An injection control unit for supplying an instruction for modulating the intensity of the exposure beam to the exposure beam emitting unit in accordance with the data to be output, and an instruction for moving the rotary drive unit together with the rotating master by a track pitch for each rotation of the master. A movement control unit that supplies the relative movement drive unit, and deflects the intensity-modulated exposure beam so that its spot is equal to the track pitch of the rotation drive unit. When the sequential moved in the moving direction and the same direction of the rotary drive unit from the exposure start position so that, moved to the exposure stop position in one rotation of the master disc,
A deflection control unit for supplying a command to the exposure beam emitting unit for periodically repeating a deflection operation for intermittently returning the exposure start position to the exposure start position.

In the information recording apparatus of the present invention, the exposure beam emitting section emits an electron beam as an exposure beam. In the information recording apparatus according to the present invention, the exposure start position is a position where an exposure beam intensity according to data to be recorded becomes zero. The information recording method according to the present invention includes: a rotation drive unit that supports and rotates a master on which a resist layer is formed; an exposure beam emission unit that deflects an exposure beam onto the master deflectably to form a spot; And a relative movement drive unit for relatively translating the spot and the spot in the radial direction of the master, using a data recording device including: a latent image of a concavo-convex pattern for recording a concentric track; A recording method, wherein the master is rotated, and sequentially moved in the radial direction at one track pitch for each rotation thereof, and the spot is formed by deflecting an exposure beam intensity-modulated according to data to be recorded. Are sequentially moved from the exposure start position in the same direction as the moving direction of the master, and when the spot is moved to the exposure stop position in one rotation of the master, the spot is moved. And wherein the repeating intermittently back deflection operation on the exposure start position periodically.

In the information recording method according to the present invention, the exposure beam emitting section emits an electron beam as an exposure beam. The recording medium of the present invention is a recording medium having a substrate duplicated using a master having a predetermined concavo-convex pattern formed along a concentric track and a recording layer formed on the substrate, and a resist While rotating the master on which the layer is formed, the master is sequentially moved in the radial direction at one track pitch for each rotation, and the exposure beam whose intensity is modulated according to the data to be recorded is deflected. The spot is sequentially moved from the exposure start position in the same direction as the moving direction of the master, and when the spot is moved to the exposure stop position in one rotation of the master,
An information recording step of forming a latent image comprising a process of periodically repeating a deflection operation of returning the spot to the exposure start position, and developing the latent image formed on the resist layer by the information recording step. And a transfer step of manufacturing a stamper on which a predetermined uneven pattern is formed by transferring the uneven pattern formed on the resist layer by the developing step. It is characterized by being obtained by.

[0011]

Embodiments of the present invention will be described in detail with reference to the drawings. FIG. 1 is a schematic block diagram of an electron beam recorder 10 which is an information recording device according to an embodiment of the present invention. Since an electron beam has a characteristic of being significantly attenuated in an air atmosphere, electron beam exposure is performed in a vacuum atmosphere. Therefore, the electron beam recorder 1
Numeral 0 is provided with a vacuum chamber 11 for accommodating a drive mechanism for rotating and translating the master 15 such that they operate in a vacuum atmosphere. An electron beam column unit 40 for emitting an electron beam is provided vertically above the master main surface of the vacuum chamber 11. The electron beam recorder 10 also includes a control device outside the vacuum chamber 11. A vacuum pump 28 is connected to the vacuum chamber 11, and the inside of the chamber is set to a vacuum atmosphere of a predetermined pressure by exhausting the inside of the chamber. The vacuum chamber 11 is installed on the floor via a vibration isolator (not shown) such as an air damper, and transmission of vibration from the outside is suppressed. For example, a silicon substrate is used as the master 15, and an electron beam resist layer is provided on a main surface thereof.

The rotary master is translated in the horizontal direction, and a latent image for a fine uneven pattern such as prepits and grooves is formed on the resist layer by the trajectory of the electron beam spot irradiated on the master. <Rotary drive unit and relative movement drive unit> As shown in FIG.
In the vacuum chamber 11, a master 15 is placed on a turntable 16, which is rotated by a spindle motor 17. The master is driven to rotate about a vertical axis at the center of the main surface. The spindle motor 17 includes a magnetically shielded motor having a vacuum-compatible air spindle structure. The spindle motor 17 is mounted on a feed stage (hereinafter, simply referred to as a stage) 18 that can be moved linearly by a slider.

The stage 18 is connected to a feed mechanism 19 for feeding a screw by a DC motor, and
7 and the turntable 16 are configured to be movable in a horizontal plane parallel to the main surface of the master 15. The spindle motor 17 and the feed mechanism 19 are connected to a feed rotation controller 30. The feed rotation control unit 30 performs feedback servo control of the rotation based on the output from the encoder of the spindle motor 17, and uses a length measurement data from the radius sensor 20 using a laser length measuring device to feed the feed mechanism. 19 is driven to perform feedback servo control of the speed of the stage 18. The feed rotation control unit 30 controls the rotation speed of the spindle motor 17 and the feed distance of the feed mechanism 19 to be constant based on predetermined track pitches and length measurement data supplied from the controller 25. In the radius sensor 20, the vacuum chamber 11
A laser light source 20a and a photodetector 20c of the radius sensor 20 are provided on the side inner wall, and a reflecting mirror 20b that reflects laser light from the laser light source is fixed to the stage 18.

The feed rotation control section 30 outputs the position data of the master to the controller 25. The controller 25 includes a clock synchronizing circuit for generating a synchronizing clock. The controller 25 outputs a signal of the position data of the master from the feed rotation controller 30, a modulation signal corresponding to a prepit or groove to be recorded, and the like.
And synchronize the modulated signal with a beam modulating unit 52 described later.
Supply to Thus, the controller 25 and the feed rotation control unit 30 cause the feed mechanism 19 to move the stage 18 together with the rotary master so as to advance by one track pitch for each rotation of the master.

Further, the controller 25 synchronizes the electron beam deflection signal with the position data signal and the modulation signal, and converts the electron beam deflection signal into a beam deflection unit 5 described later.
Output to 5 <Exposure Beam Emission Unit> On the inner wall of the vacuum chamber 11 near the electron beam column unit 40, a focus sensor including a laser light source 22 and a photodetector 23 is provided in the laser beam incident surface on the master, and the main surface of the master 15 Is optically detected. The photodetector 23 supplies a light reception signal to the height detection unit 24. The height detector 24 detects height data of the main surface of the master 15 based on the light receiving signal and sends the data to the focusing unit 56.

An electron gun 41, a converging lens 42,
A blanking electrode 43, an on / off control aperture 44,
The beam deflection electrode 45, the focus adjustment lens 46, and the objective lens 47 are arranged in this order. An electron beam emission port 49 provided at the tip of the electron beam column section 40
Is directed to the master 15, and when the electron beam emitted from the electron gun 41 passes through the opening of the aperture 44 for on / off control, the electron beam is converged by the objective lens 47 and is incident on the main surface of the master. It is configured to form a fine electron beam spot.

The electron gun 41 emits an electron beam accelerated by a high voltage of several tens KeV from an accelerating high voltage power supply 51. The converging lens 42 converges the emitted electron beam and guides it to an aperture 44. The blanking electrode 43 is controlled by the beam modulator 52, and performs intensity modulation (on / off control) of the electron beam based on a modulation signal from the controller 25. That is, the beam modulator 52 supplies the modulation signal to the blanking electrode 43 and
A voltage is applied between the three to deflect the passing electron beam greatly. Thereby, the passage of the electron beam to the aperture 44 is prevented, and the electron beam is turned off, and the electron beam is turned on.

The beam deflecting electrode 45 is composed of electrodes which are arranged opposite to each other and are orthogonal to each other. , Y) are independently deflectable. The biaxial electrodes of the beam deflection electrode 45 are controlled by a radial deflection signal X (t) and a tangential deflection signal Y (t) from the beam deflection unit 55, respectively, and deflect the passing electron beam in respective axial directions. The beam deflecting unit 55 generates deflection signals X (t) and Y (t) based on the electron beam deflection signal from the controller 25, and uses these to deflect the passing electron beam by the beam deflection electrode 45 according to, for example, a radial deflection signal. The spot is deflected to move the spot on the master radius at a rate of one track pitch per rotation of the master. Further, the beam deflecting unit 55 corrects the residual error component based on the length measurement data from the radius sensor 20 and the rotation speed data from the encoder of the spindle motor 17, and generates deflection signals X (t) and Y (t). The position of the electron beam spot on the main surface of the master 15 is also controlled.
As described above, the beam modulation unit 52 of the emission control unit supplies a command for modulating the intensity of the exposure beam according to the data to be recorded to the beam deflection electrode 45 of the exposure beam emission unit.

The focus adjusting lens 46 is controlled by a focusing unit 56, and the focusing unit 56 receives an objective lens 47 based on a detection signal from the height detecting unit 24.
The focus of the electron beam spot converged on the main surface of the master 15 is thereby adjusted. The accelerating high-voltage power supply 51 and the focusing unit 56 also operate based on a control signal from the controller 25.

The beam deflecting unit 55 supplies a deflecting signal to the beam deflecting electrode 45 to deflect the electron beam so that the beam spot S advances by one track pitch per one rotation of the master, as shown in FIG. Then, the stage 18 is moved from the exposure start position A to the exposure stop position B on the radius of the master 15 in the same direction D as the moving direction of the stage 18 (from the outer periphery to the inner periphery).

That is, for each rotation of the master, the spot S
The moving amount on the radius of the master on which the stage 18 moves is a distance equal to the track pitch T of the rotary drive unit of the stage 18. If there is a difference between the spot movement amount and the master disk movement amount, the joint of the tracks will be shifted. In addition, FIG.
An example is shown in which the beam spot S has advanced the track pitch by rotation and has advanced the track pitch. Thus, a concentric latent image is formed at a distance of one track pitch for each rotation of the master.

Specifically, as shown in FIG. 3, while the rotating master 15 is moving in the direction D by the track pitch T for each rotation thereof, the electron beam spot S is moved in the same direction D.
The spot S reaches the exposure stop position B at the time when the track pitch moves in the outer circumferential direction from the exposure start position A, and the spot S is intermittently moved to the exposure start position A, that is, jumps. Periodically. As described above, the controller 25 and the beam deflecting unit 55 shown in FIG. 1, that is, the deflection control unit, cause the beam deflecting electrode 45 to execute such a deflecting operation according to the radial deflection signal. The exposure start position A and the exposure stop position B are based on the position of the electron beam column unit 40, not on the master.

The feed rotation control unit 30 shown in FIG.
In order to satisfy the relationship between the rotation of the master and the stage feed amount shown in (a), a command to move by the track pitch T per rotation of the master is supplied to the feed mechanism 19. at the same time,
The beam deflecting section 55 satisfies the relationship between the rotation of the master and the beam deflection amount shown in FIG. 4B, that is, the spot is shifted from the exposure start position A in the same direction as the stage feed by the track pitch T per rotation. The beam is sequentially moved to the next exposure start position, ie, A, at the exposure stop position B at the track pitch of the first rotation, and a command of a sawtooth waveform to be sequentially moved is supplied to the beam deflection electrode 45 in the same manner. The exposure start position is a position where the intensity of the exposure beam according to the data to be recorded becomes zero. Further, FIG.
In synchronization with the relationship shown in FIG. 4B, the beam modulation is performed so as to satisfy the relationship between the rotation of the master and the beam intensity shown in FIG. 4C, that is, to make the beam intensity zero at least at the time of jump. The unit 52 supplies a blanking command to the beam deflection electrode 45 so as to maintain a beam intensity sensitive to the resist layer for groove exposure during the first, second and third rotations.

According to the series of deflection operations of the modulated beam spot, the resist layer of the master has a groove latent in the locus of the exposure movement of the spot S during the first, second and third rotations, as shown in FIG. An image G is formed and 1
After the exposure trajectory of the rotation, an exactly connected concentric groove latent image G is formed. This operation is performed on the entire master to complete the information recording step of forming a latent image. When a pre-address information pattern is formed together with a groove, the electron beam is turned on and off by a beam deflection electrode according to the pre-address information pattern to be recorded.

The exposure recording master having the latent image formed on the resist layer is mounted on a developing device, and is developed to remove the latent image portion to form a concavo-convex pattern on the resist layer, thereby obtaining a developed master. In this embodiment, the electron beam exposure period is divided into a groove period and a pre-pit period by synchronizing the on-off control and the deflection operation of the electron beam with respect to the rotating master on the slider that moves at a constant distance, and these are alternately repeated. In addition, since the connection of the electron beam exposure is achieved with high accuracy, the side surfaces such as the grooves after the master development can be formed smoothly.

Next, after the development master is fixed by post-baking, a conductive film such as nickel or silver is formed on the resist layer by sputtering or vapor deposition, and the concavo-convex pattern formed on the resist layer is transferred. Next, a nickel stamper is formed by, for example, nickel electroforming, and the stamper is separated from the substrate to obtain a nickel stamper. By the stamper, for example, an injection molding method or a so-called 2P
By a method or the like, a replica of the resin optical disk substrate having the same predetermined pre-information is created.

On the optical disk substrate thus obtained, for example, a protective film, a phase-change material medium layer, a protective film, and a reflective film are sequentially laminated and bonded to another substrate by an adhesive layer, thereby producing an optical disk. . In the above example, the manufacture of the optical disk substrate was described. However, according to the present invention, a substrate on which a pre-pattern (servo pattern) is formed concentrically, and a magnetic recording layer is formed thereon, Platter for disks and hard disks can be manufactured.

In the present invention, the pits are formed by irradiating the electron beam on the recording surface of the master in the vacuum chamber using the electron beam irradiator. A pit may be recorded by irradiating a laser beam with a spot on a recording surface by a laser irradiator provided with a laser, a two-dimensional optical deflector, a mirror, and an objective lens.

[0029]

As is apparent from the above description, according to the present invention, a single exposure beam is used to form the same latent image as a concentric latent image formed by a conventional exposure apparatus using a plurality of laser beams. Can be formed with a single exposure beam without using a plurality of exposure beams.

[Brief description of the drawings]

FIG. 1 is a schematic block diagram showing an electron beam recorder using an electron beam according to the present invention.

FIG. 2 is a schematic perspective view showing a state of recording on a master in an electron beam recorder according to the present invention.

FIG. 3 is a schematic cross-sectional view showing a state of recording on a master in an electron beam recorder according to an embodiment of the present invention.

FIG. 4 is a graph illustrating a master disk feeding operation, a beam deflection operation, and a beam recording signal in the electron beam recorder according to the embodiment of the present invention.

FIG. 5 is an enlarged partial plan view for explaining formation of a latent image of a master in an electron beam recorder according to an embodiment of the present invention.

[Explanation of symbols]

 Reference Signs List 10 electron beam recorder 11 vacuum chamber 15 master 16 turntable 17 spindle motor 18 stage 19 feed mechanism 20 radius sensor 25 controller 30 feed rotation control unit 40 electron beam column unit 45 beam deflection electrode 55 beam deflection unit

 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Masaki Sone 465 Osato-cho, Kofu City, Yamanashi Prefecture Inside Pioneer Corporation (72) Inventor Kenji Uemura 465 Osori-cho, Kofu City, Yamanashi Prefecture Pioneer Corporation (72) Inventor Hiroki Kaneda 465 Osatocho, Kofu City, Yamanashi Prefecture Pioneer Corporation (72) Inventor Kazumi Kuriyama 465 Osoricho, Kofu City, Yamanashi Prefecture Pioneer Corporation F Term (reference) 2H097 AA03 AB07 BA06 BB01 BB03 CA16 GB04 LA20 5D090 AA01 BB01 BB03 BB05 CC01 FF11 GG02 HH01 5D121 BB01 BB21 BB38

Claims (6)

[Claims] A rotation drive unit configured to support and rotate a master on which a resist layer is formed; an exposure beam emitting unit configured to irradiate an exposure beam onto the master deflectably to form a spot;
An information recording apparatus for recording concentric tracks, comprising: a rotary drive section and a relative movement drive section for relatively translating the spot in the radial direction of the master, wherein the exposure is performed according to data to be recorded. An injection control unit for supplying a command for modulating the beam intensity to the exposure beam emitting unit; and a command for moving the rotation drive unit together with a rotating master by a track pitch for each rotation of the master to the relative movement drive unit. A movement control unit for supplying the light, and deflects the intensity-modulated exposure beam so that the spot is
The rotation drive unit is sequentially moved from the exposure start position in the same direction as the movement direction of the rotation drive unit so as to be equal to the track pitch, and when the exposure drive position is moved to the exposure stop position in one rotation of the master, the exposure start is started. A deflection control unit for supplying to the exposure beam emitting unit a command for periodically repeating a deflection operation for intermittently returning to a position. 2. The apparatus according to claim 1, wherein the exposure beam emitting section emits an electron beam as an exposure beam.
The described device. 3. The apparatus according to claim 1, wherein the exposure start position is a position where an exposure beam intensity corresponding to data to be recorded becomes zero. 4. A rotation drive unit for supporting and rotating a master on which a resist layer is formed, an exposure beam emitting unit for irradiating an exposure beam on the master deflectably to form a spot, and
A relative movement drive unit that relatively translates the rotation drive unit and the spot in the radial direction of the master, using an information recording apparatus including a concavo-convex pattern latent image for recording concentric tracks. An information recording method for generating, while rotating the master, sequentially moving in a radial direction at one track pitch for each rotation thereof, and deflecting an exposure beam intensity-modulated according to data to be recorded. The spot is sequentially moved from the exposure start position in the same direction as the moving direction of the master, and when the spot is moved to the exposure stop position in one rotation of the master, the spot is intermittently returned to the exposure start position. A method comprising periodically repeating a deflection operation. 5. The exposure beam emitting section emits an electron beam as an exposure beam.
The described method. 6. A recording medium having a substrate duplicated using a master having a predetermined concavo-convex pattern formed along concentric tracks and a recording layer formed on the substrate, wherein the resist layer is While rotating the formed master, the master is sequentially moved in the radial direction at one track pitch for each rotation, and the spot is formed by deflecting an exposure beam intensity-modulated according to data to be recorded. To
A deflecting operation of intermittently returning the spot to the exposure start position at a time when the master is sequentially moved from the exposure start position in the same direction as the movement direction of the master and moved to the exposure stop position in one rotation of the master is periodically performed. An information recording step of forming a latent image comprising a process of repeating the step of developing, a developing step of developing the latent image formed on the resist layer by the information recording step to form a concavo-convex pattern on the resist layer, A transfer step of manufacturing a stamper on which a predetermined uneven pattern is formed by transferring the uneven pattern formed on the layer; and a recording medium obtained by copying.