WO2010009718A3 - Bauteil bestehend aus einem unlegierten oder niedriglegierten stahl, verfahren zum schutz dieser bauteile gegen coke-abscheidung bzw. metal-dusting - Google Patents

Bauteil bestehend aus einem unlegierten oder niedriglegierten stahl, verfahren zum schutz dieser bauteile gegen coke-abscheidung bzw. metal-dusting Download PDF

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Publication number
WO2010009718A3
WO2010009718A3 PCT/DE2009/001029 DE2009001029W WO2010009718A3 WO 2010009718 A3 WO2010009718 A3 WO 2010009718A3 DE 2009001029 W DE2009001029 W DE 2009001029W WO 2010009718 A3 WO2010009718 A3 WO 2010009718A3
Authority
WO
WIPO (PCT)
Prior art keywords
low
metal dusting
unalloyed
phase
protecting
Prior art date
Application number
PCT/DE2009/001029
Other languages
English (en)
French (fr)
Other versions
WO2010009718A2 (de
Inventor
Michael Schütze
Christine Geers
Original Assignee
Dechema Gesellschaft Für Chemische Technik Und Biotechnologie E.V.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dechema Gesellschaft Für Chemische Technik Und Biotechnologie E.V. filed Critical Dechema Gesellschaft Für Chemische Technik Und Biotechnologie E.V.
Priority to DE112009001963T priority Critical patent/DE112009001963A5/de
Publication of WO2010009718A2 publication Critical patent/WO2010009718A2/de
Publication of WO2010009718A3 publication Critical patent/WO2010009718A3/de

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/56—Electroplating: Baths therefor from solutions of alloys
    • C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
    • C23C10/28—Solid state diffusion of only metal elements or silicon into metallic material surfaces using solids, e.g. powders, pastes
    • C23C10/34—Embedding in a powder mixture, i.e. pack cementation
    • C23C10/52—Embedding in a powder mixture, i.e. pack cementation more than one element being diffused in one step
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
    • C23C24/082—Coating starting from inorganic powder by application of heat or pressure and heat without intermediate formation of a liquid in the layer
    • C23C24/085—Coating with metallic material, i.e. metals or metal alloys, optionally comprising hard particles, e.g. oxides, carbides or nitrides
    • C23C24/087—Coating with metal alloys or metal elements only
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces
    • C25D5/50—After-treatment of electroplated surfaces by heat-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)

Abstract

Die Erfindung sieht zur Erhöhung der Beständigkeit von un- und niedriglegierten Stählen unter Metal Dusting Bedingungen das Aufbringen einer intermetallischen Me-Sn-Phase vor. Es hat sich gezeigt, dass eine solche intermetallische Me-Sn-Phase (Me = Fe,Ni,Co) auf niedriglegierten Stählen deren Beständigkeit unter Metal Dusting Atmosphären bei hohen Temperaturen erheblich erhöht. Die intermetallische Me-Sn-Phase kann mit unterschiedlichen Verfahren appliziert werden, z. B. Packdiffusion, elektrochemische Co-Abscheidung, als Anstrich oder über Sputtern mit anschließender thermischer Behandlung. Die Fe-Sn- bzw. Co-Sn-Phase kann nicht direkt appliziert werden, da Zinn nicht in Eisen, Kobalt oder Ferriten diffundiert. Hierbei dient eine Nickelschicht als Mediator.
PCT/DE2009/001029 2008-07-23 2009-07-23 Bauteil bestehend aus einem unlegierten oder niedriglegierten stahl, verfahren zum schutz dieser bauteile gegen coke-abscheidung bzw. metal-dusting WO2010009718A2 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE112009001963T DE112009001963A5 (de) 2008-07-23 2009-07-23 Bauteil bestehend aus einem unlegierten oder niederglegierten Stahl, Verfahr zum Schutz dieser Bauteile gegen Coke-Abscheidung bzw. Metal-Dusting

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102008034315 2008-07-23
DE102008034315.3 2008-07-23

Publications (2)

Publication Number Publication Date
WO2010009718A2 WO2010009718A2 (de) 2010-01-28
WO2010009718A3 true WO2010009718A3 (de) 2010-06-03

Family

ID=41463197

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2009/001029 WO2010009718A2 (de) 2008-07-23 2009-07-23 Bauteil bestehend aus einem unlegierten oder niedriglegierten stahl, verfahren zum schutz dieser bauteile gegen coke-abscheidung bzw. metal-dusting

Country Status (2)

Country Link
DE (1) DE112009001963A5 (de)
WO (1) WO2010009718A2 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PE20171031A1 (es) 2014-11-13 2017-07-17 Shell Int Research Proceso para la preparacion de gas de sintesis
WO2021052704A1 (en) 2019-09-19 2021-03-25 Basf Se High temperature protective coatings, especially for use in petrochemical processes

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3887444A (en) * 1973-04-19 1975-06-03 Sony Corp Bright tin-nickel alloy plating electrolyte
EP0962436A1 (de) * 1993-01-04 1999-12-08 Chevron Chemical Company LLC Verfahren zur Umsetzung von Kohlenwasserstoffen

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3887444A (en) * 1973-04-19 1975-06-03 Sony Corp Bright tin-nickel alloy plating electrolyte
EP0962436A1 (de) * 1993-01-04 1999-12-08 Chevron Chemical Company LLC Verfahren zur Umsetzung von Kohlenwasserstoffen

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
B. SUBRAMANIAN, S. MOHAN, SOBHA JAYAKRISHNAN: "Selective area deposition of Tin-Nickel alloy coating - an alternative for decorative chromium plating", JOURNAL OF APPLIED ELECTROCHEMISTRY, vol. 37, 30 November 2006 (2006-11-30), pages 219 - 224, XP002575115 *
BELANGER A ET AL: "The hydrogen evolution reaction on Ni-Sn alloys and intermetallics", SURFACE AND COATINGS TECHNOLOGY, ELSEVIER, AMSTERDAM, NL, vol. 28, no. 1, 1 May 1986 (1986-05-01), pages 93 - 111, XP024461028, ISSN: 0257-8972, [retrieved on 19860501] *
CHEN Z ET AL: "Elasticity modulus, hardness and fracture toughness of Ni3Sn4 intermetallic thin films", MATERIALS SCIENCE AND ENGINEERING A: STRUCTURAL MATERIALS:PROPERTIES, MICROSTRUCTURE & PROCESSING, LAUSANNE, CH, vol. 423, no. 1-2, 15 May 2006 (2006-05-15), pages 107 - 110, XP025098606, ISSN: 0921-5093, [retrieved on 20060515] *
R. MILDENBERGER, A. VENSKUTONIS, F. AUBERTIN, J. BREME AND G. SCHWITZGEBEL: "Electrochemically Deposited Ni-Sn Alloys: A 119Sn Mössbauer Study", HYPERFINE INTERACTIONS, vol. 112, no. 1-4, December 1998 (1998-12-01), pages 151 - 154, XP002575116 *
T. KOBAYASHI, H. KANEMATSU, N. WADA, T. OKI: "Metallographic study on alloying of nickel-tin films from stacked single layers through heating", TRANSACTIONS OF THE INSTITUTE OF METAL FINISHING, vol. 81, no. 1, 2003, pages 32 - 36, XP008120513 *

Also Published As

Publication number Publication date
DE112009001963A5 (de) 2011-05-12
WO2010009718A2 (de) 2010-01-28

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