WO2010004861A1 - 酸化ランタン基焼結体、同焼結体からなるスパッタリングターゲット、酸化ランタン基焼結体の製造方法及び同製造方法によるスパッタリングターゲットの製造方法 - Google Patents
酸化ランタン基焼結体、同焼結体からなるスパッタリングターゲット、酸化ランタン基焼結体の製造方法及び同製造方法によるスパッタリングターゲットの製造方法 Download PDFInfo
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- WO2010004861A1 WO2010004861A1 PCT/JP2009/061352 JP2009061352W WO2010004861A1 WO 2010004861 A1 WO2010004861 A1 WO 2010004861A1 JP 2009061352 W JP2009061352 W JP 2009061352W WO 2010004861 A1 WO2010004861 A1 WO 2010004861A1
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- WIPO (PCT)
- Prior art keywords
- sintered body
- powder
- oxide
- lanthanum oxide
- lanthanum
- Prior art date
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- MRELNEQAGSRDBK-UHFFFAOYSA-N lanthanum(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[La+3].[La+3] MRELNEQAGSRDBK-UHFFFAOYSA-N 0.000 title claims abstract description 124
- 238000005477 sputtering target Methods 0.000 title claims abstract description 26
- 238000004519 manufacturing process Methods 0.000 title claims description 26
- 238000000034 method Methods 0.000 title abstract description 10
- 230000008569 process Effects 0.000 title abstract description 5
- 239000000843 powder Substances 0.000 claims abstract description 78
- 229910052751 metal Inorganic materials 0.000 claims abstract description 71
- 239000002184 metal Substances 0.000 claims abstract description 63
- 238000002156 mixing Methods 0.000 claims abstract description 15
- 239000000654 additive Substances 0.000 claims abstract description 13
- 230000000996 additive effect Effects 0.000 claims abstract description 13
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910000449 hafnium oxide Inorganic materials 0.000 claims abstract description 12
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000000203 mixture Substances 0.000 claims abstract description 11
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 10
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims abstract description 10
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910001928 zirconium oxide Inorganic materials 0.000 claims abstract description 10
- 238000010438 heat treatment Methods 0.000 claims abstract description 8
- 239000012535 impurity Substances 0.000 claims abstract description 8
- 238000003786 synthesis reaction Methods 0.000 claims abstract description 8
- 238000007731 hot pressing Methods 0.000 claims abstract description 5
- 239000002245 particle Substances 0.000 claims description 72
- 229910052799 carbon Inorganic materials 0.000 claims description 49
- 229910052739 hydrogen Inorganic materials 0.000 claims description 49
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 46
- 239000001257 hydrogen Substances 0.000 claims description 46
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 44
- 239000010936 titanium Substances 0.000 claims description 43
- 229910052719 titanium Inorganic materials 0.000 claims description 31
- 229910052735 hafnium Inorganic materials 0.000 claims description 26
- 229910052726 zirconium Inorganic materials 0.000 claims description 25
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 19
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 13
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 12
- 229910021193 La 2 O 3 Inorganic materials 0.000 claims description 11
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 10
- 239000002994 raw material Substances 0.000 claims description 9
- 229920002994 synthetic fiber Polymers 0.000 claims description 5
- 239000011812 mixed powder Substances 0.000 claims description 4
- 238000010304 firing Methods 0.000 claims 1
- 239000000463 material Substances 0.000 abstract description 17
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 abstract description 16
- 238000010298 pulverizing process Methods 0.000 abstract description 9
- 229910002092 carbon dioxide Inorganic materials 0.000 abstract description 8
- 239000001569 carbon dioxide Substances 0.000 abstract description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 abstract description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 3
- 229910017569 La2(CO3)3 Inorganic materials 0.000 abstract description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 abstract 2
- 238000000151 deposition Methods 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 abstract 1
- KTUFCUMIWABKDW-UHFFFAOYSA-N oxo(oxolanthaniooxy)lanthanum Chemical compound O=[La]O[La]=O KTUFCUMIWABKDW-UHFFFAOYSA-N 0.000 abstract 1
- 239000002131 composite material Substances 0.000 description 76
- 229910052746 lanthanum Inorganic materials 0.000 description 27
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 27
- 238000011156 evaluation Methods 0.000 description 26
- 238000012360 testing method Methods 0.000 description 25
- 230000000694 effects Effects 0.000 description 19
- 238000000227 grinding Methods 0.000 description 18
- 239000010408 film Substances 0.000 description 15
- 230000002401 inhibitory effect Effects 0.000 description 11
- 229910052760 oxygen Inorganic materials 0.000 description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 8
- 239000001301 oxygen Substances 0.000 description 8
- 229910052761 rare earth metal Inorganic materials 0.000 description 7
- 239000013078 crystal Substances 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- NZPIUJUFIFZSPW-UHFFFAOYSA-H lanthanum carbonate Chemical compound [La+3].[La+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O NZPIUJUFIFZSPW-UHFFFAOYSA-H 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 229910004143 HfON Inorganic materials 0.000 description 3
- 230000001133 acceleration Effects 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 3
- 238000005245 sintering Methods 0.000 description 3
- 229910004129 HfSiO Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003925 fat Substances 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- YXEUGTSPQFTXTR-UHFFFAOYSA-K lanthanum(3+);trihydroxide Chemical compound [OH-].[OH-].[OH-].[La+3] YXEUGTSPQFTXTR-UHFFFAOYSA-K 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- -1 titanium hydride Chemical compound 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- 229910004140 HfO Inorganic materials 0.000 description 1
- 229910052689 Holmium Inorganic materials 0.000 description 1
- 229910052765 Lutetium Inorganic materials 0.000 description 1
- NIPNSKYNPDTRPC-UHFFFAOYSA-N N-[2-oxo-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 NIPNSKYNPDTRPC-UHFFFAOYSA-N 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- 229910001361 White metal Inorganic materials 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000003064 anti-oxidating effect Effects 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000006356 dehydrogenation reaction Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 229960001633 lanthanum carbonate Drugs 0.000 description 1
- 150000002604 lanthanum compounds Chemical class 0.000 description 1
- FYDKNKUEBJQCCN-UHFFFAOYSA-N lanthanum(3+);trinitrate Chemical compound [La+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O FYDKNKUEBJQCCN-UHFFFAOYSA-N 0.000 description 1
- ICAKDTKJOYSXGC-UHFFFAOYSA-K lanthanum(iii) chloride Chemical compound Cl[La](Cl)Cl ICAKDTKJOYSXGC-UHFFFAOYSA-K 0.000 description 1
- CMGJQFHWVMDJKK-UHFFFAOYSA-N lanthanum;trihydrate Chemical compound O.O.O.[La] CMGJQFHWVMDJKK-UHFFFAOYSA-N 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 235000014593 oils and fats Nutrition 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000012254 powdered material Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910000048 titanium hydride Inorganic materials 0.000 description 1
- 238000009461 vacuum packaging Methods 0.000 description 1
- 239000010969 white metal Substances 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- QSGNKXDSTRDWKA-UHFFFAOYSA-N zirconium dihydride Chemical compound [ZrH2] QSGNKXDSTRDWKA-UHFFFAOYSA-N 0.000 description 1
- 229910000568 zirconium hydride Inorganic materials 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
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- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/46—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on titanium oxides or titanates
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/48—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates
- C04B35/486—Fine ceramics
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/48—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates
- C04B35/49—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zirconium or hafnium oxides, zirconates, zircon or hafnates containing also titanium oxides or titanates
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- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/08—Oxides
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02172—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides
- H01L21/02175—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides characterised by the metal
- H01L21/02181—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides characterised by the metal the material containing hafnium, e.g. HfO2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02172—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides
- H01L21/02175—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides characterised by the metal
- H01L21/02186—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing at least one metal element, e.g. metal oxides, metal nitrides, metal oxynitrides or metal carbides characterised by the metal the material containing titanium, e.g. TiO2
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
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Definitions
- the present invention relates to a lanthanum oxide-based sintered body comprising lanthanum oxide (La) as a basic component and comprising an added oxide comprising one or more of titanium (Ti), zirconium (Zr), and hafnium (Hf), and the same TECHNICAL FIELD
- the present invention relates to a sputtering target comprising a body, a method for producing a lanthanum oxide-based sintered body, and a method for producing a sputtering target by the production method.
- an effective work function of a metal gate electrode is controlled using La 2 Hf 2 O 7 in particular as a LaHfO-based material (see Patent Document 1).
- lanthanum is a material that has attracted attention.
- Lanthanum (La) is contained in rare earth elements, but is contained in the earth's crust as a mixed complex oxide as a mineral resource. Since rare earth elements were separated from relatively rare (rare) minerals, they were named as such, but they are not rare when viewed from the entire crust.
- Lanthanum is a white metal having an atomic number of 57 and an atomic weight of 138.9, and has a double hexagonal close-packed structure at room temperature. The melting point is 921 ° C., the boiling point is 3500 ° C., and the density is 6.15 g / cm 3.
- the surface is oxidized in the air and gradually dissolved in water. Soluble in hot water and acid. There is no ductility, but there is slight malleability.
- the resistivity is 5.70 ⁇ 10 ⁇ 6 ⁇ cm. It burns at 445 ° C or higher to become oxide (La 2 O 3 ) (see Physics and Chemistry Dictionary).
- oxide La 2 O 3
- rare earth elements compounds having an oxidation number of 3 are generally stable, but lanthanum is also trivalent.
- lanthanum metal Since lanthanum metal has a problem that it is easily oxidized during purification, it is difficult to achieve high purity, and there has been no high purity product. Further, when metal lanthanum is left in the air, it oxidizes in a short time and turns black, so that there is a problem that handling is not easy.
- lanthanum lanthanum oxide
- the metal lanthanum itself exists as a sputtering target material
- covering with oil / fat involves a work of removing oil / fat for a sputtering target that requires high cleanliness, and similarly involves a complicated operation. Because of these problems, the lanthanum element target material has not yet been put into practical use. As described above, a lanthanum oxide target that can withstand practical use could not be produced.
- the process using a lanthanum oxide target is simpler than the method of performing reactive sputtering of metal lanthanum with oxygen or the method of oxidizing metal lanthanum after film formation, Film formation with a uniform amount of oxygen is possible.
- lanthanum oxide reacts with moisture in the air faster than metal lanthanum, becomes powdered in a very short time, and eventually completely disintegrates. Accordingly, when an La 2 O 3 film is to be produced by an industrially common PVD method, particularly a sputtering method, it is extremely difficult to supply a sputtering target that can withstand practical use.
- metal lanthanum is easily bonded to oxygen, and lanthanum oxide is bonded to moisture or carbon dioxide gas to form a hydroxide or the like and changes into a powder form. It was difficult to make a product as a sputtering target.
- the present invention relates to a lanthanum oxide-based sintered body comprising lanthanum oxide (La) as a basic component and comprising an added oxide comprising one or more of titanium (Ti), zirconium (Zr), and hafnium (Hf), and the same
- a sputtering target comprising a body, a method for producing a lanthanum oxide-based sintered body, and a method for producing a sputtering target by the production method, thereby forming a hydroxide or the like by combining with moisture or carbon dioxide gas. It prevents the powder from changing and enables long-term storage. It is another object of the present invention to provide a technique capable of efficiently and stably providing a high-k gate insulating film oxide by forming a film using this sputtering target.
- lanthanum metal is easily bonded to oxygen, and lanthanum oxide is bonded to moisture to form a hydroxide, both of which are difficult to store for a long time.
- lanthanum oxide is used as a basic component, and one or more of titanium oxide, zirconium oxide, and hafnium oxide are added to this and used as a sintered body or sputtering target.
- the component composition of these sintered bodies and targets includes a new substance.
- the present invention is 1) A sintered body containing lanthanum oxide as a basic component, containing one or more of titanium oxide, zirconium oxide and hafnium oxide, and the balance being lanthanum oxide and inevitable impurities 2.
- Base sintered body 2 The amount of the metal elements of titanium, zirconium, and hafnium is 1 mol% or more and less than 50 mol% with respect to the total component amount of the metal elements in the sintered body.
- the lanthanum oxide-based sintered body 3) The above 1) characterized in that the amount of metal elements of titanium, zirconium and hafnium is 10 mol% or more and less than 50 mol% with respect to the total amount of metal elements in the sintered body.
- the lanthanum oxide-based sintered body 4) Hydrogen and carbon are each 25 wtppm or less, the relative density is 96% or more, the maximum particle size is 50 ⁇ m or less, and the average particle size is 5 ⁇ m or more.
- Hydrogen and carbon are each 25 wtppm or less, the relative density is 96% or more, the maximum particle size is 50 ⁇ m or less, and the average particle size is 5 ⁇ m or more.
- Hydrogen and carbon are each 25 wtppm or less, the relative density is 96% or more, the maximum particle size is 50 ⁇ m or less, and the average particle size is 5 ⁇ m or more.
- a lanthanum oxide-based sintered body according to any one of 1) to 3) above and a sputtering target comprising the sintered body according to any one of 1) to 4) above.
- the present invention 6) La 2 (CO 3 ) 3 powder or La 2 O 3 powder as lanthanum oxide raw material powder and TiO 2 , ZrO 2 , one or more of HfO 2 powder as additive oxide, and oxide for La
- the mixed powder is heated and synthesized in the atmosphere, and then the synthetic material is pulverized into a powder.
- a method for producing a lanthanum oxide-based sintered body characterized in that it is hot pressed into a sintered body 7) La 2 (CO 3 ) 3 powder or La 2 O 3 powder as an lanthanum oxide raw material powder, and an added oxide TiO 2 , ZrO 2 , or one or more of HfO 2 powders, and after mixing and mixing the composition ratio of the metal component of the oxide additive with respect to La to a predetermined value, Heating in air The synthetic material is then pulverized into a powder, and then the synthetic powder is hot-pressed to obtain a sintered body.
- the sputtering target of sintered lanthanum oxide If the sputtering target of sintered lanthanum oxide is left in the air for a long time, it will be in a state where it reacts with moisture due to deliquescence and is covered with a white powder of hydroxide, causing a problem that normal sputtering cannot be performed. . In addition, it absorbs carbon dioxide in the air and collapses into lanthanum carbonate powder.
- the target of the present invention can delay the occurrence of such a problem and can be stored until a period of no practical problem.
- Titanium oxide, zirconium oxide, and hafnium oxide as additive oxides are all effective as high-k materials, but particularly Hf oxidation used as HfO-based, HfON-based, HfSiO-based, or HfSiON-based (High-k materials). It is considered that the addition of the product is less effective than the one containing titanium oxide and zirconium oxide, and that the problem of increase in leakage current due to diffusion of titanium and zirconium to the High-k material side is less.
- the oxide sintered body sputtering target of the present invention is a sintered body containing lanthanum oxide as a basic component, and contains one or more of titanium oxide, zirconium oxide, hafnium oxide, and the remainder is lanthanum oxide and unavoidable.
- a lanthanum oxide-based sintered body characterized by being an impurity and a sputtering target using the sintered body.
- this sintered body and target react with moisture due to deliquescence and are covered with a white powder of hydroxide or collapse, or absorb carbon dioxide in the air and lanthanum carbonate powder There is a remarkable effect that it is possible to greatly suppress the collapse. This is the central technical idea of the present invention.
- hafnium oxide is particularly effective as an oxide for a high-k gate insulating film. This is because when titanium oxide or zirconium oxide is used, there is a problem that a small amount of titanium or zirconium is diffused to the High-k material side and the leakage current is slightly increased. Hafnium oxide does not cause this problem.
- the metal components of La and added oxides in the oxide (total of titanium, zirconium, and hafnium)
- the metal component of the additive oxide (total of titanium, zirconium, and hafnium) that is, (Ti, Zr, Hf) / (La + Ti, Zr, Hf) is 1 mol% to 50 mol% with respect to the total amount of It is good to make it less than. In order to prevent collapse more effectively, 10 mol% or more is good.
- the effect of preventing lanthanum oxide from collapsing due to deliquescence is small, and if it is 50 mol% or more, it is effective for the effect of preventing disintegration, but the effect using the characteristics of lanthanum oxide is reduced. It is.
- the characteristics of high dielectric constant oxides for example, La 2 Hf 2 O 7 and La 2 Zr 2 O 7 ) are dominant and the characteristics are different.
- the present invention is premised on the use as a High-k material, and is for obtaining characteristics such as lowering the threshold voltage by using lanthanum oxide (La 2 O 3 ) in combination.
- the present invention provides a lanthanum oxide-based sintered body and a target in which hydrogen and carbon are each 25 wtppm or less, relative density is 96% or more, maximum particle size is 50 ⁇ m or less, average particle size is 5 ⁇ m or more, and 20 ⁇ m or less. To do. It is effective to reduce the presence of hydrogen and carbon in the sintered body and the target because it serves as a starting point for reaction with moisture and carbon dioxide in the atmosphere. Further, the density improvement is necessary to reduce the contact area with the atmosphere.
- the density is more preferably 98%. This is because penetrating pores in the sintered body are reduced, and collapse from the inside can be prevented. Furthermore, the crystal grain size of the sintered body can be made relatively large, the grain boundaries can be reduced, and the collapse from the grain boundaries can be reduced. Thus, increasing the crystal grain size reduces the interfacial area of the grain, which is effective in reducing collapse from the grain boundary. However, increasing the crystal grain size makes it difficult to improve the density. In order to improve this, it can be said that the maximum particle size is preferably 50 ⁇ m or less. However, these are merely additional preferable requirements, and needless to say, it is not necessary to be bound by these conditions.
- La 2 (CO 3 ) 3 powder or La 2 O 3 powder is used as a raw material powder, and one or more of TiO 2 , ZrO 2 , and HfO 2 powder are used as additive oxides.
- the total amount of titanium, zirconium, and hafnium that are metal components in the additive oxide is 1 mol% or more and 50 mol with respect to the total measurement of La of the metal and titanium, zirconium, and hafnium that are the metal components in the additive oxide. It mix
- the oxide is not necessarily limited to the above oxide as long as the oxide can be formed by heat treatment or the like.
- the oxide can be formed by heat treatment or the like.
- metal lanthanum can also be used if sufficient management is possible.
- a metal powder or a hydrogenated powder with good grindability may be used if sufficient management is possible. After mixing this, it can synthesize
- hydrogenated powder titanium hydride, zirconium hydride, hafnium hydride
- performing the hot pressing at 1200 to 1500 ° C. in a vacuum for 1 to 5 hours is also a recommended production condition as a sintering condition.
- the above are the conditions for efficiently performing synthesis and sintering. Therefore, it should be understood that other conditions and other conditions can be added.
- an oxide sintered sputtering target having a relative density of 96% or more, more preferably 98% or more, and a maximum particle size of 50 ⁇ m or less, more preferably an average particle size of 5 ⁇ m or more and 20 ⁇ m or less can be obtained.
- improving the density and reducing the crystal grain size are preferable conditions that can suppress the generation of nodules and particles and can form a uniform film.
- rare earth elements contained in lanthanum are Sc, Y, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu.
- Ce approximates La
- Ce it is not easy to reduce Ce.
- these rare earth elements have similar properties, it will be understood that there is no particular problem if the total rare earth elements are less than 1000 wtppm. Therefore, the use of lanthanum in the present invention allows the inclusion of rare earth elements at this level as an inevitable impurity.
- the present invention since the present invention is intended to suppress the decay of lanthanum oxide to obtain a practical sputtering target, it includes these inevitable impurities.
- a purity of 3N or higher is preferred except for the above-mentioned special inevitable impurities and excluding gas components.
- C, N, O, S, and H exist as gas components.
- C and H it is also important to reduce C and H.
- C and H not only promote the reaction with carbon dioxide and moisture in the storage atmosphere, but also react with the oxygen in the atmosphere and oxygen in the atmosphere to form lanthanum carbonate and lanthanum hydroxide to disintegrate into powder. It is important to reduce it. For this reason, it is preferable to sinter by a hot press in an inert gas in a vacuum rather than sintering in an oxygen (atmosphere) atmosphere.
- La 2 (CO 3 ) 3 powder and HfO 2, ZrO 2 , and TiO 2 powder are used as raw material powder, and the amount of Hf 3 , Zr, and Ti is 0.5 to 4 with respect to the total amount of metal components including La. It mix
- the size of the sintered body was ⁇ 80 mm, and the press pressure was 300 kg / cm 2 .
- the present embodiment describes the case of using La 2 (CO 3) 3 powder.
- the sintered body was a composite oxide of these.
- the sintered body for evaluation was examined for stability in the air or in a constant temperature and humidity chamber (temperature 40 ° C., humidity 90%). It was confirmed by XRD that the powdered material was mainly lanthanum hydroxide (La (OH) 3 ).
- the sintered body shown in the embodiment can be used in an actual semiconductor manufacturing process by bonding to a backing plate as a target and vacuum-sealing (or in an inert gas atmosphere) as necessary.
- the mixing conditions, synthesis conditions, and hot press conditions for the raw material powder are all representative conditions. Suitable conditions described in paragraph [0011] can be arbitrarily selected.
- the composite oxide sintered body of Reference Example 1 is a composite oxide sintered body (lanthanum oxide and hafnium oxide) containing 0.5 mol% of hafnium in terms of metal, that is, a mole of Hf / (La + Hf). %, So that Hf is 0.5%.
- the composition of La 2 Hf 2 O 7 is 50 mol%
- La 2 O 3 is 33.3 mol%
- HfO 2 is 66.7 mol%.
- the carbon content was 35 ppm
- the hydrogen was 29 ppm
- the relative density was 95%
- the maximum particle size was 41 ⁇ m
- the average particle size was 12 ⁇ m.
- the amount of HfO 2 was slightly less than the preferred condition of the present invention
- the carbon content was slightly larger than the preferred condition of the present invention
- the relative density was slightly low at 95%.
- the sintered body collapsed into powder after 3 weeks in the atmosphere.
- surface pulverization was not observed in the vacuum pack until 4 months.
- this level of sintered body has a somewhat high rate of decay, it can be said that it is within a practical level if a vacuum pack is used.
- the evaluation is ⁇ .
- Reference Example 2 The composite oxide sintered body of Reference Example 2 contains 0.5 mol% in terms of metal and ZrO 2 in terms of Zr.
- the carbon content was 23 ppm, hydrogen 19 ppm, the relative density was 97%, the maximum particle size was 37 ⁇ m, and the average particle size was 9 ⁇ m.
- the amount of ZrO 2 was slightly smaller than the preferred conditions of the present invention, but the relative density was slightly high at 97%.
- the sintered body collapsed into a powder after 4 weeks in the atmosphere. It was slightly improved from Reference Example 1. However, surface pulverization was not observed in the vacuum pack until 4 months. Although this level of sintered body has a somewhat high rate of decay, it can be said that it is within a practical level if a vacuum pack is used.
- the evaluation is ⁇ .
- the composite oxide sintered body of Reference Example 3 contains 0.5 mol% of TiO 2 as Ti in terms of metal.
- the carbon content was 46 ppm
- hydrogen was 50 ppm
- the relative density was 95%
- the maximum particle size was 53 ⁇ m
- the average particle size was 11 ⁇ m.
- the amount of TiO 2 is slightly less than the preferred condition of the present invention
- the carbon content and the amount of hydrogen are slightly larger than the preferred condition of the present invention
- the maximum particle size is slightly large as 53 ⁇ m
- the relative density is slightly as 95%. It was low.
- the sintered body collapsed into powder after 3 weeks in the atmosphere.
- surface pulverization was not observed in the vacuum pack until 4 months.
- this level of sintered body has a somewhat high rate of decay, it can be said that it is within a practical level if a vacuum pack is used.
- the evaluation is ⁇ .
- Example 1 The composite oxide sintered body of Example 1 contains 1 mol% in terms of metal and HfO 2 in terms of Hf.
- the carbon content was 37 ppm
- hydrogen was 30 ppm
- the relative density was 95%
- the maximum particle size was 40 ⁇ m
- the average particle size was 10 ⁇ m.
- the amount of HfO 2 meets the preferable conditions of the present invention.
- the carbon content and hydrogen content were slightly higher than the preferred conditions of the present invention, and the relative density was slightly low at 95%.
- the sintered body collapsed into a powder form in the fourth week in a constant temperature (40 ° C.) and constant humidity (humidity 90%) bath as an accelerated test.
- surface pulverization was not observed in 6 months until 6 months.
- the presence of this HfO 2 was confirmed to have a great effect of suppressing the collapse of the sintered body. It is a practical level and is evaluated as ⁇ .
- Example 2 The composite oxide sintered body of Example 2 contains 1 mol% in terms of metal and HfO 2 in terms of Hf.
- the carbon content was 15 ppm
- hydrogen was 20 ppm
- the relative density was 97%
- the maximum particle size was 42 ⁇ m
- the average particle size was 15 ⁇ m.
- all of the conditions matched the preferable conditions of the present invention.
- surface pulverization was not observed until 10 months. It was confirmed that the presence of this HfO 2 and the optimization of additional conditions have a great effect of suppressing the collapse of the sintered body. It is a practical level and is evaluated as ⁇ .
- Example 3 The composite oxide sintered body of Example 3 contains 5 mol% in terms of metal and HfO 2 in terms of Hf.
- the carbon content was 53 ppm
- hydrogen was 47 ppm
- the relative density was 97%
- the maximum particle size was 41 ⁇ m
- the average particle size was 5 ⁇ m.
- the contents of carbon and hydrogen were high, but other conditions were suitable for the preferred conditions of the present invention.
- Example 4 The composite oxide sintered body of Example 4 contains 5 mol% in terms of metal and HfO 2 in terms of Hf.
- the carbon content was 26 ppm
- hydrogen was 28 ppm
- the relative density was 98%
- the maximum particle size was 36 ⁇ m
- the average particle size was 13 ⁇ m.
- carbon and hydrogen are present in a slight excess in the composite oxide sintered body.
- the amount is less than in Example 6.
- surface pulverization was not observed until 10 months.
- Example 4 It was confirmed that the presence of slightly excess carbon and hydrogen in the composite oxide sintered body was a factor for facilitating the decay. However, it was confirmed that the composite oxide sintered body of Example 4 had a greater effect of suppressing collapse than that of Example 6. It is a practical level and is evaluated as ⁇ .
- Example 5 The complex oxide sintered body of Example 5 contains 10 mol% of HfO 2 in terms of metal and Hf.
- the carbon content was 76 ppm
- hydrogen was 28 ppm
- the relative density was 95%
- the maximum particle size was 63 ⁇ m
- the average particle size was 3 ⁇ m.
- carbon and hydrogen are excessively present in the composite oxide sintered body, and additional requirements such as maximum particle size and average particle size are not in the optimum range.
- the accelerated test which was a constant temperature (40 ° C.) and constant humidity (humidity 90%)
- the powder was not collapsed even in the eighth week.
- the surface hardness was measured, there was a slight downward trend.
- Example 6 The composite oxide sintered body of Example 6 contains 10 mol% in terms of metal and HfO 2 in terms of Hf.
- the carbon content was 18 ppm
- hydrogen was 20 ppm
- the relative density was 96%
- the maximum particle size was 23 ⁇ m
- the average particle size was 15 ⁇ m.
- the composite oxide sintered body was in a condition suitable for the present invention.
- the powder was not collapsed even in the eighth week.
- no powdering was observed in the vacuum pack even after one year. It was confirmed that this composite oxide sintered body has a remarkable effect of suppressing collapse when the presence of Hf and other additional factors meet the conditions of the present invention.
- the evaluation is ⁇ .
- Example 7 The composite oxide sintered body of Example 7 contains 35 mol% of HfO 2 in terms of metal and Hf.
- the carbon content was 73 ppm
- hydrogen was 52 ppm
- the relative density was 98%
- the maximum particle size was 37 ⁇ m
- the average particle size was 8 ⁇ m.
- carbon and hydrogen were present in a considerable excess in the composite oxide sintered body.
- Other additional requirements are in the optimal range.
- the powder was not collapsed even in the eighth week.
- the surface hardness was measured, there was a slight downward trend.
- the vacuum pack surface powdering was finally observed after one year.
- this composite oxide sintered body has a remarkable effect of suppressing collapse when the presence of Hf and other additional factors meet the conditions of the present invention.
- the evaluation is ⁇ .
- Example 8 The composite oxide sintered body of Example 8 contains 35 mol% in terms of metal and HfO 2 in terms of Hf.
- the carbon content was 13 ppm
- hydrogen was 21 ppm
- the relative density was 98%
- the maximum particle size was 30 ⁇ m
- the average particle size was 13 ⁇ m.
- the composite oxide sintered body was in a condition suitable for the present invention.
- the powder was not collapsed even in the eighth week.
- no powdering was observed in the vacuum pack even after one year. It was confirmed that this composite oxide sintered body has a remarkable effect of suppressing collapse when the presence of Hf and other additional factors meet the conditions of the present invention.
- the evaluation is ⁇ .
- Example 9 The composite oxide sintered body of Example 9 contains 45 mol% in terms of metal and HfO 2 in terms of Hf.
- the carbon content was 73 ppm
- hydrogen was 52 ppm
- the relative density was 98%
- the maximum particle size was 37 ⁇ m
- the average particle size was 8 ⁇ m.
- carbon and hydrogen were present in a considerable excess in the composite oxide sintered body.
- Other additional requirements are in the optimal range.
- the powder was not collapsed even in the eighth week.
- the surface hardness was measured, there was a slight downward trend.
- surface powdering was finally observed after one year. It was confirmed that this composite oxide sintered body has a remarkable effect of suppressing collapse when the presence of Hf and other additional factors meet the conditions of the present invention.
- the evaluation is ⁇ .
- Example 10 The composite oxide sintered body of Example 10 contains 45 mol% in terms of metal and HfO 2 in terms of Hf.
- the carbon content was 10 ppm
- hydrogen was 25 ppm
- the relative density was 98%
- the maximum particle size was 31 ⁇ m
- the average particle size was 14 ⁇ m.
- the composite oxide sintered body was in a condition suitable for the present invention.
- the powder was not collapsed even in the eighth week.
- no powdering was observed in the vacuum pack even after one year. It was confirmed that this composite oxide sintered body has a remarkable effect of suppressing collapse when the presence of Hf and other additional factors meet the conditions of the present invention.
- the evaluation is ⁇ .
- Example 11 The composite oxide sintered body of Example 11 contains 48 mol% in terms of metal and HfO 2 in terms of Hf.
- the carbon content was 23 ppm
- hydrogen was 24 ppm
- the relative density was 97%
- the maximum particle size was 18 ⁇ m
- the average particle size was 10 ⁇ m.
- the composite oxide sintered body was in a condition suitable for the present invention.
- the powder was not collapsed even in the eighth week.
- no powdering was observed in the vacuum pack even after one year. It was confirmed that this composite oxide sintered body has a remarkable effect of suppressing collapse when the presence of Hf and other additional factors meet the conditions of the present invention.
- the evaluation is ⁇ .
- Example 12 The composite oxide sintered body of Example 12 contains 5 mol% in terms of metal and ZrO 2 in terms of Zr.
- the carbon content was 20 ppm
- hydrogen was 14 ppm
- the relative density was 98%
- the maximum particle size was 20 ⁇ m
- the average particle size was 12 ⁇ m.
- the composite oxide sintered body was in a condition suitable for the present invention.
- the constant temperature (40 ° C.) and constant humidity (humidity 90%) bath which is an accelerated test, only the surface of the sintered body collapsed into a powder form in the fourth week.
- the vacuum pack surface pulverization was confirmed after 10 months.
- This composite oxide sintered body was confirmed to have a collapse-inhibiting effect when the presence of Zr and other additional factors matched the conditions of the present invention.
- the evaluation is ⁇ .
- Example 13 The composite oxide sintered body of Example 13 contains 25 mol% in terms of metal and ZrO 2 in terms of Zr.
- the carbon content was 23 ppm
- hydrogen was 15 ppm
- the relative density was 98%
- the maximum particle size was 19 ⁇ m
- the average particle size was 11 ⁇ m.
- the composite oxide sintered body was in a condition suitable for the present invention.
- the powder was not collapsed even in the eighth week.
- the powdering of the surface was not confirmed even after one year.
- This composite oxide sintered body was confirmed to have a collapse-inhibiting effect when the presence of Zr and other additional factors matched the conditions of the present invention.
- the evaluation is ⁇ .
- Example 14 The composite oxide sintered body of Example 14 contains 48 mol% in terms of metal and ZrO 2 in terms of Zr.
- the carbon content was 73 ppm
- hydrogen was 65 ppm
- the relative density was 99%
- the maximum particle size was 17 ⁇ m
- the average particle size was 3 ⁇ m.
- this composite oxide sintered body has a high density, it has a high carbon and hydrogen content and a fine particle size.
- the powder was not collapsed even in the eighth week.
- the surface hardness was measured, there was a slight downward trend.
- surface powdering was finally observed after one year. It was confirmed that this composite oxide sintered body has a remarkable effect of suppressing collapse when the presence of Zr and other additional factors meet the conditions of the present invention.
- the evaluation is ⁇ .
- Example 15 The composite oxide sintered body of Example 15 contains 1 mol% of TiO 2 as Ti in terms of metal.
- the carbon content was 37 ppm
- hydrogen was 30 ppm
- the relative density was 95%
- the maximum particle size was 40 ⁇ m
- the average particle size was 10 ⁇ m.
- this composite oxide sintered body had a large amount of oxygen and hydrogen, and a relatively low relative density of 95%.
- the sintered body collapsed into a powder form in the fourth week in a constant temperature (40 ° C.) and constant humidity (humidity 90%) bath as an accelerated test.
- the surface was confirmed to be powdered after 6 months.
- This composite oxide sintered body was confirmed to have a moderate collapse suppression effect due to the presence of Ti and other additional factors.
- the evaluation is ⁇ .
- Example 16 The composite oxide sintered body of Example 16 contains 10 mol% of TiO 2 as Ti in terms of metal.
- the carbon content was 25 ppm
- hydrogen was 21 ppm
- the relative density was 98%
- the maximum particle size was 28 ⁇ m
- the average particle size was 13 ⁇ m.
- the composite oxide sintered body was in a condition suitable for the present invention.
- the powder was not collapsed even in the eighth week. In the vacuum pack, powdering was not confirmed even after one year.
- This composite oxide sintered body was confirmed to have a collapse-inhibiting effect when the presence of Ti and other additional factors matched the conditions of the present invention.
- the evaluation is ⁇ .
- Example 17 The composite oxide sintered body of Example 17 contains 30 mol% in terms of metal and TiO 2 in terms of Ti.
- the carbon content was 25 ppm
- hydrogen was 21 ppm
- the relative density was 98%
- the maximum particle size was 28 ⁇ m
- the average particle size was 13 ⁇ m.
- the composite oxide sintered body was in a condition suitable for the present invention.
- the powdered collapse of the sintered body was not observed even in the eighth week in the constant temperature (40 ° C.) and constant humidity (humidity 90%) bath as an acceleration test. .
- In the vacuum pack powdering was not confirmed even after one year.
- This composite oxide sintered body was confirmed to have a collapse-inhibiting effect when the presence of Ti and other additional factors matched the conditions of the present invention.
- the evaluation is ⁇ .
- Example 18 The composite oxide sintered body of Example 18 contains 49 mol% of TiO 2 in terms of metal and in terms of Ti.
- the carbon content was 19 ppm
- hydrogen was 25 ppm
- the relative density was 97%
- the maximum particle size was 20 ⁇ m
- the average particle size was 11 ⁇ m.
- the composite oxide sintered body was in a condition suitable for the present invention.
- In the vacuum pack powdering was not confirmed even after one year.
- This composite oxide sintered body was confirmed to have a collapse-inhibiting effect when the presence of Ti and other additional factors matched the conditions of the present invention.
- the evaluation is ⁇ .
- Example 19 The composite oxide sintered body of Example 19 contains TiO 2 and ZrO 2 in terms of metal, a ratio of 1: 1, and 10 mol% in terms of Ti and Zr metal. .
- the carbon content was 20 ppm
- hydrogen was 23 ppm
- the relative density was 97%
- the maximum particle size was 19 ⁇ m
- the average particle size was 9 ⁇ m.
- the composite oxide sintered body was in a condition suitable for the present invention.
- the powdered collapse of the sintered body was not observed even in the eighth week in the constant temperature (40 ° C.) and constant humidity (humidity 90%) bath as an acceleration test. .
- In the vacuum pack powdering was not confirmed even after one year.
- This composite oxide sintered body was confirmed to have a collapse-inhibiting effect when the presence of the metal composed of Ti and Zr and other additional factors matched the conditions of the present invention.
- the evaluation is ⁇ .
- Example 20 The composite oxide sintered body of Example 20 contains TiO 2 and ZrO 2 in terms of metal, a ratio of 1: 1, and contains 30 mol% in terms of Ti and Zr metal. .
- the carbon content was 17 ppm
- hydrogen was 18 ppm
- the relative density was 97%
- the maximum particle size was 26 ⁇ m
- the average particle size was 15 ⁇ m.
- the composite oxide sintered body was in a condition suitable for the present invention.
- the powdery collapse of the sintered body was not recognized even in the eighth week. .
- Example 21 The composite oxide sintered body of Example 21 contains TiO 2 and HfO 2 in terms of metal, a ratio of 1: 1, and 20 mol% in terms of Ti and Hf metal. .
- the carbon content was 18 ppm
- the hydrogen was 19 ppm
- the relative density was 97%
- the maximum particle size was 23 ⁇ m
- the average particle size was 12 ⁇ m.
- the composite oxide sintered body was in a condition suitable for the present invention.
- the powdered collapse of the sintered body was not observed even in the eighth week in the constant temperature (40 ° C.) and constant humidity (humidity 90%) bath as an accelerated test. .
- In the vacuum pack powdering was not confirmed even after one year.
- This composite oxide sintered body was confirmed to have a collapse-inhibiting effect when the presence of the metal composed of Ti and Hf and other additional factors matched the conditions of the present invention.
- the evaluation is ⁇ .
- Example 22 The composite oxide sintered body of Example 22 contains TiO 2 and HfO 2 in terms of metal, a ratio of 1: 1, and contains 40 mol% in terms of Ti and Hf metal. .
- the carbon content was 25 ppm
- hydrogen was 20 ppm
- the relative density was 97%
- the maximum particle size was 23 ⁇ m
- the average particle size was 17 ⁇ m.
- the composite oxide sintered body was in a condition suitable for the present invention.
- the powdered collapse of the sintered body was not observed even in the eighth week in the constant temperature (40 ° C.) and constant humidity (humidity 90%) bath as an acceleration test. .
- In the vacuum pack powdering was not confirmed even after one year.
- This composite oxide sintered body was confirmed to have a collapse-inhibiting effect when the presence of the metal composed of Ti and Hf and other additional factors matched the conditions of the present invention.
- the evaluation is ⁇ .
- Example 23 In the composite oxide sintered body of Example 23, in terms of metal, TiO 2 , ZrO 2 and HfO 2 had a ratio of 1: 1: 1, and in terms of metal of Ti, Zr and Hf, 6 mol%. Is contained. The carbon content was 53 ppm, hydrogen was 37 ppm, the relative density was 96%, the maximum particle size was 48 ⁇ m, and the average particle size was 3 ⁇ m. In this case, this composite oxide sintered body was in a condition suitable for the present invention, except that the carbon content and hydrogen content were remarkably large and the average particle size was fine.
- the sintered body collapsed into a powder form in the fourth week in a constant temperature (40 ° C.) and constant humidity (humidity 90%) bath as an accelerated test.
- the surface was confirmed to be powdered after 6 months. This composite oxide sintered body is evaluated as “Good”.
- Example 24 In the composite oxide sintered body of Example 24, in terms of metal, TiO 2 , ZrO 2, and HfO 2 were in a ratio of 1: 1: 1, and in terms of the metal of Ti, Zr, and Hf, 24 mol%. Is contained. The carbon content was 23 ppm, hydrogen was 24 ppm, the relative density was 97%, the maximum particle size was 23 ⁇ m, and the average particle size was 16 ⁇ m. In this case, the composite oxide sintered body was in a condition suitable for the present invention. As a result, in the accelerated test, which was a constant temperature (40 ° C.) and constant humidity (humidity 90%), the powder was not collapsed even in the eighth week.
- Example 25 The composite oxide sintered body of Example 25 is 45 mol% in terms of metal, in which the ratio of TiO 2 , ZrO 2, and HfO 2 is 1: 1: 1 and in terms of the metal of Ti, Zr, and Hf. Is contained.
- the carbon content was 23 ppm
- hydrogen was 24 ppm
- the relative density was 97%
- the maximum particle size was 28 ⁇ m
- the average particle size was 15 ⁇ m.
- the composite oxide sintered body was in a condition suitable for the present invention.
- the powder was not collapsed even in the eighth week.
- Comparative Example 1 The oxide sintered body of Comparative Example 1 is La 2 O 3 .
- the carbon content was 31 ppm
- the hydrogen was 27 ppm
- the relative density was 96%
- the maximum particle size and average particle size could not be measured. In this case, it was allowed to stand in the atmosphere for 2 weeks and disintegrated into a white powder. In this case, the shape of the sintered body could not be maintained.
- the evaluation is x. The results are shown in Table 1.
- the sputtering target of sintered lanthanum oxide If the sputtering target of sintered lanthanum oxide is left in the air for a long time, it will react with moisture due to deliquescence and become covered with white hydroxide powder, causing a problem that normal sputtering cannot be performed. . In addition, it absorbs carbon dioxide in the air and collapses into lanthanum carbonate powder.
- the target of the present invention can delay the occurrence of such a problem, and has a remarkable effect that it can be stored until a period in which there is no practical problem. In particular, it provides an oxide for a high-k gate insulating film efficiently and stably.
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Abstract
Description
このため、それに変わるものとして、高い誘電率、高い熱的安定性、シリコン中の正孔と電子に対して高いエネルギー障壁を有するHfO2、ZrO2、Al2O3、La2O3等のいわゆるHigh-k材料が提案されている。
このようにランタンは注目を集めている材料である。
ランタンの原子番号は57、原子量138.9の白色の金属であり、常温で複六方最密構造を備えている。融点は921°C、沸点3500°C、密度6.15g/cm3であり、空気中では表面が酸化され、水には徐々にとける。熱水、酸に可溶である。延性はないが、展性はわずかにある。抵抗率は5.70×10-6Ωcmである。445°C以上で燃焼して酸化物(La2O3)となる(理化学辞典参照)。
希土類元素は、一般に酸化数3の化合物が安定であるが、ランタンも3価である。
このようにランタン(酸化ランタン)については、まだ研究の段階にあると言えるが、このようなランタン(酸化ランタン)の特性を調べる場合において、金属ランタン自体がスパッタリングターゲット材として存在すれば、基板上にランタンの薄膜を形成することが可能であり、またシリコン基板との界面の挙動、さらにはランタン化合物を形成して、高誘電率ゲート絶縁膜等の特性を調べることが容易であり、また製品としての自由度が増すという大きな利点を持つものである。
このために、ターゲット作製後、すぐ真空パックするか又は油脂で覆い酸化防止策を講ずる必要があるが、随時真空パックすることは著しく煩雑な作業である。同様に、油脂で覆うことは清浄度を要求されるスパッタリングターゲットには、油脂の除去という作業を伴うので、同様に煩雑な作業を伴う。
このような問題から、ランタン元素のターゲット材は、実用化に至っていないのが現状である。 上記のように、実用に耐える酸化ランタンターゲットは製造できなかった。
ALSHAREEF H.N.,QUEVEDO-LOPEZ M., WEN H. C.,HARRIS R.,KIRSCH P.,MAJHI P.,LEE B. H.,JAMMY R.,著「Work function engineering using lanthanum oxide interfacial layers 」 Appl.Phys.Lett.,Vol.89 No.23 Page.232103-232103-3, (2006)
本発明は、酸化ランタン(La)を基本成分とし、チタン(Ti)、ジルコニウム(Zr)、ハフニウム(Hf)の一又は二以上からなる添加酸化物からなる酸化ランタン基焼結体、同焼結体からなるスパッタリングターゲット、酸化ランタン基焼結体の製造方法及び同製造方法によるスパッタリングターゲットの製造方法を提供するものであり、これによって、水分や炭酸ガスと結合して水酸化物などを形成し粉状に変化するのを防止し、長期間の保管を可能とするものである。また、このスパッタリングターゲットを使用して成膜することにより、High-kゲート絶縁膜用酸化物を効率的かつ安定して提供できる技術を提供することを課題とする。
1)酸化ランタンを基本成分とする焼結体であって、酸化チタン、酸化ジルコニウム、酸化ハフニウムの一又は二以上を含有し、残部が酸化ランタン及び不可避的不純物であることを特徴とする酸化ランタン基焼結体
2)焼結体中の金属元素の合計成分量に対して、チタン、ジルコニウム、ハフニウムの金属元素の量が1mol%以上50mol%未満であることを特徴とする上記1)記載の酸化ランタン基焼結体
3)焼結体中の金属元素の合計成分量に対して、チタン、ジルコニウム、ハフニウムの金属元素の量が10mol%以上50mol%未満であることを特徴とする上記1)記載の酸化ランタン基焼結体
4)水素及び炭素が各々25wtppm以下、相対密度96%以上、最大粒径が50μm以下、平均粒径5μm以上であることを特徴とする上記1)~3)のいずれか一項に記載の酸化ランタン基焼結体
5)上記1)~4)のいずれか一項に記載の焼結体からなるスパッタリングターゲット、を提供する。
6)酸化ランタン原料粉末としてLa2(CO3)3粉末又はLa2O3粉末と、添加酸化物としてTiO2、ZrO2、HfO2粉末の一又は2以上とを使用し、Laに対する酸化物添加剤の金属成分の組成比を所定の値になるように配合し混合した後、この混合粉末を大気中で加熱合成し、次にこの合成材料を粉砕して粉末とした後、この合成粉末をホットプレスして焼結体とすることを特徴とする酸化ランタン基焼結体の製造方法
7)酸化ランタン原料粉末としてLa2(CO3)3粉末又はLa2O3粉末と、添加酸化物としてTiO2、ZrO2、HfO2粉末の一又は2以上とを使用し、Laに対する酸化物添加剤の金属成分の組成比を所定の値になるように配合し混合した後、この混合粉末を大気中で加熱合成し、次にこの合成材料を粉砕して粉末とした後、この合成粉末をホットプレスして焼結体とすることを特徴とする上記1)~5)のいずれか一項に記載の酸化ランタン基焼結体の製造方法
8)混合を湿式ボールミルにより行い、合成を大気中1350~1550°C、5~25時間加熱して製造することを特徴とする上記6)又は7)記載の酸化ランタン基焼結体の製造方法
9)ホットプレスを1200~1500°C、真空中、1~5時間で行うことを特徴とする上記6)~8)のいずれか一項に記載の酸化ランタン基焼結体の製造方法
10)上記6)~8)のいずれか一項に記載の酸化ランタン基焼結体の製造方法によるスパッタリングターゲットの製造方法、を提供する。
添加酸化物として、酸化チタン、酸化ジルコニウム、酸化ハフニウムは、High-k材料としていずれも有効であるが、特にHfO系あるいはHfON系、HfSiO系あるいはHfSiON系(High-k材料)として用いられるHf酸化物を添加したものは、酸化チタン、酸化ジルコニウムを含むものよりも、チタン、ジルコニウムのHigh-k材料側への拡散に伴うリーク電流増加の問題が少ないと考えられ、より有効である。
この焼結体及びターゲットは、ランタン又は酸化ランタンに比べ、潮解性によって水分と反応して水酸化物の白い粉で覆われ崩壊するという現象又は空気中の炭酸ガスを吸収して炭酸ランタンの粉末に崩壊してしまうということを大きく抑制できるという著しい効果がある。これが、本願発明の中心的技術思想である。本出願人が調査した従来技術において、焼結体又はターゲットとして、このような組成を持った、焼結体及びターゲットは存在しない。
酸化チタン、酸化ジルコニウム、酸化ハフニウムの添加は、ランタン又は酸化ランタン単独の利用ではないので、材料の使用に制約がある。しかし、これらの材料は、High-kゲート絶縁膜用酸化物として、いずれも有効に利用できるものであるから、添加自体はマイナス効果を生ずるものではない。
その添加量は、使用目的及び用途によって選択が可能である。これらの中で、High-kゲート絶縁膜用酸化物としては、特に酸化ハフニウムの添加が有効である。酸化チタン、酸化ジルコニウムを使用した場合には、微量のチタン又はジルコニウムが、High-k材料側へ拡散し、リーク電流が、やや増加するという問題が発生するからである。酸化ハフニウムは、この問題は発生しない。
1モル%未満では、酸化ランタンの潮解性による崩壊を防止する効果が少なく、50モル%以上では、崩壊防止の効果には有効であるが、酸化ランタンとしての特性を利用した効果が小さくなるからである。例えば、Hfがより多くなった場合には、高誘電率酸化物(例えばLa2Hf2O7、La2Zr2O7)の特性が優位となり、特性が異なってしまうからである。
本願発明は、High-k材料としての利用を前提とするものであり、酸化ランタン(La2O3)を組み合わせて使用することにより、閾値電圧を引き下げるなどの特性を得るためのものである。
焼結体及びターゲット中の水素及び炭素の存在は、雰囲気中の水分や炭酸ガスとの反応を起こす基点となるために低減させるのが有効である。また密度向上は、上記雰囲気との接触面積を減少させるのに必要である。密度は、より好ましくは98%とすることが良い。これによって、焼結体中の貫通ポアが減少し、内部からの崩壊を防止できるためである。
さらに、焼結体の結晶粒径を比較的大きくし、粒界を減少させ、粒界からの崩壊を低下することができる。このように、結晶粒径を大きくすれば粒界面積が少なくなるので、粒界からの崩壊を低減するのに有効であるが、あまり結晶粒径を大きくすると密度向上が困難になるので、密度を向上させるには最大粒径50μm以下とすることが良いと言える。
しかし、これらは、あくまで付加的な好ましい要件とするものであり、これらの条件に拘束される必要がないことは言うまでもない。
但し、熱処理などで、酸化物にすることが出来るのであれば、上記の酸化物に限定する必要はない。例えば、そのような原料としては Laに関しては、水酸化ランタン、硝酸ランタン、塩化ランタン等がある。また、十分な管理が可能ならば金属ランタンを使用することもできる。
水素化粉末(水素化チタン、水素化ジルコニウム、水素化ハフニウム)を原料とする場合には、真空雰囲気や不活性ガス雰囲気で充分、脱水素処理を行う必要がある。
混合は湿式ボールミルにより行い、合成を大気中1350~1550°C、5~25時間程度、加熱して行うことが推奨される製造条件である。
これによって、相対密度96%以上、より好ましくは98%以上、最大粒径が50μm以下、より好ましくは平均粒径が5μm以上、20μm以下である酸化物焼結体スパッタリングターゲットを得ることができる。密度の向上と結晶粒径を微細化することは、ノジュールやパーティクルの発生を抑制でき、均一な成膜を行うことができる好ましい条件でもあることは言うまでもない。
しかしながら、これらの希土類元素は、性質が近似しているが故に、希土類元素合計で1000wtppm未満であれば、特に問題となるものでないことは理解されるであろう。したがって、本願発明におけるランタンの使用は、このレベルの希土類元素の含有は、不可避的不純物として許容される。
だだし、本願発明は、酸化ランタンの崩壊を抑制して実用的なスパッタリングターゲットとすることが目的であるので、これら不可避不純物を包含するものである。また純度的には、上述した特別な不可避不純物を除き、ガス成分を除き3N以上の純度が好ましい。
原料粉末としてLa2(CO3)3粉末とHfO2、ZrO2、TiO2粉末を使用し、Laを含む金属成分の合計量に対して、Hf、Zr、Tiの量が、0.5~49mol%となるように配合し、混合を湿式ボールミルにより混合した。この混合粉末を大気中で1450°C、20時間加熱して合成した。
この合成材料を、ボールミルにより16時間湿式粉砕して粉末とした。この合成粉末を真空中で、1400°Cで2時間ホットプレスして焼結体とした。焼結体のサイズはφ80mmであり、プレス圧は300kg/cm2で実施した。
なお、La酸化物として、La2O3粉末を使用した場合においても、同様の結果になったので、本実施例については、La2(CO3)3粉末を用いた場合について説明する。
実施例に示した焼結体は、ターゲットとしてバッキングプレートとボンディングし、必要に応じて真空密封(あるいは不活性ガス雰囲気中)して、実際の半導体製造プロセスに使用できるものである。
なお、上記原料粉末の混合条件、合成条件、ホットプレス条件は、いずれも代表的な条件を示すものである。段落[0011]に記載する好適な条件は、任意に選択できるものである。
参考例1の複合酸化物焼結体は、複合酸化物焼結体(酸化ランタンと酸化ハフニウム)のメタル換算で、ハフニウムを0.5モル%含有させたもの、すなわちHf/(La+Hf)のモル%で、Hfが0.5%となるように含有させたものである。以下、他の参考例及び実施例も同様である。なお、参考までに、50モル%で、La2Hf2O7の組成となり、La2O3が33.3モル%、HfO2が66.7モル%となる。
炭素含有量が35ppm、水素29ppm、相対密度は95%、最大粒径は41μm、平均粒径は12μmであった。この場合、HfO2量が本願発明の好ましい条件から、やや少なく、炭素含有量も本願発明の好ましい条件からやや多く、相対密度が95%と若干低かった。この結果、大気中で3週間を経て、焼結体が粉末状に崩壊した。
しかし、真空パック中では、4ヶ月間に至るまで、表面の粉末化は認められなかった。このレベルの焼結体は、やや崩壊の進む速度が大きいが、真空パックを使用すれば、実用的レベルの範囲であると言える。評価としては△である。
参考例2の複合酸化物焼結体は、メタル換算で、ZrO2をZr換算として、0.5モル%を含有させたものである。炭素含有量が23ppm、水素19ppm、相対密度は97%、最大粒径は37μm、平均粒径は9μmであった。この場合、ZrO2量が本願発明の好ましい条件から、やや少なかったが、相対密度が97%と若干高かった。この結果、大気中で4週間を経て、焼結体が粉末状に崩壊した。参考例1よりは若干改善されていた。
しかし、真空パック中では、4ヶ月間に至るまで、表面の粉末化は認められなかった。このレベルの焼結体は、やや崩壊の進む速度が大きいが、真空パックを使用すれば、実用的レベルの範囲であると言える。評価としては△である。
参考例3の複合酸化物焼結体は、メタル換算で、TiO2をTi換算として、0.5モル%を含有させたものである。炭素含有量が46ppm、水素50ppm、相対密度は95%、最大粒径は53μm、平均粒径は11μmであった。この場合、TiO2量が本願発明の好ましい条件から、やや少なく、炭素含有量及び水素量が、本願発明の好ましい条件からやや多く、最大粒径が53μmとやや大きく、相対密度が95%と若干低かった。この結果、大気中で3週間を経て、焼結体が粉末状に崩壊した。
しかし、真空パック中では、4ヶ月間に至るまで、表面の粉末化は認められなかった。このレベルの焼結体は、やや崩壊の進む速度が大きいが、真空パックを使用すれば、実用的レベルの範囲であると言える。評価としては△である。
実施例1の複合酸化物焼結体は、メタル換算で、HfO2をHf換算として、1モル%を含有させたものである。炭素含有量が37ppm、水素30ppm、相対密度は95%、最大粒径は40μm、平均粒径は10μmであった。この場合、HfO2量が本願発明の好ましい条件に適合している。炭素含有量、水素含有量は、本願発明の好ましい条件からやや多く、相対密度が95%と若干低かった。
この結果、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、4週間目で、焼結体が粉末状に崩壊した。なおかつ、真空パック中では、6ヶ月では、6ヶ月間に至るまで、表面の粉末化は認められなかった。このHfO2の存在は、焼結体の崩壊の抑制効果が大きいことが確認できた。実用的レベルであり、評価としては○である。
実施例2の複合酸化物焼結体は、メタル換算で、HfO2をHf換算として、1モル%を含有させたものである。炭素含有量が15ppm、水素20ppm、相対密度は97%、最大粒径は42μm、平均粒径は15μmであった。この場合、いずれの条件も本願発明の好ましい条件に適合していた。
この結果、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、4週間目で、焼結体の表面のみが粉末状に崩壊した。なおかつ、真空パック中では、10ヶ月間に至るまで、表面の粉末化は認められなかった。このHfO2の存在とさらに付加的条件の最適化は、焼結体の崩壊の抑制効果が大きいことが確認できた。実用的レベルであり、評価としては○である。
実施例3の複合酸化物焼結体は、メタル換算で、HfO2をHf換算として、5モル%を含有させたものである。炭素含有量が53ppm、水素47ppm、相対密度は97%、最大粒径は41μm、平均粒径は5μmであった。この場合、炭素と水素の含有量が多かったが、他の条件は本願発明の好ましい条件に適合していた。
この結果、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、4週間目で、焼結体の粉末状に崩壊した。なおかつ、真空パック中では、6ヶ月間に至るまで、表面の粉末化は認められなかった。この複合酸化物焼結体中の過剰な炭素と水素の存在は、やや崩壊の助長要因となることが確認できた。しかし、この実施例3の複合酸化物焼結体は、全体として、崩壊の抑制効果が大きいことが確認できた。実用的レベルであり、評価としては○である。
実施例4の複合酸化物焼結体は、メタル換算で、HfO2をHf換算として、5モル%を含有させたものである。炭素含有量が26ppm、水素28ppm、相対密度は98%、最大粒径は36μm、平均粒径は13μmであった。この場合、この複合酸化物焼結体中に炭素と水素がやや過剰に存在する。しかし、実施例6よりも、その量は少ない。
この結果、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、4週間目で、焼結体の表面のみが粉末状に崩壊した。なおかつ、真空パック中では、10ヶ月間に至るまで、表面の粉末化は認められなかった。
この複合酸化物焼結体中のやや過剰な炭素と水素の存在は、やや崩壊の助長要因となることが確認できた。しかし、この実施例4の複合酸化物焼結体は、実施例6よりも、崩壊の抑制効果が大きいことが確認できた。実用的レベルであり、評価としては○である。
実施例5の複合酸化物焼結体は、メタル換算で、HfO2をHf換算として、10モル%を含有させたものである。炭素含有量が76ppm、水素28ppm、相対密度は95%、最大粒径は63μm、平均粒径は3μmであった。この場合、この複合酸化物焼結体中に炭素と水素が過剰に存在し、最大粒径、平均粒径の、付加的要件は最適範囲にない。
この結果、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、8週間目でも、焼結体の粉末状の崩壊は認められなかった。但し、表面の硬さを測定したところ若干低下傾向にあった。
なおかつ、真空パック中では、1年を経て、ようやく表面の粉末化は認められた。この複合酸化物焼結体は、Hfの存在が大きく、他の付加的要因が本願発明の条件から外れていても、崩壊の抑制効果が大きいことが確認できた。評価としては◎である。
実施例6の複合酸化物焼結体は、メタル換算で、HfO2をHf換算として、10モル%を含有させたものである。炭素含有量が18ppm、水素20ppm、相対密度は96%、最大粒径は23μm、平均粒径は15μmであった。この場合、この複合酸化物焼結体は、いずれも条件も本願発明に適合する条件にあった。
この結果、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、8週間目でも、焼結体の粉末状の崩壊は認められなかった。なおかつ、真空パック中では、1年を経ても粉末化は認められなかった。この複合酸化物焼結体は、Hfの存在と他の付加的要因が本願発明の条件に適合している場合には、崩壊の抑制効果が著しいことが確認できた。評価としては◎である。
実施例7の複合酸化物焼結体は、メタル換算で、HfO2をHf換算として、35モル%を含有させたものである。炭素含有量が73ppm、水素52ppm、相対密度は98%、最大粒径は37μm、平均粒径は8μmであった。この場合、この複合酸化物焼結体中に炭素と水素が、かなり過剰に存在していた。他の付加的要件は最適範囲にある。
この結果、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、8週間目でも、焼結体の粉末状の崩壊は認められなかった。但し、表面の硬さを測定したところ若干低下傾向にあった。
なおかつ、真空パック中では、1年を経て、ようやく表面の粉末化は認められた。但し、表面の硬さを測定したところ若干低下傾向にあった。
この複合酸化物焼結体は、Hfの存在と他の付加的要因が本願発明の条件に適合している場合には、崩壊の抑制効果が著しいことが確認できた。評価としては◎である。
実施例8の複合酸化物焼結体は、メタル換算で、HfO2をHf換算として、35モル%を含有させたものである。炭素含有量が13ppm、水素21ppm、相対密度は98%、最大粒径は30μm、平均粒径は13μmであった。この場合、この複合酸化物焼結体は、いずれも条件も本願発明に適合する条件にあった。
この結果、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、8週間目でも、焼結体の粉末状の崩壊は認められなかった。なおかつ、真空パック中では、1年を経ても粉末化は認められなかった。この複合酸化物焼結体は、Hfの存在と他の付加的要因が本願発明の条件に適合している場合には、崩壊の抑制効果が著しいことが確認できた。評価としては◎である。
実施例9の複合酸化物焼結体は、メタル換算で、HfO2をHf換算として、45モル%を含有させたものである。炭素含有量が73ppm、水素52ppm、相対密度は98%、最大粒径は37μm、平均粒径は8μmであった。この場合、この複合酸化物焼結体中に炭素と水素が、かなり過剰に存在していた。他の付加的要件は最適範囲にある。
この結果、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、8週間目でも、焼結体の粉末状の崩壊は認められなかった。但し、表面の硬さを測定したところ若干低下傾向にあった。
なおかつ、真空パック中では、1年を経て、ようやく表面の粉末化は認められた。この複合酸化物焼結体は、Hfの存在と他の付加的要因が本願発明の条件に適合している場合には、崩壊の抑制効果が著しいことが確認できた。評価としては◎である。
実施例10の複合酸化物焼結体は、メタル換算で、HfO2をHf換算として、45モル%を含有させたものである。炭素含有量が10ppm、水素25ppm、相対密度は98%、最大粒径は31μm、平均粒径は14μmであった。この場合、この複合酸化物焼結体は、いずれも条件も本願発明に適合する条件にあった。
この結果、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、8週間目でも、焼結体の粉末状の崩壊は認められなかった。なおかつ、真空パック中では、1年を経ても粉末化は認められなかった。この複合酸化物焼結体は、Hfの存在と他の付加的要因が本願発明の条件に適合している場合には、崩壊の抑制効果が著しいことが確認できた。評価としては◎である。
実施例11の複合酸化物焼結体は、メタル換算で、HfO2をHf換算として、48モル%を含有させたものである。炭素含有量が23ppm、水素24ppm、相対密度は97%、最大粒径は18μm、平均粒径は10μmであった。この場合、この複合酸化物焼結体は、いずれも条件も本願発明に適合する条件にあった。
この結果、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、8週間目でも、焼結体の粉末状の崩壊は認められなかった。なおかつ、真空パック中では、1年を経ても粉末化は認められなかった。この複合酸化物焼結体は、Hfの存在と他の付加的要因が本願発明の条件に適合している場合には、崩壊の抑制効果が著しいことが確認できた。評価としては◎である。
実施例12の複合酸化物焼結体は、メタル換算で、ZrO2をZr換算として、5モル%を含有させたものである。炭素含有量が20ppm、水素14ppm、相対密度は98%、最大粒径は20μm、平均粒径は12μmであった。この場合、この複合酸化物焼結体は、いずれも条件も本願発明に適合する条件にあった。
この結果、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、4週間目で焼結体の表面のみが粉末状に崩壊した。なお、真空パック中では、10ヶ月を経て、表面の粉末化が確認された。この複合酸化物焼結体は、Zrの存在と他の付加的要因が本願発明の条件に適合している場合には、崩壊の抑制効果があることが確認できた。評価としては○である。
実施例13の複合酸化物焼結体は、メタル換算で、ZrO2をZr換算として、25モル%を含有させたものである。炭素含有量が23ppm、水素15ppm、相対密度は98%、最大粒径は19μm、平均粒径は11μmであった。この場合、この複合酸化物焼結体は、いずれも条件も本願発明に適合する条件にあった。
この結果、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、8週間目でも、焼結体の粉末状の崩壊は認められなかった。なお、真空パック中では、1年を経ても、表面の粉末化は確認されなかった。この複合酸化物焼結体は、Zrの存在と他の付加的要因が本願発明の条件に適合している場合には、崩壊の抑制効果があることが確認できた。評価としては◎である。
実施例14の複合酸化物焼結体は、メタル換算で、ZrO2をZr換算として、48モル%を含有させたものである。炭素含有量が73ppm、水素65ppm、相対密度は99%、最大粒径は17μm、平均粒径は3μmであった。この場合、この複合酸化物焼結体は、密度は高いものの、炭素、水素含有量も多く、粒径も細かいものであった。
この結果、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、8週間目でも、焼結体の粉末状の崩壊は認められなかった。但し、表面の硬さを測定したところ若干低下傾向にあった。なおかつ、真空パック中では、1年を経て、ようやく表面の粉末化は認められた。
この複合酸化物焼結体は、Zrの存在と他の付加的要因が本願発明の条件に適合している場合には、崩壊の抑制効果が著しいことが確認できた。評価としては◎である。
実施例15の複合酸化物焼結体は、メタル換算で、TiO2をTi換算として、1モル%を含有させたものである。炭素含有量が37ppm、水素30ppm、相対密度は95%、最大粒径は40μm、平均粒径は10μmであった。この場合、この複合酸化物焼結体は、酸素量、水素量が多く、また相対密度が95%と若干低い条件にあった。
この結果、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、4週間目で焼結体が粉末状に崩壊した。なお、真空パック中では、6ヶ月を経て、表面の粉末化が確認された。この複合酸化物焼結体は、Tiの存在と他の付加的要因により、適度の崩壊の抑制効果があることが確認できた。評価としては○である。
実施例16の複合酸化物焼結体は、メタル換算で、TiO2をTi換算として、10モル%を含有させたものである。炭素含有量が25ppm、水素21ppm、相対密度は98%、最大粒径は28μm、平均粒径は13μmであった。この場合、この複合酸化物焼結体は、いずれも条件も本願発明に適合する条件にあった。
この結果、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、8週間目でも、焼結体の粉末状の崩壊は認められなかった。なお、真空パック中では、1年を経ても、粉末化は確認されなかった。
この複合酸化物焼結体は、Tiの存在と他の付加的要因が本願発明の条件に適合している場合には、崩壊の抑制効果があることが確認できた。評価としては◎である。
実施例17の複合酸化物焼結体は、メタル換算で、TiO2をTi換算として、30モル%を含有させたものである。炭素含有量が25ppm、水素21ppm、相対密度は98%、最大粒径は28μm、平均粒径は13μmであった。この場合、この複合酸化物焼結体は、いずれも条件も本願発明に適合する条件にあった。
この結果、実施例16と同様に、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、8週間目でも、焼結体の粉末状の崩壊は認められなかった。なお、真空パック中では、1年を経ても、粉末化は確認されなかった。この複合酸化物焼結体は、Tiの存在と他の付加的要因が本願発明の条件に適合している場合には、崩壊の抑制効果があることが確認できた。評価としては◎である。
実施例18の複合酸化物焼結体は、メタル換算で、TiO2をTi換算として、49モル%を含有させたものである。炭素含有量が19ppm、水素25ppm、相対密度は97%、最大粒径は20μm、平均粒径は11μmであった。この場合、この複合酸化物焼結体は、いずれも条件も本願発明に適合する条件にあった。
この結果、実施例17と同様に、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、8週間目でも、焼結体の粉末状の崩壊は認められなかった。なお、真空パック中では、1年を経ても、粉末化は確認されなかった。
この複合酸化物焼結体は、Tiの存在と他の付加的要因が本願発明の条件に適合している場合には、崩壊の抑制効果があることが確認できた。評価としては◎である。
実施例19の複合酸化物焼結体は、メタル換算で、TiO2とZrO2を、その比を1:1とし、TiとZrのメタルの換算として、10モル%を含有させたものである。炭素含有量が20ppm、水素23ppm、相対密度は97%、最大粒径は19μm、平均粒径は9μmであった。この場合、この複合酸化物焼結体は、いずれも条件も本願発明に適合する条件にあった。
この結果、実施例18と同様に、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、8週間目でも、焼結体の粉末状の崩壊は認められなかった。なお、真空パック中では、1年を経ても、粉末化は確認されなかった。この複合酸化物焼結体は、TiとZrからなるメタルの存在と他の付加的要因が本願発明の条件に適合している場合には、崩壊の抑制効果があることが確認できた。評価としては◎である。
実施例20の複合酸化物焼結体は、メタル換算で、TiO2とZrO2を、その比を1:1とし、TiとZrのメタルの換算として、30モル%を含有させたものである。炭素含有量が17ppm、水素18ppm、相対密度は97%、最大粒径は26μm、平均粒径は15μmであった。この場合、この複合酸化物焼結体は、いずれも条件も本願発明に適合する条件にあった。
この結果、実施例19と同様に、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、8週間目でも、焼結体の粉末状の崩壊は認められなかった。なお、真空パック中では、1年を経ても、粉末化は確認されなかった。この複合酸化物焼結体は、TiとZrからなるメタルの存在と他の付加的要因が本願発明の条件に適合している場合には、崩壊の抑制効果があることが確認できた。評価としては◎である。
実施例21の複合酸化物焼結体は、メタル換算で、TiO2とHfO2を、その比を1:1とし、TiとHfのメタルの換算として、20モル%を含有させたものである。炭素含有量が18ppm、水素19ppm、相対密度は97%、最大粒径は23μm、平均粒径は12μmであった。この場合、この複合酸化物焼結体は、いずれも条件も本願発明に適合する条件にあった。
この結果、実施例20と同様に、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、8週間目でも、焼結体の粉末状の崩壊は認められなかった。なお、真空パック中では、1年を経ても、粉末化は確認されなかった。この複合酸化物焼結体は、TiとHfからなるメタルの存在と他の付加的要因が本願発明の条件に適合している場合には、崩壊の抑制効果があることが確認できた。評価としては◎である。
実施例22の複合酸化物焼結体は、メタル換算で、TiO2とHfO2を、その比を1:1とし、TiとHfのメタルの換算として、40モル%を含有させたものである。炭素含有量が25ppm、水素20ppm、相対密度は97%、最大粒径は23μm、平均粒径は17μmであった。この場合、この複合酸化物焼結体は、いずれも条件も本願発明に適合する条件にあった。
この結果、実施例21と同様に、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、8週間目でも、焼結体の粉末状の崩壊は認められなかった。なお、真空パック中では、1年を経ても、粉末化は確認されなかった。この複合酸化物焼結体は、TiとHfからなるメタルの存在と他の付加的要因が本願発明の条件に適合している場合には、崩壊の抑制効果があることが確認できた。評価としては◎である。
実施例23の複合酸化物焼結体は、メタル換算で、TiO2とZrO2とHfO2を、その比を1:1:1とし、TiとZrとHfのメタルの換算として、6モル%を含有させたものである。炭素含有量が53ppm、水素37ppm、相対密度は96%、最大粒径は48μm、平均粒径は3μmであった。この場合、この複合酸化物焼結体は、炭素含有量、水素含有量が著しく多く平均粒径は細かい点を除いて、いずれも条件も本願発明に適合する条件にあった。
この結果、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、4週間目で焼結体が粉末状に崩壊した。なお、真空パック中では、6ヶ月を経て、表面の粉末化が確認された。この複合酸化物焼結体は評価としては○である。
実施例24の複合酸化物焼結体は、メタル換算で、TiO2とZrO2とHfO2を、その比を1:1:1とし、TiとZrとHfのメタルの換算として、24モル%を含有させたものである。炭素含有量が23ppm、水素24ppm、相対密度は97%、最大粒径は23μm、平均粒径は16μmであった。この場合、この複合酸化物焼結体は、いずれも条件も本願発明に適合する条件にあった。
この結果、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、8週間目でも、焼結体の粉末状の崩壊は認められなかった。なお、真空パック中では、1年を経ても、粉末化は確認されなかった。この複合酸化物焼結体は、TiとZrとHfからなるメタルの存在と他の付加的要因が本願発明の条件に適合している場合には、崩壊の抑制効果があることが確認できた。評価としては◎である。
実施例25の複合酸化物焼結体は、メタル換算で、TiO2とZrO2とHfO2を、その比を1:1:1とし、TiとZrとHfのメタルの換算として、45モル%を含有させたものである。炭素含有量が23ppm、水素24ppm、相対密度は97%、最大粒径は28μm、平均粒径は15μmであった。この場合、この複合酸化物焼結体は、いずれも条件も本願発明に適合する条件にあった。
この結果、加速試験である恒温(40°C)、恒湿(湿度90%)の槽中、8週間目でも、焼結体の粉末状の崩壊は認められなかった。なお、真空パック中では、1年を経ても、粉末化は確認されなかった。この複合酸化物焼結体は、TiとZrとHfからなるメタルの存在と他の付加的要因が本願発明の条件に適合している場合には、崩壊の抑制効果があることが確認できた。評価としては◎である。
この比較例1の酸化物焼結体は、La2O3である。炭素含有量が31ppm、水素27ppm、相対密度は96%、最大粒径及び平均粒径は測定できなかった。この場合、大気中2週間放置で、白い粉末状に崩壊した。この場合は、焼結体の形状を維持できなかった。評価としては×である。
以上の結果を、表1に示す。
Claims (10)
- 酸化ランタンを基本成分とする焼結体であって、酸化チタン、酸化ジルコニウム、酸化ハフニウムの一又は二以上を含有し、残部が酸化ランタン及び不可避的不純物であることを特徴とする酸化ランタン基焼結体。
- 焼結体中の金属元素の合計成分量に対して、チタン、ジルコニウム、ハフニウムの金属元素の量が1mol%以上50mol%未満であることを特徴とする請求項1記載の酸化ランタン基焼結体。
- 焼結体中の金属元素の合計成分量に対して、チタン、ジルコニウム、ハフニウムの金属元素の量が10mol%以上50mol%未満であることを特徴とする請求項1記載の酸化ランタン基焼結体。
- 水素及び炭素が各々25wtppm以下、相対密度96%以上、最大粒径が50μm以下、平均粒径5μm以上であることを特徴とする請求項1~3のいずれか一項に記載の酸化ランタン基焼結体。
- 請求項1~4のいずれか一項に記載の焼結体からなるスパッタリングターゲット。
- 酸化ランタン原料粉末としてLa2(CO3)3粉末又はLa2O3粉末と、添加酸化物としてTiO2、ZrO2、HfO2粉末の一又は二以上とを使用し、Laに対する添加酸化物の金属成分の組成比を所定の値になるように配合し混合した後、この混合粉末を大気中で加熱合成し、次にこの合成材料を粉砕して粉末とした後、この合成粉末をホットプレスして焼結体とすることを特徴とする酸化ランタン基焼結体の製造方法。
- 酸化ランタン原料粉末としてLa2(CO3)3粉末又はLa2O3粉末と、添加酸化物としてTiO2、ZrO2、HfO2粉末の一又は二以上とを使用し、Laに対する添加酸化物の金属成分の組成比を所定の値になるように配合し混合した後、この混合粉末を大気中で加熱合成し、次にこの合成材料を粉砕して粉末とした後、この合成粉末をホットプレスして焼結体とすることを特徴とする請求項1~5のいずれか一項に記載の酸化ランタン基焼結体の製造方法。
- 混合を湿式ボールミルにより行い、合成を大気中1350~1550°C、5~25時間加熱して製造することを特徴とする請求項6又は7記載の酸化ランタン基焼結体の製造方法。
- ホットプレスを1200~1500°C、真空中、1~5時間で行うことを特徴とする請求項6~8のいずれか一項に記載の酸化ランタン基焼結体の製造方法。
- 請求項6~8のいずれか一項に記載の酸化ランタン基焼結体の製造方法によるスパッタリングターゲットの製造方法。
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US (1) | US20110114481A1 (ja) |
EP (1) | EP2298715A4 (ja) |
JP (1) | JP5301541B2 (ja) |
KR (1) | KR101222789B1 (ja) |
CN (1) | CN102089258B (ja) |
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JP2020096179A (ja) * | 2018-11-30 | 2020-06-18 | 株式会社リコー | 絶縁性酸化物膜用スパッタリングターゲット、絶縁性酸化物膜の形成方法、及び電界効果型トランジスタの製造方法 |
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AU2008344685B2 (en) * | 2007-12-28 | 2012-09-27 | Jx Nippon Mining & Metals Corporation | Highly pure lanthanum, sputtering target comprising highly pure lanthanum, and metal gate film mainly composed of highly pure lanthanum |
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WO2011062003A1 (ja) | 2009-11-17 | 2011-05-26 | Jx日鉱日石金属株式会社 | ランタン酸化物ターゲットの保管方法及び真空密封したランタン酸化物ターゲット |
KR101291822B1 (ko) | 2010-07-30 | 2013-07-31 | 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 | 스퍼터링 타깃 및/또는 코일 그리고 이들의 제조 방법 |
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US9013009B2 (en) | 2011-01-21 | 2015-04-21 | Jx Nippon Mining & Metals Corporation | Method for producing high-purity lanthanum, high-purity lanthanum, sputtering target formed from high-purity lanthanum, and metal gate film having highy-purity lanthanum as main component |
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WO2019022668A1 (en) * | 2017-07-26 | 2019-01-31 | National University Of Singapore | POLYACRYLONITRILE MEMBRANES, METHODS AND USES THEREOF |
US11274363B2 (en) * | 2019-04-22 | 2022-03-15 | Nxp Usa, Inc. | Method of forming a sputtering target |
CN113336543B (zh) * | 2021-06-09 | 2022-11-29 | Oppo广东移动通信有限公司 | 电子设备及其壳体、氧化锆陶瓷涂料的制备方法 |
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Publication number | Priority date | Publication date | Assignee | Title |
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JP5301542B2 (ja) * | 2008-07-07 | 2013-09-25 | Jx日鉱日石金属株式会社 | 酸化物焼結体、同焼結体からなるスパッタリングターゲット、同焼結体の製造方法及び同焼結体スパッタリングターゲットゲートの製造方法 |
JP2020096179A (ja) * | 2018-11-30 | 2020-06-18 | 株式会社リコー | 絶縁性酸化物膜用スパッタリングターゲット、絶縁性酸化物膜の形成方法、及び電界効果型トランジスタの製造方法 |
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JPWO2010004861A1 (ja) | 2011-12-22 |
JP5301541B2 (ja) | 2013-09-25 |
CN102089258B (zh) | 2014-04-16 |
US20110114481A1 (en) | 2011-05-19 |
KR101222789B1 (ko) | 2013-01-15 |
EP2298715A4 (en) | 2011-11-23 |
CN102089258A (zh) | 2011-06-08 |
EP2298715A1 (en) | 2011-03-23 |
KR20110020291A (ko) | 2011-03-02 |
TW201002645A (en) | 2010-01-16 |
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