WO2009144609A1 - Dispositif d’atténuation de débris - Google Patents

Dispositif d’atténuation de débris Download PDF

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Publication number
WO2009144609A1
WO2009144609A1 PCT/IB2009/051993 IB2009051993W WO2009144609A1 WO 2009144609 A1 WO2009144609 A1 WO 2009144609A1 IB 2009051993 W IB2009051993 W IB 2009051993W WO 2009144609 A1 WO2009144609 A1 WO 2009144609A1
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WO
WIPO (PCT)
Prior art keywords
foils
distance
collector
foil
central axis
Prior art date
Application number
PCT/IB2009/051993
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English (en)
Inventor
Guenther H. Derra
Michael Schaaf
Original Assignee
Philips Intellectual Property & Standards Gmbh
Koninklijke Philips Electronics N. V.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Intellectual Property & Standards Gmbh, Koninklijke Philips Electronics N. V. filed Critical Philips Intellectual Property & Standards Gmbh
Publication of WO2009144609A1 publication Critical patent/WO2009144609A1/fr

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Definitions

  • the present invention relates to a debris mitigation device, in particular for use in a radiation unit for EUV-radiation and/or soft X-rays, comprising at least one foil trap having a central axis and several foils extending in a radial direction with respect to the central axis between an inner and an outer mount.
  • the invention also relates to an arrangement of such a debris mitigation device between the radiation source and the collector in a radiation unit for EUV-radiation and/or soft X-rays.
  • Debris mitigation devices are in particular applicable in radiation units emitting extreme ultraviolet (EUV) radiation or soft X-rays in the wavelength range between approximately lnm to 20nm.
  • EUV extreme ultraviolet
  • An exemplary application field is EUV- lithography required for fabrication of integrated circuits with structures having dimensions of only a few nm.
  • EUV-radiation units for EUV-lithography comprise as key elements a radiation source emitting the EUV radiation and illumination optics for projecting the structure of a mask onto a wafer substrate.
  • the optical components are reflective mirrors since effective transmissive optical components are not known for this wavelength region.
  • the required EUV radiation is generated by a plasma discharge which forms the radiation source of the radiation unit. Apart from the EUV radiation, such a plasma, however, also emits charged or uncharged particles which can deposit on the optical surfaces of the illumination optics. Dependent on the kind of EUV radiation source these particles can comprise neutral atoms, ions, clusters or droplets of different chemical consistence. The totality of such undesired particle emissions of a EUV radiation source is also called debris.
  • the first mirror close to the radiation source - also called collector - is mainly contaminated by such debris.
  • debris mitigation systems are used between the radiation source and the optical components, in particular the collector, of such a radiation unit.
  • a known method of debris mitigation is the supply of a buffer gas between the EUV radiation source and the collector.
  • the debris particles in the case of atoms or ions, are slowed down by the collisions with the gas atoms and are deflected from their original flight direction. With a sufficient high density of the buffer gas, the debris particles can be completely stopped on their way to the collector.
  • an additional debris mitigation device is used between the EUV radiation source and the collector.
  • a debris mitigation device comprises a structure having passages for the straight passage of the radiation to the collector, wherein the debris material deflected by the interaction with the buffer gas is mainly condensed on the walls of the structure and therefore does not reach the collector.
  • Known debris mitigation devices comprise several thin sheets or foils, both in the present application referred to as foils, arranged in a parallel, radial, concentric or honeycomb structure forming manner as is disclosed for example in WO 01/01736 Al.
  • the foil structures are also called foil traps because of the thin foils forming the walls of the structure are trapping the debris particles.
  • the foils of such a foil trap are preferably manufactured from metals like steel, tungsten, molybdenum, tantalum or similar high temperature resistant metals or from ceramics.
  • Several different forms of foil trap structures have been proposed, which combine a high optical transparency for EUV-radiation and provision for a large surface capable of collecting debris particles.
  • the distances between the foils increase in the radial direction.
  • a small width of the channels formed between the foils is advantageous for effectively trapping the debris particles moving through the foil trap.
  • the debris mitigation will be relatively good at the inner parts close to the central axis and poor at the outer parts radially distant from the inner axis.
  • EP 1677149 Al discloses a debris mitigation device in which the foil trap comprises two sets of foils.
  • An inner set of foils extents from an inner mount in a radial direction within an inner cross section of the foil trap and an outer set of foils extents from an outer mount towards the central axis within an outer cross section of the foil trap.
  • the inner cross section and the outer cross section are substantially non- overlapping.
  • the number of inner foils may be smaller than the number of outer foils so as to allow a similar distance between the foils in the inner and in the outer cross section.
  • An object of the present invention is to provide a debris mitigation device with a foil trap combining a good trapping efficiency at inner and outer portions of its cross section with an improved mechanical stability, in particular compared to the above foil trap of the prior art.
  • the proposed debris mitigation device comprises at least one foil trap having a central axis and several first foils, said first foils extending in a radial direction with respect to the central axis between an inner and an outer mount. Second foils are arranged in intermediate spaces between the first foils, said second foils extending from said outer mount towards the central axis to a distance smaller than the distance between the inner and the outer mount.
  • mount means any fixture or other structure which mechanically stabilizes the foils at the respective position.
  • the foils may be mechanically fixed to or only guided by such a mount, e.g. in order to allow a movement of the foils within their corresponding foil planes due to thermal extension.
  • the mount may also be formed by distance elements which are explained later in this description.
  • the proposed debris mitigation device provides improved debris mitigation since the broader intermediate spaces between the first foils in the radially outer portions of the foil trap are narrowed by the additional second foils arranged in these intermediate spaces. Furthermore, the extension of the first foils between the inner and the outer mount guarantees mechanical stability of the foil trap even in the case of rotating the foil trap. Preferably the first foils are fixed to only one mount (outer or inner) and only guided by the other mount (inner or outer, respectively), for allowing a movement in the radial direction at one of the mounts. With the proposed foil trap structure the disadvantage of increased channel width between the foils for large collection angles, in particular when used in a EUV radiation system, is avoided.
  • third foils may be arranged in the intermediate spaces between the second foils and the first foils, said third foils extending from the outer mount towards the central axis to a distance which is smaller than the distance to which the second foils extend in this direction. It is evident for the skilled person that dependent on the intended effect and on the height of the collection angle this measure may be continued with additional fourth, fifth foils and so on.
  • Another possibility for effective debris mitigation at large collection angles is to arrange two or more second foils between the first foils, said second foils extending to a first distance towards the central axis, and to connect a smaller number of third foils to the radially inner edges or to an inner mount of the second foils, said third foils extending from the inner edges or the inner mount to a second distance towards the central axis.
  • Said first and said second distance are chosen to be in sum smaller than the distance between the inner and the outer mount.
  • mounts are provided at the radially inner edges of the second foils, third foils and so on.
  • the mount is formed of distance elements designed and arranged at the second foils to center or equally space the second foils between adjacent first foils without fixing the second foils to the first foils.
  • the distance elements allow an independent movement of the first foils and the second foils within their corresponding foil planes. Such movements may occur due to different thermal extensions of these foils.
  • the foils always maintain their lateral relative position with respect to each other resulting in a mechanically very stable construction of the whole foil trap.
  • the distance elements may be in contact or maintain a very small distance to the adjacent foils, always allowing the independent movement of the foils in their planes.
  • the distance elements may for example be formed by alternately bending portions of the inner edges of the second foils towards one side of an adjacent foil and towards the other side of the opposing adjacent foil.
  • the distance elements are formed of independent pieces of material, which may comprise central slots through which fins formed at the radially inner edges of the second foils extend. The fins are then fixed on the opposite side of the distance elements for example by bending them appropriately or by welding them to the distance elements.
  • the proposed debris mitigation device preferably also comprises at least one feed pipe for gas supply of buffer gas to the foil trap.
  • These one or several feed pipes are preferably arranged at said outer mount, but part of the buffer gas may also be supplied by feed pipes from the inner mount.
  • the proposed debris mitigation device is not limited to the use of one single foil trap unit, but may have several foil traps arranged sequentially in the direction of the passages formed by the foils to allow a straight passage of radiation. It is obvious, that such a debris mitigation device may for example be composed of a static foil trap and a rotating foil trap with a space in between, wherein this space may be used to supply a buffer gas.
  • a preferred application of the proposed debris mitigation device is the arrangement in a radiation unit for EUV radiation and/or soft X-rays.
  • the debris mitigation device is arranged between the radiation source and the collector for collecting emitted radiation as known in the art.
  • the optical axis between the radiation source and the collector then may coincide with the central axis of the foil trap.
  • the collector may comprise several collector shells concentrically arranged around the optical axis.
  • the distance elements may be arranged such that they extend on a straight line between the radiation source and the corresponding edges of the collector shells.
  • the radially inner edges of the second foils may be formed to extend parallel to such straight lines between the radiation source and the corresponding edges of the collector shells. In a further embodiment only one portion of the radially inner edge of the second foil is formed in this manner, the other portion being formed to extend essentially parallel to the optical axis. The distance elements are then only arranged at the first portion of these inner edges.
  • the radially inner edges of the second foils generally may also be formed to extend along straight lines essentially parallel to the optical or central axis.
  • the forming of at least a portion of the radially inner edges essentially parallel to the straight lines extending from the radiation source to the corresponding inner edges avoids a step in radiation losses between the inner zone of the foil trap, in which only the first foils are arranged and the outer zone, in which also the second foils extend.
  • this effect may also be achieved with other forms of the radially inner edges.
  • these explanations and embodiments also apply to optional third foils, fourth foils and so on.
  • Fig. 1 a debris mitigation device as known in the art
  • Fig. 2 a debris mitigation system as known in the art
  • Fig. 3 a first example of a debris mitigation device according to the present invention
  • FIG. 4 a second example of a debris mitigation device according to the present invention
  • Fig. 5 a third example of a debris mitigation device according to the present invention
  • Fig. 6 a fourth example of a debris mitigation device according to the present invention
  • Fig. 7 an example showing an arrangement of distance elements
  • Fig. 8 an example showing several views of an arrangement of distance elements
  • Fig. 9 several examples of the design of distance elements
  • Fig. 10 a further example showing the arrangement of distance elements
  • Fig. 11 two examples showing the mounting of distance elements to the foils
  • Fig. 12 two further examples showing of a debris mitigation device according to the present invention with and without distance elements.
  • Figure 1 refers to a known debris mitigation device as known in the art.
  • Fig 2 shows a similar system which may form the complete foil trap or may only be part of a foil trap, e.g. the static part or the foil trap.
  • These debris mitigation devices are arranged in a radiation unit emitting EUV radiation, for example for lithographic applications.
  • the EUV source 2 is emitting the useful EUV radiation 8, but at the same time unwanted debris particles 9.
  • the EUV radiation passes the foil trap system and is collected and directed by the collector 3 to the lithographic system.
  • the suppression of debris particles 9 occurs in a foil trap system which in this example comprises a rotating foil trap 5 rotating around a central axis 10 and a static foil trap 4.
  • the central axis of the foil trap system often, but not necessarily, coincides with the optical axis defined by the source and the collector.
  • the suppression is caused by the buffer gas fed into the system by the gas supply 6.
  • the gas is pumped away by vacuum pumps not shown in the figures.
  • a pressure of the buffer gas of approximately 5 to 50 Pa (cold pressure) over an interaction distance of several centimetres is required.
  • the atomic weight of the gas atoms should in the ideal case be similar to the atomic weight of the atoms and ions to be stopped in order to ensure an effective momentum transfer.
  • the free space between the above mentioned foils of such a foil trap must not be too large, since otherwise debris particles only weakly deflected by the buffer gas could still pass through the foil trap structure. If the channels formed by the thin sheets or foils of the foil trap are narrow in a direction perpendicular to the direction of debris particle velocity, the chance of capturing the weakly deflected particles is larger.
  • the channel structure comprises a relatively high buffer gas flow resistance compared to a structure with wide channels. This means that if such a narrow structure is used, it is much easier to build up a region of high buffer gas density within the foil trap system, compared to a wide structure. The debris mitigation function will therefore be improved. As a consequence of these reasons, practical designs for foil traps are using a channel width of the order of 2 millimetres and below. If the channel width of the structure is larger, the debris mitigation function is significantly reduced.
  • Currently used practical foil trap systems often comprise many thin foils arranged in radial direction relative to the optical axis, as also shown schematically in Fig. 2b, since this configuration is relatively easy to realize.
  • the width of the channels between the foils not constant, but it is small (13) for the inner part of the structure, i.e. for small collection angles, whereas it is large (14) for the outer parts, i.e. large collection angles. So the debris mitigation will be relatively good at the inner parts and poor at the outer parts of the foiltrap.
  • FIG. 3 shows an embodiment of a debris mitigation device according to the present invention, wherein Fig 3 a depicts a side view and Fig. 3b a front view across section A/A as is the case in each of the Figures 2 to 6.
  • the foils 11 also called first foils in this application
  • intermediate foils 15 also called second foils in this application
  • One or more intermediate foils 15 are introduced between each pair of first foils 11.
  • the radially inner edges 16 of the intermediate foils 15 are oriented parallel to the central axis, which may coincide with the optical axis 1 of the system.
  • the intermediate foils 15 are mounted at the outer mount 12 with their inner edges 16 without any further support.
  • the radially inner edges 16 of the intermediate foils 15 are formed to extend in a direction of a line from the source 2 to the edge of a shell of the collector 3.
  • the radially inner edges 16 of the intermediate foils 15 are furthermore supported by a mount 18 which is formed from distance elements as shown in figures 8 to 11.
  • the mount 18 is placed in such a way that it lies within the projected shadow region 17 of a collector shell, as indicated by two dashed lines in the figure. In this way, the mount 18 does not block extra light from the source 2, because the absorbed radiation would have been absorbed by the collector shell edge anyway.
  • the optical transmission of the foil trap as a function of increasing ray angle to the optical axis 1 exhibits a stepwise decrease at just the angle corresponding to the angle, where the intermediate foils 15 become effective and introduce an additional optical shadowing.
  • This stepwise decrease causes a non-uniformity of the transmitted radiation beam and may therefore require additional compensation means in the lithographic system.
  • the intermediate foils 15 are formed such that only a part of their radially inner edge 16 is supported by a mount 18 and another part is formed to be parallel to the optical axis 1, as in Figure 3.
  • the steep decrease of the optical transmission as a function of ray angle is less pronounced, because at the ray angle where the intermediate foils 15 become effective, the distance of the foil front edge to the source 2 is enlarged and therefore the shadowing by the foil edge is lower leading to only a gradual decrease with increasing ray angle.
  • This effect may also be achieved with other designs of the radially inner edges of the foils, for example with the form indicated in Figure 12.
  • the intermediate foils 15 are formed with curved radially inner edges 16 such that these inner edges 16 have a larger distance to the optical axis 1 close the radiation source than distant from the radiation source.
  • the steep decrease of the optical transmission as a function of ray angle is less pronounced.
  • Figure 12a the intermediate foils 15 are not provided with distance elements
  • Figure 12b shows a possible arrangement of such distance elements forming the mount 18 at the intermediate foils 15.
  • the mount 18 is placed at the intermediate foils 15 in such a way that it lies within the projected shadow region 17 of a collector shell, as indicated by two dashed lines in the figure. In this way, the mount 18 does not block extra light from the source 2, because the absorbed radiation would have been absorbed by the collector shell edge anyway.
  • a foil trap for a larger collection angle 7 is shown, as is intended for high volume manufacturing. Because of the larger distances to the optical axis 1 that have to be covered here, two different sets of intermediate foils 15 are used, which are referred to in the foregoing description as second and third foils. By this measure it is ensured, that even for large radial distances the foil channels do not become too wide.
  • Figure 7 shows a detail of an embodiment, in which more than one mount
  • the distance element 18 18, consisting of at least one distance piece or distance element 19.
  • Figure 8 shows a side view a) (cross section D/D), a view b) of cross section B/B and a view c) of cross section C/C.
  • each foil can extend thermally within its own foil plane, so that the geometry of the foil channels remains essentially constant. This has the advantage that the optical transmission for the EUV radiation stays essentially constant under varying thermal load conditions.
  • Another design aspect of the distance element 19 that can be used beneficially is to shape the edges of the distance element 19 touching the neighbor foils as a straight line and to minimize the distance of these edges to the neighbor foils.
  • a typical gap of 1 to 30 ⁇ m can be used here.
  • the two distance elements 19 lying left and right of each foil 11 are limiting potential deformations, especially bends, of the foils 11 in the region where they touch the foils 11.
  • All distance elements 19 of a full foil trap structure together with the foils separating them with a small gap, like described before, can thus form a relatively stiff structure with their foils 11 and intermediate foils 15 forced and maintained straight and plane.
  • Figure 9 shows four examples of differently formed intermediate foil distance elements 19.
  • Figure 9a depicts a distance element 19, which essentially closes the intermediate space between the intermediate foil 15 and the neighboring foils 11, so that essentially no flow of buffer gas can occur between the spaces departed by the distance element 19.
  • Figures 9b and 9c different designs of distance elements 19 are shown, where the distance elements 19 resemble holes or open portions, so that a flow of buffer gas can occur between the spaces separated by the distance elements 19. This leads to a changed over all pressure distribution of the buffer gas in the foil trap system.
  • Figure 9d shows a distance element 19, which is formed by one or more sections of the intermediate foil 15, which are bent towards both neighboring foils 11 to maintain the mechanical distance between the foils 11 and the intermediate foils 15.
  • Figure 10 shows an example of a larger foil trap structure, where a second set of intermediate foils 15 is used, also referred to as third foils.
  • a second set of intermediate foils 15 is used, also referred to as third foils.
  • two outer intermediate foils 15 are used between each pair of main foils 11. These foils are connected with a larger distance element 20.
  • An inner intermediate foil 15 is attached to each larger distance element 20 and at its inner edge is connected to a distance element 19 formed as described before.
  • the distance elements 19 and 20 each obtain a small gap to their neighboring main foils 11 and yield the same functions and advantages as described before.
  • FIG 11 shows two examples for the connection between the distance elements 19 and the intermediate foils 15.
  • each intermediate foil 15 has a mounting fin 22 which is penetrating the corresponding distance element 19 through a slot or opening 21.
  • a firm mechanical connection can be achieved, for example, by welding joints 23 or by bending parts 24 of the mounting fin 22 as shown in Figure 1 Ib.
  • Other solutions for connecting the foil to the distance elements 19 are possible using state of the art technology.
  • the outer foil mount 12 can be designed as a solid barrier for the injected buffer gas, such that it is enclosing at least part of the total foil trap structure to confine the injected buffer gas within the foil trap region.
  • the buffer gas injected inside the foil trap structure can then flow to the region outside the foil trap only via the narrow foil channels which constitute a relatively high flow resistance to the buffer gas flow.
  • the local buffer gas density at the location of gas injection in the central region of the foil trap is relatively high, leading to increased debris mitigation efficiency.
  • the invention is not limited to the disclosed embodiments.
  • the different embodiments described above and in the claims can also be combined.
  • Other variations to the disclosed embodiments can be understood and effected by those skilled in the art in practicing the claimed invention, from the study of the drawings, the disclosure and the appended claims.
  • the proposed debris mitigation device is not limited to one single foil trap, i.e. several foil traps can be used in a sequential manner with respect to the direction of the emitted radiation. This applies for example also to the foil trap design of Figure 1 which can be used in the proposed debris mitigation device.
  • the distance elements used as mount for the additional foils can have any design as far as the disclosed function is achieved..

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  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

La présente invention concerne un dispositif d’atténuation de débris, en particulier pour une utilisation dans une unité de rayonnement émettant des rayonnements ultraviolets extrêmes et/ou des rayons X mous. Le dispositif d’atténuation de débris comprend au moins un piège à feuilles ayant un axe central (10) et plusieurs premières feuilles (11) s’étendant dans une direction radiale par rapport à l’axe central (10) entre un support interne (25) et un support externe (12). Les deuxièmes feuilles (15) sont disposées dans des espaces intermédiaires entre les premières feuilles (11) et s’étendent depuis ledit support extérieur (12) vers l’axe central (10) à une distance plus petite que la distance entre ledit support interne (25) et ledit support externe (12). Le dispositif d’atténuation de débris permet d’améliorer l’efficacité de piégeage conjointement avec une stabilité mécanique élevée du piège à feuilles.
PCT/IB2009/051993 2008-05-28 2009-05-14 Dispositif d’atténuation de débris WO2009144609A1 (fr)

Applications Claiming Priority (2)

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EP08104143 2008-05-28
EP08104143.6 2008-05-28

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WO2009144609A1 true WO2009144609A1 (fr) 2009-12-03

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9572240B2 (en) 2013-12-25 2017-02-14 Ushio Denki Kabushiki Kaisha Light source apparatus

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103237401A (zh) * 2013-04-01 2013-08-07 哈尔滨工业大学 一种去除毛细管放电极紫外光刻光源中碎屑的除屑系统

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003034153A2 (fr) * 2001-10-12 2003-04-24 Koninklijke Philips Electronics N.V. Appareil lithographique et procede de fabrication de dispositif
US20040160155A1 (en) * 2000-06-09 2004-08-19 Partlo William N. Discharge produced plasma EUV light source
US20050199829A1 (en) * 2004-03-10 2005-09-15 Partlo William N. EUV light source
EP1742110A2 (fr) * 2005-07-06 2007-01-10 ASML Netherlands BV Appareil lithographique, piège pour contaminants et procédé de fabrication d'un dispositif

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040160155A1 (en) * 2000-06-09 2004-08-19 Partlo William N. Discharge produced plasma EUV light source
WO2003034153A2 (fr) * 2001-10-12 2003-04-24 Koninklijke Philips Electronics N.V. Appareil lithographique et procede de fabrication de dispositif
US20050199829A1 (en) * 2004-03-10 2005-09-15 Partlo William N. EUV light source
EP1742110A2 (fr) * 2005-07-06 2007-01-10 ASML Netherlands BV Appareil lithographique, piège pour contaminants et procédé de fabrication d'un dispositif

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9572240B2 (en) 2013-12-25 2017-02-14 Ushio Denki Kabushiki Kaisha Light source apparatus

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