WO2009137706A2 - In-situ differential spectroscopy - Google Patents

In-situ differential spectroscopy Download PDF

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Publication number
WO2009137706A2
WO2009137706A2 PCT/US2009/043185 US2009043185W WO2009137706A2 WO 2009137706 A2 WO2009137706 A2 WO 2009137706A2 US 2009043185 W US2009043185 W US 2009043185W WO 2009137706 A2 WO2009137706 A2 WO 2009137706A2
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Prior art keywords
sample
stream
electron beam
spectrometer
emitted
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PCT/US2009/043185
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French (fr)
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WO2009137706A3 (en
Inventor
Mehdi Vaez-Iravani
Mehran Nasser Ghodsi
Guoheng Zhao
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Kla-Tencor Corporation
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Priority to EP09743692.7A priority Critical patent/EP2294371A4/en
Priority to KR1020107027635A priority patent/KR101524022B1/en
Priority to CN200980116526.3A priority patent/CN102016525B/en
Priority to JP2011508679A priority patent/JP5639042B2/en
Publication of WO2009137706A2 publication Critical patent/WO2009137706A2/en
Publication of WO2009137706A3 publication Critical patent/WO2009137706A3/en

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28—Investigating the spectrum
    • G01J3/42—Absorption spectrometry; Double beam spectrometry; Flicker spectrometry; Reflection spectrometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/227—Measuring photoelectric effect, e.g. photoelectron emission microscopy [PEEM]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
    • H01J37/256—Tubes for spot-analysing by electron or ion beams; Microanalysers using scanning beams
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/079—Investigating materials by wave or particle radiation secondary emission incident electron beam and measuring excited X-rays
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/086—Auger electrons
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/30—Accessories, mechanical or electrical features
    • G01N2223/33—Accessories, mechanical or electrical features scanning, i.e. relative motion for measurement of successive object-parts
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/24495—Signal processing, e.g. mixing of two or more signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/25—Tubes for localised analysis using electron or ion beams
    • H01J2237/2505—Tubes for localised analysis using electron or ion beams characterised by their application
    • H01J2237/2511—Auger spectrometers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2803—Scanning microscopes characterised by the imaging method
    • H01J2237/2807—X-rays

Definitions

  • Spectroscopy is an important tool for material identification on the microscopic level in a variety of fields, including the fabrication process of integrated circuits.
  • integrated circuit includes devices such as those formed on monolithic semiconducting substrates, such as those formed of group IV materials like silicon or germanium, or group III-V compounds like gallium arsenide, or mixtures of such materials.
  • group IV materials like silicon or germanium, or group III-V compounds like gallium arsenide, or mixtures of such materials.
  • the term includes all types of devices formed, such as memory and logic, and all designs of such devices, such as MOS and bipolar.
  • the term also comprehends applications such as flat panel displays, solar cells, and charge coupled devices.
  • Auger spectroscopy Traditional techniques for performing Auger spectroscopy involve taking sequential readings in an ultra-high vacuum environment. Another technique uses a massively parallel Auger spectroscopy system, which achieves a much faster result in a moderate vacuum environment.
  • a spectrometer having an electron beam generator for generating an electron beam that is directed at a sample.
  • An electron beam positioner directs the electron beam onto a position of the sample, and thereby produces a secondary emitted electron stream from the sample.
  • An emitted electron stream positioner positions the emitted electron stream onto a detector array, which receives the emitted electron stream and detects both the amounts and the received positions of the emitted electron stream.
  • a modulator modulates the electron beam that is directed onto the sample, and thereby sweeps the electron beam between a first position and a second position on the sample.
  • An extractor is in signal communication with both the modulator and the detector, and extracts a differential signal that represents a difference between the signals that are received from the first position and the signals that are received from the second position.
  • the spectrometers according to the present invention are able to distinguish signal levels that are much lower than those of spectrometers that are constructed and operated in a traditional manner. Thus, readings can be taken in less time, for example, and other issues related to the cost of spectroscopy can be reduced or eliminated.
  • the spectrometer is either an Auger spectrometer or an EDX spectrometer.
  • a spectrometer having an electron beam generator for generating an electron beam that is directed at a sample.
  • An electron beam positioner directs the electron beam onto a position of the sample, and thereby produces a secondary emitted electron stream from the sample.
  • An emitted electron stream positioner positions the emitted electron stream onto a detector array, which receives the emitted electron stream and detects both the amounts and the received positions of the emitted electron stream.
  • a modulator modulates a voltage on the emitted electron stream positioner, and thereby sweeps the emitted electron stream across the detector.
  • An extractor is in signal communication with both the modulator and
  • P2814PCT Page 2 of 11 the detector extracts a differential signal that represents trace constituents of the sample that differ from a background composition of the sample.
  • a method for producing a differential spectrum by directing an electron beam onto a sample and thereby producing a secondary emitted electron stream from the sample.
  • the emitted electron stream is positioned onto a detector array that detects both the amounts and the received positions of the emitted electron stream.
  • a modulator modulates at least one of (1) the directing of the electron beam onto the sample and (2) the positioning of the emitted electron stream onto the detector.
  • Signal communication is provided between the modulator and the detector, and a differential signal is extracted, which represents a difference between signals generated by the at least one of the modulated electron beam and the modulated emitted electron stream.
  • the method can be implemented, for example, in an Auger spectrometer or an EDX spectrometer.
  • the modulator modulates the electron beam that is directed onto the sample, and thereby sweeps the electron beam between a first position and a second position on the sample, and the differential signal represents a difference between signals received from a first position on the sample and signals received from a second position on the sample.
  • the modulator modulates the emitted electron stream across the detector, and thereby sweeps the emitted electron stream across the detector, and the differential signal represents trace constituents of the sample that differ from a background composition of the sample.
  • FIG. 1 is a graphical representation of a first embodiment of an Auger spectrometer according to the present invention, in which a voltage-varying method is employed.
  • FIG. 2 is a graphical representation of a second embodiment of an Auger spectrometer according to the present invention, in which a position-varying method is employed.
  • Fig. 3 is a graphical representation of the variation in position according to the second embodiment of the present invention.
  • Fig. 4 is a graphical representation of the signals and frame triggers in the second embodiment of the present invention.
  • Fig. 5 is a graphical representation of the position modulation and frame triggers in the second embodiment of the present invention.
  • the embodiments described herein make possible the extraction of even minute traces of elements at a given position on sample.
  • the present invention has at least two main embodiments (each with several subordinate embodiments), each of which generates what can be called a "differential" spectrum of the interrogated position on the sample.
  • the term "differential” has somewhat different meanings as it is applied to the different embodiments.
  • differential indicates a difference in the constituents of a given interrogated position with respect to each other, such as d(NE)/d(E).
  • This form of differential data is primarily a visualization aide, as it tends to enhance the subtleties in the spectrum.
  • the spectrometer 10 produces an electron beam 12 that is directed toward a sample 14, the collision of which produces Auger electrons 16.
  • a sinusoidal voltage such as indicated is applied to the electrodes 20 of the collection system.
  • the parallel detection system 18 allows the simultaneous detection of the Auger electrons over multiple channels. The application of this
  • P2814PCT Page 4 of 11 sinusoidal voltage means that the flight paths taken by the Auger electrons 16 undergo a certain level of sinusoidal wiggle, as indicated.
  • the signal obtained at each element of the detector 18, therefore, is a combination of a "DC” signal, representing the background, and an "AC” component, which represents the differential value, d(NE)/d(E).
  • a small amplitude sinusoidal modulation signal is applied to the positioning electrodes of the electron beam 12, causing a sinusoidal wiggle in the beam 12, as indicated.
  • the spectrometer 10 is not otherwise modified in this embodiment. Thus, the spectrometer 10 continues to analyze the Auger electrons as it typically would.
  • the resulting differential spectrum does not include any signal that is of equal amplitude for those elements that are present at both of the two positions, and only shows the differences in the elemental compositions at the two points on the sample 14.
  • the elemental contents of the two adjacent positions are identical, there are no elemental variations between the two streams of Auger electrons. In that case, regardless of where the electron beam 12 lands on the sample 14, the same Auger spectrum is generated.
  • Fig. 3 depicts the oscillation of the electron beam 12 back and forth between two points on the sample 14, where one of the positions includes a black spot, representing an elemental inclusion that is not present in the other position.
  • one position in the oscillation has a slight elemental variation from the other position on the sample 14, even though most of the elemental composition between the two positions is the same, then there exists a slight change in the Auger spectrum due to the elemental variation.
  • the resulting Auger spectrum varies in a sinusoidal manner.
  • the differential signal is simply the AC signal, which can be extracted by lock-in detection. However, this changes when dealing with an entire spectrum. Because the spectrum can be considered as a one-dimensional image, the signal can be extracted by using a technique that is similar to that used in lock-in thermography.
  • the voltage applied to the electrodes 20 of the spectrometer 10, or the positioning electrodes of the electron beam 12, is modulated with a periodic signal, such as a sinusoidal function.
  • a periodic signal such as a sinusoidal function.
  • the Auger spectrum that is generated is a sinusoidally varying spectrum.
  • Multiple frames of the image, i.e. the spectrum generated in a parallel manner by the detector array, are acquired while the sample remains stationary.
  • the images are then processed by applying a Fourier filter in a time domain at the frequency of modulation.
  • the amplitude and phase images are given by:
  • - ⁇ 1 is the frequency of "the beam 12 position modulation (or voltage modulation of the electrodes 20) and - ⁇ 2 is the frame rate. In some embodiments, - ⁇ 2 is an even multiple of-' 1 .
  • X; is the pixel position (or channel) in the detector array 18.
  • ⁇ is the total number of frames that are captured, which in one embodiment is an integer multiple of the number of modulation cycles, which can be set to a desired number.
  • A is the amplitude and ⁇ is the phase of the differential spectrum.
  • P2814PCT Page 6 of 11 a pure differential spectrum of either a point itself (a differential display), or a differential spectrum with respect to another adjacent point on the sample 14 (a material variation), depending on the mode of operation.
  • Fig. 4 depicts how the frame triggers can be used to select the signals that are 5 generated by the two different spectrums.
  • Fig. 5 depicts the modulation between the beam spot positions.
  • the technique described here allows one, for the first time, to have a complete differential spectrum of a particular position on the sample 14, particularly with respect to adjacent positions. It enables the isolation and identification of minute traces of a given0 material, in a manner only limited by the amount of electronic noise in the system 10. It allows for the complete cancellation of the background signals, such as "common mode/common element" signals.
  • This methodology can also be applied to other spectroscopic techniques, such as
  • EDX In the case of EDX, one detects the x-ray spectrum generated at the sample, which5 is characteristic of the constituent materials of the interrogated point. In generating a

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Abstract

A spectrometer having an electron beam generator for generating an electron beam that is directed at a sample. An electron beam positioner directs the electron beam onto a position of the sample, and thereby produces a secondary emitted stream from the sample, where the secondary emitted stream includes at least one of electrons and x-rays. An secondary emitted stream positioner positions the secondary emitted stream onto a detector array, which receives the secondary emitted stream and detects both the amounts and the received positions of the secondary emitted stream. A modulator modulates the electron beam that is directed onto the sample, and thereby sweeps the electron beam between a first position and a second position on the sample. An extractor is in signal communication with both the modulator and the detector array.

Description

iN-SiTu DIFFERENTIAL SPECTROSCOPY
FIELD
[0001] This application claims all rights and priority on United States provisional patent application serial number 61/051,368 filed 2008.05.08. This invention relates to the field of integrated circuit fabrication. More particularly, this invention relates to using spectroscopy to inspect substrates. BACKGROUND
[0002] Spectroscopy, such as Auger spectroscopy, is an important tool for material identification on the microscopic level in a variety of fields, including the fabrication process of integrated circuits. As the term is used herein, "integrated circuit" includes devices such as those formed on monolithic semiconducting substrates, such as those formed of group IV materials like silicon or germanium, or group III-V compounds like gallium arsenide, or mixtures of such materials. The term includes all types of devices formed, such as memory and logic, and all designs of such devices, such as MOS and bipolar. The term also comprehends applications such as flat panel displays, solar cells, and charge coupled devices.
[0003] Traditional techniques for performing Auger spectroscopy involve taking sequential readings in an ultra-high vacuum environment. Another technique uses a massively parallel Auger spectroscopy system, which achieves a much faster result in a moderate vacuum environment.
[0004] However, both of these methods suffer from the problem of low contrast and vulnerability to background noise. This requires the acquisition of many averages, and paying special attention to positioning the ebeam on the exact area of interest.
[0005] What is needed, therefore, is a system that overcomes problems such as those described above, at least in part. SUMMARY
[0006] The above and other needs are met by a spectrometer having an electron beam generator for generating an electron beam that is directed at a sample. An electron beam positioner directs the electron beam onto a position of the sample, and thereby produces a secondary emitted electron stream from the sample. An emitted electron stream positioner positions the emitted electron stream onto a detector array, which receives the emitted electron stream and detects both the amounts and the received positions of the emitted electron stream. A modulator modulates the electron beam that is directed onto the sample, and thereby sweeps the electron beam between a first position and a second position on the sample. An extractor is in signal communication with both the modulator and the detector, and extracts a differential signal that represents a difference between the signals that are received from the first position and the signals that are received from the second position.
[0007] By looking at differential signals, rather than absolute signals, the spectrometers according to the present invention are able to distinguish signal levels that are much lower than those of spectrometers that are constructed and operated in a traditional manner. Thus, readings can be taken in less time, for example, and other issues related to the cost of spectroscopy can be reduced or eliminated. In various embodiments, the spectrometer is either an Auger spectrometer or an EDX spectrometer.
[0008] According to another aspect of the invention there is described a spectrometer having an electron beam generator for generating an electron beam that is directed at a sample. An electron beam positioner directs the electron beam onto a position of the sample, and thereby produces a secondary emitted electron stream from the sample. An emitted electron stream positioner positions the emitted electron stream onto a detector array, which receives the emitted electron stream and detects both the amounts and the received positions of the emitted electron stream. A modulator modulates a voltage on the emitted electron stream positioner, and thereby sweeps the emitted electron stream across the detector. An extractor is in signal communication with both the modulator and
P2814PCT Page 2 of 11 the detector, and extracts a differential signal that represents trace constituents of the sample that differ from a background composition of the sample.
[0009] According to another aspect of the invention there is described a method for producing a differential spectrum, by directing an electron beam onto a sample and thereby producing a secondary emitted electron stream from the sample. The emitted electron stream is positioned onto a detector array that detects both the amounts and the received positions of the emitted electron stream. A modulator modulates at least one of (1) the directing of the electron beam onto the sample and (2) the positioning of the emitted electron stream onto the detector. Signal communication is provided between the modulator and the detector, and a differential signal is extracted, which represents a difference between signals generated by the at least one of the modulated electron beam and the modulated emitted electron stream.
[0010] The method can be implemented, for example, in an Auger spectrometer or an EDX spectrometer. In one embodiment, the modulator modulates the electron beam that is directed onto the sample, and thereby sweeps the electron beam between a first position and a second position on the sample, and the differential signal represents a difference between signals received from a first position on the sample and signals received from a second position on the sample. In another embodiment, the modulator modulates the emitted electron stream across the detector, and thereby sweeps the emitted electron stream across the detector, and the differential signal represents trace constituents of the sample that differ from a background composition of the sample.
BRIEF DESCRIPTION OF THE DRAWINGS
[0011] Further advantages of the invention are apparent by reference to the detailed description when considered in conjunction with the figures, which are not to scale so as to more clearly show the details, wherein like reference numbers indicate like elements throughout the several views, and wherein:
P2814PCT Page 3 of 11 [0012] Fig. 1 is a graphical representation of a first embodiment of an Auger spectrometer according to the present invention, in which a voltage-varying method is employed.
[0013] Fig. 2 is a graphical representation of a second embodiment of an Auger spectrometer according to the present invention, in which a position-varying method is employed.
[0014] Fig. 3 is a graphical representation of the variation in position according to the second embodiment of the present invention.
[0015] Fig. 4 is a graphical representation of the signals and frame triggers in the second embodiment of the present invention.
[0016] Fig. 5 is a graphical representation of the position modulation and frame triggers in the second embodiment of the present invention.
DETAILED DESCRIPTION
[0017] The embodiments described herein make possible the extraction of even minute traces of elements at a given position on sample. The present invention has at least two main embodiments (each with several subordinate embodiments), each of which generates what can be called a "differential" spectrum of the interrogated position on the sample. However, the term "differential" has somewhat different meanings as it is applied to the different embodiments.
[0018] In a first embodiment, "differential" indicates a difference in the constituents of a given interrogated position with respect to each other, such as d(NE)/d(E). This form of differential data is primarily a visualization aide, as it tends to enhance the subtleties in the spectrum. In this embodiment, as depicted in Fig. 1, the spectrometer 10 produces an electron beam 12 that is directed toward a sample 14, the collision of which produces Auger electrons 16. A sinusoidal voltage such as indicated is applied to the electrodes 20 of the collection system. The parallel detection system 18 allows the simultaneous detection of the Auger electrons over multiple channels. The application of this
P2814PCT Page 4 of 11 sinusoidal voltage means that the flight paths taken by the Auger electrons 16 undergo a certain level of sinusoidal wiggle, as indicated. The signal obtained at each element of the detector 18, therefore, is a combination of a "DC" signal, representing the background, and an "AC" component, which represents the differential value, d(NE)/d(E).
[0019] In a second embodiment as depicted in Fig. 2, "differential" indicates a difference in the spectrum of a first position on the sample 14 with respect to that of a second position on the sample 14. In this embodiment, a small amplitude sinusoidal modulation signal is applied to the positioning electrodes of the electron beam 12, causing a sinusoidal wiggle in the beam 12, as indicated. The spectrometer 10 is not otherwise modified in this embodiment. Thus, the spectrometer 10 continues to analyze the Auger electrons as it typically would.
[0020] In this second embodiment, the resulting differential spectrum does not include any signal that is of equal amplitude for those elements that are present at both of the two positions, and only shows the differences in the elemental compositions at the two points on the sample 14. In other words, when the elemental contents of the two adjacent positions are identical, there are no elemental variations between the two streams of Auger electrons. In that case, regardless of where the electron beam 12 lands on the sample 14, the same Auger spectrum is generated.
[0021] Fig. 3 depicts the oscillation of the electron beam 12 back and forth between two points on the sample 14, where one of the positions includes a black spot, representing an elemental inclusion that is not present in the other position. When one position in the oscillation has a slight elemental variation from the other position on the sample 14, even though most of the elemental composition between the two positions is the same, then there exists a slight change in the Auger spectrum due to the elemental variation. Thus, the resulting Auger spectrum varies in a sinusoidal manner. By extracting the AC component of the Auger spectrum, even the smallest traces of the material of the dot can be extracted, to a level that is only limited by the electronic noise in the system 10.
P2814PCT Page 5 of 11 SIGNAL EXTRACTION
[0022] For an Auger spectrometer with just a single element detector, the differential signal is simply the AC signal, which can be extracted by lock-in detection. However, this changes when dealing with an entire spectrum. Because the spectrum can be considered as a one-dimensional image, the signal can be extracted by using a technique that is similar to that used in lock-in thermography.
[0023] As mentioned above, the voltage applied to the electrodes 20 of the spectrometer 10, or the positioning electrodes of the electron beam 12, is modulated with a periodic signal, such as a sinusoidal function. Thus, the Auger spectrum that is generated is a sinusoidally varying spectrum. Multiple frames of the image, i.e. the spectrum generated in a parallel manner by the detector array, are acquired while the sample remains stationary. The images are then processed by applying a Fourier filter in a time domain at the frequency of modulation. The amplitude and phase images are given by:
Figure imgf000007_0001
N
C(X) = I N Y uo∞s(2*4 A-)
I , t, 1 = 0 ,1,2,.:.
X. , = mP, , m - = 12,. .Nx
A + C2
S
Φ = tan~' C
[0024] Where -^1 is the frequency of "the beam 12 position modulation (or voltage modulation of the electrodes 20) and -^2 is the frame rate. In some embodiments, -^2 is an even multiple of-' 1 . X; is the pixel position (or channel) in the detector array 18. Ν is the total number of frames that are captured, which in one embodiment is an integer multiple of the number of modulation cycles, which can be set to a desired number. A is the amplitude and Φ is the phase of the differential spectrum. The result thus obtained is
P2814PCT Page 6 of 11 a pure differential spectrum of either a point itself (a differential display), or a differential spectrum with respect to another adjacent point on the sample 14 (a material variation), depending on the mode of operation.
[0025] Fig. 4 depicts how the frame triggers can be used to select the signals that are 5 generated by the two different spectrums. Fig. 5 depicts the modulation between the beam spot positions.
[0026] The technique described here allows one, for the first time, to have a complete differential spectrum of a particular position on the sample 14, particularly with respect to adjacent positions. It enables the isolation and identification of minute traces of a given0 material, in a manner only limited by the amount of electronic noise in the system 10. It allows for the complete cancellation of the background signals, such as "common mode/common element" signals.
[0027] This methodology can also be applied to other spectroscopic techniques, such as
EDX. In the case of EDX, one detects the x-ray spectrum generated at the sample, which5 is characteristic of the constituent materials of the interrogated point. In generating a
- . .differential EDX spectrum, only the e-beam position modulation mode is applicable. The methodologies described herein are, in essence, general techniques to isolate variations between any two positions on a sample.
[0028] The foregoing description of preferred embodiments for this invention has beenϋ" ' presented for purposes of illustration and description. It is not intended to be exhaustive or to limit the invention to the precise form disclosed. Obvious modifications or variations are possible in light of the above teachings. The embodiments are chosen and described in an effort to provide the best illustrations of the principles of the invention and its practical application, and to thereby enable one of ordinary skill in the art to5 utilize the invention in various embodiments and with various modifications as are suited to the particular use contemplated. All such modifications and variations are within the scope of the invention as determined by the appended claims when interpreted in accordance with the breadth to which they are fairly, legally, and equitably entitled.
P2814PCT Page 7 of 11

Claims

WHAT IS CLAIMED IS:
1. In a spectrometer of the type having an electron beam generator for generating an electron beam that is directed at a sample, an electron beam positioner for directing the electron beam onto a position of the sample and thereby producing a secondary emitted stream from the sample, a secondary emitted stream positioner for positioning the secondary emitted stream onto a detector array, and the detector array for receiving the secondary emitted stream and detecting both amounts and received positions of the secondary emitted stream, where the secondary emitted stream includes at least one of electrons and x-rays, the improvement comprising a modulator for modulating the position of electron beam that is directed onto the sample, and thereby sweeping the electron beam between a first position and a second position on the sample, and an extractor in signal communication with both the modulator and the detector array, for extracting a differential signal representing a difference between signals received from the first position and signals received from the second position.
2. The spectrometer of claim 1, wherein the spectrometer is an Auger spectrometer.
3. The spectrometer of claim 1, wherein the spectrometer is an EDX spectrometer.
4. In a spectrometer of the type having an electron beam generator for generating an electron beam that is directed at a sample, an electron beam positioner for directing the electron beam onto a position of the sample and thereby producing a secondary emitted electron stream from the sample, an emitted electron stream positioner for positioning the emitted electron stream onto a detector array, and the detector array for receiving the emitted electron stream and detecting both amounts and received positions of the emitted electron stream, the improvement comprising a modulator for modulating a voltage on the emitted electron stream positioner, and thereby sweeping the emitted electron stream across the detector, and an extractor in signal communication with both the modulator and the detector, for extracting a differential signal representing trace constituents of the sample that differ from a background composition of the sample.
P2814PCT Page 8 of 11
5. The spectrometer of claim 3, wherein the spectrometer is an Auger spectrometer.
6. A method for producing a differential spectrum, the method comprising the steps of: directing an electron beam onto a sample and thereby producing a secondary emitted stream from the sample, where the secondary emitted stream includes at least one of electrons and x-rays, positioning the secondary emitted stream onto a detector array, detecting both amounts and received positions of the secondary emitted stream with the detector array, with a modulator, modulating at least one of the directing of the electron beam onto the sample and the positioning of the secondary emitted stream onto the detector array, providing signal communication between the modulator and the detector array, and extracting a differential signal representing a difference between signals generated by the at least one of the modulated electron beam and the modulated secondary emitted stream.
7. The method of claim 7, wherein the method is implements in an Auger spectrometer.
8. The method of claim 7, wherein the method is implemented in an EDX spectrometer.
9. The method of claim 7, wherein the modulator modulates the electron beam that is directed onto the sample, and thereby sweeps the electron beam between a first position and a second position on the sample, and the differential signal represents a difference between signals received from a first position on the sample and signals received from a second position on the sample.
10. The method of claim 7, wherein the modulator modulates the emitted electron stream across the detector array, and thereby sweeps the emitted electron stream
P2814PCT Page 9 of 11 across the detector array, and the differential signal represents trace constituents of the sample that differ from a background composition of the sample. T Page 10 of 11
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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009015341A1 (en) * 2009-03-27 2010-10-07 Carl Zeiss Ag Method for optical testing of sample during e.g. chemical analysis, involves detecting optical emission of sample depending on characteristic modulation i.e. temporally periodic modulation, of particle beam
US8941049B2 (en) * 2010-07-30 2015-01-27 Kla-Tencor Corporation Readout methodology for multi-channel acquisition of spatially distributed signal
JP6501230B2 (en) * 2016-03-08 2019-04-17 株式会社リガク Multi-element simultaneous fluorescent X-ray analyzer and multi-element simultaneous fluorescent X-ray analysis method
JP6467600B2 (en) * 2016-09-30 2019-02-13 株式会社リガク Wavelength dispersive X-ray fluorescence analyzer
US11508551B2 (en) * 2018-12-14 2022-11-22 Kla Corporation Detection and correction of system responses in real-time

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3965351A (en) 1974-10-30 1976-06-22 The United States Of America As Represented By The United States Energy Research And Development Administration Differential auger spectrometry
JP2001153826A (en) 1999-11-26 2001-06-08 Matsushita Electronics Industry Corp Device and method for x-ray photoelectron spectroscopy
US6690010B1 (en) 1998-09-03 2004-02-10 Kla-Tencor Technologies Chemical analysis of defects using electron appearance spectroscopy
JP2005140567A (en) 2003-11-05 2005-06-02 Jeol Ltd Surface analyzer

Family Cites Families (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1403946A (en) * 1973-05-23 1975-08-28 Mullard Ltd Spectroscopy
DE2151167C3 (en) * 1971-10-14 1974-05-09 Siemens Ag, 1000 Berlin Und 8000 Muenchen Electron beam micro analyzer with Auger electron detection
US3739170A (en) * 1971-12-20 1973-06-12 Physical Electronics Ind Inc Auger electron spectroscopy
US4162492A (en) * 1972-08-25 1979-07-24 Aai Corporation Method and apparatus for image signal generation and image display
JPS49118493A (en) * 1973-03-12 1974-11-12
DE2446789A1 (en) * 1974-09-27 1976-09-02 Siemens Ag BODY RAY OPTICAL DEVICE FOR BODY RADIATION OF A PREPARATION
DE2546053A1 (en) * 1975-01-02 1976-07-08 Commissariat Energie Atomique METHOD AND DEVICE FOR ANALYSIS BY SPECTRAL ANALYSIS OF THE ENERGY OF SECONDARY ELECTRONS
DE2634341A1 (en) * 1976-07-30 1978-02-02 Steigerwald Strahltech METHOD AND EQUIPMENT FOR ALIGNING A CARGO CARRIER JET OF A TECHNICAL CARGO CARRIAGE BLAST DEVICE
JPS5589738A (en) * 1978-12-28 1980-07-07 Jeol Ltd Auger electron photometry unit
JPS55121259A (en) * 1979-03-14 1980-09-18 Hitachi Ltd Elelctron microscope
JPS60249327A (en) * 1984-05-25 1985-12-10 Hitachi Ltd Method of detecting resist pattern
GB8612099D0 (en) * 1986-05-19 1986-06-25 Vg Instr Group Spectrometer
NL8602177A (en) * 1986-08-27 1988-03-16 Philips Nv ELECTRONS DETECTION WITH ENERGY DISCRIMINATION.
EP0304525A1 (en) * 1987-08-28 1989-03-01 FISONS plc Pulsed microfocused ion beams
JPH02145950A (en) * 1988-11-26 1990-06-05 Shimadzu Corp X-ray photoelectron analyzer
JPH03246862A (en) * 1990-02-26 1991-11-05 Hitachi Ltd X-ray analyzer for electron microscope or the like
JPH04264243A (en) * 1991-02-20 1992-09-21 Jeol Ltd Correction of peak energy shift in auger image measurement
US5210414A (en) * 1991-03-29 1993-05-11 The United States Of America As Represented By The Department Of Health And Human Services Differential surface composition analysis by multiple-voltage electron beam X-ray spectroscopy
JPH05109378A (en) * 1991-10-15 1993-04-30 Hitachi Ltd Electron microscopic image observing method and its apparatus
WO1997019343A1 (en) * 1995-11-21 1997-05-29 Advantest Corporation Method of, and apparatus for, analyzing surface impurities of minute area
DE19745771B4 (en) * 1997-10-16 2005-12-22 Unaxis Deutschland Holding Gmbh Method for operating a high-power electron beam
JP3993334B2 (en) * 1998-04-27 2007-10-17 株式会社東芝 Charged beam lithography system
JP3805565B2 (en) * 1999-06-11 2006-08-02 株式会社日立製作所 Inspection or measurement method and apparatus based on electron beam image
JP2001083111A (en) 1999-09-14 2001-03-30 Canon Inc Auger electron spectrometer and method for measuring spectrum
GB0002367D0 (en) 2000-02-03 2000-03-22 Limited Spectrometer
WO2001082327A2 (en) * 2000-04-24 2001-11-01 Fei Company Collection of secondary electrons through the objective lens of a scanning electron microscope
JP3990981B2 (en) * 2000-12-15 2007-10-17 ケイエルエイ−テンコー コーポレイション Method and apparatus for inspecting a substrate
JP2002214169A (en) 2001-01-15 2002-07-31 Jeol Ltd Electron spectroscope
GB2390740A (en) * 2002-04-23 2004-01-14 Thermo Electron Corp Spectroscopic analyser for surface analysis and method therefor
US7087897B2 (en) * 2003-03-11 2006-08-08 Waters Investments Limited Mass spectrometer
CN1977159A (en) * 2004-06-08 2007-06-06 全域探测器公司 Method for manipulating microscopic particles and analyzing the composition thereof
US7411188B2 (en) * 2005-07-11 2008-08-12 Revera Incorporated Method and system for non-destructive distribution profiling of an element in a film
JP2007080327A (en) * 2005-09-13 2007-03-29 Hitachi Ltd Defect inspecting apparatus of recording medium and defect inspecting method
US7417223B2 (en) * 2005-10-28 2008-08-26 Mds Inc. Method, system and computer software product for specific identification of reaction pairs associated by specific neutral differences
US7653496B2 (en) * 2006-02-02 2010-01-26 Agilent Technologies, Inc. Feature selection in mass spectral data
US7456399B1 (en) * 2006-03-30 2008-11-25 Revera Incorporated Calibrating multiple photoelectron spectroscopy systems
US7560691B1 (en) * 2007-01-19 2009-07-14 Kla-Tencor Technologies Corporation High-resolution auger electron spectrometer
US7635842B2 (en) * 2007-02-19 2009-12-22 Kla-Tencor Corporation Method and instrument for chemical defect characterization in high vacuum
US7855362B1 (en) * 2007-10-25 2010-12-21 Kla-Tencor Technologies Corporation Contamination pinning for auger analysis
US7755042B1 (en) * 2008-04-18 2010-07-13 Kla-Tencor Corporation Auger electron spectrometer with applied magnetic field at target surface

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3965351A (en) 1974-10-30 1976-06-22 The United States Of America As Represented By The United States Energy Research And Development Administration Differential auger spectrometry
US6690010B1 (en) 1998-09-03 2004-02-10 Kla-Tencor Technologies Chemical analysis of defects using electron appearance spectroscopy
JP2001153826A (en) 1999-11-26 2001-06-08 Matsushita Electronics Industry Corp Device and method for x-ray photoelectron spectroscopy
JP2005140567A (en) 2003-11-05 2005-06-02 Jeol Ltd Surface analyzer

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP2294371A4

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