WO2009057680A1 - Film forming apparatus and film forming method - Google Patents
Film forming apparatus and film forming method Download PDFInfo
- Publication number
- WO2009057680A1 WO2009057680A1 PCT/JP2008/069728 JP2008069728W WO2009057680A1 WO 2009057680 A1 WO2009057680 A1 WO 2009057680A1 JP 2008069728 W JP2008069728 W JP 2008069728W WO 2009057680 A1 WO2009057680 A1 WO 2009057680A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- rotating
- film forming
- sub
- center
- shaft
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
Abstract
A main rotating section (15) which rotates with a main shaft (13) at the center is provided with a plurality of sub-rotating sections (16), and each sub-rotating section (16) has a plurality of work holders (17). A work (W) held by the work holder (17) rotates on its own rotating shaft (46), while rotating with the main shaft (13) at the center and rotating with a sub-shaft (36) at the center by rotation of the main rotating section (15) and sub-rotating sections (16). Films are formed by making surfaces of the works (W) sequentially face a target (23).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007283475A JP2009108384A (en) | 2007-10-31 | 2007-10-31 | Film-forming apparatus |
JP2007-283475 | 2007-10-31 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009057680A1 true WO2009057680A1 (en) | 2009-05-07 |
Family
ID=40591065
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/069728 WO2009057680A1 (en) | 2007-10-31 | 2008-10-30 | Film forming apparatus and film forming method |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP2009108384A (en) |
WO (1) | WO2009057680A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113316661A (en) * | 2019-02-14 | 2021-08-27 | 东和株式会社 | Workpiece holding portion rotating unit and vacuum processing apparatus |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5036501B2 (en) | 2007-11-19 | 2012-09-26 | 小島プレス工業株式会社 | Substrate support device and sputtering device |
JP6135519B2 (en) * | 2014-01-17 | 2017-05-31 | 株式会社デンソー | Deposition equipment |
JP2022029738A (en) * | 2020-08-05 | 2022-02-18 | 芝浦機械株式会社 | Surface treatment apparatus and surface treatment method |
CN113463056B (en) * | 2021-07-01 | 2022-06-17 | 安徽工业大学 | Vacuum coating does not have sample turning device that shelters from |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0310464U (en) * | 1989-06-20 | 1991-01-31 | ||
JP2006307318A (en) * | 2005-03-31 | 2006-11-09 | Kobe Steel Ltd | Method for producing alpha-alumina layer-formed member and surface treatment |
JP2007039710A (en) * | 2005-08-01 | 2007-02-15 | Optorun Co Ltd | Film-forming apparatus and method for forming thin film |
JP2007100123A (en) * | 2005-09-30 | 2007-04-19 | Kyocera Kinseki Corp | Vacuum vapor deposition apparatus |
-
2007
- 2007-10-31 JP JP2007283475A patent/JP2009108384A/en active Pending
-
2008
- 2008-10-30 WO PCT/JP2008/069728 patent/WO2009057680A1/en active Application Filing
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0310464U (en) * | 1989-06-20 | 1991-01-31 | ||
JP2006307318A (en) * | 2005-03-31 | 2006-11-09 | Kobe Steel Ltd | Method for producing alpha-alumina layer-formed member and surface treatment |
JP2007039710A (en) * | 2005-08-01 | 2007-02-15 | Optorun Co Ltd | Film-forming apparatus and method for forming thin film |
JP2007100123A (en) * | 2005-09-30 | 2007-04-19 | Kyocera Kinseki Corp | Vacuum vapor deposition apparatus |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113316661A (en) * | 2019-02-14 | 2021-08-27 | 东和株式会社 | Workpiece holding portion rotating unit and vacuum processing apparatus |
Also Published As
Publication number | Publication date |
---|---|
JP2009108384A (en) | 2009-05-21 |
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