TW200940731A - Method for forming sputtering film on three-dimensional work and apparatus used in the method - Google Patents

Method for forming sputtering film on three-dimensional work and apparatus used in the method Download PDF

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Publication number
TW200940731A
TW200940731A TW97143911A TW97143911A TW200940731A TW 200940731 A TW200940731 A TW 200940731A TW 97143911 A TW97143911 A TW 97143911A TW 97143911 A TW97143911 A TW 97143911A TW 200940731 A TW200940731 A TW 200940731A
Authority
TW
Taiwan
Prior art keywords
target
carousel
work
dimensional
apparatus used
Prior art date
Application number
TW97143911A
Other languages
Chinese (zh)
Other versions
TWI481734B (en
Inventor
Kuniaki Horie
Naoki Takahashi
Junichiro Yoshioka
Original Assignee
Ebara Udylite Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Udylite Kk filed Critical Ebara Udylite Kk
Publication of TW200940731A publication Critical patent/TW200940731A/en
Application granted granted Critical
Publication of TWI481734B publication Critical patent/TWI481734B/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target

Abstract

Provided is a sputtering technology for uniformly forming a film with sputter particles even on a work having a complicated three-dimensional shape. The film is formed on the three-dimensional work, which is attached to a rotating carousel-type work holder arranged to face the target, by sputtering the target. The three-dimensional work is rotated by means of a shaft arranged within a surface vertical to a surface which connects the target and the rotating shaft of the carousel-type work holder. At least for a partial time during the total sputtering time, the main scattering direction of the spatter particles scattering from the target is permitted to be a direction decentered from the center direction of the rotating shaft of the carousel-type work holder.
TW097143911A 2007-11-13 2008-11-13 A sputtering film forming method for a workpiece having a three-dimensional shape, and a device for use therefor TWI481734B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007294660 2007-11-13

Publications (2)

Publication Number Publication Date
TW200940731A true TW200940731A (en) 2009-10-01
TWI481734B TWI481734B (en) 2015-04-21

Family

ID=40638641

Family Applications (1)

Application Number Title Priority Date Filing Date
TW097143911A TWI481734B (en) 2007-11-13 2008-11-13 A sputtering film forming method for a workpiece having a three-dimensional shape, and a device for use therefor

Country Status (5)

Country Link
JP (1) JP5307723B2 (en)
KR (1) KR101246131B1 (en)
CN (1) CN101855382B (en)
TW (1) TWI481734B (en)
WO (1) WO2009063789A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11274364B2 (en) 2017-06-28 2022-03-15 Solayer Gmbh Sputter devices and methods
US11299803B2 (en) 2018-01-04 2022-04-12 Raytheon Technologies Corporation Metallic coating process for combustor panels using a barrel configuration
KR102399748B1 (en) * 2018-10-01 2022-05-19 주식회사 테토스 A device for depositing a metal film on a surface of a three-dimensional object
WO2022218592A1 (en) * 2021-04-16 2022-10-20 Evatec Ag Sputtering apparatus for coating of 3d-objects

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN86205741U (en) * 1986-08-16 1987-07-15 北京市有色金属研究总院 Coating device for physical vapor deposition
JPH0768614B2 (en) * 1990-03-05 1995-07-26 宇部興産株式会社 Carousel type sputtering device and spattering method thereof
JP2004300465A (en) * 2003-03-28 2004-10-28 Matsushita Electric Ind Co Ltd Sputtering apparatus
JP2005133110A (en) * 2003-10-28 2005-05-26 Konica Minolta Opto Inc Sputtering system
JP2005163151A (en) * 2003-12-04 2005-06-23 Seinan Kogyo Kk Three-dimensional sputter film deposition apparatus and method
CN1308484C (en) * 2004-05-20 2007-04-04 中国科学院上海光学精密机械研究所 Fixture three-dimensional motion control device
JP2007162049A (en) * 2005-12-12 2007-06-28 Asahi Techno Glass Corp Carousel type sputtering system
JP2007170215A (en) * 2005-12-20 2007-07-05 Yamaha Motor Co Ltd Component for internal combustion engines and its manufacturing method

Also Published As

Publication number Publication date
TWI481734B (en) 2015-04-21
JPWO2009063789A1 (en) 2011-03-31
CN101855382B (en) 2013-03-13
JP5307723B2 (en) 2013-10-02
KR20100084658A (en) 2010-07-27
CN101855382A (en) 2010-10-06
KR101246131B1 (en) 2013-03-21
WO2009063789A1 (en) 2009-05-22

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MM4A Annulment or lapse of patent due to non-payment of fees