WO2009034848A1 - タングステン含有メソポーラスシリカ薄膜、それを含む高親水性材料、およびタングステン含有メソポーラスシリカ薄膜の製造方法 - Google Patents

タングステン含有メソポーラスシリカ薄膜、それを含む高親水性材料、およびタングステン含有メソポーラスシリカ薄膜の製造方法 Download PDF

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Publication number
WO2009034848A1
WO2009034848A1 PCT/JP2008/065405 JP2008065405W WO2009034848A1 WO 2009034848 A1 WO2009034848 A1 WO 2009034848A1 JP 2008065405 W JP2008065405 W JP 2008065405W WO 2009034848 A1 WO2009034848 A1 WO 2009034848A1
Authority
WO
WIPO (PCT)
Prior art keywords
thin film
tungsten
mesoporous silica
silica thin
containing mesoporous
Prior art date
Application number
PCT/JP2008/065405
Other languages
English (en)
French (fr)
Inventor
Tadahiro Kaminade
Hiromi Yamashita
Kohsuke Mori
Shinichi Kawasaki
Yu Horiuchi
Yuki Miura
Norikazu Nishiyama
Original Assignee
Nippon Oil Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Oil Corporation filed Critical Nippon Oil Corporation
Priority to JP2009532132A priority Critical patent/JPWO2009034848A1/ja
Priority to US12/678,102 priority patent/US20100267553A1/en
Publication of WO2009034848A1 publication Critical patent/WO2009034848A1/ja

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B37/00—Compounds having molecular sieve properties but not having base-exchange properties
    • C01B37/005—Silicates, i.e. so-called metallosilicalites or metallozeosilites

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicates, Zeolites, And Molecular Sieves (AREA)
  • Catalysts (AREA)

Abstract

　シリカ前駆体および水溶性タングステン化合物を含む溶液から形成されるメソポーラスシリカ薄膜であって、ケイ素含有量に対するタングステン含有量のモル比（Ｗ／Ｓｉ）が０．００１～０．０４であり、膜厚が０．１～５μｍであり、平均細孔径が２０ｎｍ以下である、タングステン含有メソポーラスシリカ薄膜。
PCT/JP2008/065405 2007-09-14 2008-08-28 タングステン含有メソポーラスシリカ薄膜、それを含む高親水性材料、およびタングステン含有メソポーラスシリカ薄膜の製造方法 WO2009034848A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009532132A JPWO2009034848A1 (ja) 2007-09-14 2008-08-28 タングステン含有メソポーラスシリカ薄膜、それを含む高親水性材料、およびタングステン含有メソポーラスシリカ薄膜の製造方法
US12/678,102 US20100267553A1 (en) 2007-09-14 2008-08-28 Tungsten-containing Mesoporous Silica Thin Film, Highly Hydrophilic Material Containing the Same, and Method for Producing Tungsten-Containing Mesoporous Silica Thin Film

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-238750 2007-09-14
JP2007238750 2007-09-14

Publications (1)

Publication Number Publication Date
WO2009034848A1 true WO2009034848A1 (ja) 2009-03-19

Family

ID=40451858

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/065405 WO2009034848A1 (ja) 2007-09-14 2008-08-28 タングステン含有メソポーラスシリカ薄膜、それを含む高親水性材料、およびタングステン含有メソポーラスシリカ薄膜の製造方法

Country Status (4)

Country Link
US (1) US20100267553A1 (ja)
JP (1) JPWO2009034848A1 (ja)
KR (1) KR20100068433A (ja)
WO (1) WO2009034848A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011055553A1 (ja) * 2009-11-06 2011-05-12 国立大学法人信州大学 親水性シリカ膜の製造方法、親水性シリカ膜ならびに親水性シリカ膜付きのアクリル樹脂基板

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114042614B (zh) * 2021-12-09 2023-04-07 大连理工大学 一种大面积制备超亲水薄膜的方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003520745A (ja) * 1998-12-23 2003-07-08 バトル・メモリアル・インスティチュート 界面活性剤を含む溶剤から調製するメソポーラスシリカ薄膜及びその製造方法
JP2003300722A (ja) * 2002-02-08 2003-10-21 Sumitomo Chem Co Ltd 金属含有メソポアシリケート、その製造方法およびその用途

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US5922299A (en) * 1996-11-26 1999-07-13 Battelle Memorial Institute Mesoporous-silica films, fibers, and powders by evaporation
US5858457A (en) * 1997-09-25 1999-01-12 Sandia Corporation Process to form mesostructured films
US6592764B1 (en) * 1997-12-09 2003-07-15 The Regents Of The University Of California Block copolymer processing for mesostructured inorganic oxide materials
US6319872B1 (en) * 1998-08-20 2001-11-20 Conoco Inc Fischer-Tropsch processes using catalysts on mesoporous supports
US6329017B1 (en) * 1998-12-23 2001-12-11 Battelle Memorial Institute Mesoporous silica film from a solution containing a surfactant and methods of making same
EP1332795A1 (en) * 2002-02-01 2003-08-06 Centre National De La Recherche Scientifique (Cnrs) New porous silicate materials and their uses as catalytic systems for diesel improvement
CN1310836C (zh) * 2002-02-08 2007-04-18 住友化学工业株式会社 金属化中孔硅酸盐及用其进行氧化的方法
JP2005538921A (ja) * 2002-09-17 2005-12-22 スリーエム イノベイティブ プロパティズ カンパニー ポーラスな界面活性剤媒介金属酸化物フィルム

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003520745A (ja) * 1998-12-23 2003-07-08 バトル・メモリアル・インスティチュート 界面活性剤を含む溶剤から調製するメソポーラスシリカ薄膜及びその製造方法
JP2003300722A (ja) * 2002-02-08 2003-10-21 Sumitomo Chem Co Ltd 金属含有メソポアシリケート、その製造方法およびその用途

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
B.YULIARTO ET AL.: "Preparation of room temperature NO2 gas sensors based on W-and V-modified mesoporous MCM-41 thin films employing surface photovoltage technique", SENSORS AND ACTUATORS B:CHEMICAL, vol. 114, no. 1, 2006, pages 109 - 119 *
F.FENG ET AL.: "Synthesis of proton conducting tungstosilicate mesoporous materials and polymer composite membranes", MICROPOROUS AND MESOPOROUS MATERIALS, vol. 81, no. 1-3, 2005, pages 217 - 234 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011055553A1 (ja) * 2009-11-06 2011-05-12 国立大学法人信州大学 親水性シリカ膜の製造方法、親水性シリカ膜ならびに親水性シリカ膜付きのアクリル樹脂基板
JP4942057B2 (ja) * 2009-11-06 2012-05-30 国立大学法人信州大学 親水性シリカ膜の製造方法および親水性シリカ膜付きのアクリル樹脂基板

Also Published As

Publication number Publication date
US20100267553A1 (en) 2010-10-21
KR20100068433A (ko) 2010-06-23
JPWO2009034848A1 (ja) 2010-12-24

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