WO2009025048A1 - Optical semiconductor device - Google Patents
Optical semiconductor device Download PDFInfo
- Publication number
- WO2009025048A1 WO2009025048A1 PCT/JP2007/066304 JP2007066304W WO2009025048A1 WO 2009025048 A1 WO2009025048 A1 WO 2009025048A1 JP 2007066304 W JP2007066304 W JP 2007066304W WO 2009025048 A1 WO2009025048 A1 WO 2009025048A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- semiconductor junction
- junction layer
- light receiving
- semiconductor
- receiving sections
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 11
- 230000003287 optical effect Effects 0.000 title abstract 5
- 230000000903 blocking effect Effects 0.000 abstract 1
- 238000009413 insulation Methods 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14618—Containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/1446—Devices controlled by radiation in a repetitive configuration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/06—Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
- H01L2224/0605—Shape
- H01L2224/06051—Bonding areas having different shapes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
- H01L31/103—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier being of the PN homojunction type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
- H01L31/105—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier being of the PIN type
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Light Receiving Elements (AREA)
Abstract
There is provided an array type optical semiconductor light receiving element with improved crosstalk between channels and using pin junction or pn junction. The optical semiconductor element is provided with a plurality of light receiving sections comprising a first semiconductor junction layer for receiving optical signals. Between the light receiving sections, a second semiconductor junction layer is arranged without making contact with the first semiconductor junction layer. While ensuring insulation from a first electrode that is connected to the first semiconductor junction layer without blocking optical inputs to the light receiving sections, each of second electrodes that are connected to the second semiconductor junction layer is electrically connected with each other and arranged. The light receiving sections may be two-dimensionally arranged. The first semiconductor junction layer and the second semiconductor junction layer are pin (or pn) semiconductor junction layers.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2007/066304 WO2009025048A1 (en) | 2007-08-22 | 2007-08-22 | Optical semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2007/066304 WO2009025048A1 (en) | 2007-08-22 | 2007-08-22 | Optical semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2009025048A1 true WO2009025048A1 (en) | 2009-02-26 |
Family
ID=40377959
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2007/066304 WO2009025048A1 (en) | 2007-08-22 | 2007-08-22 | Optical semiconductor device |
Country Status (1)
Country | Link |
---|---|
WO (1) | WO2009025048A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3864707A4 (en) * | 2018-10-19 | 2022-03-30 | Attollo Engineering, LLC | Pin photodetector |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61289677A (en) * | 1985-06-18 | 1986-12-19 | Nippon Kogaku Kk <Nikon> | Semiconductor light detection apparatus |
JPS63224268A (en) * | 1987-03-12 | 1988-09-19 | Mitsubishi Electric Corp | Semiconductor photodetector |
JPS6424472A (en) * | 1987-07-20 | 1989-01-26 | Fujitsu Ltd | Semiconductor photodetector |
JPH05343730A (en) * | 1992-06-10 | 1993-12-24 | Fujitsu Ltd | Semiconductor photodetector |
JPH07250035A (en) * | 1994-03-14 | 1995-09-26 | Toshiba Corp | Optical receiver |
JPH0818091A (en) * | 1994-06-30 | 1996-01-19 | Mitsui Toatsu Chem Inc | Semiconductor photoelectric transducer with plurality of photodiodes |
JPH09289333A (en) * | 1996-04-23 | 1997-11-04 | Mitsubishi Electric Corp | Semiconductor photosensitive element |
JP2004303878A (en) * | 2003-03-31 | 2004-10-28 | Nippon Sheet Glass Co Ltd | Photodetector array |
JP2005251890A (en) * | 2004-03-03 | 2005-09-15 | Sumitomo Electric Ind Ltd | Upper surface incident light receiving element array |
-
2007
- 2007-08-22 WO PCT/JP2007/066304 patent/WO2009025048A1/en active Application Filing
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61289677A (en) * | 1985-06-18 | 1986-12-19 | Nippon Kogaku Kk <Nikon> | Semiconductor light detection apparatus |
JPS63224268A (en) * | 1987-03-12 | 1988-09-19 | Mitsubishi Electric Corp | Semiconductor photodetector |
JPS6424472A (en) * | 1987-07-20 | 1989-01-26 | Fujitsu Ltd | Semiconductor photodetector |
JPH05343730A (en) * | 1992-06-10 | 1993-12-24 | Fujitsu Ltd | Semiconductor photodetector |
JPH07250035A (en) * | 1994-03-14 | 1995-09-26 | Toshiba Corp | Optical receiver |
JPH0818091A (en) * | 1994-06-30 | 1996-01-19 | Mitsui Toatsu Chem Inc | Semiconductor photoelectric transducer with plurality of photodiodes |
JPH09289333A (en) * | 1996-04-23 | 1997-11-04 | Mitsubishi Electric Corp | Semiconductor photosensitive element |
JP2004303878A (en) * | 2003-03-31 | 2004-10-28 | Nippon Sheet Glass Co Ltd | Photodetector array |
JP2005251890A (en) * | 2004-03-03 | 2005-09-15 | Sumitomo Electric Ind Ltd | Upper surface incident light receiving element array |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3864707A4 (en) * | 2018-10-19 | 2022-03-30 | Attollo Engineering, LLC | Pin photodetector |
US11676976B2 (en) | 2018-10-19 | 2023-06-13 | Attollo Engineering, LLC | PIN photodetector |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US10319775B2 (en) | Semiconductor device, solid-state imaging device with tantalum oxide layer formed by diffusing a material of an electrode of necessity or a counter electrode | |
TW201613078A (en) | Photodiode array | |
WO2009051376A3 (en) | Light emitting device and method for fabricating the same | |
WO2009028287A1 (en) | Photoelectric conversion element, photoelectric conversion element connecting body and photoelectric conversion module | |
JP6789653B2 (en) | Photoelectric converter and camera | |
WO2010002009A3 (en) | Element array, electromechanical conversion device, and process for producing the same | |
EP2731137A3 (en) | Light emitting device | |
WO2014071417A3 (en) | Systems and methods for monolithically isled solar photovoltaic cells and modules | |
WO2011126248A3 (en) | Light emitting diode and method of fabricating the same | |
WO2005001941A3 (en) | Ultra thin back-illuminated photodiode array structures and fabrication methods | |
WO2010044645A3 (en) | Semiconductor light emitting device and method for manufacturing the same | |
WO2010114250A3 (en) | Light emitting device having plurality of light emitting cells and method of fabricating the same | |
EP4300597A3 (en) | Solar cell module | |
EP2924464A3 (en) | Back-illuminated distance measuring sensor and distance measuring device | |
WO2009002040A3 (en) | Semiconductor light emitting device and method of fabricating the same | |
TW200836336A (en) | Solid-state imaging device, method of making the same, and imaging apparatus | |
WO2010094533A3 (en) | Thermoelectric device | |
JP2014022561A5 (en) | ||
TW200629537A (en) | Image sensor having improved sensitivity and method for making same | |
JP2012253318A5 (en) | ||
KR20170065935A (en) | Image sensor including vertical transfer gate | |
WO2009145501A3 (en) | Light emitting device and a fabrication method thereof | |
WO2009008674A3 (en) | Solar cell and method of manufacturing the same | |
WO2009005805A3 (en) | Distributed coax photovoltaic device | |
TW200737534A (en) | Photovoltaic power device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 07792890 Country of ref document: EP Kind code of ref document: A1 |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 07792890 Country of ref document: EP Kind code of ref document: A1 |
|
NENP | Non-entry into the national phase |
Ref country code: JP |