WO2009020208A1 - 動径多極子型配置レンズ及びそれを用いた荷電粒子光学系装置 - Google Patents

動径多極子型配置レンズ及びそれを用いた荷電粒子光学系装置 Download PDF

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Publication number
WO2009020208A1
WO2009020208A1 PCT/JP2008/064319 JP2008064319W WO2009020208A1 WO 2009020208 A1 WO2009020208 A1 WO 2009020208A1 JP 2008064319 W JP2008064319 W JP 2008064319W WO 2009020208 A1 WO2009020208 A1 WO 2009020208A1
Authority
WO
WIPO (PCT)
Prior art keywords
lens
radial
type layout
radial multipolar
optical system
Prior art date
Application number
PCT/JP2008/064319
Other languages
English (en)
French (fr)
Inventor
Kenjiro Kimura
Kei Kobayashi
Hirofumi Yamada
Kazumi Matsushige
Original Assignee
Kyoto University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyoto University filed Critical Kyoto University
Priority to JP2009526503A priority Critical patent/JPWO2009020208A1/ja
Publication of WO2009020208A1 publication Critical patent/WO2009020208A1/ja

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/12—Lenses electrostatic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching for microworking, e.g. etching of gratings, trimming of electrical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/10—Lenses
    • H01J2237/12—Lenses electrostatic
    • H01J2237/121—Lenses electrostatic characterised by shape
    • H01J2237/1215—Annular electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electron Beam Exposure (AREA)

Abstract

　凹レンズ及び凸レンズ機能を有する動径多極子型配置レンズ及びそれを用いた荷電粒子光学系装置を提供する。 動径多極子型配置レンズであって、回転対称構造の周辺に複数のリング状に配置され、中心に指向性のあるポテンシャルを形成する動径多極子を備え、この動径多極子（１１）,（１２）,（１３）,（１４）,…,（ｎ）に印加される電圧を中心部から順にプラスの極性、マイナスの極性となるように配置し、最外周の動径多極子（ｎ）にマイナスの極性の電圧を印加することにより、負の荷電粒子にとっての凹レンズ、正の荷電粒子にとっての凸レンズを構成する。このとき、加える電圧の極性を反転させると上記凹レンズは凸レンズに、上記凸レンズは凹レンズに入れ替わる。
PCT/JP2008/064319 2007-08-09 2008-08-08 動径多極子型配置レンズ及びそれを用いた荷電粒子光学系装置 WO2009020208A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009526503A JPWO2009020208A1 (ja) 2007-08-09 2008-08-08 動径多極子型配置レンズ及びそれを用いた荷電粒子光学系装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007208209 2007-08-09
JP2007-208209 2007-08-09

Publications (1)

Publication Number Publication Date
WO2009020208A1 true WO2009020208A1 (ja) 2009-02-12

Family

ID=40341435

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/064319 WO2009020208A1 (ja) 2007-08-09 2008-08-08 動径多極子型配置レンズ及びそれを用いた荷電粒子光学系装置

Country Status (2)

Country Link
JP (1) JPWO2009020208A1 (ja)
WO (1) WO2009020208A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014191370A1 (fr) * 2013-05-31 2014-12-04 Commissariat A L'energie Atomique Et Aux Energies Alternatives Lentille electrostatique a membrane semiconductrice dielectrique

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50103280A (ja) * 1974-01-11 1975-08-15
JPS63226927A (ja) * 1987-03-16 1988-09-21 Fujitsu Ltd 光電子転写用マスクとその製造方法
JPH01162334A (ja) * 1987-12-18 1989-06-26 Fujitsu Ltd 電子転写マスク
JPH02224322A (ja) * 1989-02-27 1990-09-06 Rikagaku Kenkyusho 電子像投射形成装置
JPH04152296A (ja) * 1990-10-17 1992-05-26 Ebara Res Co Ltd 光電子放出材
JP2001052998A (ja) * 1999-06-03 2001-02-23 Advantest Corp 荷電粒子ビーム結像方法、荷電粒子ビーム結像装置及び荷電粒子ビーム露光装置
WO2006084298A1 (en) * 2005-02-11 2006-08-17 Ims Nanofabrication Ag Charged-particle exposure apparatus with electrostatic zone plate
WO2006123447A1 (ja) * 2005-05-17 2006-11-23 Kyoto University 電子ビーム露光装置
WO2007129376A1 (ja) * 2006-04-26 2007-11-15 Topcon Corporation 電子レンズ

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50103280A (ja) * 1974-01-11 1975-08-15
JPS63226927A (ja) * 1987-03-16 1988-09-21 Fujitsu Ltd 光電子転写用マスクとその製造方法
JPH01162334A (ja) * 1987-12-18 1989-06-26 Fujitsu Ltd 電子転写マスク
JPH02224322A (ja) * 1989-02-27 1990-09-06 Rikagaku Kenkyusho 電子像投射形成装置
JPH04152296A (ja) * 1990-10-17 1992-05-26 Ebara Res Co Ltd 光電子放出材
JP2001052998A (ja) * 1999-06-03 2001-02-23 Advantest Corp 荷電粒子ビーム結像方法、荷電粒子ビーム結像装置及び荷電粒子ビーム露光装置
WO2006084298A1 (en) * 2005-02-11 2006-08-17 Ims Nanofabrication Ag Charged-particle exposure apparatus with electrostatic zone plate
WO2006123447A1 (ja) * 2005-05-17 2006-11-23 Kyoto University 電子ビーム露光装置
WO2007129376A1 (ja) * 2006-04-26 2007-11-15 Topcon Corporation 電子レンズ

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
W.Z.LIU ET AL.: "Focusing of multiply charged energetic ions using solenoidal B and radial E lenses", REVIEW OF SCIENTIFIC INSTRUMENTS, vol. 58, no. 2, February 1987 (1987-02-01), pages 220 - 222, XP055352142 *

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014191370A1 (fr) * 2013-05-31 2014-12-04 Commissariat A L'energie Atomique Et Aux Energies Alternatives Lentille electrostatique a membrane semiconductrice dielectrique
FR3006499A1 (fr) * 2013-05-31 2014-12-05 Commissariat Energie Atomique Lentille electrostatique a membrane isolante ou semiconductrice
US9934934B2 (en) 2013-05-31 2018-04-03 Commissariat A L'energie Atomique Et Aux Energies Alternatives Electrostatic lens having a dielectric semiconducting membrane

Also Published As

Publication number Publication date
JPWO2009020208A1 (ja) 2010-11-04

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