WO2009004948A1 - Matériau de plaque d'impression lithographique photosensible - Google Patents

Matériau de plaque d'impression lithographique photosensible Download PDF

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Publication number
WO2009004948A1
WO2009004948A1 PCT/JP2008/061449 JP2008061449W WO2009004948A1 WO 2009004948 A1 WO2009004948 A1 WO 2009004948A1 JP 2008061449 W JP2008061449 W JP 2008061449W WO 2009004948 A1 WO2009004948 A1 WO 2009004948A1
Authority
WO
WIPO (PCT)
Prior art keywords
compound
printing plate
plate material
lithographic printing
double bond
Prior art date
Application number
PCT/JP2008/061449
Other languages
English (en)
Japanese (ja)
Inventor
Kunio Tani
Original Assignee
Konica Minolta Medical & Graphic, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Medical & Graphic, Inc. filed Critical Konica Minolta Medical & Graphic, Inc.
Publication of WO2009004948A1 publication Critical patent/WO2009004948A1/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Materials For Photolithography (AREA)

Abstract

L'invention concerne un matériau de plaque d'impression lithographique photosensible qui comprend : un support ; une couche photosensible formée sur celui-ci comprenant un initiateur de polymérisation, un composé polymérisable comportant une double liaison éthylénique, un colorant sensibilisateur et un liant polymère ; et une couche protectrice comprenant un alcool polyvinylique comme constituant principal et formée sur la couche photosensible. Il est caractérisé en ce que le couche photosensible renferme un produit d'une réaction entre les composés suivants (C1) à (C3) comme composé polymérisable comportant une double liaison éthylénique et en ce que la couche protectrice a une teneur d'acétate de métal de 1,0 % en poids ou moins. Le matériau de plaque d'impression lithographique photosensible est approprié en vue d'une exposition à un lumière laser ayant une longueur d'onde de 350 à 450 nm et possède une excellente aptitude au stockage. ((C1) : composé comportant au moins une double liaison éthylénique et un groupe hydroxy par molécule ; (C2) : composé de diisocyanate ; et (C3) : composé de diol ayant une structure d'amine tertiaire dans la molécule ou composé ayant une structure d'amine secondaire et un groupe hydroxy par molécule.)
PCT/JP2008/061449 2007-07-04 2008-06-24 Matériau de plaque d'impression lithographique photosensible WO2009004948A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-176081 2007-07-04
JP2007176081 2007-07-04

Publications (1)

Publication Number Publication Date
WO2009004948A1 true WO2009004948A1 (fr) 2009-01-08

Family

ID=40225995

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/061449 WO2009004948A1 (fr) 2007-07-04 2008-06-24 Matériau de plaque d'impression lithographique photosensible

Country Status (1)

Country Link
WO (1) WO2009004948A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2778782A1 (fr) * 2013-03-13 2014-09-17 Kodak Graphic Communications GmbH Éléments sensibles au rayonnement de travail négatif

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07219233A (ja) * 1993-12-08 1995-08-18 Fuji Photo Film Co Ltd 感光材料
JPH08305031A (ja) * 1995-04-28 1996-11-22 Shin Etsu Chem Co Ltd 化学増幅型レジスト用保護膜材料
JPH0925379A (ja) * 1995-07-07 1997-01-28 Nippon Synthetic Chem Ind Co Ltd:The 感光性樹脂組成物
JP2004038088A (ja) * 2002-07-08 2004-02-05 Konica Minolta Holdings Inc 感光性平版印刷版材料及び感光性平版印刷版材料の製造方法
JP2005250216A (ja) * 2004-03-05 2005-09-15 Fuji Photo Film Co Ltd ネガ型平版印刷版原版およびこれを用いた平版印刷版の製版方法
JP2006072183A (ja) * 2004-09-06 2006-03-16 Konica Minolta Medical & Graphic Inc 平版印刷版材料
WO2006090623A1 (fr) * 2005-02-25 2006-08-31 Konica Minolta Medical & Graphic, Inc. Materiau de plaque d'impression lithographique photosensible

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07219233A (ja) * 1993-12-08 1995-08-18 Fuji Photo Film Co Ltd 感光材料
JPH08305031A (ja) * 1995-04-28 1996-11-22 Shin Etsu Chem Co Ltd 化学増幅型レジスト用保護膜材料
JPH0925379A (ja) * 1995-07-07 1997-01-28 Nippon Synthetic Chem Ind Co Ltd:The 感光性樹脂組成物
JP2004038088A (ja) * 2002-07-08 2004-02-05 Konica Minolta Holdings Inc 感光性平版印刷版材料及び感光性平版印刷版材料の製造方法
JP2005250216A (ja) * 2004-03-05 2005-09-15 Fuji Photo Film Co Ltd ネガ型平版印刷版原版およびこれを用いた平版印刷版の製版方法
JP2006072183A (ja) * 2004-09-06 2006-03-16 Konica Minolta Medical & Graphic Inc 平版印刷版材料
WO2006090623A1 (fr) * 2005-02-25 2006-08-31 Konica Minolta Medical & Graphic, Inc. Materiau de plaque d'impression lithographique photosensible

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2778782A1 (fr) * 2013-03-13 2014-09-17 Kodak Graphic Communications GmbH Éléments sensibles au rayonnement de travail négatif

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