WO2008133105A1 - Plaque de gravure présentant une propriété tampon et procédé de production de ladite plaque - Google Patents
Plaque de gravure présentant une propriété tampon et procédé de production de ladite plaque Download PDFInfo
- Publication number
- WO2008133105A1 WO2008133105A1 PCT/JP2008/057330 JP2008057330W WO2008133105A1 WO 2008133105 A1 WO2008133105 A1 WO 2008133105A1 JP 2008057330 W JP2008057330 W JP 2008057330W WO 2008133105 A1 WO2008133105 A1 WO 2008133105A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- gravure
- plate
- printing
- cushion
- cushion property
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Optical Filters (AREA)
- Printing Plates And Materials Therefor (AREA)
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009511806A JP5131707B2 (ja) | 2007-04-18 | 2008-04-15 | クッション性を有するグラビア版及びその製造方法 |
KR1020097012973A KR101367784B1 (ko) | 2007-04-18 | 2008-04-15 | 쿠션성을 가지는 그라비아판 및 그 제조방법 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-109692 | 2007-04-18 | ||
JP2007109692 | 2007-04-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008133105A1 true WO2008133105A1 (fr) | 2008-11-06 |
Family
ID=39925563
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/057330 WO2008133105A1 (fr) | 2007-04-18 | 2008-04-15 | Plaque de gravure présentant une propriété tampon et procédé de production de ladite plaque |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5131707B2 (fr) |
KR (1) | KR101367784B1 (fr) |
WO (1) | WO2008133105A1 (fr) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009069409A (ja) * | 2007-09-12 | 2009-04-02 | Az Electronic Materials Kk | ケイ素含有微細パターン形成用組成物およびそれを用いた微細パターン形成方法 |
JP2012137778A (ja) * | 2012-03-19 | 2012-07-19 | Az Electronic Materials Ip Ltd | ケイ素含有微細パターン形成用組成物 |
CN102998900A (zh) * | 2012-12-01 | 2013-03-27 | 刘华礼 | 一种超薄感光层感光版的制法 |
CN113832465A (zh) * | 2021-09-01 | 2021-12-24 | 安徽亚泰包装科技股份有限公司 | 一种提升二次腐蚀压纹版压纹效果的腐蚀处理工艺 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102725147B (zh) * | 2010-02-23 | 2015-01-14 | 惠普发展公司,有限责任合伙企业 | 能移除的顶部敷层 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000199949A (ja) * | 1998-12-30 | 2000-07-18 | Think Laboratory Co Ltd | クッション性を有するグラビア版の製造方法 |
WO2007013333A1 (fr) * | 2005-07-25 | 2007-02-01 | Think Laboratory Co., Ltd. | Rouleau de clichage de gravure et son procédé de production |
WO2007135900A1 (fr) * | 2006-05-23 | 2007-11-29 | Think Laboratory Co., Ltd. | Rouleau à graver pour gravure et procédé de fabrication de celui-ci |
-
2008
- 2008-04-15 WO PCT/JP2008/057330 patent/WO2008133105A1/fr active Application Filing
- 2008-04-15 JP JP2009511806A patent/JP5131707B2/ja active Active
- 2008-04-15 KR KR1020097012973A patent/KR101367784B1/ko active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000199949A (ja) * | 1998-12-30 | 2000-07-18 | Think Laboratory Co Ltd | クッション性を有するグラビア版の製造方法 |
WO2007013333A1 (fr) * | 2005-07-25 | 2007-02-01 | Think Laboratory Co., Ltd. | Rouleau de clichage de gravure et son procédé de production |
WO2007135900A1 (fr) * | 2006-05-23 | 2007-11-29 | Think Laboratory Co., Ltd. | Rouleau à graver pour gravure et procédé de fabrication de celui-ci |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009069409A (ja) * | 2007-09-12 | 2009-04-02 | Az Electronic Materials Kk | ケイ素含有微細パターン形成用組成物およびそれを用いた微細パターン形成方法 |
JP2012137778A (ja) * | 2012-03-19 | 2012-07-19 | Az Electronic Materials Ip Ltd | ケイ素含有微細パターン形成用組成物 |
CN102998900A (zh) * | 2012-12-01 | 2013-03-27 | 刘华礼 | 一种超薄感光层感光版的制法 |
CN113832465A (zh) * | 2021-09-01 | 2021-12-24 | 安徽亚泰包装科技股份有限公司 | 一种提升二次腐蚀压纹版压纹效果的腐蚀处理工艺 |
CN113832465B (zh) * | 2021-09-01 | 2023-11-10 | 安徽亚泰包装科技股份有限公司 | 一种提升二次腐蚀压纹版压纹效果的腐蚀处理工艺 |
Also Published As
Publication number | Publication date |
---|---|
KR20090129983A (ko) | 2009-12-17 |
JPWO2008133105A1 (ja) | 2010-07-22 |
JP5131707B2 (ja) | 2013-01-30 |
KR101367784B1 (ko) | 2014-02-26 |
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