WO2008133105A1 - Gravure plate with cushion property and process for producing the same - Google Patents

Gravure plate with cushion property and process for producing the same Download PDF

Info

Publication number
WO2008133105A1
WO2008133105A1 PCT/JP2008/057330 JP2008057330W WO2008133105A1 WO 2008133105 A1 WO2008133105 A1 WO 2008133105A1 JP 2008057330 W JP2008057330 W JP 2008057330W WO 2008133105 A1 WO2008133105 A1 WO 2008133105A1
Authority
WO
WIPO (PCT)
Prior art keywords
gravure
plate
printing
cushion
cushion property
Prior art date
Application number
PCT/JP2008/057330
Other languages
French (fr)
Japanese (ja)
Inventor
Tsutomu Sato
Tatsuo Shigeta
Original Assignee
Think Laboratory Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Think Laboratory Co., Ltd. filed Critical Think Laboratory Co., Ltd.
Priority to KR1020097012973A priority Critical patent/KR101367784B1/en
Priority to JP2009511806A priority patent/JP5131707B2/en
Publication of WO2008133105A1 publication Critical patent/WO2008133105A1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Optical Filters (AREA)

Abstract

A process for producing a printing plate, especially a gravure plate with cushion property. This gravure plate due to its cushion property allows direct gravure printing not using any blanket roll on a hard matter to be printed and ensures favorable gravure printing on a rough surface like corrugated board printing. The gravure plate is suitable for color printing of a matrix image for constituting a color filter on a glass for liquid crystal panel, or color printing of an image on a compact disk, etc. The gravure plate comprises a cushion layer consisting of a rubber or resin with cushion property; a photosensitive plate material layer having photopolymerizability and, at least after photopolymerization reaction, having cushion property and plate life, provided on the surface of the cushion layer; gravure cells provided on the surface of the photosensitive plate material layer; and a silicon dioxide coating provided on the surface of the photosensitive plate material layer provided with the gravure cells, wherein the silicon dioxide coating is formed from a perhydropolysilazane solution.
PCT/JP2008/057330 2007-04-18 2008-04-15 Gravure plate with cushion property and process for producing the same WO2008133105A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020097012973A KR101367784B1 (en) 2007-04-18 2008-04-15 Gravure plate with cushion property and process for producing the same
JP2009511806A JP5131707B2 (en) 2007-04-18 2008-04-15 Gravure plate having cushioning properties and manufacturing method thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007109692 2007-04-18
JP2007-109692 2007-04-18

Publications (1)

Publication Number Publication Date
WO2008133105A1 true WO2008133105A1 (en) 2008-11-06

Family

ID=39925563

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/057330 WO2008133105A1 (en) 2007-04-18 2008-04-15 Gravure plate with cushion property and process for producing the same

Country Status (3)

Country Link
JP (1) JP5131707B2 (en)
KR (1) KR101367784B1 (en)
WO (1) WO2008133105A1 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009069409A (en) * 2007-09-12 2009-04-02 Az Electronic Materials Kk Silicon-containing composition for forming fine pattern, and method for forming fine pattern by using same
JP2012137778A (en) * 2012-03-19 2012-07-19 Az Electronic Materials Ip Ltd Silicon-containing composition for fine pattern formation
CN102998900A (en) * 2012-12-01 2013-03-27 刘华礼 Manufacturing method of photosensitive plate with ultrathin photosensitive layer
CN113832465A (en) * 2021-09-01 2021-12-24 安徽亚泰包装科技股份有限公司 Corrosion treatment process for improving embossing effect of secondary corrosion embossing plate

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BR112012017965A2 (en) * 2010-02-23 2016-03-29 Hewlett Packard Development Co Removable upper blanket and method of making a removable upper blanket

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000199949A (en) * 1998-12-30 2000-07-18 Think Laboratory Co Ltd Production of gravure plate having cushion properties
WO2007013333A1 (en) * 2005-07-25 2007-02-01 Think Laboratory Co., Ltd. Gravure plate making roll and process for producing the same
WO2007135900A1 (en) * 2006-05-23 2007-11-29 Think Laboratory Co., Ltd. Gravure engraving roll and method for manufacturing the same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000199949A (en) * 1998-12-30 2000-07-18 Think Laboratory Co Ltd Production of gravure plate having cushion properties
WO2007013333A1 (en) * 2005-07-25 2007-02-01 Think Laboratory Co., Ltd. Gravure plate making roll and process for producing the same
WO2007135900A1 (en) * 2006-05-23 2007-11-29 Think Laboratory Co., Ltd. Gravure engraving roll and method for manufacturing the same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009069409A (en) * 2007-09-12 2009-04-02 Az Electronic Materials Kk Silicon-containing composition for forming fine pattern, and method for forming fine pattern by using same
JP2012137778A (en) * 2012-03-19 2012-07-19 Az Electronic Materials Ip Ltd Silicon-containing composition for fine pattern formation
CN102998900A (en) * 2012-12-01 2013-03-27 刘华礼 Manufacturing method of photosensitive plate with ultrathin photosensitive layer
CN113832465A (en) * 2021-09-01 2021-12-24 安徽亚泰包装科技股份有限公司 Corrosion treatment process for improving embossing effect of secondary corrosion embossing plate
CN113832465B (en) * 2021-09-01 2023-11-10 安徽亚泰包装科技股份有限公司 Corrosion treatment process for improving embossing effect of secondary corrosion embossing plate

Also Published As

Publication number Publication date
KR20090129983A (en) 2009-12-17
JP5131707B2 (en) 2013-01-30
KR101367784B1 (en) 2014-02-26
JPWO2008133105A1 (en) 2010-07-22

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