WO2008123346A1 - 高電圧プラズマ発生装置 - Google Patents

高電圧プラズマ発生装置 Download PDF

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Publication number
WO2008123346A1
WO2008123346A1 PCT/JP2008/055836 JP2008055836W WO2008123346A1 WO 2008123346 A1 WO2008123346 A1 WO 2008123346A1 JP 2008055836 W JP2008055836 W JP 2008055836W WO 2008123346 A1 WO2008123346 A1 WO 2008123346A1
Authority
WO
WIPO (PCT)
Prior art keywords
signal
linear electrode
internal space
electrode
producing apparatus
Prior art date
Application number
PCT/JP2008/055836
Other languages
English (en)
French (fr)
Inventor
Noriaki Kimura
Original Assignee
Mitsui Engineering & Shipbuilding Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Engineering & Shipbuilding Co., Ltd. filed Critical Mitsui Engineering & Shipbuilding Co., Ltd.
Priority to US12/531,609 priority Critical patent/US8551414B2/en
Priority to KR1020097016532A priority patent/KR100931622B1/ko
Priority to EP08738986.2A priority patent/EP2139302B1/en
Priority to CN2008800042064A priority patent/CN101606443B/zh
Priority to JP2008551371A priority patent/JP4288308B2/ja
Priority to DK08738986.2T priority patent/DK2139302T3/da
Publication of WO2008123346A1 publication Critical patent/WO2008123346A1/ja

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
    • F01N3/00—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust
    • F01N3/08—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous
    • F01N3/0892—Electric or magnetic treatment, e.g. dissociation of noxious components
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
    • F01N3/00—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust
    • F01N3/08—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous
    • F01N3/10—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous by thermal or catalytic conversion of noxious components of exhaust
    • F01N3/18—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous by thermal or catalytic conversion of noxious components of exhaust characterised by methods of operation; Control
    • F01N3/20—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous by thermal or catalytic conversion of noxious components of exhaust characterised by methods of operation; Control specially adapted for catalytic conversion ; Methods of operation or control of catalytic converters
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL COMBUSTION ENGINES
    • F01N2240/00—Combination or association of two or more different exhaust treating devices, or of at least one such device with an auxiliary device, not covered by indexing codes F01N2230/00 or F01N2250/00, one of the devices being
    • F01N2240/28—Combination or association of two or more different exhaust treating devices, or of at least one such device with an auxiliary device, not covered by indexing codes F01N2230/00 or F01N2250/00, one of the devices being a plasma reactor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2242/00—Auxiliary systems
    • H05H2242/20—Power circuits
    • H05H2242/26—Matching networks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/10—Treatment of gases
    • H05H2245/17—Exhaust gases

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Combustion & Propulsion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Plasma Technology (AREA)
  • Treating Waste Gases (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

　ＮＯ酸化処理装置等に用いることのできる高電圧プラズマを発生させるプラズマ発生装置１０は、交流信号の電流の供給を受け共振を生じさせることにより高電圧を発生させる線状電極２２と、線状電極２２と離間し、線状電極２２から放射される電磁波の漏洩を抑えるように、線状電極２２の周りを覆う内部空間２４ｂを形成するアース電極２４と、線状電極２２の給電を制御する制御装置４０と、を有する。制御装置４０は、内部空間２４ｂの電界を計測する電界プローブ３０と、この計測信号を所定の周波数帯域にフィルタリングして交流信号とするバンドパスフィルタ４４と、この交流信号を線状電極２２に電流として給電するとき、内部空間２４ｂ内の共振信号に同期するように、交流信号を位相シフトする可変位相器５２と、位相シフトした交流信号を増幅する増幅器５４とを備える。
PCT/JP2008/055836 2007-03-28 2008-03-27 高電圧プラズマ発生装置 WO2008123346A1 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
US12/531,609 US8551414B2 (en) 2007-03-28 2008-03-27 High-voltage plasma producing apparatus
KR1020097016532A KR100931622B1 (ko) 2007-03-28 2008-03-27 고전압 플라즈마 발생 장치
EP08738986.2A EP2139302B1 (en) 2007-03-28 2008-03-27 High-voltage plasma producing apparatus
CN2008800042064A CN101606443B (zh) 2007-03-28 2008-03-27 高电压等离子体发生装置
JP2008551371A JP4288308B2 (ja) 2007-03-28 2008-03-27 高電圧プラズマ発生装置
DK08738986.2T DK2139302T3 (da) 2007-03-28 2008-03-27 Højspændings-Plasmagenereringsapparat

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-083657 2007-03-28
JP2007083657 2007-03-28

Publications (1)

Publication Number Publication Date
WO2008123346A1 true WO2008123346A1 (ja) 2008-10-16

Family

ID=39830834

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/055836 WO2008123346A1 (ja) 2007-03-28 2008-03-27 高電圧プラズマ発生装置

Country Status (7)

Country Link
US (1) US8551414B2 (ja)
EP (1) EP2139302B1 (ja)
JP (1) JP4288308B2 (ja)
KR (1) KR100931622B1 (ja)
CN (1) CN101606443B (ja)
DK (1) DK2139302T3 (ja)
WO (1) WO2008123346A1 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100931622B1 (ko) * 2007-03-28 2009-12-14 미쯔이 죠센 가부시키가이샤 고전압 플라즈마 발생 장치
JP2011064173A (ja) * 2009-09-18 2011-03-31 Mitsui Eng & Shipbuild Co Ltd 高電圧プラズマ発生装置
JP2012167614A (ja) * 2011-02-15 2012-09-06 Mitsui Eng & Shipbuild Co Ltd プラズマ発生装置
JP2020517045A (ja) * 2017-03-14 2020-06-11 テーデーカー エレクトロニクス アーゲー 非熱的大気圧プラズマを生成するための装置及び圧電変換器の周波数調整のための方法

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2455798C1 (ru) * 2010-12-08 2012-07-10 Валерий Анатольевич Гостев Жидкостной микроплазмотрон
WO2016189652A1 (ja) * 2015-05-26 2016-12-01 富士通株式会社 排気浄化装置及び車両
DE102018105895A1 (de) 2018-03-14 2019-09-19 Tdk Electronics Ag Vorrichtung zur Erzeugung eines nicht-thermischen Atmosphärendruck-Plasmas und Verfahren zum Betrieb eines piezoelektrischen Transformators

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002324698A (ja) * 2001-04-06 2002-11-08 Eni Technologies Inc パルス化インテリジェントｒｆ変調コントローラ
JP2004154562A (ja) * 2002-10-07 2004-06-03 Ethicon Inc デジタル信号プロセッサによって制御されるプラズマ発生器を備えた消毒システム
JP2004273312A (ja) * 2003-03-10 2004-09-30 Sekisui Chem Co Ltd プラズマ発生装置、プラズマ処理装置およびこれを用いたプラズマ発生方法
JP2005337200A (ja) * 2004-05-31 2005-12-08 Toyota Motor Corp 放電リアクタ用の電源方法
JP2006132483A (ja) * 2004-11-08 2006-05-25 Kri Inc 排気浄化装置及び排気浄化方法並びに制御方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5292370A (en) * 1992-08-14 1994-03-08 Martin Marietta Energy Systems, Inc. Coupled microwave ECR and radio-frequency plasma source for plasma processing
WO2002026622A1 (en) * 2000-09-29 2002-04-04 Smartultoms Co., Ltd. Ozone generator
US7109788B2 (en) * 2001-03-02 2006-09-19 Tokyo Electron Limited Apparatus and method of improving impedance matching between an RF signal and a multi- segmented electrode
US6899787B2 (en) * 2001-06-29 2005-05-31 Alps Electric Co., Ltd. Plasma processing apparatus and plasma processing system with reduced feeding loss, and method for stabilizing the apparatus and system
US7084369B2 (en) * 2002-08-20 2006-08-01 Tokyo Electron Limited Harmonic multiplexer
US7514377B2 (en) * 2002-12-27 2009-04-07 Hitachi Kokusai Electric Inc. Plasma generator, ozone generator, substrate processing apparatus and manufacturing method of semiconductor device
JP4534081B2 (ja) * 2003-03-20 2010-09-01 コニカミノルタホールディングス株式会社 薄膜形成装置
JP2004360512A (ja) * 2003-06-03 2004-12-24 Hino Motors Ltd 排気浄化装置
US20050199484A1 (en) * 2004-02-10 2005-09-15 Franek Olstowski Ozone generator with dual dielectric barrier discharge and methods for using same
US8105546B2 (en) * 2005-05-14 2012-01-31 Air Phaser Environmental Ltd. Apparatus and method for destroying volatile organic compounds and/or halogenic volatile organic compounds that may be odorous and/or organic particulate contaminants in commercial and industrial air and/or gas emissions
EP2139302B1 (en) * 2007-03-28 2013-09-25 Mitsui Engineering & Shipbuilding Co., Ltd. High-voltage plasma producing apparatus

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002324698A (ja) * 2001-04-06 2002-11-08 Eni Technologies Inc パルス化インテリジェントｒｆ変調コントローラ
JP2004154562A (ja) * 2002-10-07 2004-06-03 Ethicon Inc デジタル信号プロセッサによって制御されるプラズマ発生器を備えた消毒システム
JP2004273312A (ja) * 2003-03-10 2004-09-30 Sekisui Chem Co Ltd プラズマ発生装置、プラズマ処理装置およびこれを用いたプラズマ発生方法
JP2005337200A (ja) * 2004-05-31 2005-12-08 Toyota Motor Corp 放電リアクタ用の電源方法
JP2006132483A (ja) * 2004-11-08 2006-05-25 Kri Inc 排気浄化装置及び排気浄化方法並びに制御方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
OKUBO M. ET AL.: "Hikinko Plasma o Riyo shita Hai Gas Chu NOx no Kanzen Jokyo", THE JAPAN SOCIETY OF MECHANICAL ENGINEERS 2000 NENDO NENJI TAIKAI KOEN RONBUNSHU, 2000, pages 291 - 292, XP008121160 *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100931622B1 (ko) * 2007-03-28 2009-12-14 미쯔이 죠센 가부시키가이샤 고전압 플라즈마 발생 장치
JP2011064173A (ja) * 2009-09-18 2011-03-31 Mitsui Eng & Shipbuild Co Ltd 高電圧プラズマ発生装置
JP2012167614A (ja) * 2011-02-15 2012-09-06 Mitsui Eng & Shipbuild Co Ltd プラズマ発生装置
JP2020517045A (ja) * 2017-03-14 2020-06-11 テーデーカー エレクトロニクス アーゲー 非熱的大気圧プラズマを生成するための装置及び圧電変換器の周波数調整のための方法

Also Published As

Publication number Publication date
KR100931622B1 (ko) 2009-12-14
CN101606443B (zh) 2012-11-21
KR20090092350A (ko) 2009-08-31
US8551414B2 (en) 2013-10-08
EP2139302A4 (en) 2011-11-30
EP2139302A1 (en) 2009-12-30
JPWO2008123346A1 (ja) 2010-07-15
JP4288308B2 (ja) 2009-07-01
US20100040516A1 (en) 2010-02-18
DK2139302T3 (da) 2014-01-13
EP2139302B1 (en) 2013-09-25
CN101606443A (zh) 2009-12-16

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