DK2139302T3 - Højspændings-Plasmagenereringsapparat - Google Patents

Højspændings-Plasmagenereringsapparat

Info

Publication number
DK2139302T3
DK2139302T3 DK08738986.2T DK08738986T DK2139302T3 DK 2139302 T3 DK2139302 T3 DK 2139302T3 DK 08738986 T DK08738986 T DK 08738986T DK 2139302 T3 DK2139302 T3 DK 2139302T3
Authority
DK
Denmark
Prior art keywords
generating apparatus
plasma generating
voltage plasma
voltage
plasma
Prior art date
Application number
DK08738986.2T
Other languages
English (en)
Inventor
Noriaki Kimura
Original Assignee
Mitsui Shipbuilding Eng
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Shipbuilding Eng filed Critical Mitsui Shipbuilding Eng
Application granted granted Critical
Publication of DK2139302T3 publication Critical patent/DK2139302T3/da

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL-COMBUSTION ENGINES
    • F01N3/00—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust
    • F01N3/08—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous
    • F01N3/0892—Electric or magnetic treatment, e.g. dissociation of noxious components
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL-COMBUSTION ENGINES
    • F01N3/00—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust
    • F01N3/08—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous
    • F01N3/10—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous by thermal or catalytic conversion of noxious components of exhaust
    • F01N3/18—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous by thermal or catalytic conversion of noxious components of exhaust characterised by methods of operation; Control
    • F01N3/20—Exhaust or silencing apparatus having means for purifying, rendering innocuous, or otherwise treating exhaust for rendering innocuous by thermal or catalytic conversion of noxious components of exhaust characterised by methods of operation; Control specially adapted for catalytic conversion
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01N—GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR MACHINES OR ENGINES IN GENERAL; GAS-FLOW SILENCERS OR EXHAUST APPARATUS FOR INTERNAL-COMBUSTION ENGINES
    • F01N2240/00—Combination or association of two or more different exhaust treating devices, or of at least one such device with an auxiliary device, not covered by indexing codes F01N2230/00 or F01N2250/00, one of the devices being
    • F01N2240/28—Combination or association of two or more different exhaust treating devices, or of at least one such device with an auxiliary device, not covered by indexing codes F01N2230/00 or F01N2250/00, one of the devices being a plasma reactor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2242/00—Auxiliary systems
    • H05H2242/20—Power circuits
    • H05H2242/26—Matching networks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/10—Treatment of gases
    • H05H2245/17—Exhaust gases

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Combustion & Propulsion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Plasma Technology (AREA)
  • Treating Waste Gases (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
DK08738986.2T 2007-03-28 2008-03-27 Højspændings-Plasmagenereringsapparat DK2139302T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007083657 2007-03-28
PCT/JP2008/055836 WO2008123346A1 (ja) 2007-03-28 2008-03-27 高電圧プラズマ発生装置

Publications (1)

Publication Number Publication Date
DK2139302T3 true DK2139302T3 (da) 2014-01-13

Family

ID=39830834

Family Applications (1)

Application Number Title Priority Date Filing Date
DK08738986.2T DK2139302T3 (da) 2007-03-28 2008-03-27 Højspændings-Plasmagenereringsapparat

Country Status (7)

Country Link
US (1) US8551414B2 (da)
EP (1) EP2139302B1 (da)
JP (1) JP4288308B2 (da)
KR (1) KR100931622B1 (da)
CN (1) CN101606443B (da)
DK (1) DK2139302T3 (da)
WO (1) WO2008123346A1 (da)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008123346A1 (ja) * 2007-03-28 2008-10-16 Mitsui Engineering & Shipbuilding Co., Ltd. 高電圧プラズマ発生装置
JP2011064173A (ja) * 2009-09-18 2011-03-31 Mitsui Eng & Shipbuild Co Ltd 高電圧プラズマ発生装置
RU2455798C1 (ru) * 2010-12-08 2012-07-10 Валерий Анатольевич Гостев Жидкостной микроплазмотрон
JP2012167614A (ja) * 2011-02-15 2012-09-06 Mitsui Eng & Shipbuild Co Ltd プラズマ発生装置
JP6414330B2 (ja) * 2015-05-26 2018-10-31 富士通株式会社 排気浄化装置及び車両
DE102017105415B4 (de) * 2017-03-14 2018-10-11 Epcos Ag Vorrichtung zur Erzeugung eines nicht-thermischen Atmosphärendruck-Plasmas und Verfahren zur Frequenzregelung eines piezoelektrischen Transformators
DE102018105895A1 (de) * 2018-03-14 2019-09-19 Tdk Electronics Ag Vorrichtung zur Erzeugung eines nicht-thermischen Atmosphärendruck-Plasmas und Verfahren zum Betrieb eines piezoelektrischen Transformators
WO2021241488A1 (ja) * 2020-05-26 2021-12-02 株式会社 Integral Geometry Science 空気清浄システム及び防護服

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5292370A (en) * 1992-08-14 1994-03-08 Martin Marietta Energy Systems, Inc. Coupled microwave ECR and radio-frequency plasma source for plasma processing
US6730277B2 (en) * 2000-09-29 2004-05-04 Smart Air, Inc. Ozone generator
US6841124B2 (en) * 2000-10-02 2005-01-11 Ethicon, Inc. Sterilization system with a plasma generator controlled by a digital signal processor
AU2002245519A1 (en) * 2001-03-02 2002-09-19 Tokyo Electron Limited Apparatus and method of improving impedance matching between an rf signal and a multi-segmented electrode
US6459067B1 (en) * 2001-04-06 2002-10-01 Eni Technology, Inc. Pulsing intelligent RF modulation controller
US6899787B2 (en) * 2001-06-29 2005-05-31 Alps Electric Co., Ltd. Plasma processing apparatus and plasma processing system with reduced feeding loss, and method for stabilizing the apparatus and system
US7084369B2 (en) * 2002-08-20 2006-08-01 Tokyo Electron Limited Harmonic multiplexer
US7514377B2 (en) * 2002-12-27 2009-04-07 Hitachi Kokusai Electric Inc. Plasma generator, ozone generator, substrate processing apparatus and manufacturing method of semiconductor device
JP2004273312A (ja) * 2003-03-10 2004-09-30 Sekisui Chem Co Ltd プラズマ発生装置、プラズマ処理装置およびこれを用いたプラズマ発生方法
JP4534081B2 (ja) * 2003-03-20 2010-09-01 コニカミノルタホールディングス株式会社 薄膜形成装置
JP2004360512A (ja) * 2003-06-03 2004-12-24 Hino Motors Ltd 排気浄化装置
US20050199484A1 (en) * 2004-02-10 2005-09-15 Franek Olstowski Ozone generator with dual dielectric barrier discharge and methods for using same
JP4543754B2 (ja) 2004-05-31 2010-09-15 トヨタ自動車株式会社 放電リアクタ用の電源方法
JP2006132483A (ja) * 2004-11-08 2006-05-25 Kri Inc 排気浄化装置及び排気浄化方法並びに制御方法
US8105546B2 (en) * 2005-05-14 2012-01-31 Air Phaser Environmental Ltd. Apparatus and method for destroying volatile organic compounds and/or halogenic volatile organic compounds that may be odorous and/or organic particulate contaminants in commercial and industrial air and/or gas emissions
WO2008123346A1 (ja) * 2007-03-28 2008-10-16 Mitsui Engineering & Shipbuilding Co., Ltd. 高電圧プラズマ発生装置

Also Published As

Publication number Publication date
JPWO2008123346A1 (ja) 2010-07-15
KR100931622B1 (ko) 2009-12-14
US20100040516A1 (en) 2010-02-18
US8551414B2 (en) 2013-10-08
EP2139302A1 (en) 2009-12-30
JP4288308B2 (ja) 2009-07-01
CN101606443A (zh) 2009-12-16
KR20090092350A (ko) 2009-08-31
CN101606443B (zh) 2012-11-21
EP2139302B1 (en) 2013-09-25
EP2139302A4 (en) 2011-11-30
WO2008123346A1 (ja) 2008-10-16

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