WO2008114893A1 - Procédé de fabrication de réseaux de mini-lentilles au moyen d'un adhésif optique polymérisable aux uv - Google Patents

Procédé de fabrication de réseaux de mini-lentilles au moyen d'un adhésif optique polymérisable aux uv Download PDF

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Publication number
WO2008114893A1
WO2008114893A1 PCT/KR2007/001363 KR2007001363W WO2008114893A1 WO 2008114893 A1 WO2008114893 A1 WO 2008114893A1 KR 2007001363 W KR2007001363 W KR 2007001363W WO 2008114893 A1 WO2008114893 A1 WO 2008114893A1
Authority
WO
WIPO (PCT)
Prior art keywords
substrates
adhesives
fabrication method
mask
microlens arrays
Prior art date
Application number
PCT/KR2007/001363
Other languages
English (en)
Inventor
Si-Hyun Park
Su-Gwang Son
Original Assignee
Industry Foundation Of Chonnam National University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Industry Foundation Of Chonnam National University filed Critical Industry Foundation Of Chonnam National University
Publication of WO2008114893A1 publication Critical patent/WO2008114893A1/fr

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00009—Production of simple or compound lenses
    • B29D11/00365—Production of microlenses
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00009—Production of simple or compound lenses
    • B29D11/00038—Production of contact lenses
    • B29D11/00125—Auxiliary operations, e.g. removing oxygen from the mould, conveying moulds from a storage to the production line in an inert atmosphere
    • B29D11/00134—Curing of the contact lens material
    • B29D11/00153—Differential curing, e.g. by differential radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
    • B29D11/00—Producing optical elements, e.g. lenses or prisms
    • B29D11/00009—Production of simple or compound lenses
    • B29D11/00432—Auxiliary operations, e.g. machines for filling the moulds
    • B29D11/00442—Curing the lens material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Definitions

  • the present invention provides the fabrication method of polymer refractive microlens, which has excellent adhesive force toward substrates without regard to the kind of substrates, high optical permeability, great resistance against chemical drugs, no volatility during the fabrication process due to no usage of solvents. Also, it is fabricated through the faster and simpler low-temperature process, without soft baking or hard baking.
  • microlens ranging diameter from a few ⁇ m to mm and microlens arrays are to be used. These microlens and microlens arrays are used for combination of optical fiber and semiconductor laser, which is a light source of optical communication, bifurcation dividing the light paths, demultiplex dividing lights having different wavelengths, and imaging such as photocopiers, facsimiles, endoscopies, etc.
  • the most commonly used one is the reflow method using photo-resist (PR) for fabrication of refractive microlens.
  • PR photo-resist
  • the advantage of this method is that it can easily make microlens and arrays only with the usual photolithography process and low-temperature heat treatment and obtain half-spherical lens patterns using thermal reflow by the surface tension of photo-resist through heat treatment higher than glass transition temperature (T 9 ) .
  • the photo-lithography process used in the photo-resist reflow method, employs the principle that when it receives light, its material property changes due to chemical reaction as photo-resist does. It is a process that transcribes the mask pattern on the substrate after selectively irradiating light to photo-resist using the mask with the pattern to be obtained.
  • the photo-lithography process goes through photo-resist coating, soft baking, photo exposure, development, and hard baking.
  • photo-resist coating liquid photo-resist is sprayed and spun at high speed and then coated on the whole substrate as the form of uniform and light film. Then it is soft baked at a specific temperature and hardened after evaporating the solvent of the photo-resist for stabilization.
  • Soft baking is followed by photo exposure, which is a process that transcribes micro circuit patterns, which are formed on the photo mask, to photo-resist, by irradiating light in ultraviolet (UV) range to photo-resist on the substrate through the photo mask.
  • UV ultraviolet
  • Development is a process that dissolves photo-resist, which is relatively weakly combined due to photo exposure, using solvents. Through this process, a photo-resist pattern is formed. In case of positive PR, polymer chains loosed by photosensitization are melted away. In case of negative PR, however, not strongly combined parts by photosensitization, but relatively weakly combined parts (unexposed parts) , are melted away. Developers are largely divided into basic aqueous solutions and solvents. Usually, basic aqueous solutions such as KOH aqueous solution are used, but acetone or specific solvent is used depending on the characteristics of photo-resist. Photo-resist after development removes remaining solvents, dries itself and improves its adhesiveness to substrates. Hard baking is followed to harden the polymer structure, which is loosened during the development process.
  • This polymer microlens has the advantage of lightweightness, high processability, mass production, and impact resistance.
  • the photo-resist reflow method above has the disadvantage of low adhesiveness between photo-resist and substrates, low optical permeability, poor resistance against chemical drugs used in device process of microlenses, which is a problem for integration. Also, when the photo-resist reflow method is used, ecohazard solvents are released and photo-resist is contracted while drying, and its production process is complicated, too.
  • an object of the present invention is to provide the fabrication method of polymer refractive microlens, which has excellent adhesive force toward substrates without regard to the kind of substrates, high optical permeability, great resistance against chemical drugs, no volatility during the fabrication process due to no usage of solvents, and is fabricated through the faster and simpler low-temperature process, without soft baking or hard baking.
  • the microlens fabrication method of the present invention comprises the processes of : i) a coating process where adhesives, UV-curable resins, are coated on substrates, ii) a photo exposure process where ultraviolet is irradiated to the adhesives coated on the substrates after fixating a mask with a specific pattern on said substrates, iii) a development process where the adhesives not irradiated by ultraviolet, due to said pattern of mask, are removed by solvents, and iv) a heat treatment process where photo-resist that would not be removed from said substrates by the development process is heat treated.
  • microlens array fabrication process goes through the following process: the adhesives (120), a UV-curable resin, is coated on the substrate (110) using spin coating, and the mask
  • the substrate (110) here, where the adhesive (120) is coated can be semiconductor, metal, transparent conducting material, polymer, or ceramic.
  • the photo exposure process is followed by the development process, in order to remove uncured adhesives (122) that were not irradiated by ultraviolet and to obtain only cured adhesives (121) on the substrate (110), among the adhesives (120) that were cured (121) by the pattern of the mask (130) and that were not (122) .
  • the solvent used for the development process is determined by the material of adhesives (120), UV-curable resins. It is desirable that the adhesives (120), UV-curable resins, should be acrylate polymer or copolymer. For the solvents for them, it is desirable to be alcohols, ketones, chlorinated hydrocarbons, or the mixed solvents of these.
  • methanol, ethanol, isopropanol, butanol, or their mixture are desirable; for the ketones, acetone, methylethylketone, cyclohexanone, diisopropylketone, or their mixtures are desirable; for chlorinated hydrocarbons, dichloromethane, chloromethane, tetrachloromethane, or their mixtures are desirable.
  • the adhesive (121) which was cured by ultraviolet, only remains on the substrate (110) .
  • a half-spherical lens pattern with curvature can be made after heat treating the adhesive (121).
  • the temperature for heat treatment is determined by glass transition temperature (T 9 ) and degradation temperature (T d ) , which is the material feature of the adhesive (120) . It is desirable that it is treated at higher temperature than T g and lower than T d .
  • the heat treatment ambient can be controlled for the wetting angle of the cured adhesive (121). Since the heat treatment ambient affects interfacial energies between the substrate (110) and vapor and between the adhesive (121) and vapor, the wetting angle changes to be able to control the patterns of microlenses.
  • Another element to affect the patterns of microlenses is the thickness of the adhesive (120) that was coated.
  • the patterns of microlenses can be controlled by the thickness of the adhesive depending on the spinning speed of the substrate, acceleration toward the substrate or their combination during coating.
  • the fabrication method of microlens arrays of the present invention was described in detail in Figure 1.
  • the determiner of the size or location of microlenses here is the mask pattern.
  • the mask pattern can have repetitive identical patterns and more than two repetitive patterns with either different shape or size, or both.
  • Figure 2 is an example of the photo exposure process, one of the fabrication methods of microlens according to the present invention, using a mask pattern that has two repetitive patterns of large and small squares.
  • Ultraviolet passes through the small squares (211) and big squares (212) in the center on the mask (210) and then is irradiated to the adhesive (120) coated on the substrate (110) in Figure 2.
  • the microlens prepared by the example of Figure 2 is composed of the adhesive with big and small half-spherical patterns.
  • Figure 1 is a process flow chart of fabrication method of microlens array of the present invention.
  • Figure 2 is a perspective view of photo exposure process of fabrication method of microlens array of the present invention.
  • Figure 3 is an optical photo of microlens array fabricated according to Example of the present invention.
  • Figure 4 is an optical photo of another microlens array fabricated according to Example of the present invention.
  • Figure 5 is a photo of scanning electron microscope (SEM) of microlens fabricated according to Example of the present invention.
  • Figure 6 is a measurement result of one-dimensional profiler meter of microlens fabricated according to Example of the present invention.
  • a UV-curable adhesive (Dymax, OP-4-20663) with viscosity (ASTM D-1084) of 1900 cP was coated on the glass substrate using a spin coater at 4000 rpm. Then, a mask with lOum sized repetitive patterns of 10 X 10 was fixated after being lined up with the substrate and irradiated by ultraviolet. After that, UV uncured adhesives were removed by using acetone. Since T g (ASTM E-831) of the used adhesive is 104 0 C, it was heat treated at 130 0 C for five minutes, and then a microlens array like Figure 3 was fabricated.
  • Example 1 the heat treatment was conducted at 130 0 C, but since T d of the UV-curable adhesive (Dymax, OP-4-20663) is 180 °C, the microlens array can be fabricated at temperature ranging between 104 0 C and 180 0 C.
  • Figure 4 is the optical photo of the microlens array fabricated by the method above using the 20 ⁇ m sized mask pattern.
  • Figure 5 is the photo of scanning electron microscope (SEM) of the microlens, which composes microlens array of Figure 3. It is shown that the microlens has smooth surface and symmetrically spherical forms with no irregular changes.
  • Figure 6 is the result of one-dimensional profiler meter of the microlens of Figure 5.
  • the height to the lens center is 4 ⁇ m
  • the radius of curvature of lens center part is
  • the microlens fabricated according to Example 1 has the characteristics of having more than 99% permeability toward the light with 350 nm ⁇ 1300 nm wavelength and having refractive index of 1.56 within the same wavelength range.
  • microlens of the present invention has the characteristics of having excellent adhesive force toward substrates without regard to the kind of substrates due to usage of adhesives, UV-curable resins, high optical permeability, great resistance against chemical drugs, no volatility during the fabrication process due to no usage of solvents. Also, the microlens arrays can be fabricated through the faster due to use of UV, simpler due to adhesive curing in low temperature and low-temperature process, without soft baking or hard baking process.
  • microlens of the present invention has the characteristics of having excellent adhesive force toward substrates without regard to the kind of substrates, UV-curable resins, high optical permeability, great resistance against chemical drugs, no volatility during the fabrication process due to no usage of solvents. Also, the microlens arrays can be fabricated through the faster and simpler low-temperature process, without soft baking or hard baking process. ⁇

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Ophthalmology & Optometry (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)

Abstract

Cette invention concerne un procédé permettant de fabriquer une mini-lentille réfractive polymère présentant une excellente force d'adhérence sur des substrats quelle que soit la nature des substrats, une perméabilité optique élevée, une excellente résistance aux médicaments chimiques et aucune volatilité pendant le processus de fabrication en raison de l'absence d'utilisation de solvants. Cette mini-lentille étant fabriquée selon un processus basse température plus simple et plus rapide sans étuvage doux ni étuvage dur. Le procédé de fabrication décrit dans cette invention comprend i) un processus d'enrobage au cours duquel des adhésifs, des résines polymérisables aux UV, sont déposées sur des substrats, ii) un processus de photo-exposition au cours duquel un rayonnement ultra-violet est appliqué aux adhésifs déposés sur les substrats après fixation d'un masque présentant un motif spécifique sur lesdits substrats, iii) un processus de développement au cours duquel les adhésifs qui n'ont pas été soumis au rayonnement UV en raison de la présence du masque à motif, sont éliminés par des solvants, et iv) un processus de traitement thermique au cours duquel les adhésifs qui n'auraient pas été éliminés des substrats lors du processus de développement sont traités à chaud.
PCT/KR2007/001363 2007-03-19 2007-03-20 Procédé de fabrication de réseaux de mini-lentilles au moyen d'un adhésif optique polymérisable aux uv WO2008114893A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020070026861A KR101001756B1 (ko) 2007-03-19 2007-03-19 자외선 경화 접착제를 이용한 마이크로 렌즈 어레이의 제작방법
KR10-2007-0026861 2007-03-19

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KR (1) KR101001756B1 (fr)
WO (1) WO2008114893A1 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010127935A1 (fr) * 2009-05-05 2010-11-11 Secco Gmbh Procédé de production d'objets présentant une surface structurelle définie
JP2014080014A (ja) * 2012-09-27 2014-05-08 Dainippon Toryo Co Ltd 基材とレンズ状粒子との複合材料及びその製造方法
CN110187417A (zh) * 2019-06-27 2019-08-30 电子科技大学 Pdms薄膜微透镜阵列的制作方法
EP4368381A1 (fr) * 2022-11-09 2024-05-15 Essilor International Procédé de fabrication d'un article ophtalmique ayant au moins une surface microstructurée, et article ophtalmique ainsi obtenu

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20110058031A (ko) 2009-11-25 2011-06-01 삼성전자주식회사 가변저항 메모리 장치의 제조 방법

Citations (3)

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Publication number Priority date Publication date Assignee Title
JPH03198003A (ja) * 1989-12-27 1991-08-29 Ricoh Co Ltd マイクロレンズアレイの製造方法
JPH08313706A (ja) * 1995-05-12 1996-11-29 Hoya Corp 遮光部一体型マイクロレンズアレイ及びその製造方法
JP2001096636A (ja) * 1999-07-27 2001-04-10 Seiko Epson Corp マイクロレンズアレイ及びその製造方法並びに光学装置

Family Cites Families (2)

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Publication number Priority date Publication date Assignee Title
JP2003222705A (ja) 2002-01-30 2003-08-08 Toppan Printing Co Ltd マイクロレンズの製造方法
JP2006019575A (ja) 2004-07-02 2006-01-19 Sharp Corp フォトレジストの現像方法及び現像装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03198003A (ja) * 1989-12-27 1991-08-29 Ricoh Co Ltd マイクロレンズアレイの製造方法
JPH08313706A (ja) * 1995-05-12 1996-11-29 Hoya Corp 遮光部一体型マイクロレンズアレイ及びその製造方法
JP2001096636A (ja) * 1999-07-27 2001-04-10 Seiko Epson Corp マイクロレンズアレイ及びその製造方法並びに光学装置

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010127935A1 (fr) * 2009-05-05 2010-11-11 Secco Gmbh Procédé de production d'objets présentant une surface structurelle définie
US20120104637A1 (en) * 2009-05-05 2012-05-03 3D International Europe Gmbh Method for producing objects with a defined structured surface
JP2012525996A (ja) * 2009-05-05 2012-10-25 セッコ ゲーエムベーハー 構造化表面が形成された物体の作製方法
DE102009019762B4 (de) * 2009-05-05 2020-03-12 3D Global Holding Gmbh Verfahren zum Herstellen von Gegenständen mit einer definiert strukturierten Oberfläche
JP2014080014A (ja) * 2012-09-27 2014-05-08 Dainippon Toryo Co Ltd 基材とレンズ状粒子との複合材料及びその製造方法
CN110187417A (zh) * 2019-06-27 2019-08-30 电子科技大学 Pdms薄膜微透镜阵列的制作方法
CN110187417B (zh) * 2019-06-27 2020-08-25 电子科技大学 Pdms薄膜微透镜阵列的制作方法
EP4368381A1 (fr) * 2022-11-09 2024-05-15 Essilor International Procédé de fabrication d'un article ophtalmique ayant au moins une surface microstructurée, et article ophtalmique ainsi obtenu
WO2024099988A1 (fr) * 2022-11-09 2024-05-16 Essilor International Procédé de fabrication d'un article ophtalmique ayant au moins une surface microstructurée et article ophtalmique ainsi obtenu

Also Published As

Publication number Publication date
KR20080085402A (ko) 2008-09-24
KR101001756B1 (ko) 2010-12-15

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