WO2008114862A1 - プラズマ処理装置 - Google Patents

プラズマ処理装置 Download PDF

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Publication number
WO2008114862A1
WO2008114862A1 PCT/JP2008/055245 JP2008055245W WO2008114862A1 WO 2008114862 A1 WO2008114862 A1 WO 2008114862A1 JP 2008055245 W JP2008055245 W JP 2008055245W WO 2008114862 A1 WO2008114862 A1 WO 2008114862A1
Authority
WO
WIPO (PCT)
Prior art keywords
gas
temperature
processing
heat medium
status
Prior art date
Application number
PCT/JP2008/055245
Other languages
English (en)
French (fr)
Inventor
Toshiaki Hongoh
Original Assignee
Tokyo Electron Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Limited filed Critical Tokyo Electron Limited
Publication of WO2008114862A1 publication Critical patent/WO2008114862A1/ja

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/4557—Heated nozzles

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Drying Of Semiconductors (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

【課題】シャワープレートの温度を所望の温度に維持すると共に面内温度の均一性を向上させて、シャワープレートの変形、歪みの発生を抑える。 【解決手段】処理容器２内に基板Ｗを収納し、処理ガスをプラズマ化して基板Ｗを処理するプラズマ処理装置１であって、処理容器２内に処理ガス供給用のガス供給部材５０が配置され、ガス供給部材５０に、超臨界状態または亜超臨界状態の熱媒を流通させる熱媒流路５５が形成されている。気体と液体の両方の性質をもった超臨界状態または亜超臨界状態の熱媒を利用してガス供給部材５０の温度を所望の温度に維持すると共に面内温度の均一性を向上させて、処理の際の変形、歪みの発生を抑える。
PCT/JP2008/055245 2007-03-22 2008-03-21 プラズマ処理装置 WO2008114862A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-074996 2007-03-22
JP2007074996 2007-03-22

Publications (1)

Publication Number Publication Date
WO2008114862A1 true WO2008114862A1 (ja) 2008-09-25

Family

ID=39765962

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/055245 WO2008114862A1 (ja) 2007-03-22 2008-03-21 プラズマ処理装置

Country Status (2)

Country Link
TW (1) TW200914646A (ja)
WO (1) WO2008114862A1 (ja)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002286385A (ja) * 2001-03-26 2002-10-03 Sanyo Electric Co Ltd 熱搬送装置
WO2002080249A1 (fr) * 2001-03-28 2002-10-10 Tokyo Electron Limited Dispositif de traitement au plasma
WO2005045913A1 (ja) * 2003-11-05 2005-05-19 Tokyo Electron Limited プラズマ処理装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002286385A (ja) * 2001-03-26 2002-10-03 Sanyo Electric Co Ltd 熱搬送装置
WO2002080249A1 (fr) * 2001-03-28 2002-10-10 Tokyo Electron Limited Dispositif de traitement au plasma
WO2005045913A1 (ja) * 2003-11-05 2005-05-19 Tokyo Electron Limited プラズマ処理装置

Also Published As

Publication number Publication date
TW200914646A (en) 2009-04-01

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