WO2008114627A1 - Corps stratifié antisalissure et substrat avant pour affichage - Google Patents

Corps stratifié antisalissure et substrat avant pour affichage Download PDF

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Publication number
WO2008114627A1
WO2008114627A1 PCT/JP2008/054168 JP2008054168W WO2008114627A1 WO 2008114627 A1 WO2008114627 A1 WO 2008114627A1 JP 2008054168 W JP2008054168 W JP 2008054168W WO 2008114627 A1 WO2008114627 A1 WO 2008114627A1
Authority
WO
WIPO (PCT)
Prior art keywords
antifouling
laminated body
display
front substrate
layer
Prior art date
Application number
PCT/JP2008/054168
Other languages
English (en)
Japanese (ja)
Inventor
Takahide Toyama
Original Assignee
Konica Minolta Holdings, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Holdings, Inc. filed Critical Konica Minolta Holdings, Inc.
Priority to JP2009505133A priority Critical patent/JPWO2008114627A1/ja
Publication of WO2008114627A1 publication Critical patent/WO2008114627A1/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

L'invention concerne un corps stratifié antisalissure ayant une excellente durabilité et une excellente flexibilité, et un substrat avant pour affichage. Le corps stratifié antisalissure est comporte une couche de base contenant de l'oxyde de silicium au moins sur un côté d'une matière de base de résine transparente ; et une couche antisalissure, composée d'un composé de métal organique ayant un groupe organique contenant un atome de fluor, sur la couche de base. La quantité de teneur en carbone dans la couche de base est importante dans une région amenée en contact avec la matière de base de résine transparente, et petite dans une région amenée en contact avec la couche antisalissure.
PCT/JP2008/054168 2007-03-16 2008-03-07 Corps stratifié antisalissure et substrat avant pour affichage WO2008114627A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2009505133A JPWO2008114627A1 (ja) 2007-03-16 2008-03-07 防汚性積層体及びディスプレイ用前面板

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007068245 2007-03-16
JP2007-068245 2007-03-16

Publications (1)

Publication Number Publication Date
WO2008114627A1 true WO2008114627A1 (fr) 2008-09-25

Family

ID=39765736

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/054168 WO2008114627A1 (fr) 2007-03-16 2008-03-07 Corps stratifié antisalissure et substrat avant pour affichage

Country Status (2)

Country Link
JP (1) JPWO2008114627A1 (fr)
WO (1) WO2008114627A1 (fr)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010137400A (ja) * 2008-12-10 2010-06-24 Konica Minolta Holdings Inc ハードコート付積層体
JP2010173294A (ja) * 2009-02-02 2010-08-12 Konica Minolta Holdings Inc 防汚性積層体
WO2010125926A1 (fr) * 2009-04-30 2010-11-04 コニカミノルタホールディングス株式会社 Stratifié antisalissure
JPWO2012057005A1 (ja) * 2010-10-27 2014-05-12 コニカミノルタ株式会社 太陽熱発電用フィルムミラー、太陽熱発電用フィルムミラーの製造方法および太陽熱発電用反射装置
WO2014129171A1 (fr) * 2013-02-20 2014-08-28 凸版印刷株式会社 Film conducteur transparent, et panneau tactile et dispositif d'affichage le comprenant
JP2015189170A (ja) * 2014-03-28 2015-11-02 尾池工業株式会社 撥水処理がなされた基材及びその製造方法
JP2015189169A (ja) * 2014-03-28 2015-11-02 尾池工業株式会社 撥水紙及びその製造方法
JP2017500448A (ja) * 2013-12-12 2017-01-05 ザ・ボーイング・カンパニーＴｈｅ Ｂｏｅｉｎｇ Ｃｏｍｐａｎｙ 傾斜薄膜
JP2017125876A (ja) * 2016-01-12 2017-07-20 旭硝子株式会社 防汚層付きガラス基体およびディスプレイ用前面板
JP2020056866A (ja) * 2018-10-01 2020-04-09 Ａｇｃ株式会社 ガラス積層体、ディスプレイ用前面板および表示装置
JP2020140211A (ja) * 2016-01-12 2020-09-03 Ａｇｃ株式会社 防汚層付きガラス基体の製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10249900A (ja) * 1997-03-14 1998-09-22 Nok Corp 材料供給用シリンダ
JP2005096466A (ja) * 2001-06-08 2005-04-14 Dainippon Printing Co Ltd 積層材
JP2005096275A (ja) * 2003-09-25 2005-04-14 Dainippon Printing Co Ltd バリア性フィルム
WO2006087941A1 (fr) * 2005-02-17 2006-08-24 Konica Minolta Holdings, Inc. Film barriere aux gaz, procede de production du film barriere aux gaz, base en resine avec le film barriere aux gaz pour element electroluminescent organique et element electroluminescent organique

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3951348B2 (ja) * 1997-03-14 2007-08-01 東洋製罐株式会社 ガス遮断性及びフレキシビリティーに優れた積層体
JP4014357B2 (ja) * 2000-10-10 2007-11-28 大日本印刷株式会社 撥水性防汚フィルム
JP4333382B2 (ja) * 2004-01-30 2009-09-16 凸版印刷株式会社 ガスバリア性プラスチック容器
JP4802576B2 (ja) * 2005-06-29 2011-10-26 コニカミノルタホールディングス株式会社 ガスバリア性樹脂基材、透明導電膜付ガスバリア性樹脂基材および有機エレクトロルミネッセンス素子

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10249900A (ja) * 1997-03-14 1998-09-22 Nok Corp 材料供給用シリンダ
JP2005096466A (ja) * 2001-06-08 2005-04-14 Dainippon Printing Co Ltd 積層材
JP2005096275A (ja) * 2003-09-25 2005-04-14 Dainippon Printing Co Ltd バリア性フィルム
WO2006087941A1 (fr) * 2005-02-17 2006-08-24 Konica Minolta Holdings, Inc. Film barriere aux gaz, procede de production du film barriere aux gaz, base en resine avec le film barriere aux gaz pour element electroluminescent organique et element electroluminescent organique

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010137400A (ja) * 2008-12-10 2010-06-24 Konica Minolta Holdings Inc ハードコート付積層体
JP2010173294A (ja) * 2009-02-02 2010-08-12 Konica Minolta Holdings Inc 防汚性積層体
WO2010125926A1 (fr) * 2009-04-30 2010-11-04 コニカミノルタホールディングス株式会社 Stratifié antisalissure
JP5716663B2 (ja) * 2009-04-30 2015-05-13 コニカミノルタ株式会社 防汚性積層体
JPWO2012057005A1 (ja) * 2010-10-27 2014-05-12 コニカミノルタ株式会社 太陽熱発電用フィルムミラー、太陽熱発電用フィルムミラーの製造方法および太陽熱発電用反射装置
JPWO2014129171A1 (ja) * 2013-02-20 2017-02-02 凸版印刷株式会社 透明導電性フィルム及びこれを備えたタッチパネル並びに表示デバイス
WO2014129171A1 (fr) * 2013-02-20 2014-08-28 凸版印刷株式会社 Film conducteur transparent, et panneau tactile et dispositif d'affichage le comprenant
CN105009041A (zh) * 2013-02-20 2015-10-28 凸版印刷株式会社 透明导电性薄膜及具备该透明导电性薄膜的触摸面板和显示设备
TWI614660B (zh) * 2013-02-20 2018-02-11 Toppan Printing Co Ltd 透明導電性薄膜及具有其之觸控面板以及顯示裝置
US9523880B2 (en) 2013-02-20 2016-12-20 Toppan Printing Co., Ltd. Transparent conductive film, and touch panel and display device having the same
JP2017500448A (ja) * 2013-12-12 2017-01-05 ザ・ボーイング・カンパニーＴｈｅ Ｂｏｅｉｎｇ Ｃｏｍｐａｎｙ 傾斜薄膜
JP2015189169A (ja) * 2014-03-28 2015-11-02 尾池工業株式会社 撥水紙及びその製造方法
JP2015189170A (ja) * 2014-03-28 2015-11-02 尾池工業株式会社 撥水処理がなされた基材及びその製造方法
JP2017125876A (ja) * 2016-01-12 2017-07-20 旭硝子株式会社 防汚層付きガラス基体およびディスプレイ用前面板
JP2020140211A (ja) * 2016-01-12 2020-09-03 Ａｇｃ株式会社 防汚層付きガラス基体の製造方法
US10988410B2 (en) 2016-01-12 2021-04-27 AGC Inc. Glass substrate with antifouling layer and front plate for display
JP2020056866A (ja) * 2018-10-01 2020-04-09 Ａｇｃ株式会社 ガラス積層体、ディスプレイ用前面板および表示装置

Also Published As

Publication number Publication date
JPWO2008114627A1 (ja) 2010-07-01

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