WO2008099727A1 - α－置換アクリル酸エステル誘導体及びその製造方法 - Google Patents

α－置換アクリル酸エステル誘導体及びその製造方法 Download PDF

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Publication number
WO2008099727A1
WO2008099727A1 PCT/JP2008/051913 JP2008051913W WO2008099727A1 WO 2008099727 A1 WO2008099727 A1 WO 2008099727A1 JP 2008051913 W JP2008051913 W JP 2008051913W WO 2008099727 A1 WO2008099727 A1 WO 2008099727A1
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WO
WIPO (PCT)
Prior art keywords
acrylate derivative
substituted acrylate
alkyl group
arbitrary position
optionally containing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/051913
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English (en)
French (fr)
Inventor
Junko Sato
Takashi Fukumoto
Hideki Matsuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kuraray Co Ltd
Original Assignee
Kuraray Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kuraray Co Ltd filed Critical Kuraray Co Ltd
Publication of WO2008099727A1 publication Critical patent/WO2008099727A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C311/00—Amides of sulfonic acids, i.e. compounds having singly-bound oxygen atoms of sulfo groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
    • C07C311/22—Sulfonamides, the carbon skeleton of the acid part being further substituted by singly-bound oxygen atoms
    • C07C311/28—Sulfonamides, the carbon skeleton of the acid part being further substituted by singly-bound oxygen atoms having the sulfur atom of at least one of the sulfonamide groups bound to a carbon atom of a ring other than a six-membered aromatic ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/38—Esters containing sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2602/00—Systems containing two condensed rings
    • C07C2602/36—Systems containing two condensed rings the rings having more than two atoms in common
    • C07C2602/42—Systems containing two condensed rings the rings having more than two atoms in common the bicyclo ring system containing seven carbon atoms

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

【課題】 　１９３ｎｍ付近における高い透明性を維持しながら、溶解速度のコントロールに優れたフォトレジスト組成物用高分子化合物の材料として有用である、新規なα－置換アクリル酸エステル誘導体およびその効率的な製造方法を提供する。 【解決手段】　 　下記一般式（Ｉ） 【化１】 （式中、Ｒ１は水素原子、炭素数１～５のアルキル基または炭素数１～５のフッ素化アルキル基を表し、Ｒ２およびＲ３はそれぞれ独立して水素原子、アルキル基もしくはアルコキシ基を表すか、または両者が結合して任意の位置に酸素原子または硫黄原子を含んでもよいアルキレン基、－Ｏ－、若しくは－Ｓ－を表し、Ｒ４およびＲ５はそれぞれ独立して水素原子、任意の位置に酸素原子を含んでもよいアルキル基、任意の位置に酸素原子を含んでもよいシクロアルキル基またはアルコキシカルボニル基を表す。） で示されるα－置換アクリル酸エステル誘導体を提供する。
PCT/JP2008/051913 2007-02-15 2008-02-06 α－置換アクリル酸エステル誘導体及びその製造方法 Ceased WO2008099727A1 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007-034297 2007-02-15
JP2007034297 2007-02-15
JP2007301164 2007-11-21
JP2007-301164 2007-11-21

Publications (1)

Publication Number Publication Date
WO2008099727A1 true WO2008099727A1 (ja) 2008-08-21

Family

ID=39689965

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/051913 Ceased WO2008099727A1 (ja) 2007-02-15 2008-02-06 α－置換アクリル酸エステル誘導体及びその製造方法

Country Status (1)

Country Link
WO (1) WO2008099727A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008223000A (ja) * 2007-02-15 2008-09-25 Tokyo Ohka Kogyo Co Ltd 高分子化合物、レジスト組成物及びレジストパターン形成方法
WO2012043866A1 (en) * 2010-09-29 2012-04-05 Fujifilm Corporation Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern
US9618843B2 (en) 2011-03-25 2017-04-11 Tokyo Ohka Kogyo Co., Ltd. Resist composition and method of forming resist pattern

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04110947A (ja) * 1990-08-31 1992-04-13 Konica Corp 感光性組成物
JPH06263717A (ja) * 1992-12-14 1994-09-20 Hoechst Ag Ｎ，ｎ−二置換スルホンアミド懸垂基を有する重合体およびその使用
JPH0728242A (ja) * 1993-07-07 1995-01-31 Fuji Photo Film Co Ltd 感光性組成物
JPH1010737A (ja) * 1996-06-25 1998-01-16 Fuji Photo Film Co Ltd ポジ画像形成組成物
JP2001051408A (ja) * 1999-08-16 2001-02-23 Fuji Photo Film Co Ltd 感光性平版印刷版
JP2005023304A (ja) * 2003-06-12 2005-01-27 Shin Etsu Chem Co Ltd スルホンアミド構造を有する重合性エステル化合物、その重合体、レジスト材料及びパターン形成方法
JP2006243264A (ja) * 2005-03-02 2006-09-14 Fuji Photo Film Co Ltd 液浸露光用ポジ型レジスト組成物及びそれを用いたパターン形成方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04110947A (ja) * 1990-08-31 1992-04-13 Konica Corp 感光性組成物
JPH06263717A (ja) * 1992-12-14 1994-09-20 Hoechst Ag Ｎ，ｎ−二置換スルホンアミド懸垂基を有する重合体およびその使用
JPH0728242A (ja) * 1993-07-07 1995-01-31 Fuji Photo Film Co Ltd 感光性組成物
JPH1010737A (ja) * 1996-06-25 1998-01-16 Fuji Photo Film Co Ltd ポジ画像形成組成物
JP2001051408A (ja) * 1999-08-16 2001-02-23 Fuji Photo Film Co Ltd 感光性平版印刷版
JP2005023304A (ja) * 2003-06-12 2005-01-27 Shin Etsu Chem Co Ltd スルホンアミド構造を有する重合性エステル化合物、その重合体、レジスト材料及びパターン形成方法
JP2006243264A (ja) * 2005-03-02 2006-09-14 Fuji Photo Film Co Ltd 液浸露光用ポジ型レジスト組成物及びそれを用いたパターン形成方法

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
CORRADO C. ET AL.: "[4+2] Cycloaddition reactions of N-sulphinylcarboxamides. I. Reactions with symmetrically substituted alkenes", GAZZETTA CHIMICA ITALIANA, vol. 112, no. 11-12, 1982, pages 469 - 473 *
HANS H. ET AL.: "Synthese und Reaktionen von N-Sulfinyl-urethanen", CHEMISCHE BERICHTE, vol. 101, no. 10, 1968, pages 3567 - 3578 *

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008223000A (ja) * 2007-02-15 2008-09-25 Tokyo Ohka Kogyo Co Ltd 高分子化合物、レジスト組成物及びレジストパターン形成方法
WO2012043866A1 (en) * 2010-09-29 2012-04-05 Fujifilm Corporation Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern
JP2012073508A (ja) * 2010-09-29 2012-04-12 Fujifilm Corp 感活性光線性または感放射線性樹脂組成物、感活性光線性または感放射線性膜およびパターン形成方法
US9034558B2 (en) 2010-09-29 2015-05-19 Fujifilm Corporation Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern
US9618843B2 (en) 2011-03-25 2017-04-11 Tokyo Ohka Kogyo Co., Ltd. Resist composition and method of forming resist pattern

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